CN1908685A - Substrate detection device and control method therefor - Google Patents

Substrate detection device and control method therefor Download PDF

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Publication number
CN1908685A
CN1908685A CNA2006100079292A CN200610007929A CN1908685A CN 1908685 A CN1908685 A CN 1908685A CN A2006100079292 A CNA2006100079292 A CN A2006100079292A CN 200610007929 A CN200610007929 A CN 200610007929A CN 1908685 A CN1908685 A CN 1908685A
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substrate
detecting unit
supply
stand
discharge
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CN100570381C (en
Inventor
李秀浩
安德烈·尤莎科夫
任洵圭
闵敬善
郑敬锡
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Samsung Electronics Co Ltd
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Samsung Electronics Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0268—Marks, test patterns or identification means for electrical inspection or testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/00584—Control arrangements for automatic analysers
    • G01N35/00722—Communications; Identification
    • G01N35/00732—Identification of carriers, materials or components in automatic analysers
    • G01N2035/00792—Type of components bearing the codes, other than sample carriers
    • G01N2035/00801—Holders for sample carriers, e.g. trays, caroussel, racks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/02—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
    • G01N35/04—Details of the conveyor system
    • G01N2035/0474—Details of actuating means for conveyors or pipettes
    • G01N2035/0475—Details of actuating means for conveyors or pipettes electric, e.g. stepper motor, solenoid

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  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
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  • Pathology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention relates to a substrate detection device and control method therefor. The substrate detection device supplied by the invention includes: a detecting unit for detecting the substrate; a supplying unit disposed in the entrance region of the detecting unit having a plurality of supplying benches and supplying drive division, wherein the plurality of supplying benches supports at least one substrate and provides the detecting unit with the substrates in turn, and the supplying drive division corresponds to the entrance side of the detecting unit and moves a plurality of supplying benches; a discharging unit, mounted in the in the exit region of the detecting unit having a plurality of discharging benches and discharging drive division, wherein a plurality of discharging benches supports at least one substrate discarded from the detecting unit and the discharging drive division corresponds to the exit side of the detecting unit and moves a plurality of discharging benches. Thereby provided is a substrate detection device for detecting the substrate in a fast and simple way and a method thereof.

Description

Substrate detection apparatus and control method thereof
Technical field
The present invention relates to a kind of substrate detection apparatus and control method thereof, relate in particular to the substrate detection apparatus and the control method thereof that can detect substrate more rapidly, simply.
Background technology
Substrate is used for flat display panel (FDP:flat display panel), semiconductor wafer, LCD etc.Substrate by forming signal wire on the predetermined base main body in conjunction with between electron device such as integrated circuit, impedance and switch or the signal wire, thereby make it be electrically connected or transmit signal mutually.This substrate is through reaction process such as etch process, evaporation process.Be shifted into through the substrate of this each operation and be used to detect whether qualified substrate detection apparatus.
The substrate detection apparatus that is used to detect substrate comprises in order to improve the precision that detects substrate: the detecting unit that is used to detect substrate when keeping predetermined vacuum pressure, temperature etc.; Be arranged on the feeding unit and the deliverying unit of detecting unit inlet and outlet, this feeding unit and deliverying unit are kept the processing atmosphere as the predetermined vacuum pressure of detecting unit etc., and to the detecting unit supply and discharge substrate.
The many purposes optical detection apparatus display board transfer device that adopts the stand mode is disclosed in Korea S's publication communique " 10-2004-47062 number (2004.06.05) ".This prior art comprises the guide part that is used to guide display board, can be installed in guide part and suction handle (gripping) portion of vacuum suction display board with transferring.Aforesaid prior art be owing to can avoid the interference of transfer device and down camera and transmission illumination are set simply at string row (in line) above the pick-up unit, thereby can improve the precision of testing result.
But, aforesaid prior art is because the substrate of similar panel is transplanted on pick-up unit successively, and the detection of trend that is maximized by nearest substrate and substrate need be carried out under predetermined vacuum and forms and remove the required time of vacuum etc., it is longer to make substrate be shifted into time of pick-up unit, thereby makes the whole process time elongated and reduce production efficiency.
Summary of the invention
The object of the present invention is to provide a kind of substrate detection apparatus and control method thereof that can more simply, promptly detect substrate.
To achieve these goals, according to the substrate detection apparatus that is used to detect substrate provided by the present invention, it is characterized in that comprising: the detecting unit that is used to detect described substrate; Be arranged on described detecting unit entrance area and have a plurality of supply stands and the feeding unit of supply drive division, these a plurality of supply stands are supported at least one described substrate and supply described substrate successively to described detecting unit that this supply drive division moves a plurality of described supply stands corresponding to the entrance side of described detecting unit; Be arranged on described detecting unit exit region and have a plurality of discharge stands and the deliverying unit of discharge drive division, at least one described substrate that this a plurality of discharge stand support is discharged successively from described detecting unit, this is discharged the outlet side of the corresponding described detecting unit of drive division and moves a plurality of described discharge stands.
At this, described supply drive division is configured such that the entrance side liftable of a plurality of described supply stands corresponding to described detecting unit, and described discharge drive division is configured such that the outlet side liftable of a plurality of described discharge stands corresponding to described detecting unit.
And, the entrance side and the outlet side of described feeding unit and described detecting unit and described deliverying unit can be arranged as a straight line, to be used for by the rectilinear direction support and to transfer described substrate.
And described feeding unit and described deliverying unit can comprise: be used to accommodate the main body of a plurality of described supply stands and described discharge stand, these a plurality of described supply stands and described discharge stand are used to support at least more than one described substrate; By being used for that described main body is separated into the chamber that the wall of levels forms, to be used for accommodating a plurality of described supply stands and described discharge stand mutually isolator; The door that can open and close described chamber and be provided with.
And, can comprise the vacuum drive division, to be used for by closing described door at the described indoor predetermined vacuum pressure of keeping.
And, described feeding unit and described deliverying unit can have the control part that is used to control described supply drive division and described discharge drive division, so that the entrance side of any one the corresponding described detecting unit among a plurality of described supply stand and the described discharge stand and outlet side and supply and discharge described substrate successively.
And described detecting unit can comprise the test section that is used to detect described substrate and be used to support be supplied in the detection stand of the described substrate of described supply stand.
In addition, the control method that is used to detect the substrate detection apparatus of substrate provided by the present invention to achieve these goals is characterized in that comprising step: the detecting unit that is provided for detecting described substrate; Be provided for supporting a plurality of supply stands of at least one described substrate at the entrance area of described detecting unit; Be provided for supporting a plurality of discharge stands of the described substrate of discharging from described detecting unit at the exit region of described detecting unit; The some stands that are arranged on described detecting unit entrance side among a plurality of described supply stands are supplied described substrate to described detecting unit; Detect described substrate; Discharge the described substrate that is detected to the some stands that are arranged on described detecting unit outlet side among a plurality of described discharge stands; With described supply substrate a plurality of described supply stands that after described detecting unit, rise, so that another stand among a plurality of described supply stand is corresponding to the entrance side of described detecting unit; By a plurality of described discharge stands that after the described substrate that described detecting unit is discharged, rise of the some stand supports among a plurality of described discharge stands, so that another stand among a plurality of described discharge stand is corresponding to the outlet side of described detecting unit; Another stand that is arranged on described detecting unit entrance side among a plurality of described supply stands is supplied described substrate to described detecting unit; Detect described substrate; Discharge the described substrate that is detected to another stand that is arranged on described detecting unit outlet side among a plurality of described discharge stands.
At this, can comprise step: main body is set, and this main body is accommodated a plurality of described supply stand and the described discharge stand that is used to support at least more than one described substrate by levels; The chamber that setting forms by the wall that described main body is separated into levels is to be used for accommodating a plurality of described supply stands and described discharge stand mutually isolator; Form and keep predetermined vacuum pressure in described detecting unit and described chamber at least one.
And, can comprise step: door to be opened/closed is set in a plurality of described chambers; Open the door of the described chamber of removing predetermined vacuum pressure in a plurality of described chambers; Described supply stand to described chamber interior is supplied described substrate successively; Described discharge stand by described chamber interior is discharged described substrate successively.
Description of drawings
Fig. 1 is according to sectional side view provided by the present invention;
Fig. 2 a to Fig. 2 d is the sectional side view of expression substrate testing process;
Fig. 3 is the process flow diagram of the control procedure of expression substrate detection apparatus;
Main symbol description: 10 is substrate detection apparatus, 13a, 13b, 13c, 13d, 13e is a substrate, and 20 is detecting unit, and 21 is test section, 23 for detecting stand, 30 is feeding unit, 31a, 31b is the supply stand, and 33 are the supply drive division, 35 is the feeding unit main body, 37a, 37b is a supply room, and 39 is the feeding unit wall, 41a, 41b, 41c, 41d is the supply room door, 50 is deliverying unit, 51a, 51b is for discharging stand, and 53 for discharging drive division, and 55 is the deliverying unit main body, 57a, 57b is for discharging the chamber, 59 is the deliverying unit wall, 61a, 61b, 61c, 61d is for discharging the chamber door, and 70 is the vacuum drive division.
Embodiment
Below, with reference to substrate detection apparatus and the control method thereof of accompanying drawing detailed description as one embodiment of the invention.
The present invention relates to a kind of substrate detection apparatus 10 and control method thereof, shown in Fig. 1 to Fig. 2 d, comprise: the detecting unit 20 that is used to detect substrate (13a to 13e) according to substrate detection apparatus 10 provided by the present invention; Be arranged on detecting unit 20 entrance areas and have the feeding unit 30 of a plurality of supply stand 31a, 31b and supply drive division 33, this a plurality of supply stand 31a, 31b support at least one substrate (13a to 13e) and supply substrate (13a to 13e) successively to detecting unit 20 that this supply drive division 33 is used for moving a plurality of supply stand 31a, 31b corresponding to detecting unit 20 entrance sides; Be arranged on detecting unit 20 exit regions and have the deliverying unit 50 of a plurality of discharge stand 51a, 51b and discharge drive division 53, at least one substrate (13a to 13e) that this a plurality of discharge stand 51a, 51b support is discharged from detecting unit 20 successively, this is discharged drive division 53 and moves a plurality of discharge stand 51a, 51b corresponding to detecting unit 20 outlet sides.And substrate detection apparatus 10 has vacuum drive division 70, makes and keeps predetermined vacuum pressure in chamber 37a, 37b, 57a, the 57b by closing door (41a to 41d, 61a to 61d) being used for.
Substrate detection apparatus 10 substrate (13a to 13e) transferred and the state that stops under whether detect pattern of being formed on the substrate (13a to 13e) etc. by modes such as electron beam scannings qualified.And, for the accuracy of detection that improves substrate detection apparatus 10 can be kept predetermined vacuum pressure by forming the technology atmosphere.
Substrate (13a to 13e) is used for flat display panel (FDP:flat display panel), semiconductor wafer, LCD etc., and passes through the reaction process of etch process, evaporation process etc.Be shifted into the whether qualified substrate detection apparatus 10 of detection through the substrates (13a to 13e) of polytechnic different sizes.
Detecting unit 20 comprises the detection stand 23 that is used to detect the test section 21 of substrate (13a to 13e) and is used for supporting and transferring substrate (13a to 13e) in order to detect substrate (13a to 13e) shown in Fig. 1 and Fig. 2 a to 2d.And detecting unit 20 is connected the vacuum drive division 70 that is used to form predetermined vacuum pressure and can keeps vacuum in order to detect accurately.And the entrance side of detecting unit 20 and outlet side can be provided with detecting gate (not shown) respectively.
Test section 21 is shown in Fig. 1 and Fig. 2 a to 2d, and whether be used to detect substrate (13a to 13e) qualified and can optionally adopt known multiple modes such as electron beam scanning.
Detect stand 23 shown in Fig. 1 and Fig. 2 a to 2d, be used to support and transfer the substrate (13a to 13e) that in detecting unit 20, detects.And, be that benchmark passes through the height that drive division 33,53 is regulated a plurality of supply stand 31a, 31b and discharged stand 51a, 51b with the height that detects stand 23.And, detect stand 23 and discharge substrate (13a to 13e) towards discharging stand 51a, 51b afterwards from supply stand 31a, 31b reception substrate (13a to 13e).And, detect stand 23 and also can have and following supply stand 31a, roller that 31b is identical, motor etc.
Below, though feeding unit 30 and deliverying unit 50 lay respectively at detecting unit 20 entrance sides and outlet side and have difference on the mutual alignments, but, thereby only describe feeding unit 30 in detail and omit its detailed description as required for deliverying unit 50 because mutually structure is identical.
Feeding unit 30 has a plurality of supply stand 31a, the 31b that are arranged on detecting unit 20 entrance areas, to be used for supplying substrate (13a to 13e) successively to detecting unit 20 shown in Fig. 1 and Fig. 2 a to 2d.And feeding unit 30 has the supply drive division 33 that is used for lifting supply stand 31a, 31b shown in Fig. 1 and Fig. 2 a to 2d.And feeding unit 30 can also have the main body 35 of accommodating a plurality of supply stand 31a, 31b with levels, and this a plurality of supply stand 31a, 31b are used to support at least one substrate (13a to 13e).
Supply stand 31a, 31b are used at feeding unit main body 35 support substrates (13a to 13e) shown in Fig. 1 and Fig. 2 a to 2d, and to detecting unit 20 supply substrates (13a to 13e).And supply stand 31a, 31b are set to a plurality of, and in the top of separating and bottom supply room 37a, 37b, be set to respectively by above-below direction a plurality of, thereby can successfully supply substrate (13a to 13e).And supply stand 31a, 31b are adjusted to the detection stand 23 of detecting unit 20 entrance sides by supply drive division 33 and are positioned at identical height, thereby can successfully supply substrate (13a to 13e) successively to detecting stand 23.
And supply stand 31a, 31b not only can form two sections as shown in the Examples in each supply room 37a, 37b, also can form three sections, four sections etc. as required.And supply stand 31a, 31b can comprise roller (not shown), the drive motor (not shown) of revolving force be provided and be used to connect the driving-belt of roller and drive motor or linkage unit such as driving-chain to roller in order to support and transfer substrate (13a to 13e).
Drive division 33,53 can move a plurality of stand 31a, 31b, 51a, 51b corresponding to the entrance side of detecting unit 20 and outlet side shown in Fig. 1 and Fig. 2 a to 2d.And drive division 33,53 comprises and is used for moving the supply drive division 33 of supply stand 31a, 31b and is used for moving the discharge drive division 53 of discharging stand 51a, 51b.And drive division 33,53 is corresponding to the entrance side of detecting unit 20 and outlet side and lifting supply stand 31a, 31b and discharge stand 51a, 51b.And drive division 33,53 can utilize lifting stand 31a, 31b, 51a, 51b such as motor, can also optionally adopt known oil pressure cylinder that can be used for lifting stand 31a, 31b, 51a, 51b etc.And drive division 33,53 can be incorporated into the bottom of main body 35,55.
Thus, drive division 33,53 is by lifting stand 31a, 31b, 51a, 51b and simply, promptly supply and discharge substrate (13a to 13e) successively.
Main body 35,55 is set to accommodate a plurality of supply stand 31a, 31b and a plurality of discharge stand 51a, 51b, and has feeding unit main body 35 and deliverying unit main body 55 shown in Fig. 1 and Fig. 2 a to 2d.And main body 35,55 has chamber 37a, the 37b, 57a, the 57b that are formed by wall 39,59 of the levels of being separated into, and this chamber 37a, 37b, 57a, 57b accommodate a plurality of supply stand 31a, 31b and a plurality of discharge stand 51a, 51b mutually isolator.
Feeding unit main body 35 is accommodated a plurality of supply stand 31a, the 31b that are used to support at least one substrate (13a to 13e) shown in Fig. 1 and Fig. 2 a to 2d.And feeding unit main body 35 has upper chambers 37a, the 57a and bottom compartment 37b, the 57b that are formed by wall 39,59 of the levels of being separated into, to be used for accommodating a plurality of supply stand 31a, 31b mutually isolator.The bottom of feeding unit main body 35 can be in conjunction with supply drive division 33.
Supply room 37a, 37b are shown in Fig. 1 and Fig. 2 a to 2d, have top supply room 37a and bottom supply room 37b in order to accommodate a plurality of supply stand 31a, 31b mutually isolator, this top supply room 37a and bottom supply room 37b are by wall 39 separation that are used for feeding unit main body 35 is separated into levels.And, be provided with supply door to be opened/closed (41a to 41d) among supply room 37a, the 37b, so that substrate (13a to 13e) can pass in and out.And top supply room 37a and bottom supply room 37b can be connected in vacuum drive division 70 and form vacuum, to keep the vacuum pressure identical with the predetermined vacuum pressure of detecting unit 20.And supply room 37a, 37b not only can form two-layerly by above-below direction as shown in the Examples, also can form variforms such as three layers, four layers as required.
Wall 39,59 is used for separating main body 35,55 and forming upper chambers 37a, 57a and bottom compartment 37b, 57b by above-below direction shown in Fig. 1 and Fig. 2 a to 2d.
Therefore, the feeding unit main body 35 and the deliverying unit main body 55 of being separated by wall 39,59 can be carried out special operation.That is, form vacuum among the supply room 37a of top and detect substrate (13a to 13e), and substrate (13a to 13e) may be fed to supply stand 31a, 31b among the supply room 37b of bottom.
Door (41a to 41d, 61a to 61d) can and can open and close to chamber 37a, 37b, 57a, 57b turnover substrate (13a to 13e) shown in Fig. 1 and Fig. 2 a to 2d.
Supply door (41a to 41d) can and can open and close to supply room 37a, 37b turnover substrate (13a to 13e) shown in Fig. 1 and Fig. 2 a to 2d.And supply door (41a to 41d) may comprise control part (not shown), to be used for can controlling its switching when chamber 37a, 37b form predetermined vacuum pressure or turnover substrate (13a to 13e).And supply door (41a to 41d) can optionally adopt oil pressure cylinder, pneumatics cylinder etc. can open and close the device of supply door (41a to 41d).And supply door (41a to 41d) can comprise seal member (not shown) in order to form predetermined vacuum pressure between chamber 37a, 37b.
Discharge stand 51a, 51b and be used to support the substrate (13a to 13e) of discharging, and discharge substrate (13a to 13e) towards the outside of deliverying unit 50 from the detection stand 23 of detecting unit 20.
And supply stand 31a, 31b and discharge stand 51a, 51b make each entrance side of feeding unit 30 and detecting unit 20 and deliverying unit 50 and each outlet side form straight line for according to rectilinear direction support and handover substrate (13a to 13e).
Therefore, supply stand 31a, 31b and discharge stand 51a, 51b with respect to the detection stand 23 of detecting unit 20 and opposed mutually, thereby can transfer substrate (13a to 13e) and reduce the required time of transferring by straight line, and make the labyrinth that causes by direction conversion become simple and can transfer rapidly, thereby reduce financial burden.
Vacuum drive division 70 is shown in Fig. 1 and Fig. 2 a to 2d, door (41a to 41d as chamber 37a, 37b, 57a, 57b, 61a to 61d) under the pent state, can make detecting unit 20 and supply room 37a, 37b and discharge chamber 57a, 57b to form predetermined identical vacuum pressure.And, be provided with control part in the vacuum drive division 70, remove the vacuum of chamber 37a, 37b, 57a, 57b to be used for when substrate (13a to 13e) is finished predetermined technology control vacuum drive division 70.And,, can in supply room 37a, 37b and discharge chamber 57a, 57b and detecting unit 20, vacuum drive division 70 be set respectively in order to form predetermined vacuum as required.And, comprise the pipe arrangement that is connected with chamber 37a, 37b, 57a, 57b and detecting unit 20 respectively, related valves etc. in the vacuum drive division 70.
Control part (not shown) can be controlled supply drive division 33 and discharge drive division 53, can supply and discharge substrate (13a to 13e) with any one stand that is used among a plurality of supply stand 31a, 31b and a plurality of discharge stand 51a, the 51b successively corresponding to the entrance side of detecting unit 20 and outlet side.And control part can control gate (41a to 41d, 61a to 61d) when forming predetermined vacuum pressure or turnover substrate (13a to 13e) in chamber 37a, 37b, 57a, the 57b and make its switching.
In view of the above, with reference to Fig. 2 a to 2d and Fig. 3 the course of work according to substrate detection apparatus 10 provided by the present invention is described.
At first, detecting unit is provided with that the stage (not shown) is provided for detecting the test section 21 of substrate (13a to 13e) and the detection stand 23 of the substrate (13a to 13e) that is used to support supplied, to be used for detecting, supporting and transfer substrate (13a to 13e).Feeding unit and deliverying unit are provided with a plurality of stand 31a that the stage (not shown) is provided for supporting at least one substrate (13a to 13e) in order to supply and discharge substrate (13a to 13e) successively at the entrance area and the exit region of detecting unit 20,31b, 51a, 51b and be used to accommodate a plurality of stand 31a, 31b, 51a, the main body 35 of 51b, 55 and be used in main body 35, form in 55 and can accommodate a plurality of stand 31a mutually isolator, 31b, 51a, the chamber 37a of 51b, 37b, 57a, the wall 39 of 57b, 59.
At first, the substrate testing process among observation upper chambers 37a, the 57a.
Substrate is introduced the stage (S110, S110 ') and is introduced substrate (13a to 13e) successively from the outside to a plurality of supply stand 31a, 31b.At this moment, control part will be arranged on supply room door (41a to 41d) among supply room 37a, the 37b and be controlled to be and open.
Below, label S000 represents the testing process of upper chambers 37a, 57a, the testing process of label S000 ' expression bottom compartment 37b, 57b.That is, S110 represents the substrate introducing stage of upper chambers 37a, and the substrate of S110 ' expression bottom compartment 37b is introduced the stage.
Form vacuum stages (S115, S115 ') and on a plurality of supply stand 31a, 31b, introducing substrate (13a to 13e) if the door (41a to 41d of the 37a of close chamber, 37b, 57a, 57b afterwards, 61a to 61d), then control part (not shown) control vacuum drive division 70 so that supply room 30 and discharging forms the vacuum of being scheduled to identical with detecting unit 20 in the chamber 50.That is, when door 41a, 41b, 61a, the 61b of upper chambers 37a, 57a are closed, then control part control vacuum drive division 70 makes and forms predetermined vacuum pressure among upper chambers 37a, the 57a respectively.Utilize a vacuum drive division 70 also can in detecting unit 20, form predetermined vacuum in this vacuum formation stage (S115).
The supply substrate stage (S120, S120 ') is by the detection stand 23 supply substrates (13a to 13e) of the some stands that are arranged on detecting unit 20 entrance sides among a plurality of supply stand 31a, the 31b to detecting unit 20.
Substrate detection-phase (S125, S125 ') is supported from the substrate (13a to 13e) of supply stand 31a, 31b supply by detecting stand 23, and is detected substrate (13a to 13e) by test section 21.
Substrate is discharged stage (S130, S130 ') among discharging stand 51a, 51b, discharge the substrate (13a to 13e) that is detected to the some stands that are arranged on detecting unit 20 outlet sides, and by discharging the substrate (13a to 13e) that stand 51a, 51b support is discharged.
Supply stand ascent stage (S135, S135 ') afterwards, rise a plurality of supply stand 31a, 31b of supply drive division 33 make another stand among a plurality of supply stand 31a, the 31b corresponding to the entrance side of detecting unit 20 to detecting unit 20 supply substrates (13a to 13e).
Discharge stand ascent stage (S140, S140 ') substrate (13a to 13e) of being discharged from detecting unit 20 by the some stand supports among a plurality of discharge stand 51a, the 51b is discharged rise a plurality of discharge stand 51a, 51b of drive division 53 and is made another stand among a plurality of discharge stand 51a, the 51b corresponding to the outlet side of detecting unit 20 afterwards.
The chamber is finished the stage of recognition (S143, S143 ') and is confirmed whether a substrate (13a to 13e) that is held in upper chambers 37a, 57a supply stand 31a, 31b all is supplied in detecting unit 20 and finishes detection and discharge.To this, do not detect and discharge if finish, then from the described repeatedly process of supply substrate stage (S120) beginning.Detect and discharge if finish, then supply the upper chambers 37a, the 57a that finish substrate (13a to 13e) and carry out different processes with the bottom compartment 37b, the 57b that do not have supply to finish substrate (13a to 13e).That is, though bottom compartment 37b, 57b continue to carry out repeatedly aforesaid process, because upper chambers 37a, 57a carry out another kind of process, thereby the course of work of following explanation upper chambers 37a, 57a.
The chamber Vacuum solutions removes that control part stops the work of vacuum drive division 70 in the stage (S145), and door 41a, the 61b of upper chambers 37a, 57a is controlled to be open.Thus, upper chambers 37a, 57a remove vacuum.
Substrate is introduced the stage (S110 ') and is introduced substrate (13a to 13e) successively from the outside to a plurality of top supply stand 31a.
Discharge the stage (S150) to the substrate of outside and discharge stand 51a from top successively to outside discharge substrate (13a to 13e).
And after finishing the detection of substrate and discharge in bottom compartment 37b, 57b, control part operation drive division 33,53 makes a plurality of stand 31a, 31b, 51a, 51b drop to homeposition, and is controlled to be repeatedly and carries out the above-mentioned stage.
Therefore, according to a plurality of chambers of the present invention, make each chamber carry out independent process by being provided for accommodating a plurality of supply stands and discharging stand; Supply stand and discharge stand by liftably being provided with, thereby can simply, promptly transfer substrate corresponding to detecting unit.And, according to the present invention owing to press straight line handover substrate, thereby avoided the substrate detection apparatus complex structure, reduced financial burden.
In sum, according to the invention provides the substrate detection apparatus and the control method thereof that can more simply, promptly detect substrate.

Claims (10)

1, a kind of substrate detection apparatus that is used to detect substrate is characterized in that comprising:
Be used to detect the detecting unit of described substrate;
Be arranged on described detecting unit entrance area and have a plurality of supply stands and the feeding unit of supply drive division, these a plurality of supply stands are supported at least one described substrate and supply described substrate successively to described detecting unit that this supply drive division moves a plurality of described supply stands corresponding to the entrance side of described detecting unit;
Be arranged on described detecting unit exit region and have a plurality of discharge stands and the deliverying unit of discharge drive division, at least one described substrate that this a plurality of discharge stand support is discharged successively from described detecting unit, this is discharged the outlet side of the corresponding described detecting unit of drive division and moves a plurality of described discharge stands.
2, substrate detection apparatus according to claim 1, it is characterized in that described supply drive division is configured such that the entrance side liftable of a plurality of described supply stands corresponding to described detecting unit, described discharge drive division be configured such that a plurality of described discharge stands corresponding to the outlet side of described detecting unit liftable.
3, substrate detection apparatus according to claim 1 is characterized in that each entrance side and each outlet side of described feeding unit and described detecting unit and described deliverying unit are arranged as a straight line, to be used for by the rectilinear direction support and to transfer described substrate.
4, substrate detection apparatus according to claim 1 is characterized in that described feeding unit and described deliverying unit comprise:
Be used to accommodate the main body of a plurality of described supply stands and a plurality of described discharge stands, these a plurality of described supply stands and a plurality of described discharge stand are supported at least more than one described substrate;
By the chamber that is used for described main body is separated into the wall of levels and forms, to be used for accommodating a plurality of described supply stands and a plurality of described discharge stand mutually isolator; And,
The door that can open and close described chamber and be provided with.
5, substrate detection apparatus according to claim 4 is characterized in that comprising the vacuum drive division, to be used for by closing described door at the described indoor predetermined vacuum pressure of keeping.
6, substrate detection apparatus according to claim 2, it is characterized in that described feeding unit and described deliverying unit have the control part that is used to control described supply drive division and described discharge drive division, so that the entrance side of any one the corresponding described detecting unit among a plurality of described supply stand and a plurality of described discharge stand and outlet side and supply and discharge described substrate successively.
7, substrate detection apparatus according to claim 1 is characterized in that described detecting unit comprises the test section that is used to detect described substrate and is used to support be supplied in the detection stand of the described substrate of described supply stand.
8, a kind of control method that is used to detect the substrate detection apparatus of substrate is characterized in that comprising step:
Be provided for detecting the detecting unit of described substrate;
Be provided for supporting a plurality of supply stands of at least one described substrate at the entrance area of described detecting unit;
Be provided for supporting a plurality of discharge stands of the described substrate of discharging from described detecting unit at the exit region of described detecting unit;
The some stands that are arranged on described detecting unit entrance side among a plurality of described supply stands are supplied described substrate to described detecting unit;
Detect described substrate;
Discharge the described substrate that is detected to the some stands that are arranged on described detecting unit outlet side among a plurality of described discharge stands;
With described supply substrate a plurality of described supply stands that after described detecting unit, rise, so that another stand among a plurality of described supply stand is corresponding to the entrance side of described detecting unit;
By a plurality of described discharge stands that after the described substrate that described detecting unit is discharged, rise of the some stand supports among a plurality of described discharge stands, so that another stand among a plurality of described discharge stand is corresponding to the outlet side of described detecting unit;
Another stand that is arranged on described detecting unit entrance side among a plurality of described supply stands is supplied described substrate to described detecting unit;
Detect described substrate;
Discharge the described substrate that is detected to another stand that is arranged on described detecting unit outlet side among a plurality of described discharge stands.
9, the control method of substrate detection apparatus according to claim 8 is characterized in that comprising step:
Main body is set, and this main body is accommodated a plurality of described supply stand and a plurality of described discharge stand that is used to support at least more than one described substrate by levels;
The chamber that setting forms by the wall that described main body is separated into levels is to be used for accommodating a plurality of described supply stands and a plurality of described discharge stand mutually isolator;
Form and keep predetermined vacuum pressure in described detecting unit and described chamber at least one.
10, the control method of substrate detection apparatus according to claim 8 is characterized in that comprising step:
Door to be opened/closed is set in a plurality of described chambers;
Open the door of the described chamber of removing predetermined vacuum pressure in a plurality of described chambers;
Described supply stand to described chamber interior is supplied described substrate successively;
Described discharge stand by described chamber interior is discharged described substrate successively.
CNB2006100079292A 2005-08-05 2006-02-21 Substrate detection apparatus and control method thereof Active CN100570381C (en)

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