CN1808280A - Method for removing static on substrate, apparatus and base thereof - Google Patents
Method for removing static on substrate, apparatus and base thereof Download PDFInfo
- Publication number
- CN1808280A CN1808280A CN 200610004242 CN200610004242A CN1808280A CN 1808280 A CN1808280 A CN 1808280A CN 200610004242 CN200610004242 CN 200610004242 CN 200610004242 A CN200610004242 A CN 200610004242A CN 1808280 A CN1808280 A CN 1808280A
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- CN
- China
- Prior art keywords
- substrate
- pedestal
- supporting construction
- ionized gas
- outstanding post
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims description 81
- 230000003068 static effect Effects 0.000 title claims description 28
- 238000000034 method Methods 0.000 title description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 42
- 238000010276 construction Methods 0.000 claims description 30
- 239000007921 spray Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000013467 fragmentation Methods 0.000 description 3
- 238000006062 fragmentation reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Images
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Disclosed is a machine bench for processing base boards. The machine bench comprises a base plate, a supporting structure and a projecting column. The supporting structure is placed on the base plate and supports the base plate. The projecting column is placed on the base plate, where in the ion gas can be sprayed out by the supporting structure and/or the projecting column for eliminating statistic charge on the base board.
Description
Technical field
The present invention is about a kind of board, particularly about a kind of exposure bench.
Background technology
Fig. 1 a shows traditional exposure bench 1, and it comprises cavity 2, pedestal 6 and X-ray generator 4.Pedestal 6 and X-ray generator 4 all are located among the cavity 2.Glass substrate 3 is positioned on the pedestal 6.When desire was eliminated glass substrate 3 lip-deep static, X-ray generator 4 can penetrate X-ray 5 towards glass substrate 3, eliminates static with utilization X-ray 5.Yet, utilize the mode of X-ray irradiation only can remove the static of glass substrate 3 upper surfaces.The static of glass substrate 3 lower surfaces still can exist through after the above-mentioned steps, and produces Electrostatic Absorption with pedestal 6 surfaces.Therefore, shown in Fig. 1 b, when replacing glass substrate 3 when the supporting construction in the pedestal 6 (support column) 7 risings, the electrostatic force of glass substrate 3 lower surfaces can cause the situation of glass substrate 3 unbalance stress, and glass substrate 3 is bent and the situation of fragmentation easily.
Summary of the invention
In order to solve the problem of above-mentioned conventional art, the invention provides a kind of board, in order to handle a substrate, this kind board comprises a pedestal, a supporting construction and an outstanding post.Supporting construction is arranged at this pedestal and supports this substrate.Outstanding post is arranged on this pedestal, wherein ionized gas optionally by this supporting construction maybe should outstanding post towards this substrate ejection, or this supporting construction and should outstanding post both simultaneously towards this substrate ejection, so as to removing the static charge on this substrate.
Utilization the present invention can effectively eliminate the static of substrate surface, reduces the Electrostatic Absorption power between substrate and the pedestal, and then the unbalance stress phenomenon when preventing that supporting construction from raising substrate, avoids the situation of substrate generation fragmentation.
Description of drawings
Fig. 1 a shows traditional exposure bench.
Fig. 1 b is presented in the conventional art, the situation of top glass substrate at the bottom of the supporting construction.
Fig. 2 a shows the pedestal of the exposure bench of first embodiment of the invention.
Fig. 2 b shows that supporting construction is positioned at the situation of the second place in the first embodiment of the invention.
Fig. 3 a display base plate is placed in the situation on the pedestal.
Fig. 3 b display support structure rises the situation of substrate.
Fig. 3 c shows the primary structure of the exposure bench of first embodiment of the invention.
Fig. 3 d shows that the exposure bench of first embodiment of the invention has the situation of X-ray generator.
Fig. 4 a shows the exposure bench of second embodiment of the invention.
Fig. 4 b shows in the second embodiment of the invention that the outstanding band of column is around the situation of substrate.
Fig. 5 shows the exposure bench of third embodiment of the invention.
The main element symbol description
1～exposure bench; 2～cavity;
3～substrate; 4～X-ray generator;
5～X-ray; 6～pedestal;
7～supporting construction; 100,100 ', 200～exposure bench;
110～pedestal; 111～supporting construction;
112～perforate; 113～pipeline;
114～ionized gas generator; 115～ionized gas;
116～outstanding post; 117～blow vent;
120～cavity; 130～X-ray generator;
131～X-ray.
