CN202499902U - Substrate holder capable of achieving automatically overturning - Google Patents
Substrate holder capable of achieving automatically overturning Download PDFInfo
- Publication number
- CN202499902U CN202499902U CN201220101661XU CN201220101661U CN202499902U CN 202499902 U CN202499902 U CN 202499902U CN 201220101661X U CN201220101661X U CN 201220101661XU CN 201220101661 U CN201220101661 U CN 201220101661U CN 202499902 U CN202499902 U CN 202499902U
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- ratchet
- substrate
- pawl
- ratchet wheel
- coating
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Abstract
The utility model discloses a substrate holder capable of achieving automatically overturning. The substrate holder comprises a substrate clamp fixture, wherein the substrate clamp fixture is arranged on a support saddle through a rotating shaft; a ratchet wheel is arranged at the rear end of the rotating shaft; a pawl is arranged at a part corresponding to the ratchet wheel; the pawl is connected with an elevating gear; and when the pawl ascends, the pawl is meshed with the ratchet wheel, and when the paw descends, the pawl is separated from the ratchet wheel. The free overturning of a substrate can be achieved through a ratchet wheel-pawl mechanism in a coating process; the characteristics of poor diffraction properties of vacuum sputtering coating equipment and vacuum evaporation coating equipment are overcome, and films can be uniformly and firmly deposited on two surfaces of the substrate in a coating process, thereby achieving the purposes of meeting process requirements, ensuring the coating quality and improving the working efficiency.
Description
Technical field
The utility model relates to a kind of substrate frame of vacuum coating film equipment, relates in particular to a kind of substrate frame of upset automatically that realizes.
Background technology
Vacuum coating film equipment mainly is divided into Pvd equipment and chemical vapor depsotition equipment according to the difference of its plated film principle and form.Wherein vacuum sputtering coating equipment and vacuum evaporation coating film device are filming equipments the most common, that application is the widest.
In filming equipment (no matter being vacuum sputtering coating equipment or vacuum evaporation coating film device) each several part structure, the structure of substrate frame is of paramount importance.It is by plated product---and substrate is installed, fixed mechanism, and the reasonableness of substrate frame structure design is directly connected to the effect and the quality of plated film.Because sputter coating and evaporation coating diffraction property poor (being substrate face can deposit upper film and can not deposit upper film back to the one side of film material the one side of Coating Materials), and the for example accurate astronomical telescope eyeglass of more products, crystal thickness measurement and control instrument crystal-vibration-chip etc. all require on the substrate two sides, to deposit one or more identical or different films.
Adopt substrate frame structure of the prior art, just can only after the plated film work of accomplishing the substrate one side, open Vakuumkammer, change another side into and carry out plated film, not only influenced working efficiency, and damaged coating quality.
Summary of the invention
The purpose of the utility model provides a kind of automatically substrate frame of upset that realizes, this substrate frame can be implemented in freely overturning of substrate in the coating process process, makes two surfaces of substrate in a coating process process, can both deposit upper film evenly, securely.
The purpose of the utility model realizes through following scheme:
The substrate frame that realizes automatic upset of the utility model, substrate frame comprises the substrate jig, and said substrate jig is installed on the bearing through rotating shaft, and the rear end of said rotating shaft is provided with ratchet, and said bearing is fixed on the rotating mechanism of filming equipment;
The position corresponding with said ratchet is provided with ratchet, and said ratchet is connected with lifting device;
When said ratchet rises, said ratchet and ratchet engaged; When said ratchet descended, said ratchet separated with ratchet.
