CN203999806U - A kind of vertical layout is prepared many array thermal silk device of diamond film - Google Patents
A kind of vertical layout is prepared many array thermal silk device of diamond film Download PDFInfo
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- CN203999806U CN203999806U CN201420288856.9U CN201420288856U CN203999806U CN 203999806 U CN203999806 U CN 203999806U CN 201420288856 U CN201420288856 U CN 201420288856U CN 203999806 U CN203999806 U CN 203999806U
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Abstract
Vertical layout is prepared many array thermal silk device of diamond film, belongs to coating technique field, and this device comprises vacuum chamber wainscot and vacuum chamber lower wall panels, it is characterized in that: electric pole plate is fixedly connected with vacuum chamber wainscot; At least two row heated filaments vertically distribute, and every row heated filament upper end electric pole plate corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate corresponding with it is fixedly connected with; Lower electrode plate lower end is fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels.This device adopts many arrays heated filament vertically to distribute, can two-sided large-area coating film, reduce the cost of heated filament, the distribution mode of multiple row heated filament can realize complete effective plated film of large-area coating film sample, and improve the efficiency of plated film, the hot wire structure vertically distributing has ensured in the situation that not destroying heated filament, to take out sample, has further reduced the cost of heated filament, the heated filament of heated filament lower end adjusts the force mechanisms can tensioning heated filament and limit heated filament and swing, and realizes uniform coated.
Description
Technical field
The invention belongs to coating technique field, particularly a kind of heated filament device of preparing diamond film.
Background technology
Diamond has excellent power, heat, sound, the properties such as optical, electrical, chemical.The performance of artificial diamond film has approached natural diamond substantially, and excellent performance makes it be with a wide range of applications in high-tech area.At present, thin diamond membrane technique is at cutter, high-performance electric sub-element, and numerous occasions such as space material are applied, and receive fabulous effect, and it is applied in high-tech area and is extraordinarily paid close attention to by people.
At present, the preparation method of industrialization CVD diamond thin mainly contains two kinds, and the one, hot filament CVD (HFCVD), the 2nd, microwave plasma CVD method (MPCVD).Microwave method can be prepared the diamond thin of high-quality and thickness and reach the diamond wafer of millimeter magnitude, but equipment cost is high, and depositional area is less, and sedimentation velocity is slow.Hot wire process is simple to operate, and sedimentation rate is fast, and cost is low, easily controls the underlayer temperature of deposition, can obtain the diamond thin that quality is higher, area size is larger.Adopting HFCVD legal system is indoor by passing into vacuum reaction after reactant gases mixing for diamond thin, and mixed gas is after the cracking of high temperature heated filament, and the active atoms of carbon in its gas will be deposited on matrix surface, thereby grows diamond thin.
Heated filament device in diamond coated equipment is the device for cutter head Mass production diamond film, traditional heated filament device is generally horizontally disposed, namely heated filament is that horizontal cross is arranged, this structure can only utilize a side of heated filament to carry out heating film-coated, and efficiency is very low.
At present, the heated filament device of some company's invention, for being arranged vertically, can utilize two sides of heated filament to generate diamond film, efficiency is improved significantly, but in these devices, heated filament is arranged vertically, adopt the lower end of counterweight hanging at heated filament simultaneously, because heated filament has elasticity, and counterweight is free suspension, can causes lower electrode plate to rock, thereby further cause heated filament to rock, the unstable meeting of heated filament makes plated film inhomogeneous, and the diamond film that affects cutter generates quality.
In addition, current heated filament is general adopts single-row heated filament to distribute, and cannot realize complete effective plated film, and have the problem that plated film efficiency is lower for the larger sample of plated film area.
Utility model content
The purpose of this utility model is to overcome above the deficiencies in the prior art, provide a kind of vertical layout to prepare many array thermal silk device of diamond film, this device adopts many arrays heated filament vertically to distribute, can two-sided large-area coating film, reduce the cost of heated filament, the distribution mode of multiple row heated filament can realize complete effective plated film of large-area coating film sample simultaneously, and improve the efficiency of plated film, the hot wire structure vertically distributing has ensured to take out sample in the situation that not destroying heated filament, further reduce the cost of heated filament, the heated filament of heated filament lower end adjusts the force mechanisms can tensioning heated filament and limit heated filament and swing, realize uniform coated.
The technical scheme that the utility model adopted is for achieving the above object: a kind of vertical layout is prepared many array thermal silk device of diamond film, comprise vacuum chamber wainscot and vacuum chamber lower wall panels, it is characterized in that: electric pole plate is fixedly connected with vacuum chamber wainscot; At least two row heated filaments vertically distribute, and every row heated filament upper end electric pole plate corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate corresponding with it is fixedly connected with; Lower electrode plate lower end is fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels.
