CN202916206U - Device for measuring and evaluating laser-induced damage resisting capacity of film - Google Patents
Device for measuring and evaluating laser-induced damage resisting capacity of film Download PDFInfo
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- CN202916206U CN202916206U CN 201220631755 CN201220631755U CN202916206U CN 202916206 U CN202916206 U CN 202916206U CN 201220631755 CN201220631755 CN 201220631755 CN 201220631755 U CN201220631755 U CN 201220631755U CN 202916206 U CN202916206 U CN 202916206U
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Abstract
The utility model provides a device for measuring and evaluating a laser-induced damage resisting capacity of a film. The device comprises an upper computer (1), a pulse width monitoring unit (2), a pulse laser device (3), a light beam shaping unit (4), a focusing unit (5), a spectroscope (6), an energy calibration unit (7), an image acquisition unit (8) and an electrical control sample table (9), wherein light beams with uniformly distributed space energy are used for inducing film damages; the pulse width monitoring unit (2) and the energy calibration unit (7) are used for monitoring the pulse width and the pulse energy of lasers emitted by the pulse laser device (3); and the energy density of light irradiating on a tested sample is adjusted by changing the relative distance between a focusing lens and the tested sample. The device is small in measuring error and high in degree of automation, and can be used quickly and conveniently.
Description
Technical field
The utility model relates to a kind of film resisting laser damage ability measurement and evaluating apparatus, belongs to laser testing, films test technical field.
Background technology
Soon, the damage of optical element film occurred often, has caused researchist's attention after the First laser instrument was born in the world.The nineties has formed ISO11254 optical thin-film laser injure threshold quantitative test standard, and China State Bureau of Technical Supervision has promulgated GB/T16601-1996 optical surface laser damage threshold method of testing accordingly, and promotion and implementation 1-on-1 testing standard.
Judge that accurately the film damage is the precondition that damage threshold is accurately measured.At present, to optical thin-film laser injure threshold measuring technique aspect, external technology is relatively ripe, but the measurement that great majority all still carry out under laboratory condition.Damage method of discrimination commonly used has hot spot Deformation Method, phase contrast microscopy, plasma spark method, He-Ne scattering method, Transflective scanning method, photothermal deflection method, optoacoustic mensuration and fog method etc., and the test result that different tests and determination methods obtain differs greatly.
In recent years, more than ten units such as domestic Changchun University of Science and Technology, Shanghai ray machine institute, Tongji University, Changchun ray machine institute, Chengdu Fine Optical Engineering Research Center, Sichuan University, Xi'an Technological University and Beijing GK Laser Technology Co., Ltd. try to explore the optical thin film damage threshold method of testing, but no longer be confined to manual test experimentally, started the upsurge of research.
Report about film damage threshold test macro all is based on the Gaussian distribution light beam to the damage of optical thin film, and the center intensity of laser facula is high, and a little less than the edge, the spot center position is easy to cause the damage of film, and measured deviation is larger.2011 older spring scenery machines have been reported the ArF laser film element damage proving installation of irradiation density high uniformity, but this only is confined to directly radiation uniform beam of ultraviolet band excimer laser, do not have generality, and system cost is expensive, working gas is poisonous, but generalization is poor.
Summary of the invention
Be objective and accurate measurement film resisting laser damage ability, the utility model provides a kind of film resisting laser damage ability measurement and evaluating apparatus.This device is induced the film surface damage based on the equally distributed light beam of dimensional energy, in the situation that the irradiation laser pulse energy is constant, relative distance is regulated the facula area of irradiation on sample between employing change condenser lens and sample, thereby realize the adjusting of exposure light energy density, this plant automation degree is high, uses efficient and convenient.
As shown in Figure 1, a kind of film resisting laser damage ability measurement and the evaluating apparatus that provide of the utility model comprises host computer 1, pulsewidth monitoring means 2, pulsed laser 3, beam shaping unit 4, focusing unit 5, spectroscope 6, energy calibration unit 7, image acquisition units 8 and Electrocontrolled sample platform 9; Wherein host computer 1 respectively with pulsewidth monitoring means 2, pulsed laser 3, focusing unit 5, energy calibration unit 7, image acquisition units 8 is connected with Electrocontrolled sample platform 9, under the control of host computer 1, pulsewidth monitoring means 2 monitoring pulsed lasers 3 send laser pulse width, this laser pulse is successively through inciding on the spectroscope 6 behind beam shaping unit 4 and the focusing unit 5, the part laser beam is surperficial to sample by the rear irradiation of spectroscope 6 reflections, another part laser beam sees through spectroscope 6 and is received by energy calibration unit 7, sample is installed on the Electrocontrolled sample platform 9, and the sample surface is through being imaged on the test surface of image acquisition units 8 behind the spectroscope 6;
Described host computer 1 is industrial computer, and it triggers the pulsewidth monitoring single simultaneously to pulsed laser 3 transmit button instructions
Described pulsewidth monitoring means 2 is comprised of photodetector and treatment circuit, place the pulsed laser 3 high reflection mirrors outsides and with the laser beam same light path, be used for the width of monitoring Laser emission pulse, and send this pulse width data to host computer 1;
Described pulsed laser 3 is the Q-switched Pulse Laser device, the preferred 1064nm of emission wavelength, 532nm or 355nm, and maximum repetition rate is 10Hz, and pulse width is 10ns, and the laser pulse of its emission is used for the irradiation sample;
Described beam shaping unit 4 is the even bundle of microlens array device, optical element surface wherein is coated with the anti-reflection film of paired pulses laser instrument 3 Emission Lasers wavelength, be arranged in the light path of pulsed laser 3 outgoing laser beams, and with the same optical axis of laser beam, the beam shaping that is used for pulsed laser 3 outputs is the equally distributed light beam of dimensional energy;
As shown in Figure 2, described focusing unit 5 is comprised of plano-convex lens 10, optical adjusting frame 11, automatically controlled displacement platform 12 and controller 13; Plano-convex lens 10 is fixed on the slide block of automatically controlled displacement platform 12 by adjustment rack 11, the automatically controlled displacement platform 11 of controller 13 controls drives plano-convex lens 10 and optical adjusting frame 11 changes relative distance between plano-convex lens 10 and sample along optical axis do motion in one dimension, thereby changes irradiation at the optical energy density on sample surface; The preferred 200mm of described plano-convex lens 10 focal lengths, the surface is coated with the anti-reflection film of paired pulses laser instrument 3 Emission Lasers wavelength, with the same optical axis of laser beam, is used for converging the laser beam of pulsed laser 3 emissions;
Described spectroscope 6 is block prism, its inclined surface is coated with the spectro-film to 45 degree laser wavelength of incidence, anti-reflection film to 45 degree incident visible lights, left side and right lateral surface are coated with the anti-reflection film of laser wavelength of incidence, upside and downside surface are coated with the anti-reflection film of visible light and the highly reflecting films of optical maser wavelength, be miter angle with the incident laser light path and place, separate with the sample surfaces imaging optical path for realization radiation sample light path, energy detection light path;
Described energy calibration unit 7 is comprised of pyroelectric detector and treatment circuit, place about spectroscope 6 symmetries with focusing unit 5, under the control of host computer 1, measure the pulsed laser energy of incident, light splitting ratio according to 6 pairs of optical maser wavelengths of spectroscope, pulsed laser energy is demarcated, and the result that will demarcate sends host computer 1 to;
As shown in Figure 3, described image acquisition units 8 is comprised of imaging optical system 14, imageing sensor 15 and image pick-up card 16; Imaging optical system 14 wherein is used for the sample surface is imaged onto the test surface of imageing sensor 15; Described imageing sensor 15 preferred CCD camera or CMOS cameras, be used for the optical imagery of film is converted to electronic image signal, the electronic image signal that image pick-up card 16 obtains according to the steering order acquisition and processing imageing sensor 15 of host computer 1, and this signal is transferred to host computer 1 processes;
Described Electrocontrolled sample platform 9 is automatically controlled XY two dimensional motion platform, and it drives sample and makes two dimensional motion under the control of host computer 1, to satisfy the record requirement of different pulse energy irradiation sample diverse locations.
Beneficial effect: the utility model adopts the uniform light beam of dimensional energy distribution to induce the film damage, regulate the energy density of irradiation on sample by automatically controlled adjusting focusing unit and sample room relative distance, measuring error is little, and automaticity is high, uses efficient and convenient.
Description of drawings
Fig. 1 is a kind of film resisting laser damage ability measurement and evaluating apparatus schematic diagram.
Fig. 2 is the schematic diagram of focusing unit.
Fig. 3 is the schematic diagram of image acquisition units.
Among the figure: 1-host computer, 2-pulsewidth monitoring means, 3-pulsed laser, 4-beam shaping unit, 5-focusing unit, 6-spectroscope, 7-energy calibration unit, 8-image acquisition units, 9-Electrocontrolled sample platform, the 10-plano-convex lens, 11-optical adjusting frame, the automatically controlled displacement platform of 12-, the 13-controller, the 14-imaging optical system, 15-imageing sensor, 16-image pick-up card.
