CN201858869U - Mesh-belt absence type sintering furnace for silicon cells - Google Patents
Mesh-belt absence type sintering furnace for silicon cells Download PDFInfo
- Publication number
- CN201858869U CN201858869U CN2010205815839U CN201020581583U CN201858869U CN 201858869 U CN201858869 U CN 201858869U CN 2010205815839 U CN2010205815839 U CN 2010205815839U CN 201020581583 U CN201020581583 U CN 201020581583U CN 201858869 U CN201858869 U CN 201858869U
- Authority
- CN
- China
- Prior art keywords
- fixed
- zone
- sintering furnace
- stand
- carriage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model discloses a mesh-belt absence type sintering furnace for silicon cells. The mesh-belt absence type sintering furnace comprises a charging platform, a tunnel type sintering box, a discharging platform and a silicon wafer conveying device; a preheating and glue-dumping zone, a heating zone, a sintering zone and a cooling zone are arranged in the vertical direction of the tunnel type sintering box in sequence; heat insulation plates and air flow heat insulation doors are uniformly arranged among the zones; heating lighting tubes are arranged in the preheating and glue-dumping zone, the heating zone and the sintering zone; a reciprocating elevation mechanism is arranged between a fixed bottom plate and a movable plate; a reciprocating translation mechanism is arranged between the fixed bottom plate and a sliding plate; the sliding plate carries out the upward elevation, the forward translation, the downward movement and the backward translation relative to the fixed bottom plate in sequence; and the silicon wafer conveying device comprises a fixed bracket and a movable bracket. As the heat insulation plates and the air flow heat insulation doors are arranged among the zones, the temperature zones are effectively divided, the temperature in each temperature zone is more close to the requirements of the sintering process, the tunnel sintering zone is isolated from the atmosphere, the sintering efficiency is improved, the heat consumption of the sintering furnace is also reduced, and the furnace body of the whole sintering furnace is shortened.
Description
Technical field:
The utility model relates to a kind of production equipment of photovoltaic cell, relates in particular to the silicon cell sintering furnace.
Background technology:
In the whole production technological process of solar cell piece, diffusion, plated film and sintering three process are the most important, and wherein sintering is to make the crystalline silicon substrate really have a vital step of photoelectric converting function.Therefore, the performance quality of agglomerating plant directly affects the quality of battery sheet.
At present, the net belt type tunnel sintering furnace that manufacture of solar cells both domestic and external manufacturing firm generally uses American-European enterprise to produce, sintering furnace vertically on be provided with preheating binder removal district successively, heating zone, sintering zone and cooling area, heating fluorescent tube at zones of different layout different densities is controlled each regional temperature, the silicon chip that prints electrode transmits by guipure, pass through the different furnace temperature district of sintering furnace successively, finish the preheating binder removal, heat up, the electrode sintering process of sintering and cooling, though this net belt type tunnel sintering technology comparative maturity, but vertical floor space of whole sintering furnace is big, need the very long body of heater of design could guarantee the preheating binder removal of silicon chip in the tunnel transmission course, heat up, sintering, temperature-fall period, particularly the high temperature sintering district need be between 850-950 ℃, need the length of tunnel of design 2-3 rice just can reach so high temperature, this makes that the volume of net belt type sintering furnace is all huger.If it is just indeterminate to dwindle the furnace temperature district of net belt type tunnel sintering furnace then, can't satisfy the sintering process requirement.In addition, high temperature resistant guipure in the process of running, need be inside and outside body of heater cycle operation, guipure partly follows silicon chip to accept the process that heats up and lower the temperature, therefore, and in operation process, guipure can carry out a large amount of heats in stove, and this part heat will be all as loss, has not only caused the waste of big energy, and the operating ambient temperature that raise, especially in tight hot summer, operating personnel's stream time can only be at 2 hours, otherwise, the operator just easily in administration.
The utility model content:
In order to overcome the deficiency of existing solar cell net belt type tunnel sintering furnace, the utility model provides a kind of no guipure silicon cell sintering furnace.
The technical scheme that the utility model adopted is:
Described no guipure silicon cell sintering furnace, it comprises loading bay, tunnel type sinter box, discharge pedestal, silicon chip conveying device and furnace body frame, vertically be provided with preheating binder removal district, heating zone, sintering zone and four zones of cooling area successively along the tunnel type sinter box, it is characterized in that: between preheating binder removal district, heating zone, sintering zone and cooling area, be equipped with thermal insulation board, in preheating binder removal district, heating zone and sintering zone, be provided with the heating fluorescent tube; The structure of discharge pedestal is identical with the structure of loading bay, and both are symmetrical arranged, they all comprise fixed base plate, fixed mount, guide post, fairlead, portable plate, slide rail and sliding panel, slide rail is separately fixed on the portable plate, sliding panel is set on the slide rail, portable plate is connected with fixed base plate by the sleeve structure of guide post and fairlead respectively, and fixed base plate all is installed on the furnace body frame; Between fixed base plate and portable plate, be provided with reciprocal elevating mechanism, between fixed base plate and sliding panel, be provided with reciprocal translation mechanism, back and forth elevating mechanism drive portable plate is periodically finished with respect to fixed base plate and is risen and down maneuver, and back and forth translation mechanism drive sliding panel is periodically finished reach with respect to portable plate and moved work with the back; The silicon chip conveying device comprises analog bracket and movable support bracket, the two ends of analog bracket are separately fixed on the fixed mount in loading bay and the discharge pedestal, the two ends of movable support bracket are separately fixed on the sliding panel in loading bay and the discharge pedestal, and analog bracket is between two adjacent movable support brackets.
Further, the sleeve structure liftable by four guide posts and fairlead is slidingly connected between portable plate and fixed base plate; Sleeve structure liftable by four guide posts and fairlead between portable plate and fixed base plate is slidingly connected.
Further, the structure of analog bracket and movable support bracket is identical, and they all comprise quartz glass tube, metallic sheath, stand-off and stop screw, and stand-off is fixed on the metallic sheath, be provided with screwed hole on metallic sheath, metallic sheath is fixed on the quartz glass tube equally spacedly by stop screw.
Further, on quartz glass tube, in axial direction have spacing hole equidistantly; On metallic sheath, also be provided with opening.
Further, described stand-off is made by steel wire, scribbles ceramic coating in Steel Wire Surface.
Further, the two ends of analog bracket are installed on the fixed base plate respectively by ear seat, fixed mount, two stand-offs are fixed on the metallic sheath symmetrically, and the overhanging pin section of stand-off is higher than the exposed junction that is installed in the stop screw on the metallic sheath, and the distance between the overhanging pin section of two stand-offs is 0.70～0.90 of a silicon chip width.
Further, the two ends of movable support bracket are installed in respectively on the sliding panel by the ear seat, and described movable support bracket is divided into double-legged carriage, left foot carriage and right crus of diaphragm carriage, and in double-legged carriage, two stand-offs are fixed on the metallic sheath symmetrically; In the left foot carriage, a stand-off is fixed on the right side of metallic sheath; In the right crus of diaphragm carriage, a stand-off is fixed on the left side of metallic sheath; All stand-offs on both feet carriage, left foot carriage and the right crus of diaphragm carriage are all in the same plane, and the distance between the overhanging end of adjacent stand-off is 0.70～0.90 of a silicon chip width on left foot carriage and the double-legged carriage; Distance on right crus of diaphragm carriage and the double-legged carriage between the overhanging end of adjacent stand-off is 0.70～0.90 of a silicon chip width.
Further, described reciprocal elevating mechanism comprises horizontal push A, fork, rotating shaft, bearing block, eccentric wheel, roller, ear seat, traveling table and fixed base plate, rotating shaft is installed on the fixed base plate by bearing block, eccentric wheel is fixedly mounted in the rotating shaft, the upper end of fork is fixedly mounted in the rotating shaft, the lower end of fork and horizontal push A are hinged, and roller is fixed on by the ear seat on the lower surface of portable plate, and roller contacts with eccentric wheel.
Further, described reciprocal translation mechanism comprises horizontal push B, lever, ships and resell on another market, supporting base, slide block and upright slide rail, upright slide rail is fixed on the sliding panel vertically, slide block set is contained on the upright slide rail, the upper end and the slide block of lever are hinged, the lower end of lever and horizontal push B are hinged, and the middle part of lever is installed on the supporting base by shipping and reselling on another market, and supporting base is installed on the fixed base plate.
Further, between preheating binder removal district, heating zone, sintering zone and cooling area, be equipped with the air-flow insulated door, and press close to thermal insulation board, the air-flow insulated door comprises air jet pipe and suction tube, both all are provided with perpendicular to the tunnel direction is corresponding, be provided with circulating pump between air jet pipe and suction tube, the gas outlet of air jet pipe and circulating pump interlinks, and the air entry of suction tube and circulating pump interlinks.
Further, also be provided with the air-flow cavity volume between air jet pipe and suction tube, the air-flow cavity volume is connected with circulating pump.
Owing between each district, both be provided with thermal insulation board, be provided with the air-flow insulated door again, form the hot gas barrier by air jet pipe with the pressure reduction of suction tube, can separate warm area effectively, make the interior temperature of each warm area more near the sintering process requirement, and make sintering zone, tunnel and atmospheric isolation, both improved sintering efficient, reduce the sintering furnace heat exhaustion again, thereby can make the body of heater contraction in length of whole sintering furnace.When behind the silicon chip sintering by can fast cooling after being moved out of the sintering zone, tunnel, adopt this no guipure chip transmission mechanism, avoided transmitting device to move out of the tunnel and heat carried out the tunnel, save a large amount of heats.It is estimated, be standard with the 100MW production capacity, uses the efficient sintering furnace of no guipure to carry out the production of solar cell, but about 1,040,000 degree of conservation of power in every year, and only concerned power saves production cost about 1,000,000 yuans for solar cell manufacturer man every year.Reducing production costs is the necessary condition that the photovoltaic industry is moved towards large-scale application, for the sound development of photovoltaic industry very positive effect is arranged, and has responded China's energy-saving and emission-reduction policy, meets China's STRATEGIES OF SUSTAINABLE DEVELOPMENT target.
In the silicon chip conveying mechanism, movable support bracket and analog bracket all adopt set metal carrier structure on quartz glass tube, silicon chip only contact with stand-off on the metal bracket, and contact form is some contact or line contact, thereby reduces silicon chip metal ion contamination in sintering process.
Description of drawings:
Fig. 1 is the utility model overall structure schematic diagram;
Fig. 2 is the structural representation of tunnel type sinter box;
Fig. 3 is the structural representation of silicon chip conveying device;
Fig. 4, Fig. 5 are the distribution schematic diagram of analog bracket and movable support bracket in the silicon chip conveying device;
Fig. 5 is a vertical view among Fig. 4, and Fig. 4 is a C-C cutaway view among Fig. 5;
Fig. 6 is the structural representation of analog bracket in the silicon chip conveying device;
Fig. 7 is the structural representation (single pin carriage) of movable support bracket in the silicon chip conveying device;
Fig. 8 is the structural representation (double-legged carriage) of movable support bracket in the silicon chip conveying device;
The air-flow insulation system schematic diagram of Fig. 9 between preheating binder removal district 21, heating zone 22, sintering zone 23 and cooling area 24, being provided with;
Figure 10 is the structural representation of carriage;
Among the figure: 1 is loading bay; 2 is the tunnel type sinter box; 3 is discharge pedestal; 4 is the silicon chip conveying device; 5 is furnace body frame; 8 is the air-flow insulated door; 11,31 is fixed base plate; 12,32 is fixed mount; 13,33 is guide post; 14,34 is fairlead; 15,35 is portable plate; 16,36 is slide rail; 17,37 is sliding panel; 21 are preheating binder removal district; 22 is heating zone; 23 is the sintering zone; 24 is cooling area; 25 is thermal insulation board; 26 are the heating fluorescent tube; 41 is analog bracket; 411 is quartz glass tube; 412 is metallic sheath; 413 is stand-off; 414 is stop screw; 415 is spacing hole; 416 is screwed hole; 417 is opening; 418 is ceramic coating; 42 is movable support bracket; 43 is the ear seat; 61 is horizontal push A; 62 is fork; 63 are rotating shaft; 64 is bearing block; 65 is eccentric wheel; 66 is roller; 67 is the ear seat; 71 is horizontal push B; 72 is lever; 73 for shipping and reselling on another market; 74 is supporting base; 75 is slide block; 76 is upright slide rail; 81 is air jet pipe; 82 is suction tube; 83 is the air-flow cavity volume; 84 is circulating pump.
The specific embodiment:
Below in conjunction with the explanation accompanying drawing specific embodiment of the present utility model is described:
Described no guipure silicon cell sintering furnace is made up of loading bay 1, tunnel type sinter box 2, discharge pedestal 3, silicon chip conveying device 4 and furnace body frame 5, as shown in Figure 1; Wherein, vertically be provided with preheating binder removal district 21, heating zone 22, sintering zone 23 and 24 4 zones of cooling area successively along tunnel type sinter box 2, between preheating binder removal district 21, heating zone 22, sintering zone 23 and cooling area 24, be equipped with thermal insulation board 25 and air-flow insulated door 8, in preheating binder removal district 21, heating zone 22 and sintering zone 23, be provided with heat radiation heating fluorescent tube 26, thermal insulation board 25 is provided with perpendicular to the tunnel direction, air-flow insulated door 8 is arranged on a side of thermal insulation board 25, as shown in Figure 2; Described loading bay 1 comprises fixed base plate 11, fixed mount 12, guide post 13, fairlead 14, portable plate 15, slide rail 16 and sliding panel 17, fixed mount 12 is installed on the fixed base plate 11, portable plate 15 is sleeved in the corresponding fairlead 14 by four guide posts 13, fairlead 14 is fixed on the fixed base plate 11, slide rail 16 is fixed on the portable plate 15, and sliding panel 17 is sleeved on the slide rail 16; The structure of discharge pedestal 3 is identical with the structure of loading bay 1, and be symmetrical arranged with loading bay 1, it comprises fixed base plate 31, fixed mount 32, guide post 33, fairlead 34, portable plate 35, slide rail 36 and sliding panel 37, fixed mount 32 is installed on the fixed base plate 31, portable plate 35 is sleeved in the corresponding fairlead 34 by four guide posts 33, fairlead 34 is fixed on the fixed base plate 31, and slide rail 36 is fixed on the portable plate 35, and sliding panel 37 is sleeved on the slide rail 36; Between fixed base plate 11,31 and portable plate 15,35, be provided with reciprocal elevating mechanism, between furnace body frame 5 and sliding panel 17,37, be provided with reciprocal translation mechanism, back and forth elevating mechanism drives portable plate 15,35 and periodically finishes rising and down maneuver with respect to fixed base plate 11,31, reciprocal translation mechanism drives sliding panel 17,37 and periodically finishes the mobile work of reach and back with respect to portable plate 15,35, as shown in Figure 3; Silicon chip conveying device 4 comprises analog bracket 41 and movable support bracket 42, the two ends of analog bracket 41 are fixed on the fixed mount 12,32 in loading bay 1 and the discharge pedestal 3 by ear seat 43, the two ends of movable support bracket 42 are fixed on the sliding panel 17,37 in loading bay 1 and the discharge pedestal 3 by ear seat 43, analog bracket 41 is between two adjacent movable support brackets 42, as Fig. 4, shown in Figure 5; Analog bracket 41 is identical with the structure of movable support bracket 42, they all comprise quartz glass tube 411, metallic sheath 412, stand-off 413 and stop screw 414, stand-off 413 is fixed on the metallic sheath 412, on metallic sheath 412, be provided with screwed hole 416 and opening 417, on quartz glass tube 411, in axial direction have spacing hole 415 equidistantly; Metallic sheath 412 is fixed on the quartz glass tube 411 equally spacedly by stop screw 414, and described stand-off 413 is made by steel wire, scribbles ceramic coating 418 in Steel Wire Surface.The two ends of analog bracket 41 are installed in respectively on the fixed base plate 11,31 by ear seat 43, fixed mount 12,32, two stand-offs 413 are fixed on the metallic sheath 412 symmetrically, and the overhanging pin section of stand-off 413 is higher than the exposed junction of the stop screw 414 that is installed on the metallic sheath 412, and the distance between the overhanging pin section of two stand-offs 413 is 0.70～0.90 of a silicon chip width; The two ends of movable support bracket 42 are installed in respectively on the sliding panel 17,37 by ear seat 43, and described movable support bracket 42 is divided into double-legged carriage, left foot carriage and right crus of diaphragm carriage, and in double-legged carriage, two stand-offs 413 are fixed on the metallic sheath 412 symmetrically; In the left foot carriage, a stand-off 413 is fixed on the right side of metallic sheath 412; In the right crus of diaphragm carriage, a stand-off 413 is fixed on the left side of metallic sheath 412; All stand-offs 413 on both feet carriage, left foot carriage and the right crus of diaphragm carriage are all in the same plane, and the distance between the overhanging end of adjacent stand-off 413 is 0.70～0.90 of a silicon chip width on left foot carriage and the double-legged carriage; Distance on right crus of diaphragm carriage and the double-legged carriage between the overhanging end of adjacent stand-off 413 is 0.70～0.90 of a silicon chip width.
