CN203049026U - Low-temperature low-damage multifunctional composite film coating device - Google Patents
Low-temperature low-damage multifunctional composite film coating device Download PDFInfo
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- CN203049026U CN203049026U CN 201320039940 CN201320039940U CN203049026U CN 203049026 U CN203049026 U CN 203049026U CN 201320039940 CN201320039940 CN 201320039940 CN 201320039940 U CN201320039940 U CN 201320039940U CN 203049026 U CN203049026 U CN 203049026U
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Abstract
The utility model belongs to the preparation field of a film, and particularly relates to a low-temperature low-damage multifunctional composite film coating device. The device consists of a vacuum cavity comprising two groups of four rectangular unbalanced magnetic control targets, an ion source and a workpiece rotating stand. The two groups of unbalanced targets are arranged side by side, and two targets in each group are opposite to each other and can work independently or simultaneously; and the distance between every two adjacent targets is adjustable, the angle between every two adjacent targets is adjustable, the targets are driven by a direct-current power, and plasmas are generated between two targets in each group. The working rotating stand is arranged in a middle position between the two groups of targets, and the ion source is arranged on the side surfaces of one group of targets and plays a role in washing and assisting the deposition of ions. By adopting the low-temperature low-damage multifunctional composite film coating device, the damage and heating of organic materials such as polymers caused by secondary electrons and oxygen anions can be prevented, and a film can be rapidly and uniformly deposited on the surface of the organic material such as the polymer in a low-temperature low-damage way through the low-temperature linear ion source auxiliary deposition.
Description
Technical field
The utility model belongs to the film preparation field, the device of the multi-functional composite film coating of the low damage of a kind of low temperature specifically.
Background technology
Transparent organic electro-optic device is owing to have advantages such as response speed faster, less energy expenditure, higher brightness and workability, in novel flat-plate demonstration, solid state lighting, flexiblely show, high density information transmission and fields such as storage, new forms of energy and photochemistry utilization have manifested wide application prospect.In these transparent organic electro-optic devices, usually need be on organic material layer sputtering sedimentation transparent conductive oxide film material as negative electrode, but traditional magnetron sputtering technique is because target is parallel with the organic materials substrate, plasma body is between target and the substrate, lotus with certain energy can directly be bombarded the organic materials substrate as reflection atom (ar atmo, Sauerstoffatom), sputtered atom, secondary electron and negative oxygen ion etc. by particle, causes damaging and causing the rising of temperature; In addition, the thermal radiation of plasma body and uv-radiation also can cause to a certain degree damage and temperature rise.In this deposition process, the damage of the organic materials that causes and temperature rise meeting be performance and the life-span of the transparent organic electro-optic device of influence directly.Simultaneously, traditional rigid indicating meter can't satisfy people to the demand of display function, and that flexible display has is light, thin, shock-resistant, can be around song and be not subjected to characteristics such as occasion and space constraint, but the flexible materials thermal conductivity is low, surface temperature rises easily, has limited the large-scale application of flexible device.Therefore, need a kind of novel on organic material layers such as polymkeric substance the device of the low damage of low temperature high speed production negative electrode.
The utility model content
The purpose of this utility model is to provide a kind of can hang down the device that damages the high speed deposition multifunctional composite film by low temperature on organic materialss such as polymkeric substance.
To achieve these goals, the technical solution of the utility model is:
The device of the multi-functional composite film coating of the low damage of a kind of low temperature, this device is made up of the vacuum cavity that comprises two groups four rectangle nonequilibrium state magnetic control targets, a linear ion source and a biased workpiece pivoted frame for vacuum unit; Wherein: two groups of nonequilibrium state magnetic control targets are placed side by side, and two targets are face-to-face placement in every group, work alone or work simultaneously; The mid-way of workpiece pivoted frame between two groups of nonequilibrium state magnetic control targets, linear ion source are positioned at one group of nonequilibrium state magnetic control target side.
The device of the multi-functional composite film coating of the low damage of described low temperature, in every group of nonequilibrium state magnetic control target, distance is adjustable at 10-15cm between target and the target.
