CN1991333B - Zero-Abbe error measuring system and its method - Google Patents
Zero-Abbe error measuring system and its method Download PDFInfo
- Publication number
- CN1991333B CN1991333B CN2005101374506A CN200510137450A CN1991333B CN 1991333 B CN1991333 B CN 1991333B CN 2005101374506 A CN2005101374506 A CN 2005101374506A CN 200510137450 A CN200510137450 A CN 200510137450A CN 1991333 B CN1991333 B CN 1991333B
- Authority
- CN
- China
- Prior art keywords
- mobile platform
- height
- grating
- vertical height
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
A zero Abelian error measuring system is disclosed that includes: moving platform, detecting equipment, the first and second three-dimensional optical rulers. The moving platform is used to load the sample to be measured. The detecting equipment is used to detect the sample and measure the perpendicular height of observation point relative to sample. The first and second three-dimensional optical rulers are mounted separately on the moving platform face to face secluded by the sample; the height of the first and second three-dimensional optical rulers can be adjusted tiny along the perpendicular height, the perpendicular height of the first and second three-dimensional optical rulers relative to the moving platform is same as the perpendicular height of observation point to measure the sample.
Description
Technical field
The present invention relates to a kind of measuring system and method thereof, and be particularly related to a kind of measuring system and the method thereof that can eliminate Abbe error.
Background technology
The framework of conventional three-dimensional little (receiving) rice measuring system, as scanning probe microscopy (scanning probemicroscopy, SPM), atomic force microscope (atomic force microscope, AFM) with three coordinate measuring machine (coordinate measuring machine, CMM) etc., mainly formed with subsystems such as pattern detection system and/or locating platforms.The groundwork of pattern detection system is to utilize modes such as probe to obtain the surface information of determinand.The locating platform system then is responsible for promoting probe carrier or mobile platform, makes total system finish the scanning and measurement action of three dimensions.But the putting position of optics chi in this kind positioning system (linear scale) or interferometer and probe or measurement terminals between the two can be because of being seated in different positions, and have angular deviation in a way.This deviation can make measuring process produce so-called Abbe error (Abbe error) because 2 distance increases and increases.This Abbe error can influence last actual measured results and reduce the degree of accuracy of measuring.
In three-dimension measuring system, generally be to adopt the instrument of many group optical interdferometers as the platform location, also add the measurement design of Zero-Abbe error in addition.But when locating with interferometer, often having needs more problem and shortcomings such as element, contraposition complexity, optical path length and air interference, so degree of accuracy and system effectiveness are not easy to improve.Also have in addition and use the optics chi to come as locating device, it possess light path relatively short with advantages such as contraposition is convenient.
Fig. 1 represents the measuring system of known use interferometer.The measuring system of Fig. 1 comprises optical interdferometer 106x, 106y, the 106z of three coordinate directions.On mobile platform 100, place sample 102 to be measured.In addition, use the probe etc. of detecting device 104 to obtain the information such as surface topography of sample 102 to be measured.Have a bit of distance between the probe of detecting device 104 and positioning table displacement measurement position, this makes and produce so-called Abbe error in measuring process.Fig. 2 is the known interferometer measuring system with Zero-Abbe error design of expression.Fig. 2 is that three groups of optical interdferometer 106x, 106y that make Fig. 1, the measuring beam of 106z intersect at a point along three of XYZ, and utilize Abbe error correction portion 108a, 108b that anchor point is dropped on the measurement point, position work, make Abbe error eliminate minimum.But adopt the location of interferometer, system complexity is increased, and it is a lot of that system cost is increased.
Therefore, the someone proposes to use the mode of optics chi.Fig. 3 is the synoptic diagram of three-dimensional optical positioning rule measuring system.As shown in Figure 3, the optics chi comprises grating 120 and light source 122, utilizes light source that the grating outgoing beam is positioned.Grating 120 is arranged on the below of mobile platform 100, and this kind framework can drop on diverse location because of anchor point and actual measurement location, and can produce Abbe error equally.
