CN103981511B - A kind of vertical arrangement prepares many array thermal silk device of diamond film - Google Patents
A kind of vertical arrangement prepares many array thermal silk device of diamond film Download PDFInfo
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- CN103981511B CN103981511B CN201410241054.7A CN201410241054A CN103981511B CN 103981511 B CN103981511 B CN 103981511B CN 201410241054 A CN201410241054 A CN 201410241054A CN 103981511 B CN103981511 B CN 103981511B
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Abstract
A kind of vertical arrangement prepares many array thermal silk device of diamond film, belongs to coating technique field, and this device includes vacuum chamber wainscot and vacuum chamber lower wall panels, it is characterised in that: electric pole plate is fixing with vacuum chamber wainscot to be connected；At least two row heated filaments are vertically distributed, the fixing connection of electric pole plate that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate that each column heated filament lower end is corresponding；Lower electrode plate lower end is fixed on heated filament force adjustment mechanism, and heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels.This device adopts many arrays heated filament to be vertically distributed, can two-sided large-area coating film, reduce the cost of heated filament, the distribution mode of multiple row heated filament can realize the complete effectively plated film of large-area coating film sample, and the efficiency of raising plated film, vertically the hot wire structure of distribution ensure that the taking-up sample when not destroying heated filament, reduce further the cost of heated filament, the heated filament force adjustment mechanism of heated filament lower end can tensioning heated filament limit heated filament and swing, it is achieved uniform coated.
Description
Technical field
The invention belongs to coating technique field, particularly to a kind of hot-wire device preparing diamond film.
Background technology
Diamond has the power of excellence, heat, sound, the properties such as optical, electrical, chemical.The performance of artificial diamond film is substantially close to natural diamond, and excellent performance makes it be with a wide range of applications in high-tech area.At present, thin diamond membrane technology is at cutter, high-performance electronic element, and numerous occasions such as space material are applied, and receive fabulous effect, and it is applied in high-tech area and is paid attention in again by people.
At present, the preparation method of industrialization cvd diamond thin film mainly has two kinds, and one is hot filament CVD (HFCVD), and two is MPCVD method (MPCVD).Microwave method can prepare the diamond thin of high-quality and thickness reaches the diamond wafer of millimeter magnitude, but equipment cost is high, and depositional area is less, and deposition velocity is slow.Heat wire method is simple to operate, and sedimentation rate is fast, and cost is low, it is easy to controls the underlayer temperature of deposition, can obtain the diamond thin that quality is higher, area size is bigger.Adopting HFCVD method to prepare diamond thin is pass into vacuum response indoor after being mixed by reacting gas, and mixing gas is after high temperature heated filament cracks, and the active atoms of carbon in its gas will be deposited on matrix surface, thus growing diamond thin.
Hot-wire device in diamond coated equipment is the device for tool nose Mass production diamond film, traditional hot-wire device is generally horizontally disposed, namely heated filament is that horizontal cross is arranged, this structure carrys out heating film-coated only with the side of heated filament, and efficiency is very low.
At present, the hot-wire device of some company invention, for being arranged vertically, can utilize two sides of heated filament to generate diamond film, efficiency is improved significantly, but in these devices, heated filament is arranged vertically, adopt counterweight to hang in the lower end of heated filament simultaneously, owing to heated filament has elasticity, and counterweight is free suspension, causing that lower electrode plate rocks, rocking thus further resulting in heated filament, the instability of heated filament can make plated film uneven, and the diamond film affecting cutter generates quality.
It addition, current heated filament is generally adopted the distribution of single-row heated filament, complete effectively plated film cannot be realized for the sample that plated film area is bigger, and there is also the problem that plated film is inefficient.
Summary of the invention
It is an object of the invention to overcome above the deficiencies in the prior art, many array thermal silk device that a kind of vertical arrangement prepares diamond film is provided, this device adopts many arrays heated filament to be vertically distributed, can two-sided large-area coating film, reduce the cost of heated filament, the distribution mode of multiple row heated filament can realize the complete effectively plated film of large-area coating film sample simultaneously, and improve the efficiency of plated film, vertically the hot wire structure of distribution ensure that the taking-up sample when not destroying heated filament, reduce further the cost of heated filament, the heated filament force adjustment mechanism of heated filament lower end can tensioning heated filament limit heated filament and swing, realize uniform coated.