The device of the multi-functional composite film coating of the low damage of described low temperature, in every group of nonequilibrium state magnetic control target, the angle of target and target is adjustable at the 0-15 degree.
The device of the multi-functional composite film coating of the low damage of described low temperature, target uses direct supply to drive, and produces plasma body between target and the target.
The device of the multi-functional composite film coating of the low damage of described low temperature, two non-equilibrium target A, B are one group in the whole vacuum unit, and two non-equilibrium target C, D are one group in addition, and two groups of nonequilibrium state magnetic control targets use respectively separately, perhaps use simultaneously.
The device of the multi-functional composite film coating of the low damage of described low temperature, the linear ion source is positioned at one group of nonequilibrium state magnetic control target side, uses flange to be connected with vacuum cavity; Another group nonequilibrium state magnetic control target side uses the blind plate of identical flange port to be connected with vacuum cavity, and perhaps blind plate is replaced by the linear ion source, uses simultaneously with existing linear ion source.
The device of the multi-functional composite film coating of the low damage of described low temperature, the linear ion source is low temperature linear ion source.
Know-why of the present utility model:
The utility model is parallel minute surface respectively with two identical targets to be placed, and the magnetic pole at the target back side is opposite, and wherein the outer cover of target and sputter is respectively as negative electrode and anode.Produce plasma body between target and the target, sputtered atom by with plasma body in other lotus can particle collision, move on the work rest of target side and be deposited as film.Target is negative potential, under electric field action, and secondary electron and the negative oxygen ion larmor's precession of shape of spinning that between target, moves back and forth, thus avoided direct bombardment to workpiece; Thermal radiation and the optical radiation of plasma body have been reduced away from workpiece in the plasma body zone, can be implemented in the low temperature depositing on the organic materialss such as polymkeric substance.Simultaneously, in order to improve the bonding force of film, before sputtering sedimentation, use low temperature linear ion source to clean the bombardment sample; During sputter, for improving sedimentation rate, can use low temperature linear ion source to improve ionization level.
Advantage of the present utility model and positively effect are:
1, the utility model proposes the device of the multi-functional composite film coating of the low damage of a kind of low temperature, secondary electron and negative oxygen ion etc. be can shield and organic materials damage and temperature rises such as polymkeric substance caused, and by low temperature linear ion source assistant depositing, be implemented in the low damage of low temperature high speed uniform deposition film on the organic materials surface such as polymkeric substance.
2, the device that the utility model proposes not only can be realized the deposition of single kind metallic film on organic materialss such as polymkeric substance, can also realize depositing multi-element compounds film and multilayer complex films.
3, the speed of the utility model by regulating sputter gas flow, reactive gas species, sputtering time, coiling pivoted frame etc. is implemented in metal or the compound film of organic materials surface deposition different thickness such as polymkeric substance.
Description of drawings
Fig. 1 is the whole vacuum system attach list of the utility model device group low temperature linear ion source synoptic diagram.
Among the figure, 1 first group of target is respectively: first group of target A face 1A and first group of target B face 1B; Second group of target is respectively: second group of target C face 1C and second group of target D face 1D; 2 workpiece pivoted frames; 3 magnet systems lay respectively at the back side of every group of target, and wherein the 3A of magnet system A portion and the magnet system B 3B of portion be corresponding to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; 4 target water-cooled tubes, be respectively: the water-cooled tube 4A that is used for first group of target A face 1A of cooling, the water-cooled tube 4B that is used for first group of target B face 1B of cooling for the water-cooled tube 4C of second group of target C face 1C of cooling, is used for the water-cooled tube 4D of second group of target D face 1D of cooling; 5 vacuum cavities; 6 low temperature linear ion sources; 7 blind plates.
Fig. 2 transfers to the whole vacuum system attach list group low temperature linear ion source synoptic diagram of 15 degree for target angle in the utility model device.
