JP2014007279A - Substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technology which can effectively improve throughput of a substrate processing apparatus.SOLUTION: A substrate processing apparatus 1 comprises intermediate units 101 provided at a connection part between a wash treatment cell 20 and an indexer cell 10. The intermediate unit 101 includes: an invert handing-over part 30 for delivering a substrate W delivered from one of a transfer robot 22 and a pick-and-place robot 12 to the other robot by inverting a surface and a rear face of the substrate W; an inverting part 50 arranged on the invert handing-over part 30 in a stacked manner, for inverting the surface and the rear face of the substrate W delivered from the transfer robot 22. In this embodiment, a stacking direction of a rear face washing part SSR with respect to a surface washing part SS and a stacking direction of the invert handing-over part 30 with respect to the inverting part 50 are the same.

Description

  The present invention relates to a technique for processing a plurality of semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for plasma displays, glass substrates for photomasks, substrates for optical disks (hereinafter simply referred to as “substrates”).

  There are various types of substrate processing apparatuses for processing a substrate. For example, the substrate processing apparatus of Patent Documents 1 and 2 has a configuration in which an indexer cell that integrates an unprocessed substrate and a processed substrate and a cleaning processing cell that performs scrub cleaning processing on the substrate are connected via a substrate transfer unit. It has become. The cleaning processing cell is provided with a transfer robot, a plurality of cleaning processing units arranged so as to sandwich the transfer robot, and the transfer robot receives an unprocessed substrate sent through the indexer cell and receives the received substrate. A series of processes are performed on the substrates in a predetermined order by transporting the substrates to the respective cleaning processing units or the like in a predetermined order.

  In the substrate processing apparatus having the above-described configuration, when the number of processing steps in the cleaning processing cell increases, the transfer process of the transfer robot of the cleaning processing cell increases, resulting in transfer rate limiting. As a result, the throughput of the substrate processing apparatus decreases.

  Accordingly, in order to reduce the burden on the transfer robot of the cleaning cell, for example, when the substrate is transferred from the transfer robot provided in the indexer cell to the transfer robot provided in the cleaning cell, the substrate is transferred at the substrate transfer unit. Has been proposed (see, for example, Patent Document 2 and Patent Document 3). According to this configuration, for example, the number of transfer processes of the transfer robot of the cleaning processing cell is reduced as compared with an aspect in which the reversing unit is provided in the cleaning processing cell and the transfer robot of the cleaning processing cell carries the substrate in and out of the reversing unit. . As a result, the time required for the transfer robot of the cleaning processing cell to perform one cycle of the transfer process is shortened, and as a result, a decrease in throughput of the substrate processing is suppressed.

JP 2009-146975 A JP 2009-252888 A Japanese Patent No. 4287663

  As described above, various techniques for improving the throughput of the substrate processing apparatus have been proposed in the past, but further improvements in throughput are required. For example, as in Patent Document 3, it is one idea to implement two transfer robots to achieve high throughput, but according to this configuration, the footprint of the apparatus is increased and the manufacturing cost is significantly increased. Is inevitable. Therefore, a technology that can effectively improve the throughput without increasing the number of transfer robots has been demanded.

  The present invention has been made in view of the above problems, and an object thereof is to provide a technique capable of effectively improving the throughput of a substrate processing apparatus.

  A first aspect is a substrate processing apparatus, and includes a processing unit in which a front surface cleaning unit that cleans the surface of a substrate and a back surface cleaning unit that cleans the back surface of the substrate are stacked, and a first transport robot An indexer block having a processing block, a second transfer robot, delivering an unprocessed substrate to the cleaning processing block and receiving a processed substrate from the cleaning processing block; and a connecting portion between the indexer block and the cleaning processing block A reversal delivery unit that reverses a substrate delivered from one of the second transport robot and the first transport robot and causes the other robot to receive it. And the reversing / delivering section, and the substrate transferred from the first transfer robot is reversed and received by the first transfer robot. Comprising a reversing unit causes al, and a lamination direction with respect to the surface cleaning portion of the back surface cleaning unit, is equal to the stacking direction with respect to the reversing section of the reversing transfer part.

  A 2nd aspect is a substrate processing apparatus which concerns on a 1st aspect, Comprising: While the said back surface cleaning part is arrange | positioned below the said surface cleaning part, the said inversion delivery part is below a said inversion part Placed in.

  A third aspect is a substrate processing apparatus according to the first or second aspect, comprising a plurality of the intermediate units, and each of the plurality of intermediate units is a virtual circle centered on the first transfer robot. It is arranged on the circumference of.

  A fourth aspect is a substrate processing apparatus according to any one of the first to third aspects, comprising two processing units and two intermediate units, the cleaning processing block and the indexer block The two processing units are arranged separately on both sides of the virtual dividing line with a straight line passing through the arrangement position of the first transfer robot as a virtual dividing line, and the two intermediate units. Are arranged separately on both sides of the virtual dividing line, and the first transport robot transfers the substrate received from the intermediate unit to the processing unit arranged on the same side as the intermediate unit and the virtual dividing line. An intermediate unit that conveys the substrate processed by the processing unit and is disposed on the same side as the processing unit and the virtual dividing line. To transport.

  A fifth aspect is a substrate processing apparatus according to any one of the first to fourth aspects, wherein the intermediate unit is disposed between the reverse delivery unit and the reverse unit, and the second transfer robot And a transfer unit that supports the substrate delivered from one of the first transfer robots and causes the other robot to receive the supported substrate.

  According to the 1st aspect, the arrangement direction with respect to the surface cleaning part of a back surface washing | cleaning part and the arrangement direction with respect to the inversion part of an inversion delivery part are equal. According to this configuration, the first transfer robot can suppress the amount of vertical movement when the substrate received from the reverse delivery unit is carried into the back surface cleaning unit, and can carry the substrate received from the reverse unit into the surface cleaning unit. The amount of vertical movement at the time of carrying out can also be suppressed small, and the movement amount of the first transfer robot can be suppressed as a whole. This shortens the time required for the first transfer robot to perform one cycle of the transfer operation, and can effectively improve the throughput of the substrate processing apparatus.

  According to the 2nd aspect, while a back surface washing | cleaning part is arrange | positioned below a surface washing part, an inversion delivery part is arrange | positioned below the inversion part. According to this configuration, since the substrate after surface cleaning passes through the relatively upper path, contamination of the substrate after surface cleaning is suppressed.

  According to the third aspect, each of the plurality of intermediate units is arranged on the circumference of a virtual circle centered on the first transfer robot. According to this configuration, the first transfer robot can access any of the plurality of intermediate units with the same transfer time.

  According to the fourth aspect, the first transport robot transports the substrate received from the intermediate unit to the processing unit disposed on the same side as the intermediate unit and the virtual dividing line, and is processed by the processing unit. The transferred substrate is transferred to an intermediate unit disposed on the same side as the processing unit and the virtual dividing line. According to this configuration, the rotation angle when the first transport robot transports the substrate between the intermediate unit and the processing unit can be reduced. Thereby, the throughput of the substrate processing apparatus can be further improved.

  According to the fifth aspect, the intermediate unit includes the transfer unit used for transferring the substrate between the first transfer robot and the second transfer robot. According to this configuration, when it is not necessary to invert the substrate at the time of delivery, the substrate can be delivered between the first transfer robot and the second transfer robot via the transfer unit.

1 is a plan view of a substrate processing apparatus according to the present invention. It is the figure which looked at the substrate processing apparatus from the AA line of FIG. It is the figure which looked at the substrate processing apparatus from the BB line of FIG. It is a top view of an inversion delivery part. It is the figure which looked at the inversion delivery part from CC line of FIG. It is the figure which looked at the inversion delivery part from the DD line | wire of FIG. It is the elements on larger scale which show the principal part of a clamping inversion mechanism. It is a schematic diagram for demonstrating operation | movement of a board | substrate inversion apparatus. It is a schematic diagram for demonstrating operation | movement of a substrate processing apparatus. It is a schematic diagram for demonstrating operation | movement of a substrate processing apparatus. It is a figure which shows transition of the height position during a conveyance robot performing conveyance operation of 1 cycle. It is a figure which shows transition of the turning position while a conveyance robot performs conveyance operation of 1 cycle. It is a figure which shows typically the structure of the substrate processing apparatus made into a comparative example.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The following embodiment is an example embodying the present invention, and does not limit the technical scope of the present invention.

  In the following description, the “front surface” of the substrate is a surface on which a pattern (for example, a circuit pattern) is formed on the main surface of the substrate, and the “back surface” is a surface opposite to the front surface. . The “upper surface” of the substrate is the surface facing the upper side of the main surface of the substrate, and the “lower surface” is the surface facing the lower side (regardless of whether it is the front surface or the back surface). .

<1. Configuration of Substrate Processing Apparatus 1>
A configuration of the substrate processing apparatus 1 according to the embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view of the substrate processing apparatus 1. FIG. 2 is a view of the substrate processing apparatus 1 as seen from the line AA in FIG. FIG. 3 is a view of the substrate processing apparatus 1 as seen from the line BB in FIG. In each drawing referred to below, an XYZ orthogonal coordinate system in which the Z-axis direction is the vertical direction and the XY plane is the horizontal plane is appropriately attached.

  The substrate processing apparatus 1 is a cleaning apparatus that continuously performs scrub cleaning processing on a plurality of substrates W such as semiconductor wafers, and includes two cells (processing blocks) that are an indexer cell 10 and a cleaning processing cell 20 arranged in parallel. It is configured. In addition, the substrate processing apparatus 1 includes two intermediate units 101 provided at a connection portion between the indexer cell 10 and the cleaning processing cell 20. Each intermediate unit 101 includes a reverse delivery unit 30, a placement unit 40, and a reverse unit 50, which are stacked in the vertical direction. Further, the substrate processing apparatus 1 includes a control unit 60 that controls each operation mechanism provided in the indexer cell 10 and the cleaning processing cell 20 to execute the cleaning processing of the substrate W.

<Indexer cell 10>
The indexer cell 10 passes the substrate W (unprocessed substrate W) received from the outside of the apparatus to the cleaning processing cell 20 and carries the substrate W (processed substrate W) received from the cleaning processing cell 20 out of the apparatus. It is a cell. The indexer cell 10 includes a plurality of (four in the present embodiment) carrier stages 11 on which the carriers C are placed, and untransferred substrates W from the carriers C and a transfer that stores the processed substrates W in the carriers C. Loading robot 12.

  On each carrier stage 11, a carrier C containing an unprocessed substrate W is carried from the outside of the apparatus by an AGV (Automated Guided Vehicle) or the like and placed. Further, the substrate W that has been subjected to the scrub cleaning process in the apparatus is stored again in the carrier C placed on the carrier stage 11. The carrier C storing the processed substrate W is carried out of the apparatus by AGV or the like. That is, the carrier stage 11 functions as a substrate integration unit that integrates the unprocessed substrate W and the processed substrate W. In addition to the FOUP (front opening unified pod) that accommodates the substrate W in a sealed space, the carrier C is configured as an OC (open cassette) that exposes the standard mechanical interface (SMIF) pod and the accommodated substrate W to the outside air. ).

  The transfer robot 12 includes two transfer arms 121a and 121b, an arm stage 122 on which they are mounted, and a movable base 123.

  The movable table 123 is screwed into a ball screw 124 that extends parallel to the arrangement of the carrier stages 11 (along the Y-axis direction) and is slidable with respect to the two guide rails 125. Therefore, when the ball screw 124 is rotated by a rotation motor (not shown), the entire transfer robot 12 including the movable base 123 moves horizontally along the Y-axis direction.

  The arm stage 122 is mounted on the movable table 123. The movable table 123 includes a motor that pivots the arm stage 122 around an axis along the vertical direction (Z-axis direction), and a motor that moves the arm stage 122 up and down along the vertical direction (both not shown). ) Is built-in. On the arm stage 122, the transfer arms 121a and 121b are arranged vertically with a predetermined pitch. Each of the transfer arms 121a and 121b is formed in a fork shape in plan view. Each of the transfer arms 121a and 121b supports the lower surface of one substrate W with a fork-like portion. In addition, the transfer arms 121a and 121b are independently operated in the horizontal direction (in the turning radius direction of the arm stage 122) by the articulation mechanism being bent and extended by a drive mechanism (not shown) built in the arm stage 122. It is configured to be able to move forward and backward along.

  With such a configuration, each of the transfer arms 121a and 121b can perform horizontal movement along the Y-axis direction, up-and-down movement, a turning operation in a horizontal plane, and a forward and backward movement along the turning radius direction. Then, the transfer robot 12 moves each of the transfer arms 121a and 121b that support the substrate W with a fork-shaped portion to each part (specifically, the carrier C placed on the carrier stage 11, the reverse delivery part 30, and Each part) of the mounting unit 40 is accessed, and the substrate W is transferred between the parts.

<Washing treatment cell 20>
The cleaning processing cell 20 is a cell that performs scrub cleaning processing on the substrate W, and includes two cleaning processing units 21 and a transfer robot 22 that delivers the substrate W to each cleaning processing unit 21.

  The two cleaning processing units 21 are opposed to each other with the transfer robot 22 interposed therebetween. That is, one of the two cleaning processing units 21 is disposed on the + Y side with respect to the transfer robot 22, and the other cleaning processing unit 21 is disposed on the −Y side with respect to the transfer robot 22. The Here, assuming that a straight line passing through the arrangement position of the transfer robot 22 along the arrangement direction (X-axis direction) of the cleaning processing cell 20 and the indexer cell 10 is a virtual dividing line K, the two cleaning processing units 21 have the virtual It will be arranged separately on both sides of the dividing line K. That is, one of the two cleaning processing units 21 is disposed on the + Y side with respect to the virtual dividing line K, and the other cleaning processing unit 21 is on the −Y side with respect to the virtual dividing line K. Will be placed.

  The two cleaning processing units 21 have the same configuration. That is, each cleaning processing unit 21 includes one or more (in this embodiment, two) front surface cleaning units SS and one or more (two in this embodiment) back surface cleaning units SSR. The one or more front surface cleaning units SS are arranged above the one or more back surface cleaning units SSR. That is, only the front surface cleaning unit SS is stacked above the boundary height between the front surface cleaning unit SS and the back surface cleaning unit SSR, and only the back surface cleaning unit SSR is stacked below the boundary height. For example, when a plurality of front surface cleaning units SS and a plurality of back surface cleaning units SSR are provided, the plurality of front surface cleaning units SS are stacked together, and the plurality of back surface cleaning units SSR are stacked together. The front surface cleaning unit SS is arranged above the group of back surface cleaning units SSR.

  The surface cleaning unit SS performs a scrub cleaning process on the surface of the substrate W. Specifically, the surface cleaning unit SS is held on, for example, the spin chuck 201 and the spin chuck 201 that hold the substrate W with the surface facing upward in a horizontal posture and rotate it around the axis along the vertical direction. A cleaning brush 202 that performs scrub cleaning in contact with or close to the surface of the substrate W, a nozzle 203 that discharges cleaning liquid (for example, pure water) to the surface of the substrate W, a spin motor 204 that rotationally drives the spin chuck 201, and a spin A cup (not shown) or the like surrounding the periphery of the substrate W held on the chuck 201 is provided.

  The back surface cleaning unit SSR performs a scrub cleaning process on the back surface of the substrate W. Specifically, for example, the back surface cleaning unit SSR is held on the spin chuck 211 and the spin chuck 211 that hold the substrate W with the back surface facing upward in a horizontal posture and rotate it around the axis along the vertical direction. A cleaning brush 212 that performs scrub cleaning in contact with or close to the back surface of the substrate W, a nozzle 213 that discharges cleaning liquid (for example, pure water) to the back surface of the substrate W, a spin motor 214 that rotationally drives the spin chuck 211, and a spin A cup (not shown) that surrounds the periphery of the substrate W held on the chuck 211 is provided. The spin chuck 201 of the front surface cleaning unit SS that performs the front surface cleaning may be of a vacuum suction type because it holds the substrate W from the back surface side, but the spin chuck 211 of the back surface cleaning unit SSR that performs the rear surface cleaning. Must be of the type that mechanically grips the edge of the substrate in order to hold it from the surface side of the substrate W.

  The transfer robot 22 includes two transfer arms 221a and 221b, an arm stage 222 on which they are mounted, and a base 223. The base 223 is fixedly installed on the frame of the cleaning processing cell 20. Therefore, the entire transfer robot 22 does not move in the horizontal direction.

  The arm stage 222 is mounted on the base 223. The base 223 includes a motor that swings and drives the arm stage 222 around an axis along the vertical direction (Z-axis direction) and a motor that moves the arm stage 222 up and down along the vertical direction (both not shown). ) Is built-in. On the arm stage 222, transfer arms 221a and 221b are arranged vertically with a predetermined pitch. Each of the transfer arms 221a and 221b is formed in a fork shape in plan view. Each of the transfer arms 221a and 221b supports the lower surface of one substrate W with a fork-like portion. In addition, the transfer arms 221a and 221b are independently operated in the horizontal direction (in the turning radius direction of the arm stage 222) by the articulated mechanism being bent and extended by a drive mechanism (not shown) built in the arm stage 222. It is configured to be able to move forward and backward.

  With such a configuration, the transfer robot 22 can individually transfer each of the two transfer arms 221a and 221b to each unit (specifically, the cleaning processing units 21a and 21b, the reverse transfer unit 30, the mounting unit 40, And each part of the reversing part 50 is accessed, and the substrate W can be exchanged between these parts. Note that another mechanism such as a belt feeding mechanism using a pulley and a timing belt may be employed as the lifting drive mechanism of the transport robot 22.

<Control unit 60>
The controller 60 controls various operation mechanisms provided in the substrate processing apparatus 1. The configuration of the control unit 60 as hardware is the same as that of a general computer. That is, the control unit 60 stores a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, control software, data, and the like. It has a magnetic disk.

<Intermediate unit 101>
In the substrate processing apparatus 1, a cleaning processing cell 20 is provided adjacent to the indexer cell 10, and an atmosphere blocking partition 300 is provided between the indexer cell 10 and the cleaning processing cell 20. The two intermediate units 101 are provided through a part of the partition wall 300. That is, the two intermediate units 101 are provided at a connection portion between the indexer cell 10 and the cleaning processing cell 20.

  The two intermediate units 101 are arranged separately on both sides of the virtual dividing line K described above. That is, one of the two intermediate units 101 is arranged on the + Y side from the virtual dividing line K, and the other intermediate unit 101 is arranged on the −Y side from the virtual dividing line K. . Furthermore, each intermediate unit 101 is preferably arranged on the circumference of a virtual circle Q with the transfer robot 22 as the center.

  The two intermediate units 101 have the same configuration. That is, each intermediate unit 101 has a configuration in which the reverse delivery unit 30, the placement unit 40, and the reverse unit 50 are stacked in the vertical direction. Here, the reverse delivery unit 30 and the reverse unit 50 are arranged so that the stacking direction of the reverse transfer unit 30 with respect to the reverse unit 50 is equal to the stacking direction of the back surface cleaning unit SSR with respect to the front surface cleaning unit SS in the cleaning processing unit 21. Is done. In the substrate processing apparatus 1 according to this embodiment, as described above, the back surface cleaning unit SSR is disposed below the front surface cleaning unit SS in the cleaning processing unit 21. Therefore, in the intermediate unit 101, the reverse delivery unit 30 is disposed below the reverse unit 50. Further, the mounting unit 40 is disposed between the reverse delivery unit 30 and the reverse unit 50. That is, in the intermediate unit 101, the reversing unit 50, the mounting unit 40, and the reversing delivery unit 30 are stacked in the vertical direction in order from the top. However, there may be a gap between the reversing unit 50 and the mounting unit 40. There may also be a gap between the mounting unit 40 and the reverse delivery unit 30.

  The inversion delivery unit 30 inverts the substrate W delivered from one of the transfer robot 12 and the transfer robot 22 and causes the other robot to receive it. That is, the reversal delivery unit 30 functions as a reversal unit that reverses the front and back surfaces of the substrate W by 180 °, and functions as a delivery unit of the substrate W between the transfer robot 12 and the transfer robot 22. Have both. The configuration of the reverse delivery unit 30 will be described later.

  The placement unit 40 supports the substrate W delivered from one of the transfer robot 22 and the transfer robot 12 and causes the other robot to receive the supported substrate W. In the mounting unit 40, a plurality of (for example, six in this embodiment) a plurality of mounting portions PASS that support one substrate W in a horizontal posture are arranged in a stacked manner. As a result, the mounting unit 40 can simultaneously support six substrates W in a horizontal posture and stacked in a vertically spaced manner. Of the six placement units PASS included in the placement unit 40, for example, the upper three placement units PASS are used for delivery of the processed substrate W from the cleaning cell 20 to the indexer cell 10 (so-called The return placement unit) and the remaining placement units PASS (that is, the lower three placement units PASS) are used for delivery of the unprocessed substrate W from the indexer cell 10 to the cleaning processing cell 20 (so-called so-called “mounting unit PASS”). , Feed placement unit).

  The reversing unit 50 reverses the substrate W delivered from the transfer robot 22 and causes the transfer robot 22 to receive the substrate W. That is, the inversion unit 50 has a function as an inversion unit that inverts the substrate W. The reversing unit 50 has a configuration in which a substrate reversing device 100 described later is accommodated in a box-shaped housing (not shown). However, only the transfer robot 22 can access the inside of the housing. That is, the housing is not formed with an opening in the wall portion on the indexer cell 10 side, and the transfer arms 221a and 221b of the transfer robot 22 are accessed only inside the wall portion on the cleaning processing cell 20 side. Are formed.

<2. Inversion delivery unit 30>
<2-1. Configuration>
The configuration of the reverse delivery unit 30 will be described with reference to FIGS. FIG. 4 is a plan view of the reverse delivery unit 30. FIG. 5 is a view of the reverse delivery unit 30 as seen from the line CC in FIG. 6 is a diagram of the reverse delivery unit 30 as seen from the line DD in FIG.

  The reverse delivery unit 30 is supported by a support mechanism 70 and a support mechanism 70 that support a plurality (two in this embodiment) of substrates W in a horizontal posture and stacked in a vertically spaced manner. A sandwiching / reversing mechanism 80 or the like for sandwiching each of the plurality of substrates W and reversing the plurality of substrates W at a time is arranged in the housing 301. The support mechanism 70 and the sandwiching / reversing mechanism 80 constitute a substrate reversing apparatus 100 that inverts a plurality (two in this embodiment) of substrates W at a time.

  Both the transfer robot 12 and the transfer robot 22 can access the inside of the housing 301. That is, an opening 302 for allowing the transfer arms 221 a and 221 b of the transfer robot 22 to access the inside of the case 301 is formed in the wall portion of the case 301 on the cleaning processing cell 20 side. In addition, an opening 303 for allowing the transfer arms 121 a and 121 b of the transfer robot 12 to access the inside of the housing 301 is formed in the wall portion of the housing 301 on the indexer cell 10 side. In the following description, the side on which the opening 302 for accessing the transfer arms 221a and 221b of the transfer robot 22 is formed is referred to as “front side”, and the transfer arms 121a and 121b of the transfer robot 12 are accessed. The side on which the opening 303 is formed is referred to as “rear side”. A direction orthogonal to the front-rear direction and the up-down direction (Z-axis direction) is referred to as a “left-right direction”.

<I. Support Mechanism 70>
In each of the left and right side wall portions of the housing 301, two oblique shaft portions 71 are provided so as to slidably penetrate the side wall portions. The two oblique shaft portions 71 provided on each side wall portion are arranged at intervals in the front-rear direction with the extending directions thereof being parallel to each other. Further, in each of the left and right side wall portions, the oblique shaft portions 71 provided relatively on the front side are opposed to each other in the left-right direction when viewed from the vertical direction, and the oblique shaft portions 71 provided relatively on the rear side are arranged. Also, they are arranged opposite to each other in the left-right direction when viewed from the up-down direction.

  A support column 72 extending in the vertical direction is disposed at an upper end portion of each oblique shaft portion 71 protruding into the housing 301. On the other hand, the lower end portion of each oblique shaft portion 71 protruding outside the housing 301 is connected to the cylinder 73. The two oblique shaft portions 71 provided on the same side wall portion are connected to the same cylinder 73 via a connecting rod (not shown). That is, the lower end portions of the two oblique shaft portions 71 are respectively connected to the vicinity of the front end portion and the vicinity of the rear end portion of the connecting rod extending in the front-rear direction, and the cylinder 73 is connected to the connecting rod. ing. According to this configuration, the two oblique shaft portions 71 connected to the cylinder 73 via the connecting rod are moved in synchronization with the driving of the cylinder 73.

  Near the upper end and the lower end of the support column 72, a support member 74 extending in the left-right direction in the horizontal plane is attached in a cantilever state. Specifically, the support member 74 is a long plate-like member that extends horizontally from a fixed end attached to the support column 72 to a free end. The upper surface of the support member 74 has a stepped shape having an inclined surface in the middle of extension, and a substantially horizontal plane that is relatively lower than the fixed end side is formed on the free end side. The horizontal surface on the free end side constitutes a contact surface that contacts the lower surface of the substrate W, and as will become apparent later, each of the contact surfaces of the four support members 74 arranged in the same horizontal surface is the surface of the substrate W. By contacting the lower surface side, the substrate W is supported in a horizontal posture. The contact surface is not necessarily a horizontal plane, and may be a surface that is slightly inclined so as to become lower toward the tip. In the support member 74, the inclined surface formed continuously with the contact surface functions as a position regulating surface that regulates the position of the edge of the substrate W. That is, each inclined surface of the four support members 74 arranged in the same horizontal plane regulates the edge position of the substrate W, whereby the position of the substrate W in the horizontal plane is regulated.

