CN202862022U

CN202862022U - Novel device capable of prolonging service life of polishing upper pad

Info

Publication number: CN202862022U
Application number: CN 201220206850
Authority: CN
Inventors: 姜翠宁
Original assignee: SHENZHEN ZHENGXING OPTOELECTRONICS TECHNOLOGY Co Ltd
Current assignee: SHENZHEN ZHENGXING OPTOELECTRONICS TECHNOLOGY Co Ltd
Priority date: 2012-05-09
Filing date: 2012-05-09
Publication date: 2013-04-10
Anticipated expiration: 2022-05-09

Abstract

The utility model discloses a novel device capable of prolonging the service life of a polishing upper pad. The novel device capable of prolonging the service life of the polishing upper pad comprises a stainless steel flake, a polishing upper plate, the polishing upper pad and polishing upper pad strakes, wherein the stainless steel flake is fixed on the surface of the polishing upper plate; the external diameter of the stainless steel flake coincides with the external diameter of the polishing upper plate; an opening with the size of the four sides greater than that of the glass substrate is formed in the central position of the stainless steel flake according to the size of a polishing glass substrate; the polishing upper pad is sticked in a position in the stainless steel opening; polishing upper pad edgings are sticked around the polishing upper pad; and the position left on the polishing upper pad is exactly as big as the size of the glass substrate.

Description

A kind of upper pad of polishing new device in service life that prolongs

Technical field

The utility model relates to the polishing of glass substrate in a kind of FPD field, especially can prolong the upper pad of the polishing new device in service life.

Background technology

Prior art is will polish pad according to the glass substrate size to cut into needed suitable dimension, then will polish pad is attached on above the upper dish of polishing, when polishing, glass substrate is adsorbed on above the upper pad of polishing, dish decline contacts with the polishing lower wall in the polishing, and the special-purpose polishing slurries of supply, waving and rotate glass surface is polished by upper lower burrs, this technology is in polishing process, the easy polished slurry lateral erosion in edge of pad in the polishing, cause the edge of the upper pad of polishing to begin to occur damaged and progressively inwards diffusion, when breakage arrives glassy zone, will affect the adsorption effect of glass, and this mode glass each to stick the position identical, otherwise because polishing each position usage degree of upper pad and the difference of time, can cause its adsorption capacity and flexible variation, further affect the normal polishing effect of product, and slurry directly shortens polishing upper service life of filling up to the lateral erosion of polishing upper pad, increased the polishing cost.

The utility model content

The technical problems to be solved in the utility model has been to provide a kind of upper pad of polishing new device in service life that prolongs.

For solving the problems of the technologies described above, the utility model is realized according to following scheme: can prolong the upper new device that fills up service life of polishing and be made of pad edge strip in pad, the polishing in dish, the polishing in stainless steel thin slice, the polishing, the fixing stainless steel thin slice of panel surface in polishing, the stainless steel thin slice conforms to the upper dish of polishing external diameter, size in stainless steel thin slice center according to the polished glass substrate, open and get four limit sizes greater than the opening of glass substrate, the polishing pad is pasted in the position in the stainless steel opening, sticks the upper pad of polishing edge strip in the polishing around the pad.

Further, the pad edge strip is close to the opening edge of stainless steel thin slice on one side in the described polishing, push down on one side the upper pad of polishing edge, thickness of the Thickness Ratio polished glass substrate of the upper pad of this polishing edge strip is little, and it is just identical with the glass substrate size to fill up the institute position of staying in the polishing.

Adopt device of the present utility model, can extend to two months by an original week even be longer the service life of filling up in the polishing, position of glass substrate is fixed, and has therefore eliminated because this kind device is adopted in the impact that the skew of substrate position brings the polishing product quality, in polishing process, reduced upper slice and time of unloading piece, improved production efficiency, when prolonging polishing pad service life, also just reduce the replacing frequency of the upper pad of polishing, saved the production time.

