CN106148897A - Evaporation coating device and tray holding member - Google Patents
Evaporation coating device and tray holding member Download PDFInfo
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- CN106148897A CN106148897A CN201510184179.5A CN201510184179A CN106148897A CN 106148897 A CN106148897 A CN 106148897A CN 201510184179 A CN201510184179 A CN 201510184179A CN 106148897 A CN106148897 A CN 106148897A
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- vault
- pallet
- coating device
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Abstract
Evaporation coating device and tray holding member are provided, workpiece are uniformly deposited with and further increase production efficiency.The tray holding member of the present invention has: framework, and it has the 1st rotary part (1101)；And rotating part (1200), it has the 2nd rotary part (1211), and is mounted to together with described 2nd rotary part rotate around the axle (1213) supported by described framework.Described rotating part has multiple workpiece holding pallet (1251A, 1251B, 1251C) configured around described axle, and described 2nd rotary part is configured to, and is rotated together with described rotating part by described 1st rotary part.
Description
Technical field
The present invention relates to evaporation coating device and tray holding member.
Background technology
As an example, evaporation coating device is used for being formed antireflection film on the surface of the optical elements such as lens.Evaporation coating device
Including for discharging the vapor deposition source of the material forming film and covering vapor deposition source the vault that can rotate around central shaft.
Vault is provided with multiple pallet, each pallet is provided with multiple workpiece, such as lens.
Above-mentioned evaporation coating device is utilized to include being deposited with preparation process and evaporation step to the technique processing workpiece.Evaporation prepares step
Suddenly include: workpiece is installed on evaporation coating device；Prepare vapor deposition source；And generate evaporation environment.In evaporation step,
The material discharged from vapor deposition source in evaporation environment arrives the workpiece being installed on vault, forms the film of this material.
In evaporation preparation process, the action of evaporation coating device is interrupted.Therefore, in order to improve the production effect of evaporation coating device
Rate, needs the break period shortened owing to being deposited with the evaporation coating device that preparation process causes.
In the prior art, following evaporation coating device is developed: consist of and vault is divided into multiple fragment, make
Two-sided this fragment upset (such as, Fig. 2 and Fig. 6 of patent documentation 1) being mounted with workpiece.Utilize said structure,
The break period owing to being deposited with the evaporation coating device that preparation process causes can be shortened, improve production efficiency.
But, in said structure, it is impossible to configure workpiece at a proper angle relative to vapor deposition source.Therefore, it is impossible to it is right
Multiple workpiece are uniformly deposited with.Further, the raising of the production efficiency of evaporation coating device is the most insufficient.
Patent documentation 1: Japanese Unexamined Patent Publication 2011-179102 publication
Therefore, for multiple workpiece are uniformly deposited with and further increase production efficiency evaporation coating device and
There is demand in tray holding member.
Summary of the invention
The tray holding member of the 1st mode of the present invention has: framework, and it has the 1st rotary part；And rotating part,
It has the 2nd rotary part, and is mounted to together with described 2nd rotary part around being supported by described framework
Axle rotates.Described rotating part has the multiple workpiece holding pallets configured around described axle, described 2nd rotary part structure
Become, rotated together with described rotating part by described 1st rotary part.
Workpiece holding pallet can be switched over by the tray holding member of the manner, wherein, and this workpiece holding pallet
Being configured to when being installed in the opening of vault of evaporation coating device, by the rotation of vault, its face covers the opening of vault.
Therefore, it is possible to shorten the break period owing to being deposited with the evaporation coating device that preparation process causes, improve the production of evaporation coating device
Efficiency.
The evaporation coating device of the 2nd mode of the present invention has: vapor deposition source；The vault that can rotate, it covers described evaporation
Source, and there is at least one opening；At least one the 1st bar, it is arranged at the outside of described vault；And at least one
Individual tray holding member, this tray holding member has: framework, and it has the 1st rotary part；And rotating part, its tool
There is the 2nd rotary part, and be mounted to together with described 2nd rotary part revolve around the axle supported by described framework
Turn.Described rotating part has the multiple workpiece holding pallets configured around described axle, and described tray holding member is with described many
The face of 1 workpiece holding pallet in individual workpiece holding pallet covers the mode of at least one opening described and arranges
In described vault, at least one the 1st bar described is configured to, it is possible to be in the rotation of described vault not with described
The position of readiness of 1 rotary part contact with can contact with described 1st rotary part in the rotation of described vault
Operating position, described 1st rotary part is configured to, in the case of at least one the 1st bar described is in operating position,
In the rotation of described vault, rotate, described 2nd rotating part by contacting with at least one the 1st bar described
Part is configured to, and with in the rotation of described vault, enters the workpiece holding pallet being configured to the described opening of its face covering
The mode of row switching, is rotated together with described rotating part by described 1st rotary part.
In the evaporation coating device of the manner, tray holder has multiple workpiece holding pallet, and can pass through vault
Rotation, the workpiece holding pallet of opening being configured to its face and covering vault is switched over.Therefore, it is possible to shorten
Due to the break period of the evaporation coating device that evaporation preparation process causes, improve the production efficiency of evaporation coating device.Additionally, by
As broad as long with conventional evaporation coating device in the shape of vault, it is possible to carry out in the same manner as conventional evaporation coating device all
Even evaporation.
The evaporation coating device of the 1st embodiment of the 2nd mode of the present invention also has: be arranged on the outside of described vault
At least one the 1st detection contact, described rotating part also has pallet and shows that with contact, this pallet shows and divides with contact
The most corresponding with the plurality of workpiece holding pallet, in the rotation of described vault, with at least one the 1st detection described
Use contact.
According to present embodiment, it is possible in the rotation of vault, the relative position of the pallet in detection tray holding member.
Therefore, it is possible in the rotation of vault, for being installed on all tray holding member of vault, confirm that the switching of pallet is moved
Make.
The evaporation coating device of the 2nd embodiment of the 2nd mode of the present invention also has and is arranged on the outside of described vault extremely
Few 2nd bar, described rotating part has the 3rd corresponding with the plurality of workpiece holding pallet respectively rotary part,
The plurality of workpiece holding pallet is respectively provided with the 4th rotary part, and is mounted to and described 4th rotating part
Part rotates around the axle supported by described rotating part together, and at least one the 2nd bar described is configured to, it is possible to be in described
The position of readiness that do not contacts with described 3rd rotary part in the rotation of vault and can be with in the rotation of described vault
Described 3rd rotary part contact operating position, described 3rd rotary part is configured to, described at least one the 2nd
In the case of bar is in operating position, in the rotation of described vault, by contacting with at least one the 2nd bar described and
Rotating, described 4th rotary part is configured to, in the way of making the upset of the plurality of workpiece holding pallet respectively,
Rotated together with the plurality of workpiece holding pallet by described 3rd rotary part respectively.
In the evaporation coating device of present embodiment, it is possible in the rotation of vault, make respectively to be installed on tray holding member
Multiple workpiece holding pallets overturn.Therefore, at the two-sided installation workpiece of pallet, it is being installed on the workpiece in a face
After process terminates, make pallet overturn, the workpiece being installed on another face is processed, it is possible to carry further
The production efficiency of high evaporation coating device.
The evaporation coating device of the 3rd embodiment of the 2nd mode of the present invention also has and is arranged on the outside of described vault extremely
A few 2nd detection contact, the plurality of workpiece holding pallet is also respectively provided with pallet face and shows with contact, is somebody's turn to do
Pallet face shows with contact in the rotation of described vault, with at least one the 2nd detection contact described.
According to present embodiment, it is possible to detect pallet face in the rotation of vault.Therefore, it is possible in the rotation of vault,
For being installed on all tray holding member of vault, confirm the rotary movement of pallet.
The evaporation coating device of the 4th embodiment of the 2nd mode of the present invention also has the of the outside being arranged on described vault
3 detection contacts, at least one workpiece holding tray holding member includes multiple workpiece holding tray holding member, institute
State one in multiple workpiece holding tray holding member also there is at least one rotation reference position to show with contact, should
At least one rotation reference position shows with contact in the rotation of described vault, connects with described 3rd detection contact
Touch.
According to present embodiment, it is possible to detect the rotation reference position of vault in the rotation of vault.Therefore, it is possible to pin
To being installed on all tray holding member of vault, reliably carry out the switching action of pallet and the rotary movement of pallet.
In the evaporation coating device of the 5th embodiment of the 2nd mode of the present invention, described rotating part has 3 workpiece to be protected
Hold and use pallet.
Accompanying drawing explanation
Fig. 1 is the figure of the structure of the evaporation coating device illustrating the present invention.
Fig. 2 is the figure of the characteristic structural of the evaporation coating device for the present invention is described.
Fig. 3 is the front view of tray holding member.
Fig. 4 is the side view of tray holding member.
Fig. 5 is the rearview of tray holding member.
Fig. 6 is the flow chart for evaporation process that the evaporation coating device of the present invention carries out is described.
Fig. 7 is for evaporation preparatory technology and the steaming that the evaporation coating device of conventional evaporation coating device and the present invention carries out is described
The figure of depositing process.
Fig. 8 is the flow chart of the pallet switching action utilizing the rotation of rotating part to carry out for explanation.
Fig. 9 is the flow chart of the rotary movement for pallet is described.
Figure 10 A is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 B is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 C is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 D is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 E is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 F is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 G is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 H is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 I is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 J is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 K is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 10 L is for illustrating that rotating part rotates the figure of the action of 120 degree.
Figure 11 A is the figure of the action for pallet rotation turnback is described.
Figure 11 B is the figure of the action for pallet rotation turnback is described.
Figure 11 C is the figure of the action for pallet rotation turnback is described.
Figure 12 is identification and the figure of rotation reference position detection in the face for the identification of pallet, pallet are described.
Figure 13 is that the evaporation coating device being shown through the present invention forms the optical element of film and by prior art on surface
Evaporation coating device forms the figure of the relation between optical element, light wavelength and the reflectance of film on surface.
Figure 14 is the figure of the principle of the Optical Monitoring for evaporation process is described.
Figure 15 A is the figure of the relation between process time and the light quantity illustrating the 1st tunic.
Figure 15 B is the figure of the relation between process time and the light quantity illustrating the 2nd tunic.
Figure 15 C is the figure of the relation between process time and the light quantity illustrating the 3rd tunic.
Figure 15 D is the figure of the relation between process time and the light quantity illustrating the 4th tunic.
Detailed description of the invention
Fig. 1 is the figure of the structure of the evaporation coating device 100 illustrating the present invention.Evaporation coating device 100 include vapor deposition source 120,
Vault 110 and the chamber 130 that they are impaled.Chamber 130 is exhausted by use air vent 135, quilt
Remain the vacuum of regulation.Vault 110 is configured to surface within it and installs workpiece 200, and is disposed over evaporation
Source 120.The material discharged from vapor deposition source 120 arrives the workpiece 200 of the inner surface being installed on vault 110, and quilt
Evaporation is to its surface, and this vault 110 covers vapor deposition source 120.In order to inner surface multiple being installed on vault 110
The uniform evaporation material of workpiece 200, in evaporation process, makes vault 110 around its central shaft by not shown drive division
Rotate.Workpiece 200 is the optical elements such as lens as an example, is installed in not shown pallet, and this pallet is mounted
Inner surface in vault 110.Above-mentioned description is fitted in the evaporation coating device 100 and conventional evaporation coating device of the present invention jointly
With.The characteristic structural of the evaporation coating device 100 of the following description present invention.
Fig. 2 is the figure of the characteristic structural of the evaporation coating device 100 for the present invention is described.The evaporation coating device of the present invention
100 tray holding member 1000 with the outer surface being arranged at vault 110.Tray holding member 1000 is configured to have
Multiple workpiece holding pallets, and 1 pallet therein is configured in the opening being arranged at vault 110.Pass through
Successively by multiple workpiece holding tray arrangement to the opening of vault 110, it is fixed on arch with making workpiece holding pallet
The conventional evaporation coating device of the inner surface on top 110 is compared, it is possible to process more multi-work piece efficiently.Afterwards explanation is processed
Detailed content.
The evaporation coating device 100 of the present invention also has the fixed mechanism 1500 being installed on chamber 130.Fixed mechanism 1500
Act on the tray holding member 1000 being rotated about its center axis together with vault 110.Tray holding member will be described afterwards
1000 and the detailed content of action of fixed mechanism 1500.
Fig. 3 is the front view of tray holding member 1000.
Fig. 4 is the side view of tray holding member 1000.
Fig. 5 is the rearview of tray holding member 1000.
