CN201483369U - Polishing liquid transmitting device - Google Patents
Polishing liquid transmitting device Download PDFInfo
- Publication number
- CN201483369U CN201483369U CN2009202082744U CN200920208274U CN201483369U CN 201483369 U CN201483369 U CN 201483369U CN 2009202082744 U CN2009202082744 U CN 2009202082744U CN 200920208274 U CN200920208274 U CN 200920208274U CN 201483369 U CN201483369 U CN 201483369U
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- pipeline
- lapping liquid
- communicated
- transmitting device
- liquid transmitting
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Abstract
The utility model discloses a polishing liquid transmitting device, which is applied to a chemical mechanical polishing machine platform. The polishing liquid transmitting device comprises a first pipeline, a second pipeline and a third pipeline, wherein one end of the first pipeline is communicated with a manifold, while the other end is communicated with a filtering device; one end of the second pipeline is communicated with the filtering device, while the other end is communicated with a flow controller; one end of the third pipeline is communicated with the flow controller, while the other end is communicated with chemical mechanical polishing machine platform; and the first, second and third pipelines are provided with at least one ultrasonic generator respectively. The ultrasonic wave generated by the ultrasonic generator can prevent the polishing liquid in each pipeline from generating crystallization so as to ensure the normal operation of the polishing liquid transmitting device and improve the product yield.
Description
Technical field
The utility model relates to integrated circuit and makes the field, relates in particular to a kind of lapping liquid transmitting device that is applied to work-table of chemicomechanical grinding mill.
Background technology
At present, chemical mechanical milling tech (Chemical Mechanical Polishing, CMP) be one of the most common and most important flatening process in the semiconductor technology, its purpose is to remove equably the aimed thin film layer (target thin film) that has irregular surface on the wafer, make described wafer can have smooth and regular surface through behind the chemical mechanical milling tech, to guarantee the yield of subsequent technique, especially for the making of the plain conductor of dual damascene (Dual Damascene) structure, the for example making of copper conductor, the step that chemical mechanical milling tech can't replace especially.
Because chemical mechanical milling tech is to utilize mechanical system and chemical mode to carry out simultaneously, therefore must consider the technological parameter of a lot of complexity, the for example composition of the composition of the characteristic of aimed thin film layer, lapping liquid (slurry), grinding pad (polishing pad), platform (platen) rotating speed etc., wherein the control of the composition of lapping liquid has very important influence for the yield of chemical mechanical milling tech.In general, the composition of lapping liquid mainly includes grinding agent (abrasive) and oxidant (oxidizer), can form thick liquid after the two mixes, and is delivered to the platform of work-table of chemicomechanical grinding mill through the lapping liquid transmitting device.
Please refer to Fig. 1, it is the schematic diagram of existing lapping liquid transmitting device.As shown in Figure 1, existing lapping liquid transmitting device mainly comprises first pipeline 11, second pipeline 12, the 3rd pipeline 13, manifold 14, filter 15 and flow controller 16, wherein, one end of first pipeline 11 is communicated with manifold 14, the other end of first pipeline 11 is communicated with filter 15, one end of second pipeline 12 is communicated with this filter 15, the other end of second pipeline 12 is communicated with flow controller 16, one end of the 3rd pipeline 13 is communicated with this flow controller 16, the other end of the 3rd pipeline 13 is communicated with work-table of chemicomechanical grinding mill 20, wherein, first pipeline 11 is provided with valve 17.When carrying out chemical mechanical milling tech, valve 17 is in open mode, lapping liquid in the manifold 14 is delivered to work-table of chemicomechanical grinding mill 20 through described first pipeline 11, second pipeline 12 and the 3rd pipeline 13, wherein filter 15 is in order to the soluble thing in the filtration lapping liquid, and flow-control dress device 16 is flow and the flow velocitys that are delivered to the lapping liquid of work-table of chemicomechanical grinding mill 20 in order to adjusting.
Yet; in actual production, find; there are some problems in existing lapping liquid transmitting device; promptly when work-table of chemicomechanical grinding mill 20 is in idle (idle) state; because valve 17 will be in closed condition; so first pipeline 11; the lapping liquid that retains in second pipeline 12 and the 3rd pipeline 13 will remain static; in this case; lapping liquid in described each pipeline is subjected to factor affecting such as temperature; the lapping liquid crystalline polamer often occurs, the crystalline solid of generation often is stranded in described each pipeline and causes pipeline blockage, and these crystalline solid also very easily stop up filter 15; cause the lapping liquid transmitting device to damage; even more serious is that when carrying out chemical mechanical milling tech, these crystalline solid also residue in crystal column surface through regular meeting; cause crystal column surface cut (scratch) to occur, influenced the yield of product.
In order to address the above problem, the method that industry is taked usually is when work-table of chemicomechanical grinding mill 20 is in idle state, still regularly open valve 17, and carry lapping liquid to work-table of chemicomechanical grinding mill 20, make the lapping liquid in described each pipeline be in flow regime, to guarantee the lapping liquid crystalline polamer can not occur.Yet this method is when not carrying out chemical mechanical milling tech, still supply with lapping liquid and give work-table of chemicomechanical grinding mill 20, and lapping liquid is the very expensive chemical reagent of a kind of price that this has caused great waste, has increased production cost.
Therefore, providing a kind of lapping liquid transmitting device that saves production cost, to solve the problem of lapping liquid crystallization, is very necessary.
The utility model content
The purpose of this utility model is, a kind of transmitting device of lapping liquid cheaply is provided, to solve existing lapping liquid transmitting device when work-table of chemicomechanical grinding mill is in idle state, the problem of lapping liquid crystallization.
For addressing the above problem, the utility model provides a kind of lapping liquid transmitting device that is applied to work-table of chemicomechanical grinding mill, and it comprises: first pipeline, and an end is communicated with a manifold, and the other end is communicated with a filter; Second pipeline, an end is communicated with this filter, and the other end is communicated with a flow controller; The 3rd pipeline, an end is communicated with this flow controller, and the other end is communicated with this work-table of chemicomechanical grinding mill; Wherein, be respectively arranged with at least one ultrasonic generator on described first pipeline, described second pipeline and described the 3rd pipeline.
Optionally, described lapping liquid transmitting device also comprises a clack box, this clack box comprises a casing, described manifold is arranged at described box house, one end of described first pipeline wears described casing and is communicated with this manifold, described first pipeline is provided with one first valve, and described first valve is to be positioned at described box house.
Optionally, described lapping liquid transmitting device also comprises a feed liquor pipeline, and an end of this feed liquor pipeline wears described casing and is communicated with described manifold, and the other end of this feed liquor pipeline is communicated with a lapping liquid supply tank.
Optionally, described lapping liquid transmitting device also comprises a fluid pipeline, and an end of this fluid pipeline wears described casing and is communicated with described manifold, and the other end of this fluid pipeline is communicated with a lapping liquid supply tank.
Optionally, described lapping liquid transmitting device also comprises a deionized water pipeline, one end of this deionized water pipeline wears described casing and is communicated with described manifold, the other end of this deionized water pipeline is communicated with a deionized water rinsing device, described deionized water pipeline is provided with one second valve, and described second valve is to be positioned at described box house.
Optionally, described first pipeline is provided with a ultrasonic generator, and described second pipeline is provided with a ultrasonic generator, and described the 3rd pipeline is provided with a ultrasonic generator.
Compared with prior art, be respectively arranged with ultrasonic generator on first pipeline of lapping liquid transmitting device provided by the utility model, second pipeline and the 3rd pipeline, the ultrasonic wave that described ultrasonic generator sends can propagate in the lapping liquid, and in lapping liquid density interphase to previous irradiation, lapping liquid is flowed, can prevent that the lapping liquid crystalline polamer appears in the lapping liquid in each pipeline when work-table of chemicomechanical grinding mill is idle, guarantee the normal operation of lapping liquid transmitting device, improved the yield of product.
Description of drawings
Fig. 1 is the schematic diagram of existing lapping liquid transmitting device;
The schematic diagram of the lapping liquid transmitting device that Fig. 2 is provided for the utility model one embodiment.
The specific embodiment
Below with reference to accompanying drawings the utility model is described in more detail, wherein represented a preferred embodiment of the present utility model, should be appreciated that those skilled in the art can revise the utility model described here and still realize advantageous effects of the present utility model.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as to restriction of the present utility model.