  The support members 74 disposed at the upper ends of the four support pillars 72 disposed in the housing 301 are disposed in the same horizontal plane and constitute one support member group. Further, the support members 74 disposed at the lower ends of the four support pillars 72 are also disposed in the same horizontal plane to constitute one support member group. One substrate W is supported in a horizontal position at a predetermined position by being supported from the lower surface side by four support members 74 constituting one support member group. That is, one support member group forms a support portion 701 that supports one substrate W in a horizontal posture.

  As described above, in the support mechanism 70, the two support portions 701 arranged in the vertical direction with a gap therebetween are provided, whereby the two substrates W are spaced in the vertical direction in a horizontal posture. It can be supported in a laminated state.

  Here, as viewed from above and below, a pair of two diagonal shaft portions 71 that are opposed to each other in the left-right direction (that is, opposed to each other across the center line of the substrate W supported by the support portion 701) are paired. The oblique shaft portion 71 is used. Each of the pair of oblique shaft portions 71 is obliquely downward from the upper end portion connected to the support column 72 (that is, the direction toward the bottom while being separated from the other oblique shaft portion 71 disposed opposite to the left and right direction). To the lower end connected to the cylinder 73.

  The cylinder 73 slides each diagonal shaft portion 71 along its extending direction. That is, the cylinder 73 slides the oblique shaft portion 71 obliquely downward along the extending direction, and the support member 74 is moved to the support position A1 (that is, the support member 74 is formed on the contact surface of the substrate W). The substrate W is moved from the position contacting the lower surface to support the substrate W to the retracted position A2 (that is, the predetermined position where the support member 74 is separated from the lower surface and the side surface of the substrate W). According to this configuration, the support member 74 at the support position A1 is moved in a diagonally downward direction (in other words, while being away from the center line of the substrate W when viewed from the up and down direction). ), Moved downward) and placed in the retracted position A2. That is, the support member 74 at the support position A1 is moved in the direction away from both the lower surface and the side surface of the substrate W (more specifically, the side surface portion where the inclined surface of the support member 74 faces), It will be arranged at the retracted position A2.

  However, the retracted position A2 is set at a position outside the peripheral edge of the substrate W when viewed from the vertical direction. Such a retracted position A2 is outside the region (reversal region) M through which each substrate W reversed by the sandwiching and reversing mechanism 80 passes. Therefore, it is ensured that the support member 74 arranged at the retracted position A2 does not interfere with the substrate W to be reversed. The retracted position A2 is preferably set above the support position of the lower substrate W (the support position of the substrate W supported on the lower side of the substrate W supported by the support member 74).

  Further, the cylinder 73 slides the oblique shaft portion 71 obliquely upward along the extending direction, and moves the support member 74 from the retracted position A2 to the support position A1. That is, the support member 74 at the retracted position A2 is moved in the reverse direction along the above path, and is moved from the retracted position A2 to the support position A1.

  The direction in which the support member 74 is moved may be any direction that is inclined at an angle larger than 0 with respect to the horizontal direction. The specific value of the angle is, for example, the substrate W supported by each support portion 701. It can be defined based on the vertical separation distance between them and the separation distance between the peripheral edge of the substrate W and the position where the support member 74 contacts the substrate W. In FIG. 4, each support member 74 is configured to move in the direction along the Y axis and move away from the center of the substrate W when viewed from the vertical direction. It may be configured to be moved along an axis extending radially from the center of the substrate W and away from the center of the substrate W.

<Ii. Nipping and reversing mechanism 80>
The structure of the clamping / reversing mechanism 80 will be described with reference to FIG. 7 in addition to FIGS. FIG. 7 is a partially enlarged view showing a main part of the clamping / reversing mechanism 80.

  Each of the left and right side wall portions of the housing 301 is provided with a single slide shaft portion 81 that slidably penetrates the side wall portion. One slide shaft portion 81 provided on each side wall portion is disposed between two oblique shaft portions 71 provided on the side wall portion. Further, the slide shaft portions 81 provided on the left and right side wall portions are opposed to each other in the left-right direction when viewed from the up-down direction. Each slide shaft portion 81 extends in the left-right direction in a horizontal plane, and a support column 82 extending in the up-down direction is disposed at an end portion on the side protruding into the housing 301. The support column 82 is connected to the slide shaft portion 81 at the center portion in the vertical direction.

  At the upper and lower ends of the support column 82, clamping members 83 extending in the left-right direction in the horizontal plane are attached in a cantilevered state. Specifically, the clamping member 83 is a member having a tapered surface with a V-shaped cross section into which the edge portion of the substrate W enters. The holding members 83 disposed at the upper ends of the two support columns 82 disposed in the housing 301 are disposed in the same horizontal plane. Further, the clamping members 83 disposed at the lower ends of the two support pillars 82 are also disposed in the same horizontal plane. As will be apparent later, the pair of clamping members 83 disposed in the same horizontal plane clamps the substrate W from both edge portions.

  Here, as described above, the two slide shaft portions 81 are arranged opposite to each other in the housing 301, and each of the two slide shaft portions 81 is on the side where the support pillar 82 is disposed. From the end portion, it extends in the left-right direction in the horizontal plane and reaches the other end portion that protrudes to the outside of the housing 301. Each slide shaft portion 81 is in contact with the elastic member 84 at an end portion on the side protruding to the outside of the housing 301. Specifically, the elastic member 84 is, for example, a coil spring, and in a contracted state, one end of the elastic member 84 comes into contact with the end of the slide shaft portion 81 and the other end is a pulley 873 (or later). The bottom plate 872). Therefore, each slide shaft portion 81 is always moved in a direction away from the pulley 873 (or the bottom plate 872) by the elastic member 84, that is, in a direction close to the other slide shaft portion 81 opposed to the left and right. It is energized.

  In this configuration, the pair of sandwiching members 83 that are opposed to each other in the left-right direction within the same horizontal plane are always elastically biased in the direction of approaching each other, and the pair of sandwiching members 83 is the substrate. The substrates W are held in a horizontal posture by being opposed to each other with the W interposed therebetween and elastically biasing each clamping member 83 toward the side surface of the substrate W. That is, a single substrate W is sandwiched in a horizontal posture by being sandwiched between a pair of sandwiching members 83 arranged opposite to each other in the left-right direction from both edge portions along the radial direction of the substrate W. However, the “edge portion” of the substrate W here refers to an annular region on the side surface of the substrate W and the upper and lower surfaces of the substrate W and about several millimeters from the periphery.

  As described above, in the sandwiching and reversing mechanism 80, the pair of sandwiching members 83 form the sandwiching portion 801 that supports the single substrate W in a horizontal posture, and the two sandwiching members disposed at intervals in the vertical direction. By providing the portion 801, the two substrates W can be sandwiched in a horizontal posture and stacked in a vertically spaced manner. However, each of the two sandwiching portions 801 that are spaced apart in the vertical direction is disposed at the same height as each of the two support portions 701, and each sandwiching portion 801 is each support portion 701. The substrate W supported by can be clamped.

  A protruding portion 811 that protrudes from the outer peripheral surface of the slide shaft portion 81 in a collar shape is formed at the end portion of each slide shaft portion 81 that protrudes to the outside of the housing 301. At least a part of the tip of the protruding portion 811 is inserted into the groove of the hook-shaped portion 85. The hook-shaped portion 85 is a member that opens upward and forms a groove extending in the front-rear direction. The width of the groove is larger than the width of the protruding portion 811. Moreover, the front and rear end portions of the groove are also opened. The hook-shaped portion 85 is fixed to the rod of the cylinder 86 via a support portion 851. However, the rod of the cylinder 86 is disposed so as to extend in the left-right direction in the horizontal plane. Note that the protruding portion 811 is formed in, for example, a semicircular shape when viewed from the left-right direction, and at least a part of the tip of the protruding portion 811 remains after the slide shaft portion 81 is rotated by 180 ° about the rotation axis L. , It is formed so as to be inserted into the groove of the bowl-shaped portion 85.

  The cylinder 86 reciprocates the bowl-shaped portion 85 within a predetermined movement range along a movement axis extending in the left-right direction in the horizontal plane. In the following, the end position on the substrate W side within the movement range of the bowl-shaped portion 85 is referred to as “closed end position C1”, and the other end position is referred to as “open end position C2.”

  When the cylinder 86 moves the hook-shaped portion 85 at the closed end position C1 in the direction of separating from the substrate W, the protruding portion 811 is caught by the hook-shaped portion 85, and the slide shaft portion 81 is It is slid in the direction away from the substrate W together with the bowl-shaped portion 85. As a result, the clamping member 83 (ie, the clamping member at the clamping position B1) that is elastically biased to the side surface of the substrate W is separated from the side surface of the substrate W, and is separated from the left and right center lines of the substrate W in the horizontal plane. It is moved in the direction (that is, the direction away from the center of the substrate W) and is disposed at the separation position B2 that is separated from the side surface of the substrate W. That is, the cylinder 86 moves the bowl-shaped portion 85 from the closed side end position C1 to the open side end position C2, so that the clamping member 83 is moved from the clamping position B1 to the separation position B2.

  On the other hand, when the cylinder 86 moves the bowl-shaped portion 85 at the open end position C2 in a direction to approach the substrate W, the slide shaft portion 81 is slid in the direction to approach the substrate W together with the bowl-shaped portion 85. The Accordingly, the clamping member 83 at the separation position B2 is moved in a direction approaching the left-right center line of the substrate W (that is, a direction approaching the center of the substrate W) in the horizontal plane. Here, in a state where the cylinder 86 has moved the hook-shaped portion 85 to the closed end position C1, the protruding portion 811 is separated from the groove side wall portion of the hook-shaped portion 85 (preferably, the hook-shaped portion 85. In a state of being arranged at substantially the center of the groove), that is, in a state where the force from the flange 85 is not received. Therefore, in the state where the bowl-shaped portion 85 is disposed at the closed end portion position C1, the slide shaft portion 81 is elastically biased to the side surface of the substrate W by the elastic member 84 with the desired pressure. It is in the state arrange | positioned in such position (namely, clamping position) B1.

  That is, while the cylinder 86 moves the flange 85 from the open side end position C2 to the closed side end position C1, the clamping member 83 receives the elastic biasing force from the elastic member 84 until halfway. In the state where it is supported by 86, it is brought close to the substrate W, and in the middle, it receives the elastic biasing force from the elastic member 84 and is moved to the final clamping position B1. More specifically, the clamping member 83 receives the driving force of the cylinder 86 and extends from the separation position B2 to the approach position (that is, a predetermined position where the clamping member 83 approaches or contacts the side surface of the substrate W). After that, it is further moved from the approach position to the clamping position B1 only by the elastic biasing force from the elastic member 84 without depending on the driving force of the cylinder 86, and elastically biased with the desired pressure on the side surface of the substrate W. Is done. As described above, each of the pair of sandwiching members 83 is disposed at the sandwiching position B1, so that the substrate W is sandwiched by the pair of sandwiching members 83 from both edge portions.

  According to this configuration, each clamping member 83 is elastically biased with a necessary and sufficient force with respect to the substrate W, so that the substrate W can be reliably clamped by the clamping unit 801 without being damaged. For example, if the substrate W is held between the holding members only by driving the cylinder without providing the elastic member, the stop position of the holding member is uniquely fixed. Accordingly, when the position and size of the substrate W are slightly deviated from the intended ones, the substrate W is damaged because the holding members are too close to the side surfaces of the substrate W, or each holding member is a substrate. Although the substrate W may be dropped because it is disposed at a position that is too far from the side surface of the W, such a situation is unlikely to occur according to the above configuration.

  Here, the sandwiching and reversing mechanism 80 is provided with an open / close detection unit 800 that detects the position state of the pair of sandwiching members 83. The open / close detection unit 800 includes, for example, a pair of optical sensors 810 and 820, and one sensor (closed side sensor) 810 is disposed in the vicinity of the closed end position C1, and the closed end position C1. The protruding portion 811 inserted into the groove of the hook-shaped portion 85 disposed in the position is detected. The other sensor (open side sensor) 820 is arranged in the vicinity of the open side end position C2 and has a protruding portion 811 inserted into the groove of the hook-shaped part 85 arranged at the open side end position C2. Detect. As described above, the width of the groove of the hook-shaped portion 85 is formed to be larger than the width of the protruding portion 811, and the protruding portion 811 can take an arbitrary position within the width of the groove. Therefore, each sensor 810, 820 preferably has a detection range about the groove width of the bowl-shaped portion 85 in the left-right direction.

  According to this configuration, when the hook-shaped portion 85 is moved to the closed side end position C1, the closed side sensor 810 detects the protruding portion 811. That is, when the closed side sensor 810 detects the protruding portion 811, it can be determined that each clamping member 83 is disposed at the close position and further disposed at the clamping position B <b> 1 by the elastic member 84. On the other hand, when the hook-shaped portion 85 is moved to the open-side end position C2, the open-side sensor 820 detects the protruding portion 811. That is, when the open-side sensor 820 detects the protruding portion 811, it can be determined that each clamping member 83 is disposed at the separation position B2. By detecting whether the pair of sandwiching members 83 sandwich the substrate W by the open / close detection unit 800, the plurality of substrates W can be safely reversed in the substrate reversing device 100.

  Each of the pair of slide shaft portions 81 is provided so as to penetrate each side wall portion of the housing 301 in a state of being inserted into the hollow rotation shaft portion 87. That is, each of the left and right side wall portions of the housing 301 is provided with a single rotating shaft portion 87 that is rotatably penetrated. The slide shaft portion 81 slides inside the rotating shaft portion 87. It is inserted as possible. However, as described above, the protruding portion 811 is formed at the end portion of the slide shaft portion 81, and the insertion opening 871 through which the protruding portion 811 is inserted is formed in the rotating shaft portion 87. The insertion opening 871 is shaped to have a sufficient length in the left-right direction so as not to hinder the movement of the protruding portion 811 in the left-right direction accompanying the slide of the slide shaft portion 81.

  The rotation shaft portion 87 and the slide shaft portion 81 inserted therein are, for example, the end surface of the protruding portion 811 (the periphery of the slide shaft portion 81) on the end surface of the insertion opening 871 (the end surface in the circumferential direction of the rotation shaft portion 87). The end surface in the direction) is hooked, so that the slide shaft portion 81 cannot rotate around the axis (center line along the extending direction) inside the rotation shaft portion 87. Therefore, when the rotary shaft portion 87 is rotated around its axis (rotary axis L), the slide shaft portion 81 also rotates around the rotary shaft L together with this.

  Here, each of the pair of rotating shaft portions 87 that are opposed to each other in the left-right direction when viewed from the up-down direction extends in the left-right direction in the horizontal plane, and one end is inside the housing 301 and the other end is the housing. Each protrudes outside 301. The pair of rotating shaft portions 87 is connected to the other rotating shaft portion 87 via a pair of auxiliary bars 88 at the end portion on the side protruding into the housing 301. The pair of auxiliary bars 88 are arranged separately on the upper side and the lower side of the two substrates W supported by the support mechanism 70, and each auxiliary bar 88 is arranged extending in the left-right direction in the horizontal plane. .

  A bottom plate 872 for closing the hollow portion of the rotation shaft portion 87a is attached to an end portion of the one rotation shaft portion 87a that protrudes to the outside of the housing 301 in the pair of rotation shaft portions 87. As described above, the elastic member 84 is disposed between the slide shaft portion 81 inserted through the hollow portion of the rotation shaft portion 87a and the bottom plate 872 that closes the hollow portion.

  A pulley 873 is attached to the end of the pair of rotating shaft portions 87 on the side of the other rotating shaft portion 87b that protrudes to the outside of the housing 301 so as to close the hollow portion of the rotating shaft portion 87b. ing. As described above, the elastic member 84 is disposed between the slide shaft portion 81 inserted through the hollow portion of the rotation shaft portion 87b and the pulley 873 that closes the hollow portion.

  The pulley 873 is disposed such that the rotation center thereof coincides with the rotation axis L of the rotation shaft portion 87. A motor 89 is disposed near the pulley 873, and a belt 891 that transmits the driving force of the motor 89 to the pulley 873 is wound between the pulley 873 and the motor 89. In this configuration, when the motor 89 is rotated, the rotational force is transmitted to the pulley 873 via the belt 891, and the pulley 873 rotates. As a result, the rotating shaft portion 87b moves its axis (rotating shaft) L. Rotate to center.

  As described above, the pair of rotating shaft portions 87 a and 87 b are connected to each other via the pair of auxiliary bars 88. Therefore, when one rotating shaft portion 87b is rotated around the rotating shaft L, the other rotating shaft portion 87a is also rotated around its axis (rotating shaft) L in synchronization. That is, the rotational driving force of the motor 89 connected to one rotary shaft portion 87b is also transmitted to the other rotary shaft portion 87a.

  Here, as described above, each slide shaft portion 81 cannot rotate inside the rotation shaft portions 87a and 87b. Therefore, when the rotary shaft portions 87a and 87b are rotated by 180 ° around the rotary shaft L, each slide shaft portion 81 also rotates by 180 ° around the rotary shaft L. As a result, the support column 82 connected to each slide shaft portion 81 rotates 180 ° around the connection portion with the slide shaft portion 81 (that is, the central portion in the extending direction of the support column 82) in the vertical plane. To do. As a result, the two substrates W sandwiched between the sandwiching members 83 disposed on the support pillars 82 are inverted by 180 °. As described above, in the sandwiching and reversing mechanism 80, the two substrates W sandwiched between the two sandwiching portions 801 that are spaced apart in the vertical direction can be reversed at a time. ing.

<2-2. Operation of Substrate Inversion Device 100>
The operation of the substrate reversing apparatus 100 will be described with reference to FIG. 8 in addition to FIGS. FIG. 8 is a schematic diagram for explaining the operation of the substrate reversing apparatus 100. The operation of the substrate reversing apparatus 100 is executed by the control unit 60 controlling the units 70 and 80 included in the substrate reversing apparatus 100. In addition, the control part which controls each part 70 and 80 with which the substrate inversion apparatus 100 is provided separately from the control part 60 of the substrate processing apparatus 1 is provided, and the control part 60 of the substrate processing apparatus 1 performs overall control. It may be.

  In the following description, the substrate reversing device 100 included in the reversal delivery unit 30 will explain the operation of reversing the substrate W received from the transfer robot 12 and delivering the reversed substrate W to the transfer robot 22. Operation when the substrate reversing device 100 reverses the substrate W received from the transport robot 22 and causes the transfer robot 12 to receive the substrate W after reversal, and the substrate reversing device 100 included in the reversing unit 50 transports the substrate W. The operation for inverting the substrate W received from the robot 22 and causing the transfer robot 22 to receive the inverted substrate W again is the same as the operation described below.

  In a state where all the supporting members 74 are arranged at the supporting position A1 and all the holding members 83 are arranged at the separating position B2, the transfer robot 12 supports the substrate W one by one. The two transfer arms 121a and 121b are made to enter the inside of the housing 301 through the opening 303, and the substrate W supported by the upper transfer arm 121a is supported by the upper support portion 701. The substrate W supported by the lower transfer arm 121b is supported by the lower support portion 701. When the substrate W is supported by each support portion 701, the transfer robot 12 pulls out the transfer arms 121 a and 121 b from the inside of the casing 301 through the opening 303. As a result, two substrates W are transferred from the transfer robot 12 to the support mechanism 70, and the two substrates W are stacked in a horizontal posture with a gap in the vertical direction. It becomes the state supported by 701 (state shown in the upper part of FIG. 8).

  Subsequently, the cylinder 86 moves the bowl-shaped portion 85 from the open side end position C2 to the closed side end position C1. Then, the clamping member 83 is brought close to the substrate W while being supported by the cylinder 86 while receiving the elastic biasing force from the elastic member 84 until halfway, and receives the elastic biasing force from the elastic member 84 from the middle. In response, it is moved to the clamping position B1. By arranging each of the pair of clamping members 83 at the clamping position B1, the substrate W is in a state of being clamped by the pair of clamping members 83 from both edge portions. That is, the substrate W supported by each support portion 701 is supported by the support portion 701 and is also sandwiched by the sandwiching portion 801 (the state shown in the middle stage of FIG. 8).

  When the open / close detection unit 800 detects the closed state, all the support members 74 are moved synchronously from the support position A1 to the retracted position A2 by driving the cylinder 73. As a result, each support member 74 is arranged outside the inversion region M of the substrate W, and the two substrates W are stacked in a horizontal posture with a gap in the vertical direction. It will be in the state clamped by the clamping part 801 (state shown by the lower stage of FIG. 8). However, as described above, the cylinder 73 moves each support member 74 from the support position A1 to the retracted position A2 by moving the support member 74 obliquely downward. According to this configuration, the support member 74 is moved in a direction away from both the side surface and the lower surface of the substrate W at the same time. For example, when the support member is moved away from only the side surface, the support member that is in contact with the lower surface of the substrate W at the support position A1 is moved while being in contact with the substrate W, and the lower surface of the substrate W is damaged. There is a fear. On the other hand, when the support member is moved in a direction away from only the lower surface, the support member collides with the lower substrate W. According to the configuration according to this embodiment, such a situation does not occur. That is, the support member 74 can be appropriately moved to the retracted position A2 without damaging the substrate W by the support member 74.

  When all the support members 74 are moved from the support position A1 to the retracted position A2, the rotation shaft portions 87a and 87b are subsequently rotated by 180 ° around the rotation axis L by driving the motor 89. Then, the pair of slide shaft portions 81 is also rotated by 180 ° around the rotation axis L, and the support column 82 connected to each slide shaft portion 81 is 180 ° around the central portion in the extending direction in the vertical plane. Rotate. As a result, the substrate W sandwiched between the two sandwiching portions 801 is inverted by 180 °. That is, the two substrates W are inverted 180 ° at a time.

  When the two substrates W are inverted, all the supporting members 74 are moved synchronously from the retracted position A2 to the supporting position A1 by driving the cylinder 73. Thus, the inverted substrate W sandwiched between the sandwiching portions 801 is also supported by the support portion 701 while being sandwiched between the sandwiching portions 801 (see the middle stage of FIG. 8).

  When all the support members 74 are moved from the retracted position A2 to the support position A1, the cylinder 86 subsequently moves the flange 85 from the closed end position C1 to the open end position C2. Then, the clamping member 83 is moved from the clamping position B1 to the separation position B2. As a result, each clamping member 83 is arranged at a position spaced from the substrate W, and the two substrates W are stacked in a horizontal posture with a gap in the vertical direction. It will be in the state supported by 701 (refer the upper stage of Drawing 8). In this state, the transfer robot 22 causes the two transfer arms 221a and 221b to enter the inside of the housing 301 through the opening 302, and the substrate W supported by each support portion 701 is transferred to each transfer arm 221a. , 221b, and the two transfer arms 221a, 221b supporting the substrate W are extracted from the housing 301 through the opening 302.

<3. Operation of Substrate Processing Apparatus 1>
Next, the operation of the substrate processing apparatus 1 will be described with reference to FIGS. 1 to 3, 9, and 10. 9 and 10 are schematic diagrams for explaining the operation of the substrate processing apparatus 1. As described above, the substrate processing apparatus 1 includes the front surface cleaning unit SS that performs the scrub cleaning process on the surface of the substrate W and the back surface cleaning unit SSR that performs the scrub cleaning process on the back surface of the substrate W. Depending on the purpose, various pattern cleaning processes (for example, a cleaning process for cleaning only the front surface of the substrate W, a cleaning process for cleaning only the back surface of the substrate W, and a cleaning process for cleaning both the front and back surfaces of the substrate W) , Etc.). The type of cleaning process to be executed is set by a recipe that describes the transfer procedure of the substrate W (the transfer procedure of the substrate is also referred to as “flow”) and the processing conditions. In the following, the operation of the substrate processing apparatus 1 will be described by taking as an example a case where a cleaning process for cleaning both surfaces of the substrate W is executed.

  As described above, in the cleaning cell 20, the two cleaning units 21 are arranged separately on both sides of the virtual dividing line K. As described above, the two intermediate units 101 are also arranged separately on both sides of the virtual dividing line K. Hereinafter, the cleaning processing unit 21 disposed on the + Y side of the virtual dividing line K is also referred to as “first cleaning processing unit 21a”, and the intermediate unit 101 disposed on the + Y side of the virtual dividing line K is referred to as “first cleaning processing unit 21a”. Also referred to as “intermediate unit 101a”. Further, the cleaning processing unit 21 disposed on the −Y side of the virtual dividing line K is also referred to as “second cleaning processing unit 21b”, and the intermediate unit 101 disposed on the −Y side of the virtual dividing line K is referred to as “second”. Also referred to as “2 intermediate unit 101b”.

  When the carrier C containing the unprocessed substrate W is loaded into the carrier stage 11 of the indexer cell 10 from outside the apparatus by AGV or the like, the transfer robot 12 of the indexer cell 10 moves from the carrier C to the transfer arms 121a and 121b. Then, two unprocessed substrates W are taken out, and the two taken-out substrates W are transported to the reverse delivery unit 30 of the first intermediate unit 101a (step S11a). Subsequently, the transfer robot 12 takes out two processed substrates W placed on the placement unit PASS of the first intermediate unit 101a by the transfer arms 121a and 121b, and stores them in the carrier C (step S12a). .

  Next, the transfer robot 12 takes out two unprocessed substrates W from the carrier C by the transfer arms 121a and 121b, and transfers the two removed substrates W to the reverse delivery unit 30 of the second intermediate unit 101b. (Step S11b). Subsequently, the transfer robot 12 takes out two processed substrates W placed on the placement unit PASS of the second intermediate unit 101b by the transfer arms 121a and 121b, and stores them in the carrier C (step S12b). .

  The transfer operation of one cycle of the transfer robot 12 has been described above, and the transfer robot 12 repeatedly executes the transfer operation of one cycle (a series of operations from step S11a to step S12b). That is, the transfer robot 12 alternately accesses each of the two intermediate units 101a and 101b, and carries the substrate W in and out.

  In the reversal delivery unit 30 into which two unprocessed substrates W are loaded, the substrate reversing device 100 inverts the front and back of the two substrates W so that each substrate W faces upward. And The specific operation of the substrate reversing apparatus 100 is as described above.

  On the other hand, the transfer robot 22 of the cleaning processing cell 20 uses the transfer arms 221a and 221b, for example, two inverted substrates W (that is, the back surface of the first intermediate unit 101a is turned upside down 2). The two substrates W received are transferred one by one to each of the two back surface cleaning units SSR of the first cleaning processing unit 21a (step S21a).

  In the back surface cleaning unit SSR into which the substrate W has been loaded, the back surface cleaning process for the substrate W is executed. That is, in the back surface cleaning unit SSR, the cleaning liquid is supplied from the nozzle 213 to the back surface of the substrate W while the substrate W with the back surface facing upward is held and rotated by the spin chuck 211. In this state, the cleaning brush 212 scans in the horizontal direction in contact with or close to the back surface of the substrate W, so that the back surface of the substrate W is scrubbed.

  When the back surface cleaning processing of the substrate W is completed in each of the two back surface cleaning units SSR of the first cleaning processing unit 21a, the transfer robot 22 uses the transfer arms 221a and 221b to each of the two back surface cleaning units SSR. The substrate W after the back surface cleaning process is taken out in order, and the two taken out substrates W are transferred to the reversing unit 50 of the first intermediate unit 101a (step S22a).

  In the reversing unit 50 in which the two substrates W after the back surface cleaning processing are carried in, the substrate reversing device 100 reverses the front and back of the two substrates W so that each substrate W faces upward. State.

  When the two substrates W are reversed by the reversing unit 50 of the first intermediate unit 101a, the transport robot 22 is transported from the reversing unit 50 by the transport arms 221a and 221b. The two substrates W) whose surfaces are directed upward are received, and the two received substrates W are transported one by one to each of the two surface cleaning sections SS of the first cleaning processing unit 21a (step S23a).

  In the surface cleaning unit SS into which the substrate W has been loaded, the surface cleaning process of the substrate W is executed. That is, in each surface cleaning unit SS, the cleaning liquid is supplied from the nozzle 203 to the surface of the substrate W while the substrate W with the surface facing upward is held and rotated by the spin chuck 201. In this state, the cleaning brush 202 scans in the horizontal direction in contact with or close to the surface of the substrate W, so that the surface of the substrate W is scrubbed.

  When the surface cleaning process of the substrate W is completed in each of the two surface cleaning units SS of the first cleaning processing unit 21a, the transfer robot 22 is transferred to each of the two surface cleaning units SS by the transfer arms 221a and 221b. The substrates W after the surface cleaning process are taken out in order, and each of the two taken out substrates W is transferred to the placement unit PASS of the first intermediate unit 101a (step S24a). The processed substrate W placed on the placement unit PASS is taken out by the transfer robot 12 of the indexer cell 10 and stored in the carrier C.

  Subsequently, the transfer robot 22 receives the two inverted substrates W (that is, the two substrates W whose back faces upward) from the inversion delivery unit 30 of the second intermediate unit 101b, and receives the received substrates. Two substrates W are transferred one by one to each of the two back surface cleaning units SSR of the second cleaning processing unit 21b (step S21b).

  When the back surface cleaning process of the substrate W is completed in each of the two back surface cleaning units SSR of the second cleaning processing unit 21b, the transfer robot 22 is transferred to each of the two back surface cleaning units SSR by the transfer arms 221a and 221b. The substrate W after the back surface cleaning processing is taken out in order, and the two taken out substrates W are transferred to the reversing unit 50 of the second intermediate unit 101b (step S22b).

  When the two substrates W are reversed by the reversing unit 50 of the second intermediate unit 101b, the transport robot 22 is transported from the reversing unit 50 by the transport arms 221a and 221b. The two substrates W) whose surfaces are directed upward are received, and the two received substrates W are transported one by one to each of the two surface cleaning sections SS of the second cleaning processing unit 21b (step) S23b).

  When the surface cleaning process of the substrate W is completed in each of the two surface cleaning units SS of the second cleaning processing unit 21b, the transfer robot 22 uses the transfer arms 221a and 221b, respectively, of the two surface cleaning units SS. The substrate W after the surface cleaning process is taken out in order, and each of the two taken out substrates W is transferred to the placement part PASS of the second intermediate unit 101b (step S24b). When the processed substrate W is placed on the placement unit PASS, the processed substrate W is taken out by the transfer robot 12 of the indexer cell 10 and stored in the carrier C.

  Note that the transfer robot 22 preferably includes two or more pairs of transfer arms 221a and 221b, and the target substrate W supported by any of the transfer arms in each of the above-described series of transfer operations is processed. In the case of loading into a portion (each processing portion of the front surface cleaning portion SS, the back surface cleaning portion SSR, and the reversing portion 50), first, the substrate W previously processed in the processing portion is taken out with an empty transfer arm. Therefore, the target substrate W supported by another transfer arm is carried into the processing unit. That is, in this case, the transfer robot 22 performs the replacement operation of the substrate W when accessing these processing units.

  The above is the one-cycle transfer operation of the transfer robot 22, and the transfer robot 22 repeatedly executes this one-cycle transfer operation (a series of operations from step S21a to step S24b). That is, the transfer robot 22 converts the unprocessed substrate W received via the first intermediate unit 101a into the back surface cleaning unit SSR of the first cleaning processing unit 21a, the reversing unit 50 of the first intermediate unit 101a, the first The first cleaning unit 21a is sequentially transported to the surface cleaning unit SS and the placement unit PASS of the first intermediate unit 101a. Further, the transfer robot 22 converts the unprocessed substrate W received via the second intermediate unit 101b into the back surface cleaning unit SSR of the second cleaning processing unit 21b, the reversing unit 50 of the second intermediate unit 101b, the first The two cleaning units 21b are sequentially transported to the surface cleaning unit SS and the mounting unit PASS of the second intermediate unit 101b. That is, the unprocessed substrate W delivered from the indexer cell 10 via the intermediate unit 101 is set as a recipe in each processing unit arranged on the same side as the intermediate unit 101 and the virtual dividing line K. After being subjected to the cleaning process, it is delivered to the indexer cell 10 via the intermediate unit 101 again.

<4. Effect>
According to the above embodiment, the operation path of the transfer robot 22 is made efficient, and the movement amount of the transfer robot 22 is shortened. This point will be specifically described with reference to FIGS. 11 and 12. The upper part of FIG. 11 schematically shows an example of the transition of the height position while the transfer robot 22 performs one cycle of the transfer operation in the substrate processing apparatus 1 according to this embodiment (“ Graph labeled "this embodiment"). In the lower part of FIG. 11, the transition of the height position of the transfer robot 922 when a series of operations similar to those of the substrate processing apparatus 1 is executed in the substrate processing apparatus 9 illustrated in FIG. 13 is a comparative example. (Graph labeled “comparative example”). The upper part of FIG. 12 schematically shows an example of the transition of the turning position while the transfer robot 22 performs one cycle of the transfer operation in the substrate processing apparatus 1 according to this embodiment (“Book”). Graph labeled "Embodiment"). In the lower part of FIG. 12, the transition of the turning position of the transfer robot 922 when a series of operations similar to those of the substrate processing apparatus 1 is executed in the substrate processing apparatus 9 illustrated in FIG. (Graph labeled “Comparative Example”). 11 and 12, “RP” means the reverse delivery units 30 and 930, “P” means the placement unit included in the placement units 40 and 940, and “R” indicates the reverse units 50 and 950. means. “SS” means the front surface cleaning unit SS, and “SSR” means the back surface cleaning unit SSR.

  However, the substrate processing apparatus 9 as a comparative example illustrated in FIG. 13 includes an indexer cell 910 having a transfer robot 912, a transfer robot 922, and two cleaning processing units 921a and 921b disposed therebetween. Are connected to each other, and one intermediate unit 901 is arranged at a connecting portion between the cells. In the intermediate unit 901, an inversion delivery unit 930, a placement unit 940, and an inversion unit 950 are stacked in the vertical direction in order from the bottom. Further, of the two cleaning processing units 921a and 921b included in the cleaning processing cell 920, four surface cleaning units SS1 to SS4 are stacked in one cleaning processing unit 921a. The other cleaning processing unit 921b includes four back surface cleaning units SSR1 to SSR4 that are stacked.

  When comparing the upper stage (graph according to the present embodiment) and the lower stage (graph according to the comparative example) in FIG. 11, in the substrate processing apparatus 1 according to the present embodiment, the transfer robot 22 includes the reverse delivery unit 30 (RP ) When the substrate W received from the reversing unit 50 (R) is carried into the front surface cleaning unit SS. It can be seen that the amount of movement is also stable and small. In the substrate processing apparatus 1, the components that are continuously accessed by the transfer robot 22 are arranged so as to gather as much as possible in the vertical direction (specifically, the front surface cleaning unit SS of the back surface cleaning unit SSR). This is because the arrangement direction with respect to the reverse transfer section 30 is equal to the arrangement direction with respect to the reverse section 50). According to this configuration, the separation distance along the vertical direction between the back surface cleaning unit SSR and the reverse delivery unit 30 and the separation distance along the vertical direction between the surface cleaning unit SS and the reversal unit 50 are both kept small (FIG. 9). reference). As a result, as described above, the vertical movement amount when the substrate W received by the transfer robot 22 from the reversal delivery unit 30 is carried into the back surface cleaning unit SSR, and the substrate W received by the transfer robot 22 from the reversal unit 50 are surfaced. The amount of vertical movement when carrying into the cleaning unit SS is both kept small, and the amount of movement of the transfer robot 22 is kept small as a whole. As a result, the time required for the transfer operation of the transfer robot 22 in one cycle is shortened, and the throughput of the substrate processing apparatus 1 is improved. As described above, according to the above-described embodiment, the substrate processing apparatus can be used without increasing the number of transfer robots and cleaning units (that is, without increasing the footprint of the apparatus and without increasing the manufacturing cost). 1 throughput can be effectively improved.

  Comparing the upper stage (graph according to the present embodiment) and the lower stage (graph according to the comparative example) of FIG. 12, in the substrate processing apparatus 1 according to this embodiment, the turning angle in each operation of the transfer robot 22 is stable. It can be seen that it is kept small. In the substrate processing apparatus 1, at least one intermediate unit 101 and one cleaning processing unit 21 are arranged on both sides of the virtual dividing line K (that is, each of the steps required for a series of processing on the substrate W). Constituent elements (at least one surface cleaning unit SS, back surface cleaning unit SSR, reverse delivery unit 30, reverse unit 50, and placement unit PASS are arranged on both sides of the virtual dividing line K), a transfer robot 22 transports the substrate W received from one intermediate unit 101 to the cleaning processing unit 21 disposed on the same side as the intermediate unit 101 and the virtual dividing line K, and is processed by the cleaning processing unit 21. This is because the transferred substrate W is transferred to the intermediate unit 101 disposed on the same side as the cleaning processing unit 21 and the virtual dividing line K (FIG. 1). Reference). According to this configuration, since the transfer robot 22 does not perform a large turning operation across the virtual dividing line K, the turning angle of the transfer robot 22 can be stably kept small and the turning movement amount of the transfer robot 22 can be reduced as a whole. As small as possible. That is, not only the vertical movement amount of the transfer robot 22 but also the turning movement amount can be reduced, and the movement amount of the transfer robot 22 can be further reduced as a whole. As a result, the time required for the transfer operation of the transfer robot 22 in one cycle is further shortened, and the throughput of the substrate processing apparatus 1 is further improved.

  Further, according to the above embodiment, the back surface cleaning unit SSR is disposed below the front surface cleaning unit SS, and the reverse delivery unit 30 is disposed below the reversing unit 50. According to this configuration, since the substrate W after the surface cleaning passes through the path above the path through which the substrate W before the surface cleaning passes, contamination of the substrate W after the surface cleaning is suppressed.

  Further, according to the above-described embodiment, each of the two intermediate units 101 is arranged on the circumference of the virtual circle Q around the transfer robot 22. According to this configuration, the transfer robot 22 can access any of the two intermediate units 101 in the same transfer time.

  Further, according to the above embodiment, the intermediate unit 101 includes the delivery unit PASS used for delivering the substrate W between the transfer robot 22 and the transfer robot 12. According to this configuration, when it is not necessary to reverse the substrate W at the time of delivery, the substrate W can be delivered between the transfer robot 22 and the transfer robot 12 via the delivery unit PASS.

  Moreover, in said embodiment, the board | substrate inversion apparatus 100 with which each of the inversion delivery part 30 and the inversion part 50 is provided can invert two board | substrates W at once appropriately. Thereby, the throughput in the substrate processing apparatus 1 can be improved.

<5. Modification>
In the above embodiment, in each cleaning processing unit 21, the back surface cleaning unit SSR is disposed below the front surface cleaning unit SS, and in the intermediate unit 101, the reverse delivery unit 30 is lower than the reverse unit 50. Although the rear surface cleaning unit SSR is disposed above the front surface cleaning unit SS in each cleaning processing unit 21, the reversal delivery unit 30 is disposed above the reversing unit 50 in the intermediate unit 101. It may be arranged.

  In the above embodiment, the number of intermediate units 101 of the substrate processing apparatus 1 is not necessarily two, but may be one or three or more. In addition, the number of placement units PASS included in the placement unit 40 of the intermediate unit 101 is not necessarily six. Further, the number of the front surface cleaning unit SS and the back surface cleaning unit SSR mounted in each cleaning processing unit 21 of the substrate processing apparatus 1 is not limited to the above example.

  In the above embodiment, the substrate reversing device 100 is for reversing two substrates W at the same time. However, the substrate reversing device 100 is for reversing one substrate W. Alternatively, three or more substrates W may be reversed at the same time. For example, in the support mechanism 70, four support members 74 are disposed on each support column 72, and in the sandwich reversing mechanism 80, four support members 82 are disposed on each support column 82. The substrate W can be reversed at the same time.

  Further, in the substrate reversing device 100 according to the above-described embodiment, a detection unit that detects an abnormality of the corresponding substrate W may be provided for each of the two substrates W supported by the support mechanism 70. Good. The detection unit can detect the presence / absence of the corresponding substrate W, an abnormal posture, and the like using, for example, an optical sensor.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 10 Indexer cell 12 Transfer robot 20 Cleaning process cell 21,21a, 21b Cleaning process unit SS Surface cleaning part SSR Back surface cleaning process part 22 Transfer robot 101, 101a, 101b Intermediate unit 30 Reverse delivery part 40 Mounting unit 50 reversing unit 60 control unit 100 substrate reversing device W substrate

Claims (5)

A substrate processing apparatus,
A cleaning processing block having a processing unit in which a front surface cleaning unit that cleans the surface of the substrate and a back surface cleaning unit that cleans the back surface of the substrate are stacked, and a first transfer robot;
An indexer block having a second transfer robot, delivering an unprocessed substrate to the cleaning processing block and receiving a processed substrate from the cleaning processing block;
An intermediate unit provided in a connecting portion between the indexer block and the cleaning processing block;
With
The intermediate unit is
An inversion delivery unit that inverts a substrate delivered from one of the second transfer robot and the first transfer robot and causes the other robot to receive the substrate;
A reversing unit that is stacked with the reversing delivery unit, and reverses the substrate delivered from the first transport robot to be received by the first transport robot;
With
The substrate processing apparatus, wherein a laminating direction of the back surface cleaning unit with respect to the front surface cleaning unit is equal to a laminating direction of the reverse transfer unit with respect to the reversing unit. The substrate processing apparatus according to claim 1,
The substrate processing apparatus, wherein the back surface cleaning unit is disposed below the front surface cleaning unit, and the reverse delivery unit is disposed below the reverse unit. The substrate processing apparatus according to claim 1, wherein:
A plurality of the intermediate units are provided,
Each of the plurality of intermediate units is
A substrate processing apparatus disposed on a circumference of a virtual circle centering on the first transfer robot. A substrate processing apparatus according to any one of claims 1 to 3,
Including two processing units and two intermediate units;
A straight line passing through the arrangement position of the first transfer robot along the arrangement direction of the cleaning processing block and the indexer block, as a virtual dividing line,
The two processing units are arranged separately on both sides of the virtual dividing line, and the two intermediate units are arranged separately on both sides of the virtual dividing line,
The first transfer robot is
While transporting the substrate received from the intermediate unit to the processing unit disposed on the same side as the intermediate unit and the virtual dividing line,
The substrate processed by the processing unit is transported to an intermediate unit disposed on the same side as the processing unit and the virtual dividing line.
Substrate processing equipment. A substrate processing apparatus according to any one of claims 1 to 4,
The intermediate unit is
The substrate disposed between the reversing delivery unit and the reversing unit supports a substrate delivered from one of the second transport robot and the first transport robot, and the supported substrate is supported by the other robot. The delivery part,
A substrate processing apparatus comprising:

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