Description of drawings

Below in conjunction with accompanying drawing the utility model is elaborated

Fig. 1 is the structure chart of the upper cushion device of the utility model polishing;

Fig. 2 is the profile of the upper cushion device of the utility model polishing.

The specific embodiment

As shown in Figure 2; with stainless steel thin slice 1 centered by the center of polishing upper dish 3; open each limit size all greater than the opening of 10 millimeters to 15 millimeters of glass substrate 5 sizes; then with among Fig. 1 the stainless steel thin slice behind the opening 1 adopt glue special to be attached on the upper dish 3 of polishing; stainless steel thin slice 1 mainly plays the upper dish 3 of protection polishing; cut the upper pad 4 of polishing; its size is than large 1 millimeter to 2 millimeters of glass substrate 5 each limit size; then will polish pad 4 still is attached on centered by the center of polishing upper dish 3 on the upper dish 3 of polishing; then will protect that pad edge strip 2 is attached on the upper dish 3 of polishing in the polishing of the upper pad 4 of polishing; its particular location is between stainless steel thin slice 1 and polishing pad 4; wherein near the one side of polishing upper pad 4; all be pressed in the upper pad of polishing 1 millimeter to 2 millimeters place, edge; it mainly plays the upper pad 4 of protection polishing; prevent its polished slurry lateral erosion; its thickness is 0.3mm less than the glass substrate 5 of needs polishing; glass substrate 5 is adsorbed in the polishing of posting 2 protections of the upper pad of polishing edge strip on the pad 4; because patch location and the glass substrate 5 reserved on the upper pad 4 of polishing are measure-alike; so each upper slice the time; only need glass is being pasted the upper pad of polishing edge strip 2 positions on one side; then pad 4 was adjacent to and gets final product on integral body relied on and polishes; the position of the each glass substrate 5 of this mode is all identical; pad edge strip 2 is pushed down after the upper pad of polishing 4 edges in the polishing; in polishing process; polishing slurries can't infiltrate below the upper pad 4 of polishing more from the side; it is damaged because of corrosion to cause polishing pad 4; therefore prolonged the service life of the upper pad 4 of polishing; when changing product size; the size of the upper pad of corresponding replacing polishing edge strip 2; after posting the protection edge strip, center and glass substrate 5 are measure-alike.

By above device; because the protection of pad edge strip 2 in four edge polishings; side etching phenomenon around the polishing pad is eliminated; prolonged the service life of the upper pad 4 of polishing; and because the restriction of edge strip positions of materials; can guarantee that every subvitreous absorption position is all identical, just guarantee that also use and the degree of injury at the upper pad of polishing 4 each position is identical, eliminate owing to polish upper pad 4 different parts usage degree differences to the impact of glass polishing effect.Therefore the utility model has not only improved quality of finish, has also prolonged the service life of the upper pad 4 of polishing, thereby has reduced production cost.

Claims

1. one kind can prolong the upper pad of the polishing new device in service life, it is characterized in that: this can prolong the upper new device in service life that fills up of polishing by stainless steel thin slice (1), dish (3) in the polishing, pad (4) in the polishing, pad edge strip (2) consists of in the polishing, at the surperficial fixedly stainless steel thin slice (1) of polishing dish (3), stainless steel thin slice (1) conforms to the upper dish of polishing (3) external diameter, size in stainless steel thin slice (1) center according to polished glass substrate (5), open and get four limit sizes greater than the opening of glass substrate (5), polishing pad (4) is pasted in the position in the stainless steel opening, and pad (4) sticks the upper pad of polishing edge strip (2) all around in the polishing.

2. according to the upper pad of the polishing new device in service life that prolongs claimed in claim 1, it is characterized in that: fill up edge strip (2) in the described polishing Yi Bian be close to the opening edge of stainless steel thin slice (1), push down the upper pad of polishing (4) edge on one side, the thickness of the Thickness Ratio polished glass substrate (5) of this polishing upper pad edge strip (2) is little.