The present invention the technical scheme is that a kind of vertical arrangement for achieving the above object prepares many array thermal silk device of diamond film, including vacuum chamber wainscot and vacuum chamber lower wall panels, it is characterised in that: electric pole plate is fixing with vacuum chamber wainscot to be connected；At least two row heated filaments are vertically distributed, the fixing connection of electric pole plate that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate that each column heated filament lower end is corresponding；Lower electrode plate lower end is fixed on heated filament force adjustment mechanism, and heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels.
Described electric pole plate is connected by fixed support and vacuum chamber wainscot are fixing.
Being distributed as of the heated filament of described each column:
On electric pole plate with lower electrode plate end positions, it is perpendicular to electric pole plate and lower electrode plate, 4 heated filaments of parallel equidistant arrangement respectively, parallel equidistant arrangement 10-30 root heated filament on electric pole plate with lower electrode plate centre position, and the half of the spacing that the distance between the heated filament in end positions is heated filament on centre position, heater material is generally dystectic, energy and the metal of carbon formation carbide, and such as tungsten, tantalum etc., its diameter is usually no more than 0.6mm.
Described heated filament force adjustment mechanism includes protection bell jar, and described protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole；Heated filament force adjustment slide plate upper end is fixed on lower electrode plate, and its lower end sequentially passes through limiting through hole and roller bearing.
Described heated filament force adjustment slide plate upper end is fixed on lower electrode plate, after its lower end sequentially passes through limiting through hole and roller bearing, then is connected with counterweight.
Described heated filament force adjustment slide plate upper end is fixed on lower electrode plate, after its lower end sequentially passes through limiting through hole and roller bearing, then is connected with force adjustment spring, and the force adjustment spring other end is connected with vacuum chamber lower wall panels or protection bell jar diapire.
Described heated filament force adjustment slide plate is linear type slide plate, and roller bearing is fixedly installed in inside protection bell jar.
Described heated filament force adjustment slide plate is bending type slide plate, and roller bearing is fixedly installed on support column, and support column is fixed on vacuum chamber lower wall panels.
Apparatus of the present invention provide the benefit that:
(1) this device heated filament adopts many column distributions, improve the area of heated filament plated film radiation, it is possible to achieve to the plated film complete, effective needing large-area coating film sample, simultaneously for general sample, efficient, the complete plated film of more sample be can once complete, plated film efficiency and quality improved；
(2) heated filament adopts vertically distribution, all can arrange that in heated filament both sides sample carries out plated film, it is possible to achieve two-sided large-area coating film, and heated filament once can increase by plated film area, relatively improves the service efficiency of heated filament, reduces the cost of heated filament；
(3) in the device that heated filament is vertically distributed, sample can be installed on the both sides of heated filament, after completing plated film, it is possible to takes out sample when not destroying heated filament, it is possible to repeatedly use heated filament, reduce further heated filament cost；
(4) installation heated filament force adjustment mechanism on the lower electrode plate of heated filament lower end, makes heated filament tensioning by its deadweight, additional counterweight or force adjustment spring, swings with limit heated filament, protect heated filament, it is prevented that heated filament destroys, and is beneficial to uniform coated simultaneously；
(5) the heated filament force adjustment slide plate of heated filament force adjustment mechanism can be designed to bending shape, it is to avoid force adjustment is in-house by coating influence, it is ensured that force adjustment mechanism life-time service effective, safe and reliable, improves its service life.
Accompanying drawing explanation
Fig. 1 is many array thermal silk device structural representation that a kind of vertical arrangement prepares diamond film.
Fig. 2 is the Section A-A schematic diagram that a kind of vertical arrangement prepares many array thermal silk device of diamond film.
In figure: 11, vacuum chamber wainscot, 12, vacuum chamber lower wall panels, 2, electric pole plate, 3, lower electrode plate, 4, heated filament force adjustment slide plate, 5, protection bell jar, 6, counterweight, 7, heated filament, 8, fixed support, 9, support column, 10, roller bearing
Detailed description of the invention
Below in conjunction with accompanying drawing, the present invention will be further described, but the invention is not limited in specific embodiment.
Embodiment 1
A kind of vertical arrangement as illustrated in fig. 1 and 2 prepares many array thermal silk device of diamond film, and including vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, electric pole plate 2 is fixing with vacuum chamber wainscot 11 to be connected；Two row heated filaments 7 are vertically distributed, the fixing connection of electric pole plate 2 that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate 3 that each column heated filament lower end is corresponding；Two lower electrode plate 3 lower ends are fixed on heated filament force adjustment mechanism, and heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is connected by fixed support 8 is fixing with vacuum chamber wainscot 11.