Tray holding member 1000 includes framework 1100F and 1100R and rotating part 1200.As it is shown on figure 3,
The front of framework 1100F is provided with the 1st rotary part including impeller 1101 and swivel plate 1103.Impeller 1101
Rotate integrally with swivel plate 1103.Swivel plate 1103 has pin 1105.Rotating part 1200 include pallet 1251A,
1251B and 1251C and sheave 1211.As shown in Figure 4, rotating part 1200 is configured to around by framework 1100F
Rotate with the axle 1213 of 1100R supporting.When swivel plate 1103 rotates, pin 1105 engages with the groove of sheave 1211,
Sheave 1211 is made to rotate around axle 1213.Rotating part 1200 rotates together with sheave 1211.So, rotating part 1200
Rotate around axle 1213.
Fixed mechanism 1500 includes the 1st bar maintaining part 1501 with bar 1503F and 1503R.Keep at the 1st bar
When portion 1501 is in position of readiness, in the rotation of vault 110, bar 1503F and 1503R not with framework 1100
Impeller 1101 contact.When the 1st bar maintaining part 1501 is in operating position, in the rotation of vault 110, bar
1503F with 1503R contacts with the impeller 1101 of framework 1100, makes impeller 1101 rotate.So, at vault 110
Rotation in, when bar 1503F and 1503R makes impeller 1101 rotate, the rotating part 1200 with sheave 1211 revolves
Turn.Can be rotated by rotating part 1200, the pallet in handover configurations to the opening of vault 110.Afterwards will be in detail
The pallet switching action utilizing the rotation of rotating part 1200 to carry out is described.
As it is shown in figure 5, rotating part 1200 includes respectively the corresponding with pallet 1251A, 1251B and 1251C the 2nd
Rotary part.As an example, 2nd rotary part corresponding with pallet 1251C includes impeller 1231C and swivel plate
1233C.Impeller 1231C and swivel plate 1233C rotates integrally.Pallet 1251C has swivel plate 1253C, and quilt
It is mounted to rotate around the axle supported by rotating part 1200.Swivel plate 1233C and swivel plate 1253C passes through gear
Engaging, when impeller 1231C rotates, the pallet 1251C with swivel plate 1253C rotates.
Fixed mechanism 1500 includes the 2nd bar maintaining part 1541 with bar 1543F and 1543R.Keep at the 2nd bar
When portion 1541 is in position of readiness, in the rotation of vault 110, bar 1543F and 1543R not with rotary shaft 1200
Impeller 1231C contact.When the 2nd bar maintaining part 1541 is in operating position, in the rotation of vault 110,
Bar 1543F with 1543R contacts with the impeller 1231C of rotary shaft 1200, makes impeller 1231C rotate.So, exist
In the rotation of vault 110, when bar 1543F and 1543R makes impeller 1231C rotate, have swivel plate 1253C's
Pallet 1251C rotates.By making pallet 1251C rotate, it is possible to make the face in the outside of pallet and the face of inner side exchange.
The situation making the face in the outside of pallet and the face of inner side exchange is referred to as the upset of pallet.Will be explained in afterwards utilizing torr
The pallet rotary movement that the rotation of dish is carried out.
Fig. 6 is for the flow chart being deposited with operation that the evaporation coating device 100 of the present invention is carried out is described.
In step S1010 of Fig. 6, detect rotation reference position.Afterwards by the detection of explanation rotation reference position.
In step S1020 of Fig. 6, vault 110 is made to rotate regulation week number.During this period, evaporation process is utilized to exist
Desired film is formed on workpiece.As an example, the rotary speed of the vault 110 in evaporation is rotation per minute 10 weeks
(10rpm)。
In step S1030 of Fig. 6, it is determined whether the process for the workpiece of all terminates the most.If all
The process of workpiece terminate, then terminate to be deposited with operation.If the process of any one workpiece does not terminates, then enter step
S1040。
In step S1040 of Fig. 6, carry out at least one party in the switching of pallet and the upset of pallet.Afterwards, return
Return to step S1010.The switching of pallet and the upset of pallet can be carried out in any order.As it has been described above, pallet
Switching and the upset of pallet be to carry out in the rotation of vault 110.As an example, the switching of pallet and pallet
The rotary speed of the vault 110 during upset is rotation per minute 2 weeks (2rpm).Will be explained in cutting of pallet afterwards
Move and make and the rotary movement of pallet.
Even if the situation at evaporation coating device 100 without the switching mechanism of pallet or the switching mechanism with pallet are the most only
In the case of a face of pallet is mounted with workpiece, do not carry out the upset of pallet.
Fig. 7 is for evaporation preparation process and the steaming that the evaporation coating device of conventional evaporation coating device and the present invention carries out is described
The figure of plating step.
In the case of using conventional evaporation coating device, implement below step successively.
Step 1), 2) and 4) be evaporation preparation process.The required time of each step of above-mentioned time representation.Film forming is accurate
Standby step includes the preparation etc. of vapor deposition source 120.Vacuum step includes the row using air vent 135 to carry out chamber 130
Gas, becomes the vacuum of regulation in making chamber.Film formation step includes evaporation process.Atmosphere opening step includes making chamber
130 to atmosphere opening.
In the case of the evaporation coating device 100 using the present invention, implement below step successively.The most here, explanation
Do not carry out the upset of pallet and only carry out the situation of the switching of pallet.
Step 1), 2), 4), 6) and 8) be evaporation preparation process.Film forming preparation process, vacuum step, one-tenth
Film step is identical with the situation using conventional evaporation coating device with atmosphere opening step.
Here, by the evaporation step relative to overall required time (evaporation step and the required time of evaporation preparation process)
Rapid required time represents the efficiency in the case of efficiency, and the evaporation coating device conventional to use and uses the steaming of the present invention
Efficiency in the case of plating appts 100 compares.Use the efficiency in the case of conventional evaporation coating device as follows.
23/ (7+22+23+13)=35.4%
Use the efficiency in the case of the evaporation coating device 100 of the present invention as follows.
(23 × 3)/(7+22+23 × 3+3 × 2+13)=59.0%
So, the evaporation coating device 100 of the application of the invention, efficiency is significantly improved.
Then, shown in step S1040 of explanatory diagram 6, pallet switching that the rotation that utilizes rotating part 1200 is carried out
Action.
Fig. 8 is the flow chart of the pallet switching action utilizing the rotation of rotating part 1200 to carry out for explanation.
In step S2010 of Fig. 8, detect rotation reference position.Afterwards by the detection of explanation rotation reference position.
In step S2020 of Fig. 8, as it is shown on figure 3, make the 1st bar maintaining part 1501 drop to from position of readiness
Operating position.As a result of which it is, in the rotation of vault 110, the 1st bar 1503F and 1503R become can with set
It is placed in the state of impeller 1101 contact of framework 1100F.
In step S2030 of Fig. 8, rotating part 1200 rotates 120 degree, is arranged in the opening of vault 110
Pallet is switched to 1251B from 1251A.
Figure 10 A to Figure 10 L is for illustrating that rotating part 1200 rotates the figure of the action of 120 degree.
Figure 10 A illustrate the 1st bar 1503F contact with impeller 1101 before state.
Figure 10 B illustrates that the 1st bar 1503F contacts with impeller 1101 and make impeller 1101 and swivel plate 1103 to rotate
State after 90 degree.In fig. 1 ob, the 1st bar 1503R does not contacts with impeller 1101.
It addition, in illustrating Figure 10 A to Figure 10 L in front of rotating part 1200, bar moves from right to left.
Figure 10 C illustrates that the 1st bar 1503R contacts with impeller 1101 and make impeller 1101 and swivel plate 1103 to enter one
State after step 90-degree rotation.The pin 1105 of swivel plate 1103 engages with the groove of sheave 1211, makes sheave 1211
Rotate 30 degree.
As shown in Figure 10 A to Figure 10 C, the 1st bar 1503F and 1503R makes swivel plate 1103 revolve turnback, makes
Sheave 1211 rotates 30 degree.
As shown in Figure 10 D to Figure 10 F, when vault 110 further rotates 1 week, the 1st bar 1503F and 1503R
Make swivel plate 1103 further rotate 180 degree, make sheave 1211 further rotate 30 degree.
As shown in Figure 10 G to Figure 10 I, when vault 110 further rotates 1 week, the 1st bar 1503F and 1503R
Make swivel plate 1103 further rotate 180 degree, make sheave 1211 further rotate 30 degree.
