CN1996547A - 回转减速浸没式物镜电子光学聚焦、偏转和信号的收集方法 - Google Patents
回转减速浸没式物镜电子光学聚焦、偏转和信号的收集方法 Download PDFInfo
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- CN1996547A CN1996547A CNA2007100023408A CN200710002340A CN1996547A CN 1996547 A CN1996547 A CN 1996547A CN A2007100023408 A CNA2007100023408 A CN A2007100023408A CN 200710002340 A CN200710002340 A CN 200710002340A CN 1996547 A CN1996547 A CN 1996547A
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- 239000000523 sample Substances 0.000 description 74
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/103—Lenses characterised by lens type
- H01J2237/1035—Immersion lens
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/151—Electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/25—Tubes for localised analysis using electron or ion beams
- H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
- H01J2237/2594—Measuring electric fields or potentials
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2002/022045 WO2003081286A2 (en) | 2000-02-25 | 2002-03-21 | Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028289935A Division CN100397550C (zh) | 2000-02-25 | 2002-03-21 | 回转减速浸没式物镜电子光学聚焦、偏转和信号的收集系统 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1996547A true CN1996547A (zh) | 2007-07-11 |
CN100565774C CN100565774C (zh) | 2009-12-02 |
Family
ID=34102320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007100023408A Expired - Lifetime CN100565774C (zh) | 2002-03-21 | 2002-03-21 | 回转减速浸没式物镜电子光学聚焦、偏转和信号的收集方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2005521215A (zh) |
KR (1) | KR100813210B1 (zh) |
CN (1) | CN100565774C (zh) |
AU (1) | AU2002330873A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103038855A (zh) * | 2010-10-27 | 2013-04-10 | 株式会社Param | 电子透镜和电子束装置 |
TWI576888B (zh) * | 2014-11-28 | 2017-04-01 | 財團法人工業技術研究院 | 檢測儀器及其檢測方法 |
CN106783466A (zh) * | 2016-12-27 | 2017-05-31 | 四川智研科技有限公司 | 一种加速电子束流光学结构 |
CN106920723A (zh) * | 2017-03-06 | 2017-07-04 | 聚束科技(北京)有限公司 | 一种扫描聚焦系统及电子束控制方法 |
CN111681939A (zh) * | 2015-07-22 | 2020-09-18 | Asml荷兰有限公司 | 多个带电粒子束的装置 |
CN117706881A (zh) * | 2024-02-05 | 2024-03-15 | 广东省科学院半导体研究所 | 一种电子束偏转模组、电子束聚焦偏转系统及电子束光柱体 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101524381B1 (ko) * | 2013-12-30 | 2015-05-29 | 현대제철 주식회사 | 레들 카세트용 방열판 |
US10777382B2 (en) * | 2017-11-21 | 2020-09-15 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Low voltage scanning electron microscope and method for specimen observation |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57202630A (en) * | 1981-06-08 | 1982-12-11 | Rikagaku Kenkyusho | Electrostatic deflector |
US4945246A (en) * | 1989-03-24 | 1990-07-31 | International Business Machines Corporation | Tri-deflection electron beam system |
EP0821393B1 (en) | 1996-07-25 | 1999-06-16 | ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH | Detector objective lens |
JP3564958B2 (ja) * | 1997-08-07 | 2004-09-15 | 株式会社日立製作所 | 電子ビームを用いた検査方法及び検査装置 |
EP0968517B1 (en) * | 1997-12-23 | 2003-09-03 | Fei Company | Sem provided with an electrostatic objective and an electrical scanning device |
JP4006946B2 (ja) * | 2000-01-25 | 2007-11-14 | 株式会社日立製作所 | 走査電子顕微鏡 |
EP1120809B1 (en) * | 2000-01-27 | 2012-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Objective lens for a charged particle beam device |
JP2001273861A (ja) * | 2000-03-28 | 2001-10-05 | Toshiba Corp | 荷電ビーム装置およびパターン傾斜観察方法 |
-
2002
- 2002-03-21 AU AU2002330873A patent/AU2002330873A1/en not_active Abandoned
- 2002-03-21 KR KR1020047014962A patent/KR100813210B1/ko active IP Right Grant
- 2002-03-21 JP JP2003578966A patent/JP2005521215A/ja active Pending
- 2002-03-21 CN CNB2007100023408A patent/CN100565774C/zh not_active Expired - Lifetime
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103038855A (zh) * | 2010-10-27 | 2013-04-10 | 株式会社Param | 电子透镜和电子束装置 |
CN103038855B (zh) * | 2010-10-27 | 2016-02-03 | 株式会社Param | 电子透镜和电子束装置 |
US9418815B2 (en) | 2010-10-27 | 2016-08-16 | Param Corporation | Tubular permanent magnet used in a multi-electron beam device |
TWI576888B (zh) * | 2014-11-28 | 2017-04-01 | 財團法人工業技術研究院 | 檢測儀器及其檢測方法 |
CN111681939A (zh) * | 2015-07-22 | 2020-09-18 | Asml荷兰有限公司 | 多个带电粒子束的装置 |
CN111681939B (zh) * | 2015-07-22 | 2023-10-27 | Asml荷兰有限公司 | 多个带电粒子束的装置 |
CN106783466A (zh) * | 2016-12-27 | 2017-05-31 | 四川智研科技有限公司 | 一种加速电子束流光学结构 |
CN106783466B (zh) * | 2016-12-27 | 2019-04-02 | 四川智研科技有限公司 | 一种加速电子束流光学结构 |
CN106920723A (zh) * | 2017-03-06 | 2017-07-04 | 聚束科技(北京)有限公司 | 一种扫描聚焦系统及电子束控制方法 |
CN117706881A (zh) * | 2024-02-05 | 2024-03-15 | 广东省科学院半导体研究所 | 一种电子束偏转模组、电子束聚焦偏转系统及电子束光柱体 |
CN117706881B (zh) * | 2024-02-05 | 2024-05-17 | 广东省科学院半导体研究所 | 一种电子束偏转模组、电子束聚焦偏转系统及电子束光柱体 |
Also Published As
Publication number | Publication date |
---|---|
JP2005521215A (ja) | 2005-07-14 |
AU2002330873A1 (en) | 2003-10-08 |
KR20040101340A (ko) | 2004-12-02 |
KR100813210B1 (ko) | 2008-03-13 |
CN100565774C (zh) | 2009-12-02 |
AU2002330873A8 (en) | 2003-10-08 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190212 Address after: Holland Weide Eindhoven Patentee after: ASML Holding N.V Address before: Holland Weide Eindhoven Patentee before: Hermes-Microvision, Inc. Effective date of registration: 20190212 Address after: Holland Weide Eindhoven Patentee after: Hermes-Microvision, Inc. Address before: 5th Floor, 18 Yanxin Road, Xinzhu Science Park, Taiwan, China Patentee before: Hermes-Microvision, Inc. |
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Granted publication date: 20091202 |