Being distributed as of each column heated filament 7: on electric pole plate with lower electrode plate end positions, it is perpendicular to electric pole plate and lower electrode plate, 4 heated filaments of parallel equidistant arrangement respectively, 30 heated filaments of parallel equidistant arrangement on electric pole plate with lower electrode plate centre position, and the half of the spacing that the distance between the heated filament in end positions is heated filament on centre position, heater material is tungsten (W), and heated filament diameter is 0.4mm.
Heated filament force adjustment mechanism includes protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole；Heated filament force adjustment slide plate 4 upper end is fixed on lower electrode plate, and its lower end sequentially passes through limiting through hole and roller bearing 10, and heated filament force adjustment slide plate 4 is linear type slide plate, and roller bearing 10 is fixedly installed in inside protection bell jar.
Embodiment 2
A kind of vertical arrangement as illustrated in fig. 1 and 2 prepares many array thermal silk device of diamond film, and including vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, electric pole plate 2 is fixing with vacuum chamber wainscot 11 to be connected；Three row heated filaments 7 are vertically distributed, the fixing connection of electric pole plate 2 that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate 3 that each column heated filament lower end is corresponding；Three lower electrode plate 3 lower ends are fixed on heated filament force adjustment mechanism, and heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is connected by fixed support 8 is fixing with vacuum chamber wainscot 11.
Being distributed as of each column heated filament 7: on electric pole plate with lower electrode plate end positions, it is perpendicular to electric pole plate and lower electrode plate, 4 heated filaments of parallel equidistant arrangement respectively, 20 heated filaments of parallel equidistant arrangement on electric pole plate with lower electrode plate centre position, and the half of the spacing that the distance between the heated filament in end positions is heated filament on centre position, heater material is tantalum (Ta), and heated filament diameter is 0.3mm.
Heated filament force adjustment mechanism includes protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole；Heated filament force adjustment slide plate 4 upper end is fixed on lower electrode plate, after its lower end sequentially passes through limiting through hole and roller bearing 10, then is connected with counterweight 6.
Heated filament force adjustment slide plate 4 is bending type slide plate, and roller bearing 10 is fixedly installed on support column 9, and support column is fixed on vacuum chamber lower wall panels.
Embodiment 3
A kind of vertical arrangement as illustrated in fig. 1 and 2 prepares many array thermal silk device of diamond film, and including vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, electric pole plate 2 is fixing with vacuum chamber wainscot 11 to be connected；Four row heated filaments 7 are vertically distributed, the fixing connection of electric pole plate 2 that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate 3 that each column heated filament lower end is corresponding；Four lower electrode plate 3 lower ends are fixed on heated filament force adjustment mechanism, and heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels 11.
Electric pole plate 2 is connected by fixed support 8 is fixing with vacuum chamber wainscot 11.
Being distributed as of each column heated filament 7: on electric pole plate with lower electrode plate end positions, it is perpendicular to electric pole plate and lower electrode plate, 4 heated filaments of parallel equidistant arrangement respectively, 10 heated filaments of parallel equidistant arrangement on position therebetween, and the half of the spacing that the distance between the heated filament in end positions is heated filament on centre position, heater material is tungsten (W), and heated filament diameter is 0.3mm.
Heated filament force adjustment mechanism includes protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole；Heated filament force adjustment slide plate 4 upper end is fixed on lower electrode plate, after its lower end sequentially passes through limiting through hole and roller bearing 10, then is connected with force adjustment spring, and the force adjustment spring other end is connected with vacuum chamber lower wall panels.
Heated filament force adjustment slide plate 4 is bending type slide plate, and roller bearing 10 is fixedly installed on support column 9, and support column is fixed on vacuum chamber lower wall panels.
Claims (7)
1. a vertical arrangement prepares many array thermal silk device of diamond film, including vacuum chamber wainscot (11) and vacuum chamber lower wall panels (12), it is characterised in that: electric pole plate (2) is fixing with vacuum chamber wainscot (11) to be connected；At least two row heated filaments (7) are vertically distributed, the fixing connection of electric pole plate (2) that each column heated filament upper end is corresponding, the fixing connection of lower electrode plate (3) that each column heated filament lower end is corresponding；Lower electrode plate (3) lower end is fixed on heated filament force adjustment mechanism; heated filament force adjustment mechanism is fixed on vacuum chamber lower wall panels (11); described heated filament force adjustment mechanism includes protection bell jar (5); affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole；Heated filament force adjustment slide plate (4) upper end is fixed on lower electrode plate, and its lower end sequentially passes through limiting through hole and roller bearing (10).
