12 ό 7 02^2twfd〇c/g 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種量測系統及其方法，且特別是有 關於一種可以消除阿貝誤差的量測系統及其方法。 【先前技術】 傳統三維微(奈）米量測系統的架構，如掃描探針顯微 鏡(scanning probe microscopy，SPM)、原子力顯微鏡(at〇mic force microscope，AFM)與三次元量測儀（c〇〇rdinate measuring machine，CMM)等，主要以形貌偵測系統及/或 定位平台等次系統所組成。形貌偵測系統主要工作為利用 探針等方式取得待測物的表面資訊。定位平台系統則負責 推動探針載具或移動平台，使整個系統完成三個維度的掃 描與量測動作。但是，此種定位系統中的光學尺(linear scde) f干涉儀的擺放位置以及探針或量測端點兩者間會因為坐 落在不同的位置，而存在某種程度上的角度偏差。此偏差 會因為兩點的距離增加而增加，使得量測過程產生所謂的 阿貝誤差(Abbe error)。此阿貝誤差會影響最後實際量測結 果並降低量測的精確度。 、，么在二維量測系統中，一般是採用多組光學干涉儀做為 平台定位的工具，另外也加入零阿貝誤差的量測設計。但 是，以干涉儀來定_，往往會有f要較多的元件、對位 设雜、光路徑長以及空氣干擾制題與缺點，故精破度與 =統效能不料提升。另外也有使用光學尺來做為定位裝 ，其具備光路徑相對較短與對位方便等的優勢。 1267622« twf.doc/g 圖1繪示習知使用干涉儀的量測系統。圖1的量測系 、、先包括二個座標方向的光學干涉儀1Q6X、lQ6y、1Q6Z。在 移動平台100上置放待量測樣本102。另外，使用偵測器 104的探針等取得待量測樣本1〇2的表面形貌等資訊。偵 測為104的探針與定位台位移量測位置間存在一小段距 離，這使得在量測過程中產生所謂的阿貝誤差。圖2為繪 不習知具有零阿貝誤差設計的干涉儀量測系統。圖2是使 圖1的二組光學干涉儀106x、106y、1〇6z的量測光束沿著 XYj三軸相交於一點，並利用阿貝誤差修正部i〇8a、1〇訃 使，位點落在量測點上，進行定位工作，使阿貝誤差消除 到取小。但是採用干涉儀的定位，會使系統複雜度增加， 而且會使系統成本增加很多。 因此，有人提出使用光學尺的方式。圖3緣示三 學定位尺量測系統的示意圖。如圖3所示，光學尺包括 栅120與光源122，利用光源對光栅射出光束來進行定位。 光栅120是配置在移動平a 定位點與實際量測位此種架構會因為 續差。 置洛在不_置，而同樣會產生阿貝 因此，如何改善上述問題，以一個 以消除阿貝誤差的量測系缔，H 早低成本且可 【發明内容】 疋1測技術所要突破的一環。 貝題’本發_目的就是在提供-種零阿 貝表差^錢’以三維或二維光學尺為定 新的 式，使量騎果翻物貞衫，^一^干 612 ό 7 02^2twfd〇c/g IX. Description of the Invention: [Technical Field] The present invention relates to a measurement system and method thereof, and more particularly to a measurement system capable of eliminating Abbe error And its method. [Prior Art] The architecture of a traditional three-dimensional micro (nano) metering system, such as scanning probe microscopy (SPM), atomic force microscope (AFM), and three-dimensional measuring instrument (c〇) 〇rdinate measuring machine, CMM), etc., mainly composed of sub-systems such as topographic detection system and/or positioning platform. The main function of the topography detection system is to obtain the surface information of the object to be tested by means of a probe or the like. The positioning platform system is responsible for driving the probe carrier or moving platform, enabling the entire system to perform three dimensions of scanning and measurement. However, there is a degree of angular deviation between the placement of the linear scde f interferometer and the probe or measurement end point in such a positioning system due to sitting at different positions. This deviation increases as the distance between the two points increases, causing the measurement process to produce a so-called Abbe error. This Abbe error affects the final actual measurement and reduces the accuracy of the measurement. In the two-dimensional measurement system, multiple sets of optical interferometers are generally used as the platform positioning tool, and the measurement design of zero Abbe error is also added. However, with the interferometer to determine _, there will often be more components, more mismatched, long optical path and air interference problems and shortcomings, so the degree of fineness and the performance of the system is unexpectedly improved. In addition, an optical ruler is also used as a positioning device, which has the advantages of a relatively short light path and convenient alignment. 1267622 « twf.doc/g Figure 1 depicts a conventional measurement system using an interferometer. The measurement system of Fig. 1 includes optical interferometers 1Q6X, lQ6y, and 1Q6Z in two coordinate directions. The sample to be measured 102 is placed on the mobile platform 100. Further, information such as the surface topography of the sample to be measured 1 to 2 is obtained using the probe or the like of the detector 104. There is a small distance between the probe with a detection of 104 and the displacement measurement position of the positioning table, which causes a so-called Abbe error during the measurement. Fig. 2 is a diagram showing an interferometer measuring system with a zero Abbe error design. 2 is a view in which the measuring beams of the two sets of optical interferometers 106x, 106y, and 1〇6z of FIG. 1 are intersected at one point along the XYj three-axis, and are made by the Abbe error correcting unit i〇8a, 1〇讣. It falls on the measuring point and performs positioning work to eliminate the Abbe error to take small. However, the use of interferometer positioning will increase the complexity of the system and increase the system cost. Therefore, the use of an optical scale has been proposed. Figure 3 shows a schematic diagram of the three-scientific positioning ruler measurement system. As shown in Fig. 3, the optical scale includes a grid 120 and a light source 122, and the light beam is used to illuminate the grating to position the light beam. The grating 120 is configured to move the flat a positioning point with the actual measuring position. This architecture will be due to the continuation. If you don’t set it, it will also produce Abbe. So how to improve the above problem, with a measure to eliminate the Abbe error, H is low cost and can be [invented] 疋1 test technology to break through A ring. The title of 'Beifa _ is to provide - a kind of zero Abbe table difference ^ money' with a three-dimensional or two-dimensional optical ruler as a new style, so that the amount of riding fruit flip-up shirt, ^ one ^ 6
I2676332twid〇c/g 涉儀f職統，並降低系統成本。 二、達上述目的，本發明接屮—# ;其=移動平台、偵_以— ，樣本，並量測待量測樣二:， 台的垂直高度。第―㈣—制點相對於移動平 台上且隔著待量測樣本彼^對在移動平 學尺可垂直該移動平台進行高度微調，三維光 光學尺相對於移動平台的垂直高度與待測點三維 等，以進行待量測樣本的量測。 、一直尚度相 =本發明—實施_，前述物轉 第-與弟二三維光學尺更分別包括 j糸、、㈣ 與:度，器。二維光栅配置在移動平台上， 度!:器與二維光柵耦接，用以微調二維光柵的 直同度。同度偵測器配置成大致垂直於二維光柵上方， 用以射出光束，偵測二維光栅的垂直高度。 根據本發明一實施形態，前述二維光柵具有一起伏狀 表面。此外，當前述起伏狀表面為光可穿透時，二維光柵 的基底更具有反射面。另外，二維光柵可以例如是全像式 二維光概 根據本發明一實施形態，前述零阿貝誤差量測系統可 更包括控制電路，其至少包括比較器與高度微調控制器。 比較器用以接收第一與第二三維光學尺的高度偵測器輸出 的垂直高度以及偵測裝置輸出的待測點的垂直高度，並輸 7 X26762^2twf.doc/g 出兩者垂直高度的紐。高度微調控制 輸出’接收該差值並依據此隸控制高度微調器，進= 維光栅的垂直高度的微調。 ’本發較提出—鮮阿貝誤差量啦統，其包 動制裝置以及第—與—第二二維光學尺。移 α疋^載置待量測樣本。彳貞難置用則貞測待量測 二择量難本的待測點相對於移動平台的垂直 :二‘t第二二維光學尺分別配置在移動平台上且隔 直今=樣本彼此i目對，其中第—與第二二維光學尺可垂 對:r動：it行高度微調’使第一與第二二維光學尺相 行待“樣度與待測點的垂直高度相等’以進 光柵根前述各二維光學尺分別包括 平么卜 1 源/、呵度偵測器。光柵配置在移動 大m 又光源配置成大致垂直於移動平A下 偵射出光束’以進行移動平台的定位。；度 直於二維光柵上方，用以射出光= 、見JTb柵的垂直咼度。前述的 儀或者高精確度位移量·。n度偵心例如可以是干涉 第-與第二光學尺。零阿貝^=本。移動平台上更配置 驟:偵測待量測樣本的表面 8 I26762^twf.d〇c/g 相對於該移動平台的第一垂直高度；偵測第一與第二光學 尺相對於移動平台的第二垂直高度；以及依據第一與第二 ，直向度的差値，進行第一與第二二維光學尺的垂直高度 H周使第-與第二垂直高度相等，以量測待量測樣本。 /综上所述，本發明將光學尺的光柵的χγ平面置放在 與待量測點相同的垂直高度上，使得定位點與量測點均保 1在，樣的平面上，藉以消除習知將光柵置放在樣本下方 時，量測點與實際定位位置不同所造成的阿貝誤差。 另外，由於本發明不使用干涉儀做為平台定位之用， 或僅$用在垂直高度量測上，所以更不需要額外的阿貝誤 差補彳員裝置，故可以降低系統的成本以及複雜度。 為讓本舍明之上述和其他目的、特徵和優點能更明顯 - 易懂，下文特舉較佳實施例，並配合所附圖式，作詳細說 明如下。 、v 【實施方式】 圖4為依據本發明實施例所繪示的零阿貝誤差量測系 # 、统的不思圖。