As shown in Figure 10 J to Figure 10 L, when vault 110 further rotates 1 week, the 1st bar 1503F and 1503R
Make swivel plate 1103 further rotate 180 degree, make sheave 1211 further rotate 30 degree.
So, when vault 110 rotates 4 weeks, rotating part 1200 rotates 120 degree, is arranged in opening of vault 110
Pallet in Kou is switched to 1251B from 1251A.
In step S2040 of Fig. 8, identify pallet and confirm the position of pallet.Afterwards by the identification of explanation pallet.
Then, the rotary movement of the pallet shown in step S1040 of explanatory diagram 6.
Fig. 9 is the flow chart of the rotary movement for pallet is described.
In step S3010 of Fig. 9, detect rotation reference position.Afterwards by the detection of explanation rotation reference position.
In step S3020 of Fig. 9, the 2nd bar maintaining part 1541 is made to decline from position of readiness as shown in Figure 5
To operating position.As a result of which it is, in the rotation of vault 110, the 2nd bar 1543F and 1543R becomes can be with
It is arranged at the state of impeller 1231A, 1231B or 1231C contact of rotating part 1200.
In step S3030 of Fig. 9, pallet rotation turnback.
Figure 11 A to Figure 11 C is the figure of the action for pallet 1253A rotation turnback is described.
Figure 11 A illustrate the 2nd bar 1543F contact with impeller 1231A before state.
Figure 11 B illustrates that the 2nd bar 1543F contacts and make impeller 1231A and swivel plate 1233A with impeller 1231A
State after 90-degree rotation.When swivel plate 1233A 90-degree rotation, by gear and swivel plate 1233A card
The swivel plate 1253A also 90-degree rotation closed, pallet 1251A also 90-degree rotation.In Figure 11 B, the 2nd bar 1543R
Do not contact with impeller 1231A.
It addition, as it has been described above, in illustrating Figure 10 A to Figure 10 L in front of rotating part 1200, bar is from right to left
Mobile, on the other hand, in illustrating Figure 11 A to Figure 11 C at the back side of rotating part, bar moves from left to right.
Figure 11 C illustrates that the 2nd bar 1543R contacts and make impeller 1231A and swivel plate 1233A with impeller 1231A
Further rotate the state after 90 degree.
So, when vault 110 rotates 1 week, pallet rotation turnback.
In step S3040 of Fig. 9, identify and confirm the face of pallet.Afterwards by the identification in the face of explanation pallet.
Then, identification and the rotation reference position detection in the face of the identification of pallet, pallet are described.
Figure 12 is identification and the figure of rotation reference position detection in the face for the identification of pallet, pallet are described.
Pallet 1251A, 1251B and 1251C are respectively provided with pallet and show with contact 1255A, 1255B and 1255C.
Fixed mechanism 1500 has the 1st contact maintaining part 1511 and is installed on 3 inspections of the 1st contact maintaining part 1511
Survey with contact 1513.As it is shown on figure 3, in the case of the 1st contact maintaining part 1511 is in operating position, at arch
In the rotation on top 110,3 detection contacts 1513 can show with contact 1255A, 1255B or 1255C with pallet
Contact.Owing to pallet shows with contact 1255A, 1255B different with the shape of 1255C, it is possible to by detection
3 detection contact conditions between contact 1513 and pallet display contact, carry out the identification of 3 pallets.
Additionally, pallet 1251A, 1251B and 1251C be respectively provided with 2 pallet faces show with contact 1257AT and
1257AB, 1257BT and 1257BB and 1257CT and 1257CB.Fixed mechanism 1500 has the 2nd contact
Maintaining part 1521 and be installed on 3 detection contacts 1523 of contact maintaining part 1521.In the 2nd contact maintaining part
In the case of 1521 are in operating position, in the rotation of vault 110, such as can in 3 detection contacts 1523
Show with pallet face and contact with contact 1257AT or 1257AB.Owing to pallet face shows the shape with contact 1257AT
Shape is different from the shape of display contact, pallet face 1257AB, it is possible to by 3 detection contacts 1523 of detection
And pallet face shows with the contact condition between 1257AT or 1257AB of contact, carries out the identification in pallet face.It addition,
It can also be 2 for carrying out the detection contact of the identification in pallet face.
Be arranged in multiple tray holding member 1000 of vault 110 3 pallet 1251A kept,
1251B and 1251C is respectively provided with rotation reference position and shows with contact 1256A, 1256B and 1256C.Fixing machine
Structure 1500 has the 3rd contact maintaining part 1531 and is installed on 1 detection contact 1533 of contact maintaining part 1531.
In the case of the 3rd contact maintaining part 1531 is in operating position, in the rotation of vault 110, detection contact
1533 can show with rotation reference position and contact with contact 1256A, 1256B or 1256C.In such manner, it is possible to inspection
Survey the rotation reference position of vault 110.
Figure 13 is that the evaporation coating device being shown through the present invention forms the optical element of film and by prior art on surface
Evaporation coating device forms the figure of the relation between optical element, light wavelength and the reflectance of film on surface.Figure 13's
Transverse axis represents the wavelength of light, and the longitudinal axis of Figure 13 represents reflectance.In fig. 13, solid line represents the steaming by the present invention
Plating appts forms the relation between optical element, light wavelength and the reflectance of film on surface, and dotted line represents by existing
The evaporation coating device having technology forms the relation between optical element, light wavelength and the reflectance of film on surface.According to
Figure 13, forms the reflectance of optical element of film relative to the distribution of wavelength by the evaporation coating device of the present invention on surface
Real relative to the distribution of wavelength with the reflectance of the optical element being formed film by the evaporation coating device of prior art on surface
In matter as broad as long.
Figure 14 is the figure of the Optical Monitoring for evaporation process is described.Prison installed by vault 110 at evaporation coating device 100
Visual organ glass 210, makes light from the back side of monitor glass 210 with the incident angles specified by light projector, passes through
Light-receiving device measures the light quantity of reflection light.When the vacuum state in chamber changes, the evaporation of monitor glass 210
The refractive index of film changes, thus the light quantity reflecting light changes.Therefore, it is possible to by the light measuring reflection light
Amount, the change to the vacuum state in chamber monitors.
Figure 15 A to Figure 15 D is to illustrate the process time of the film from the 1st layer to the 4th layer and the light quantity of reflection light
The figure of relation.Transverse axis represents the process time, and the longitudinal axis represents the light quantity of the reflection light measured by light-receiving device.At figure
In 15A to Figure 15 D, solid line represents the above-mentioned relation in the case of the evaporation coating device of the present invention, and dotted line represents existing
Above-mentioned relation in the case of the evaporation coating device of technology.The 100% of light quantity is the light quantity of incident illumination.The evaporation of the present invention
The light quantity of reflection light in the case of device and the light quality entity of the reflection light in the case of the evaporation coating device of prior art
Upper as broad as long.If the vacuum state in the operating condition of evaporation process, i.e. chamber changes, it is considered to reflection is arrived
Time in the light quantity of reflection light, even with the evaporation coating device of the present invention, with the situation of the evaporation coating device using prior art
Comparing, the operating condition of evaporation process is the most constant.
So, the evaporation coating device of the present invention can be with the light of the production of higher production efficiency with the evaporation coating device of prior art
Learn the optical element of element equal in quality.
Although being explained above tray holding member possess the situation of 3 pallets, but tray holding member can also possessing 4
Individual above pallet.
Claims (7)
1. a tray holding member, it has: framework, it has the 1st rotary part；And rotating part, its tool
There is the 2nd rotary part, and be mounted to together with described 2nd rotary part revolve around the axle supported by described framework
Turn, in described tray holding member,
Described rotating part has the multiple workpiece holding pallets configured around described axle,
Described 2nd rotary part is configured to, and is rotated together with described rotating part by described 1st rotary part.
2. an evaporation coating device, it has:
Vapor deposition source；
The vault that can rotate, it covers described vapor deposition source, and has at least one opening；
At least one the 1st bar, it is arranged at the outside of described vault；And
Tray holding member described in claim 1,
Described tray holding member covers with the face of 1 workpiece holding pallet in the plurality of workpiece holding pallet
The mode of at least one opening described is arranged at described vault,
At least one the 1st bar described is configured to, it is possible to be in the rotation of described vault not with described 1st rotating part
The position of readiness of part contact and the working position that can contact with described 1st rotary part in the rotation of described vault
Put,
Described 1st rotary part is configured to, in the case of at least one the 1st bar described is in operating position, in institute
State in the rotation of vault, rotate by contacting with at least one the 1st bar described,
Described 2nd rotary part is configured to, and with in the rotation of described vault, covers described opening to being configured to its face
The mode that switches over of workpiece holding pallet, rotated together with described rotating part by described 1st rotary part.