Technical scheme by above-mentioned the utility model provides can be found out; The substrate frame that realizes automatic upset that the utility model embodiment provides; Because the substrate jig is installed on the bearing through rotating shaft; The rear end of rotating shaft is provided with ratchet, and the position corresponding with ratchet is provided with ratchet, and ratchet is connected with lifting device; When ratchet rises, ratchet and ratchet engaged; When ratchet descended, ratchet separated with ratchet.Can in coating process, realize freely overturning of substrate through ratchet and pawl mechanicm; Overcome the characteristics of vacuum sputtering coating equipment and vacuum evaporation coating film device diffraction property difference; Two surfaces that make substrate can both be even, firm in coating process process the deposition upper film, accomplish processing requirement to reach, guarantee the purpose that coating quality is increased work efficiency simultaneously.
Description of drawings
The structural representation of realizing automatic substrate frame of overturning that Fig. 1 provides for the utility model embodiment;
Fig. 2 is the structural representation of substrate frame and ratchet among the utility model embodiment;
Fig. 3 is the view of ratchet-ratchet among the utility model embodiment.
Embodiment
To combine accompanying drawing that the utility model embodiment is done to describe in detail further below.
The substrate frame that realizes automatic upset of the utility model, its preferable embodiment is:
Substrate frame comprises the substrate jig, and said substrate jig is installed on the bearing through rotating shaft, and the rear end of said rotating shaft is provided with ratchet, and said bearing is fixed on the rotating mechanism of filming equipment;
The position corresponding with said ratchet is provided with ratchet, and said ratchet is connected with lifting device;
When said ratchet rises, said ratchet and ratchet engaged; When said ratchet descended, said ratchet separated with ratchet.
Said lifting device comprises cylinder, also can adopt linear electric motors or other lifting device.
The material of said pawl-and-gearing is selected 40Cr.
The utility model can be realized the substrate frame of upset automatically simultaneously at the assurance coating quality, and the plated film on substrate two sides is accomplished in a plated film job, increases work efficiency.
Specific embodiment:
Like Fig. 1, shown in Figure 2, substrate frame comprises substrate jig 2, and substrate jig 2 is installed on the bearing 3 through rotating shaft 5, and the rear end of rotating shaft is provided with ratchet 4, and bearing 3 is fixed on the rotating mechanism 6 of filming equipment.Substrate 1 is the sedimentary zone of Coating Materials, is final product, its installation, is fixed on the substrate jig 2.
Can drive freely overturning of substrate frame through the rotation of ratchet 4; Ratchet 7 and ratchet 4 engagements are that substrate frame realizes the PWR PLT of upset automatically, and ratchet 7 is connected with lifting device; What adopt in the present embodiment is cylinder 8; Drive the up-down of ratchet 7 through the flexible fortune merit of cylinder rod, make ratchet 7 with ratchet 4 engagements or separate, provide or eliminate the substrate frame power of upset automatically.
The process of concrete work is:
As shown in Figure 3, after substrate 1 is packed substrate frame into, open rotating mechanism 6; Carry out the plated film work on a surface of substrate 1; Accomplish the exhaust hood bar and shrink 7 risings of drive ratchet and ratchet 4 engagements 71 automatically, in rotating mechanism 6 rotary courses, ratchet 7 just can drive ratchet 4 rotations; Substrate frame upset power is provided, substrate frame is overturn automatically; After substrate 1 was all accomplished upset, cylinder rod stretched automatically, drove ratchet 7 declines and broke away from 72 with ratchet 4, made substrate frame stop upset, carried out substrate 1 another surperficial plated film work then.
The size that the utility model can come the actual design ratchet according to the concrete quantity of the concrete size of vacuum coating film equipment and substrate frame.In the utility model, the accurate design through ratchet and ratchet has guaranteed that ratchet and ratchet engaged are good, has especially guaranteed that through design ratchet can drive the substrate frame upset through the ratchet rotation and put in place in time, accurately.Having avoided occurring ratchet blocks ratchet or overturns phenomenon not in place.
In the specific embodiment, in the selection of some key parts, like ratchet, ratchet, material has been selected 40Cr, and has carried out surface heat treatment process, has higher hardness and stronger wear resistance.