Described electric pole plate is fixedly connected with vacuum chamber wainscot by fixed support.
Being distributed as of the heated filament of described every row:
In electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, the parallel equidistant 10-30 root heated filament of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is the half of distance between the heated filament on mid-way, that heater material is generally is dystectic, can and carbon form the metal of carbide, as tungsten, tantalum etc., its diameter is generally no more than 0.6mm.
Described heated filament adjusts force mechanisms to comprise protection bell jar, and described protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing.
Described heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing successively, then is connected with counterweight.
Described heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing successively, then is connected with the power of tune spring, adjusts the power spring the other end to be connected with vacuum chamber lower wall panels or protection bell jar diapire.
It is linear pattern slide plate that described heated filament is adjusted power slide plate, and roller bearing is fixedly installed in protection bell jar inside.
It is bending type slide plate that described heated filament is adjusted power slide plate, and roller bearing is fixedly installed on pillar stiffener, and pillar stiffener is fixed on vacuum chamber lower wall panels.
The beneficial effect of the utility model device is:
(1) this device heated filament adopts multiple row to distribute, improve the area of heated filament plated film radiation, can realize complete, the effective plated film to needing large-area coating film sample, simultaneously for general sample, efficient, the complete plated film of more sample be can once complete, plated film efficiency and quality improved;
(2) heated filament adopts vertically and distributes, and all can arrange that sample carries out plated film in heated filament both sides, can realize two-sided large-area coating film, and heated filament once can plated film area change, has relatively improved the service efficiency of heated filament, has reduced the cost of heated filament;
(3), in the device that heated filament vertically distributes, sample can be installed on the both sides of heated filament, completes after plated film, can in the situation that not destroying heated filament, take out sample, can repeatedly use heated filament, has further reduced heated filament cost;
(4) heated filament is installed on the lower electrode plate of heated filament lower end and is adjusted force mechanisms, make heated filament tensioning by its deadweight, additional counterweight or the power of tune spring, limit heated filament simultaneously and swing, protection heated filament, prevents that heated filament from destroying, and is beneficial to uniform coated simultaneously;
(5) heated filament adjusts the heated filament of force mechanisms to adjust power slide plate can be designed to bending shape, avoids adjusting force mechanisms inside to be subject to coating influence, ensures to adjust effective, the safe and reliable life-time service of force mechanisms, improves its work-ing life.
Brief description of the drawings
Fig. 1 is many array thermal silk device structural representation that a kind of vertical layout is prepared diamond film.
Fig. 2 is the A-A schematic cross-section that a kind of vertical layout is prepared many array thermal silk device of diamond film.
In figure: 11, vacuum chamber wainscot, 12, vacuum chamber lower wall panels, 2, electric pole plate, 3, lower electrode plate, 4, heated filament adjusts power slide plate, 5, protection bell jar, 6, counterweight, 7, heated filament, 8, fixed support, 9, pillar stiffener, 10, roller bearing
Embodiment
Below in conjunction with accompanying drawing, the utility model is described further, but the utility model is not limited to specific embodiment.
Embodiment 1
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared many array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Two row heated filaments 7 vertically distribute, and every row heated filament upper end electric pole plate 2 corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate 3 corresponding with it is fixedly connected with; Two lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support 8.
Being distributed as of every row heated filament 7: in electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 30 heated filaments of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is the half of distance between the heated filament on mid-way, heater material is tungsten (W), and heated filament diameter is 0.4mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing 10, and it is linear pattern slide plate that heated filament is adjusted power slide plate 4, and roller bearing 10 is fixedly installed in protection bell jar inside.
Embodiment 2
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared many array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Three row heated filaments 7 vertically distribute, and every row heated filament upper end electric pole plate 2 corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate 3 corresponding with it is fixedly connected with; Three lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support 8.
Being distributed as of every row heated filament 7: in electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 20 heated filaments of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is the half of distance between the heated filament on mid-way, heater material is tantalum (Ta), and heated filament diameter is 0.3mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing 10 successively, then is connected with counterweight 6.
It is bending type slide plate that heated filament is adjusted power slide plate 4, and roller bearing 10 is fixedly installed on pillar stiffener 9, and pillar stiffener is fixed on vacuum chamber lower wall panels.
Embodiment 3
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared many array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Four row heated filaments 7 vertically distribute, and every row heated filament upper end electric pole plate 2 corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate 3 corresponding with it is fixedly connected with; Four lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support 8.