Evaporation coating device the most according to claim 2, wherein,
Described evaporation coating device also has at least one the 1st detection contact in the outside being arranged on described vault,
Described rotating part also has pallet and shows that with contact, this pallet shows and keeps with the plurality of workpiece respectively with contact
Corresponding, in the rotation of described vault, with at least one the 1st detection contact described with pallet.
4. according to the evaporation coating device described in Claims 2 or 3, wherein,
Described evaporation coating device also has at least one the 2nd bar in the outside being arranged on described vault,
Described rotating part has the 3rd corresponding with the plurality of workpiece holding pallet respectively rotary part,
The plurality of workpiece holding pallet is respectively provided with the 4th rotary part, and be installed to be can be with the described 4th
Rotary part rotates around the axle supported by described rotating part together,
At least one the 2nd bar described is configured to, it is possible to be in the rotation of described vault not with described 3rd rotating part
The position of readiness of part contact and the working position that can contact with described 3rd rotary part in the rotation of described vault
Put,
Described 3rd rotary part is configured to, in the case of at least one the 2nd bar described is in operating position, in institute
State in the rotation of vault, rotate by contacting with at least one the 2nd bar described,
Described 4th rotary part is configured to, in the way of making the upset of the plurality of workpiece holding pallet respectively, respectively
Rotated together with the plurality of workpiece holding pallet by described 3rd rotary part.
Evaporation coating device the most according to claim 4, wherein,
Described evaporation coating device also has at least one the 2nd detection contact in the outside being arranged on described vault,
The plurality of workpiece holding pallet is also respectively provided with pallet face and shows that with contact, this pallet face shows and exists with contact
In the rotation of described vault, with at least one the 2nd detection contact described.
6. according to the evaporation coating device described in any one in claim 2 to 5, wherein,
Described evaporation coating device also has the 3rd detection contact in the outside being arranged on described vault,
At least one workpiece holding tray holding member includes multiple workpiece holding tray holding member,
In the plurality of workpiece holding tray holding member one also has the display of at least one rotation reference position and uses
Contact, this at least one rotation reference position shows with contact in the rotation of described vault, uses with described 3rd detection
Contact.
7. according to the evaporation coating device described in any one in claim 2 to 6, wherein,
Described rotating part has 3 workpiece holding pallets.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510184179.5A CN106148897B (en) | 2015-04-17 | 2015-04-17 | Evaporation coating device and tray holding member |
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| CN201510184179.5A CN106148897B (en) | 2015-04-17 | 2015-04-17 | Evaporation coating device and tray holding member |
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| CN106148897B CN106148897B (en) | 2019-10-29 |
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Citations (4)
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|---|---|---|---|---|
| JP2009155683A (en) * | 2007-12-26 | 2009-07-16 | Nisca Corp | Method for forming film of optical filter, apparatus for manufacturing optical filter, optical filter, and apparatus for adjusting amount of imaging light |
| JP2011179102A (en) * | 2010-03-04 | 2011-09-15 | Panasonic Corp | Vapor deposition apparatus for lens |
| CN202181347U (en) * | 2011-07-26 | 2012-04-04 | 御林汽配(昆山)有限公司 | Improved transmission mechanism of vacuum coating machine |
| CN202499902U (en) * | 2012-03-16 | 2012-10-24 | 北京北仪创新真空技术有限责任公司 | Substrate holder capable of achieving automatically overturning |
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2015
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009155683A (en) * | 2007-12-26 | 2009-07-16 | Nisca Corp | Method for forming film of optical filter, apparatus for manufacturing optical filter, optical filter, and apparatus for adjusting amount of imaging light |
| JP2011179102A (en) * | 2010-03-04 | 2011-09-15 | Panasonic Corp | Vapor deposition apparatus for lens |
| CN202181347U (en) * | 2011-07-26 | 2012-04-04 | 御林汽配(昆山)有限公司 | Improved transmission mechanism of vacuum coating machine |
| CN202499902U (en) * | 2012-03-16 | 2012-10-24 | 北京北仪创新真空技术有限责任公司 | Substrate holder capable of achieving automatically overturning |
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