CN201030364Y

CN201030364Y - Substrate washing unit

Info

Publication number: CN201030364Y
Application number: CNU2007201489773U
Authority: CN
Inventors: 李�远; 王晶; 信心; 萧新桥; 孙阳; 宋晶路
Original assignee: Beijing Jiaotong University
Current assignee: Beijing Jiaotong University
Priority date: 2007-04-28
Filing date: 2007-04-28
Publication date: 2008-03-05
Anticipated expiration: 2017-04-28

Abstract

A chip cleaning device relates to a chip cleaning device designed for laboratories especially, which can place and clean a piezoid, a transparent conducting glass (ITO) chip and a silicon chip and the like. The size can be 1 centimeter * 1 centimeter, 3 centimeters * 4 centimeters and 10 centimeters * 10 centimeters and 150 chips of 1 centimeter * 1 centimeter can be cleaned simultaneously. Different substrates and interlayers of the cleaning device can be dismounted complementally for depositing chips of different sizes according to actual requirements and the utility model achieves effects of flexibility and multipurpose. The utility model follows the design conception of tightness and saving, the maximum receiving quantity of chips is greatly improved, the idle space of the container is reduced, and the liquor is saved. The external container device adapts acid and alkaline resisting materials such as quartz and tetrafluoride polymer and the range of the cleaning liquor can be broadened. The utility model has an upper opening and a lower opening, which can complementally utilize a circulating pump to improve the efficiency, and the device for maintaining chips can be positioned in a vacuum desiccator.

Description

A kind of Weft cleaner

Technical field

The utility model relates to the cleaning device technology, specifically a kind ofly is applied to that FPD is luminous, the Weft cleaner in the solar cell research.

Background technology

At present, knownly be applied to that FPD is luminous, the Weft cleaner in the solar cell research is comparatively simple, it only is the simple combination of large-sized rock quartz cup and substrate slot, cleaning device can only be deposited a small amount of substrate generally speaking, and in the process of placing substrate, slot slides in solution easily, increase difficulty for operation, stability is also relatively poor, though the cleaning device for operated by rotary motion is easy, but carrying substrates is too limited and function is less, and the restriction that practical value is subjected to design itself can't be not fully exerted.

Summary of the invention

The purpose of this utility model just provides a kind of Weft cleaner, and this device mainly is made up of outer layer container, main frame and matching component, and whole " hardware and software platform " design philosophy that adopts is installed matching component according to the substrate specification on main frame.

Design of the present utility model is as follows:

This Weft cleaner mainly comprises matrix, front and rear baffle, left baffle, diaphragm plate, vertical clapboard, quartz curette, lid and water pump.

Matrix is made up of bottom surface, column and handle: the matrix bottom surface is provided with substrate lattice and scupper; Column is provided with the built-in fixed slot that is used for fixing front and rear baffle, left baffle and diaphragm plate; The connector on corresponding column top constitutes handle;

Front and rear baffle is provided with column slot arm, and is provided with and matrix bottom surface and the corresponding inside groove of diaphragm plate substrate lattice separation trough;

Left baffle is provided with column slot arm, and is provided with and matrix bottom surface and the corresponding inside groove of diaphragm plate substrate cell;

Diaphragm plate is provided with column slot arm and substrate lattice;

Vertical clapboard is provided with front and rear baffle slot arm, and its inside groove is corresponding with matrix bottom surface substrate lattice, diaphragm plate substrate lattice and left baffle inside groove;

Matrix is included in the quartz curette; The quartz curette bottom is provided with the haptic element device, and the waterpipe jointing of quartz curette lid and its bottom is connected with inlet with the outlet of water pump respectively.

The utility model is one and is the Weft cleaner of lab design specially, its beneficial effect is that it can place quartz plate, transparent conducting glass (ITO) substrate, silicon chip etc., size from 1cm * 1cm, 3cm * 4cm, 10cm * 10cm all can, and can clean 150 of the substrates of 1cm * 1cm simultaneously.Different substrates and interlayer can be according to actual needs and supporting dismounting reaches flexible multi-purpose effect.The design concept of " closely save " makes that maximum is held substrate quantity in the container and is largely increased, and it is idle to reduce in the container space, saves solution.The outer layer container device materials adopts antiacid base materials such as quartzy and tetrafluoro polymer, dilatation can use the scope of cleaning solution.The upper and lower opening that its adopts, can supporting use circulation water pumper raising the efficiency, and can be used as the device of preserving substrate and place vacuum desiccator.The haptic element design of external container can guarantee that therefore the contact that reduces with objective table resonates, can not damage with the protection substrate when accepting ultrasonic cleaning.

Description of drawings

Fig. 1 is the schematic diagram of matrix in the Weft cleaner.

Fig. 2 is the cleaning device schematic diagram behind assembling one deck front and rear baffle.

Fig. 3 is the cleaning device schematic diagram after assembling one deck left baffle.

Fig. 4 is the cleaning device schematic diagram behind vertical clapboard of assembling.

Fig. 5 is the cleaning device schematic diagram behind the assembling diaphragm plate.

Fig. 6 is the cleaning device schematic diagram after the two-layer front and rear baffle of assembling, the left baffle.

Fig. 7 is the cleaning device schematic diagram behind two vertical clapboards of assembling.

Fig. 8 is quartz curette and water pump connection diagram.

The specific embodiment

Matrix 1 comprises bottom surface, column and handle three parts, column has the built-in fixed slot of multilayer, can piece together and insert multilayer front and rear baffle 2, left baffle 3 and diaphragm plate 4, be respectively equipped with on front and rear baffle 2, left baffle 3, the diaphragm plate 4 and be used for and the fixing slot arm of matrix 1, the connector on corresponding column top constitutes handle.

