CN1808280B

CN1808280B - Method for removing static on substrate, apparatus and base thereof

Info

Publication number: CN1808280B
Application number: CN 200610004242
Authority: CN
Inventors: 许朝钦
Original assignee: AU Optronics Corp
Current assignee: AU Optronics Corp
Priority date: 2006-02-13
Filing date: 2006-02-13
Publication date: 2010-05-12
Anticipated expiration: 2026-02-13
Also published as: CN1808280A

Abstract

Disclosed is a machine bench for processing base boards. The machine bench comprises a base plate, a supporting structure and a projecting column. The supporting structure is placed on the base plate and supports the base plate. The projecting column is placed on the base plate, where in the ion gas can be sprayed out by the supporting structure and/or the projecting column for eliminating statistic charge on the base board.

Description

Can remove method and the board and the pedestal of static on the substrate

Technical field

The present invention is about a kind of board, particularly about a kind of exposure bench.

Background technology

Fig. 1 a shows traditional exposure bench 1, and it comprises cavity 2, pedestal 6 and X-ray generator 4.Pedestal 6 and X-ray generator 4 all are located among the cavity 2.Glass substrate 3 is positioned on the pedestal 6.When desire was eliminated glass substrate 3 lip-deep static, X-ray generator 4 can penetrate X-ray 5 towards glass substrate 3, eliminates static with utilization X-ray 5.Yet, utilize the mode of X-ray irradiation only can remove the static of glass substrate 3 upper surfaces.The static of glass substrate 3 lower surfaces still can exist through after the above-mentioned steps, and produces Electrostatic Absorption with pedestal 6 surfaces.Therefore, shown in Fig. 1 b, when replacing glass substrate 3 when the supporting construction in the pedestal 6 (support column) 7 risings, the electrostatic force of glass substrate 3 lower surfaces can cause the situation of glass substrate 3 unbalance stress, and glass substrate 3 is bent and the situation of fragmentation easily.

Summary of the invention

In order to solve the problem of above-mentioned conventional art, the invention provides a kind of board, in order to handle a substrate, this board comprises: a pedestal; At least one supporting construction is arranged at this pedestal, in order to support this substrate; At least one outstanding post is arranged at this pedestal upper surface; An and ionized gas generator, be connected to this pedestal, and with this supporting construction and should be communicated with by outstanding post, wherein ionized gas optionally maybe should be sprayed towards this substrate by outstanding post by this supporting construction, or both spray towards this base lower surface and upper surface respectively simultaneously to reach this outstanding post by this supporting construction, so as to removing the static charge of this base lower surface and upper surface.

Utilization the present invention can effectively eliminate the static of substrate surface, reduces the Electrostatic Absorption power between substrate and the pedestal, and then the unbalance stress phenomenon when preventing that supporting construction from raising substrate, avoids the situation of substrate generation fragmentation.

Description of drawings

Fig. 1 a shows traditional exposure bench.

Fig. 1 b is presented in the conventional art, the situation of top glass substrate at the bottom of the supporting construction.

Fig. 2 a shows the pedestal of the exposure bench of first embodiment of the invention.

Fig. 2 b shows that supporting construction is positioned at the situation of the second place in the first embodiment of the invention.

Fig. 3 a display base plate is placed in the situation on the pedestal.

Fig. 3 b display support structure rises the situation of substrate.

Fig. 3 c shows the primary structure of the exposure bench of first embodiment of the invention.

Fig. 3 d shows that the exposure bench of first embodiment of the invention has the situation of X-ray generator.

Fig. 4 a shows the exposure bench of second embodiment of the invention.

Fig. 4 b shows in the second embodiment of the invention that the outstanding band of column is around the situation of substrate.

Fig. 5 shows the exposure bench of third embodiment of the invention.

The main element symbol description

1～exposure bench; 2～cavity;

3～substrate; 4～X-ray generator;

5～X-ray; 6～pedestal;

7～supporting construction; 100,100 ', 200～exposure bench;

110～pedestal; 111～supporting construction;

112～perforate; 113～pipeline;

114～ionized gas generator; 115～ionized gas;

116～outstanding post; 117～blow vent;

120～cavity; 130～X-ray generator;

131～X-ray.

Embodiment

First embodiment

Fig. 2 a shows the pedestal 110 of the exposure bench of the first embodiment of the present invention.In this embodiment, pedestal 110 is provided with a plurality of supporting constructions (support column) 111 and a plurality of perforate 112.Supporting construction 111 is provided with in the mode of arranged, and can move between the primary importance (as the position as shown in Fig. 2 a) and the second place (position as shown in Fig. 2 b).Shown in Fig. 3 a, when described supporting construction 111 was positioned at this second place, substrate 3 was placed on this pedestal 110.Treat substrate 3 after overexposure, shown in Fig. 3 b, supporting construction 111 rises to this primary importance, so that substrate 3 is risen.With reference to Fig. 3 c, exposure bench 100 comprises cavity 120, pedestal 110 and ionized gas generator 114.Pedestal 110 is located among the cavity 120.Ionized gas generator 114 is located among the pedestal 110.Be provided with pipeline 113 in the pedestal 110 and be communicated with described perforate 112, ionized gas generator 114 promptly is positioned among this pipeline 113.When desire was eliminated the static on substrate 3 surfaces, substrate 3 was placed on this pedestal 110.Ionized gas 115 is produced by ionized gas generator 114, and by pipeline 113, the lower surface of contact substrate 3 is so as to eliminating the static of substrate 3 lower surfaces.

With reference to Fig. 3 d, exposure bench 100 can also comprise X-ray generator 130, is located among this cavity 120.Ionized gas 115 X-ray 131 that X-ray generator 130 is produced of can arranging in pairs or groups is eliminated the upper surface of substrate 3 and the static of lower surface simultaneously.

Second embodiment

Fig. 4 a shows the exposure bench 100 ' of second embodiment of the invention.In this embodiment, exposure bench 100 ' also comprises a plurality of outstanding posts (nozzle) 116, is located at the upper surface of pedestal 110.When blowing ionized gas 115, ionized gas 115 can be from described outstanding post 116 ejections, and from the upper surface of the top contact substrate 3 of substrate 3, eliminate the static of substrate 3 upper surfaces whereby.In the second embodiment of the present invention, the X-ray that needn't use the X-ray generator to be produced is eliminated the static of upper surface of base plate.

With reference to Fig. 4 b, in the time of on substrate 3 is placed in pedestal 110, outstanding post 116 can be located at substrate 3 the periphery and around substrate 3, evenly to provide ionized gas to substrate 3 fully.

In above-mentioned first and second embodiment, perforate 112 can be communicated with a vacuum line (not illustrating) in addition, in order to when substrate 3 is exposed, with vacuum action absorption substrate 3, and then strengthens the degree of stability of substrate 3 when exposure.In addition, after finishing the exposure manufacture craft, exposure bench can be earlier to described perforate 112 supply dry gas, to abolish vacuum, then again to described perforate 112 supply ionized gass, to eliminate the static of substrate 3 lower surfaces.

The 3rd embodiment

Fig. 5 shows the exposure bench 200 of the third embodiment of the present invention.In this embodiment, the central authorities of supporting construction 111 are provided with blow vent 117, blow vent 117 connecting pipelines 113.When desire was eliminated the static charge of substrate 3 lower surfaces, ionized gas generator 114 can produce ionized gass 115, and through pipeline 113 and described blow vent 117 and the lower surface of contact substrate 3.

The a plurality of perforates among first embodiment of can arranging in pairs or groups of the exposure bench 200 of the 3rd embodiment are to increase the contact area of ionized gas and base lower surface, the static charge elimination effect of promoting base lower surface.Perhaps, the exposure bench 200 of the 3rd embodiment X-ray generator among first embodiment of also can arranging in pairs or groups is to eliminate the static charge of upper surface of base plate.

The exposure bench 200 of the 3rd embodiment a plurality of outstanding post among second embodiment of also can arranging in pairs or groups, the upper surface from the top of this substrate to this substrate provides ionized gas, to eliminate the static charge of upper surface of base plate.

Similarly, blow vent 117 can be communicated with a vacuum line (not illustrating) in addition, in order to when substrate 3 exposes, with vacuum action absorption substrate 3, and then strengthens the degree of stability of substrate 3 when exposure.After finishing the exposure manufacture craft, exposure bench can be earlier to described blow vent 117 supply dry gas, to abolish vacuum, then again to described blow vent 117 supply ionized gass, to eliminate the static of substrate 3 lower surfaces.

Though the present invention with preferred embodiment openly as above, so it is not in order to limit the present invention; Any insider without departing from the spirit and scope of the present invention, still can do a little change and retouching.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.

Claims

1. board, in order to treatment substrate, this board comprises:

Pedestal;

At least one supporting construction is arranged at this pedestal, in order to support this substrate;

At least one outstanding post is arranged at this pedestal upper surface; And

The ionized gas generator, be connected to this pedestal, and with this supporting construction and should be communicated with by outstanding post, wherein ionized gas optionally maybe should be sprayed towards this substrate by outstanding post by this supporting construction, or both spray towards this base lower surface and upper surface respectively simultaneously to reach this outstanding post by this supporting construction, so as to removing the static charge of this base lower surface and upper surface.

2. board according to claim 1, wherein this at least one supporting construction is a support column, is provided with a blow vent, with the supply dry gas.

3. board according to claim 1, this at least one this substrate of supporting construction butt wherein, between this at least one outstanding post and this substrate at a distance of a both set a distance.

4. board according to claim 1, wherein this pedestal is rectangular substantially, and this at least one outstanding post is a plurality of, be arranged at this pedestal around.

5. board according to claim 1, wherein this at least one supporting construction is a plurality of, with arranged on this pedestal, and this at least one outstanding post outstanding be arranged at this substrate around.

6. board according to claim 1 wherein should have nozzle by outstanding post.

7. pedestal in order to supporting substrate, comprising:

At least one outstanding post is arranged at this pedestal upper surface, towards this upper surface of base plate ejection ionized gas, so as to removing the static charge of this upper surface of base plate; And

The ionized gas generator is connected to this at least one outstanding post, and wherein ionized gas is sprayed towards this upper surface of base plate by this at least one outstanding post, so as to removing the static charge of this upper surface of base plate.

8. board according to claim 7, wherein this pedestal is rectangular substantially, and this at least one outstanding post is a plurality of, be arranged at this pedestal upper surface around.

9. board, in order to treatment substrate, this board comprises:

Cavity;

Pedestal is located among this cavity, and this pedestal comprises a plurality of perforates and pipeline, and this base-plates surface is located in described perforate, and this pipeline is located among this pedestal, the described perforate of this pipeline connection;

At least one supporting construction is arranged on this pedestal, and with this pipeline connection, in order to support this substrate;

At least one outstanding post is arranged at this pedestal upper surface, and with this pipeline connection; And

The ionized gas generator, be located among this pipeline, and generation ionized gas, wherein this ionized gas this pipeline of process and described perforate, this at least one supporting construction are with this at least one outstanding post and simultaneously respectively towards this base lower surface and upper surface ejection, so as to removing the static charge of this base lower surface and upper surface.

10. board according to claim 9, it also comprises the X-ray generator, is located among this cavity, this X-ray generator provides X-ray towards the upper surface of this substrate, is positioned at the static charge of this upper surface of base plate so as to removal.