CN1828206B - Centrifugal drying device - Google Patents
Centrifugal drying device Download PDFInfo
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- CN1828206B CN1828206B CN200610003119XA CN200610003119A CN1828206B CN 1828206 B CN1828206 B CN 1828206B CN 200610003119X A CN200610003119X A CN 200610003119XA CN 200610003119 A CN200610003119 A CN 200610003119A CN 1828206 B CN1828206 B CN 1828206B
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Abstract
The invention provides a centrifugal drying device, which can reduce vibration, prevent object from being destroyed and increase the drying effect for object. Said device comprises: rotating platform (13) revolving around rotation shaft (12) in container; two pairs of supporting rack (15A), (15B), (16A) and (16B) of storing base plate (18) installed in space with the same angle in position symmetrical to rotation shaft on rotating platform; upper balance device (27A) and lower balance device (27B) of counterweight (33), which are installed with respect to supporting rack (15A) and (15B) in side lower of container and can move to orthogonal direction of rotation shaft; upper balance device (28A) and lower balance device (28B) of counterweight (38), which are installed with respect to supporting rack (16A) and (16B) in side lower of container and can move to orthogonal direction of rotation shaft; the base plate is dried through the rotation of rotating platform.
Description
Technical field
The present invention relates to utilize centrifugal force that clean back moisture attached to object being treated surfaces such as substrates is dispersed, thereby to the withering centrifugal drying device of above-mentioned object being treated.
Background technology
As utilizing centrifugal force that the moisture attached to substrate surface is dispersed and the example of withering centrifugal drying device, patent documentation 1 is arranged.This centrifugal drying device comprises: be contained in the container and the turntable that rotates around the shaft; Be arranged on the turntable position respectively, and be used for the pair of supporting (cradle) of supporting substrate about the rotating shaft symmetry; Be arranged at about rotating shaft symmetry and with a pair of balanced controls portion of the position of above-mentioned pair of supporting quadrature.
If the number of substrates of taking in the pair of supporting is identical, the turntable that then comprises bracing frame is realized weight balancing when rotated easily, but owing to needing to remove reasons such as bad substrate, the situation that the number of substrates that can occur taking in the pair of supporting is different in the manufacturing engineering.In this case, the centrifugal drying device of patent documentation 1 will detect the number of substrates of being taken in the pair of supporting, and counterweight (weight) position of changing a pair of balanced controls portion according to the quantity difference, thereby realization comprises the weight balancing of the turntable of bracing frame, vibration and noise when the reduction turntable rotates at a high speed.
No. 3129895 communique of [patent documentation 1] Japan Patent
Summary of the invention
But for the centrifugal drying device of above-mentioned patent documentation 1, owing to only disposed pair of supporting on the turntable, the number of substrates that the primary drying engineering can be handled seldom can not be carried out high efficiency dry the processing.
The present invention considers the problems referred to above and proposes that purpose provides and reduces vibration and prevent to damage object being treated, improves the centrifugal drying device to the withering disposal ability of object being treated simultaneously.
According to the centrifugal drying device of first aspect present invention, it is characterized in that comprising: be contained in the container and the turntable that rotates around the shaft; About rotating shaft symmetric position configuration, every pair be disposed on the turntable with the equal angles spacing and hold the many of object being treated respectively holding parts; At described outside of containers and be arranged at epimere support component in the described rotating shaft; Be positioned at the bottom of described epimere support component and be arranged at hypomere support component in the described rotating shaft; On described epimere support component, hold the corresponding epimere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with the rotating shaft quadrature with every pair; On described hypomere support component, hold the corresponding hypomere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature with every pair; Wherein, that make the centripetal force act on the described centripetal force that holds parts and the counterweight that acts on described hypomere balanced controls portion and equal to act on the centripetal force of the counterweight of described epimere balanced controls, by the rotation of above-mentioned turntable, carry out the drying processing to being contained in the described object being treated that holds parts.
According to the centrifugal drying device of second aspect present invention, it is characterized in that comprising: be contained in the container and the turntable that rotates around the shaft; On described turntable about the position configuration of described rotating shaft symmetry, and hold a pair of parts that hold of object being treated respectively; At described outside of containers and be arranged at epimere support component in the described rotating shaft; Be positioned at the bottom of described epimere support component and be arranged at hypomere support component in the described rotating shaft; On described epimere support component, hold the corresponding epimere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature with every pair; On described hypomere support component with this to holding the corresponding hypomere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature; Wherein, that make the centripetal force act on the described centripetal force that holds parts and the counterweight that acts on described hypomere balanced controls portion and equal to act on the centripetal force of the counterweight of described epimere balanced controls, by the rotation of described turntable, carry out the drying processing to being contained in the described object being treated that holds parts.
Centrifugal drying device according to third aspect present invention is characterized in that, for according to the described the present invention of first aspect present invention, the described parts that hold have 2 pairs, about the position of rotating shaft symmetry orthogonal configuration respectively.
Centrifugal drying device according to fourth aspect present invention, it is characterized in that, for according to the described the present invention of first aspect present invention, the counterweight of described epimere balanced controls portion be arranged in corresponding with it relatively a pair of hold that parts hold more object being treated hold parts about the opposite side of rotating shaft, in addition, the counterweight of hypomere balanced controls portion then be positioned at hold more object being treated relatively hold parts about the identical side of rotating shaft.
Centrifugal drying device of the present invention according to fifth aspect present invention, it is characterized in that, for according to the described the present invention of first aspect present invention, the counterweight of described epimere balanced controls portion is arranged at the rotating shaft both sides, the corresponding a pair of counterweight that holds the parts homonymy that holds more object being treated in the parts that holds is positioned near rotating shaft position, in addition, the counterweight of hypomere balanced controls portion is arranged at the rotating shaft both sides, and the corresponding a pair of counterweight that holds the parts opposite side that holds more object being treated in the parts that holds is positioned near rotating shaft position.
Centrifugal drying device of the present invention according to sixth aspect present invention, it is characterized in that, for according to the described the present invention of first aspect present invention, described epimere balanced controls portion and described hypomere balanced controls portion are fixed in counterweight on the ball screw (ball screw) that extends with the rotating shaft orthogonal direction, on the assigned position of turntable rotation, combine rotation with the counterweight drive division by ball screw and drive, make above-mentioned counterweight be positioned at desired location.
Centrifugal drying device of the present invention according to seventh aspect present invention, it is characterized in that, for according to first aspect present invention to according to any described the present invention in the sixth aspect present invention, the a pair of quantity that holds the object being treated that parts hold, on the assigned position that turntable rotates, detector by the outside of containers configuration detects, and it is poor according to these a pair of quantity of object being treated that hold on the parts, adjust and a pair of position that holds the counterweight of corresponding described epimere balanced controls portion of parts and described hypomere balanced controls portion, be located at desired location.
The invention effect
According to first aspect present invention to according to the described invention of sixth aspect present invention, dispose one or more pairs of container (chamber) outsides that hold the turntable of parts accommodating, along rotating shaft the multistage support component is set in above-mentioned rotating shaft axially, on each support component, dispose balanced controls portion with counterweight, thereby can set the weight balancing of the rotor shaft direction of the weight balancing of turntable diameter direction and turntable well, therefore the vibration in the time of can reducing dry the processing prevents to damage holding the object being treated that parts hold.
In addition, many for being provided with on the turntable to holding the situation of parts, by the rotation of turntable, can both carry out drying to a plurality of object being treateds when primary drying is handled and handle, improved disposal ability greatly.
Because balanced controls portion is disposed at the outside of containers of accommodating turntable, the dust that therefore above-mentioned balanced controls portion produces can not enter in the container, thereby can drop to minimum to the influence that holds the object being treated that parts hold of turntable in the container dust.
According to the described invention of seventh aspect present invention, the a pair of quantity that holds the object being treated that parts hold will be detected by the detector of outside of containers configuration, and it is poor according to the quantity of object being treated, the counterweight of adjusting balanced controls portion is positioned at desired location, thereby the drying of carrying out object being treated by the rotation of turntable is handled, and can finish automatically by single device from the dry a series of processing procedures handled of detecting of object being treated quantity.
Description of drawings
Fig. 1 is the simple side schematic view of an embodiment of centrifugal drying device of the present invention.
Fig. 2 is the stereogram of major part of the centrifugal drying device of presentation graphs 1.
Fig. 3 is the III direction of arrow vertical view of Fig. 1.
Fig. 4 is the IV direction of arrow vertical view of Fig. 1.
Fig. 5 is the number detector schematic diagram with optical pickocff shown in Figure 1, (A) is front schematic view, (B) is side schematic view.
Fig. 6 (A) is the side schematic view of a pair of substrate box, epimere balanced controls portion and the hypomere balanced controls portion of Fig. 1, (B) is the relevant form of quantity difference with the counterweight position relation of epimere and hypomere balanced controls portion of substrate in the substrate box in the expression pair of supporting.
Fig. 7 is the centrifugal drying device part workflow diagram of Fig. 1.
Fig. 8 is the flow chart of the centrifugal drying device work remainder of Fig. 1.
Fig. 9 (A) is the side schematic view of a pair of substrate box in another embodiment of centrifugal drying device of the present invention, epimere balanced controls portion and hypomere balanced controls portion; (B) be for another embodiment shown in Fig. 9 (A), represent the relevant form of quantity difference with the counterweight position relation of epimere and hypomere balanced controls portion of substrate in the substrate box in the pair of supporting.
Symbol description
10: centrifugal drying device 11: container
12: rotating shaft 13: turntable
14: balancing unit 15A, 15B: bracing frame (holding parts)
16A, 16B: bracing frame (holding parts) 17: substrate box
18: substrate (object being treated) 25: epimere support component
26: hypomere support component 27A: epimere balanced controls portion
27B: the hypomere balanced controls 28A of portion: epimere balanced controls portion
28B: hypomere balanced controls portion 32,37: ball screw
33,38: counterweight 39: the counterweight drive division
47: the number detector
The specific embodiment
With reference to the accompanying drawings, best mode for carrying out the invention is described.
Fig. 1 is the simple side schematic view of the embodiment of centrifugal drying device that the present invention relates to.Fig. 2 is the stereogram of major part of the centrifugal drying device of Fig. 1.Fig. 3 is an III direction of arrow vertical view among Fig. 1.
Fig. 1～centrifugal drying device 10 shown in Figure 3 has the turntable 13 of the 12 rotation drivings around the shaft of accommodating in the container 11 and the balancing unit 14 of container 11 belows configuration etc., for as the substrate 18 that holds in the substrate box 17 that holds respectively in bracing frame 15A, 15B that parts are arranged on turntable 13,16A, the 16B, rotate the centrifugal action that produces at a high speed by turntable 13 moisture is dispersed, carry out drying and handle.Here, aforesaid substrate 18 is object being treateds such as semiconductor substrate (silicon chip) or glass substrate.
As shown in Figure 2, aforesaid substrate box 17 is parts that a plurality of substrate 18 parallel equidistant placements are accommodated, and can hold 25 pieces of substrates 18 at most.Bracing frame 15A, the 15B, 16A and the 16B that hold aforesaid substrate box 17 as shown in Figure 3, on turntable 13 about rotating shaft 12 symmetric positions, 2 pairs of orthogonal configuration respectively.Promptly, on turntable 13, the 1 couple of bracing frame 15A and 15B are configured in the position about rotating shaft 12 symmetries, another to bracing frame 16A and 16B be configured in about the position of rotating shaft 12 symmetries and with the orientation quadrature of bracing frame 15A and 15B.
Each bracing frame 15A, 15B, 16A, 16B such as Fig. 1 and shown in Figure 3, utilize central support shaft 24 center support on turntable 13, the interarea of the substrate 18 that substrate box 17 is accommodated, utilize cylinder drive units such as (cylinder) (not diagram), can 90 degree be arranged on rotationally with the rotating shaft 12 of turntable 13 almost quadrature fixed position α and with rotating shaft 12 parallel the moving into of turntable 13/take out of between the β of position.Bracing frame 15A, 15B, 16A and 16B be set in when moving into or take out of substrate box 17 and move into/take out of position β, then be set in fixed position α in the time beyond moving into/taking out of (when comprising dry the processing).In the said fixing position alpha, substrate 18 can dispose with level.
As Fig. 1, Fig. 2 and shown in Figure 4, above-mentioned balancing unit 14 has outside container 11 side-lower along 2 sections support components (epimere support component 25, hypomere support component 26) that are arranged at rotating shaft 12 of branch axial separated by a distance of rotating shaft 12; The balanced controls portion (epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, the epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion) that is supported by epimere support component 25 and hypomere support component 26 etc.
As shown in Figure 2, epimere support component 25 and hypomere support component 26 are fixed in rotating shaft 12 by the support frame 29 of orthogonal configuration and 30 cross section, and support frame 29 and 30 both ends connect by support arm 31.
The epimere balanced controls 27A of portion is disposed at epimere support component 25 along support frame 29, and the epimere balanced controls 28A of portion is along support frame 30 and the epimere balanced controls 27A of portion orthogonal configuration simultaneously.In addition, the hypomere balanced controls 27B of portion is disposed at hypomere support component 26 along support frame 29, and the hypomere balanced controls 28B of portion is along support frame 30 and the epimere balanced controls 28A of portion orthogonal configuration simultaneously.Corresponding pair of supporting 15A of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion and 15B configuration, in addition, corresponding pair of supporting 16A of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion and 16B configuration.
Epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion are individually fixed in counterweight 33 in the both sides of support frame 29 along 2 ball screws 32 that extend with rotating shaft 12 orthogonal directions.By the rotation of ball screw 32, counterweight 33 can move to the direction with rotating shaft 12 quadratures.The supported framework 29 in the two ends of ball screw 32 supports and can freely rotate, and an end of ball screw 32 combines with driven gear 34.These driven gears 34 are connected with the driven wheel 35 that possesses lock hole 36.
The epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion avoids ball screw 32 in the both sides of support frame 30 and support frame 29 is arranged at upper-lower position is individually fixed in counterweight 38 along 2 ball screws 37 that extend with rotating shaft 12 orthogonal directions.By the rotation of ball screw 37, counterweight 38 can move to the direction with rotating shaft 12 quadratures.The supported framework 30 in the two ends of ball screw 37 supports and can freely rotate, and an end of ball screw 37 combines with driven gear 34.These driven gears 34 are connected with driven wheel 35.