Among the figure, 1 first group of target is respectively: first group of target A face 1A and first group of target B face 1B; Second group of target is respectively: second group of target C face 1C and second group of target D face 1D; 2 workpiece pivoted frames; 3 magnet systems lay respectively at the back side of every group of target, and wherein the 3A of magnet system A portion and the magnet system B 3B of portion be corresponding to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; 4 target water-cooled tubes, be respectively: the water-cooled tube 4A that is used for first group of target A face 1A of cooling, the water-cooled tube 4B that is used for first group of target B face 1B of cooling for the water-cooled tube 4C of second group of target C face 1C of cooling, is used for the water-cooled tube 4D of second group of target D face 1D of cooling; 5 vacuum cavities; 6 low temperature linear ion sources; 7 blind plates.
Fig. 3 is the additional two groups of low temperature linear ion source synoptic diagram of the whole vacuum system of the utility model device.
Among the figure, 1 first group of target is respectively: first group of target A face 1A and first group of target B face 1B; Second group of target is respectively: second group of target C face 1C and second group of target D face 1D; 2 workpiece pivoted frames; 3 magnet systems lay respectively at the back side of every group of target, and wherein the 3A of magnet system A portion and the magnet system B 3B of portion be corresponding to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; 4 target water-cooled tubes, the water-cooled tube 4A that is used for first group of target A face 1A of cooling, be used for the water-cooled tube 4B of first group of target B face 1B of cooling, be respectively: be used for the water-cooled tube 4C of second group of target C face 1C of cooling, be used for the water-cooled tube 4D of second group of target D face 1D of cooling; 5 vacuum cavities; 6 low temperature linear ion sources are respectively: first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B.
Fig. 4 transfers to additional two groups of low temperature linear ion source synoptic diagram of whole vacuum system of 15 degree for target angle in the utility model device.
Among the figure, 1 first group of target is respectively: first group of target A face 1A and first group of target B face 1B; Second group of target is respectively: second group of target C face 1C and second group of target D face 1D; 2 workpiece pivoted frames; 3 magnet systems lay respectively at the back side of every group of target, and wherein the 3A of magnet system A portion and the magnet system B 3B of portion be corresponding to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; 4 target water-cooled tubes, be respectively: the water-cooled tube 4A that is used for first group of target A face 1A of cooling, the water-cooled tube 4B that is used for first group of target B face 1B of cooling for the water-cooled tube 4C of second group of target C face 1C of cooling, is used for the water-cooled tube 4D of second group of target D face 1D of cooling; 5 vacuum cavities; 6 low temperature linear ion sources are respectively: first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B.
Embodiment
As Fig. 1-shown in Figure 4, the utility model provides the device of the multi-functional composite film coating of the low damage of a kind of low temperature, this device is made up of the vacuum cavity that comprises two groups four rectangle nonequilibrium state magnetic control targets, a low temperature linear ion source and a biased workpiece pivoted frame for vacuum unit; Wherein: two groups of nonequilibrium state magnetic control targets are placed side by side, and two targets are face-to-face placement in every group, work alone or work simultaneously; In every group of nonequilibrium state magnetic control target, distance is adjustable at 10-15cm between target and the target, and the angle of target and target is adjustable at the 0-15 degree, and target uses direct supply to drive, and produces plasma body between target and the target; The mid-way of workpiece pivoted frame between two groups of nonequilibrium state magnetic control targets, low temperature linear ion source are positioned at one group of nonequilibrium state magnetic control target side, play ion and clean and assistant depositing.
The device of the multi-functional composite film coating of the low damage of described low temperature, two non-equilibrium target A, B are one group in the whole vacuum system, and two non-equilibrium target C, D are one group in addition, and two groups of nonequilibrium state magnetic control targets use respectively separately, perhaps use simultaneously.
The device of the multi-functional composite film coating of the low damage of described low temperature, low temperature linear ion source is positioned at one group of nonequilibrium state magnetic control target side, uses flange to be connected with vacuum cavity; Another group nonequilibrium state magnetic control target side uses the blind plate of identical flange port to be connected with vacuum cavity, and perhaps blind plate is replaced by low temperature linear ion source, uses simultaneously with existing low temperature linear ion source.
The device of the multi-functional composite film coating of the low damage of described low temperature adopts the direct supply deposit film.
The device of the multi-functional composite film coating of the low damage of described low temperature, the target of use adopts pure metal targets: zinc target, aluminium target, copper target, titanium target or silver-colored target; It or is alloy target material: aluminium zinc; It or is the conductor oxidate target: indium tin oxide (ITO).
The device of the multi-functional composite film coating of the low damage of described low temperature, two non-equilibrium target A, B are one group in the whole vacuum system, two non-equilibrium target C, D are one group in addition, the material of two groups of target A, B and C, D is identical or different, identical target is applicable to preparation homogeneity film, and different targets is applicable to the preparation complex thin film.
The device of the multi-functional composite film coating of the low damage of described low temperature is realized workpiece temperature at 200 ° of plated films below the C, and the material of workpiece is the polymeric film organic materials.
The device of the multi-functional composite film coating of the low damage of described low temperature can realize plating unitary film or multilayer film, and film thickness is scope between the 100-500nm.
The device of the multi-functional composite film coating of the low damage of described low temperature, the speed of rotation of this workpiece pivoted frame 8-20 rev/min adjustable, have also that forward changes or reverse rotating function.
The device of the multi-functional composite film coating of the low damage of described low temperature, this workpiece pivoted frame connects pulsed bias, pulsed voltage 50-1500V, pulse-repetition is 5-30KHz, dutycycle is 5-80%.
The method of the multi-functional composite film coating of the low damage of the low temperature of described device, use low temperature linear ion source to clean the bombardment workpiece earlier, use the direct supply sputtering target material on workpiece, to use low temperature linear ion source assistant depositing in the deposit film then, wherein sputter gas is rare gas element, and reactant gases is oxygen or nitrogen.
The utility model low temperature linear ion source refers under normal temperature and vacuum conditions, charge into stabilizing gas by gas-filled valve, this gas carries out ionization under ionogenic effect, improve the current density in the coating chamber, form plasma body, strengthen ionization, have the cleaning workpiece effect under the high-voltage situation, have the assistant depositing effect under the low voltage.Its technical parameter scope is: operating air pressure is 1.1 * 10
-1Between the Pa-5Pa, ion source power 10kW.The ion source power supply adopts the medium frequency inverter dc constant current power supply, and dutycycle is that 20%-90% is adjustable, and voltage of supply is divided into high and low shift control position: 1000V and 300V.In the utility model, low temperature linear ion source can not produce temperature rise to vacuum chamber, can not produce temperature effect to workpiece yet, thereby makes whole depositing temperature be no more than 90 ° of C.
Embodiment 1
As shown in Figure 1, the whole vacuum system of the utility model device mainly comprises and being arranged in the vacuum cavity 5: first group of target (first group of target A face 1A and first group of target B face 1B), workpiece pivoted frame 2, magnet system (3A of magnet system A portion, the 3B of magnet system B portion), low temperature linear ion source 6, and second group of target (second group of target C face 1C and second group of target D face 1D), magnet system (3C of magnet system C portion, the 3D of magnet system D portion) etc.Concrete structure is as follows:
First group of target A face 1A and first group of target B face 1B are oppositely arranged, apart from 12cm, the angle of target and target is 0 degree, described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, low temperature linear ion source 6 is positioned at first group of target side, play ion and clean and assistant depositing, low temperature linear ion source 6 uses flange to be connected with vacuum cavity.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3A of magnet system A portion and the magnet system B 3B of portion correspond respectively to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
First group of target A face 1A is connected with for the water-cooled tube 4A that cools off first group of target A face 1A, and first group of target B face 1B is connected with for the water-cooled tube 4B that cools off first group of target B face 1B.
Second group of target C face 1C and second group of target D face 1D are oppositely arranged, apart from 12cm, the angle of target and target is 0 degree, described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, vacuum cavity 5 sidewalls of second group of target side arrange blind plate 7, use to be connected with vacuum cavity with the blind plate of the identical flange port of vacuum cavity;
Magnet system lays respectively at the back side of every group of target, and wherein: the 3C of magnet system C portion and the magnet system D 3D of portion correspond respectively to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
Second group of target C face 1C is connected with for the water-cooled tube 4C that cools off second group of target C face 1C, and second group of target D face 1D is connected with for the water-cooled tube 4D that cools off second group of target D face 1D.
In the present embodiment, first group of target (first group of target A face 1A and first group of target B face 1B) works alone.Adopt the aluminium target at polyethylene terephthalate (PET) film surface deposition of aluminum film, sputter gas (argon gas) enters into vacuum cavity 5 and produces plasma body at (between 1A and the 1B) between first group of target, and PET is fixed on the workpiece pivoted frame 2.At first will be fixed on PET sample on the workpiece pivoted frame 2 and aim at the low temperature linear ion source 6 of first group of target A face 1A and first group of target B face 1B side, and feed argon gas in low temperature linear ion source 6, vacuum tightness is 2.0 * 10
-1Pa opens low temperature linear ion source 6, and electric current is 0.50A, and voltage is 500V, bombards 10 minutes with the cleaning cleaning polyalcohol surface.Turn off low temperature linear ion source 6 then, with sample Rotate 180 degree to back to low temperature linear ion source 6.Feed argon gas, vacuum tightness is 3.0 * 10
-1Pa opens direct supply, and electric current is 1.00A, and voltage is 290V, and pre-sputter 10 minutes then with sample Rotate 180 degree, applies the 100V negative bias and is pressed on Rotary Specimen Rack, and 15 minutes plated film time, the thickness of deposit film is 300 nanometers.Whole depositing temperature is no more than 90 ° of C.
Embodiment 2
As shown in Figure 1, the whole vacuum system of the utility model device mainly comprises and being arranged in the vacuum cavity 5: first group of target (first group of target A face 1A and first group of target B face 1B), workpiece pivoted frame 2, magnet system (3A of magnet system A portion, the 3B of magnet system B portion), low temperature linear ion source 6, and second group of target (second group of target C face 1C and second group of target D face 1D), magnet system (3C of magnet system C portion, the 3D of magnet system D portion) etc.Concrete structure is as follows:
First group of target A face 1A and first group of target B face 1B are oppositely arranged, apart from 12cm, the angle of target and target is 0 degree, described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, low temperature linear ion source 6 is positioned at one group of target side, play ion and clean and assistant depositing, low temperature linear ion source 6 uses flange to be connected with vacuum cavity.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3A of magnet system A portion and the magnet system B 3B of portion correspond respectively to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
First group of target A face 1A is connected with for the water-cooled tube 4A that cools off first group of target A face 1A, and first group of target B face 1B is connected with for the water-cooled tube 4B that cools off first group of target B face 1B.
Second group of target C face 1C and second group of target D face 1D are oppositely arranged, and apart from 12cm, the angle of target and target is 0 degree, and vacuum cavity 5 sidewalls of second group of target side arrange blind plate 7, use to be connected with vacuum cavity with the blind plate of the identical flange port of vacuum cavity.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3C of magnet system C portion and the magnet system D 3D of portion correspond respectively to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
Second group of target C face 1C is connected with for the water-cooled tube 4C that cools off second group of target C face 1C, and second group of target D face 1D is connected with for the water-cooled tube 4D that cools off second group of target D face 1D.
In the present embodiment, first group of target (first group of target A face 1A and first group of target B face 1B) works alone.Adopt the aluminium target at polyethylene terephthalate (PET) surface deposition aluminium film, sputter gas (argon gas) enters into vacuum cavity 5 and produces plasma body at (between 1A and the 1B) between first group of target, and PET is fixed on the workpiece pivoted frame 2.At first will be fixed on PET sample on the workpiece pivoted frame 2 and aim at the low temperature linear ion source 6 of first group of target A face 1A and first group of target B face 1B side, and feed argon gas in low temperature linear ion source 6, vacuum tightness is 2.0 * 10
-1Pa opens low temperature linear ion source 6, and electric current is 0.50A, and voltage is 500V, bombards 10 minutes with the cleaning cleaning polyalcohol surface.Then with sample Rotate 180 degree to back to low temperature linear ion source 6.Feed argon gas, vacuum tightness is 3.0 * 10
-1Pa, regulate low temperature linear ion source 6, electric current is 0.25A, and voltage is 280V, open direct supply, electric current is 1.00A, and voltage is 290V, pre-sputter 10 minutes, then with sample Rotate 180 degree, apply the 100V negative bias and be pressed on Rotary Specimen Rack, 15 minutes plated film time, the thickness of deposit film is 400 nanometers.Whole depositing temperature is no more than 90 ° of C.
