CN201556600U - Scanning electronic microscope electronic backscatter diffraction test sample stand - Google Patents
Scanning electronic microscope electronic backscatter diffraction test sample stand Download PDFInfo
- Publication number
- CN201556600U CN201556600U CN2009202097913U CN200920209791U CN201556600U CN 201556600 U CN201556600 U CN 201556600U CN 2009202097913 U CN2009202097913 U CN 2009202097913U CN 200920209791 U CN200920209791 U CN 200920209791U CN 201556600 U CN201556600 U CN 201556600U
- Authority
- CN
- China
- Prior art keywords
- sample
- sample stage
- electron microscope
- scanning electron
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
A scanning electronic microscope electronic backscatter diffraction test sample stand comprises a rotary insertion type circular stand for holding a test sample and a socket type sample stand capable of being inserted into an insertion hole of the circular stand. A stand face, facing a direction of electronic backscatter diffraction, of the sample stand is a groove for the test sample to be inserted into, a test sample plane is parallel to the stand face, and the stand face, facing the direction of electronic backscatter diffraction, of the sample stand forms an included angle theta of 65-75degrees with a horizontal face. The scanning electronic microscope electronic backscatter diffraction test sample stand can be used for precise positioning of the test sample in testing a sample surface and section EBSD. In testing, a to-be-tested sample surface forms an included angle theta of 65-75degrees with the horizontal face with angular deviation controlled within 0.5degrees, and the to-be-tested sample surface is vertically upward along a rolling direction with angular deviation controlled within 0.3degrees. In precise positioning in testing the test sample section EBSD, an included angle theta of 65-75degrees with angular deviation controlled within 0.5degrees is guaranteed to be formed between the to-be-tested surface and the horizontal face, and the test sample section is guaranteed to be longitudinally vertically upward with angular deviation controlled within 0.3degrees.
Description
Technical field
The utility model relates to a kind of crystal structure microcell orientation and characterizes the device field of using, particularly, the utility model relates to a kind of scanning electron microscope electron back scattering diffraction sample sample stage, described scanning electron microscope electron back scattering diffraction sample is used for testing at material electronics back scattering diffraction (EBSD) with sample stage, at sample rolling direction be difficult to accurate location, sample to be tested was placed angle and is difficult to problems such as control when upper and lower surface was not parallel, provide and to carry out pinpoint sample stage to sample to be tested, improve the test accuracy thus.
Background technology
Configuration Electron Back-Scattered Diffraction device just can carry out microcell texture and misorientation analysis to sample on ESEM; Crystallite dimension and distribution of shapes analysis; Crystal boundary, subgrain and twin boundary property analysis; Strain and the analysis of crystallization again; Operations such as the identification of phases and the calculating of phase ratio.Obtain the unfailing test data, just must accurately locate, reduce the error that causes when sample is placed as far as possible placing sample.
The sample stage of material electronics back scattering diffraction (EBSD) sample that uses both at home and abroad is illustrated in fig. 3 shown below at present, at first is with the oblique partial application of a cylinder, obtains a scarf.Then, make this scarf and the horizontal plane θ that has angle, general θ is decided to be 70 °.Carrying out EBSD when test, at first standard sample is close on the inclined-plane sample stage, with the horizontal plane θ that has angle, simultaneously, also require a certain direction of standard sample straight up, in view of the above instrument is calibrated.Secondly, sample to be tested is attached on the inclined-plane sample stage, requires its surficial inclination and rolling direction and standard sample modes of emplacement in full accord.Directly sample is accurately located with this sample stage.
Yet, reach above-mentioned requirements, be still very difficulty.
Because, when as mentioned above specimen surface being done the EBSD test, be directly sample to be attached on the sample stage, the sample that this is parallel to each other for upper and lower surface can guarantee that specimen surface becomes a fixed angle θ with horizontal plane, satisfy test requirements document.Yet, running into the testing sample upper and lower surface when not parallel, if directly sample is attached on the sample stage, then described testing sample surface is not θ with the angle of horizontal plane, the angular deviation that causes has had the several years, thus, will inevitably bring bigger error to the orientation test.
In addition, when being placed on sample on the sample stage, usually, testing crew is to adopt the method for range estimation to observe and adjust the rolling direction of sample simply, and the rolling direction that makes sample straight up.At this moment, still can have what deviation, its rolling direction can reach 4～10 ° with the deviation of directivity straight up when serious, even bigger.Like this, the test accuracy is difficult to be guaranteed.
Have again,, similar problem is arranged also if the occasion that EBSD tests is done in the sample cross section.That is, if directly the sample cross section for preparing is attached on the sample stage, can exist because of lower section on the sample not parallelly, be not θ=70 ° thereby cause the angle of sample cross section and horizontal plane yet, and the angular deviation that causes has also had the several years.Observe and adjust the length direction (being generally rolling direction) in sample cross section simultaneously with the method for range estimation, make it straight up, also can have very big deviation, deviation can reach 4～10 °, even bigger.Like this, the test accuracy is difficult to be guaranteed.
For this reason, existing people has developed new technology.For example, be respectively in the patent No. in the utility model patent of " 200720157306.3 " and " 200720157305.9 ", a kind of like this technology is disclosed: utilize screw rod that one round platform is fixed in the ESEM operating room, then the Electron Back-Scattered Diffraction private jack is inserted in the round platform center hub, again specimen holder is installed in the jack of special-purpose seat fixing, at last sample is fixed on the specimen holder, sample is carried out EBSD detect.Yet this sample platform of scanning electronic microscope only provides a sample bogey, the position is not carried out by test requirements document in the sample to be tested plane and accurately locatees, and can't control effectively to the sample modes of emplacement, is difficult to the guarantee test accuracy.
The patent No. is the special-purpose specimen holder of a kind of Electron Back-Scattered Diffraction for the utility model patent of " 200720157303.X " relates to, and can be used to support a plurality of angles of inclination and be 70 ° special-purpose sample stage, can measure a plurality of samples simultaneously.Yet the sample stage of this patent disclosure has no doubt improved operating efficiency, but does not relate to the problems such as accurate location of sample yet.
The utility model patent of the patent No. " 200820002530.X " is a kind of sample platform of scanning electronic microscope collector, be that a metal round platform is installed in the ESEM operating room, on round platform, be provided with the logical circular hole of 4-8 equal portions as the sample platform of scanning electronic microscope loading attachment, disposable 4-8 the sample platform of scanning electronic microscope of packing into.Yet as above-mentioned, the sample stage of this patent disclosure has no doubt improved operating efficiency and guarantee ESEM vacuum degree, device such as does not accurately locate but relate to sample.
The utility model content
For overcoming described problem, the utility model proposes a kind of scanning electron microscope electron back scattering diffraction sample sample stage, described scanning electron microscope electron back scattering diffraction sample can be installed in the ESEM operating room with sample stage, to the pinpoint sample table device design of sample to be tested.Sample was accurately located when scanning electron microscope electron back scattering diffraction sample of the present utility model can be respectively applied for test sample surface and sample cross section EBSD with sample stage.
Scanning electron microscope electron back scattering diffraction sample of the present utility model is as follows with the sample stage technical scheme:
A kind of scanning electron microscope electron back scattering diffraction sample sample stage, comprise that the placement of Electron Back-Scattered Diffraction sample is with turning the female type round platform and can being inserted in the described Electron Back-Scattered Diffraction sample placement female type sample stage that turns the jack on the female type round platform, it is characterized in that, described female type sample stage is the groove of an insertion sample towards the table top of Electron Back-Scattered Diffraction direction, described groove two end-stopping plates are contour, two baffle plate top plan are in the same plane, and with the angle of horizontal plane be θ=65-75 °, described female type sample stage becomes angle towards the table top of Electron Back-Scattered Diffraction direction with horizontal plane be θ=65-75 °.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that, the groove surfaces top and the bottom of described insertion sample cover the flat board that covers with respectively, the middle part is penetrating, the dull and stereotyped inner surface that cover described top and the bottom is in the same plane, and with the angle of horizontal plane be θ=65-75 °, two dull and stereotyped outer surface calibrate chis, be used for accurately adjusting sample rolling direction, in the described groove spring clip is set, and the spring clip lower surface contacts with the groove baseplane, and this two spring clip is used for oblique support sample.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that, pass through center, last lower baffle plate side screw with bolt respectively, spring clip is fixed in the groove.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that, process two symmetrical screwed holes respectively at last lower baffle plate tip position, process a screwed hole respectively in center, last lower baffle plate side.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that the upper flat plate of described surface coverage is the trapezoidal flat board in a right angle, lower flat plate is a rectangular flat.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that described two is dull and stereotyped wide with groove, with nut flat board is fixed in the baffle plate screw top hole.