Described reciprocal elevating mechanism comprises horizontal push A61, fork 62, rotating shaft 63, bearing block 64, eccentric wheel 65, roller 66, ear seat 67, traveling table 15,35 and fixed base plate 11,31, rotating shaft 63 is installed on the fixed base plate 11,31 by bearing block 64, eccentric wheel 65 is fixedly mounted in the rotating shaft 63, the upper end of fork 62 is fixedly mounted in the rotating shaft 63, the lower end of fork 62 and horizontal push A61 are hinged, roller 66 is fixed on by ear seat 67 on the lower surface of portable plate 15,35, and roller 66 contacts with eccentric wheel 65.
Described reciprocal translation mechanism comprises horizontal push B71, lever 72, ship and resell on another market 73, supporting base 74, slide block 75 and upright slide rail 76, upright slide rail 76 is fixed on the sliding panel 17,37 vertically, slide block 75 is sleeved on the upright slide rail 76, the upper end of lever 72 and slide block 75 are hinged, the lower end of lever 72 and horizontal push B71 are hinged, the middle part of lever 72 73 is installed on the supporting base 74 by shipping and reselling on another market, and supporting base 74 is installed on the fixed base plate 11,31.
Between preheating binder removal district 21, heating zone 22, sintering zone 23 and cooling area 24, be equipped with air-flow insulated door 8, thermal insulation board 25 is pressed close in the position that is provided with of air-flow insulated door 8, air-flow insulated door 8 comprises air jet pipe 81 and suction tube 82, both all are provided with perpendicular to the tunnel direction is corresponding, between air jet pipe 81 and suction tube 82, be provided with air-flow cavity volume 83 and circulating pump 84, air-flow cavity volume 83 is connected with circulating pump 84, air jet pipe 81 interlinks with the gas outlet of circulating pump 84, suction tube 82 interlinks with the air entry of circulating pump 84, as shown in figure 10.
Claims (11)
1. no guipure silicon cell sintering furnace, it is characterized in that: described no guipure silicon cell sintering furnace, it comprises loading bay (1), tunnel type sinter box (2), discharge pedestal (3), silicon chip conveying device (4) and furnace body frame (5), vertically be provided with preheating binder removal district (21) successively along tunnel type sinter box (2), heating zone (22), (24) four zones of sintering zone (23) and cooling area, it is characterized in that: in preheating binder removal district (21), heating zone (22), be equipped with thermal insulation board (25) between sintering zone (23) and the cooling area (24), in preheating binder removal district (21), be provided with heating fluorescent tube (26) in heating zone (22) and sintering zone (23); The structure of discharge pedestal (3) is identical with the structure of loading bay (1), and both are symmetrical arranged, they all comprise fixed base plate (11,31), fixed mount (12,32), guide post (13,33), fairlead (14,34), portable plate (15,35), slide rail (16,36) and sliding panel (17,37), slide rail (16,36) be separately fixed at portable plate (15,35) on, sliding panel (17,37) be set in slide rail (16,36) on, portable plate (15,35) respectively by guide post (13,33) and fairlead (14,34) sleeve structure and fixed base plate (11,31) be connected fixed base plate (11,31) all be installed on the furnace body frame (5); Between fixed base plate (11,31) and portable plate (15,35), be provided with reciprocal elevating mechanism, between fixed base plate (11,31) and sliding panel (17,37), be provided with reciprocal translation mechanism, back and forth elevating mechanism drive portable plate (15,35) is periodically finished with respect to fixed base plate (11,31) and is risen and down maneuver, and back and forth translation mechanism drive sliding panel (17,37) is periodically finished reach with respect to portable plate (15,35) and moved work with the back; Silicon chip conveying device (4) comprises analog bracket (41) and movable support bracket (42), the two ends of analog bracket (41) are separately fixed on the fixed mount (12,32) in loading bay (1) and the discharge pedestal (3), the two ends of movable support bracket (42) are separately fixed on the sliding panel (17,37) in loading bay (1) and the discharge pedestal (3), and analog bracket (41) is positioned between the two adjacent movable support brackets (42).
2. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: between portable plate (15) and fixed base plate (11), be slidingly connected by the sleeve structure liftable of four guide posts (13) with fairlead (14); Between portable plate (35) and fixed base plate (31), be slidingly connected by the sleeve structure liftable of four guide posts (33) with fairlead (34).
3. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: analog bracket (41) is identical with the structure of movable support bracket (42), they all comprise quartz glass tube (411), metallic sheath (412), stand-off (413) and stop screw (414), stand-off (413) is fixed on the metallic sheath (412), be provided with screwed hole (416) on metallic sheath (412), metallic sheath (412) is fixed on the quartz glass tube (411) equally spacedly by stop screw (414).
4. according to the described no guipure silicon cell sintering furnace of claim 3, it is characterized in that: on quartz glass tube (411), in axial direction have spacing hole (415) equidistantly; On metallic sheath (412), also be provided with opening (417).
5. according to the described no guipure silicon cell sintering furnace of claim 3, it is characterized in that: described stand-off (413) is made by steel wire, scribbles ceramic coating (418) in Steel Wire Surface.
6. according to the described no guipure silicon cell sintering furnace of claim 3, it is characterized in that: the two ends of analog bracket (41) are installed in respectively on the fixed base plate (11,31) by ear seat (43), fixed mount (12,32), two stand-offs (413) are fixed on the metallic sheath (412) symmetrically, and the overhanging pin section of stand-off (413) is higher than the exposed junction of the stop screw (414) that is installed on the metallic sheath (412), and the distance between the overhanging pin section of two stand-offs (413) is 0.70～0.90 of a silicon chip width.
7. according to the described no guipure silicon cell sintering furnace of claim 3, it is characterized in that: the two ends of movable support bracket (42) are installed in respectively on the sliding panel (17,37) by ear seat (43), described movable support bracket (42) is divided into double-legged carriage, left foot carriage and right crus of diaphragm carriage, in double-legged carriage, two stand-offs (413) are fixed on the metallic sheath (412) symmetrically; In the left foot carriage, a stand-off (413) is fixed on the right side of metallic sheath (412); In the right crus of diaphragm carriage, a stand-off (413) is fixed on the left side of metallic sheath (412); All stand-offs (413) on both feet carriage, left foot carriage and the right crus of diaphragm carriage are all in the same plane, and the distance between the overhanging end of adjacent stand-off (413) is 0.70～0.90 of a silicon chip width on left foot carriage and the double-legged carriage; Distance on right crus of diaphragm carriage and the double-legged carriage between the overhanging end of adjacent stand-off (413) is 0.70～0.90 of a silicon chip width.
8. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: described reciprocal elevating mechanism comprises horizontal push A (61), fork (62), rotating shaft (63), bearing block (64), eccentric wheel (65), roller (66), ear seat (67), traveling table (15,35) and fixed base plate (11,31), rotating shaft (63) is installed in fixed base plate (11 by bearing block (64), 31) on, eccentric wheel (65) is fixedly mounted in the rotating shaft (63), the upper end of fork (62) is fixedly mounted in the rotating shaft (63), the lower end of fork (62) and horizontal push A (61) are hinged, roller (66) is fixed on portable plate (15 by ear seat (67), 35) on the lower surface, roller (66) contacts with eccentric wheel (65).
9. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: described reciprocal translation mechanism comprises horizontal push B (71), lever (72), ship and resell on another market (73), supporting base (74), slide block (75) and upright slide rail (76), upright slide rail (76) is fixed on sliding panel (17 vertically, 37) on, slide block (75) is sleeved on the upright slide rail (76), the upper end of lever (72) and slide block (75) are hinged, the lower end of lever (72) and horizontal push B (71) are hinged, the middle part of lever (72) is installed on the supporting base (74) by ship and resell on another market (73), and supporting base (74) is installed in fixed base plate (11,31) on.
10. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: in preheating binder removal district (21), heating zone (22), be equipped with air-flow insulated door (8) between sintering zone (23) and the cooling area (24), and press close to thermal insulation board (25), air-flow insulated door (8) comprises air jet pipe (81) and suction tube (82), both all are provided with perpendicular to the tunnel direction is corresponding, between air jet pipe (81) and suction tube (82), be provided with circulating pump (84), air jet pipe (81) interlinks with the gas outlet of circulating pump (84), and suction tube (82) interlinks with the air entry of circulating pump (84).
11. according to the described no guipure silicon cell sintering furnace of claim 1, it is characterized in that: also be provided with air-flow cavity volume (83) between air jet pipe (81) and suction tube (82), air-flow cavity volume (83) is connected with circulating pump (84).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205815839U CN201858869U (en) | 2010-10-29 | 2010-10-29 | Mesh-belt absence type sintering furnace for silicon cells |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205815839U CN201858869U (en) | 2010-10-29 | 2010-10-29 | Mesh-belt absence type sintering furnace for silicon cells |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201858869U true CN201858869U (en) | 2011-06-08 |
Family
ID=44104674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205815839U Expired - Lifetime CN201858869U (en) | 2010-10-29 | 2010-10-29 | Mesh-belt absence type sintering furnace for silicon cells |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201858869U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102062529A (en) * | 2010-10-29 | 2011-05-18 | 常州亿晶光电科技有限公司 | Mesh tape-free silicon cell slice sintering furnace |
-
2010
- 2010-10-29 CN CN2010205815839U patent/CN201858869U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102062529A (en) * | 2010-10-29 | 2011-05-18 | 常州亿晶光电科技有限公司 | Mesh tape-free silicon cell slice sintering furnace |
| CN102062529B (en) * | 2010-10-29 | 2013-09-25 | 常州亿晶光电科技有限公司 | Mesh tape-free silicon cell slice sintering furnace |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102062529B (en) | Mesh tape-free silicon cell slice sintering furnace | |
| CN202719846U (en) | Silicon chip drying oven capable of preventing metal ion contamination | |
| CN102809270B (en) | Silicon wafer drying furnace capable of preventing metal ion pollution and silicon wafer drying method | |
| CN201858873U (en) | Five-tube silicon wafer conveying device | |
| CN201858869U (en) | Mesh-belt absence type sintering furnace for silicon cells | |
| CN207793058U (en) | A kind of kiln chamber structure | |
| CN102605348A (en) | Transmission heating system and method | |
| CN201858874U (en) | Lifting mechanism of silicon chip moving bracket | |
| CN204537995U (en) | Roller bed type solar cell sintering and radiation annealing one continuous oven | |
| CN107631603B (en) | Silicon wafer drying furnace | |
| CN202380087U (en) | Thermal insulation system for heating cavity | |
| CN102052829B (en) | Lifting mechanism for silicon chip movable bracket | |
| CN110981210B (en) | Photovoltaic glass anti-reflection strengthening continuous production device and method | |
| CN201527177U (en) | Photovoltaic industry electrical furnace with thermal energy recycling device | |
| CN211367422U (en) | Photovoltaic glass anti-reflection strengthening continuous production device | |
| CN201858875U (en) | Bilateral shifting mechanism of silicon wafer movable brackets | |
| CN211946786U (en) | Curved surface glass hot bending equipment | |
| CN208517267U (en) | A kind of glass heat bender | |
| CN201527176U (en) | Photovoltaic industry electrical furnace with quick cooling device | |
| CN105423569A (en) | Manufacturing method for multipurpose flat type solar device and product thereof | |
| CN202076213U (en) | Cold-cathode lamp tube baking machine | |
| CN102032776A (en) | Left-and-right translating mechanism of silicon wafer moving bracket | |
| CN201858870U (en) | Full automatic high-efficiency energy-saving electric tunnel furnace | |
| CN101786074A (en) | Surface coating drying technology and special device for wind power tower | |
| CN215412138U (en) | Box type heat exchange station |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20110608 Effective date of abandoning: 20130925 |
|
| RGAV | Abandon patent right to avoid regrant |