For clear, whole features of an actual embodiment are not described.In the following description, be not described in detail known function and structure, because they can make the utility model because unnecessary details and confusion.Will be understood that in the exploitation of any actual embodiment, must make a large amount of implementation details, for example, change into another embodiment by one one embodiment according to relevant system or relevant commercial restriction to realize developer's specific objective.In addition, will be understood that this development may be complicated and time-consuming, but only be routine work to those skilled in the art.
For the purpose of this utility model, feature are become apparent, the specific embodiment of the present utility model is further described below in conjunction with accompanying drawing.It should be noted that accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of aid illustration the utility model one embodiment lucidly.
Please refer to Fig. 2, the structural representation of the lapping liquid transmitting device that it is provided for the utility model one embodiment.As shown in the figure, the lapping liquid transmitting device that is used for work-table of chemicomechanical grinding mill comprises: first pipeline 101, second pipeline 102, the 3rd pipeline 103, manifold 104, filter 105 and flow controller 106, wherein, one end of first pipeline 101 is communicated with manifold 104, the other end of first pipeline 101 is communicated with filter 105, one end of second pipeline 102 is communicated with this filter 105, the other end of second pipeline 102 is communicated with flow controller 106, one end of the 3rd pipeline 103 is communicated with this flow controller 106, the other end of the 3rd pipeline 103 is communicated with work-table of chemicomechanical grinding mill 200, and described first pipeline 101 is provided with first valve 107.In the lapping liquid transmitting device that the utility model one embodiment is provided, on first pipeline 101, second pipeline 102 and the 3rd pipeline 103, be separately installed with at least one ultrasonic generator 108.The ultrasonic wave that described ultrasonic generator 108 sends propagates in the lapping liquid, lapping liquid is flowed, can prevent effectively that crystalline polamer from appearring in the lapping liquid in described each pipeline, therefore, when not carrying out chemical mechanical milling tech, need not regularly to carry lapping liquid to idle work-table of chemicomechanical grinding mill 200, the expensive lapping liquid that avoids waste has been saved production cost.
Wherein, described lapping liquid transmitting device also comprises clack box 109, feed liquor pipeline 110 and fluid pipeline 111.Described clack box 109 comprises a casing, and manifold 104 is arranged at described box house, and an end of first pipeline 101 wears described casing and is communicated with manifold 104, and first valve 107 is to be positioned at described box house.One end of described feed liquor pipeline 110 wears described casing and is communicated with manifold 104, and the other end of described feed liquor pipeline 110 is communicated with a lapping liquid supply tank (not shown).One end of described fluid pipeline 111 wears described casing and is communicated with manifold 104, and the other end of described fluid pipeline 111 is communicated with described lapping liquid supply tank.This fluid pipeline 111 has formed conveying loop with feed liquor pipeline 110, prevents that lapping liquid from crystalline polamer occurring before being delivered to first pipeline 101.
Further, described lapping liquid transmitting device also comprises deionized water pipeline 112, one end of this deionized water pipeline 112 wears described casing and is communicated with manifold 104, the other end of this deionized water pipeline 112 is communicated with deionized water rinsing device 113, and described deionized water pipeline 112 is provided with second valve 114.Detailed, second valve 114 is to be positioned at described box house.When work-table of chemicomechanical grinding mill 200 carried out chemical mechanical milling tech, described second valve 114 was closed.When work-table of chemicomechanical grinding mill 200 needs to be serviced, can open second valve 114, the deionized water that is provided by deionized water rinsing device 113 can be in deionized water pipeline 112 be delivered to each pipeline of lapping liquid transmitting device 100, to wash and to clean each pipeline.