Being distributed as of every row heated filament 7: in electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 10 heated filaments of arranging on position therebetween, and the distance between the heated filament in end positions is the half of distance between the heated filament on mid-way, heater material is tungsten (W), and heated filament diameter is 0.3mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing 10 successively, then is connected with the power of tune spring, adjusts the power spring the other end to be connected with vacuum chamber lower wall panels.
It is bending type slide plate that heated filament is adjusted power slide plate 4, and roller bearing 10 is fixedly installed on pillar stiffener 9, and pillar stiffener is fixed on vacuum chamber lower wall panels.
Claims (8)
1. a vertical layout is prepared many array thermal silk device of diamond film, comprise vacuum chamber wainscot (11) and vacuum chamber lower wall panels (12), it is characterized in that: electric pole plate (2) is fixedly connected with vacuum chamber wainscot (11); At least two row heated filaments (7) vertically distribute, and every row heated filament upper end electric pole plate (2) corresponding with it is fixedly connected with, and every row heated filament lower end lower electrode plate (3) corresponding with it is fixedly connected with; Lower electrode plate (3) lower end is fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels (11).
2. a kind of vertical layout according to claim 1 is prepared many array thermal silk device of diamond film, it is characterized in that: described electric pole plate (2) is fixedly connected with vacuum chamber wainscot (11) by fixed support (8).
3. a kind of vertical layout according to claim 1 is prepared many array thermal silk device of diamond film, it is characterized in that: being distributed as of heated filament (7) of described every row:
In electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, the parallel equidistant 10-30 root heated filament of arranging on electric pole plate and lower electrode plate mid-way, and distance between heated filament in end positions is the half of distance between the heated filament on mid-way.
4. a kind of vertical layout according to claim 1 is prepared many array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts force mechanisms to comprise protection bell jar (5), affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing (10).
5. a kind of vertical layout according to claim 4 is prepared many array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate, its lower end is passed after limiting through hole and roller bearing (10) successively, then is connected with counterweight (6).
6. a kind of vertical layout according to claim 4 is prepared many array thermal silk device of diamond film; it is characterized in that: described heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate; its lower end is successively through after limiting through hole and roller bearing (10); be connected with the power of tune spring again, adjust the power spring the other end to be connected with vacuum chamber lower wall panels (12) or protection bell jar (5) diapire.
7. prepare many array thermal silk device of diamond film according to claim 4,5 or 6 arbitrary described a kind of vertical layouts; it is characterized in that: described heated filament adjusts power slide plate (4) for linear pattern slide plate, and roller bearing (10) is fixedly installed in protection bell jar inside.
8. prepare many array thermal silk device of diamond film according to claim 4,5 or 6 arbitrary described a kind of vertical layouts, it is characterized in that: described heated filament adjusts power slide plate (4) for bending type slide plate, it is upper that roller bearing (10) is fixedly installed in pillar stiffener (9), and pillar stiffener is fixed on vacuum chamber lower wall panels.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420288856.9U CN203999806U (en) | 2014-05-30 | 2014-05-30 | A kind of vertical layout is prepared many array thermal silk device of diamond film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420288856.9U CN203999806U (en) | 2014-05-30 | 2014-05-30 | A kind of vertical layout is prepared many array thermal silk device of diamond film |
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| Publication Number | Publication Date |
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| CN203999806U true CN203999806U (en) | 2014-12-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420288856.9U Withdrawn - After Issue CN203999806U (en) | 2014-05-30 | 2014-05-30 | A kind of vertical layout is prepared many array thermal silk device of diamond film |
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| CN (1) | CN203999806U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981511A (en) * | 2014-05-30 | 2014-08-13 | 大连理工常州研究院有限公司 | Vertically-arranged multi-array heating wire device for preparing diamond film |
| CN107400875A (en) * | 2017-07-12 | 2017-11-28 | 华中科技大学 | A kind of hot-filament chemical vapor deposition equipment |
-
2014
- 2014-05-30 CN CN201420288856.9U patent/CN203999806U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981511A (en) * | 2014-05-30 | 2014-08-13 | 大连理工常州研究院有限公司 | Vertically-arranged multi-array heating wire device for preparing diamond film |
| CN103981511B (en) * | 2014-05-30 | 2016-06-29 | 大连理工常州研究院有限公司 | A kind of vertical arrangement prepares many array thermal silk device of diamond film |
| CN107400875A (en) * | 2017-07-12 | 2017-11-28 | 华中科技大学 | A kind of hot-filament chemical vapor deposition equipment |
| CN107400875B (en) * | 2017-07-12 | 2019-10-08 | 华中科技大学 | A kind of hot-filament chemical vapor deposition equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20141210 Effective date of abandoning: 20160629 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |