CN203741050U - 一种去除多晶硅中磷和硼的装置 - Google Patents
一种去除多晶硅中磷和硼的装置 Download PDFInfo
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- CN203741050U CN203741050U CN201420016083.9U CN201420016083U CN203741050U CN 203741050 U CN203741050 U CN 203741050U CN 201420016083 U CN201420016083 U CN 201420016083U CN 203741050 U CN203741050 U CN 203741050U
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- Prior art keywords
- pipe
- ring pipe
- boron
- vacuum chamber
- annular
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 229910052796 boron Inorganic materials 0.000 title claims abstract description 15
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 13
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 11
- 239000011574 phosphorus Substances 0.000 title claims abstract description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000010439 graphite Substances 0.000 claims abstract description 16
- 241000209456 Plumbago Species 0.000 claims description 12
- 229920005591 polysilicon Polymers 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 230000003447 ipsilateral effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 12
- 238000009423 ventilation Methods 0.000 abstract description 5
- 229910002804 graphite Inorganic materials 0.000 abstract description 4
- 239000002893 slag Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 238000005272 metallurgy Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000003723 Smelting Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000009854 hydrometallurgy Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- CSJDCSCTVDEHRN-UHFFFAOYSA-N methane;molecular oxygen Chemical compound C.O=O CSJDCSCTVDEHRN-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201420016083.9U CN203741050U (zh) | 2014-01-10 | 2014-01-10 | 一种去除多晶硅中磷和硼的装置 |
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CN201420016083.9U CN203741050U (zh) | 2014-01-10 | 2014-01-10 | 一种去除多晶硅中磷和硼的装置 |
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Publication Number | Publication Date |
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CN203741050U true CN203741050U (zh) | 2014-07-30 |
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CN201420016083.9U Expired - Lifetime CN203741050U (zh) | 2014-01-10 | 2014-01-10 | 一种去除多晶硅中磷和硼的装置 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106994276A (zh) * | 2017-05-25 | 2017-08-01 | 京华建设科技有限公司 | 一种自动清洁的超净台 |
CN109133068A (zh) * | 2018-11-19 | 2019-01-04 | 成都斯力康科技股份有限公司 | 冶金法除杂制备太阳能级硅锭的装置及方法 |
CN109354024A (zh) * | 2018-11-19 | 2019-02-19 | 成都斯力康科技股份有限公司 | 一种新型工业硅分离除杂的装置及方法 |
-
2014
- 2014-01-10 CN CN201420016083.9U patent/CN203741050U/zh not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106994276A (zh) * | 2017-05-25 | 2017-08-01 | 京华建设科技有限公司 | 一种自动清洁的超净台 |
CN109133068A (zh) * | 2018-11-19 | 2019-01-04 | 成都斯力康科技股份有限公司 | 冶金法除杂制备太阳能级硅锭的装置及方法 |
CN109354024A (zh) * | 2018-11-19 | 2019-02-19 | 成都斯力康科技股份有限公司 | 一种新型工业硅分离除杂的装置及方法 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 164399, Heihe, Heilongjiang Province five Xiushan Russian electric processing zone Patentee after: HEIHE HESHENG PHOTOVOLTAIC TECHNOLOGY CO.,LTD. Patentee after: HOSHINE SILICON INDUSTRY CO.,LTD. Address before: 164399, Heihe, Heilongjiang Province five Xiushan Russian electric processing zone Patentee before: HEIHE HESHENG PHOTOVOLTAIC TECHNOLOGY CO.,LTD. Patentee before: ZHEJIANG HESHENG SILICON INDUSTRY Co.,Ltd. |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20151019 Address after: Jiaxing City, Zhejiang province 314201 Zhapu Zhen Ya Mountain Road No. 530 Patentee after: HOSHINE SILICON INDUSTRY CO.,LTD. Address before: 164399, Heihe, Heilongjiang Province five Xiushan Russian electric processing zone Patentee before: HEIHE HESHENG PHOTOVOLTAIC TECHNOLOGY CO.,LTD. Patentee before: HOSHINE SILICON INDUSTRY CO.,LTD. |
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CX01 | Expiry of patent term |
Granted publication date: 20140730 |
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CX01 | Expiry of patent term |