Therefore, how to improve the problems referred to above, obtain one simple, low-cost and can eliminate the measuring system of Abbe error, be a ring of measuring technique institute Gonna breakthrough.
Summary of the invention
In view of the above problems, purpose of the present invention just provides a kind of Zero-Abbe error measuring system, is locating platform with three-dimensional or two-dimension optical chi, add new design, make measurement result reach Zero-Abbe error, replace general interferometer measuring system, and reduce system cost.
For reaching above-mentioned purpose, the present invention proposes a kind of Zero-Abbe error measuring system, and it comprises mobile platform, pick-up unit and first and second three-dimensional optical chi.Mobile platform is in order to mounting sample to be measured.Pick-up unit is in order to detecting sample to be measured, and measures the vertical height of the tested point of sample to be measured with respect to mobile platform.First and second three-dimensional optical chi is separately positioned on the mobile platform and across sample to be measured toward each other, wherein first and second three-dimensional optical chi vertically this mobile platform carry out height fine setting, first and second three-dimensional optical chi is equated, to carry out the measurement of sample to be measured with the vertical height of tested point with respect to the vertical height of mobile platform.
According to an embodiment of the present invention, first and second three-dimensional optical chi of aforementioned Zero-Abbe error measuring system also comprises two-dimensional grating, height micro actuator and height sensor respectively.Two-dimensional grating is arranged on the mobile platform, with the location mobile platform.The height micro actuator is connected with two-dimensional grating, in order to the vertical height of fine setting two-dimensional grating.Height sensor is arranged to be approximately perpendicular to the two-dimensional grating top, in order to outgoing beam, detects the vertical height of two-dimensional grating.
According to an embodiment of the present invention, aforementioned two-dimensional grating has contoured surface.In addition, when aforementioned contoured surface is light when penetrable, the substrate of two-dimensional grating also has reflecting surface.In addition, two-dimensional grating can for example be the full image type two-dimensional grating.
According to an embodiment of the present invention, aforementioned Zero-Abbe error measuring system can also comprise control circuit, and it comprises comparer at least and highly finely tunes controller.Comparer is in order to the vertical height of the tested point of the vertical height of the height sensor output that receives first and second three-dimensional optical chi and pick-up unit output, and exports the difference of both vertical heights.Highly finely tune controller and be connected to the output terminal of comparer, receive this difference and, carry out the fine setting of the vertical height of two-dimensional grating according to this difference control height micro actuator.
In addition, the present invention also proposes a kind of Zero-Abbe error measuring system, and it comprises mobile platform, pick-up unit and first and second two-dimension optical chi.Mobile platform is in order to mounting sample to be measured.Pick-up unit is in order to detecting sample to be measured, and measures the vertical height of the tested point of sample to be measured with respect to mobile platform.First and second two-dimension optical chi is separately positioned on the mobile platform and across sample to be measured toward each other, wherein first and second two-dimension optical chi vertically this mobile platform carry out height fine setting, first and second two-dimension optical chi is equated, to carry out the measurement of sample to be measured with the vertical height of tested point with respect to the vertical height of mobile platform.
According to an embodiment of the present invention, aforementioned each two-dimension optical chi comprises grating, height micro actuator, light source and height sensor respectively.Grating is arranged on the mobile platform, with the location mobile platform.The height micro actuator is connected with grating, in order to the vertical height of fine setting grating.Light source is arranged to be approximately perpendicular to mobile platform below, in order to the grating outgoing beam, to carry out the location of mobile platform.Height sensor is arranged to be approximately perpendicular to the two-dimensional grating top, in order to outgoing beam, detects the vertical height of grating.Aforesaid height sensor for example can be interferometer or pinpoint accuracy deviation meter.
In addition, the present invention also proposes a kind of Zero-Abbe error measuring method, in order to measure the to be measured sample of mounting on mobile platform.First and second optics chi also is set on the mobile platform.The Zero-Abbe error measuring method may further comprise the steps at least: detect the surface of sample to be measured, and measure first vertical height of the tested point of sample to be measured with respect to this mobile platform; Detect second vertical height of first and second optics chi with respect to mobile platform; And, carry out the vertical height fine setting of first and second two-dimension optical chi according to the difference of first and second vertical height, first and second vertical height is equated, to measure sample to be measured.