Between front and rear baffle 2, can insert the vertical clapboard of different spacing, for the substrate of depositing different in width.

Multilayer front and rear baffle 2 and left baffle 3 can be on bottom surface or one deck diaphragm plate, inserted simultaneously,, and vertical clapboard 5 can be inserted in the relevant position to increase fixed effect in order to the big substrate of protection.

1-8 is specifically described the utility model below in conjunction with example figure:

Figure 1 shows that the matrix 1 of cleaning device, matrix 1 bottom surface is divided into 6 row, whenever show 15 substrate lattice, four bar shaped scuppers have been dug on four limits, bottom surface, four columns of matrix 1 are provided with 20 groups of slots that cooperate with front and rear baffle 2, be provided with 20 groups of slots that cooperate with left baffle 3, be provided with 10 groups of slots that cooperate with diaphragm plate 3.

As shown in Figure 2, two front and rear baffles 2 are inserted respectively in the column of matrix 1, the groove of front and rear baffle 2 and matrix 1 bottom surface row groove are corresponding one by one, and there is the distance about 1cm front and rear baffle 2 and matrix 1 bottom surface.

As shown in Figure 3, two left baffle 3 are inserted respectively in the column of matrix 1, the groove of left baffle 3 and matrix 1 bottom surface substrate lattice are corresponding one by one, and there is the distance about 1cm left baffle 3 and basic 1 bottom surface.

As shown in Figure 4, present embodiment can be assembled to 1-5 sheet vertical clapboard 5 in the cleaning device, each classifies an interlayer unit as matrix 1 bottom surface, utilize vertical clapboard 5 can tell 1-6 interlayer, vertical clapboard 5 closely cooperates with front and rear baffle 2 and matrix 1 bottom surface, can put 0-15 sheet substrate in each interlayer.

As shown in Figure 5, insert diaphragm plate 4 in matrix 1 column, diaphragm plate 4 is identical with matrix 1 bottom surface structure.

As shown in Figure 6, can on matrix 1 or one deck diaphragm plate, insert two-layer front and rear baffle 2 and two-layer left baffle 3 simultaneously as required.

As shown in Figure 7, with shown in Figure 4 similar, can assemble 1-5 sheet vertical clapboard 5.

In a word, can adjust and assemble front and rear baffle 2, left baffle 3, diaphragm plate 4 and the vertical clapboard 5 of some quantity, for the substrate of depositing different in width according to actual needs.

As shown in Figure 8, the cleaning device that assembles is put into quartz curette 6, cover lid 7, quartz curette 6 one side lower ends have a waterpipe jointing, are connected on water pump 8 inlets through water pipe, and water pump 8 outlets are connected on the waterpipe jointing of lid 7 centers through water pipe.

Concrete installation method: earlier all around front and rear baffle, left baffle are inserted matrix column fixed slot, finish assembling for the first time.Later every increase one deck assembling, then many insertion one deck diaphragm plates get final product.Can insert vertical clapboard with fixed substrate according to sizes of substrate, because inserting vertical clapboard, existing substrate width design front and rear baffle it widely can be divided into three kinds, in order to deposit the substrate of three kinds of different sizes, big I is made according to actual needs, and substrate fixedly is issued to stable at the slot of front and rear baffle, left baffle, diaphragm plate and vertical clapboard.For big substrate, can increase front and rear baffle, left baffle and the vertical clapboard number of plies to meet the demands.

After finishing, the integral body assembling can install the motor of water inlet pipe, outlet pipe and antiacid caustic corrosion additional, can inject in the quartz curette different cleaning solution and wash cycles according to requirement to substrate cleaning, reach higher cleaning effect, and under the situation that does not install inlet tube and outlet tube and motor additional, whole quartz curette can be put in and carry out ultrasonic dedusting in the ultrasonic cleaning instrument.Because outer quartz curette is overall structure and discrete haptic element is arranged, and can guarantee that substrate can not shake damage.Cleaning finishes and the related some plug-in units of inner base can be taken out together, and surplus solution can be discharged from the scupper of matrix lower side when removing plug-in unit and substrate, can the residual solution corrosion device thereby guarantee.

Claims

1. a Weft cleaner is characterized in that this Weft cleaner mainly comprises matrix (1), front and rear baffle (2), left baffle (3), diaphragm plate (4), vertical clapboard (5), quartz curette (6), lid (7) and water pump (8);

Matrix (1) is made up of bottom surface, column and handle: matrix (1) bottom surface is provided with substrate lattice and scupper; Column is provided with the built-in fixed slot that is used for fixing front and rear baffle (2), left baffle (3) and diaphragm plate (4); The connector on corresponding column top constitutes handle;

Front and rear baffle (2) is provided with column slot arm, and is provided with and matrix (1) bottom surface and the corresponding inside groove of diaphragm plate (4) substrate lattice separation trough;

Left baffle (3) is provided with column slot arm, and is provided with and matrix (1) bottom surface and the corresponding inside groove of diaphragm plate (4) substrate cell;

Diaphragm plate (4) is provided with column slot arm and substrate lattice;

Vertical clapboard (5) is provided with front and rear baffle (2) slot arm, and its inside groove is corresponding with matrix (1) bottom surface substrate lattice, diaphragm plate (4) substrate lattice and left baffle (3) inside groove;

Matrix (1) is included in the quartz curette (6); Quartz curette (6) bottom is provided with the haptic element device.The waterpipe jointing of quartz curette lid (7) and its bottom is connected with inlet with the outlet of water pump (8) respectively.