2. a kind of vertical arrangement according to claim 1 prepares many array thermal silk device of diamond film, it is characterised in that: described electric pole plate (2) is connected by fixed support (8) and vacuum chamber wainscot (11) are fixing.
3. a kind of vertical arrangement according to claim 1 prepares many array thermal silk device of diamond film, it is characterised in that: being distributed as of heated filament (7) of described each column:
On electric pole plate with lower electrode plate end positions, it is perpendicular to electric pole plate and lower electrode plate, 4 heated filaments of parallel equidistant arrangement respectively, parallel equidistant arrangement 10-30 root heated filament on electric pole plate and lower electrode plate centre position, and the half of the spacing that the distance between the heated filament in end positions is heated filament on centre position.
4. a kind of vertical arrangement according to claim 1 prepares many array thermal silk device of diamond film, it is characterized in that: described heated filament force adjustment slide plate (4) upper end is fixed on lower electrode plate, after its lower end sequentially passes through limiting through hole and roller bearing (10), then it is connected with counterweight (6).
5. a kind of vertical arrangement according to claim 1 prepares many array thermal silk device of diamond film; it is characterized in that: described heated filament force adjustment slide plate (4) upper end is fixed on lower electrode plate; after its lower end sequentially passes through limiting through hole and roller bearing (10); being connected with force adjustment spring, the force adjustment spring other end is connected with vacuum chamber lower wall panels (12) or protection bell jar (5) diapire again.
6. many array thermal silk device of diamond film is prepared according to the arbitrary described a kind of vertical arrangement of claim 1,4 or 5; it is characterized in that: described heated filament force adjustment slide plate (4) is linear type slide plate, roller bearing (10) is fixedly installed in inside protection bell jar.
7. many array thermal silk device of diamond film is prepared according to the arbitrary described a kind of vertical arrangement of claim 1,4 or 5, it is characterized in that: described heated filament force adjustment slide plate (4) is bending type slide plate, roller bearing (10) is fixedly installed on support column (9), and support column is fixed on vacuum chamber lower wall panels.
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| CN201410241054.7A CN103981511B (en) | 2014-05-30 | 2014-05-30 | A kind of vertical arrangement prepares many array thermal silk device of diamond film |
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| CN201410241054.7A CN103981511B (en) | 2014-05-30 | 2014-05-30 | A kind of vertical arrangement prepares many array thermal silk device of diamond film |
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| CN103981511B true CN103981511B (en) | 2016-06-29 |
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| CN108531882A (en) * | 2017-03-03 | 2018-09-14 | 深圳先进技术研究院 | Filament assembly and deposition of diamond thin films equipment |
| CN109722646A (en) * | 2017-10-27 | 2019-05-07 | 深圳先进技术研究院 | Prepare the heated filament frame and device of diamond coatings |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5273731A (en) * | 1989-09-14 | 1993-12-28 | General Electric Company | Substantially transparent free standing diamond films |
| CN102383113A (en) * | 2011-10-25 | 2012-03-21 | 武汉工程大学 | Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness |
| CN203999806U (en) * | 2014-05-30 | 2014-12-10 | 大连理工常州研究院有限公司 | A kind of vertical layout is prepared many array thermal silk device of diamond film |
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- 2014-05-30 CN CN201410241054.7A patent/CN103981511B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5273731A (en) * | 1989-09-14 | 1993-12-28 | General Electric Company | Substantially transparent free standing diamond films |
| CN102383113A (en) * | 2011-10-25 | 2012-03-21 | 武汉工程大学 | Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness |
| CN203999806U (en) * | 2014-05-30 | 2014-12-10 | 大连理工常州研究院有限公司 | A kind of vertical layout is prepared many array thermal silk device of diamond film |
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Effective date of registration: 20171106 Address after: 225600 Yangzhou City, Gaoyou Province, South City Economic Zone, the outer ring road Patentee after: Gaoyou Institute of Dalian University of Technology Co., Ltd. Address before: 213164 Changzhou science and Education City, No. 801 middle Wu Road, Wujin District, Jiangsu, Changzhou Patentee before: Changzhou Institute Co., Ltd. of Daian University of Technology |
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