In sum, the present invention is placed on the XY plane of the grating of optics chi on the vertical height identical with point to be measured, make anchor point and measurement point all remain on the same plane, use when elimination is known to be placed on the sample below with grating the different Abbe errors that cause of measurement point with the actual location position.
In addition,, or only use on vertical height is measured because the present invention does not use the usefulness of interferometer as the platform location, thus more do not need extra Abbe error compensation system, so can reduce the cost and the complexity of system.
State with other purpose, feature and advantage and can become apparent on the present invention for allowing, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 represents the measuring system of known use interferometer.
Fig. 2 represents known interferometer measuring system with Zero-Abbe error design.
Fig. 3 is the synoptic diagram of three-dimensional optical positioning rule measuring system.
Fig. 4 is the synoptic diagram according to the Zero-Abbe error measuring system of the embodiment of the invention.
Fig. 5 is the synoptic diagram of the control circuit of Fig. 4.
Fig. 6 is the synoptic diagram according to the Zero-Abbe error measuring system of another embodiment of the present invention.
The main element description of symbols
100 mobile platforms
102 samples to be measured
104 pick-up units
106x, 106y, 106z interferometer
108a, 108b Abbe error correction portion
120 gratings (optics chi)
122 light sources (optics chi)
200 mobile platforms
210 microscope carriers
212 samples to be measured
230,240 measuring systems (three-dimensional optical chi)
232,242 height sensors
234,244 two-dimensional gratings
250 pick-up units
264 comparers
266 controllers
300,310 measuring systems (two-dimension optical chi)
302,312 height sensors
304,314 light sources
306,316 gratings
306a, 316a reflecting surface
308,318 height micro actuators
Embodiment
Fig. 4 is the synoptic diagram according to the Zero-Abbe error measuring system of the embodiment of the invention.For making figure simplify readability, the detailed physical construction of system itself is omitted, and the person of ordinary skill in the field can do suitable design according to following explanation.
Zero-Abbe error measuring system of the present invention mainly comprises two parts, and a part detects subsystem for pattern, and another part then is a platform location survey subsystem.As shown in Figure 4, pattern detects subsystem and is made of pick-up unit 250, and it has probe, can detect the surface topography of sample to be measured (hereinafter to be referred as sample) 212.Sample 212 to be measured is to be placed on the three-dimensional mobile platform (3D moving table) 200 via a microscope carrier 210.This mobile platform 200 can move along illustrated XYZ axle three directions, so that the surface topography of pick-up unit 250 detection samples 212 or other physicochemical characteristics or the like.
Platform location survey subsystem mainly is to be made of 230,240 of two groups of measuring systems.Measuring system 230,240 mainly is to use the location of three-dimensional optical chi as platform, hereinafter referred to as the first three-dimensional optical chi 230 and the second three-dimensional optical chi 240.As shown in Figure 4, the first three-dimensional optical chi 230 and the second three-dimensional optical chi 240 are separately positioned on the mobile platform 200, and across sample 212 toward each other.The first three-dimensional optical chi 230 can carry out the fine setting of height (H) by vertical this mobile platform with the second three-dimensional optical chi 240, the three-dimensional optical chi 230 of winning is equated, to carry out the measurement of sample 212 with the vertical height of tested point with the vertical height of the second three-dimensional optical chi 240 with respect to this mobile platform.
The first three-dimensional optical chi 230 comprises two-dimensional grating 234, height micro actuator (not shown), height sensor (Z axle height) 232.Two-dimensional grating 234 is arranged on the mobile platform 200, with location mobile platform 200.The height micro actuator can be used for the vertical height H of two-dimensional grating 234 is finely tuned.Height sensor 232 for example mainly can penetrate light beams such as laser, in order to detect the vertical height of two-dimensional grating 234 with respect to mobile platform 200.
Similarly, the second three-dimensional optical chi 240 comprises two-dimensional grating 244, height micro actuator (not shown), height sensor (Z axle height) 242.Two-dimensional grating 244 is arranged on the mobile platform 200, with location mobile platform 200.The height micro actuator can be used for the vertical height H of two-dimensional grating 244 is finely tuned.Height sensor 242 for example mainly can penetrate light beams such as laser, in order to detect the vertical height of two-dimensional grating 244 with respect to mobile platform 200.
About two-dimensional grating 234,244, it can use the two-dimension optical chi with surface undulation, as the measurement of displacement.In addition, penetrable if aforementioned surfaces rises and falls for light, then can do the reflection horizon in the base material bottom surface of two-dimensional grating, the light beam that height sensor 232 is penetrated can be reflected back, and carries out the detection of Z axle height H.In addition, two-dimensional grating 234,244 also can use full image type two-dimension optical chi, as the measurement of displacement.So long as can reach the function and the purpose person of two-dimensional grating 234,244, its embodiment seldom limits.
The operation of above-mentioned measuring system then is described.When measuring, mobile platform 200 can move, and makes pick-up unit 250 remove to detect each tested point of sample 212.In addition, pick-up unit 250 also can detect the vertical height of tested point with respect to mobile platform 200 simultaneously.At this moment, the height sensor 232,242 of two-dimension optical chi 230,240 can detect the vertical height with respect to mobile platform 200 on the XY plane of two-dimensional grating 234,244.Then, can compare the vertical height of height sensor 232,242 and the vertical height of tested point, two vertical heights not simultaneously, the height micro actuator of two-dimension optical chi 230,240 can move, adjust the vertical height of two-dimension optical chi 230,240, so that the vertical height on the XY plane of two-dimensional grating 234,244 is identical with the vertical height of tested point.In whole measuring process, the vertical height of tested point can change always.According to this height change, the height micro actuator of two-dimension optical chi 230,240 also can be constantly along with height is adjusted in action, make the vertical height on the XY plane of two-dimensional grating 234,244 can be identical with the vertical height of each tested point.
As mentioned above, because in measuring process, the vertical height on the XY plane of two-dimensional grating 234,244 can all keep identical with the vertical height of tested point always, so can eliminate Abbe error, reaches the purpose of Zero-Abbe error.
Fig. 5 is the synoptic diagram of the control circuit of Fig. 4.Control circuit shown in Figure 5 is to be used for controlling aforementioned measuring process.Control circuit comprises comparer 264 and controller 266.
The vertical height on the XY plane of aforementioned height sensor 232,242 two-dimensional gratings of being exported 234,244 of comparer 264 meeting receptions and the vertical height of the tested point that aforementioned pick-up unit 250 is exported.Comparer 264 then compares the difference of both vertical heights, and exports to controller 266.Controller 266 is then according to the height micro actuator of this difference control two-dimensional grating 234,244, and the vertical height on the XY plane of two-dimensional grating 234,244 is carried out the height fine setting of Z-direction, and the vertical height that makes vertical height and tested point is on identical height.In whole measuring process, above-mentioned negative feedback control action all the time makes the vertical height on XY plane of two-dimensional grating 234,244 remain on the identical height with the vertical height of tested point, uses the elimination Abbe error.
As mentioned above, the present invention utilizes simple optics chi just can reach the measurement purpose of Zero-Abbe error, reduces the cost of system greatly.
Fig. 6 is the synoptic diagram according to the Zero-Abbe error measuring system of another embodiment of the present invention.This embodiment mainly is the variation example of Fig. 4, and difference of them is that Fig. 4 is to use the three-dimensional optical chi, and the system of Fig. 6 is to use the two-dimension optical chi.
As shown in Figure 6, Zero-Abbe error measuring system is except platform location survey subsystem is variant, and other Zero-Abbe error measuring system to Fig. 4 is similar.Only do explanation herein at platform location survey subsystem.
The first two-dimension optical chi 300 comprises grating 306, height micro actuator 308, light source 304 and height sensor 302.Grating 306 is arranged on the mobile platform 200, in order to location mobile platform 200.Height micro actuator 308 is connected to grating 306, in order to the vertical height H of fine setting grating 306.Light source is arranged to be approximately perpendicular to mobile platform 200 belows, in order to grating 306 outgoing beams, to carry out the location of mobile platform 200.Height sensor 302 is arranged to be approximately perpendicular to two-dimensional grating 306 tops, in order to outgoing beam, detects the vertical height of grating 306.
The second two-dimension optical chi 310 comprises grating 316, height micro actuator 318, light source 314 and height sensor 312.Grating 316 is arranged on the mobile platform 200, in order to location mobile platform 200.Height micro actuator 318 is connected to grating 316, in order to the vertical height H of fine setting grating 316.Light source is arranged to be approximately perpendicular to mobile platform 200 belows, in order to grating 3 16 outgoing beams, to carry out the location of mobile platform 200.Height sensor 312 is arranged to be approximately perpendicular to two-dimensional grating 316 tops, in order to outgoing beam, detects the vertical height of grating 316.
When measuring, the principle of eliminating Abbe error is identical with the system of Fig. 4, so just seldom describe at this.Illustrate that with the first two-dimension optical chi 300 present embodiment is to use general grating on the platform location, and cooperate light source 304 to carry out.The vertical height fine setting on the XY surface of grating 306 then utilizes height sensor 302 to carry out.In order to cooperate this structure, on the surperficial 306a of grating 306, reflecting surface is set, use the beam reflection that height sensor 302 is penetrated and go back, with the vertical height on the XY surface of measuring grating 306.
Above-mentioned height sensor 302,312 can for example use the deviation meter of interferometer or pinpoint accuracy.In addition, identical with the embodiment of Fig. 4, Fig. 6 embodiment also can utilize control circuit shown in Figure 5, carries out the vertical height micro actuator of grating, just seldom does description at this.
In sum, the present invention is placed on the XY plane of the grating of optics chi on the vertical height identical with point to be measured, make anchor point and measurement point all remain on the same plane, use when elimination is known to be placed on the sample below with grating the different Abbe errors that cause of measurement point with the actual location position.
In addition, because the present invention does not use the usefulness of interferometer as the platform location, and interferometer is also only highly being measured as if using, thus more do not need extra Abbe error compensation system, so can reduce the cost and the complexity of system.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any person of ordinary skill in the field; without departing from the spirit and scope of the invention; when can doing a little change and improvement, so the present invention's protection domain is as the criterion when looking the claim person of defining.
Claims (11)
1. Zero-Abbe error measuring system is characterized in that comprising:
Mobile platform is in order to mounting sample to be measured;
Pick-up unit in order to this sample to be measured of detection, and is measured the vertical height of the tested point of this sample to be measured with respect to this mobile platform;
First and second three-dimensional optical chi, be separately positioned on this mobile platform and toward each other across this sample to be measured, wherein this first can vertical this mobile platform carry out the height fine setting with this second three-dimensional optical chi, this first is equated with the vertical height of this tested point with respect to this mobile platform with the vertical height of this second three-dimensional optical chi with respect to this mobile platform, to carry out the measurement of this sample to be measured
Wherein this first comprises respectively with this second three-dimensional optical chi:
Two-dimensional grating is arranged on this mobile platform, to locate this mobile platform;
The height micro actuator is connected with this two-dimensional grating, in order to finely tune the vertical height of this two-dimensional grating; And
Height sensor is arranged to be approximately perpendicular to this two-dimensional grating top, in order to outgoing beam, detects the vertical height of this two-dimensional grating.
2. the Zero-Abbe error measuring system according to claim 1 is characterized in that this two-dimensional grating has contoured surface.
3. the Zero-Abbe error measuring system according to claim 2, this contoured surface that it is characterized in that this two-dimensional grating is that light is penetrable, and the substrate of this two-dimensional grating has reflecting surface.
4. the Zero-Abbe error measuring system according to claim 1 is characterized in that this two-dimensional grating is the full image type two-dimensional grating.
5. the Zero-Abbe error measuring system according to claim 1 is characterized in that also comprising control circuit, and this control circuit also comprises:
Comparer, in order to receive respectively this first with the vertical height of this tested point of the vertical height of this height sensor output of this second three-dimensional optical chi and the output of this pick-up unit, and export the difference of both vertical heights; And
Highly finely tune controller, be connected to the output terminal of this comparer, receive this difference, and control this height micro actuator according to this difference.
6. Zero-Abbe error measuring system is characterized in that comprising:
Mobile platform is in order to mounting sample to be measured;
Pick-up unit in order to this sample to be measured of detection, and is measured the vertical height of the tested point of this sample to be measured with respect to this mobile platform;
First and second two-dimension optical chi, be separately positioned on this mobile platform and toward each other across this sample to be measured, wherein this first can vertical this mobile platform carry out the height fine setting with this second two-dimension optical chi, this first is equated with the vertical height of this tested point with respect to this mobile platform with the vertical height of this second two-dimension optical chi with respect to this mobile platform, to carry out the measurement of this sample to be measured
Wherein this first comprises respectively with this second two-dimension optical chi:
Grating is arranged on this mobile platform, to locate this mobile platform;
The height micro actuator is connected with this grating, in order to finely tune the vertical height of this grating;
Light source is arranged to be approximately perpendicular to this mobile platform below, in order to this grating outgoing beam, to carry out the location of this mobile platform; And
Height sensor is arranged to be approximately perpendicular to this grating top, in order to outgoing beam, detects the vertical height of this grating.
7. the Zero-Abbe error measuring system according to claim 6 is characterized in that this height sensor is an interferometer.
8. the Zero-Abbe error measuring system according to claim 6 is characterized in that this height sensor is a deviation meter.
9. the Zero-Abbe error measuring system according to claim 6 is characterized in that also comprising control circuit, and this control circuit also comprises:
Comparer, in order to receive respectively this first with the vertical height of this tested point of the vertical height of this height sensor output of this second two-dimension optical chi and the output of this pick-up unit, and export the difference of both vertical heights; And
Highly finely tune controller, be connected to the output terminal of this comparer, receive this difference, and control this height micro actuator according to this difference.
10. a Zero-Abbe error measuring method in order to measure the to be measured sample of mounting on mobile platform, is characterized in that also being provided with on this mobile platform first and second three-dimensional optical chi, and this Zero-Abbe error measuring method comprises:
Detect the surface of this sample to be measured, and measure first vertical height of the tested point of this sample to be measured with respect to this mobile platform;
Detect this first with this second three-dimensional optical chi with respect to second vertical height of this mobile platform;
According to this first with the difference of this second vertical height, carry out this first with the vertical height fine setting of this second three-dimensional optical chi, this first is equated with this second vertical height, with this sample to be measured of measurement,
Wherein this first comprises respectively with this second three-dimensional optical chi:
Two-dimensional grating is arranged on this mobile platform, to locate this mobile platform;
The height micro actuator is connected with this two-dimensional grating, in order to finely tune the vertical height of this two-dimensional grating; And
Height sensor is arranged to be approximately perpendicular to this two-dimensional grating top, in order to outgoing beam, detects the vertical height of this two-dimensional grating.
11. a Zero-Abbe error measuring method in order to measure the to be measured sample of mounting on mobile platform, is characterized in that also being provided with on this mobile platform first and second two-dimension optical chi, this Zero-Abbe error measuring method comprises:
Detect the surface of this sample to be measured, and measure first vertical height of the tested point of this sample to be measured with respect to this mobile platform;
Detect this first with this second two-dimension optical chi with respect to second vertical height of this mobile platform;
According to this first with the difference of this second vertical height, carry out this first with the vertical height fine setting of this second two-dimension optical chi, this first is equated with this second vertical height, with this sample to be measured of measurement,
Wherein this first comprises respectively with this second two-dimension optical chi:
Grating is arranged on this mobile platform, to locate this mobile platform;
The height micro actuator is connected with this grating, in order to finely tune the vertical height of this grating;
Light source is arranged to be approximately perpendicular to this mobile platform below, in order to this grating outgoing beam, to carry out the location of this mobile platform; And
Height sensor is arranged to be approximately perpendicular to this grating top, in order to outgoing beam, detects the vertical height of this grating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101374506A CN1991333B (en) | 2005-12-30 | 2005-12-30 | Zero-Abbe error measuring system and its method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101374506A CN1991333B (en) | 2005-12-30 | 2005-12-30 | Zero-Abbe error measuring system and its method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1991333A CN1991333A (en) | 2007-07-04 |
| CN1991333B true CN1991333B (en) | 2010-11-10 |
Family
ID=38213744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005101374506A Expired - Fee Related CN1991333B (en) | 2005-12-30 | 2005-12-30 | Zero-Abbe error measuring system and its method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1991333B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100585454C (en) * | 2008-12-29 | 2010-01-27 | 中国科学院长春光学精密机械与物理研究所 | High-precision 2-D rotary regulation mechanism |
| WO2011080362A1 (en) * | 2009-12-31 | 2011-07-07 | Fundacion Tekniker | Device and method for reducing abbe error in microscopy systems |
| CN103234496B (en) * | 2013-03-28 | 2015-09-30 | 中国计量学院 | A kind of High-precision correction method of three coordinate measuring machine two-dimensional stage error |
| CN107167102B (en) * | 2017-05-26 | 2019-04-30 | 潍坊路加精工有限公司 | Part thickness measurement method under low-frequency vibration environment |
| CN109780992B (en) * | 2018-12-28 | 2020-01-10 | 西安交通大学 | Interferometric system error calibration method based on optical plane fringe image processing |
| CN111238337B (en) * | 2020-01-21 | 2021-11-30 | 中国计量科学研究院 | Step gauge calibration method and system capable of eliminating Abbe errors based on laser interference |
| CN114518068A (en) * | 2020-11-20 | 2022-05-20 | 微正股份有限公司 | Double-reading head optical ruler ball rod and measured value processing method thereof |
-
2005
- 2005-12-30 CN CN2005101374506A patent/CN1991333B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1991333A (en) | 2007-07-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1991333B (en) | Zero-Abbe error measuring system and its method | |
| Fan et al. | A 6-degree-of-freedom measurement system for the accuracy of XY stages | |
| Gao et al. | Measurement technologies for precision positioning | |
| KR940003918B1 (en) | Shape measuring instrument | |
| US7734445B2 (en) | Shape measuring device and method | |
| US20020104963A1 (en) | Multidimensional sensing system for atomic force microscopy | |
| US20030233870A1 (en) | Multidimensional sensing system for atomic force microscopy | |
| US10415955B2 (en) | Measuring system | |
| JP4500736B2 (en) | Shape measuring device | |
| US6026583A (en) | Shape measuring apparatus and method | |
| JP4050459B2 (en) | Device for detecting the position of two objects | |
| CN103983205A (en) | Composite measurement system and measurement method for micro-array complex surface optical element | |
| US6895682B2 (en) | Polar coordinate-based profilometer and methods | |
| CN110081823A (en) | A kind of lathe five degree of freedom geometric moving error measuring system | |
| JP2000266524A (en) | Machine and method for measuring three-dimensional shape | |
| US8988691B2 (en) | Position-measuring device | |
| CN103047514B (en) | Air floatation vibration isolation platform on basis of air floatation zero-position reference and laser auto-collimation measurement | |
| US6351313B1 (en) | Device for detecting the position of two bodies | |
| JP3032334B2 (en) | Method and apparatus for measuring surface profile | |
| CN103162067B (en) | Air flotation vibration isolation platform based on spring zero position criterion and laser self-alignment measurement | |
| CN116295105B (en) | Optical interference type micro-machined wafer surface morphology measuring device and measuring method | |
| GB2170005A (en) | Interferometric multicoordinate measuring device | |
| Yujiu et al. | A non-contact calibration system for step gauges using automatic collimation techniques | |
| CN114018174B (en) | Complex curved surface contour measuring system | |
| Lewis | Fully traceable miniature CMM with submicrometer uncertainty |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101110 Termination date: 20161230 |