The ball screw 37 of the ball screw 32 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion and the epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion, the assigned position that rotates at turntable 13 drives by 39 rotations of counterweight drive division.Promptly, as shown in Figure 1, counterweight drive division 39 with the same vertical line of framework 23 on be set to 2 positions up and down.
As shown in Figure 4, above-mentioned counterweight drive division 39 has been installed the whirligig (revolver) 42 of (the lock pin) 41 that have lock pin on the motor shaft (motor shaft) of drive motors 40 (not having diagram), thereby drive motors 40 is arranged on the base station 44 by slider (slider) 43.Base station 44 is provided with cylinder 45, the moving of the bar (rod) by cylinder 45, and slider 43 relative base stations 44 move back and forth, and drive motors 40 is advanced and retreat.Advance and retreat by drive motors 40 move, the lock pin 41 of whirligig 42 and lock hole 36 interlocks of the driven wheel 35 on the epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion and epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion, under this state, by starting drive motors 40, swing roller screw rod 32,37.
Above-mentioned drive motors 40 can be stepper motor (stepper motor), and the distance of ball screw 32,37 as benchmark, is made ball screw 32,37 forward or reverse, thereby makes counterweight 33,38 be positioned at desired location (back narration).
Shown in Fig. 6 (A), the counterweight 33 of the epimere balanced controls 27A of portion, in corresponding pair of supporting 15A and 15B,, hold the bracing frame 15A of more substrate 18 or the opposite side that 15B (being bracing frame 15A among Fig. 6) is positioned at rotating shaft 12 relatively by substrate fixer (holder) 17.In addition, the counterweight 33 of the hypomere balanced controls 27B of portion in corresponding pair of supporting 15A and 15B, by substrate box 17, holds the bracing frame 15A of more substrate 18 or the same side that 15B (being bracing frame 15A among Fig. 6) is positioned at rotating shaft 12 relatively.
In like manner, the counterweight 38 of the epimere balanced controls 28A of portion, corresponding another to bracing frame 16A and 16B in, by substrate box 17, hold the bracing frame 16A of more substrate 18 or the opposite side that 16B (being bracing frame 16A among Fig. 6) is positioned at rotating shaft 12 relatively.In addition, the counterweight 38 of the hypomere balanced controls 28B of portion, corresponding another to bracing frame 16A and 16B in, by substrate box 17, hold the bracing frame 16A of more substrate 18 or the same side that 16B (being bracing frame 15A among Fig. 6) is positioned at rotating shaft 12 relatively.
As shown in Figure 2, be contained in pair of supporting 15A and 15B and another number respectively,, do not have 2 number detectors 47 of illustrated chassis configuration to detect towards container 11 outsides by assigned position in turntable 13 rotations to the substrate 18 of bracing frame 16A and 16B.One of them number detector 47 be arranged at counterweight drive division 39 directly over the position.As shown in Figure 5, this number detector 47 has been fixed nut (nut block) 50 on the ball screw 49 that sensing motor (sensor motor) 48 drives, optical sensor (photo sensor) 51 has been installed on the nut 50.Start by sensing motor 48, optical sensor 51 moves along the placement direction that is contained in the substrate 18 of bracing frame 15A, 15B, 16A, 16B by substrate fixer 17 by ball screw 49 and nut 50, detects substrate 18 numbers in each substrate fixer 17.
As mentioned above, by substrate 18 numbers in number detector 47 detected pair of supporting 15A and the 15B, calculate number poor of the substrate 18 in pair of supporting 15A and the 15B, and, utilize relevant form (back detailed description) to determine and this position (above-mentioned desired location) to the counterweight 33 of bracing frame 15A and corresponding epimere balanced controls 27A of portion of 15B and the hypomere balanced controls 27B of portion based on this difference.In like manner, by number detector 47 detected another to 18 numbers of the substrate in bracing frame 16A and the 16B, calculate another poor to the number of the substrate in bracing frame 16A and the 16B 18, and, utilize relevant form to determine and another position (above-mentioned desired location) to the counterweight 38 of bracing frame 16A and corresponding epimere balanced controls 28A of portion of 16B and the hypomere balanced controls 28B of portion based on this difference.
Above-mentioned relevant form is shown in Fig. 6 (B), the position relation of the substrate 18 number differences of demonstration pair of supporting 15A and 15B (or another is to bracing frame 16A and 16B) and the counterweight 33 (or counterweight 38 of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion) of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, the position of counterweight 33 (or counterweight 38) serves as the zero mark that carries out with rotating shaft 12 positions.By the epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion of pair of supporting 15A and 15B correspondence, describe the computation sequence of relevant form among Fig. 6 (B) in detail.With another to bracing frame 16A and corresponding epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion of 16B, situation is identical.
For rotating shaft 12 is rotated under the situation that does not have vibration, act on the bracing frame 15A that holds substrate 18 and the centripetal force of 15B and must equate with the centripetal force of the counterweight 33 that acts on the epimere balanced controls 27A of portion with the centripetal force sum of the counterweight 33 that acts on the hypomere balanced controls 27B of portion.Here, centripetal force F is F=m r ω
2(m: quality, r: radius, ω: angular speed), owing to only consider the rotation of a rotating shaft 12, ω
2Identical, therefore can omit.Therefore, 12 moment is around the shaft compared, and be that the moment (moment) of the bracing frame 15A of fulcrum and 15B and the counterweight 33 of the hypomere balanced controls 27B of portion is compared and got final product with the counterweight 33 of the epimere balanced controls 27A of portion.
Here, establish the bracing frame 15A that holds substrate 18 and the weight of 15B and be respectively M
W1(substrate number: W1), M
W2(the substrate number: W2), bracing frame 15A, 15B are L from the distance of rotating shaft 12, and the weight of the counterweight 33 of the epimere balanced controls 27A of portion is A, and the counterweight 33 of the epimere balanced controls 27A of portion is L from the distance of rotating shaft 12
A, the weight of the counterweight 33 of the hypomere balanced controls 27B of portion is B, the counterweight 33 of the hypomere balanced controls 27B of portion is L from the distance of rotating shaft 12
B, the ball screw 32 of the epimere balanced controls 27A of portion is H to the distance of turntable 13 bottoms 19, the ball screw 32 of the epimere balanced controls 27A of portion is H to the distance of the hypomere balanced controls 27B of portion ball screw 32
W, above-mentioned like this 2 formulas can be write as
(M
W1·L-M
W2·L)+B·L
B＝A·L
A ………(1)
H(M
W1·L-M
W2·L)＝H
W·B·L
B ………(2)
If A=M, B=m, formula (1), formula (2) become respectively
L(M
W1-M
W2)+m·L
B＝M·L
A ………(3)
H(M
W1-M
W2)L＝H
W·m·L
B ………(4)
For the more situation of substrate 18 numbers among the bracing frame 15A that holds substrate 18, consider the movable distance (0≤L of the counterweight 33 of the epimere balanced controls 27A of portion, the hypomere balanced controls 27B of portion
A≤ 200mm, 0≤L
B≤ 200mm), obtain the weight of the counterweight 33 of the epimere balanced controls 27A of portion, the hypomere balanced controls 27B of portion.
At first, get by formula (4)
0≤L
B＝(M
W1-M
W2)H·L/(H
W·m)≤200……(5)
Get by formula (3) again
0≤L
A＝(M
W1-M
W2)L/M+m·L
B/M≤200……(6)
Substitution formula (5), the cancellation distance L
B, obtain
(M
W1-M
W2)·(H
W+H)·L/H
W≤200M ………(7)
Here, H=290mm, H
W=300mm, L=197.5mm, the weight of substrate 18 is 640g/25 piece.In addition, the situation that condition is the harshest, promptly the number difference of the substrate 18 in bracing frame 15A and the 15B is 25 o'clock, M
W1-M
W2=640g, therefore
Draw m 〉=0.61kg by formula (5),
Draw M 〉=1.24kg by formula (7).
Therefore, when the weight of the counterweight 33 of the epimere balanced controls 27A of portion is the weight of the counterweight 33 of M=1.3Kg, the hypomere balanced controls 27B of portion when being m=0.65Kg, can access the relevant form shown in Fig. 6 (B).As mentioned above, if the weight of bracing frame 15A, 15B when holding maximum substrate 18,16A, 16B is as a reference value, the weight of the counterweight 38 of the counterweight 33 of the epimere balanced controls 27A of portion and the epimere balanced controls 28A of portion is set at 2 times of a reference value approximately, and the weight of the counterweight 38 of the counterweight 33 of the hypomere balanced controls 27B of portion and the hypomere balanced controls 28B of portion is set at a reference value and equates substantially.
Below, by Fig. 7 and Fig. 8 the working condition of centrifugal drying device 10 is described.
The substrate box 17 that utilizes transfer robot etc. will take in substrate 18 is moved into (S1) among pair of supporting 15A and the 15B.Then, revolving-turret 13 lays respectively at number detector 47 (S2) with pair of supporting 15A and 15B.
After this, start the cylinder 45 of counterweight drive division 39, the lock pin 41 of whirligig 42 is embedded the lock hole 36 of the driven wheel 35 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, in conjunction with whirligig 42 and driven wheel 35 (S3).Then, by substrate 18 numbers (S4) in the substrate box 17 of number detector 47 detection pair of supporting 15A and 15B.
The number of the substrate 18 in the pair of supporting 15A that detects according to number detector 47 and each substrate box 17 of 15B is poor, utilize the relevant form of Fig. 6 (B), with rotating shaft 12 positions is benchmark (position 0), determines the amount of movement (S5) of the counterweight 33 of epimere balanced controls portion 27A corresponding with bracing frame 15A and 15B and the hypomere balanced controls 27B of portion.
Then, the drive motors 40 of counterweight drive division 39 is just being changeed or reverse, the counterweight 33 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion is moved to (S6) till the desired location of being determined by relevant form.Behind the counterweight 33 of mobile epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, start the cylinder 45 of counterweight drive division 39, the whirligig 42 of this counterweight driver 39 is separated (S7) with the driven wheel 35 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion.
Then, turntable 13 revolved turn 90 degrees (S8), the substrate box 17 that utilizes transfer robot etc. will take in substrate 18 is moved into another to bracing frame 16A and 16B (S9).After this, start the cylinder 45 of counterweight drive division 39, the lock pin 41 of whirligig 42 is embedded the lock hole 36 of the driven wheel 35 of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion, in conjunction with whirligig 42 and driven wheel 35 (S10).
Then, by substrate 18 numbers (S11) in the substrate box 17 of number detector 47 detection pair of supporting 16A and 16B.The number of the substrate 18 in the pair of supporting 16A that is detected by number detector 47 and each substrate box 17 of 16B is poor, utilize the relevant form of Fig. 6 (B), with rotating shaft 12 positions is benchmark (position 0), determines the amount of movement (S12) of the counterweight 38 of epimere balanced controls portion 28A corresponding with bracing frame 16A and 16B and the hypomere balanced controls 28B of portion.
After this, the drive motors 40 of counterweight drive division 39 is just being changeed or reverse, the counterweight 38 of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion is moved to (S13) till the desired location of being determined by relevant form.Behind the counterweight 38 of mobile epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion, start the cylinder 45 of counterweight drive division 39, the whirligig 42 of this counterweight driver 39 is separated (S14) with the driven wheel 35 of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion.
Then, high speed revolving-turret 13 disperses bracing frame 15A, 15B, 16A, 16B respectively by the moisture that adheres on the substrate 18 that substrate box 17 is taken in separately, substrate 18 is carried out drying handle (815).Behind turntable 13 beginnings rotation process at a high speed certain hour, stop the rotation (S16) of turntable 13, the substrate box 17 of having taken in substrate 18 is taken out of (S17) from bracing frame 15A, 15B, 16A, 16B, finish dry the processing.
By above structure, above-mentioned embodiment can reach the effect of following (1)～(4).
(1) owing to disposed pair of supporting 15A and 15B and another outer side-lower holding to the container 11 of the turntable 13 of bracing frame 16A and 16B, epimere balanced controls portion 27A with counterweight 33 and the hypomere balanced controls portion 27B corresponding have been disposed with pair of supporting 15A and 15B, in addition, disposed a pair of with another to bracing frame 16A and corresponding epimere balanced controls 28A of portion with counterweight 38 and the hypomere balanced controls 28B of portion of 16B, so can set the weight balancing of turntable 13 diametric weight balancings and turntable 13 rotating shafts 12 directions well, vibration in the time of can reducing dry the processing prevents to be contained in bracing frame 15A, 15B, 16A, the damage of the substrate 18 of 16B.
(2) owing to be provided with 2 pairs of bracing frames (bracing frame 15A and 15B, bracing frame 16A and 16B) on the turntable 13, thus the rotation by turntable 13, when primary drying is handled, can dry a plurality of substrates 18, improved disposal ability greatly.
(3) because balancing unit 14 (epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, the epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion) is configured in the outer side-lower of the container 11 of accommodating turntable 13, so the dust that balancing unit 14 produces can not enter in the container 11, thereby the influence of the substrate 18 that dust can be held bracing frame 15A, 15B, 16A, the 16B of turntables 13 in the container 11 drops to minimum.
(4) be contained in pair of supporting 15A and 15B and another number to the substrate 18 of bracing frame 16A and 16B, number detector 47 by the configuration of container 11 outsides detects, number according to these substrates 18 is poor, the position of the counterweight 38 of the position of the counterweight 33 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion and the epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion lays respectively at desired location, rotation by turntable 13, carrying out the drying of substrate 18 handles, therefore from the dry a series of processing procedures handled of detecting of substrate 18 numbers, can carry out automatically by single centrifugal drying device 10.
Fig. 9 (A) is the side schematic view of a pair of substrate box in another embodiment of centrifugal drying device of the present invention, epimere balanced controls portion and hypomere balanced controls portion.Fig. 9 (B) is for another embodiment shown in Fig. 9 (A), shows the relevant form of quantity difference with the counterweight position relation of epimere and hypomere balanced controls portion of substrate in the substrate box in the pair of supporting.For another embodiment, the part identical with first embodiment adopts identical symbol, and omits its explanation.
Another embodiment and the 1st embodiment difference are, for balancing unit 14, the counterweight 33 of the epimere balanced controls 27A of portion is arranged at both sides about rotating shaft 12, among the pair of supporting 15A and 15B corresponding, be set in position (distance L near rotating shaft 12 with the counterweight 33 of the bracing frame 15A that holds more substrate 18 or 15B (being 15A among Fig. 9) homonymy with it
AA), in addition, the counterweight 33 of the hypomere balanced controls 27B of portion is arranged at both sides about rotating shaft 12, among the pair of supporting 15A and 15B corresponding with it, is set in position (distance L near rotating shaft 12 with the counterweight 33 of the bracing frame 15A that holds more substrate 18 or 15B (being 15A among Fig. 9) opposition side
BB).
Moreover, the counterweight 38 of the epimere balanced controls 28A of portion is arranged at both sides about rotating shaft 12, another corresponding with it be among bracing frame 16A and the 16B, is set in position (distance L near rotating shaft 12 with the counterweight 38 of bracing frame 16A that holds more substrate 18 or 16B (being 16A among Fig. 9) homonymy
AA), in addition, the counterweight 38 of the hypomere balanced controls 28B of portion is arranged at both sides about rotating shaft 12, among the pair of supporting 16A and 16B corresponding with it, is set in position (distance L near rotating shaft 12 with the counterweight 38 of the bracing frame 16A that holds more substrate 18 or 16B (being 16A among Fig. 9) opposition side
BB), this point is also different with above-mentioned first embodiment.
For another kind of embodiment, counterweight 33 and 38 movable distance (L
A, L
AA, L
B, L
BB) will be 85～200mm, so utilize and the same computational methods of first embodiment, if the weight of the counterweight 38 of the counterweight 33 of the epimere balanced controls 27A of portion and the epimere balanced controls 28A of portion is that the weight of the counterweight 38 of the counterweight 33 of 2.2Kg, the hypomere balanced controls 27B of portion and the hypomere balanced controls 28B of portion is 1.2Kg, can obtain the relevant form shown in Fig. 9 (B).
Thereby, embodiment hereto, number according to the substrate 18 that is accommodated in pair of supporting 15A and 15B respectively is poor, utilize above-mentioned relevant form to determine the position of the counterweight 33 of epimere balanced controls 27A of portion and the hypomere balanced controls 27B of portion, poor based on the number of the substrate 18 that is accommodated in pair of supporting 16A and 16B respectively in addition, utilize above-mentioned relevant form to determine the position of the counterweight 38 of epimere balanced controls 28A of portion and the hypomere balanced controls 28B of portion, can realize effect (1)～(4) identical effect equally with first embodiment.
More than, describe the present invention based on above-mentioned embodiment, but the present invention is not limited thereto.For example, though in above-mentioned two embodiments, on turntable 13 about the position configuration of rotating shaft 12 symmetries 2 pairs of bracing frames (bracing frame 15A or 15B, bracing frame 16A or 16B), also can be about rotating shaft 12 with equal angles arranged spaced many more than 3 couples to bracing frame, also can be about 12 configurations of rotating shaft pair of supporting.
Claims (7)
1. a centrifugal drying device is characterized in that, comprising: be contained in the container and the turntable that rotates around the shaft; About the configuration of described rotating shaft symmetric position, every pair be disposed on the turntable with the equal angles spacing and hold the many of object being treated respectively holding parts; At described outside of containers and be arranged at epimere support component in the described rotating shaft; Be positioned at the bottom of described epimere support component and be arranged at hypomere support component in the described rotating shaft; On described epimere support component, hold the corresponding epimere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature with every pair; On described hypomere support component, hold the corresponding hypomere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature with every pair; Wherein, that make the centripetal force act on the described centripetal force that holds parts and the counterweight that acts on described hypomere balanced controls portion and equal to act on the centripetal force of the counterweight of described epimere balanced controls, by the rotation of described turntable, carry out the drying processing to being contained in the described object being treated that holds parts.
2. a centrifugal drying device is characterized in that, comprising: be contained in the container and the turntable that rotates around the shaft; On described turntable about the position configuration of described rotating shaft symmetry, and hold a pair of parts that hold of object being treated respectively; At described outside of containers and be arranged at epimere support component in the described rotating shaft; Be positioned at the bottom of described epimere support component and be arranged at hypomere support component in the described rotating shaft; On described epimere support component with this to holding the corresponding hypomere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature; On described hypomere support component with this to holding the corresponding hypomere balanced controls portion that be provided with and that have the counterweight that can move of parts along direction with described rotating shaft quadrature; Wherein, make and to act on the described centripetal force of counterweight centripetal force and that equal to act on described epimere balanced controls that holds the centripetal force of parts and act on the counterweight of described hypomere balanced controls portion, by the rotation of described turntable, carry out the drying processing to being contained in the described object being treated that holds parts.
3. centrifugal drying device according to claim 1 is characterized in that, the described parts that hold have 2 pairs, in the position difference orthogonal configuration about the rotating shaft symmetry.
4. centrifugal drying device according to claim 1, it is characterized in that, the counterweight of described epimere balanced controls portion be arranged in corresponding with it relatively a pair of hold that parts hold more object being treated hold parts about the opposite side of rotating shaft, the counterweight of hypomere balanced controls portion then be positioned at hold more object being treated relatively hold parts about the identical side of rotating shaft.
5. centrifugal drying device according to claim 1, it is characterized in that, the counterweight of described epimere balanced controls portion is arranged at the rotating shaft both sides, the corresponding a pair of counterweight that holds the parts homonymy that holds more object being treated in the parts that holds is positioned near rotating shaft position, in addition, the counterweight of hypomere balanced controls portion is arranged at the rotating shaft both sides, and the corresponding a pair of counterweight that holds the parts opposite side that holds more object being treated in the parts that holds is positioned near rotating shaft position.
6. centrifugal drying device according to claim 1, it is characterized in that, described epimere balanced controls portion and described hypomere balanced structure portion are fixed in counterweight on the ball screw that extends with the rotating shaft orthogonal direction, on the assigned position of turntable rotation, combine rotation with the counterweight drive division by described ball screw and drive, make described counterweight be positioned at desired location.
7. according to any described centrifugal drying device in the claim 1 to 6, it is characterized in that, the a pair of described quantity that holds the object being treated that parts hold, on the assigned position that turntable rotates, detector by the outside of containers configuration detects, and poor according to these a pair of quantity of object being treated that hold on the parts, adjust and the described a pair of position that holds the counterweight of corresponding described epimere balanced controls portion of parts and described hypomere balanced controls, be located at desired location.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005-056689 | 2005-03-01 | ||
| JP2005056689A JP4029093B2 (en) | 2005-03-01 | 2005-03-01 | Centrifugal dryer |
| JP2005056689 | 2005-03-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1828206A CN1828206A (en) | 2006-09-06 |
| CN1828206B true CN1828206B (en) | 2010-06-09 |
Family
ID=36946712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200610003119XA Expired - Fee Related CN1828206B (en) | 2005-03-01 | 2006-02-14 | Centrifugal drying device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4029093B2 (en) |
| CN (1) | CN1828206B (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103575075B (en) * | 2012-07-25 | 2015-08-26 | 中国科学院微电子研究所 | Silicon wafer spin-drying system |
| CN105890314A (en) * | 2016-06-16 | 2016-08-24 | 江苏永尚能源科技有限公司 | Drying device for sealing element processing |
| JP6758163B2 (en) * | 2016-11-21 | 2020-09-23 | 東京エレクトロン株式会社 | Board processing equipment |
| CN110842661A (en) * | 2019-12-10 | 2020-02-28 | 沈阳航空航天大学 | Cutter passivation and measurement integrated device and use method thereof |
| CN112665317A (en) * | 2020-12-02 | 2021-04-16 | 山西白求恩医院(山西医学科学院) | Instrument draining device for hospital disinfection supply center |
| CN112923697A (en) * | 2021-02-01 | 2021-06-08 | 东莞市万德盛自动化设备有限公司 | Self-balancing spin-drying device for removing glass cleaning solution |
| CN112944814A (en) * | 2021-02-01 | 2021-06-11 | 东莞市万德盛自动化设备有限公司 | Spin-drying device for removing glass cleaning liquid |
| CN113623976B (en) * | 2021-08-19 | 2022-10-04 | 安徽弘腾药业有限公司 | Split charging and drying equipment and method for traditional Chinese medicine decoction pieces |
| CN113720107A (en) * | 2021-09-11 | 2021-11-30 | 苏州中天日得科技有限公司 | Drying device for plastic products |
| CN114485108B (en) * | 2021-12-31 | 2023-09-05 | 上海至纯洁净系统科技股份有限公司 | Automatic counterweight-based polycrystalline wafer rotary drying system and drying method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000353685A (en) * | 1999-06-11 | 2000-12-19 | Kaijo Corp | Centrifugal drying apparatus |
| JP3148126B2 (en) * | 1996-06-07 | 2001-03-19 | 昭和アルミニウム株式会社 | Polishing method of magnetic disk substrate |
-
2005
- 2005-03-01 JP JP2005056689A patent/JP4029093B2/en not_active Expired - Fee Related
-
2006
- 2006-02-14 CN CN200610003119XA patent/CN1828206B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3148126B2 (en) * | 1996-06-07 | 2001-03-19 | 昭和アルミニウム株式会社 | Polishing method of magnetic disk substrate |
| JP2000353685A (en) * | 1999-06-11 | 2000-12-19 | Kaijo Corp | Centrifugal drying apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006242433A (en) | 2006-09-14 |
| CN1828206A (en) | 2006-09-06 |
| JP4029093B2 (en) | 2008-01-09 |
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