The above; Be merely the preferable embodiment of the utility model; But the protection domain of the utility model is not limited thereto; Any technician who is familiar with the present technique field is in the technical scope that the utility model discloses, and the variation that can expect easily or replacement all should be encompassed within the protection domain of the utility model.Therefore, the protection domain of the utility model should be as the criterion with the protection domain of claims.
Claims (3)
1. can realize the substrate frame of upset automatically for one kind, it is characterized in that substrate frame comprises the substrate jig, said substrate jig is installed on the bearing through rotating shaft, and the rear end of said rotating shaft is provided with ratchet, and said bearing is fixed on the rotating mechanism of filming equipment;
The position corresponding with said ratchet is provided with ratchet, and said ratchet is connected with lifting device;
When said ratchet rises, said ratchet and ratchet engaged; When said ratchet descended, said ratchet separated with ratchet.
2. the substrate frame of upset automatically that realizes according to claim 1 is characterized in that said lifting device comprises cylinder or linear electric motors.
3. the substrate frame of upset automatically that realizes according to claim 1 and 2 is characterized in that the material of said pawl-and-gearing is selected 40Cr.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220101661XU CN202499902U (en) | 2012-03-16 | 2012-03-16 | Substrate holder capable of achieving automatically overturning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220101661XU CN202499902U (en) | 2012-03-16 | 2012-03-16 | Substrate holder capable of achieving automatically overturning |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202499902U true CN202499902U (en) | 2012-10-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201220101661XU Expired - Fee Related CN202499902U (en) | 2012-03-16 | 2012-03-16 | Substrate holder capable of achieving automatically overturning |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202499902U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106148897A (en) * | 2015-04-17 | 2016-11-23 | 纳卢克斯株式会社 | Evaporation coating device and tray holding member |
| CN107287567A (en) * | 2017-07-11 | 2017-10-24 | 成都天府新区河川科技有限公司 | Droplet ion sputtering technique and hydraulic turbine preparation method |
| CN107841726A (en) * | 2017-12-21 | 2018-03-27 | 北京铂阳顶荣光伏科技有限公司 | Full-automatic coating machine |
| CN108193187A (en) * | 2017-11-29 | 2018-06-22 | 北京中科优唯科技有限公司 | A kind of substrate frame of achievable automatic turning |
| CN108588683A (en) * | 2018-06-05 | 2018-09-28 | 梁亚 | A kind of semiconductor production chemical vapor deposition unit |
-
2012
- 2012-03-16 CN CN201220101661XU patent/CN202499902U/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106148897A (en) * | 2015-04-17 | 2016-11-23 | 纳卢克斯株式会社 | Evaporation coating device and tray holding member |
| CN106148897B (en) * | 2015-04-17 | 2019-10-29 | 纳卢克斯株式会社 | Evaporation coating device and tray holding member |
| CN107287567A (en) * | 2017-07-11 | 2017-10-24 | 成都天府新区河川科技有限公司 | Droplet ion sputtering technique and hydraulic turbine preparation method |
| CN107287567B (en) * | 2017-07-11 | 2019-09-27 | 成都天府新区河川科技有限公司 | Droplet ion sputtering technique and hydraulic turbine preparation method |
| CN108193187A (en) * | 2017-11-29 | 2018-06-22 | 北京中科优唯科技有限公司 | A kind of substrate frame of achievable automatic turning |
| CN108193187B (en) * | 2017-11-29 | 2024-03-29 | 山西中科潞安紫外光电科技有限公司 | Substrate frame capable of realizing automatic overturning |
| CN107841726A (en) * | 2017-12-21 | 2018-03-27 | 北京铂阳顶荣光伏科技有限公司 | Full-automatic coating machine |
| CN108588683A (en) * | 2018-06-05 | 2018-09-28 | 梁亚 | A kind of semiconductor production chemical vapor deposition unit |
| CN108588683B (en) * | 2018-06-05 | 2019-12-13 | 南京溧航仿生产业研究院有限公司 | chemical vapor deposition device for semiconductor production |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121024 Termination date: 20200316 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |