CN201858874U - Lifting Mechanism of Wafer Moving Bracket - Google Patents

Abstract

A lifting mechanism for a moving bracket of a silicon wafer in a high-efficiency sintering furnace without a mesh belt, including a horizontal push rod, a swing rod, a rotating shaft, an eccentric wheel, a roller, a bearing seat, an ear seat, a movable table and a fixed bottom plate, and the rotating shaft passes through the bearing seat Installed on the fixed base plate, the eccentric wheel is fixedly installed on the rotating shaft, the upper end of the swing rod is fixedly mounted on the rotating shaft, the rotating shaft is rotatably installed on the fixed base plate, the lower end of the swing rod is hinged with the horizontal push rod, and the roller is rotatably installed On the lower end face of the plate, the roller is fixed on the movable plate through the lug seat, and the roller is in contact with the eccentric wheel. When the horizontal push rod moves left and right, the swing rod drives the rotating shaft to swing left and right. Since the eccentric wheel is fixedly installed on the rotating shaft, the eccentric wheel will also swing accordingly, thereby driving the movable plate to reciprocate and lift, satisfying the need for the movable bracket to move up and down relative to the fixed bracket. Rack lifting action requirements.

Description

Lifting Mechanism of Wafer Moving Bracket

Technical field:

The utility model relates to a silicon cell sintering furnace, in particular to a silicon chip conveying device in the silicon cell sintering furnace.

Background technique:

In the production process of solar cells, sintering is a crucial step to make the crystalline silicon substrate truly have the function of photoelectric conversion. Therefore, the performance of the sintering equipment directly affects the quality of the cell.

At present, solar cell manufacturers at home and abroad mainly use sintering furnaces produced by European and American companies. The structure of this type of sintering furnace is a mesh-belt tunnel sintering furnace. area, sintering area and cooling area, arrange heating lamps with different densities in different areas to control the temperature of each area, and the silicon wafers with printed electrodes are transported through the mesh belt, and pass through different furnace temperature areas of the sintering furnace in turn to complete the pre-heating process. The electrode sintering process of thermal debinding, heating up, sintering and cooling down, although this kind of mesh belt tunnel sintering technology is relatively mature, but the longitudinal footprint of the entire sintering furnace is large, and it is necessary to design a very long furnace body to ensure that the silicon wafers are kept in the tunnel. In the process of preheating, debinding, heating, sintering, and cooling during the transmission process, since the process temperature in the high-temperature sintering zone needs to be between 850-950°C, it is necessary to design a tunnel length of 2-3 meters to reach such a high temperature. Make the mesh belt type sintering furnace bulky. If it shrinks, it cannot meet the sintering process requirements. In addition, the high temperature resistant mesh belt needs to circulate around the inside and outside of the furnace during operation, and the mesh belt part is accompanied by the heating and cooling process of the silicon wafer. Therefore, during the operation, the mesh belt will carry a large amount of heat from the furnace. heat, and this part of heat will all be used as loss, which not only causes a lot of energy waste, but also increases the temperature of the working environment. Therefore, the applicant has developed a high-efficiency sintering furnace without mesh belt, which can well overcome the The disadvantages of the prior art are that the equipment occupies a small area, has high thermal efficiency, less power consumption, and remarkable energy-saving effect.

The high-efficiency sintering furnace without mesh belt comprises a feed table 1, a tunnel type sintering box 2, a discharge table 3, a silicon chip conveying device 4 and a furnace frame 5, as shown in Figure 1, along the tunnel type sintering box 2 There are four preheating and debinding zones 21, heating zone 22, sintering zone 23 and cooling zone 24 in sequence in the longitudinal direction. Insulation plate 25 and air flow cut-off door 8 are provided with heating lamp tube 26 in preheating debinding area 21, heating area 22 and sintering area 23, as shown in Figure 2; and between the discharge table 3, it includes a fixed bracket 41 and a movable bracket 42, and the two ends of the fixed bracket 41 are respectively fixed on the fixed mounts 12 and 32 in the feed table 1 and the discharge table 3, and the movable bracket The two ends of frame 42 are respectively fixed on the sliding plates 17,37 in the feed table 1 and the discharge table 3, and the fixed bracket 41 is positioned between two adjacent moving brackets 42; the feed table 1 and the discharge table 3 The same structure, all including fixed base plate 11,31, fixed frame 12,32, guide bar 13,33, guide sleeve 14,34, movable plate 15,35, slide rail 16,36 and sliding plate 17,37, movable plate 15,35 are connected with the set matching structure of guide rod 13,33 and guide sleeve 14,34 with fixed base plate 11,31, and slide rail 16,36 is fixed on movable plate 15,35, and slide plate 17,37 sets On slide rail 16,36, be provided with reciprocating lifting mechanism between fixed base plate 11,31 and movable plate 15,35, fixed base plate 11,31 is installed on the furnace frame 5, between fixed base plate 11,31 and sliding plate 17,37 is provided with a reciprocating translation mechanism 7, as shown in Figure 3, Figure 4, Figure 5, the reciprocating lifting mechanism drives the movable plate 15,35 to complete the rising and falling action periodically relative to the fixed base plate 11,31, reciprocating The translation mechanism 7 drives the sliding plates 17, 37 to move forward and backward periodically relative to the movable plates 15, 35, as shown in FIG. 3 . It can be seen that the reciprocating lifting mechanism and the reciprocating translation mechanism 7 are the core driving mechanisms in the high-efficiency sintering furnace without mesh belt.