Embodiment
Embodiment 1A kind of film resisting laser damage ability measurement and evaluating apparatus.
As shown in Figure 1, a kind of film resisting laser damage ability measurement and the evaluating apparatus that provide of the utility model comprises host computer 1, pulsewidth monitoring means 2, pulsed laser 3, beam shaping unit 4, focusing unit 5, spectroscope 6, energy calibration unit 7, image acquisition units 8 and Electrocontrolled sample platform 9; Wherein host computer 1 respectively with pulsewidth monitoring means 2, pulsed laser 3, focusing unit 5, energy calibration unit 7, image acquisition units 8 is connected with Electrocontrolled sample platform 9, under the control of host computer 1, pulsewidth monitoring means 2 monitoring pulsed lasers 3 send laser pulse width, this laser pulse is successively through inciding on the spectroscope 6 behind beam shaping unit 4 and the focusing unit 5, the part laser beam is surperficial to sample by the rear irradiation of spectroscope 6 reflections, another part laser beam sees through spectroscope 6 and is received by energy calibration unit 7, sample is installed on the Electrocontrolled sample platform 9, and the sample surface is through being imaged on the test surface of image acquisition units 8 behind the spectroscope 6;
Described host computer 1 is industrial computer, and it triggers the pulsewidth monitoring single simultaneously to pulsed laser 3 transmit button instructions
Described pulsewidth monitoring means 2 is comprised of photodetector and treatment circuit, be 47ps pulse rise time, place the pulsed laser 3 high reflection mirrors outsides and with the laser beam same light path, be used for the width of monitoring Laser emission pulse, and send this pulse width data to host computer 1;
Described pulsed laser 3 is the Q-switched Pulse Laser device, emission wavelength is 1064nm, 532nm or 355nm, and the maximum repetition rate of its emission pulse laser is 10Hz, and the maximum laser pulse energy is 500mJ, pulse width is 10ns, and the laser pulse of its emission is used for the irradiation sample;
Described beam shaping unit 4 is the even bundle of microlens array device, clear aperature is 15mm, the surface is coated with the anti-reflection film of paired pulses laser instrument 3 Emission Lasers wavelength, transmissivity is greater than 99%, be arranged in the light path of pulsed laser 3 outgoing laser beams, and with the same optical axis of laser beam, the beam shaping that is used for pulsed laser 3 outputs is the uniform light beam of dimensional energy distribution;
As shown in Figure 2, described focusing unit 5 is comprised of plano-convex lens 10, optical adjusting frame 11, automatically controlled displacement platform 12 and controller 13; Plano-convex lens 10 is fixed on the slide block of automatically controlled displacement platform 12 by adjustment rack 11, the automatically controlled displacement platform 11 of controller 13 controls drives plano-convex lens 10 and optical adjusting frame 11 changes relative distance between plano-convex lens 10 and sample along optical axis do motion in one dimension, thereby changes irradiation at the optical energy density on sample surface; Described plano-convex lens 10 diameters are 20mm, and focal length is 200mm, and the surface is coated with the anti-reflection film of paired pulses laser instrument 3 Emission Lasers wavelength, and transmissivity with the same optical axis of laser beam, is used for converging the laser beam of pulsed laser 3 emissions greater than 99.5%;
Described spectroscope 6 is block prism, be of a size of 20mm*20mm*20mm, its inclined surface is coated with the spectro-film to 45 degree laser wavelength of incidence, reflected light and transmitted intensity ratio are 49:1, anti-reflection film to 45 degree incident visible lights, left side and right lateral surface are coated with the anti-reflection film of laser wavelength of incidence, transmissivity is greater than 99.5%, upside and downside surface are coated with the anti-reflection film of visible light and the highly reflecting films of optical maser wavelength, reflectivity is greater than 98%, be miter angle with the incident laser light path and place, be used for realizing the radiation sample light path, the energy detection light path is separated with the sample surfaces imaging optical path;
Described energy calibration unit 7 is comprised of pyroelectric detector and treatment circuit, effectively surveying bore is 25mm, energy resolution is 50uJ, the highest detectable energy 100mJ, place about spectroscope 6 symmetries with condenser lens 5, be used for receiving the laser energy that is mapped to its searching surface, place about spectroscope 6 symmetries with focusing unit 5, under the control of host computer 1, measure the pulsed laser energy of incident, light splitting ratio according to 6 pairs of optical maser wavelengths of spectroscope, pulsed laser energy is demarcated, and the result that will demarcate sends host computer 1 to;
As shown in Figure 3, described image acquisition units 8 is comprised of imaging optical system 14, imageing sensor 15 and image pick-up card 16; Imaging optical system 14 wherein is used for the sample surface is imaged onto the test surface of imageing sensor 15; Described imageing sensor 15 is CCD camera or CMOS camera, test surface is of a size of 1/3 inch, be used for the optical imagery of film is converted to electronic image signal, the electronic image signal that image pick-up card 16 obtains according to the steering order acquisition and processing imageing sensor 15 of host computer 1, and this signal is transferred to host computer 1 processes; Described imaging optical system 14 enlargement ratios are 2, and optical element surface wherein is coated with the anti-reflection film of visible light, and transmissivity is used for the sample surface is imaged onto the test surface of imageing sensor 15 greater than 99%;
Described Electrocontrolled sample platform 9 is automatically controlled XY two dimensional motion platform, and it drives sample and makes two dimensional motion under the control of host computer 1, to satisfy the record requirement of different pulse energy irradiation sample diverse locations.