According to this design of the present utility model, when test, specimen length can change in a big way, satisfies the test request of different length specification sample.
In addition,, can be used for accurately adjusting sample rolling direction because dull and stereotyped and rectangular flat outer surface is distinguished the calibrate chi in right-angled trapezium, like this its rolling direction and straight up the deviation between direction can be controlled in 0.3 °.
And, even the sample to be tested upper and lower surface is not parallel like this, can guarantee that also sample surface to be measured becomes a fixed angle θ=65-75 ° with horizontal plane, its angular deviation can be controlled in 0.5 °.
According to above-mentioned scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, can accurately locate the test surfaces of sample.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that described groove is one to have the through slot of certain width (5-30mm), described groove side plane is straight up.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that centre, described through slot side processes a screwed hole, sample is screwed by screwed hole with a screw rod.
Like this, both can guarantee that the sample to be tested cross section became a fixed angle θ=65-75 ° with horizontal plane, and make sample rolling direction again along the long side direction of groove, straight up promptly, its angular deviation can be controlled in below 0.3 °, and the placement location of cross section sample has obtained accurate location.During test in the groove sample size can in a big way, change, can satisfy the test request of different size specification samples.According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that described perforation groove width 5-30mm.
During test, the sample cross section for preparing is placed in the groove, near the groove inner surface, again sample stage and sample inverted are placed on the horizontal plane, adjust specimen height, make sample cross section and sample stage table top place at grade, sample is screwed by another centre, groove side screwed hole with a screw rod then, promptly can accurately locate the test surfaces in sample cross section.
According to above-mentioned scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, can accurately locate the cross section EBSD test of sample.
According to scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, it is characterized in that described θ=69-71 °
Sample was accurately located when scanning electron microscope electron back scattering diffraction sample of the present utility model can be respectively applied for test sample surface and sample cross section EBSD with sample stage.When being used for the test sample surface, guarantee that sample surface to be measured becomes a fixed angle θ=65-75 ° with horizontal plane, its angular deviation can be controlled in 0.5 °, and can guarantee the sample to be tested surface along rolling direction straight up, and its angular deviation can be controlled in 0.3 °; When the cross section EBSD test of sample is accurately located, guarantee that sample surface to be measured becomes a fixed angle θ=65-75 ° with horizontal plane, its angular deviation can be controlled in 0.5 °, and can guarantee the sample cross section straight up along its length, and its angular deviation can be controlled in 0.3 °.
The accompanying drawing simple declaration
Figure 1A, B be respectively scanning electron microscope electron back scattering diffraction sample of the present utility model with the A of the test surfaces of the cutaway view of sample stage and sample to view.
Fig. 2 A, B are respectively scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model, front view and end view when the cross sectional testing of sample is accurately located.
Fig. 3 is the sample stage schematic diagram of Electron Back-Scattered Diffraction (EBSD) sample in the past.
Fig. 4,5 be respectively scanning electron microscope electron back scattering diffraction sample of the present utility model with sample stage to the test surfaces of sample and the test stereogram in cross section.
Among the figure, 1 is sample stage, and 2 is spring clip, and 3 is pole, and 4 is the right-angled trapezium baffle plate, and 5 is the rectangle baffle plate, and 6 is bolt, and 7 is baffle plate side bolt, and 8 is ruler, and 9 is electron beam, 10 be detector towards, 11 is sample.