Specifically, the lapping liquid transmitting device that the utility model one embodiment is provided is work like this, the lapping liquid that is stored in the described lapping liquid supply tank flows between feed liquor pipeline 110 and fluid pipeline 111, when needs carry out chemical mechanical milling tech, open first valve 107 on first pipeline 101, lapping liquid can be delivered to second pipeline 102 by first pipeline 101 through connecting on manifold 104, and be delivered to the platform of work-table of chemicomechanical grinding mill 200, and then grind the wafer that is arranged on this platform through the 3rd pipeline 103.Wherein filter 15 is in order to the soluble thing in the filtration lapping liquid, and flow-control dress device 16 is flow and flow velocitys that the mode of employing closed-loop control is regulated the lapping liquid that is delivered to work-table of chemicomechanical grinding mill 20.When work-table of chemicomechanical grinding mill 200 is in idle state; that is to say; when not carrying out chemical mechanical milling tech; close first valve 107; because first pipeline 101; on second pipeline 102 and the 3rd pipeline 103 ultrasonic generator 108 has been installed respectively; therefore; the uniform ultrasonic wave that described ultrasonic generator 108 is produced can propagate into and remain in first pipeline 101; in second pipeline 102 and the 3rd pipeline 103 interior lapping liquids; and in lapping liquid density interphase to previous irradiation; make in the lapping liquid and produced " cavitation "; because the powerful mechanical force that described " cavitation " produces flows lapping liquid; can prevent the lapping liquid crystallization effectively; simultaneously; hyperacoustic high-energy also can smash established big particle in the lapping liquid, avoids these big particles to be stranded in and causes pipeline and filter 105 to stop up in each pipeline, guarantees the normal operation of lapping liquid transmitting device; and guarantee that crystal column surface cut can not occur, has improved the yield of product.
In the utility model one embodiment, be respectively arranged with a ultrasonic generator 108 on described first pipeline 101, second pipeline 102, the 3rd pipeline 103, to save cost.Certainly, in other embodiment of the utility model, the concrete condition of also can grading according to the concrete one-tenth of the stand-by time of the length of pipeline, work-table of chemicomechanical grinding mill and lapping liquid is provided with two or more ultrasonic generators on first pipeline, second pipeline and the 3rd pipeline.
In sum, the utility model provides a kind of lapping liquid transmitting device that is used for work-table of chemicomechanical grinding mill, and this lapping liquid transmitting device comprises: first pipeline, and the one end is communicated with a manifold, and the other end is communicated with a filter; Second pipeline, the one end is communicated with this filter, and the other end is communicated with a flow controller; The 3rd pipeline, the one end is communicated with this flow controller, and the other end is communicated with this work-table of chemicomechanical grinding mill; Wherein, be respectively arranged with at least one ultrasonic generator on described first pipeline, second pipeline and the 3rd pipeline.The ultrasonic wave that described ultrasonic generator produces can prevent that crystalline polamer from appearring in the lapping liquid in each pipeline, guarantees the normal operation of lapping liquid transmitting device, has improved the yield of product.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from spirit and scope of the present utility model.Like this, if of the present utility model these are revised and modification belongs within the scope of the utility model claim and equivalent technologies thereof, then the utility model also is intended to comprise these changes and modification interior.
Claims (13)
1. lapping liquid transmitting device, it is applied to work-table of chemicomechanical grinding mill, it is characterized in that, comprising:
First pipeline, an end is communicated with a manifold, and the other end is communicated with a filter;
Second pipeline, an end is communicated with this filter, and the other end is communicated with a flow controller;
The 3rd pipeline, an end is communicated with this flow controller, and the other end is communicated with this work-table of chemicomechanical grinding mill;
Wherein, be respectively arranged with at least one ultrasonic generator on described first pipeline, described second pipeline and described the 3rd pipeline.
2. lapping liquid transmitting device as claimed in claim 1 is characterized in that, also comprises a clack box, and this clack box comprises a casing.
3. lapping liquid transmitting device as claimed in claim 2 is characterized in that described manifold is arranged at described box house, and an end of described first pipeline wears described casing and is communicated with this manifold.
4. lapping liquid transmitting device as claimed in claim 3 is characterized in that, described first pipeline is provided with one first valve.
5. lapping liquid transmitting device as claimed in claim 4 is characterized in that, described first valve is to be positioned at described box house.
6. lapping liquid transmitting device as claimed in claim 2 is characterized in that, also comprises a feed liquor pipeline, and an end of this feed liquor pipeline wears described casing and is communicated with described manifold, and the other end of this feed liquor pipeline is communicated with a lapping liquid supply tank.
