CN201132849Y - Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight - Google Patents
Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight Download PDFInfo
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- CN201132849Y CN201132849Y CNU2007201555224U CN200720155522U CN201132849Y CN 201132849 Y CN201132849 Y CN 201132849Y CN U2007201555224 U CNU2007201555224 U CN U2007201555224U CN 200720155522 U CN200720155522 U CN 200720155522U CN 201132849 Y CN201132849 Y CN 201132849Y
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- plating
- film
- vacuum arc
- plasma
- multilayer film
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Abstract
The utility model relates to a film plating machine using a sightline external magnet filtering metal steam vacuum arc plasma to deposit a multilayer film. The film plating machine utilizes a sightline external magnet filtering plasma sedimentary origin to plate on the material surface, so as to realize the plating of the multilayer film. The film plating machine is characterized in that at least two sightline external magnet filtering metal steam vacuum arc plasma sedimentary origins are installed on the same plane of a vacuum plating room in a certain included angle, a plating workpiece table can flexibly rotate to be matched with the working state of the plasma sedimentary origins, and proper negative bias is added on the workpiece table, so that different plasma sedimentary origins work in sequence or alternately to realize the function of multilayer plating. The sightline external magnet filtering metal steam vacuum arc plasma sedimentary origin is adopted, the objects deposited on the basal body are basically ions, the energy of which can be conveniently adjusted through the negative bias of the workpiece table, thereby conveniently finishing the functions including the cleaning of the workpiece surface, interface mixing, plating, etc.; the plating of the multilayer film is realized through the correct cooperation of the workpiece table and the plasma sedimentary origins, and causing different plasma sedimentary origins to work in sequence or alternately. If reaction gases are led, a gaseous compound multilayer film can be obtained.
Description
Affiliated technical field
The utility model relates to a kind of multilayer film coating equipment that is used for surface coating.More particularly, be the multilayer film coating equipment that a kind of plasma body that utilizes the outer magnetic filtering metal steam-to-vacuum arc plasma source of sight line to produce carries out the material surface plated film.
Background technology
The research of multilayer film has had the history in more than 30 year since the seventies in 20th century.Over more than 30 year, development and progress along with new film deposition techniques and analytical technology, the appearance of computer application and more effective method of calculation, people have carried out number of research projects from many-sides such as theoretical and experiments to the correlation theory of multilayer film, technology of preparing, mechanical property, optical property, electric property, magnetic performance etc.Thereby promoted the understanding of people on the one hand, a kind of effective way of artificial novel material also is provided for people on the other hand some basic physics mechanism.These are at document " magnetoresistance effect progress: theoretical and experiment ", Liu Mingsheng, Jiang Enyong, Liu Yuguang, vacuum science and technology, 1994 (2) and " progress of multilayer film ", Xue Yuzhi, Dalian Railway University's journal, 1994 (3) etc. all have detailed description.The technology of preparing of multilayer film is hydatogenesis, sputtering sedimentation at first; utilized magnetron sputtering plating afterwards; multi-arc ion plating film; also there is a few thing to adopt householder methods such as ionic fluid, electron beam, laser beam to improve some weak point of plated film work; but evaporation and sputtering sedimentation all are atom, molecule or atomic group on matrix basically, and multi-arc ion coating then has a lot of macrobeads or drop.Therefore, the film of preparation all has weak point in compactness, smooth finish etc. aspect many, thereby has influenced the character of film, has further influenced the application of multilayer film.
Summary of the invention
The purpose of this utility model is to utilize the outer magnetic filtering metal steam-to-vacuum arc plasma deposition source of sight line of our patent ZL03200996.8 description, manufactures and designs a kind of multilayer film coating equipment that utilizes plasma body to carry out the material surface plated film.
The technical scheme that its technical problem that solves the utility model adopts is: at least two outer magnetic filtering metal steam-to-vacuum arc plasma deposition sources of sight line are installed on the same plane of vacuum film coating chamber with certain included angle, the film-coating workpiece platform can rotate flexibly with plasma-deposited source working order and cooperate, and on work stage, add suitable negative bias, allow different plasma source sequence or alternation, realize the multicoating function.
Owing to adopt the outer magnetic filtering metal steam-to-vacuum arc plasma deposition source of sight line, be deposited on the matrix substantially all is ion, thereby overcome the defective that other film coating method utilizes atom, molecule or atomic group deposit film, also eliminated the influence of macrobead (or drop) simultaneously.Ion energy can be regulated easily by the work stage negative bias simultaneously.When negative bias was very high, ion energy was also very high, can realize that the interface of workpiece surface is mixed; When negative bias was higher, ion energy was higher, can realize the ion beam sputtering cleaning function of workpiece surface; Negative bias is adjusted to suitable value, can realize the plated film function, obtains highly polished, fine and close high-quality thin film.Work stage is correctly cooperated with plasma-deposited source, and allow different plasma-deposited source sequence or alternation, can realize the work of multilayer film plated film easily.According to the requirement of plated film, negative bias can be direct current, pulse or direct current and three kinds of modes of superimposed pulses.If in vacuum target chamber, charge into reactant gases when magnetic filtering metal steam-to-vacuum arc plasma deposition source is worked outside sight line, can obtain plasma-deposited source cathode material and reactant gases compound film, thereby expand the kind of film widely.