Utility model content:

The purpose of the utility model is to provide a lifting mechanism for a silicon chip moving bracket for a high-efficiency sintering furnace without a mesh belt.

The technical scheme adopted in the utility model is:

The lifting mechanism of the silicon wafer mobile bracket includes a horizontal push rod, a swing rod, a rotating shaft, a bearing seat, an eccentric wheel, a roller, an ear seat, a movable plate and a fixed base plate, the rotating shaft is installed on the fixed base plate through the bearing seat, and the eccentric wheel Fixedly installed on the rotating shaft, the upper end of the swing rod is fixed on the rotating shaft, the rotating shaft is rotatably installed on the fixed base plate, the lower end of the swing rod is hinged with the horizontal push rod, the roller is fixed on the lower end surface of the movable plate through the ear seat, and the roller contact with the eccentric.

Because the roller is fixed on the movable plate through the ear seat, the rotating shaft is installed on the fixed base plate through the bearing seat, the eccentric wheel is fixedly installed on the rotating shaft, the upper end of the swing rod is fixedly installed on the rotating shaft, and the rotating shaft is rotatably installed on the fixed base plate. The lower end of the rod is hinged with the horizontal push rod, and the eccentric wheel is in contact with the roller. When the horizontal push rod translates left and right, the swing rod drives the rotating shaft to rotate positively and negatively within a certain angle range. Since the eccentric wheel is fixedly installed on the rotating shaft, the eccentric wheel also It rotates accordingly, thereby driving the movable plate to descend or rise to meet the lifting action requirements of the mobile bracket relative to the fixed bracket; it cooperates with the translation mechanism to make the mobile bracket continuously move the silicon wafers placed on the fixed bracket to the front handling.

Description of drawings:

Fig. 1 is the overall structure schematic diagram of no mesh belt sintering furnace;

Fig. 2 is the structural representation of the tunnel type sintering box in Fig. 1;

Fig. 3 is the structural schematic diagram of silicon chip conveying device;

Fig. 4 and Fig. 5 are schematic diagrams of the distribution of fixed brackets and movable brackets in the silicon wafer conveying device;

Fig. 5 is C-C sectional view among Fig. 4;

In the figure: 1 is the feeding platform; 2 is the tunnel-type sintering box; 3 is the discharging platform; 4 is the silicon wafer conveying device; 5 is the furnace frame; 7 is the reciprocating translation mechanism; 8 is the air flow partition door; 12 and 32 are fixed frames; 13 and 33 are guide rods; 14 and 34 are guide sleeves; 15 and 35 are movable plates; 16 and 36 are slide rails; 17 and 37 are sliding plates; 21 is preheating Glue removal area; 22 is the heating area; 23 is the sintering area; 24 is the cooling area; 25 is the heat insulation board; 26 is the heating lamp; 41 is the fixed bracket; 63 is a rotating shaft; 64 is a bearing seat; 65 is an eccentric wheel; 66 is a roller; 67 is an ear seat.

Detailed ways:

The lifting mechanism of the moving bracket for silicon wafers, as shown in Figure 3, includes a horizontal push rod 61, a swing rod 62, a rotating shaft 63, a bearing seat 64, an eccentric wheel 65, a roller 66, an ear seat 67, a movable plate 15, 35 and the fixed base plate 11,31, the rotating shaft 63 is installed on the fixed base plate 11,31 by the bearing seat 64, the eccentric wheel 65 is fixedly installed on the rotating shaft 63, and the upper end of the fork 62 is fixedly installed on the rotating shaft 63, and the rotating shaft 63 is rotatably Installed on the fixed base plate 11,31, the lower end of the fork 62 is hinged with the horizontal push rod 61, the roller 66 is fixed on the lower end surface of the movable plate 15,35 by the lug 67, and the roller 66 contacts with the eccentric wheel 65.

Claims (1)

1. the elevating mechanism of a silicon chip movable support bracket, it is characterized in that: comprise horizontal push (61), fork (62), rotating shaft (63), bearing block (64), eccentric wheel (65), roller (66), ear seat (67), portable plate (15,35) and fixed base plate (11,31), rotating shaft (63) is installed in fixed base plate (11 by bearing block (64), 31) on, eccentric wheel (65) is fixedly mounted in the rotating shaft (63), the upper end of fork (62) is fixedly mounted in the rotating shaft (63), rotating shaft (63) is installed in rotation on fixed base plate (11,31) on, the lower end of fork (62) and horizontal push (61) are hinged, roller (66) is fixed on portable plate (15 by ear seat (67), 35) on the lower surface, roller (66) contacts with eccentric wheel (65).

Images