Embodiment 3
As shown in Figure 2, the whole vacuum system of the utility model device mainly comprises and being arranged in the vacuum cavity 5: first group of target (first group of target A face 1A and first group of target B face 1B), second group of target (second group of target C face 1C and second group of target D face 1D), workpiece pivoted frame 2, magnet system (3A of magnet system A portion, the 3B of magnet system B portion), magnet system (3C of magnet system C portion, the 3D of magnet system D portion), low temperature linear ion source 6 etc.Concrete structure is as follows:
First group of target A face 1A and first group of target B face 1B are oppositely arranged, and apart from 12cm, the angle of target and target is 15 degree, and second group of target C face 1C and second group of target D face 1D are oppositely arranged, and apart from 12cm, the angle of target and target is 15 degree.Described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, and low temperature linear ion source 6 is positioned at first group of target side, uses flange to be connected with vacuum cavity 5, plays ion and cleans and assistant depositing.In addition, vacuum cavity 5 sidewalls of second group of target side arrange blind plate 7, use to be connected with vacuum cavity with the blind plate of the identical flange port of vacuum cavity.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3A of magnet system A portion and the magnet system B 3B of portion correspond respectively to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
First group of target A face 1A is connected with for the water-cooled tube 4A that cools off first group of target A face 1A, and first group of target B face 1B is connected with for the water-cooled tube 4B that cools off first group of target B face 1B.Second group of target C face 1C is connected with for the water-cooled tube 4C that cools off second group of target C face 1C, and second group of target D face 1D is connected with for the water-cooled tube 4D that cools off second group of target D face 1D.
In the present embodiment, first group of target (first group of target A face 1A and first group of target B face 1B) and second group of target (second group of target C face 1C and second group of target D face 1D) are worked simultaneously.Adopt the aluminium target at polyethylene terephthalate (PET) surface deposition film, sputter gas (argon gas) enters into vacuum cavity 5, (between 1C and the 1D) produces plasma body between (between 1A and the 1B) between first group of target and second group of target, and PET is fixed on the workpiece pivoted frame 2.At first will be fixed on PET sample on the workpiece pivoted frame 2 and aim at the low temperature linear ion source 6 of first group of target A face 1A and first group of target B face 1B side, and feed argon gas in low temperature linear ion source 6, vacuum tightness is 2.0 * 10
-1Pa opens low temperature linear ion source 6, and electric current is 0.50A, and voltage is 500V, bombards 10 minutes with the cleaning cleaning polyalcohol surface.Then with sample Rotate 180 degree to back to low temperature linear ion source 6.Feed argon gas, vacuum tightness is 3.0 * 10
-1Pa, regulate low temperature linear ion source 6, electric current is 0.25A, and voltage is 280V, open direct supply, electric current is 1.00A, and voltage is 290V, pre-sputter 10 minutes, then with sample Rotate 180 degree, apply the 100V negative bias and be pressed on Rotary Specimen Rack, 15 minutes plated film time, the thickness of deposit film is 450 nanometers.Whole depositing temperature is no more than 90 ° of C.
Embodiment 4
As shown in Figure 3, the whole vacuum system of the utility model device mainly comprises and being arranged in the vacuum cavity 5: first group of target (first group of target A face 1A and first group of target B face 1B), second group of target (second group of target C face 1C and second group of target D face 1D), workpiece pivoted frame 2, magnet system (3A of magnet system A portion, the 3B of magnet system B portion), magnet system (3C of magnet system C portion, the 3D of magnet system D portion), first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B etc.Concrete structure is as follows:
First group of target A face 1A and first group of target B face 1B are oppositely arranged, and apart from 12cm, the angle of target and target is 0 degree, and second group of target C face 1C and second group of target D face 1D are oppositely arranged, and apart from 12cm, the angle of target and target is 0 degree.Described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B lay respectively at the side of first group of target A, B and second group of target C, D, play ion and clean and assistant depositing, first group of low temperature linear ion source 6A uses flange to be connected with vacuum cavity 5 respectively with second group of low temperature linear ion source 6B.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3A of magnet system A portion and the magnet system B 3B of portion correspond respectively to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
First group of target A face 1A is connected with for the water-cooled tube 4A that cools off first group of target A face 1A, and first group of target B face 1B is connected with for the water-cooled tube 4B that cools off first group of target B face 1B.Second group of target C face 1C is connected with for the water-cooled tube 4C that cools off second group of target C face 1C, and second group of target D face 1D is connected with for the water-cooled tube 4D that cools off second group of target D face 1D.
In the present embodiment, first group of target (first group of target A face 1A and first group of target B face 1B) and second group of target (second group of target C face 1C and second group of target D face 1D) are worked simultaneously.Adopt the aluminium target at pet sheet face deposit film, sputter gas (argon gas) enters into vacuum cavity 5, and (between 1C and the 1D) produces plasma body between (between 1A and the 1B) between first group of target and second group of target, and PET is fixed on the workpiece pivoted frame 2.Rotational workpieces frame at first, rotating speed is 20 rev/mins, feeds argon gas respectively in first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B, vacuum tightness is 2.0 * 10
-1Pa opens low temperature linear ion source 6, and electric current is 0.50A, and voltage is 500V, bombards 10 minutes with the cleaning cleaning polyalcohol surface.Feed argon gas, vacuum tightness is 3.0 * 10
-1Pa, regulate first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B, electric current is 0.25A, voltage is 280V, opens direct supply, and electric current is 1.00A, voltage is 290V, apply the 100V negative bias and be pressed on Rotary Specimen Rack, 15 minutes plated film time, the thickness of deposit film is 500 nanometers.Whole depositing temperature is no more than 90 ° of C.
Embodiment 5
As shown in Figure 4, the whole vacuum system of the utility model device mainly comprises and being arranged in the vacuum cavity 5: first group of target (first group of target A face 1A and first group of target B face 1B), second group of target (second group of target C face 1C and second group of target D face 1D), workpiece pivoted frame 2, magnet system (3A of magnet system A portion, the 3B of magnet system B portion), magnet system (3C of magnet system C portion, the 3D of magnet system D portion), first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B etc.Concrete structure is as follows:
First group of target A face 1A and first group of target B face 1B are oppositely arranged, and apart from 12cm, the angle of target and target is 15 degree, and second group of target C face 1C and second group of target D face 1D are oppositely arranged, and apart from 12cm, the angle of target and target is 15 degree.Described workpiece pivoted frame 2 is positioned at two groups of four sides target position intermediate, first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B lay respectively at the side of first group of target A, B and second group of target C, D, play ion and clean and assistant depositing, first group of low temperature linear ion source 6A uses flange to be connected with vacuum cavity 5 respectively with second group of low temperature linear ion source 6B.
Magnet system lays respectively at the back side of every group of target, and wherein: the 3A of magnet system A portion and the magnet system B 3B of portion correspond respectively to first group of target A face 1A and first group of target B face 1B, and magnetic pole is opposite; The 3C of magnet system C portion and the magnet system D 3D of portion are corresponding to second group of target C face 1C and second group of target D face 1D, and magnetic pole is opposite; Negative electrode and the target of magnetically controlled DC sputtering power supply join, the anode of magnetically controlled DC sputtering power supply and vacuum cavity 5 ground connection.
First group of target A face 1A is connected with for the water-cooled tube 4A that cools off first group of target A face 1A, and first group of target B face 1B is connected with for the water-cooled tube 4B that cools off first group of target B face 1B.Second group of target C face 1C is connected with for the water-cooled tube 4C that cools off second group of target C face 1C, and second group of target D face 1D is connected with for the water-cooled tube 4D that cools off second group of target D face 1D.
