CN1918126B - 离子型uv-a防晒剂及含有该防晒剂的组合物 - Google Patents
离子型uv-a防晒剂及含有该防晒剂的组合物 Download PDFInfo
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- CN1918126B CN1918126B CN200580004920XA CN200580004920A CN1918126B CN 1918126 B CN1918126 B CN 1918126B CN 200580004920X A CN200580004920X A CN 200580004920XA CN 200580004920 A CN200580004920 A CN 200580004920A CN 1918126 B CN1918126 B CN 1918126B
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/28—Radicals substituted by singly-bound oxygen or sulphur atoms
- C07D213/30—Oxygen atoms
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/54—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D213/57—Nitriles
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/576—Six-membered rings
- C07F9/59—Hydrogenated pyridine rings
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Abstract
本发明涉及一类新的1,4-二氢吡啶衍生物、含有该衍生物的化妆或皮肤病学用的新防晒剂组合物,以及这类衍生物对人类皮肤及/或头发抗紫外线照射,尤其抗日光照射进行光辐照保护的用途。
Description
本发明涉及新的1,4-二氢吡啶衍生物、含有该衍生物的化妆或皮肤病学用的新防晒剂(sunscreen)组合物,以及这类衍生物对人的皮肤及/或头发抗紫外线照射,尤其抗日光照射进行光辐照保护的应用。
在接受有害阳光照射量增多的人群中,对防晒保护剂的要求持续增多。反复日光照射会引起皮肤变化,即光老化皮肤。在光老化皮肤中可见的临床变化不同于人体防日光曝晒部位的正常老化皮肤的临床变化。在皮肤大面积日晒的损伤结果中,起皱纹、弹性组织变性、色素性变化、癌变前和癌病皮肤损伤越来越多。
过去,已研制了许多防晒剂化学品,可以对UV-A(320~400nm)及/或UV-B(290~320nm)波长以及甚至更短波长(UV-C)的有害效应进行防护。这些化学品抑或单独抑或互相组合加入到广为人知并广泛使用的化妆或药物制剂中。
特别是UV-A照射,会引起快速、直接的微弱皮肤色素沉着。UV-A射线穿透皮肤深层,并可在那里加速皮肤老化过程。较短波UV-A II的照射促进晒斑形成。UV-A II的照射还能进而引起光紧张(phototonic)或者光过敏反应。UV-A照射和越来越多的皮肤癌危险之间有着关系。
尽管有着大量安全而有效的UV-B吸收剂,适于保护人的皮肤的UV-A吸收剂却为数颇为有限。性能良好的UV-A吸收剂应当具有良好的光稳定性、毒理学和皮肤病学可接受性、卓越的热稳定性、化妆品溶剂中的极佳可溶性,特别是在油或水中的可溶性,与化妆品基料的相容性、pH值在4~9范围内的稳定性、加入化妆制剂中的可加工性能、与其他化妆制剂成分及包装材料的相容性、不沾污纺织品,应当无色、具有天然或好闻的嗅味,而且应当没有粘性,并具有低挥发性。尤其对用于头发的制品如头发定型剂、洗发液、头发护理产品等,必须符合严格的要求,而且UV吸收剂必须粘附在头发上,以提供充分的保护。
在UV-A范围具吸收作用的油溶性防晒剂,举例来说,公开于WO03/068183中。
满足上述各种要求中至少一些要求的可得到的UV-A吸收剂品种数目本就不多,水溶性或适用于头发的UV-A吸收剂品种数目甚而更少。水溶性UV-A防晒剂的优点是,可将其引入水包油型或油包水型乳液的水相中。由于通常在这些乳液中,水相多于油相,因此可加入水相的防晒剂比可加入油相的防晒剂多,从而得到较高防晒系数的组合物。而且,水溶性UV-A遮光剂可以与两相乳液的油相中的已知的油溶性UV-A遮光剂组合,这也会导致防晒系数增大。
举例来说,EP-A 669 323中公开了一些水溶性UV-A防晒剂,该专利申请中既公开了水溶性防晒剂,也公开了油溶性防晒剂。然而,该文件中所公开的水溶性UV-A防晒剂,例如化合物苯基二苯并咪唑四磺酸二钠,其吸收峰值在335nm处,且消光值E仅为745,此值较低。吸收峰值介乎350~370nm之间是优选的。此外,还优选使用水溶性及/或有利地粘附在头发上的、消光值E高的、能改进防晒剂效果的UV-A防晒剂。E值大于900,优选大于1000,例如1000~1200是非常有利的。
DE 33 24 735中也公开了一些UV-A防晒剂,而且该文件中所公开的一些防晒剂也是水溶性的。这种水溶性UV-A防晒剂的例子是对苯二亚甲基二樟脑磺酸(terephthalylidene dicamphor sulfonic acid),然而,该化合物的消光系数E仅为866,而且吸收峰值在345nm处。
现时仍存在着对更多UV-A防晒剂的需要,这种防晒剂为水溶性的及/或能粘附在头发上的、不仅符合上面所指出的防晒剂要求,而且但在相当高的波长上也具有吸收峰值,优选介于350~370nm之间,并具有极好的E值,优选900或更高,更优选1000或更高。
通式I所示的化合物实现了这个目的
式中,
R1和R2为相同或不同的吸电荷子基团,或者R1和R2中的一者为氢,而另一者为吸电荷子基团,
R3、R4、R5和R6独立地选自氢原子、C1-C10烷基、C2-C10链烯基、C2-C10炔基、C3-C10环烷基或者、C6-C10芳基,上述各基团为未取代的或者任选被1至3个取代基所取代,所述取代基选自C1-C6烷基、卤素、羟基和C1-C6烷氧基,或者R3和R5及/或R4和R6同其所连的碳原子一起构成5元或6元环,该5元或6元环任选被1至4个取代基所取代,所述取代基选自C1-C6烷基、C3-C6环烷基、C1-C6烷氧基、羟基或卤素,
X为含1至20个碳原子和任选1至10个杂原子,并含有至少一个荷正电或荷负电的基团的烃基,以及
Y为抗衡离子。
正如本申请文件中所用,术语“吸电子基团”是指那些含有多键的基团,例如优选为氰基或次氮基(-CN基团),或者-COOR8、-COR8或-CONR8 2基团,式中每个R8各自独立地为氢、C1-C21烷基(优选C1-C6烷基)、C2-C21链烯基(优选C2-C6链烯基)、C2-C21炔基(优选C2-C6炔基)、C3-C21环烷基(优选C3-C8环烷基)或者C6-C10芳基(优选苯基),这些基团或优选基团中的每一个基团未被取代或者任选被1~3个取代基取代,取代基选自C1-C6烷基、卤素、羟基和C1-C6烷氧基。优选的是,基团R1和R2中的至少一个为氰基,最优选的是,基团R1和R2均为氰基(-CN基团)。也优选的是,一个基团为氰基,而另一个基团为-COOR8。
R3、R4、R5和R6独立地选自氢原子、C1-C10烷基、C2-C10链烯基、C2-C10炔基、C3-C10环烷基和C6-C10芳基。这些基团中的每个基团可以是未取代的,或者被1至3个取代基所取代,所述取代基选自C1-C6烷基、卤素、羟基和C1-C6烷氧基。作为另一种选择方案,也可使R3和R5及/或R4和R6同其所连的碳原子一起构成5元或6元环,该5元或6元环任选被1至4个取代基所取代,所述取代基选自C1-C6烷基、C3-C6环烷基、C1-C6烷氧基、羟基或卤素。优选的是,R3、R4、R5和R6独立地选自氢原子、C1-C6烷基、C2-C6链烯基、C5-C8环烷基和苯基,这些基团中的每个基团任选被1~3个取代基取代,更优选的是,被上面所定义的一个取代基取代。也优选的是,R3、R4、R5和R6独立地选自氢原子和未取代的C1-C6烷基、C2-C6链烯基、C5-C8环烷基和苯基。如果R3和R5及/或R4和R6同其所连的碳原子一起构成5元或6元环,则优选为6元环,而且该环优选未取代或者被上面所定义的一个取代基取代。
最优选的是,R3、R4、R5和R6中的至少一个,更优选R3、R4、R5和R6中的二个为氢原子,而R3、R4、R5和R6基团中的其他基团为C1-C6烷基或C2-C6链烯基。最优选R3和R4为氢原子,而R5和R6为C1-C6烷基或C2-C6链烯基,更优选C1-C3烷基。
烷基可为支链或直链。C1-C10烷基的优选例子为甲基、乙基、丙基、异丙基、丁基、仲丁基、异丁基、戊基、新戊基、己基、2-乙基己基和辛基。
C3-C10环烷基的优选例子为环丙基、环丁基、环戊基、环己基、环庚基和环辛基。
C2-C6链烯基的优选例子为乙烯基和正丙烯基。
C6-C10芳基的优选例子为苯基和萘基。
X为含1至20个碳原子,优选1至10个碳原子,更优选1至6个碳原子并任选含有1至10个杂原子,优选1至6个杂原子的直链、支链、环状或芳族烃基。根据本说明书,含有杂原子的烃基也可含有官能团如羟基。杂原子优选选自O、N、S及P原子。对于本发明来说,重要的是,基团X包括至少一个基团,优选包括1、2或3个荷正电或荷负电的基团。X优选为含有1至20个碳原子和任选1至10个杂原子、并包括至少一个荷正电或荷负电基团的烷基、芳基、烷芳基、烷基环烷基。术语“烷芳基”或“烷基环烷基”系指含有一个或多个烷基取代基的芳基或环烷基。由于基团X包括至少一个荷正电或荷负电的基团,所以它通常含有至少一个荷正电或荷负电的杂原子。优选的是,X基团含有1至6个杂原子,而且所述杂原子优选选自氮、氧、硫或磷原子。倘若基团X荷正电,则优选至少含有一个荷正电的氮原子,因而该荷正电的基团是季铵基团。这种包括季铵离子的化合物特别优选用于头发。如若基团X含有荷负电基团,则该荷负电基团优选为酸基,例如磷酸基或硫酸基或羧酸残基。
X基团也可以含有1至4个不饱和碳-碳键,优选双键。X基团中每个碳原子可以任选被官能团取代,具体来说,被羟基或氨基取代,优选被羟基取代。优选上面所定义取代的X基团中被取代的碳原子数不多于3个,更优选不多于2个。当然,如果X基团中的碳原子被氨基取代,则碳原子和氮原子之间也可能是不饱和键,优选为双键。还有可能的是,X基团和Y基团共同构成两性离子结构。
如果X基团中荷正电或荷负电的基团荷负电,则X基团优选荷一个负电荷,并且最优选为酸基例如-O-SO3 -、-COO-、-O-PO3H-、-O-PO3 2-、-SO3 -、-PO3H-或-PO3 2-。最优选为-O-SO3 -、-SO3 -和-O-PO3H-。包括至少一个荷负电基团的X基团,其典型例子为任选被环烷基或芳基取代的亚烷基、被环烷基或芳基间隔的亚烷基以及含有上面所定义酸基的亚烷基。在一种优选实施方案中,该亚烷基被1至3个杂原子间隔,所述杂原子优选选自氧和氮原子间隔,所述杂原子优选选自氧、氮原子和氮原子。该亚烷基优选含有1至10个碳原子,更优选含有1至6个碳原子。如果该亚烷基被氮原子间隔,则该氮原子还带有如上所定义的基团R8。
荷单个负电荷的X基团的优选实施例为基团
-(C(R9 2))n-(V)m-(C(R9 2))o-(U)p-(C(R9 2))q-W,式中每个R9独立地为羟基,或者上面所定义的R8基团并优选为氢原子、羟基或C1-C3烷基,V和U独立地为杂原子,优选为氧原子或氮原子(该氮原子还带有上面所定义的R8基团),更优选为氧原子,n为0~6的整数(优选为1~6),m为0或1,o为0~6的整数(优选为1~6),p为0或1,q为0~6的整数(优选为1~6),而W为荷负电的基团,优选为上面所定义的酸基,最优选为-O-PO3H-、-SO3 -或者-O-SO3 -,前提条件是,碳原子总数为20或更少,优选为10或更少,最优选为1~6,同时前提条件是X基团中杂原子总数包括官能团W中的杂原子在内为1~10,其前提条件是,如果下标m和p均为1,则下标o不为0。优选不多于4个R9基团,更优选不多于2个R9基团不同于氢,最优选所有R9基团均为氢。
荷单个负电荷的X基团的另一个优选实施例是基团
-Ar-W,
式中,Ar为芳族基团,优选C6-C10芳基如亚苯基或亚萘基,或者杂环基团,优选为4~10元环,其中一个或多个,优选1或2个环原子为杂原子,优选为N、O、或S。该杂环基团可为饱和或不饱和的基团,以及杂芳族基团,例如亚吡啶基也包括于其中。W为如上所定义者。
还优选的是,X基团中荷正电或负电的至少一个基团为荷一个正电荷的基团。最优选荷一个正电荷的该基团是季铵基团。在此情况下,X基团优选为下式所示的基团
式中,每个R10独立地为氢或R11,而每个R11独立地同上面所定义的R8,优选为氢、C1-C10烷基,优选为可被1至4个杂原子间隔的C1-C6烷基,优选被1或2个杂原子间隔的C1-C6烷基,优选被1或2个氧原子间隔的C1-C6烷基,而且该C1-C10烷基可被1至3个选自羟基、氨基和C1-C6烷基(优选C1-C3烷基)的取代基所取代,下标r为1~10的整数,优选为1~6的整数,前提条件是,X基团中碳原子总数为20或小于20,优选1~10,而包括氮原子和官能团中所有杂原子在内的杂原子总数优选为1~10,优选1~6,更优选1~4。包括至少一个如上所定义季铵离子的化合物特别适用于头发,例如头发护理产品、洗发液、发胶等等。在本发明的一个实施方案中,R11基团可含一个负电荷,从而包括Y基团,例如一个R11基团可以是被荷负电官能团如-SO3 -或相似基团取代的烷基。
在一个优选实施方案中,XY基团为兼荷正电和负电的两性离子,其碳原子数、杂原子数和官能团数如上所定义。
X基团的确切结构并无关系,只要它荷有至少一个能使分子溶于水及/或提供与头发的粘结力的正电荷或负电荷即可。优选的是,X含有一个、两个或三个正电荷或负电荷。
Y基团是应该平衡X基团电荷的抗衡离子。抗衡离子Y的确切化学性质对于本发明并不重要,只要抗衡离子Y不对UV-A吸收剂的优越特性起不良影响即可,而且特别只要Y在皮肤医学上和化妆品方面可予接受即可。如果X基团荷负电,则Y基团优选为季铵离子、碱金属离子或碱土金属离子,更优选为钠离子、钾离子、钙离子或镁离子,但Y基团也可以是荷正电的有机基团,举例来说,铵离子如三乙醇铵离子、氨基甲基丙醇离子或者缓血酸胺(tromethamine)离子。如果Y基团所荷正电比X基团所荷负电多,则Y基团还含有能平衡多余电荷的抗衡离子,或者用一个Y基团来平衡一个以上X基团。举例来说,Y基团可为或Ms+(A-)s-1,其中Ms+为荷正电离子,A-为荷单个负电荷的离子如卤原子,s为1~3,优选1或2,更优选为1。
如果X基团荷正电,则Y荷负电,并且Y基团优选为卤原子如氯原子、溴原子或碘原子。如果Y基团所荷负电比X基团所荷正电多,则Y基团还含有能平衡多余电荷的抗衡离子,或者用一个Y基团来平衡一个以上X基团。举例来说,Y基团可为(Ms-)或Ms-(A+)s-1,其中Ms-为荷负电离子,A+为荷单个正电荷的离子如碱金属离子,s为1~3,优选1或2,更优选为1。
如果X基团带一个以上电荷,则可存在一个以上Y抗衡离子,或者Y基团带一个以上抗衡电荷。重要的是,选择Y基团使得式I所示分子整体上不带电荷。
也可以使X和Y以化学方式结合在一起, 就如在-(CH2)rN+(R11)2-(CH2)t-SO3 -部分中那样,其中r同上所定义,t为1~10的整数,优选为1~5的整数,例如2。这种情况的各实施方案中,X基团和Y基团共同构成两性离子结构。
优选选择R1至R6、X和Y使得分子的溶解度至少为10g/l,优选至少为50g/l,更优选至少为100g/l。如果式I所示化合物的溶解度不足够大,则可改变取代模式,例如可以减少R3至R6基团中的碳原子数,可从某些或所有基团中除去会使溶解度降低的芳基或环烷基基团,以及可含有诸如羟基之类的亲水取代基。
对头发具极大粘结力的化合物如上面所定义通式-C(R10 2)r-N+(R11)3的季铵离子,其溶解度可能较低。
本发明优选的化合物为
以及不同结构单元(structure element)的组合或互换。
化合物
的水溶性可能不大,但它们特别优选用于头发护理。
式I所示化合物可用本身已知的方法来制备。有一些方法公开于实施例中,该领域技术人员可轻易采用这些方法来制备式I所示的其他化合物。
其中X’为XY的前体结构。
-O-PO3 2-类型的磷酸根残基可以例如由相应的醇官能团如使用POCl3与碱例如三乙胺(例如参见M.-Z.Liu et al.,Carbohy dr.Res.330(3),413-420(2001)),与P2O5和H3PO4(例如参见K.Buss et al.,J.Med.Chem.44(19),3166-3174(2001))或通过酶促方法制备。
-O-SO3 -类型的硫酸根残基可以例如由相应的醇官能团如使用SO3×吡啶(例如参见W.J.Sanders et al.,Tetrahedron 53(48),16391-16422(1997))、与SO3×NEt3(例如参见B.Ferla et al.,Tetrahedron 55(32),9867-9880(1999))、氯磺酸(例如参见G.Dekany et al.,J.Carbohy dr.Chem.16(1),11-24(1997))或H2SO4(例如参见S.P.Gaur et al.,Indian J.Chem.Sect.B21(1),46-51(1982))制备。
本发明的一些优选的化合物及其通用制备方法如下:
方法a)
方法b)
类似于:
方法c)
类似于:
方法d)
类似于:
方法e)
同上
方法f)
方法g)
方法h)
方法i)
方法j)
类似于实施例2:
类似于实施例1:
下列通式(I)所示化合物尤其优选:
R1和R2基团均为氰基,基团R3、R4、R5和R6各自独立地选自氢原子和C1-C6烷基,Y是平衡X基团电荷的抗衡离子,依X的电荷而定,优选为碱金属离子或卤离子,以及
a)X为基团
-(C(R9 2))n-(V)m-(C(R9 2))o-(U)p-(C(R9 2))q-W,
式中每个R9各自独立地为氢、羟基或C1-C3烷基,V和U为氧原子,n为1~3的整数,m为0或1,p为0或1,其中m和p中至少一个为1,o为1~3的整数,并且q为1~3的整数,以及W为-O-PO3H-基团或-O-SO3 -基团,或者
b)X为基团
式中,各R10基团独立地选自氢原子、羟基和C1-C3烷基,而R11基团独立地选自氢原子和任选被1至2个氧原子间隔、且任选被1至3个羟基取代的C1-C6烷基,以及r为1~6的整数,或者
c)X为基团
-(C(R9 2))n-(V)m-(C(R9 2))o-(U)p-(C(R9 2))q-W,
式中R9各自分别为氢或甲基,V和U为氧原子,n为1~3的整数,m为0或1,p为0或1,其中m和p中至少一个为1,o为1~3的整数,并且q为1~3的整数,以及W为-O-PO3H-基团或-O-SO3 -基团,或者
b)X为基团
式中,R10基团分别选自氢原子、羟基和C1-C3烷基,而R11基团分别选自氢原子和任选被1至2个氧原子间隔、且任选被1至3个羟基取代的C1-C6烷基,以及r为1~3的整数,或者
e)X为基团
-(C(R9 2))n-(V)m-(C(R9 2))o-W,
式中,R9各自独立地为氢或甲基,V为氧原子,n为1~3的整数,m为1,o为1~3的整数,以及W为基团-O-PO3H-或-O-SO3 -,或者
f)X为下式所示基团
式中,基团R10各自独立地选自氢原子和C1-C3烷基,基团R11各自独立地选自任选被1或2个杂原子间隔、且任选被1至3个羟基取代的C1-C6烷基,以及r为1~3的整数,或者
g)X为下式所示基团
-(C(R9 2))n-W,
式中,每个R9各自独立地为氢、羟基或C1-C3烷基,n为1~6的整数,W为基团-O-PO3H-或-O-SO3 -,或者
h)X为下式所示基团
式中,R10各自独立地选自氢原子、羟基和C1-C3烷基,两个R11基团为C1-C3烷基,一个R11基团为任选被1或2个氧原子间断、且任选被1至3个羟基取代的C1-C6烷基,以及r为1~3的整数,或者R11基团与氮原子共同构成吡啶基,该吡啶基未被取代,或者被1至5个,优选被1至3个上面所定义取代基R8取代。
i)上面a)至h)项中所定义各基团中的一个基团,其中一个基团R9或R10为饱和或不饱和的、含有至多5个碳原子和一或两个氮原子的含氮烃基。
含有下列基团的本发明化合物的溶解度特别高,并且通式(I)所示化合物是特别优选的:
所示基团未被取代,或者被1至5个,优选1至3个如上所定义的取代基R8取代。
本发明还涉及各种含有配制到适宜载体或基料中的通式(I)所示化合物的组合物。具有代表性的是,本发明组合物用来保护对紫外线辐照敏感的材料,特别对日光辐照敏感的材料,所述组合物包括有效光照保护量的至少一种通式(I)所示化合物。在本发明的一个优选实施方案中,这种组合物适于保护皮肤及/或头发不受紫外线辐照的有害作用。在此情况下,本发明的组合物为化妆品组合物或药物组合物,其包括局部可用的、化妆品或药物学可接受的赋形剂或稀释剂作载体。按照本发明的另一个实施方案,通式(I)所示化合物可加入塑性基料中。通式(I)所示化合物也可用来使局部用配制品中的光敏成分稳定,尤其是着色剂,例如FD&C、D&C着色剂、酸性黄(curcumin)、核黄素(riboflavine)、核黄素(lactoflavine)、酒石黄(tartrazine)、氮萘黄(chinolinyellow)、胭脂虫红(cochenille)、偶氮玉红(azorubine)、苋菜红、丽春红4R、真曙红(erythrosin)、靛青、叶绿素(chlorophylle)、叶绿酸、焦糖、药用炭、类胡罗卜素、胭脂树橙、原胭脂树(norbixin)、胭脂树红(annatto)、辣椒红(orlean)、辣椒黄素(capsanthin)、辣椒红素(capsorubin)、菌脂色素(lycopin)、叶黄素(xanthophylle)、毛莨黄素(flavoxanthin)、叶黄素(lutein)、隐黄素(kryptoaxanthin)、玉红黄质(rubixanthin)、堇菜黄质(violaxanthin)、紫杉紫素(rhodoxanthin)、角黄素(canthaxanthin)、甜菜苷(betanin)、花角素(anthocyan)、维生素如维生素A、维生素K1、维生素C,或者其他活性成分。
通式(I)所示化合物的最大吸收值在UV-A区域内。为制备防晒剂起见,尤其为制备皮肤病学用及/或化妆用制剂,例如日常化妆品中的护肤或防晒配方制品起见,可将通式(I)所示化合物掺加到助剂中,例如掺加到按常规用于这些配方制品的化妆品基料中。在便利的场合下,也可添加其他常用的UV-A或UV-B防晒剂,优选为颜料。组合采用紫外滤光剂会显示协同效应。上述防晒剂的制备,该领域熟练技术人员均知悉。紫外滤光剂的浓度可在宽广的范围内变动。举例来说,通式(I)所示化合物和通式(I)所示化合物之外的任选额外的亲水性及/或亲脂性UV-A或UV-B防晒剂的量可在以组合物总重量为准计的0.5~12%(重量)范围内。这些额外的防晒剂以选自下列化合物为有利,但不局限于这些化合物:
UV-B或广谱防晒剂,也即最大吸收值在约290至340nm的物质,其被考虑与本发明化合物组合使用的例子例如为下列有机化合物和无机化合物:
---樟脑衍生物,例如4-甲基亚苄基樟脑(PARSOL5000)、3-亚苄基樟脑、樟脑苯甲烃铵甲基硫酸酯、聚丙烯酰胺基甲基亚苄基樟脑、磺基亚苄基樟脑、磺甲基亚苄基樟脑、对苯二亚甲基二樟脑磺酸(therephthalidene dicamphor sulfonic acid)等;---肉桂酸酯衍生物,例如甲氧基肉桂酸辛酯(PARSOLMCX)、甲氧基肉桂酸乙氧基乙基酯、甲氧基肉桂酸二乙醇胺盐(diethanolaminemethoxycinnamate,PARSOLHydro)、甲氧基肉桂酸异戊酯、与硅氧烷键合的肉桂酸衍生物;
---对氨基苯甲酸衍生物,例如对氨基苯甲酸、对二甲基氨基苯甲酸2-乙基己基酯、N-氧丙烯基化(N-oxypropylenated)对氨基苯甲酸乙酯、对氨基苯甲酸甘油酯。
---二苯酮,例如二苯酮-3、二苯酮-4、2,2',4,4'-四羟基-二苯酮、2,2'-二羟基-4,4'-二甲氧基二苯酮等;
---亚苄基丙二酸的酯,例如4-甲氧基亚苄基丙二酸二(2-乙基己基)酯;
---2-(4-乙氧基苯胺基亚甲基)丙二酸的酯,例如EP 0895 776中所记载的2-(4-乙氧基苯胺基亚甲基)丙二酸二乙酯。
---含苯丙二酸酯(benzmalonate)基的有机硅氧烷化合物,如EP0358584 B1、EP 0538431 B1及EP 0709080 A1所记载者;
---甲酚曲唑三硅氧烷(drometrizole trisiloxane)(Mexoryl XL);
---颜料如微粒状TiO2等。“微粒状”系指粒度约5nm至约200nm,尤其约15nm至约100nm的颗粒。TiO2颗粒也可包覆以诸如氧化铝或氧化锆之类的金属氧化物,或者包覆以有机覆层如多元醇、聚甲基硅氧烷(methicone)、硬脂酸铝、烷基硅烷。这些覆层是该领域中众所周知的。
---水杨酸酯衍生物,例如水杨酸异丙基苄基酯、水杨酸苄酯、水杨酸丁酯、水杨酸辛酯(NEO HELIOPAN OS)、水杨酸异辛酯或者水杨酸三甲环己酯(homosalate,HELIOPAN)等。
---三嗪衍生物,例如辛基三嗪酮(UVINULT-150)、二辛基丁酰胺基三嗪酮(UVASORB HEB)、双乙氧苯酚甲氧苯基三嗪(Tinosorb S)等。
广谱或UV A防晒剂,也即最大吸收值约在320至400nm的物质,其被考虑与本发明化合物组合使用的例子例如为下列有机化合物和无机化合物:
---二苯甲酰甲烷衍生物例如,4-叔丁基-4′-甲氧基二苯甲酰甲烷(PARSOL1789)、二甲氧基二苯甲酰基甲烷、异丙基二苯甲酰基甲烷等;
---苯并三唑衍生物,例如2,2’-亚甲基-双-(6-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)-苯酚(TINOSORB M)等;
---亚苯基-1,4-双-苯并咪唑磺酸或其盐,例如2,2-(1,4-亚苯基)双-(1H-苯并咪唑-4,6-二磺酸)(Neoheliopan AP);
---氨基取代的羟基二苯甲酮,例如2-(4-二乙基氨基-2-羟基-苯甲酰基)-苯甲酸己酯,如EP 1046391中所记叙者;
---颜料如微粒状ZnO或TiO2等。“微粒状”系指粒度约5nm至约200nm,尤其约15nm至约100nm的颗粒。这种颗粒也可包覆其他金属氧化物如氧化铝或氧化锆,或者包覆有机覆层如多元醇、聚甲基硅氧烷(methicone)、硬脂酸铝、烷基硅烷。这些覆层是该领域中众所周知的。
---3,3-二苯基丙烯酸酯衍生物,如EP 0514491 B1和EP 0780119 A1中所记叙者;
---亚苄基樟脑衍生物,如US 5,605,680中所记叙者;
---含苯基丙二酸酯基的有机硅氧烷,如EP 0358584 B1、EP0538431 B1和EP 0709080 A1中所记叙者。
本发明组合物还含有惯用化妆品佐剂和添加剂,例如防腐剂/抗氧化剂、脂肪物质/油、水、有机溶剂、硅酮、增稠剂、软化剂、乳化剂、辅助防晒剂、消泡剂、保湿剂、香料、表面活性剂、填料、多价螯合剂、阴离子型聚合物、阳离子型聚合物、非离子型聚合物或两性聚合物或其混合物,推进剂、酸化剂或碱化剂、染料、着色剂、颜料或者纳米级颜料,尤其那些适于通过物理方式遮蔽紫外辐射而产生额外光保护效应的颜料,或者任何其他通常配入化妆品的成分,特别是用来制造遮光/防晒组合物的成分。根据所要制造的产品,本领域技术人员就能轻而易举地选择化妆和皮肤医学用的助剂及添加剂的需用量,本申请的实施例中将予阐明,但不局限于此。
一般而言,优选添加额外量的抗氧化剂/防腐剂。根据本发明,通常配入化妆品的所有已知抗氧化剂都可使用。尤其优选的是选自如下这类物质的抗氧化剂:氨基酸(例如,甘氨酸、组氨酸、酪氨酸、色氨酸)及其衍生物、咪唑(例如尿刊酸)及衍生物、肽(例如D,L-肌肽、D-肌肽、L-肌肽及衍生物如鹅肌肽)、类胡萝卜素、胡萝卜素(α-胡萝卜素、β-胡萝卜素、番茄红素)及衍生物、绿原酸及衍生物、硫辛酸及衍生物(例如二氢硫辛酸)、硫金代葡萄糖、丙烷基硫脲嘧啶及其他硫醇(例如硫氧还蛋白、谷胱甘肽、半胱氨酸、胱氨酸、胱胺及其糖基、N-乙酰基、甲基、乙基、丙基、戊基、丁基以及月桂基、棕榈基、油基、y-十八碳二烯基(y-linoleyl)、胆甾烯基以及甘油酯)及其盐、硫代二丙酸二月桂酯、硫代二丙酸二硬脂基酯、硫代二丙酸及其衍生物(酯、醚、肽、类脂、核苷酸、核苷及盐)以及很低相容剂量(例如pmol/kg至μmol/kg)的硫氧亚氨(sulfoximine)化合物(例如S-(3-氨基3-羧丙基)-S-丁基硫氧亚氨(buthionine sulfoximine)、高半胱氨酸硫氧亚氨、S-(3-氨基3-羧丙基)-S-丁基砜(buthionine sulfone)、五-、六-、七硫堇(thionine)硫氧亚氨),另外还有(金属)螯合剂(例如α-羟基脂肪酸、棕榈酸、肌醇六磷酸、乳铁蛋白)、β-羟基酸(例如柠檬酸、乳酸、苹果酸)、腐殖酸、五倍子酸、五倍子提取物、胆红素、胆绿素、EDTA、EGTA及其衍生物、不饱和脂肪酸及其衍生物(例如γ-亚油酸、亚油酸、油酸)、叶酸及其衍生物、泛醌与泛醌醇(ubiquinol)及其衍生物、维生素C及衍生物(例如抗坏血酸棕榈酸酯及抗坏血酸四异棕榈酸酯、Mg-抗坏血酸磷酸酯(Mg-ascorbyl phosphate)、Na-抗坏血酸磷酸酯、抗坏血酸乙酸酯))、维生素E及衍生物(例如维生素-E-乙酸酯)、天然维生素E的混合物、维生素A及衍生物(维生素-A-棕榈酸酯及维生素-A-乙酸酯)以及松柏基苯甲酸酯、芸香亭酸和衍生物、α-糖基芸香苷、阿魏酸、亚糠基葡萄糖醇、肌肽、丁基羟基甲苯、丁基羟基茴香醚、三羟基苯丁酮(trihydroxybutyrophenone)、尿素及其衍生物、甘露糖及衍生物、锌及衍生物(例如ZnO、ZnSO4)、硒及衍生物(例如硒代蛋氨酸)、芪及衍生物(例如芪氧化物(stilben oxide)、反式-芪氧化物)以及上述各活性成分的相宜的衍生物(盐、酯、醚、糖、核苷酸、核甙、肽及类脂)。以本发明组合物总重量为准计,一种或多种防腐剂/抗氧化剂可以约0.01%(重量)至约10%(重量)的量存在。优选的是,一种或多种防腐剂/抗氧化剂可以约0.1%(重量)至约1%(重量)的量存在。
一般,配方中还含有诸如乳化剂、增溶剂等的表面活性成分。乳化剂能使两种或两种以上不互溶组分均匀混合。而且,乳化剂还起着稳定组合物的作用。本发明中,为形成O/W、W/O、O/W/O、W/O/W型乳液/微乳液,可能使用的乳化剂包括失水山梨糖醇油酸酯、失水山梨糖醇倍半油酸酯、失水山梨糖醇异硬脂酸酯、失水山梨糖醇三油酸酯、聚甘油基(polyglyceryl)-3-二异硬脂酸酯、油酸/异硬脂酸的聚缩水甘油酯、聚甘油基-6六蓖麻醇酸酯(hexaricinolate)、聚甘油基-4-油酸酯、聚甘油基-4油酸酯/PEG-8丙二醇椰油酯(cocoate)、油酰二元醇胺(DEA)、三乙醇胺(TEA)肉豆蔻酸酯、TEA硬脂酸酯、硬脂酸镁、硬脂酸钠、月桂酸钾、蓖麻醇酸钾、椰子油酸钠(sodium cocoate)、牛油酸(tallowate)钠、海狸香酸(castorate)钾、油酸钠、及其混合物。其它合适的乳化剂为磷酸酯及其盐,例如磷酸十六烷酯(A)、二乙醇胺十六烷磷酸酯()、十六烷磷酸钾(K)、油酸甘油酯磷酸钠(sodium glyceryl oleate phosphate)、氢化植物甘油酯磷酸酯及其混合物。此外,一种或多种合成聚合物可以作为乳化剂。例如,PVP二十碳烯(eicosene)共聚物、丙烯酸酯/C10-30烷基丙烯酸酯交联聚合物(crosspolymer)、丙烯酸酯/硬脂醇醚(steareth)-20甲基丙烯酸酯共聚物、PEG-22/十二基二醇共聚物、PEG-45/十二基二醇共聚物、及其混合物。优选的乳化剂为磷酸十六烷基酯(A)、十六基磷酸二乙醇胺盐()、十六烷基磷酸钾(K)、PVP二十碳烯共聚物、丙烯酸酯/C10-30-烷基丙烯酸酯交联聚合物、PEG-20失水山梨糖醇异硬脂酸酯、失水山梨糖醇异硬脂酸酯及其混合物。一种或多种乳化剂的总存在量为本发明组合物总量的约0.01wt%~约20wt%。优选,使用约0.1wt.%~约10wt.%的乳化剂。
类脂相可有利地选自:
矿物油和矿物蜡;
油例如癸酸(caprinic acid)或辛酸的甘油三酯,优选蓖麻油;
油或蜡和其它天然或合成油,在优选实施方式中,脂肪酸与醇,例如异丙醇、丙二醇、甘油的酯,或脂肪醇与碳酸或脂肪酸的酯;
苯甲酸烷基酯;和/或
硅油例如二甲基聚硅氧烷、二乙基聚硅氧烷、二苯基聚硅氧烷、环甲基硅酮(cyclomethicone)及其混合物。
可以加入本发明乳液、微乳液、油凝胶、水分散体或脂肪分散体的油相中的示例性脂肪物质有利地选自饱和和/或不饱和、直链或支化、3~30碳原子的烷基羧酸,与饱和和/或不饱和、直链和/或支化、3~30碳原子的醇的酯,以及芳族羧酸和饱和和/或不饱和、直链或支化、3-30碳原子的醇的酯。此种酯可以有利地选自棕榈酸辛酯、辛基椰油酸酯(cocoate)、异硬脂酸辛酯、辛基十二烷基肉豆蔻酸酯、十六/十八烷基(cetearyl)异壬酸酯、肉豆蔻酸异丙基酯、棕榈酸异丙基酯、硬脂酸异丙基酯、油酸异丙基酯、硬脂酸正-丁基酯、月桂酸正-己基酯、油酸正-癸酯、硬脂酸异辛基酯、硬脂酸异壬基酯、异壬酸异壬基酯、棕榈酸2-乙基己基酯、月桂酸2-乙基己基酯、硬脂酸2-己基癸酯、棕榈酸2-辛基十二烷基酯、庚酸硬脂基酯、油酸油基酯、芥酸油基酯、油酸瓢儿菜基酯(erucyloleate)、芥酸瓢儿菜基酯、硬脂酸十三烷基酯、十三烷基偏苯三酸酯,和这些酯的合成、半-合成或天然混合物,例如霍霍巴油。
其它适用于本发明制剂的脂肪组分包括极性油(polar oils)例如卵磷脂(lecithin)和脂肪酸甘油三酯,即饱和和/或不饱和的、直链或支化的、8~24碳原子的、优选12~18个碳原子的羧酸的甘油三酯,其中脂肪酸甘油三酯优选选自合成、半合成或天然油(例如椰油酸甘油酯(cocoglyceride)、橄榄油、向日葵籽油、豆油、花生油、菜子油、甜杏仁油、棕榈油、椰子油、蓖麻油、氢化蓖麻油、麦油、葡萄子油、澳洲坚果油及其它);极性油例如直链和/或支化烃和蜡例如矿物油、凡士林(矿脂);石蜡、角鲨烷(squalane)和角鲨烯(squalene)、聚烯烃、氢化聚异丁烯和异十六烷,优选的聚烯烃为聚癸烯;二烷基醚,例如二辛酰醚;直链或环状硅油例如优选环甲基硅酮(cyclomethicone)(八甲基环四硅氧烷)、十六烷基聚二甲基硅氧烷(cetyldimethicone)、六甲基环三硅氧烷、聚二甲基硅氧烷、聚(甲基苯基硅氧烷)及其混合物。
可以有利地加入本发明的制剂中的其它脂肪组分包括异二十烷(isoeikosane)、新戊二醇二庚酸酯、丙二醇二辛酸酯/二癸酸酯、辛酸/癸酸/二甘油基琥珀酸酯、丁二醇辛酸酯/癸酸酯、C12-13-烷基乳酸酯、二C12-13-烷基酒石酸酯、三异硬脂酸甘油酯、二季戊四醇六辛酸酯/六癸酸酯、丙二醇单异硬脂酸酯、甘油三辛酸酯、二甲基异山梨醇(dimethylisosorbid)。特别优选使用C12-15-烷基苯甲酸酯和2-乙基-己基异硬脂酸酯的混合物,C12-15-烷基苯甲酸酯和异十三烷基异壬酸酯的混合物,以及C12-15-烷基苯甲酸酯、2-乙基己基异硬脂酸酯和异十三烷基异壬酸酯的混合物。
本发明制剂的油相还含有天然植物或动物蜡例如蜂蜡、中国蜡(chinawax)、大黄蜂蜡和其它昆虫的蜡,以及牛油树脂和可可脂。
本发明组合物中可以混入保湿剂,以保持水合作用或使皮肤再水化。通过提供防护层而防止水从皮肤蒸发的增湿剂称作润肤剂。附加的润肤剂对皮肤表面提供软化或润肤效果,并通常被认为对局部应用是安全的。优选的润肤剂包括矿物油、羊毛脂、矿脂、癸酸(capric)三甘油醛、辛酸三甘油醛、胆甾醇;硅氧烷,例如聚二甲基硅氧烷、环甲基硅酮;杏仁油、霍霍巴油、鳄梨油、蓖麻油、芝麻油、向日葵籽油、椰子油和葡萄子油、可可脂、橄榄油、芦荟提取物(aloe extracts );脂肪酸,例如油酸和硬脂酸;脂肪醇,例如鲸蜡醇和十六烷基醇;己二酸二异丙基酯、羟基苯甲酸酯、C9-15-醇的苯甲酸酯、异壬酸异壬基酯;醚,例如聚氧丙烯丁基醚和聚氧丙烯十六烷基醚、C12-15-烷基苯甲酸酯、及其混合物。最优选的润肤剂是羟基苯甲酸酯、库拉索芦荟(aloe vera)、C12-15-烷基苯甲酸酯,及其混合物。润肤剂可以以组合物总量的约1wt%~约20wt%的量存在。润肤剂的量优选为约2wt%~约15wt%,最优选约4wt%~约10wt%。
与水相结合的、因此将其保持在皮肤表面的增湿剂称作保湿剂。可以加入到本发明组合物中的合适的保湿剂为,例如甘油、聚丙二醇、聚乙二醇、乳酸、吡咯烷酮羧酸(pyrrolidon carboxylic acid)、脲、磷脂(phopholipids)、胶原蛋白、弹性蛋白、神经酰胺、卵磷脂山梨糖醇、PEG-4、及其混合物。其它合适的增湿剂为下类的聚合物增湿剂:水溶的和/或可溶胀和/或与水凝胶化的多糖,例如透明质酸、壳聚糖和/或富岩藻糖的多糖,其是例如作为1000(CAS-Nr.178463-23.5)从SOLABIA S获得。一种或多种保湿剂任选地以本发明组合物的约0.5wt%~约8wt%,优选约1wt%~约5wt%的量存在。
本发明组合物的水相可含有常见的化妆品添加剂,例如醇,尤其低级醇,优选乙醇及/或异丙醇、低级二醇或多元醇及其醚,优选丙二醇、丙三醇、乙二醇、乙二醇单乙基醚或单丁基醚、丙二醇单甲基醚或单乙基醚或单丁基醚、一缩二乙二醇单甲基醚或单丁基醚、丙二醇单甲基醚或单乙基醚或单丁基醚、一缩二乙二醇单甲基醚或单乙基醚以及类似产品、聚合物、泡沫稳定剂;电解质以及尤其一种或多种增稠剂。可用于本发明制剂中、有助于产生合适的产品稠度的增稠剂包括丙烯酸聚合物(carbomer)、二氧化硅、镁和/或铝硅酸盐、蜂蜡、硬脂酸、十八烷醇多糖及其衍生物,例如黄原胶、羟丙基纤维素、聚丙烯酰胺、丙烯酸酯交联聚合物,优选丙烯酸聚合物,例如单独的980、981、1382、2984、5984型carbopole或其混合物。可以包含在本发明组合物中以中和组分(例如乳化剂或发泡助剂(foambuilder)/稳定剂)的合适的中和剂包括但不限于氢氧化物碱(alkali hydroxide),例如氢氧化钠和钾;有机碱,例如二乙醇胺(DEA)、三乙醇胺(TEA)、氨基甲基丙醇及其混合物;氨基酸例如精氨酸和赖氨酸,以及任何前述的组合。中和剂的存在量可以为本发明组合物的约0.01wt%~约8wt%,优选1wt%~约5wt%。
加入本发明组合物中的电解质,或许是改变憎水乳化剂的行为所必需的。因此,本发明中的乳液/微乳液可优选含有一种或数种盐的电解质,其中包括阴离子如氯离子、硫酸根、碳酸根、硼酸根及铝酸根,但不限于这些。其他相宜的电解质可以有机阴离子为基础,例如但不局限于,乳酸盐、乙酸盐、苯甲酸盐、丙酸盐、酒石酸盐及柠檬酸盐。阳离子优选选择铵、烷基铵、碱金属或碱土金属、镁离子、铁离子或锌离子。特别优选的盐是氯化钾及氯化钠、硫酸镁、硫酸锌及其混合物。本发明组合物中,电解质可存在的量为约0.01%(重量)至约8%(重量)。
本发明的化妆组合物可作为用于防止人的表皮或头发受到紫外线损害的组合物,作为遮光组合物。具体说来,这种组合物可以乳液、增稠乳液、凝胶、膏、乳剂、软膏、粉或固体管状棒(solid tube stick)的形式提供,并可按需要以气溶胶形式来包装,也可以摩丝、泡沫剂或喷雾剂形式提供。当本发明化妆品组合物供保护人类表皮不受紫外线辐射或者用作遮光组合物时,该组合物可以采取悬浮或分散于溶剂或脂肪物质中的悬浮液、分散体的形式;或者作为选择采取乳液或微乳液的形式(具体来说,O/W或W/O型、O/W/O或W/O/W型),例如膏或乳剂,多泡状分散体;采取软膏、凝胶、管装固体棒形式或气溶胶摩丝形式。乳液也可含有阴离子型、非离子型、阳离子型或者两性型表面活性剂。
本发明化合物保护皮肤和头发不受UV-A辐射危害。这些化合物可被有机相中的其他UV-A防晒剂补充,从而产生更高的防晒效果。这些化合物可容易地混入不同的化妆品组合物中,而且这些化合物比其他已知UV-防晒剂显示出对更长波长的防护,而且特别比其他市售的水溶性的UV-A防晒剂显示出对更长波长的防护,因而是有效的UV-A滤光剂,而不是UV-A/UV-B间隙滤光剂(gapfilter),而且防护皮肤不被可见光着色。此外,通式(I)所示新化合物的显著优点是,这些化合物比已知的其他水溶性UV-A防晒剂呈现更高的消光度,而且尤其比现有市售的水溶性UV-A防晒剂具有甚至更好的消光度,因而产生更好的保护。通式(I)所示的化合物还呈现优良的光稳定性。意外的是,通式(I)所示的化合物还使乳液稳定,从而可用作本发明组合物的助乳化剂,如果这些化合物采取乳液形式的话。通式(I)所示的化合物呈现很低的经皮渗透性,而且对皮肤和头发具有优良的粘着力。
提供下列实施例来进一步举例说明本发明的方法和组合物。这些实施例仅仅是示例性的,无论如何不旨在限制本发明的保护范围。
实施例1
4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基-乙氧基磷酸酯一钠盐):
a) 4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基-乙醇)
350ml三颈反应烧瓶配以温度计、回流冷凝器和带有磁子搅拌器的油浴,烧瓶中装以存在于150ml正丁醇中的30.1g(175mmol)的4-二氰基亚甲基-4H-吡喃(按Helv.Chim.Acta 1962,1908-1917制备)和20.2g(192mmol)2-(2-氨基乙氧基)-乙醇(Fluka),并在氩气氛下加热90分钟。冷却后,对全部悬浮液进行过滤,依次用乙酸乙酯、二异丙基醚和戊烷洗涤滤渣,干燥后得20.3g微黄褐色晶体。熔点157~158℃,UV(THF)360及372nm(32’332)。
b)4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基-乙氧基磷酸酯一钠盐)
750ml四颈反应烧瓶配以温度计、滴液漏斗、回流冷凝器、pH电极和带有磁子搅拌器的冷却浴,在氩气氛下,烧瓶中装以存在于250mlTHF中的19.5g(75mmol)上面所制备的4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基-乙醇)以及13.6ml(97.5mmol)三乙胺(Fluka)并冷至10℃。然后,在15分钟内用滴液漏斗添加13.8g(90mmol)溶于50mlTHF的POCl3。室温下搅拌混合物16小时,用HPLC跟踪反应,滤除沉淀物,以除去所生成的NEt3×HCl。再将滤液冷至10℃,并添加1mg的18-冠醚-6,继而添加97.5ml的2.0-n NaOH水溶液,同时检查pH。再搅拌反应物90分钟,并在20℃下再添加2.0-n NaOH水溶液,直至pH达到4为止。此刻,分离出水相,并用100ml乙酸乙酯洗涤之。添加50ml饱和NaCl水溶液,以使产物沉淀,并可将之过滤出来,再以200ml丙酮洗涤之。干燥后得18.2g无色晶体。水中溶解度168g/l。在DMF中重结晶此盐。熔点158~159℃;UV(水)350nm(E=979)。按照Berset et al.,Internat.J. Cosmetic Science 18:167-177(1996),用7∶3的水/甘油混合物溶液作液相测量了该盐的光稳定性。发现产物具有光稳定性。
实施例2
4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基硫酸酯一钠盐):
a)4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-乙-2-醇
350ml三颈反应烧瓶配以温度计、回流冷凝器和带有磁子搅拌器的油浴,烧瓶中装以存在于100ml乙醇胺(Fluka)中的25.8g(150mmol)4-二氰基亚甲基-4H-吡喃(按Helv.Chim.Acta 1962,1908-1917制备),并在氩气氛下加热到80℃,保持30分钟。反应开始后不久就观察到放热反应。冷却后,用100ml正丁醇稀释混合物,并予过滤。依次用2×10ml冷水和2×100ml丙酮洗涤滤渣。干燥后得17.5g微黄色晶体。熔点267~268℃,UV(THF)360及372nm(26’305)。
b) 4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基硫酸酯一钠盐)
100ml反应烧瓶配以搅拌器、回流冷凝器、温度计、油浴和氩气氛,烧瓶中装以存在于30ml 9∶1乙腈/吡啶混合物中的2.15g(10mmol)上述4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-乙-2-醇和1.91g(12mmol)三氧化硫-吡啶复合剂(Fluka)。边强烈搅拌边将此混合物加热到60℃,保持30分钟。10分钟后,用HPLC就实际上检测不到起始原料。室温下,用30ml丙酮稀释该混合物,并过滤之。用丙酮、二异丙醚和戊烷洗涤滤渣,干燥后得3.1g无色晶体,熔点209~210℃。将该物质溶于30ml水中。加入1当量的1-n NaOH水溶液,并搅拌混合物15分钟,并在旋转式蒸发器(rotavap)中进行高真空浓缩。再向滤渣中添加50ml水,并如上进行浓缩。再重复2次该过程,直至闻不到吡啶嗅味。再将干燥物质溶于5倍于其重量的水中,添加200mlTHF使之沉淀,过滤并用THF和丙酮洗涤残留物,得2.9g无色晶体。熔点198℃(分解);UV(水)352nm(E=1261)。水中溶解度≥25g/l。按照Berset et al.,Internat.J.CosmeticScience18:167-177(1996),用7∶3的水/甘油混合物溶液作液相测量了该产物的光稳定性。发现该产物具有光稳定性。
实施例3
4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-[3-(N,N-二甲基)-N-(乙氧基-乙氧基乙醇-基)-丙基-碘化铵]
a) 4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(3-[N,N-二甲基氨基]-丙烷)
250ml三颈反应烧瓶配以温度计、回流冷凝器和带有磁子搅拌器的油浴,烧瓶中装以存在于145ml正丁醇中的14.5g(82.2mmol)4-二氰基亚甲基-4H-吡喃(按Helv.Chim.Acta1962,1908-1917制备)和10.1g(99mmol)3-(N,N-二甲基氨基)-丙胺(Fluka),并在氩气氛下加热2小时。冷却后,过滤悬浮液,用冷正丁醇洗涤滤渣,干燥后得10.4g微黄色晶体。熔点187~188℃。UV(乙醇)360nm(37’287)。
b) 2-[2-(2-碘代乙氧基)-乙氧基]-乙醇
25ml反应烧瓶配以回流冷凝器、油浴和磁子搅拌器,烧瓶中装以存在于20ml丙酮中的2g(11.9mmol)2-[2-(2-氯代乙氧基)-乙氧基]-乙醇(Fluka)、4g碘化钠及3g碳酸氢钠。将反应混合物回流过夜,冷后予以过滤。滤液在旋转式蒸发器之予以浓缩,溶于5ml CH2Cl2后再予过滤。然后,再在旋转式蒸发器中浓缩滤液,得2.5g黄色油状物。NMR证实纯净物质(CDCl3)2.58 s宽(1H/OH);3.22 t(2H/CH2-J);3.53-3.77m(10H/CH2-O)。
c)4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-[3-(N,N-二甲基)-N-(乙氧基-乙氧基乙醇-基)-丙基-碘化铵]
50ml反应烧瓶配以回流冷凝器、油浴和磁子搅拌器,烧瓶中装以存在于15mlDMF中的1.28g(5mmol)如上所制4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(3-[N,N-二甲基氨基]-丙烷)、1.34g(5.5mmol)上述2-[2-(2-碘代乙氧基)-乙氧基]-乙醇。将反应混合物回流过夜,并用TLC显示无起始原料。在旋转式蒸发器中浓缩反应混合物,随后进行高真空(HV)干燥。用环己烷洗涤残留物,再用乙酸乙酯洗涤之,继而在乙醇中重结晶。得2.09g棕色晶体。熔点130~180℃(分解);UV(乙醇)362nm(37’946)。
实施例4
1-{2-[2-(4-二氰基亚甲基-2,6-二甲基-4H-吡啶-1-基)-乙氧基]-乙基}-吡啶鎓氧化物
a)2-{1-[2-(2-氯-乙氧基)-乙基]-2,6-二甲基-1 H-亚吡啶-4-基}-丙二腈
750ml四颈反应烧瓶配以温度计、滴液漏斗、回流冷凝器、带有磁子搅拌器的冷却加热浴,在氩气氛下,烧瓶中装以存在于50ml THF中的19.5g(75mmol)上面所制备的4-二氰基亚甲基-2,6-二甲基-1,4-二氢吡啶-N-(乙氧基-乙醇)(实施例6.1.a)以及痕量三乙胺(Fluka)并冷至10℃。然后,在15分钟内用滴液漏斗添加10.7g(90mmol)溶于50ml THF的SOCl2溶液。室温下搅拌混合物1小时,然后加热回流4小时。用HPLC跟踪反应。将混合物倾于冰上,滤出产物,并在乙酸乙酯中重结晶。得白色晶体,熔点148~149℃。
b)1-{2-[2-(4-二氰基亚甲基-2,6-二甲基-4H-吡啶-1-基)-乙氧基]-乙
a)2-[1-(3-羟基-苯基)-2,6-二甲基-1H-亚吡啶-4-基}-丙二腈
10ml反应烧瓶配以回流冷凝器、磁子搅拌器和油浴,在氩气氛下,烧瓶中装入0.86g(5mmol)4-二氰基亚甲基-4H-吡喃(按照Helv.Chim.Acta1962,1908-1917制备)和2.8g(25mmol)3-氨基苯酚(Fluka),并加热到140℃,保持5小时。趁热将反应混合物倾倒在100ml的2n HCl中,并用100ml乙酸乙酯萃取两次。有机相合并后用2n HCl回洗,在旋转式蒸发器中予以浓缩并干燥。所得晶体用温热乙酸乙酯和MeOH洗涤,并再次干燥,得460mg白色晶体。熔点>300℃,TLC(硅胶上EtOAc∶己烷=1∶1) Rf=0.15。
b)3-[3-(4-二氰基亚甲基-2,6-二甲基-4H-吡啶-1-基)-苯氧基]丙烷-1-磺酸
50ml三颈反应烧瓶配以温度计、回流冷凝器、磁子搅拌器和加热基}-吡啶鎓氯化物
50ml反应烧瓶配以回流冷凝器、加热浴和磁子搅拌器,在氩气氛下,烧瓶中装以存在于25ml吡啶中的1.4g(5mmol)上述2-{1-[2-(2-氯-乙氧基)-乙基]-2,6-二甲基-lH-亚吡啶-4-基}-丙二腈,加热回流5小时。生成粘稠状悬浮液,将之滤出,并用少量冷吡啶洗涤,再用THF洗涤。干燥后,得1.69g细晶体,熔点248~251℃(分解),UV(水)352nm(E=1149)。水中溶解度>>200g/l。
实施例5
3-[3-(4-二氰基亚甲基-2,6-二甲基-4H-吡啶-1-基)-苯氧基]丙烷-1-磺酸浴,在氩气氛下,烧瓶中装以悬浮于20ml无水THF和0.1ml无水DMF混合物中的263mg(1mmol)上述2-[1-(3-羟基-苯基)-2,6-二甲基-1H-亚吡啶-4-基]-丙二腈和26.5mg(1.05mmol)无水NaH(95%)。观察到氢气产生。45分钟后,将134mg(1.1mmol)的1,3-丙磺酸内酯(propan sultone)加入悬浮液中,并将反应混合物加热到70℃,保持5小时,用HPLC跟踪。趁冷过滤混合物,残留物用少量THF洗涤,得260mg白色粉末。在MeOH/CH2Cl2中重结晶,用CH2Cl2洗涤晶体并予以干燥,得190mg无色晶体,熔点200℃(分解)。UV(水)352nm(E=1150),水中溶解度>50g/l。
实施例6
O/W型防晒乳液UV-B及UV-A的制备
含2%实施例1所制化合物的广谱防晒乳液
A部分在反应器中加热到85℃。B部分在10分钟内缓缓加入,接着添加KOH,将乳液冷却并脱气。
实施例7
耐水型防晒乳剂
实施例8
喷雾型防晒乳液
成分 | INCI命名法 | %(重量) | ||
A) | PARSOL MCX | 甲氧基肉桂酸乙基己酯 | 1) | 6.00 |
PARSOL 5000 | 4-甲基亚苄基樟脑 | 1) | 2.00 | |
Emulgade SE-PE | 硬脂酸甘油酯、十六/十八烷醇聚氧乙烯(20)醚、十六/十八烷醇聚氧乙烯(12)醚、十六/十八烷醇、棕榈酸十六烷基酯混合物 | 2) | 7.00 | |
Eumulgin B-2 | 十六/十八醇聚氧乙烯(20)醚 | 2) | 6.00 | |
MVritol 318 | (辛酸/癸酸)甘油三酯 | 2) | 3.00 | |
Cetiol A | 月桂酸己酯 | 2) | 6.00 | |
Silicone DC 345流体 | 环甲基硅酮 | 6) | 7.00 | |
Antaron V-220 | PVP/二十碳烯共聚物 | 7) | 2.00 | |
Edeta BD | EDTA二钠盐 | 3) | 0.10 | |
丁基化羟基甲苯 | BHT | 5) | 0.05 | |
Phenonip | 苯氧基乙醇、对羟基苯甲酸甲酯、对羟基苯甲酸乙酯、对羟基苯甲酸丙酯及对羟基苯甲酸丁酯 | 8) | 0.60 | |
B) | 去离子水 | 水 | q.s.100 |
成分 | INCI命名法 | %(重量) | ||
甘油 | 甘油 | 5) | 5.00 | |
C) | PARSOL HS | 苯基苯并咪唑磺酸 | 1) | 2.00 |
实施例2的产物 | 2.00 | |||
去离子水 | 水 | 20.00 |
KOH 10%sol. | 氢氧化钾 | 4.40 |
操作步骤:
边搅拌边将A)部分加热至85℃。搅拌均匀后,搅拌下添加B)部分(80℃)。然后,搅拌下添加C)部分(40℃)(确保Parsol HS已完全溶解,如果残留痕量,则添加少量碱予以中和,直至溶液澄清,pH>7)。最后,将pH调节到至少为7,并冷至室温。
供货商:
1)DSM Nutritional Products,CH-4002 Basel/Switzerland
2)COGNIS,D-40551 Düsseldorf/Germany
3)BASF AG, D-67056 Ludwigshafen/Germany
4)GOODRICH COMPANY,Cleveland-OH 44141-3247/USA
5)FLUKA CHEMIE AG,CH-9471 Buchs/Switzerland
6)DOW CORNING CORP.,Midland-Mi 48686-0994/USA
7)ISP TECHNOLOGIES INC.,Wayne-NJ 07470/USA
8)NIPA LABORATORIES LTD,Mid Glam.-CF38 2SN/England
实施例9
O/W维生素型广谱防晒乳液
成分 | INCI命名法 | %(重量) | ||
A) | PARSOL MCX | 肉桂酸乙基己酯 | 1) | 4.00 |
PARSOL 1789 | 丁基甲氧基二苯酰基甲烷 | 1) | 1.00 | |
PARSOL 5000 | 4-甲基亚苄基樟脑 | 1) | 3.50 | |
Estol GMM 3650 | 豆蔻酸甘油酯 | 8) | 4.00 |
成分 | INCI命名法 | %(重量) | ||
十六烷醇 | 十六烷醇 | 2.00 | ||
Ganex V-220 | PVP/二十碳烯共聚物 | 4) | 2.00 | |
Tegosoft TN | 苯甲酸C<sub>12-15</sub>烷基酯 | 5) | 10.00 | |
Myritol 318 | (辛酸/癸酸)甘油三酯 | 6) | 6.00 | |
丁基化羟基甲苯 | BHT | 0.05 | ||
Edeta BD | EDTA二钠 | 2) | 0.10 | |
Phenonip | 苯氧基乙醇、对羟基苯甲酸甲 | 3) | 0.60 |
酯、对羟基苯甲酸乙酯、对羟基苯甲酸丙酯及对羟基苯甲酸丁酯 | ||||
AMPHISOL K | 十六烷基磷酸钾 | 1) | 2.00 | |
VITAMIN EACETATE | 生育酚乙酸酯 | 1) | 2.00 | |
B) | 去离子水 | 水 | ad 100 | |
丙二醇 | 丙二醇 | 5.00 | ||
Carbopol 981(1%sol.) | 丙烯酸聚合物 | 7) | 10.00 | |
D-PANTHENOL75L | 泛醇 | 1) | 2.70 | |
C) | KOH(10%sol.) | 氢氧化钾 | 0.70 | |
D) | 去离子水 | 水 | 20.00 |
酯、对羟基苯甲酸乙酯、对羟基苯甲酸丙酯及对羟基苯甲酸丁酯 | ||||
实施例2的产物 | 2.00 | |||
PARSOL HS | 苯基苯并咪唑磺酸 | 1) | 2.00 | |
KOH 10%sol. | 氢氧化钾 | 4.40 |
操作步骤:
边搅拌边将A)部分加热至85℃。搅拌均匀后,搅拌下添加在75℃预热的B)部分和C)部分至75℃。添加预热到75℃的D)部分(确保Parsol HS已完全溶解,如果残留痕量,则添加少量碱予以中和,直至溶液澄清)。以11000转/分钟的速度均质化30秒。冷至室温。
物理数据:
pH:7.20
粘度(Brookfield RVT,25℃,转子6,10转/分钟):约12350cP
SPF:按Colipa协议进行活体内测试,5个测试对象,LaboratoireDermscan,Lyon Ref.98098(02.98)
供货商:
9)ROCHE VITAMINS LTD,CH-4070 Basel/Switzerland
10)BASF AG,D-67056 Ludwigshafen/Germany
11) NIPA LABORATORIES LTD,Mid Glam.-CF38 2SN/England
12)ISP TECHNOLOGIES INC.,Wayne-NJ 07470/USA
13)GOLDSCHMIDT AG,D-45127/Germany
14)COGNIS,D-40551Düsseldorf/Germany
15) B.F.GOODRICH COMPANY;Cleveland-OH44141/USA
16) UNICHEMA CHEMIE GmbH,D-46446 Emmerich/Germany
Claims (22)
2.权利要求1所述的化合物,其中X为含1至20个碳原子和任选1至10个杂原子,并含有至少一个荷正电或负电荷的基团的烷基、烷芳基或烷基环烷基。
3.权利要求2所述的化合物,其中X为C1-C10亚烷基,该亚烷基任选含有1至10个杂原子并包含至少一个荷正电或负电荷的基团。
4.权利要求1至3中任何一项所述的化合物,其中X含有1至6个杂原子。
5.权利要求4所述的化合物,其中杂原子选自氮原子、氧原子、硫原子和磷原子。
6.权利要求1至5中任何一项所述的化合物,其中荷正电或荷负电的基团带一个正电荷。
7.权利要求6所述的化合物,其中荷正电或荷负电的基团为季铵基团。
8.权利要求7所述的化合物,其中Y为卤素离子。
9.权利要求1至5中任何一项所述的化合物,其中荷正电或荷负电的基团带一个负电荷。
10.权利要求9所述的化合物,其中带一个负电荷的基团选自-COO-、-O-SO3 -和-O-PO3H-。
11.权利要求10所述的化合物,其中Y为碱金属离子、碱土金属离子、三乙醇铵离子、氨基甲基丙醇离子或者缓血酸胺离子。
12.权利要求1至11中任何一项所述的化合物,其中R3和R4基团各自为氢原子。
13.权利要求1至12中任何一项所述的化合物,其中R5和R6基团独立地选自氢原子和C1-C6烷基。
14.权利要求1至13中任何一项所述的化合物,其中R1和R2基团均为氰基。
15.权利要求1所述的化合物,即
16.含有权利要求1至15中任何一项所定义化合物的UV-A遮蔽组合物。
17.权利要求16所述的UV-A遮蔽组合物,该组合物是用来保护皮肤或头发抗UV-A辐照的化妆品组合物。
18.权利要求16或17所述的UV-A遮蔽组合物,该组合物包括一种或多种附加防晒剂,这些防晒剂选自微粒颜料和聚合物类紫外防晒剂。
19.权利要求18所述的UV-A遮蔽组合物,微粒颜料为粒度5nm至200nm的微粒TiO2。
20.权利要求18所述的UV-A遮蔽组合物,其中聚合物类紫外防晒剂为有机硅氧烷。
21.权利要求20所述的UV-A遮蔽组合物,其中有机硅氧烷是含有苯丙二酸酯基的有机硅氧烷。
22.权利要求1至15中任何一项所定义化合物在制备UV-A防晒剂中的用途。
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EP04003294.8 | 2004-02-13 | ||
EP04003294 | 2004-02-13 | ||
PCT/EP2005/001379 WO2005080341A1 (en) | 2004-02-13 | 2005-02-11 | Ionic uv-a sunscreens and compositions containing them |
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CN1918126A CN1918126A (zh) | 2007-02-21 |
CN1918126B true CN1918126B (zh) | 2010-07-21 |
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US (1) | US7897779B2 (zh) |
EP (1) | EP1716117B1 (zh) |
JP (1) | JP5341316B2 (zh) |
KR (1) | KR101182959B1 (zh) |
CN (1) | CN1918126B (zh) |
AT (1) | ATE508116T1 (zh) |
AU (1) | AU2005215881B2 (zh) |
DE (1) | DE602005027811D1 (zh) |
WO (1) | WO2005080341A1 (zh) |
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EP2623094A1 (en) | 2012-02-02 | 2013-08-07 | DSM IP Assets B.V. | Use of an edelweiss extract |
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- 2005-02-11 AT AT05701401T patent/ATE508116T1/de not_active IP Right Cessation
- 2005-02-11 KR KR1020067016292A patent/KR101182959B1/ko not_active IP Right Cessation
- 2005-02-11 DE DE602005027811T patent/DE602005027811D1/de active Active
- 2005-02-11 US US10/589,051 patent/US7897779B2/en not_active Expired - Fee Related
- 2005-02-11 WO PCT/EP2005/001379 patent/WO2005080341A1/en active Application Filing
- 2005-02-11 JP JP2006552555A patent/JP5341316B2/ja not_active Expired - Fee Related
- 2005-02-11 CN CN200580004920XA patent/CN1918126B/zh not_active Expired - Fee Related
- 2005-02-11 AU AU2005215881A patent/AU2005215881B2/en not_active Ceased
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Also Published As
Publication number | Publication date |
---|---|
EP1716117A1 (en) | 2006-11-02 |
AU2005215881B2 (en) | 2010-11-11 |
KR20060123540A (ko) | 2006-12-01 |
AU2005215881A1 (en) | 2005-09-01 |
JP2007523078A (ja) | 2007-08-16 |
EP1716117B1 (en) | 2011-05-04 |
US20070275090A1 (en) | 2007-11-29 |
CN1918126A (zh) | 2007-02-21 |
US7897779B2 (en) | 2011-03-01 |
DE602005027811D1 (de) | 2011-06-16 |
WO2005080341A1 (en) | 2005-09-01 |
JP5341316B2 (ja) | 2013-11-13 |
KR101182959B1 (ko) | 2012-09-18 |
ATE508116T1 (de) | 2011-05-15 |
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