Embodiment
First embodiment
Fig. 2 a shows the pedestal 110 of the exposure bench of the first embodiment of the present invention.In this embodiment, pedestal 110 is provided with a plurality of supporting constructions (support column) 111 and a plurality of perforate 112.Supporting construction 111 is provided with in the mode of arranged, and can move between the primary importance (as the position as shown in Fig. 2 a) and the second place (position as shown in Fig. 2 b).Shown in Fig. 3 a, when described supporting construction 111 was positioned at this second place, substrate 3 was placed on this pedestal 110.Treat substrate 3 after overexposure, shown in Fig. 3 b, supporting construction 111 rises to this primary importance, so that substrate 3 is risen.With reference to Fig. 3 c, exposure bench 100 comprises cavity 120, pedestal 110 and ionized gas generator 114.Pedestal 110 is located among the cavity 120.Ionized gas generator 114 is located among the pedestal 110.Be provided with pipeline 113 in the pedestal 110 and be communicated with described perforate 112, ionized gas generator 114 promptly is positioned among this pipeline 113.When desire was eliminated the static on substrate 3 surfaces, substrate 3 was placed on this pedestal 110.Ionized gas 115 is produced by ionized gas generator 114, and by pipeline 113, the lower surface of contact substrate 3 is so as to eliminating the static of substrate 3 lower surfaces.
With reference to Fig. 3 d, exposure bench 100 can also comprise X-ray generator 130, is located among this cavity 120.Ionized gas 115 X-ray 131 that X-ray generator 130 is produced of can arranging in pairs or groups is eliminated the upper surface of substrate 3 and the static of lower surface simultaneously.
Utilization the present invention can effectively eliminate the static of substrate surface, reduces the Electrostatic Absorption power between substrate and the pedestal, and then the unbalance stress phenomenon when preventing that supporting construction from raising substrate, avoids the situation of substrate generation fragmentation.
Second embodiment
Fig. 4 a shows the exposure bench 100 ' of second embodiment of the invention.In this embodiment, exposure bench 100 ' also comprises a plurality of outstanding posts (nozzle) 116, is located at the upper surface of pedestal 110.When blowing ionized gas 115, ionized gas 115 can be from described outstanding post 116 ejections, and from the upper surface of the top contact substrate 3 of substrate 3, eliminate the static of substrate 3 upper surfaces whereby.In the second embodiment of the present invention, the X-ray that needn't use the X-ray generator to be produced is eliminated the static of upper surface of base plate.
With reference to Fig. 4 b, in the time of on substrate 3 is placed in pedestal 110, outstanding post 116 can be located at substrate 3 the periphery and around substrate 3, evenly to provide ionized gas to substrate 3 fully.
In above-mentioned first and second embodiment, perforate 112 can be communicated with a vacuum line (not illustrating) in addition, in order to when substrate 3 is exposed, with vacuum action absorption substrate 3, and then strengthens the degree of stability of substrate 3 when exposure.In addition, after finishing the exposure manufacture craft, exposure bench can be earlier to described perforate 112 supply dry gas, to abolish vacuum, then again to described perforate 112 supply ionized gass, to eliminate the static of substrate 3 lower surfaces.
The 3rd embodiment
Fig. 5 shows the exposure bench 200 of the third embodiment of the present invention.In this embodiment, the central authorities of supporting construction 111 are provided with blow vent 117, blow vent 117 connecting pipelines 113.When desire was eliminated the static charge of substrate 3 lower surfaces, ionized gas generator 114 can produce ionized gass 115, and through pipeline 113 and described blow vent 117 and the lower surface of contact substrate 3.
The a plurality of perforates among first embodiment of can arranging in pairs or groups of the exposure bench 200 of the 3rd embodiment are to increase the contact area of ionized gas and base lower surface, the static charge elimination effect of promoting base lower surface.Perhaps, the exposure bench 200 of the 3rd embodiment X-ray generator among first embodiment of also can arranging in pairs or groups is to eliminate the static charge of upper surface of base plate.
The exposure bench 200 of the 3rd embodiment a plurality of outstanding post among second embodiment of also can arranging in pairs or groups, the upper surface from the top of this substrate to this substrate provides ionized gas, to eliminate the static charge of upper surface of base plate.
Similarly, blow vent 117 can be communicated with a vacuum line (not illustrating) in addition, in order to when substrate 3 exposes, with vacuum action absorption substrate 3, and then strengthens the degree of stability of substrate 3 when exposure.After finishing the exposure manufacture craft, exposure bench can be earlier to described blow vent 117 supply dry gas, to abolish vacuum, then again to described blow vent 117 supply ionized gass, to eliminate the static of substrate 3 lower surfaces.
Though the present invention with preferred embodiment openly as above, so it is not in order to limit the present invention; Any insider without departing from the spirit and scope of the present invention, still can do a little change and retouching.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (14)
1. board, in order to handle a substrate, this board comprises:
One pedestal;
At least one supporting construction is arranged at this pedestal, in order to support this substrate;
At least one outstanding post is arranged at this pedestal; And
One ionized gas generator, be connected to this pedestal, and with this supporting construction and should be communicated with by outstanding post, wherein ionized gas optionally maybe should be sprayed towards this substrate by outstanding post by this supporting construction, or this supporting construction and should outstanding post both simultaneously towards this substrate ejection, so as to removing the static charge on this substrate surface.
2. board according to claim 1, wherein this at least one supporting construction is provided with a blow vent, with the supply dry gas.
3. board according to claim 1, this at least one this substrate of supporting construction butt wherein, between this at least one outstanding post and this substrate at a distance of a both set a distance.
4. board according to claim 1, wherein this pedestal is rectangular substantially, and this at least one supporting construction is arranged at the corner of this pedestal.
5. board according to claim 1, wherein this at least one supporting construction is arranged on this pedestal, and this at least one outstanding post protrude in this base-plates surface and be arranged at this substrate around.
6. board according to claim 1 should outstanding post be a nozzle wherein.
7. pedestal, in order to support a substrate, this pedestal comprises:
At least one supporting construction; And
One ionized gas generator is connected to this at least one supporting construction, and wherein ionized gas is sprayed towards this substrate by this at least one supporting construction, so as to removing the static charge on this substrate surface.
8. pedestal according to claim 7, wherein this at least one supporting construction is provided with a blow vent, with the supply dry gas.
9. pedestal according to claim 7, it also comprises at least one outstanding post, towards this substrate ejection ionized gas, so as to removing the static charge on this substrate.
10. pedestal according to claim 7, this at least one this substrate of supporting construction butt wherein, between this at least one outstanding post and this substrate at a distance of a both set a distance.
11. a pedestal in order to support a substrate, comprising:
At least one outstanding post sprays an ionized gas towards this substrate, so as to removing the static charge on this substrate; And
One ionized gas generator is connected to this at least one outstanding post, and wherein ionized gas is sprayed towards this substrate by this at least one outstanding post, so as to removing the static charge on this substrate surface.
12. a board, in order to handle a substrate, this board comprises:
One cavity;
One pedestal is located among this cavity, and this pedestal comprises a plurality of perforates and a pipeline, and this base-plates surface is located in described perforate, and this pipeline is located among this pedestal, the described perforate of this pipeline connection;
At least one supporting construction is arranged on this pedestal, in order to support this substrate; And
One ionized gas generator is located among this pipeline, and produces an ionized gas, and wherein this ionized gas is through this pipeline and described perforate and towards this substrate ejection, so as to removing the static charge on this substrate surface.
13. board according to claim 12, wherein this ionized gas towards the lower surface ejection of this substrate, is positioned at the static charge of this base lower surface through this pipeline and described perforate so as to removal.
14. board according to claim 13, it also comprises an X-ray generator, is located among this cavity, and this X-ray generator provides X-ray towards the upper surface of this substrate, is positioned at the static charge of this upper surface of base plate so as to removal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610004242 CN1808280B (en) | 2006-02-13 | 2006-02-13 | Method for removing static on substrate, apparatus and base thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610004242 CN1808280B (en) | 2006-02-13 | 2006-02-13 | Method for removing static on substrate, apparatus and base thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1808280A true CN1808280A (en) | 2006-07-26 |
| CN1808280B CN1808280B (en) | 2010-05-12 |
Family
ID=36840235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610004242 Expired - Fee Related CN1808280B (en) | 2006-02-13 | 2006-02-13 | Method for removing static on substrate, apparatus and base thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1808280B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103472603A (en) * | 2013-09-17 | 2013-12-25 | 京东方科技集团股份有限公司 | Supporting pin and display panel production equipment |
| CN106154607A (en) * | 2016-08-26 | 2016-11-23 | 京东方科技集团股份有限公司 | A kind of elevating mechanism |
| CN106328489A (en) * | 2015-06-30 | 2017-01-11 | 细美事有限公司 | Method and apparatus for treating substrate |
| CN109388035A (en) * | 2018-10-31 | 2019-02-26 | 武汉华星光电技术有限公司 | Expose side machine and exposure method |
| CN111989988A (en) * | 2019-03-28 | 2020-11-24 | 大科防静电技术咨询（深圳）有限公司 | Apparatus and method for suppressing electrostatic charge |
-
2006
- 2006-02-13 CN CN 200610004242 patent/CN1808280B/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103472603A (en) * | 2013-09-17 | 2013-12-25 | 京东方科技集团股份有限公司 | Supporting pin and display panel production equipment |
| WO2015039437A1 (en) * | 2013-09-17 | 2015-03-26 | 京东方科技集团股份有限公司 | Supporting pin and display panel manufacturing device |
| CN106328489A (en) * | 2015-06-30 | 2017-01-11 | 细美事有限公司 | Method and apparatus for treating substrate |
| CN106154607A (en) * | 2016-08-26 | 2016-11-23 | 京东方科技集团股份有限公司 | A kind of elevating mechanism |
| CN106154607B (en) * | 2016-08-26 | 2019-03-29 | 京东方科技集团股份有限公司 | A kind of elevating mechanism |
| US10386661B2 (en) | 2016-08-26 | 2019-08-20 | Boe Technology Group Co., Ltd. | Elevating mechanism |
| CN109388035A (en) * | 2018-10-31 | 2019-02-26 | 武汉华星光电技术有限公司 | Expose side machine and exposure method |
| CN111989988A (en) * | 2019-03-28 | 2020-11-24 | 大科防静电技术咨询（深圳）有限公司 | Apparatus and method for suppressing electrostatic charge |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1808280B (en) | 2010-05-12 |
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Granted publication date: 20100512 |
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| CF01 | Termination of patent right due to non-payment of annual fee |