為使圖簡化易讀，系統本身的詳細機械結構 省略，熟悉此技藝者可以依據下面的說明做適當的設計。 本發明的零阿貝誤差量測系統主要包括兩部分，一為 形貌偵測次系統，另一則為平台定位量測次系統。如圖4 所示，形貌偵測次系統主要是由偵測裝置25〇所構成，其 具有探針，可以偵測待量測樣本(以下簡稱樣本）212的^ 面形貌。待量測樣本212是經由一個載台21〇置放在三維 移動平台（3D moving table)200上。此移動平台2〇〇可以沿 I26762^twf.d〇c/g 轴三方向進行運動，以使仙⑼置250谓 測樣本212的表面形貌或其他物理化學特性等等。 所禮Γ 口里測次系統主要是由兩組量測系統230、 系統細主要是使用三維光學尺做為平 I 240。4二下％為第一三維光學尺230與第二三維光學 。口圖4所示，第一三維光學尺23〇盥 二 學尺24。分別配置在移動平台綱上，且隔著玆了= = Γ三維光學尺230與第二三維光學尺240可垂 23fi第^"高綱的微調，使得第-三維光學尺 鮮測St 240相對於該移動平台的垂直高度 ，寺則的垂直向度相等，以進行樣本212的量測。 在移動平a 2Q()^ 度）232 °二維光柵234配置 以定位移動平台200。高度微調器可 哭232主Γ橋234的垂直高度H進行微調。高度偵測 :234^i射出例如雷射光等光束’用以偵測二維光 拇4相對於移動平台200的垂直高度。 产微=^/山二三維光學尺24G包括二維光栅244、高 二f5周為（未繪出）、高度偵測器(z軸高度）242。-唯光柵 244配置在移動平台細上，以定位移動平台200：Ϊ3 維光樹244的垂直高度η進行二 ϋ 要可以射出例如雷射光等光束，用以偵測 —、准先柵244相對於移動平台200的垂直高度。 關於二維光柵234、244 ’其可以使料有表面起伏的 I26762242twf.d〇c/g 5維ί學尺’做為位移的量測。另外，若前述表面起伏為 、可牙？，則可以在二維光栅的基材底面做反射層，使； ，偵測器232射出的光束可以被反射回去，進行Ζ軸^ 的偵測。另外，二維光柵234、244也可以使用全像 Γ34光t :為位移的量測。只要是可以達成二維光： 234、244的功能與目的者，其具體實施方式不多做限制。 接者說明上述量測系統的操作。在進行量測時，移動 平台200會移動’使偵測裝置25()去偵測樣本212的每一 =測點。另外’偵戦置25G也會同_測⑽測點相 子於移，平台200的垂直高度。此時，二維光學尺23〇、 =0的同度偵心232、242會偵測二維光柵234、244的 =平面的相對於移動平台的垂直高度。接著，會比 ^度偵測器232、2幻的垂直高度與待測點的垂直高度， 直高度不同時’二維光學尺23〇、24〇的高度微調 二二作’调整—維光學尺230、240的垂直高度，以使二 ^冊234 244的χγ平面的垂直高度與待測點的垂直高 又相同。在整個量測過程中，待測點的垂直高度會一直變 根，气度變化，二維光學尺230、240的高i微調器 I不斷地k著動作來調整高度，使二維光拇別、施 π 平面的垂直高度能夠與每-個待測點的垂直高度相 同〇 如上所述，因為在量測過程中，二維光柵234、244 1ΧΥ平面的垂直高度能夠與待測點的垂直高度都一直保 待相同’所以可⑷肖除阿貝誤差，達到零阿貝誤差的目的。 126762Qr42twf.d〇c/g 雷j 5繪示圖ί的控制電路的示意圖。5所示的控制 電路疋用來控制前述量測過程。^t 與控制器266。 控制電路包括比較益264I2676332twid〇c/g is involved in the system and reduces system costs. Second, to achieve the above purpose, the present invention is connected to ##; its = mobile platform, detection _ to -, sample, and measurement of the measurement sample 2:, the vertical height of the table. The first (fourth)-point is relative to the moving platform and is separated from the sample to be measured. The moving platform is vertically fine-tuned in the moving level, and the vertical height of the three-dimensional optical optical scale relative to the moving platform and the point to be measured Three-dimensional, etc., to measure the sample to be measured. The present invention is the same as the invention, the implementation of the first and the second two-dimensional optical scales respectively include j糸, (4) and: degrees, the device. The two-dimensional grating is arranged on the mobile platform, and the degree:: is coupled to the two-dimensional grating to fine tune the straightness of the two-dimensional grating. The homogeneity detector is configured to be substantially perpendicular to the two-dimensional grating for emitting a beam of light and detecting the vertical height of the two-dimensional grating. According to an embodiment of the invention, the two-dimensional grating has a corrugated surface. Further, when the aforementioned undulating surface is light permeable, the base of the two-dimensional grating has a reflecting surface. In addition, the two-dimensional grating may be, for example, a holographic two-dimensional light. According to an embodiment of the present invention, the zero Abbe error measurement system may further include a control circuit including at least a comparator and a height fine adjustment controller. The comparator is configured to receive the vertical height of the height detector output of the first and second three-dimensional optical scales and the vertical height of the point to be measured outputted by the detecting device, and input 7 X26762^2twf.doc/g New Zealand. The height fine-tuning control output 'receives the difference and controls the height trimmer according to this, and fine-tunes the vertical height of the dimension raster. 'This issue is more proposed - fresh Abbe error amount, its package system and the first - and - second two-dimensional optical ruler. Move α疋^ to place the sample to be measured.彳贞 置 贞 贞 贞 贞 贞 待 待 待 待 待 待 待 待 待 待 待 待 待 待 : : : : : : : : : : : : : : : : : : : : : : : : : : : Yes, wherein the first and second two-dimensional optical scales are vertically opposite: r-moving: the height of the row is fine-tuned 'to make the first and second two-dimensional optical scales to be "the height of the sample is equal to the vertical height of the point to be measured" Into the grating root, each of the two-dimensional optical scales includes a flat source 1 and a detector, and the grating is arranged to move the beam and the light source is configured to be perpendicular to the moving plane A to detect the beam 'for the mobile platform. Positioning.; Straight to the top of the two-dimensional grating, to emit light =, see the vertical curvature of the JTb grid. The aforementioned instrument or high-precision displacement. · n-degree detection can be, for example, interference - and second optics尺.零阿贝^=本. More configuration steps on the mobile platform: detecting the surface of the sample to be measured 8 I26762^twf.d〇c/g relative to the first vertical height of the mobile platform; detecting the first and a second vertical height of the second optical scale relative to the moving platform; and according to the first and second, The straightness difference is performed, and the vertical height H of the first and second two-dimensional optical scales is made equal to the first and second vertical heights to measure the sample to be measured. / In summary, the present invention will optically The χγ plane of the grating of the ruler is placed at the same vertical height as the point to be measured, so that both the positioning point and the measuring point are kept on the plane of the sample, thereby eliminating the conventional placement of the grating under the sample. The Abbe error caused by the difference between the measuring point and the actual positioning position. In addition, since the present invention does not use the interferometer as a platform positioning, or is only used for vertical height measurement, it does not need an additional Abbe. The above-mentioned and other objects, features and advantages of the present invention will become more apparent and obvious, and the preferred embodiments of the present invention will be described in conjunction with the accompanying drawings. The detailed description is as follows. v [Embodiment] FIG. 4 is a schematic diagram of a zero Abbe error measurement system according to an embodiment of the present invention. In order to simplify the drawing, the details of the system itself are detailed. The mechanical structure is omitted, familiar with this technique The artist can make appropriate design according to the following description. The zero Abbe error measurement system of the invention mainly comprises two parts, one is a topography detection subsystem and the other is a platform positioning measurement subsystem. The topography detection system is mainly composed of a detecting device 25, which has a probe, and can detect the shape of the sample to be measured (hereinafter referred to as sample) 212. The sample to be measured 212 is via A loading table 21 is placed on the 3D moving table 200. The moving platform 2 can be moved in three directions along the I26762^twf.d〇c/g axis, so that the fairy (9) is set to 250 The surface topography or other physicochemical properties of the sample 212, etc. The system of measurement in the mouth is mainly composed of two sets of measurement systems 230, the system is mainly used as a flat I 240 using a three-dimensional optical ruler. It is a first three-dimensional optical scale 230 and a second three-dimensional optical. As shown in Figure 4, the first three-dimensional optical ruler is 23 〇盥 two feet. They are respectively arranged on the mobile platform, and the third-dimensional optical ruler 230 and the second three-dimensional optical ruler 240 can be trimmed by the fine-tuning of the high-precision, so that the first-and-three-dimensional optical ruler is compared with the second-order optical scale. The vertical height of the mobile platform and the vertical orientation of the temple are equal for the measurement of the sample 212. The 232 ° two-dimensional grating 234 is configured to move the flat a 2Q()^ to position the mobile platform 200. The height spinner can be fine-tuned by crying the vertical height H of the main bridge 234. Height detection: 234^i emits a beam such as laser light to detect the vertical height of the two-dimensional light thumb 4 relative to the moving platform 200. The micro-[^/mount2] three-dimensional optical scale 24G includes a two-dimensional grating 244, a high-level f5 week (not shown), and a height detector (z-axis height) 242. - the only grating 244 is disposed on the moving platform to position the mobile platform 200: Ϊ3 The vertical height η of the illuminating tree 244 is performed to emit a beam such as laser light for detecting, and the quasi-first grating 244 is relative to the moving The vertical height of the platform 200. With regard to the two-dimensional gratings 234, 244', it is possible to measure the displacement of the surface having an apparent undulation of I26762242twf.d〇c/g. In addition, if the aforementioned surface is undulating, can it be toothy? , the reflective layer can be made on the bottom surface of the substrate of the two-dimensional grating, so that the light beam emitted by the detector 232 can be reflected back to detect the axis ^. Alternatively, the two-dimensional gratings 234, 244 may also use a hologram Γ 34 light t: a measure of displacement. As long as the function and purpose of two-dimensional light: 234, 244 can be achieved, the specific implementation manner is not limited. The operator explains the operation of the above measurement system. During the measurement, the mobile platform 200 will move 'to enable the detection device 25() to detect each = measurement point of the sample 212. In addition, the Detective Set 25G will also move with the _ (10) measuring point phase, the vertical height of the platform 200. At this time, the same degree of detection 232, 242 of the two-dimensional optical scale 23 〇, =0 will detect the vertical height of the = plane of the two-dimensional grating 234, 244 with respect to the moving platform. Then, compared with the vertical height of the Detector 232, 2 and the vertical height of the point to be measured, when the straight height is different, the height of the two-dimensional optical ruler 23〇, 24〇 is fine-tuned by the two-adjustment-dimensional optical ruler. The vertical height of 230, 240 is such that the vertical height of the χ γ plane of the 234 244 is the same as the vertical height of the point to be measured. During the whole measurement process, the vertical height of the point to be measured will always change to the root, and the air level changes. The high-micro-tuner I of the two-dimensional optical scale 230, 240 constantly moves to adjust the height, so that the two-dimensional optical The vertical height of the π plane can be the same as the vertical height of each of the points to be measured, as described above, because the vertical height of the plane of the two-dimensional grating 234, 244 1 能够 can be perpendicular to the height of the point to be measured during the measurement process. Always keep the same 'so can (4) Xiao Abe error, to achieve zero Abbe error. 126762Qr42twf.d〇c/g Ray j 5 shows a schematic diagram of the control circuit of Figure ί. The control circuit shown in Figure 5 is used to control the aforementioned measurement process. ^t with controller 266. Control circuit includes comparison benefit 264
比較器264會接收前述高度偵測器232、242所輸出的 ==、_χγ平面的垂直高度以及前述= 斤，出的待測點的垂直高度。比較器Μ4接著比較 兩者垂直南度的差値，並輸出給控制器266。控制哭施 接著依據此差健制二維光柵说、…的高度微調; 二維光柵234、244的XY平面的垂直高度進行z軸。方向 的南度微調，趋直高度與剌關垂直高度在相同的高 度上。在整個量測過程中，上述的負回授控制—直不斷地 動作’使得二維光柵234、244的XY平面的垂直高度與待 測點的垂直高度保持在相同的高度上，藉以消除阿貝誤差。 上如上所述，本發明利用簡單的光學尺便可以達到零阿 貝誤差的量測目的，大大降低系統的成本。The comparator 264 receives the vertical height of the ==, _χγ plane output by the height detectors 232, 242 and the vertical height of the point to be measured. Comparator Μ4 then compares the difference between the two vertical south and outputs to controller 266. The crying is controlled according to the height of the two-dimensional grating, and the vertical height of the XY plane of the two-dimensional gratings 234 and 244 is z-axis. The south of the direction is fine-tuned, and the straightening height is at the same height as the vertical height of the gate. During the entire measurement process, the above-mentioned negative feedback control—straightening continuously—makes the vertical height of the XY plane of the two-dimensional gratings 234 and 244 at the same height as the vertical height of the point to be measured, thereby eliminating Abbe error. As described above, the present invention can achieve the measurement objective of zero Abbe error by using a simple optical scale, and greatly reduces the cost of the system.
圖6為依據本發明另一實施例所繪示的零阿貝誤差量 測系統的示意圖。此實施例主要是圖4的變化例，兩者差 別在於圖4是使用三維光學尺，圖6的系統是使用二 學尺。 、 如圖6所示，零阿貝誤差量測系統除了平台定位量測 次系統有差異外，其他與圖4的零阿貝誤差量測系統相 似。在此處僅針對平台定位量測次系統做說明。 第一二維光學尺300包括光柵306、高度微調器3〇8、 光源304與高度偵測器302。光柵306配置在移動平台2〇〇 12 126762522twf.d〇c/g 上，用以定位移動平台200。高度微調器308耦接至光栅 306,用以微調光栅3〇6的垂直高度H。光源配置成大致垂 直於移動平台200下方，用以對光栅306射出光束，以進 行移動平台200的定位。高度偵測器302配置成大致垂直 於二維光柵306上方，用以射出光束，偵測光柵30ό的垂 直高度。 第二二維光學尺310包括光柵316、高度微調器318、 光源314與高度债測器312。光柵316配置在移動平台200 上，用以定位移動平台200。高度微調器318耦接至光柵 316，用以微調光柵316的垂直高度η。光源配置成大致垂 直於移動平台200下方，用以對光柵316射出光束，以進 行移動平台200的定位。高度偵測器312配置成大致垂直 於二維光柵316上方，用以射出光束，偵測光栅316的垂 直向度。 在進行量測時，消除阿貝誤差的原理與圖4的系統相 同，故在此便不多描述。以第一二維光學尺3〇〇來說明， 本只施例在平台定位上是使用一般光栅，並配合光源 來進行。光柵306的XY表面的垂直高度微調則利用高度 偵測器302來進行。為了配合這種結構，在光柵3〇6的一 表面306a上設置反射面，藉以將高度偵測器3〇2射出的光 束反射回去，以量測光柵306的χγ表面的垂直高度。 ^上述的尚度偵測器302、312可以例如使用干涉儀或者 疋向精確度的位移量測器。此外，與圖4的實施例相同， 圖6實施例也可以利用圖5所示的控制電路，來進行光柵 13 12676222 twf.doc/g 的垂直高度微調器，在此便不多做描述。 知上所述’本發明將光學尺的光柵的XY平面置放在 與待量測點相同的垂直高度上，使得定位點與量測點均保 持在同樣的平面上，藉以消除習知將光栅置放在樣本下方 時’量測點與實際定位位置不同所造成的阿貝誤差。 另外’由於本發明不使用干涉儀做為平台定位之用， 而干涉儀若使用也僅在高度量測上，所以更不需要額外的 阿貝誤差補償裝置，故可以降低系統的成本以及複雜度。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之精神 和範圍内’當可作些許之更動與潤飾，因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 ， 圖1繪示習知使用干涉儀的量測系統。 圖2繪示習知具有零阿貝誤差設計的干涉儀量測系 統。 φ 圖3繪示三維光學定位尺量測系統的示意圖。 圖4為依據本發明實施例所繪示的零阿貝誤差量測系 統的示意圖。 圖5繪示圖4的控制電路的示意圖。 圖6為依據本發明另一實施例所繪示的零阿貝誤差量 測系統的示意圖。 【主要元件符號說明】 100移動平台FIG. 6 is a schematic diagram of a zero Abbe error measurement system according to another embodiment of the invention. This embodiment is mainly a variation of Fig. 4, the difference being that Fig. 4 is a three-dimensional optical scale, and the system of Fig. 6 is a two-foot scale. As shown in Fig. 6, the zero Abbe error measurement system is similar to the zero Abbe error measurement system of Fig. 4 except that there is a difference in the platform positioning measurement system. Only the platform positioning measurement subsystem is described here. The first two-dimensional optical scale 300 includes a grating 306, a height trimmer 3〇8, a light source 304, and a height detector 302. The grating 306 is disposed on the mobile platform 2 〇〇 12 762762522 twf.d 〇 c / g for locating the mobile platform 200. The height spinner 308 is coupled to the grating 306 for fine tuning the vertical height H of the grating 3〇6. The light source is configured to be substantially perpendicular to the underside of the mobile platform 200 for emitting light beams to the grating 306 for positioning of the mobile platform 200. The height detector 302 is disposed substantially perpendicular to the two-dimensional grating 306 for emitting a beam of light and detecting the vertical height of the grating 30ό. The second two-dimensional optical scale 310 includes a grating 316, a height trimmer 318, a light source 314, and a height debt detector 312. The grating 316 is disposed on the mobile platform 200 for positioning the mobile platform 200. The height spinner 318 is coupled to the grating 316 for fine tuning the vertical height η of the grating 316. The light source is configured to be generally perpendicular to the underside of the mobile platform 200 for emitting a beam of light to the grating 316 for positioning of the mobile platform 200. The height detector 312 is disposed substantially perpendicular to the two-dimensional grating 316 for emitting a beam of light and detecting the vertical dimension of the grating 316. In the measurement, the principle of eliminating the Abbe error is the same as that of the system of Fig. 4, so it will not be described here. The first two-dimensional optical ruler 3 说明 illustrates that the present embodiment uses a general grating for platform positioning and is matched with a light source. The vertical height fine adjustment of the XY surface of the grating 306 is performed using the height detector 302. In order to cooperate with this structure, a reflecting surface is provided on a surface 306a of the grating 3?6, whereby the light beam emitted from the height detector 3?2 is reflected back to measure the vertical height of the ?? surface of the grating 306. The above-described splendor detectors 302, 312 may, for example, use an interferometer or a tilt-to-accuracy displacement measurer. In addition, as in the embodiment of FIG. 4, the embodiment of FIG. 6 can also use the control circuit shown in FIG. 5 to perform the vertical height trimmer of the grating 13 12676222 twf.doc/g, which will not be described here. Knowing that the present invention places the XY plane of the grating of the optical scale on the same vertical height as the point to be measured, so that the positioning point and the measuring point are both kept on the same plane, thereby eliminating the conventional grating. When placed under the sample, the Abbe error caused by the difference between the measured point and the actual positioning position. In addition, since the present invention does not use an interferometer as a platform for positioning, and the interferometer is only used for height measurement, it does not require an additional Abbe error compensation device, thereby reducing the cost and complexity of the system. . While the invention has been described above by way of a preferred embodiment, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 illustrates a conventional measurement system using an interferometer. Figure 2 illustrates an interferometer measurement system with a zero Abbe error design. φ Figure 3 shows a schematic diagram of a three-dimensional optical positioning ruler measurement system. 4 is a schematic diagram of a zero Abbe error measurement system according to an embodiment of the invention. FIG. 5 is a schematic diagram of the control circuit of FIG. 4. FIG. 6 is a schematic diagram of a zero Abbe error measurement system according to another embodiment of the invention. [Main component symbol description] 100 mobile platform
Itwf.doc/g 102待量測樣本 104偵測裝置 106x、106y、106z 干涉儀 108a、108b阿貝誤差修正部 120光柵(光學尺） 122光源(光學尺） 200移動平台 210載台 212待量測樣本 230、240量測系統(三維光學尺) 232、242高度偵測器 234、244二維光柵 250偵測裝置 264比較器 266控制器 300、310量測系統(二維光學尺) 302、312高度偵測器 304、314 光源 306、316 光柵 306a、316a反射面 308、318高度微調器 15Itwf.doc/g 102 to be measured sample 104 detection device 106x, 106y, 106z interferometer 108a, 108b Abbe error correction unit 120 grating (optical scale) 122 light source (optical scale) 200 mobile platform 210 stage 212 to wait Measuring sample 230, 240 measuring system (three-dimensional optical ruler) 232, 242 height detector 234, 244 two-dimensional grating 250 detecting device 264 comparator 266 controller 300, 310 measuring system (two-dimensional optical ruler) 302, 312 height detector 304, 314 light source 306, 316 grating 306a, 316a reflecting surface 308, 318 height trimmer 15