Embodiment
Below, for embodiment, specify scanning electron microscope electron back scattering diffraction sample sample stage of the present utility model.
Surface EBSD sample stage schematic diagram is seen shown in Figure 1.
This device is made of sample stage 1, spring clip 2, pole 3, right-angled trapezium baffle plate 4, rectangle baffle plate 5, baffle plate top bolt 6, baffle plate side bolt 7, ruler 8 eight parts of trough of belt mouth baffle plate.
Wherein pole 3 is a cylinder, cooperates scanning electron microscope example chamber and sample stage requirement, and pole 3 two ends respectively process an inserted link, insert respectively in sample stage 1 and the scanning electron microscope example chamber round platform jack.At first sample stage 1 is processed into straight triangular prism, the bottom surface is a right-angled triangle, and another angle is θ (θ=69-71 a °); Centre, straight triangular prism one side (its angle with two adjacent sides is respectively 90 ° and θ) processes a circular hole, for pole 3 insertions in it.
Straight triangular prism prism is sample stage 1 table top, requires its surface roughness to reach
0.4, be processed with the rectangular recess of certain depth in the middle of this side, two ends respectively keep a baffle plate up and down, and guarantee that two baffle plate top plan are in the same plane, and with the angle of horizontal plane be θ=69-71 °, two baffle plate top plan roughness should reach
0.4; At baffle plate top symmetry processing two screwed holes, respectively right-angled trapezium baffle plate 4 and rectangular flat 5 are fixed on two on the lower baffle plate with bolt 6, two dull and stereotyped lower surfaces are in the same plane, and become a fixed angle θ=69-71 ° with horizontal plane.
Require right-angled trapezium baffle plate 4 and rectangular flat 5 lower surface roughness to reach
0.4.Stick the ruler 8 of symmetry respectively at the upper surface of two flat boards, make on the ruler line between the identical scale value point so just can adjust the rolling direction of sample according to the scale value on the ruler 8 straight up.
Center, lower baffle plate side processes a threaded hole respectively on sample stage, with bolt 7 spring clip 2 is fixed in the groove, this spring is used to support sample 11, makes sample 11 be close to two baffle plate lower surfaces, guarantees that specimen surface becomes a fixed angle θ=69-71 ° with horizontal plane.
When the EBSD test is done in the sample cross section, see Fig. 2.
This device is formed for sample stage 1, screw rod 2, pole 3 three parts of band rectangular notch, wherein pole 3 is a cylinder, cooperate scanning electron microscope example chamber and sample stage requirement, pole 3 two ends respectively process an inserted link, insert respectively in sample stage 1 and the scanning electron microscope example chamber round platform jack.
Straight quadrangular prism is sample stage 1 table top, and it becomes a fixed angle θ with the another side, θ=69-71 °, and sample stage 1 mesa surfaces roughness should reach
0.4; A groove is opened in sample stage 1 table top centre, and this groove has certain width (10-20mm), runs through the whole sample platform, and the groove side parallels with straight quadrangular bottom surface; Groove one side surface requires smooth, and its surface roughness should reach
0.4; Process a screwed hole from the center, another side.
When loading sample, with the surface of sample 11 near the groove inner surface, make sample cross section and sample bench table top in the same plane, sample is screwed by screwed hole of centre with a screw rod 6 then, fix sample, so just can guarantee the sample cross section straight up, can not tilt, and the sample cross section also becomes a fixed angle θ=69-71 ° with horizontal plane.
This cover contrive equipment had both guaranteed that the sample to be tested plane became desired angle θ=69-71 ° of a test with horizontal plane, guaranteed sample rolling direction again straight up, had improved test accuracy, can obtain accurate test data.