The beneficial effects of the utility model are, adopt the outer magnetic filtering metal steam-to-vacuum arc plasma deposition source of sight line, be deposited on the matrix substantially all is ion, its energy can be regulated easily by the work stage negative bias, thereby finishes functions such as comprising workpiece surface cleaning, interface mixing, plated film easily; Correctly cooperate with plasma-deposited source by work stage, and make different plasma-deposited source sequence or alternation, realize the multilayer film plated film.If the feeding reactant gases can obtain the gaseous compound multilayer film.
Description of drawings
Below in conjunction with drawings and Examples the utility model is further specified.
Fig. 1 is the vacuum target chamber top view of a magnetic filtering metal steam-to-vacuum arc multilayer film coating equipment.1 is vacuum target chamber among the figure, the 2nd, and vacuum target chamber door, the 3rd, the outer magnetic filtering metal steam-to-vacuum arc plasma source of sight line, the 4th, viewing window, the 5th, work stage, the 6th, spare interface, the 7th, the interface of vacuum target chamber and off-gas pump system, the 8th, inlet mouth.
Embodiment
Embodiment: the multilayer film coating equipment that two outer magnetic filtering metal steam-to-vacuum arc plasma sources of sight line are installed, vacuum target chamber 1 internal diameter 500mm.The magnetic filter duct internal diameter 80mm in two outer magnetic filtering metal steam-to-vacuum arc plasma sources 3 of sight line, 90 ° of deflection angles, plasma source 3 works in pulse condition.Work stage 5 mesa diameter 200mm, the negative bias that applies on the work stage are pressed with two kinds of 0-300V and 0-3000V, can switch as required.Vacuum target chamber is connected with the molecular pump system of 1500L/min with the interface 7 of off-gas pump system, for vacuum target chamber 1 vacuumizes.Viewing window 4 can the handled easily personnel be observed the plated film state when work.Work stage 5 is corresponding with plasma source 3 working ordeies, that source work, and work stage 5 just turns to the position corresponding with this source.The workpiece of plated film is by vacuum target chamber door 2 turnover vacuum chambers.Two outer magnetic filtering metal steam-to-vacuum arc plasma source 3 alternations of sight line, come and go corresponding with plasma source 3 working ordeies of work stage 5 rotated, and this multilayer film coating equipment can be realized the multilayer film of two kinds of elements or its alloy easily.If feed reactant gases by inlet mouth 8, can obtain corresponding gaseous compound multilayer film.
Claims (2)
1. the outer magnetic filtering metal steam-to-vacuum arc plasma deposit multilayer film coating equipment of a sight line.It is characterized in that the outer magnetic filtering metal steam-to-vacuum arc plasma deposition source of at least two sight lines is installed on the same plane of vacuum film coating chamber with certain included angle, the film-coating workpiece platform can rotate flexibly with plasma-deposited source working order and cooperate, and on work stage, add suitable negative bias, different plasma body source sequence or alternation realize the multicoating function.
2. according to the outer magnetic filtering metal steam-to-vacuum arc plasma deposit multilayer film coating equipment of the sight line of claim 1 described structure, it is characterized in that the negative bias that applies on the work stage can be the stack of direct current, pulse or direct current and pulse according to job requirement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201555224U CN201132849Y (en) | 2007-07-05 | 2007-07-05 | Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201555224U CN201132849Y (en) | 2007-07-05 | 2007-07-05 | Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201132849Y true CN201132849Y (en) | 2008-10-15 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007201555224U Expired - Fee Related CN201132849Y (en) | 2007-07-05 | 2007-07-05 | Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201132849Y (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105296938A (en) * | 2014-07-14 | 2016-02-03 | 北京师范大学 | Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device |
| CN111020479A (en) * | 2019-12-25 | 2020-04-17 | 北京师范大学 | High-shielding-piece corrosion-resistant multi-element coating, preparation method thereof and device used by preparation method |
-
2007
- 2007-07-05 CN CNU2007201555224U patent/CN201132849Y/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105296938A (en) * | 2014-07-14 | 2016-02-03 | 北京师范大学 | Tree-shaped cathode vacuum arc plasma deposition and magnetic filtration device |
| CN111020479A (en) * | 2019-12-25 | 2020-04-17 | 北京师范大学 | High-shielding-piece corrosion-resistant multi-element coating, preparation method thereof and device used by preparation method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C57 | Notification of unclear or unknown address | ||
| DD01 | Delivery of document by public notice |
Addressee: Wu Xianying Document name: Notification to Make Rectification |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081015 |