Sample surface laser damage threshold measuring process and step are as follows:
1) with the sample clamping on Electrocontrolled sample platform 9;
2) open the power supply of this measurement mechanism, System self-test enters after self check is finished and measures the interface;
3) software interface arranges emission wavelength, plano-convex lens 10 focal lengths, sample size, Electrocontrolled sample platform 9 maximum displacements and the moving step length of pulsed laser 3, system calculates every row test point quantity and line number automatically, this moment, the sample upper surface was positioned at the focal plane of plano-convex lens 10, clicked to begin to measure;
4) host computer 1 sends instructions and requires it according to the parameter work that arranges to pulsed laser 2, triggers synchronously pulsewidth monitoring means 2, energy calibration unit 7 and image acquisition units 8 and carries out data acquisition process;
5) at maximum laser pulse energy state, ten differences of irradiation, 1 once command of a point of every irradiation host computer requires it to move a step-length along X or Y-direction to Electrocontrolled sample platform 9, software judges whether sample damages, if the sample surface is 0 damage probability, then surpass measurement range, system prompt is changed the condenser lens of less focal length, if sample surface damage, record also shows pulsed laser energy, measure and demonstration damage location area, calculate also demonstration irradiation laser energy density, damage probability and pulse width;
6) host computer 1 send instructions make plano-convex lens 10 and sample hypotelorism, repeating step 4 to automatically controlled displacement platform 12) to 5), until the sample surface is zero damage probability;
7) host computer 1 software records and show different pulsed laser energy irradiation laser pulse energy densities, damage probability and pulse width, take the laser pulse energy metric density as transverse axis, damage probability is the longitudinal axis, generate the distribution plan of damage probability and pulsed laser energy density points, by go out zero damage probability with fitting a straight line, calculate and show the laser damage threshold of sample.
Claims (5)
1. a film resisting laser damage ability measurement and evaluating apparatus is characterized in that comprising host computer (1), pulsewidth monitoring means (2), pulsed laser (3), beam shaping unit (4), focusing unit (5), spectroscope (6), energy calibration unit (7), image acquisition units (8) and Electrocontrolled sample platform (9); Wherein host computer (1) respectively with pulsewidth monitoring means (2), pulsed laser (3), focusing unit (5), energy calibration unit (7), image acquisition units (8) is connected with Electrocontrolled sample platform (9), under the control of host computer (1), pulsewidth monitoring means (2) monitoring pulsed laser (3) sends laser pulse width, this laser pulse incides on the spectroscope (6) after passing through successively beam shaping unit (4) and focusing unit (5), the part laser beam is surperficial to sample by the rear irradiation of spectroscope (6) reflection, another part laser beam sees through spectroscope (6) and is received by energy calibration unit (7), sample is installed on the Electrocontrolled sample platform (9), is imaged on the test surface of image acquisition units (8) behind the sample surface process spectroscope (6);
Described host computer (1) is industrial computer, it is to pulsed laser (3) transmit button instruction, trigger simultaneously pulsewidth monitoring means (2), data acquisition is carried out in image acquisition units (7) and energy calibration unit (8), the data analysis that gathers is processed, numeral output laser pulse width, pulsed laser energy, the sample surfaces damaged area, irradiation energy density and sample surfaces laser damage threshold are done the record requirement that two dimensional motion satisfies different pulse energy irradiation sample diverse locations by control Electrocontrolled sample platform (9) in the cross section perpendicular to light beam;
Described pulsewidth monitoring means (2) is comprised of photodetector and treatment circuit, place pulsed laser (3) the high reflection mirror outside and with the laser beam same light path;
Described pulsed laser (3) is the Q-switched Pulse Laser device, and emission wavelength is 1064nm, 532nm or 355nm, and maximum repetition rate is 10Hz, and pulse width is 10ns;
Described focusing unit (5) is comprised of plano-convex lens (10), optical adjusting frame (11), automatically controlled displacement platform (12) and controller (13);
Described energy calibration unit (7) is comprised of pyroelectric detector and treatment circuit;
Described image acquisition units (8) is comprised of imaging optical system (14), imageing sensor (15) and image pick-up card (16);
Described Electrocontrolled sample platform (9) is automatically controlled XY two dimensional motion platform.
2. a kind of film resisting laser damage ability measurement as claimed in claim 1 and evaluating apparatus is characterized in that, described irradiation sample light beam is the uniform light beam of dimensional energy distribution.
3. a kind of film resisting laser damage ability measurement as claimed in claim 1 and evaluating apparatus is characterized in that, described beam shaping unit (4) is the even bundle of microlens array device.
4. a kind of film resisting laser damage ability measurement as claimed in claim 1 and evaluating apparatus is characterized in that, the energy density on described irradiation sample surface changes by relative distance between control focusing unit (5) and sample.
5. a kind of film resisting laser damage ability measurement as claimed in claim 1 and evaluating apparatus, it is characterized in that, described spectroscope (6) is block prism, its inclined surface is coated with the spectro-film to 45 degree laser wavelength of incidence, anti-reflection film to 45 degree incident visible lights, left side and right lateral surface are coated with the anti-reflection film of laser wavelength of incidence, and upside and downside surface are coated with the anti-reflection film of visible light and the highly reflecting films of optical maser wavelength, are miter angle with the incident laser light path and place.
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| CN 201220631755 CN202916206U (en) | 2012-11-27 | 2012-11-27 | Device for measuring and evaluating laser-induced damage resisting capacity of film |
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| CN 201220631755 CN202916206U (en) | 2012-11-27 | 2012-11-27 | Device for measuring and evaluating laser-induced damage resisting capacity of film |
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Cited By (6)
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| CN103335663A (en) * | 2013-06-28 | 2013-10-02 | 上海新跃仪表厂 | Method for testing radiation-resistant index of star sensor lens |
| CN107991284A (en) * | 2016-12-26 | 2018-05-04 | 同方威视技术股份有限公司 | Raman spectrum detection device and its monitoring method for detecting security |
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| CN109799074A (en) * | 2019-02-19 | 2019-05-24 | 长春理工大学 | A kind of optical thin film laser damage threshold rapid measurement device |
| CN113652627A (en) * | 2021-08-12 | 2021-11-16 | 西北大学 | Method and device for preparing steel part anti-rust film by laser based on specular reflectivity measurement |
| CN114440800A (en) * | 2022-01-24 | 2022-05-06 | 山东大学 | Method for accurately measuring effective area of light spot in laser damage threshold test |
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- 2012-11-27 CN CN 201220631755 patent/CN202916206U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103335663A (en) * | 2013-06-28 | 2013-10-02 | 上海新跃仪表厂 | Method for testing radiation-resistant index of star sensor lens |
| CN103335663B (en) * | 2013-06-28 | 2015-09-09 | 上海新跃仪表厂 | A kind of Flouride-resistani acid phesphatase indication test method of lens of star sensor |
| CN107991284A (en) * | 2016-12-26 | 2018-05-04 | 同方威视技术股份有限公司 | Raman spectrum detection device and its monitoring method for detecting security |
| CN107991284B (en) * | 2016-12-26 | 2024-04-19 | 同方威视技术股份有限公司 | Raman spectrum detection equipment and monitoring method for detection safety of Raman spectrum detection equipment |
| CN109253797A (en) * | 2018-10-15 | 2019-01-22 | 湖北航天技术研究院总体设计所 | A kind of laser irradiating effects pilot system and method |
| CN109799074A (en) * | 2019-02-19 | 2019-05-24 | 长春理工大学 | A kind of optical thin film laser damage threshold rapid measurement device |
| CN113652627A (en) * | 2021-08-12 | 2021-11-16 | 西北大学 | Method and device for preparing steel part anti-rust film by laser based on specular reflectivity measurement |
| CN114440800A (en) * | 2022-01-24 | 2022-05-06 | 山东大学 | Method for accurately measuring effective area of light spot in laser damage threshold test |
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Granted publication date: 20130501 Termination date: 20131127 |