AU2002330873A1 - Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method - Google Patents

Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method

Info

Publication number
AU2002330873A1
AU2002330873A1 AU2002330873A AU2002330873A AU2002330873A1 AU 2002330873 A1 AU2002330873 A1 AU 2002330873A1 AU 2002330873 A AU2002330873 A AU 2002330873A AU 2002330873 A AU2002330873 A AU 2002330873A AU 2002330873 A1 AU2002330873 A1 AU 2002330873A1
Authority
AU
Australia
Prior art keywords
objectif
swinging
deflection
collection system
signal collection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002330873A
Other versions
AU2002330873A8 (en
Inventor
Zhong-Wei Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hermes Microvision Inc
Original Assignee
Hermes Microvision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hermes Microvision Inc filed Critical Hermes Microvision Inc
Priority claimed from PCT/US2002/022045 external-priority patent/WO2003081286A2/en
Publication of AU2002330873A8 publication Critical patent/AU2002330873A8/en
Publication of AU2002330873A1 publication Critical patent/AU2002330873A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/103—Lenses characterised by lens type
    • H01J2237/1035—Immersion lens
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2594—Measuring electric fields or potentials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU2002330873A 2002-03-21 2002-03-21 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method Abandoned AU2002330873A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2002/022045 WO2003081286A2 (en) 2000-02-25 2002-03-21 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method

Publications (2)

Publication Number Publication Date
AU2002330873A8 AU2002330873A8 (en) 2003-10-08
AU2002330873A1 true AU2002330873A1 (en) 2003-10-08

Family

ID=34102320

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002330873A Abandoned AU2002330873A1 (en) 2002-03-21 2002-03-21 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method

Country Status (4)

Country Link
JP (1) JP2005521215A (en)
KR (1) KR100813210B1 (en)
CN (1) CN100565774C (en)
AU (1) AU2002330873A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5148014B2 (en) 2010-10-27 2013-02-20 株式会社Ｐａｒａｍ Electron lens and electron beam device
KR101524381B1 (en) * 2013-12-30 2015-05-29 현대제철 주식회사 Heat insulating board for ladle cassette
TWI576888B (en) * 2014-11-28 2017-04-01 財團法人工業技術研究院 Detecting instrument and detecting method thereof
KR20190091577A (en) * 2015-07-22 2019-08-06 에이에스엠엘 네델란즈 비.브이. Apparatus of plural charged-particle beams
CN106783466B (en) * 2016-12-27 2019-04-02 四川智研科技有限公司 A kind of accelerated electron beam stream optical texture
CN106920723A (en) * 2017-03-06 2017-07-04 聚束科技（北京）有限公司 A kind of scanning focused system and electron beam control method
WO2019100600A1 (en) * 2017-11-21 2019-05-31 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
CN117706881B (en) * 2024-02-05 2024-05-17 广东省科学院半导体研究所 Electron beam deflection module, electron beam focusing deflection system and electron beam optical column

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57202630A (en) * 1981-06-08 1982-12-11 Rikagaku Kenkyusho Electrostatic deflector
US4945246A (en) * 1989-03-24 1990-07-31 International Business Machines Corporation Tri-deflection electron beam system
EP0821393B1 (en) * 1996-07-25 1999-06-16 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Detector objective lens
JP3564958B2 (en) * 1997-08-07 2004-09-15 株式会社日立製作所 Inspection method and inspection apparatus using electron beam
EP0968517B1 (en) * 1997-12-23 2003-09-03 Fei Company Sem provided with an electrostatic objective and an electrical scanning device
JP4006946B2 (en) * 2000-01-25 2007-11-14 株式会社日立製作所 Scanning electron microscope
EP1120809B1 (en) * 2000-01-27 2012-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Objective lens for a charged particle beam device
JP2001273861A (en) * 2000-03-28 2001-10-05 Toshiba Corp Charged beam apparatus and pattern incline observation method

Also Published As

Publication number Publication date
CN1996547A (en) 2007-07-11
AU2002330873A8 (en) 2003-10-08
JP2005521215A (en) 2005-07-14
KR100813210B1 (en) 2008-03-13
CN100565774C (en) 2009-12-02
KR20040101340A (en) 2004-12-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase