CN1991333B - zero-Abbe error measuring system and method thereof - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及一种测量系统及其方法,且特别涉及一种可以消除阿贝误差的测量系统及其方法。The invention relates to a measuring system and its method, and in particular to a measuring system and its method capable of eliminating Abbe errors.
背景技术Background technique
传统三维微(纳)米测量系统的架构,如扫描探针显微镜(scanning probemicroscopy,SPM)、原子力显微镜(atomic force microscope,AFM)与三坐标测量机(coordinate measuring machine,CMM)等,主要以形貌检测系统及/或定位平台等次系统所组成。形貌检测系统主要工作为利用探针等方式取得待测物的表面信息。定位平台系统则负责推动探针载具或移动平台,使整个系统完成三个维度的扫描与测量动作。但是,此种定位系统中的光学尺(linear scale)或干涉仪的摆放位置以及探针或测量端点两者间会因为坐落在不同的位置,而存在某种程度上的角度偏差。此偏差会因为两点的距离增加而增加,使得测量过程产生所谓的阿贝误差(Abbe error)。此阿贝误差会影响最后实际测量结果并降低测量的精确度。The architecture of traditional three-dimensional micro (nano) measurement systems, such as scanning probe microscopy (SPM), atomic force microscope (AFM) and coordinate measuring machine (coordinate measuring machine, CMM), is mainly based on the form It is composed of sub-systems such as appearance detection system and/or positioning platform. The main work of the shape detection system is to obtain the surface information of the object to be measured by means of probes and other methods. The positioning platform system is responsible for driving the probe carrier or mobile platform, so that the whole system can complete three-dimensional scanning and measurement actions. However, there is a certain degree of angular deviation between the placement position of the linear scale or the interferometer and the probe or the measuring end point in this positioning system because they are located in different positions. This deviation will increase as the distance between the two points increases, causing the measurement process to produce the so-called Abbe error (Abbe error). This Abbe error will affect the final actual measurement result and reduce the accuracy of the measurement.
在三维测量系统中,一般是采用多组光学干涉仪做为平台定位的工具,另外也加入零阿贝误差的测量设计。但是,以干涉仪来定位时,往往会有需要较多的元件、对位复杂、光路径长以及空气干扰等问题与缺点,故精确度与系统效能不容易提高。另外也有使用光学尺来做为定位装置,其具备光路径相对较短与对位方便等优势。In a three-dimensional measurement system, multiple groups of optical interferometers are generally used as a tool for platform positioning, and a measurement design with zero Abbe error is also added. However, when using an interferometer for positioning, there are often problems and shortcomings such as requiring more components, complicated alignment, long optical path, and air interference, so the accuracy and system performance are not easy to improve. In addition, an optical ruler is also used as a positioning device, which has the advantages of relatively short optical path and convenient alignment.
图1表示公知使用干涉仪的测量系统。图1的测量系统包括三个坐标方向的光学干涉仪106x、106y、106z。在移动平台100上放置待测量样本102。另外,使用检测器104的探针等取得待测量样本102的表面形貌等信息。检测器104的探针与定位台位移测量位置间存在一小段距离,这使得在测量过程中产生所谓的阿贝误差。图2为表示公知具有零阿贝误差设计的干涉仪测量系统。图2是使图1的三组光学干涉仪106x、106y、106z的测量光束沿着XYZ三轴相交于一点,并利用阿贝误差修正部108a、108b使定位点落在测量点上,进行定位工作,使阿贝误差消除到最小。但是采用干涉仪的定位,会使系统复杂度增加,而且会使系统成本增加很多。Figure 1 shows a known measurement system using an interferometer. The measurement system of FIG. 1 includes optical interferometers 106x, 106y, 106z in three coordinate directions. A sample 102 to be measured is placed on the mobile platform 100 . In addition, information such as the surface topography of the sample to be measured 102 is acquired using a probe of the detector 104 or the like. There is a small distance between the probe of the detector 104 and the displacement measurement position of the positioning table, which causes so-called Abbe error in the measurement process. FIG. 2 is a diagram illustrating a known interferometer measurement system with zero Abbe error design. Fig. 2 is to make the measurement beams of the three groups of optical interferometers 106x, 106y, 106z in Fig. 1 intersect at one point along the XYZ three axes, and use the Abbe error correction parts 108a, 108b to make the positioning point fall on the measurement point for positioning Work to minimize the Abbe error. However, the positioning of the interferometer will increase the complexity of the system, and will increase the system cost a lot.
因此,有人提出使用光学尺的方式。图3为三维光学定位尺测量系统的示意图。如图3所示,光学尺包括光栅120与光源122,利用光源对光栅射出光束来进行定位。光栅120是设置在移动平台100的下方,此种架构会因为定位点与实际测量位置落在不同位置,而同样会产生阿贝误差。Therefore, someone proposes a method of using an optical ruler. Fig. 3 is a schematic diagram of a three-dimensional optical positioning ruler measuring system. As shown in FIG. 3 , the optical scale includes a grating 120 and a light source 122 , and the light source emits a light beam to the grating for positioning. The grating 120 is disposed under the mobile platform 100 , and this kind of structure will also generate Abbe error because the positioning point and the actual measurement position are in different positions.
因此,如何改善上述问题,得到一个简单、低成本且可以消除阿贝误差的测量系统,是测量技术所要突破的一环。Therefore, how to improve the above problems and obtain a simple, low-cost measurement system that can eliminate the Abbe error is a part of the measurement technology to break through.
发明内容Contents of the invention
鉴于上述问题,本发明的目的就是提供一种零阿贝误差测量系统,以三维或二维光学尺为定位平台,加入新的设计方式,使测量结果达到零阿贝误差,取代一般干涉仪测量系统,并降低系统成本。In view of the above problems, the object of the present invention is to provide a zero-Abbe error measurement system, using a three-dimensional or two-dimensional optical scale as a positioning platform, adding a new design method, so that the measurement results can reach zero Abbe error, replacing the general interferometer measurement system and reduce system cost.
为达上述目的,本发明提出一种零阿贝误差测量系统,其包括移动平台、检测装置以及第一与第二三维光学尺。移动平台是用以载置待测量样本。检测装置用以检测待测量样本,并测量待测量样本的待测点相对于移动平台的垂直高度。第一与第二三维光学尺分别设置在移动平台上且隔着待测量样本彼此相对,其中第一与第二三维光学尺可垂直该移动平台进行高度微调,使第一与第二三维光学尺相对于移动平台的垂直高度与待测点的垂直高度相等,以进行待测量样本的测量。To achieve the above purpose, the present invention proposes a zero Abbe error measurement system, which includes a mobile platform, a detection device, and first and second three-dimensional optical scales. The mobile platform is used to load the samples to be measured. The detection device is used for detecting the sample to be measured, and measuring the vertical height of the point to be measured of the sample to be measured relative to the mobile platform. The first and second three-dimensional optical rulers are respectively arranged on the mobile platform and face each other across the sample to be measured, wherein the first and second three-dimensional optical rulers can be finely adjusted vertically to the mobile platform, so that the first and second three-dimensional optical rulers The vertical height relative to the mobile platform is equal to the vertical height of the point to be measured, so as to measure the sample to be measured.
根据本发明一实施方式,前述零阿贝误差测量系统的第一与第二三维光学尺还分别包括二维光栅、高度微调器与高度检测器。二维光栅设置在移动平台上,以定位移动平台。高度微调器与二维光栅连接,用以微调二维光栅的垂直高度。高度检测器设置成大致垂直于二维光栅上方,用以射出光束,检测二维光栅的垂直高度。According to an embodiment of the present invention, the first and second three-dimensional optical scales of the aforementioned zero-Abbe error measurement system further include a two-dimensional grating, a height trimmer, and a height detector, respectively. A two-dimensional grating is set on the mobile platform to position the mobile platform. The height fine-tuner is connected with the two-dimensional grating, and is used for fine-tuning the vertical height of the two-dimensional grating. The height detector is set approximately perpendicular to the top of the two-dimensional grating, and is used for emitting light beams to detect the vertical height of the two-dimensional grating.
根据本发明一实施方式,前述二维光栅具有起伏状表面。此外,当前述起伏状表面为光可穿透时,二维光栅的基底还具有反射面。另外,二维光栅可以例如是全像式二维光栅。According to an embodiment of the present invention, the aforementioned two-dimensional grating has an undulating surface. In addition, when the aforementioned undulating surface is permeable to light, the base of the two-dimensional grating also has a reflective surface. In addition, the two-dimensional grating may be, for example, a holographic two-dimensional grating.
根据本发明一实施方式,前述零阿贝误差测量系统可还包括控制电路,其至少包括比较器与高度微调控制器。比较器用以接收第一与第二三维光学尺的高度检测器输出的垂直高度以及检测装置输出的待测点的垂直高度,并输出两者垂直高度的差值。高度微调控制器连接至比较器的输出端,接收该差值并依据此差值控制高度微调器,进行二维光栅的垂直高度的微调。According to an embodiment of the present invention, the aforementioned zero-Abbe error measurement system may further include a control circuit, which at least includes a comparator and a height fine-tuning controller. The comparator is used to receive the vertical heights output by the height detectors of the first and second three-dimensional optical scales and the vertical heights of the points to be measured output by the detection device, and output the difference between the two vertical heights. The height fine-tuning controller is connected to the output terminal of the comparator, receives the difference and controls the height fine-tuning device according to the difference to fine-tune the vertical height of the two-dimensional grating.
此外,本发明还提出一种零阿贝误差测量系统,其包括移动平台、检测装置以及第一与第二二维光学尺。移动平台是用以载置待测量样本。检测装置用以检测待测量样本,并测量待测量样本的待测点相对于移动平台的垂直高度。第一与第二二维光学尺分别设置在移动平台上且隔着待测量样本彼此相对,其中第一与第二二维光学尺可垂直该移动平台进行高度微调,使第一与第二二维光学尺相对于移动平台的垂直高度与待测点的垂直高度相等,以进行待测量样本的测量。In addition, the present invention also proposes a zero Abbe error measurement system, which includes a mobile platform, a detection device, and first and second two-dimensional optical scales. The mobile platform is used to load the samples to be measured. The detection device is used for detecting the sample to be measured, and measuring the vertical height of the point to be measured of the sample to be measured relative to the mobile platform. The first and second two-dimensional optical rulers are respectively arranged on the mobile platform and face each other across the sample to be measured, wherein the first and second two-dimensional optical rulers can be finely adjusted vertically to the mobile platform, so that the first and second two-dimensional optical rulers The vertical height of the dimensional optical ruler relative to the mobile platform is equal to the vertical height of the point to be measured, so as to measure the sample to be measured.
根据本发明一实施方式,前述各二维光学尺分别包括光栅、高度微调器、光源与高度检测器。光栅设置在移动平台上,以定位移动平台。高度微调器与光栅连接,用以微调光栅的垂直高度。光源设置成大致垂直于移动平台下方,用以对光栅射出光束,以进行移动平台的定位。高度检测器设置成大致垂直于二维光栅上方,用以射出光束,检测光栅的垂直高度。前述的高度检测器例如可以是干涉仪或者高精确度位移测量器。According to an embodiment of the present invention, each of the aforementioned two-dimensional optical scales includes a grating, a height trimmer, a light source, and a height detector, respectively. The grating is set on the mobile platform to position the mobile platform. The height fine-tuner is connected with the grating for fine-tuning the vertical height of the grating. The light source is arranged approximately perpendicular to the bottom of the mobile platform, and is used to emit light beams to the grating for positioning the mobile platform. The height detector is set approximately perpendicular to the top of the two-dimensional grating for emitting light beams and detecting the vertical height of the grating. The aforementioned height detector can be, for example, an interferometer or a high-precision displacement measuring device.
此外,本发明还提出一种零阿贝误差测量方法,用以测量载置于移动平台上的待测量样本。移动平台上还设置第一与第二光学尺。零阿贝误差测量方法至少包括以下步骤:检测待测量样本的表面,并测量待测量样本的待测点相对于该移动平台的第一垂直高度;检测第一与第二光学尺相对于移动平台的第二垂直高度;以及依据第一与第二垂直高度的差值,进行第一与第二二维光学尺的垂直高度微调,使第一与第二垂直高度相等,以测量待测量样本。In addition, the present invention also proposes a zero Abbe error measurement method for measuring the sample to be measured placed on the mobile platform. The first and second optical rulers are also arranged on the mobile platform. The zero Abbe error measurement method at least includes the following steps: detecting the surface of the sample to be measured, and measuring the first vertical height of the point to be measured of the sample to be measured relative to the mobile platform; detecting the first and second optical scales relative to the mobile platform and according to the difference between the first and second vertical heights, fine-tuning the vertical heights of the first and second two-dimensional optical scales, so that the first and second vertical heights are equal to measure the sample to be measured.
综上所述,本发明将光学尺的光栅的XY平面放置在与待测量点相同的垂直高度上,使得定位点与测量点均保持在同样的平面上,藉以消除公知将光栅放置在样本下方时,测量点与实际定位位置不同所造成的阿贝误差。To sum up, the present invention places the XY plane of the grating of the optical scale on the same vertical height as the point to be measured, so that the positioning point and the measuring point are kept on the same plane, thereby eliminating the known problem of placing the grating under the sample. , the Abbe error caused by the difference between the measurement point and the actual positioning position.
另外,由于本发明不使用干涉仪做为平台定位之用,或仅使用在垂直高度测量上,所以更不需要额外的阿贝误差补偿装置,故可以降低系统的成本以及复杂度。In addition, since the present invention does not use the interferometer for platform positioning, or is only used for vertical height measurement, no additional Abbe error compensating device is needed, thereby reducing the cost and complexity of the system.
为让本发明之上述和其它目的、特征和优点能更明显易懂,下文特举较佳实施例,并配合附图,作详细说明如下。In order to make the above and other objects, features and advantages of the present invention more comprehensible, preferred embodiments are specifically cited below and described in detail with accompanying drawings.
附图说明Description of drawings
图1表示公知使用干涉仪的测量系统。Figure 1 shows a known measurement system using an interferometer.
图2表示公知具有零阿贝误差设计的干涉仪测量系统。Figure 2 shows a known interferometer measurement system with zero Abbe error design.
图3为三维光学定位尺测量系统的示意图。Fig. 3 is a schematic diagram of a three-dimensional optical positioning ruler measuring system.
图4为依据本发明实施例的零阿贝误差测量系统的示意图。FIG. 4 is a schematic diagram of a zero Abbe error measurement system according to an embodiment of the present invention.
图5为图4的控制电路的示意图。FIG. 5 is a schematic diagram of the control circuit of FIG. 4 .
图6为依据本发明另一实施例的零阿贝误差测量系统的示意图。FIG. 6 is a schematic diagram of a zero Abbe error measurement system according to another embodiment of the present invention.
主要元件标记说明Description of main component marking
100移动平台100 mobile platforms
102待测量样本102 samples to be measured
104检测装置104 detection device
106x、106y、106z干涉仪106x, 106y, 106z interferometer
108a、108b阿贝误差修正部108a, 108b Abbe error correction unit
120光栅(光学尺)120 grating (optical scale)
122光源(光学尺)122 light source (optical ruler)
200移动平台200 mobile platforms
210载台210 stage
212待测量样本212 samples to be measured
230、240测量系统(三维光学尺)230, 240 measuring system (three-dimensional optical ruler)
232、242高度检测器232, 242 height detector
234、244二维光栅234, 244 two-dimensional grating
250检测装置250 detection device
264比较器264 Comparator
266控制器266 controller
300、310测量系统(二维光学尺)300, 310 measuring system (two-dimensional optical ruler)
302、312高度检测器302, 312 height detector
304、314光源304, 314 light source
306、316光栅306, 316 grating
306a、316a反射面306a, 316a reflective surface
308、318高度微调器308, 318 height trimmer
具体实施方式Detailed ways
图4为依据本发明实施例的零阿贝误差测量系统的示意图。为使图简化易读,系统本身的详细机械结构省略,所属技术领域的技术人员可以依据下面的说明做适当的设计。FIG. 4 is a schematic diagram of a zero Abbe error measurement system according to an embodiment of the present invention. In order to make the diagram simple and easy to read, the detailed mechanical structure of the system itself is omitted, and those skilled in the art can make appropriate designs according to the following description.
本发明的零阿贝误差测量系统主要包括两部分,一部分为形貌检测次系统,另一部分则为平台定位测量次系统。如图4所示,形貌检测次系统主要是由检测装置250所构成,其具有探针,可以检测待测量样本(以下简称样本)212的表面形貌。待测量样本212是经由一个载台210放置在三维移动平台(3D moving table)200上。此移动平台200可以沿着图示的XYZ轴三方向进行移动,以使检测装置250检测样本212的表面形貌或其它物理化学特性等等。The zero Abbe error measurement system of the present invention mainly includes two parts, one part is the shape detection subsystem, and the other part is the platform positioning measurement subsystem. As shown in FIG. 4 , the morphology detection subsystem is mainly composed of a
平台定位测量次系统主要是由两组测量系统230、240所构成。测量系统230、240主要是使用三维光学尺做为平台的定位,以下称为第一三维光学尺230与第二三维光学尺240。如图4所示,第一三维光学尺230与第二三维光学尺240分别设置在移动平台200上,且隔着样本212彼此相对。第一三维光学尺230与第二三维光学尺240可垂直该移动平台进行高度(H)的微调,使得第一三维光学尺230与第二三维光学尺240相对于该移动平台的垂直高度与待测点的垂直高度相等,以进行样本212的测量。The platform positioning measurement subsystem is mainly composed of two sets of
第一三维光学尺230包括二维光栅234、高度微调器(图中未表示)、高度检测器(Z轴高度)232。二维光栅234设置在移动平台200上,以定位移动平台200。高度微调器可以用来对二维光栅234的垂直高度H进行微调。高度检测器232主要可以射出例如激光等光束,用以检测二维光栅234相对于移动平台200的垂直高度。The first three-dimensional
同样地,第二三维光学尺240包括二维光栅244、高度微调器(图中未表示)、高度检测器(Z轴高度)242。二维光栅244设置在移动平台200上,以定位移动平台200。高度微调器可以用来对二维光栅244的垂直高度H进行微调。高度检测器242主要可以射出例如激光等光束,用以检测二维光栅244相对于移动平台200的垂直高度。Likewise, the second three-dimensional
关于二维光栅234、244,其可以使用具有表面起伏的二维光学尺,做为位移的测量。另外,若前述表面起伏为光可穿透,则可以在二维光栅的基材底面做反射层,使高度检测器232射出的光束可以被反射回去,进行Z轴高度H的检测。另外,二维光栅234、244也可以使用全像式二维光学尺,做为位移的测量。只要是可以达到二维光栅234、244的功能与目的者,其具体实施方式不多做限制。As for the two-
接着说明上述测量系统的操作。在进行测量时,移动平台200会移动,使检测装置250去检测样本212的每一个待测点。另外,检测装置250也会同时检测出待测点相对于移动平台200的垂直高度。此时,二维光学尺230、240的高度检测器232、242会检测二维光栅234、244的XY平面的相对于移动平台200的垂直高度。接着,会比较高度检测器232、242的垂直高度与待测点的垂直高度,在两个垂直高度不同时,二维光学尺230、240的高度微调器会动作,调整二维光学尺230、240的垂直高度,以使二维光栅234、244的XY平面的垂直高度与待测点的垂直高度相同。在整个测量过程中,待测点的垂直高度会一直变化。根据此高度变化,二维光学尺230、240的高度微调器也会不断地随着动作来调整高度,使二维光栅234、244的XY平面的垂直高度能够与每一个待测点的垂直高度相同。Next, the operation of the above measurement system will be described. When measuring, the
如上所述,因为在测量过程中,二维光栅234、244的XY平面的垂直高度能够与待测点的垂直高度都一直保持相同,所以可以消除阿贝误差,达到零阿贝误差的目的。As mentioned above, since the vertical heights of the XY planes of the two-
图5为图4的控制电路的示意图。图5所示的控制电路是用来控制前述测量过程。控制电路包括比较器264与控制器266。FIG. 5 is a schematic diagram of the control circuit of FIG. 4 . The control circuit shown in Fig. 5 is used to control the aforementioned measurement process. The control circuit includes a comparator 264 and a controller 266 .
比较器264会接收前述高度检测器232、242所输出的二维光栅234、244的XY平面的垂直高度以及前述检测装置250所输出的待测点的垂直高度。比较器264接着比较两者垂直高度的差值,并输出给控制器266。控制器266接着依据此差值控制二维光栅234、244的高度微调器,对二维光栅234、244的XY平面的垂直高度进行Z轴方向的高度微调,使垂直高度与待测点的垂直高度在相同的高度上。在整个测量过程中,上述的负反馈控制一直不断地动作,使得二维光栅234、244的XY平面的垂直高度与待测点的垂直高度保持在相同的高度上,藉以消除阿贝误差。The comparator 264 receives the vertical heights of the XY planes of the two-
如上所述,本发明利用简单的光学尺便可以达到零阿贝误差的测量目的,大大降低系统的成本。As mentioned above, the present invention can achieve the measurement goal of zero Abbe error by using a simple optical scale, and greatly reduce the cost of the system.