When specimen surface is done the EBSD test, when sample is installed, press two spring clipes gently, sample 11 surfaces upwards, slip in the notch gently near two dull and stereotyped lower surfaces and to go, utilize the ruler on two notches, adjust the rolling direction of sample, its rolling direction and ruler two ends identical graduation value are coincided, and then its rolling direction is for straight up.Sample surface to be measured becomes with horizontal plane in a fixed angle θ=69-71 ° of circular hole with the last inserted link insertion of pole sample stage, pole being gone up another inserted link inserts in the round platform jack of scanning electron microscope example chamber again, rotate pole, make the sample to be tested surface face the EBSD detector, can test the sample to be tested surface.
When the EBSD test is done in the sample cross section, when sample is installed, sample 11 surfaces near the groove inner surface, are inverted in sample stage table top and sample cross section on one horizontal plane, make sample cross section and sample stage table top be in same plane, another surface of sample is screwed by threaded hole with a screw rod then, be fixed, so just can make the sample to be tested cross section become a fixed angle θ, θ=69-71 ° with horizontal plane, and the cross section straight up along its length, can not tilt.The last inserted link of pole is inserted in the circular hole of sample stage, again pole is gone up another inserted link and insert in the round platform jack of scanning electron microscope example chamber, rotate pole, make the sample to be tested cross section face the EBSD detector, can test the sample to be tested cross section.
Except sample surface to be measured becomes with horizontal plane a fixed angle θ=66-69 °, other make surperficial EBSD sample stage of the present utility model as embodiment 1.
Except sample surface to be measured becomes a fixed angle θ=71-73 ° with horizontal plane, outside, other make surperficial EBSD sample stage of the present utility model as embodiment 1.
Except sample cross section to be measured becomes a fixed angle θ=66-69 ° with horizontal plane, groove has outside the certain width (20-30mm), and other make cross section of the present utility model EBSD sample stage as embodiment 2.
Except sample cross section to be measured becomes a fixed angle θ=71-73 ° with horizontal plane, groove has outside the certain width (5-10mm), and other make cross section of the present utility model EBSD sample stage as embodiment 2.
Except sample surface to be measured becomes with horizontal plane a fixed angle θ=66-69 °, other do the EBSD test as test case 1 to specimen surface.
Except sample surface to be measured becomes with horizontal plane a fixed angle θ=71-73 °, other do the EBSD test as test case 1 to specimen surface.
Except sample cross section to be measured becomes with horizontal plane a fixed angle θ=66-69 °, other do the EBSD test as test case 2 to the sample cross section.
Except sample cross section to be measured becomes with horizontal plane a fixed angle θ=71-73 °, other do the EBSD test as test case 2 to the sample cross section.
Sample was accurately located when scanning electron microscope electron back scattering diffraction sample of the present utility model can be respectively applied for test sample surface and sample cross section EBSD with sample stage.When being used for the test sample surface, guarantee that sample surface to be measured becomes a fixed angle θ=65-75 ° with horizontal plane, its angular deviation can be controlled in 0.5 °, and can guarantee the sample to be tested surface along rolling direction straight up, and its angular deviation can be controlled in 0.3 °; When the cross section EBSD test of sample is accurately located, guarantee that sample surface to be measured becomes a fixed angle θ=65-75 ° with horizontal plane, its angular deviation can be controlled in 0.5 °, and can guarantee sample cross-sectional length direction straight up, and its angular deviation can be controlled in 0.3 °.
Claims (10)
1. scanning electron microscope electron back scattering diffraction sample sample stage, comprise that the placement of Electron Back-Scattered Diffraction sample is with turning the plug-in type round platform and can being inserted in the described Electron Back-Scattered Diffraction sample placement female type sample stage that turns the jack on the plug-in type round platform, it is characterized in that, described female type sample stage is one can insert the groove of sample (11) towards the table top of Electron Back-Scattered Diffraction direction, described sample plane is parallel to table top, described groove two end-stopping plates are contour, two baffle plate top plan are in the same plane, and with the angle of horizontal plane be θ=65-75 °, described female type sample stage becomes angle towards the table top of Electron Back-Scattered Diffraction direction with horizontal plane be θ=65-75 °.
2. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 1, it is characterized in that, the groove surfaces top and the bottom of described insertion sample cover respectively with a flat board that covers (4,5), the middle part is penetrating, the dull and stereotyped outer surface calibrate chi (8) that cover described top and the bottom, be used for accurately adjusting sample rolling direction, two dull and stereotyped inner surfaces are in the same plane, and with the angle of horizontal plane be θ=65-75 °, be provided for the spring clip (2) of oblique support sample in the described groove, and the spring clip lower surface contacts with the groove baseplane.
3. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 1 is characterized in that, passes through center, last lower baffle plate side screw with bolt respectively, and spring clip is fixed in the groove.
4. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 1 is characterized in that, processes two symmetrical screwed holes respectively at last lower baffle plate tip position, processes a screwed hole respectively in center, last lower baffle plate side.
5. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 2 is characterized in that, the upper flat plate of described surface coverage is the trapezoidal flat board in a right angle (4), and lower flat plate is a rectangular flat (5).
6. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 2 is characterized in that, described two is dull and stereotyped wide with groove, with nut flat board is fixed in the baffle plate screw top hole.
7. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 1 is characterized in that described groove is a through slot, described through slot side plane straight up, the cross section of described sample is concordant with table top.
8. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 7 is characterized in that centre, described through slot side processes a screwed hole, sample is screwed by screwed hole with a screw rod.
9. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 7 is characterized in that, described perforation groove width 5-30mm.
10. scanning electron microscope electron back scattering diffraction sample sample stage as claimed in claim 1 or 2 is characterized in that, described θ=69-71 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202097913U CN201556600U (en) | 2009-09-17 | 2009-09-17 | Scanning electronic microscope electronic backscatter diffraction test sample stand |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202097913U CN201556600U (en) | 2009-09-17 | 2009-09-17 | Scanning electronic microscope electronic backscatter diffraction test sample stand |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201556600U true CN201556600U (en) | 2010-08-18 |
Family
ID=42616288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009202097913U Expired - Fee Related CN201556600U (en) | 2009-09-17 | 2009-09-17 | Scanning electronic microscope electronic backscatter diffraction test sample stand |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201556600U (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926263A (en) * | 2014-04-09 | 2014-07-16 | 北京工业大学 | Method for researching alloy baseband recrystallization and cubic texture forming mechanisms through quasi in-situ electron back scattered diffraction (EBSD) technology |
| CN105606635A (en) * | 2015-12-29 | 2016-05-25 | 哈尔滨工业大学 | Sample testbed for EBSD (Electron Back-Scattered Diffraction) testing |
| CN105699408A (en) * | 2016-04-15 | 2016-06-22 | 南京大学 | Sample stage for electron backscatter diffraction instruments |
| CN109254022A (en) * | 2018-10-24 | 2019-01-22 | 首钢智新迁安电磁材料有限公司 | A method of measurement crystallite dimension |
| CN110398508A (en) * | 2019-07-05 | 2019-11-01 | 山东省分析测试中心 | Inlaying samples EBSD detection sample stage, production method and detection device |
| CN110993475A (en) * | 2019-12-05 | 2020-04-10 | 山东省分析测试中心 | Scanning electron microscope universal rotating sample table for fracture analysis and scanning electron microscope |
| CN111812134A (en) * | 2020-07-21 | 2020-10-23 | 山东省分析测试中心 | Detection table for obtaining cladding metal three-dimensional organization information and operation method thereof |
| CN111982943A (en) * | 2020-08-05 | 2020-11-24 | 上海大学 | EBSD test sample platform and application thereof |
| CN112397365A (en) * | 2019-08-14 | 2021-02-23 | 中国科学院上海硅酸盐研究所 | Sample table suitable for TIC3X three-ion-beam cutting instrument |
-
2009
- 2009-09-17 CN CN2009202097913U patent/CN201556600U/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926263A (en) * | 2014-04-09 | 2014-07-16 | 北京工业大学 | Method for researching alloy baseband recrystallization and cubic texture forming mechanisms through quasi in-situ electron back scattered diffraction (EBSD) technology |
| CN105606635A (en) * | 2015-12-29 | 2016-05-25 | 哈尔滨工业大学 | Sample testbed for EBSD (Electron Back-Scattered Diffraction) testing |
| CN105606635B (en) * | 2015-12-29 | 2018-10-02 | 哈尔滨工业大学 | Sampling test platform for EBSD tests |
| CN105699408A (en) * | 2016-04-15 | 2016-06-22 | 南京大学 | Sample stage for electron backscatter diffraction instruments |
| CN109254022A (en) * | 2018-10-24 | 2019-01-22 | 首钢智新迁安电磁材料有限公司 | A method of measurement crystallite dimension |
| CN109254022B (en) * | 2018-10-24 | 2021-07-20 | 首钢智新迁安电磁材料有限公司 | Method for measuring grain size |
| CN110398508A (en) * | 2019-07-05 | 2019-11-01 | 山东省分析测试中心 | Inlaying samples EBSD detection sample stage, production method and detection device |
| CN112397365A (en) * | 2019-08-14 | 2021-02-23 | 中国科学院上海硅酸盐研究所 | Sample table suitable for TIC3X three-ion-beam cutting instrument |
| CN112397365B (en) * | 2019-08-14 | 2022-06-14 | 中国科学院上海硅酸盐研究所 | Sample table suitable for TIC3X three-ion-beam cutting instrument |
| CN110993475A (en) * | 2019-12-05 | 2020-04-10 | 山东省分析测试中心 | Scanning electron microscope universal rotating sample table for fracture analysis and scanning electron microscope |
| CN111812134A (en) * | 2020-07-21 | 2020-10-23 | 山东省分析测试中心 | Detection table for obtaining cladding metal three-dimensional organization information and operation method thereof |
| CN111812134B (en) * | 2020-07-21 | 2023-07-21 | 山东省分析测试中心 | Detection table for acquiring three-dimensional tissue information of cladding metal and operation method thereof |
| CN111982943A (en) * | 2020-08-05 | 2020-11-24 | 上海大学 | EBSD test sample platform and application thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN201556600U (en) | Scanning electronic microscope electronic backscatter diffraction test sample stand | |
| CN201141758Y (en) | Detection device for flat horizontal surface angle of eccentric shaft eccentric part | |
| CN205880675U (en) | Three -coordinate measuring machine part measuring uses quick aligning device | |
| CN106935464A (en) | Instrument and diffraction image imaging method for transmitted electron back scattering diffraction | |
| CN207528662U (en) | EBSD test sample platforms | |
| CN207133209U (en) | A kind of EBSD instrument sample stage | |
| CN208654068U (en) | Electron backscatter diffraction sample fixture | |
| CN206420391U (en) | A kind of piston detection means | |
| CN206905685U (en) | A kind of latch shaft axle sleeve detecting tool | |
| CN206339216U (en) | A kind of micro- testing for level difference device | |
| CN213580739U (en) | Objective table and microscope for transmission-electron back scattering diffraction analysis of slice sample | |
| CN213688319U (en) | Detection equipment for electromechanical device installation | |
| CN204027488U (en) | A kind of cubing detecting engine cylinder cover oil pocket plate height | |
| CN210981112U (en) | Tool for measuring aperture of machined part | |
| CN112710215A (en) | Quick detection device for workpiece verticality | |
| CN207662329U (en) | The measurement cubing of the depth of parallelism between measurement rod piece difference plane | |
| CN220772159U (en) | Battery positioning device and battery size detection equipment | |
| CN220930701U (en) | Quick positioner of sensor installation for high strain detection | |
| CN219038865U (en) | Cutter blade detection device | |
| CN219223575U (en) | Support and device for measuring thickness and flatness of sheet | |
| CN217442734U (en) | Calibration device for a meter | |
| CN219694180U (en) | Datum point detects frock | |
| CN208313864U (en) | A kind of slit arrangement for zinc-aluminum-magnesium coating X-ray diffraction analysis | |
| CN219200256U (en) | Measuring tool for nose castings | |
| CN206460941U (en) | A kind of multistation ESEM EBSD sample stages |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100818 Termination date: 20160917 |