In the present embodiment, first group of target (first group of target A face 1A and first group of target B face 1B) and second group of target (second group of target C face 1C and second group of target D face 1D) are worked simultaneously.Adopt the aluminium target at pet sheet face deposit film, sputter gas (argon gas) enters into vacuum cavity 5, and (between 1C and the 1D) produces plasma body between (between 1A and the 1B) between first group of target and second group of target, and PET is fixed on the workpiece pivoted frame 2.Rotational workpieces frame at first, rotating speed is 20 rev/mins, feeds argon gas respectively in first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B, vacuum tightness is 2.0 * 10
-1Pa opens low temperature linear ion source 6, and electric current is 0.50A, and voltage is 500V, bombards 10 minutes with the cleaning cleaning polyalcohol surface.Feed argon gas, vacuum tightness is 3.0 * 10
-1Pa, regulate first group of low temperature linear ion source 6A and second group of low temperature linear ion source 6B, electric current is 0.25A, voltage is 280V, opens direct supply, and electric current is 1.00A, voltage is 290V, apply the 100V negative bias and be pressed on Rotary Specimen Rack, 15 minutes plated film time, the thickness of deposit film is 550 nanometers.Whole depositing temperature is no more than 90 ° of C.
Two groups of nonequilibrium state magnetic controlling targets of the utility model are driven by direct supply and produce highdensity plasma body between targets, apply bias voltage on the rotational workpieces pivoted frame, and sedimentation rate can be improved in low temperature linear ion source.The utility model is by regulating in the magnetic control sputtering device gas flow, the sputtering sedimentation time in the vacuum chamber and using different target etc., is implemented in metal refining or oxide nano-film on the organic materials such as polymkeric substance.
Embodiment result shows, the nonequilibrium state magnetron sputtering target drives and produces high density plasma by direct supply in the utility model between target, can be implemented in metal refining equably or oxide nano-film on the organic materialss such as polymkeric substance, expand the range of application of magnetron sputtering plating.
Claims (7)
1. the device of the multi-functional composite film coating of the low damage of low temperature is characterized in that this device is made up of the vacuum cavity that comprises two groups four rectangle nonequilibrium state magnetic control targets, a linear ion source and a biased workpiece pivoted frame for vacuum unit; Wherein: two groups of nonequilibrium state magnetic control targets are placed side by side, and two targets are face-to-face placement in every group, work alone or work simultaneously; The mid-way of workpiece pivoted frame between two groups of nonequilibrium state magnetic control targets, linear ion source are positioned at one group of nonequilibrium state magnetic control target side.
2. according to the device of the multi-functional composite film coating of the low damage of the described low temperature of claim 1, it is characterized in that in every group of nonequilibrium state magnetic control target, distance is adjustable at 10-15cm between target and the target.
3. according to the device of the multi-functional composite film coating of the low damage of the described low temperature of claim 1, it is characterized in that in every group of nonequilibrium state magnetic control target, the angle of target and target is adjustable at the 0-15 degree.
4. according to the device of the multi-functional composite film coating of the low damage of the described low temperature of claim 1, it is characterized in that target uses direct supply to drive, and produces plasma body between target and the target.
5. according to the low device that damages multi-functional composite film coating of the described low temperature of claim 1, it is characterized in that two non-equilibrium target A, B are one group in the whole vacuum unit, two non-equilibrium target C, D are one group in addition, two groups of nonequilibrium state magnetic control targets use respectively separately, perhaps use simultaneously.
6. according to the device of the multi-functional composite film coating of the low damage of the described low temperature of claim 1, it is characterized in that the linear ion source is positioned at one group of nonequilibrium state magnetic control target side, use flange to be connected with vacuum cavity; Another group nonequilibrium state magnetic control target side uses the blind plate of identical flange port to be connected with vacuum cavity, and perhaps blind plate is replaced by the linear ion source, uses simultaneously with existing linear ion source.
7. according to the device of the multi-functional composite film coating of the low damage of the described low temperature of claim 1, it is characterized in that the linear ion source is low temperature linear ion source.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107849690A (en) * | 2015-07-21 | 2018-03-27 | 住友重机械工业株式会社 | Film formation device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107849690A (en) * | 2015-07-21 | 2018-03-27 | 住友重机械工业株式会社 | Film formation device |
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