7. lapping liquid transmitting device as claimed in claim 2 is characterized in that, also comprises a fluid pipeline, and an end of this fluid pipeline wears described casing and is communicated with described manifold, and the other end of this fluid pipeline is communicated with a lapping liquid supply tank.
8. lapping liquid transmitting device as claimed in claim 2, it is characterized in that, also comprise a deionized water pipeline, an end of this deionized water pipeline wears described casing and is communicated with described manifold, and the other end of this deionized water pipeline is communicated with a deionized water rinsing device.
9. lapping liquid transmitting device as claimed in claim 8 is characterized in that, described deionized water pipeline is provided with one second valve.
10. lapping liquid transmitting device as claimed in claim 9 is characterized in that, described second valve is to be positioned at described box house.
11. lapping liquid transmitting device as claimed in claim 1 is characterized in that, described first pipeline is provided with a ultrasonic generator.
12. lapping liquid transmitting device as claimed in claim 11 is characterized in that, described second pipeline is provided with a ultrasonic generator.
13. lapping liquid transmitting device as claimed in claim 12 is characterized in that, described the 3rd pipeline is provided with a ultrasonic generator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202082744U CN201483369U (en) | 2009-08-21 | 2009-08-21 | Polishing liquid transmitting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202082744U CN201483369U (en) | 2009-08-21 | 2009-08-21 | Polishing liquid transmitting device |
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| Publication Number | Publication Date |
|---|---|
| CN201483369U true CN201483369U (en) | 2010-05-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2009202082744U Expired - Fee Related CN201483369U (en) | 2009-08-21 | 2009-08-21 | Polishing liquid transmitting device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104552008A (en) * | 2013-10-23 | 2015-04-29 | 株式会社荏原制作所 | Polishing method and polishing apparatus |
| CN107537721A (en) * | 2017-09-11 | 2018-01-05 | 德淮半导体有限公司 | Crystallizable device for atomizing liquid and method |
| CN109262442A (en) * | 2017-07-18 | 2019-01-25 | 中芯国际集成电路制造(上海)有限公司 | A kind of system and chemical machinery polishing system for cleaning chemical-mechanical grinding device |
| CN109352531A (en) * | 2018-10-24 | 2019-02-19 | 上海华力微电子有限公司 | A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid |
| CN109940516A (en) * | 2019-03-12 | 2019-06-28 | 上海新昇半导体科技有限公司 | Slurry recovery system and its clean method |
| CN112677032A (en) * | 2019-10-17 | 2021-04-20 | 夏泰鑫半导体(青岛)有限公司 | Grinding fluid conveying module and chemical mechanical grinding device |
-
2009
- 2009-08-21 CN CN2009202082744U patent/CN201483369U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104552008A (en) * | 2013-10-23 | 2015-04-29 | 株式会社荏原制作所 | Polishing method and polishing apparatus |
| CN104552008B (en) * | 2013-10-23 | 2018-04-06 | 株式会社荏原制作所 | Ginding process and lapping device |
| US11192216B2 (en) | 2013-10-23 | 2021-12-07 | Ebara Corporation | Polishing method and polishing apparatus |
| CN109262442A (en) * | 2017-07-18 | 2019-01-25 | 中芯国际集成电路制造(上海)有限公司 | A kind of system and chemical machinery polishing system for cleaning chemical-mechanical grinding device |
| CN107537721A (en) * | 2017-09-11 | 2018-01-05 | 德淮半导体有限公司 | Crystallizable device for atomizing liquid and method |
| CN109352531A (en) * | 2018-10-24 | 2019-02-19 | 上海华力微电子有限公司 | A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid |
| CN109940516A (en) * | 2019-03-12 | 2019-06-28 | 上海新昇半导体科技有限公司 | Slurry recovery system and its clean method |
| CN112677032A (en) * | 2019-10-17 | 2021-04-20 | 夏泰鑫半导体(青岛)有限公司 | Grinding fluid conveying module and chemical mechanical grinding device |
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Legal Events
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130115 |
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| C41 | Transfer of patent application or patent right or utility model | ||
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Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
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| TR01 | Transfer of patent right |
Effective date of registration: 20130115 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100526 Termination date: 20180821 |
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| CF01 | Termination of patent right due to non-payment of annual fee |