图6为依据本发明另一实施例的零阿贝误差测量系统的示意图。此实施例主要是图4的变化例,两者差别在于图4是使用三维光学尺,图6的系统是使用二维光学尺。FIG. 6 is a schematic diagram of a zero Abbe error measurement system according to another embodiment of the present invention. This embodiment is mainly a variation example of FIG. 4 , the difference between the two is that FIG. 4 uses a three-dimensional optical ruler, and the system in FIG. 6 uses a two-dimensional optical ruler.
如图6所示,零阿贝误差测量系统除了平台定位测量次系统有差异外,其它与图4的零阿贝误差测量系统相似。在此处仅针对平台定位测量次系统做说明。As shown in Figure 6, the zero-Abbe error measurement system is similar to the zero-Abbe error measurement system in Figure 4 except that the platform positioning measurement subsystem is different. Only the platform positioning measurement subsystem is described here.
第一二维光学尺300包括光栅306、高度微调器308、光源304与高度检测器302。光栅306设置在移动平台200上,用以定位移动平台200。高度微调器308连接至光栅306,用以微调光栅306的垂直高度H。光源设置成大致垂直于移动平台200下方,用以对光栅306射出光束,以进行移动平台200的定位。高度检测器302设置成大致垂直于二维光栅306上方,用以射出光束,检测光栅306的垂直高度。The first two-dimensional
第二二维光学尺310包括光栅316、高度微调器318、光源314与高度检测器312。光栅316设置在移动平台200上,用以定位移动平台200。高度微调器318连接至光栅316,用以微调光栅316的垂直高度H。光源设置成大致垂直于移动平台200下方,用以对光栅3 16射出光束,以进行移动平台200的定位。高度检测器312设置成大致垂直于二维光栅316上方,用以射出光束,检测光栅316的垂直高度。The second two-dimensional
在进行测量时,消除阿贝误差的原理与图4的系统相同,故在此便不多描述。以第一二维光学尺300来说明,本实施例在平台定位上是使用一般光栅,并配合光源304来进行。光栅306的XY表面的垂直高度微调则利用高度检测器302来进行。为了配合这种结构,在光栅306的表面306a上设置反射面,藉以将高度检测器302射出的光束反射回去,以测量光栅306的XY表面的垂直高度。When measuring, the principle of eliminating the Abbe error is the same as that of the system in Fig. 4, so it will not be described here. Taking the first two-dimensional
上述的高度检测器302、312可以例如使用干涉仪或者是高精确度的位移测量器。此外,与图4的实施例相同,图6实施例也可以利用图5所示的控制电路,来进行光栅的垂直高度微调器,在此便不多做描述。The
综上所述,本发明将光学尺的光栅的XY平面放置在与待测量点相同的垂直高度上,使得定位点与测量点均保持在同样的平面上,藉以消除公知将光栅放置在样本下方时,测量点与实际定位位置不同所造成的阿贝误差。To sum up, the present invention places the XY plane of the grating of the optical scale on the same vertical height as the point to be measured, so that the positioning point and the measuring point are kept on the same plane, thereby eliminating the known problem of placing the grating under the sample. , the Abbe error caused by the difference between the measurement point and the actual positioning position.
另外,由于本发明不使用干涉仪做为平台定位之用,而干涉仪若使用也仅在高度测量上,所以更不需要额外的阿贝误差补偿装置,故可以降低系统的成本以及复杂度。In addition, since the present invention does not use the interferometer for platform positioning, and if the interferometer is used, it is only used for height measurement, so no additional Abbe error compensation device is needed, so the cost and complexity of the system can be reduced.
虽然本发明已以较佳实施例披露如上,然其并非用以限定本发明,任何所属技术领域的技术人员,在不脱离本发明之精神和范围内,当可作些许之更动与改进,因此本发明之保护范围当视权利要求所界定者为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art may make some modifications and improvements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the claims.
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