CN101051604A - Method and device of panel etching process - Google Patents
Method and device of panel etching process Download PDFInfo
- Publication number
- CN101051604A CN101051604A CN 200610072661 CN200610072661A CN101051604A CN 101051604 A CN101051604 A CN 101051604A CN 200610072661 CN200610072661 CN 200610072661 CN 200610072661 A CN200610072661 A CN 200610072661A CN 101051604 A CN101051604 A CN 101051604A
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- panel
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- etching solution
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Abstract
The faceplate to be etched is setup in a sealed operating trough in vertical mode. Then, spraying etching solution in spirrillum onto the faceplate carries out etching step. The etching solution is atomized to spraying airflow in spirrillum. Thus, the etching solution is sprayed on entire surface to be etched evenly to as to improve etching evenness. Fresh etching solution is sprayed onto surface to be etched continuously in order to increase etching speed.
Description
Invention field
The present invention is the method and the device thereof of relevant a kind of panel etching process, refers to a kind of method and device that can improve the etching uniformity and promote etching efficiency in etch process especially.
Background technology
Press, the Wet-type etching technology is to utilize the chemical reaction that is carried out between film and particular solution to remove suprabasil film, so that form required pattern or make this substrate finish the slimming engineering in substrate, the advantage of this technology is that processing procedure is simple, equipment is simple, with low cost and working (machining) efficiency is fast.Right person as known, etching is to utilize chemical reaction to carry out the removal or the slimming engineering of film, and chemical reaction itself is not had a directivity, so this iso etch features causes it to be difficult to accurately control etching result at local location; In addition, this kind etching mode is difficult to make the etching equably of whole surface owing to be subjected to the influence of the stickiness of etching solution own, causes having the subregion to cause etching incomplete, the phenomenon of undercutting (undercutting) is then arranged in other zone, have a strong impact on the product yield; Yet along with the size of product component is done littler and littler, machining accuracy is more and more higher, and the uniformity of etching and processing has also just become more important.
In addition, in recent years under the consumption electronic products benefit is tending towards compact trend, make the basic module of this series products～～display floater also is required to meet frivolous important document, and the lightening of general display floater mainly is to reach purpose by its glass substrate is implemented slimming processing procedure; In numerous known slimming process technique the most normal adopted be exactly etched mode, this mainly is to consider that etched slimming processing procedure has good working (machining) efficiency usually, and be difficult for producing the infringement that stress causes thin glass plate in the processing procedure, yet as previously mentioned, the disappearance of etch process many bad results that also can derive, for example: etching is inhomogeneous to cause each thickness of glass plate body differ (when especially being applied to the larger area glass baseplate), the mechanical strength of glass plate body is fallen sharply and sustain damage easily, also can produce shaggy situation and etching is inhomogeneous, have influence on the image quality of LCD assembly.
Summary of the invention
Purpose of the present invention mainly provides a kind of method and device thereof of panel etching process of improvement, in order on panel, to form required pattern and/or to be used for carrying out the slimming processing procedure of panel, its with panel be vertically stand aspect be arranged at one the sealing work nest in, and provide the etching solution of shape sprinkling in the shape of a spiral to be sprayed to this panel to carry out etching, by etching solution being atomized into spiral helicine spraying air-flow, etching solution can be sprayed equably be dispersed in whole desire etched surfaces, promote the etched uniformity in view of the above, and utilize continuously etched surfaces is sprayed fresh etching solution spraying, to promote etch-rate.
For achieving the above object, the method of panel etching process provided by the invention, can be in order on panel, to form required pattern and/or to be used for carrying out the slimming processing procedure of panel, it utilizes the chemical reaction that carries out between etching solvent and the panel to remove the material that institute's desire is removed on the panel, and the step of carrying out etch process comprises:
Be installed on the clamping apparatus panel of desiring etching and processing fixing;
The plate body that this clamping apparatus makes this panel vertically stands in the work nest that aspect is arranged at a sealing to be;
Provide the etching solution of shape sprinkling in the shape of a spiral to be sprayed to this panel, carry out etching; And
After finishing etching and processing this clamping apparatus is shifted out this work nest, take out the panel of having finished processing.
The device of panel etching process provided by the invention, can be in order on panel, to form required pattern and/or to be used for carrying out the slimming processing procedure of panel, it utilizes the chemical reaction that carries out between etching solvent and the panel to remove material on the panel, and the device of this etch process comprises at least:
One work nest is made up of a cell body and groove lid, and this groove lid can be done the lifting displacement freely, is combined into an airtight tank after covering with this cell body;
One clamping apparatus is articulated in aforementioned grooves lid below vertically to stand aspect, and it has at least onely seizes that the unit can grip a slice or the panel that is set up in parallel parallel to each other more than two on both sides by the arms; And
One etching solution feed arrangement, have an etching solution accomodating unit and some sprayer units, this accomodating unit can provide etching solution to these sprayer units, and take in residual etching solution at the bottom of this work nest, and these sprayer units are set in this work nest and regard to the desire etching face of these panels respectively, be provided with a plurality of swivel nozzles in this sprayer unit, etching solution can be ejected to this panel with helical form; Utilize this clamping apparatus with the etched panel fixing of desire, cover decline displacement to seal this work nest then and with this groove, make this panel vertically stand aspect and be arranged in the work nest simultaneously slightly to be, by these sprayer units etching solution is ejected to this panel to carry out etching with helical form again, by etching solution being atomized into spiral helicine spraying air-flow, be dispersed in whole desire etched surfaces and etching solution sprayed equably, promote the etching uniformity in view of the above, and promote the efficient of etching and processing.
The device of described panel etching process, wherein, this clamping apparatus also can include plural groups be each other parallel be set up in parallel seize the unit on both sides by the arms.
The device of described panel etching process, wherein, this seizes the unit on both sides by the arms is a rectangle framework, is provided with at least one group of fixed chuck on an architrave of this framework, and is provided with at least one group of active chuck on another corresponding architrave.
The device of described panel etching process wherein, is all established tool one v-depression in the end of aforementioned fixation chuck and active chuck.
The device of described panel etching process, wherein, this etching solution feed unit also comprises a recursive filter, can carry out filtration, purification to the etching solution of collecting in this work nest certainly and handle.
In detail, according to the method for panel etching process provided by the present invention, it carries out the step system of etch process: the panel that at first will desire etching and processing is installed on the clamping apparatus fixing; The plate body that this clamping apparatus makes this panel vertically stands in the work nest that aspect is arranged at a sealing to be; Provide the etching solution of shape sprinkling in the shape of a spiral to be sprayed to this panel, the row etching; And after finishing etching and processing, this clamping apparatus is shifted out this work nest and takes out the panel of having finished processing.
Again, if, then can before aforementioned etch process, carry out the photoresistance processing procedure to set its surface etching pattern to this panel earlier in order to form the purpose of special pattern at this panel surface.
According to the present invention, the device of this panel etching process comprises at least again: a sealable work nest, and one can install the clamping apparatus of desiring the etching panel, and an etching solution feed unit; Wherein, this work nest system is made up of a cell body and groove lid, and this groove lid can be done the lifting displacement freely, is combined into an airtight tank after covering with this cell body; And this clamping apparatus is to be articulated in aforementioned grooves lid below vertically to stand aspect, and it can grip a slice or the panel that is set up in parallel parallel to each other more than two; This etching solution feed arrangement tool one etching solution accomodating unit and some sprayer units again, this accomodating unit can provide etching solution, it for example is the dilute solution of hydrofluoric acid (HF), supply with these sprayer units, and take in residual etching solution at the bottom of this work nest, and these sprayer units are the desire etching faces that are set in this work nest and regard to these panels respectively, are provided with a plurality of swivel nozzles in this sprayer unit, etching solution can be ejected to this panel with helical form; Utilize this clamping apparatus with the etched panel fixing of desire, cover decline displacement to seal this work nest then and with this groove, make this panel vertically stand aspect and be arranged in the work nest simultaneously slightly to be, by these sprayer units etching solution is ejected to this panel to carry out etching with helical form again, again after etching and processing is finished, these sprayer units stop the spraying running, and make this groove lid and do the rising displacement and shift out the cell body of this work nest with this clamping apparatus, so that on this clamping apparatus, substitute installation panel.Total this, this device is in the etching and processing process, by etching solution being atomized into spiral helicine spraying air-flow, and etching solution sprayed equably the desire etched surfaces that is dispersed in whole front panel, to guarantee the etching and processing degree homogeneous at etched each position, produce out in view of the above and have the slightly panel of degree of making and flatness of accurate figure, precise measure and good surface, and utilize continuously etched surfaces is sprayed fresh etching solution spraying, allow etching detritus and the waste liquid can be, to promote etch-rate rapidly from this surface isolation.
The seizing the unit on both sides by the arms and can vertically seize fixing a slice or the above panel of a slice on both sides by the arms of aforementioned clamping apparatus, further, in order to carry out the etch process of more panel at one time, then this clamping apparatus more can include plural groups be each other parallel be set up in parallel seize the unit on both sides by the arms.
In addition, this etching solution feed unit also optionally comprises a recursive filter, and it can carry out the etching solution of collecting filtration, purification in this work nest handles, and the etching detritus and the grit filtering that will be mingled in view of the above in the etching solution purify.
The present invention is not limited to the above form; clearly; with regard to haveing the knack of this technical staff; after the above-mentioned explanation of reference; more improvement and variation can be arranged, be with, all have in that identical creation spirit is following do relevant any modification of the present invention or change; all must be included in the category that the invention is intended to protect, and give Chen Ming.And will go on to say with a specific embodiment after being next to, further to illustrate character of innovation of the present invention.
Description of drawings
Figure 1 shows that the structure front reference diagram and the running signal thereof of Etaching device of the present invention;
The view that Fig. 2 has risen for the groove lid that shows Etaching device;
Fig. 3 seizes the front reference diagram of unit on both sides by the arms for this; And
The enlarged drawing that Fig. 4 analyses and observe for the A portion side of Fig. 3.
Embodiment
Below cited preferred embodiment, be that the glass substrate to display panels carries out the thinning processing procedure; As described later shown in each accompanying drawing, on board, be installed with one group of work nest 1, this work nest comprises a cell body 12 and groove lid 13, be articulated with one group of elevating mechanism 14 in this groove side of covering, make this groove lid 13 can above cell body 12, do the lifting displacement by this elevating mechanism, and make this groove lid 13 can after covering, be combined into an airtight tank with this cell body 12.
One clamping apparatus 2 is in order to seize the fixing panel 5 of desiring etching and processing on both sides by the arms, it is closed by pivot and is arranged on aforementioned grooves and covers 13 belows, thereby after this groove lid 13 covers with cell body 12, can make this clamping apparatus 2 and the panel 5 of being seized on both sides by the arms vertically stands aspect and is arranged in this airtight work nest 1 slightly to be; And shown in Fig. 3,4, the unit 2a system of seizing on both sides by the arms of this clamping device 2 slightly is a rectangle framework, thereunder architrave 21 is provided with several fixed chucks 22, top architrave 23 then is provided with plurality of movable chuck 24, and these active chucks have length-adjustable axostylus axostyle 241, for example screw rod or spring lever in order to adjust the clip position up and down of this active chuck 24, can be seized panel 5 on both sides by the arms between the fixed chuck and active chuck that is fixed on this rectangle framework in view of the above; In addition, all establish tool one v-depression 25,, make the panel energy automatic guiding contraposition of being seized on both sides by the arms, increase the steadiness after seizing on both sides by the arms simultaneously by the edge of this this panel 5 of groove socket in the aforementioned fixation chuck 22 and the end of active chuck 24.
Show from accompanying drawing that again this Etaching device is provided with one group of etching solution feed arrangement 3 and comprises an etching solution accomodating unit 31 and the sprayer unit of at least one pair of 32; Wherein, this etching solution accomodating unit 31 is in order to supply with and to be stored in etching solution required in the etch process, and this etching solution, for example carrying out etch process with the substrate to glass material in the present embodiment is example, is to adopt hydrofluoric acid (HF) concentration greater than more than 5%; In addition, this etching solution accomodating unit 31 is provided with output duct 314 can provide etching solution to these sprayer units 32, and its also tool one be communicated in the input pipe 312 of aforementioned work nest 1 bottom, can be accommodated in the etch process at the bottom of this work nest residual etching solution, best, also be connected in series a filtration purifier 313 in this input pipe 312, the etching solution of going into from this work nest underflow can be carried out filtration, purification and handle, so that make etching detritus and the grit filtering that is mingled in the etching solution; And these sprayer units 32 are set within this work nest 1, and make it regard to the desire etched surfaces of these panels 5 respectively; Again, on these sprayer units 32, be equipped with a plurality of rotatable atomizers 321, etching solution can be ejected to the helical form aerosol and carry out etching on this panel.
The Etaching device of assembly composition is when running as described above, this clamping apparatus 2 is seized the etched panel 5 of desire on both sides by the arms earlier and is fixed this and seize on both sides by the arms on the unit 2a, make this groove lid 13 by this elevating mechanism 14 then and with these clamping apparatus 2 decline displacements, make this groove lid 13 these cell bodies 12 of sealing, and make this clamping apparatus 2 and the panel 5 of being seized on both sides by the arms vertically stands aspect and is arranged in this airtight work nest 1 slightly to be, by these sprayer units 32 etching solution is sprayed onto again and carries out etching on this panel, by etching solution being atomized into spiral helicine spraying air-flow, etching solution can be sprayed equably be dispersed in whole desire etched surfaces, promote the etched uniformity in view of the above, and utilize continuously etched surfaces is sprayed fresh etching solution spraying, to promote etch-rate.Subsequently after etching and processing is finished, these sprayer units 32 stop the spraying running, and this elevating mechanism 14 makes this groove lid 13 and do the rising displacement with this clamping apparatus 2, makes this clamping apparatus 2 shift out the cell body 12 of this work nest, so that substitute installation panel on this clamping apparatus.
Claims (6)
1, a kind of method of panel etching process, can be in order on panel, to form required pattern and/or to be used for carrying out the slimming processing procedure of panel, it utilizes the chemical reaction that carries out between etching solvent and the panel to remove the material that institute's desire is removed on the panel, and the step of carrying out etch process comprises:
Be installed on the clamping apparatus panel of desiring etching and processing fixing;
The plate body that this clamping apparatus makes this panel vertically stands in the work nest that aspect is arranged at a sealing to be;
Provide the etching solution of shape sprinkling in the shape of a spiral to be sprayed to this panel, carry out etching; And
After finishing etching and processing this clamping apparatus is shifted out this work nest, take out the panel of having finished processing.
2, a kind of device of panel etching process, can be in order on panel, to form required pattern and/or to be used for carrying out the slimming processing procedure of panel, it utilizes the chemical reaction that carries out between etching solvent and the panel to remove material on the panel, and the device of this etch process comprises at least:
One work nest is made up of a cell body and groove lid, and this groove lid can be done the lifting displacement freely, is combined into an airtight tank after covering with this cell body;
One clamping apparatus is articulated in aforementioned grooves lid below vertically to stand aspect, and it has at least onely seizes that the unit can grip a slice or the panel that is set up in parallel parallel to each other more than two on both sides by the arms; And
One etching solution feed arrangement, have an etching solution accomodating unit and some sprayer units, this accomodating unit can provide etching solution to these sprayer units, and take in residual etching solution at the bottom of this work nest, and these sprayer units are set in this work nest and regard to the desire etching face of these panels respectively, be provided with a plurality of swivel nozzles in this sprayer unit, etching solution can be ejected to this panel with helical form; Utilize this clamping apparatus with the etched panel fixing of desire, cover decline displacement to seal this work nest then and with this groove, make this panel vertically stand aspect and be arranged in the work nest simultaneously slightly to be, by these sprayer units etching solution is ejected to this panel to carry out etching with helical form again, by etching solution being atomized into spiral helicine spraying air-flow, be dispersed in whole desire etched surfaces and etching solution sprayed equably, promote the etching uniformity in view of the above, and promote the efficient of etching and processing.
3, the device of panel etching process as claimed in claim 2, wherein, this clamping apparatus also can include plural groups be each other parallel be set up in parallel seize the unit on both sides by the arms.
4, as the device of claim 2 or 3 described panel etching process, wherein, this seizes the unit on both sides by the arms is a rectangle framework, is provided with at least one group of fixed chuck on an architrave of this framework, and is provided with at least one group of active chuck on another corresponding architrave.
5, the device of panel etching process as claimed in claim 4 wherein, is all established tool one v-depression in the end of aforementioned fixation chuck and active chuck.
6, the device of panel etching process as claimed in claim 2, wherein, this etching solution feed unit also comprises a recursive filter, can carry out filtration, purification to the etching solution of collecting in this work nest certainly and handle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610072661 CN101051604A (en) | 2006-04-07 | 2006-04-07 | Method and device of panel etching process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610072661 CN101051604A (en) | 2006-04-07 | 2006-04-07 | Method and device of panel etching process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101051604A true CN101051604A (en) | 2007-10-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610072661 Pending CN101051604A (en) | 2006-04-07 | 2006-04-07 | Method and device of panel etching process |
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| CN (1) | CN101051604A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103539362A (en) * | 2012-07-09 | 2014-01-29 | 技迪科技股份有限公司 | Ultra-thin glass manufacturing system |
| CN103539363A (en) * | 2012-07-09 | 2014-01-29 | 技迪科技股份有限公司 | Method for manufacturing ultrathin glass |
| CN104854679A (en) * | 2012-10-30 | 2015-08-19 | 株式会社Smc | Method for manufacturing microcircuit |
| WO2015196520A1 (en) * | 2014-06-26 | 2015-12-30 | 深圳市华星光电技术有限公司 | Etching method and etching soaking device for glass substrate |
| CN107352501A (en) * | 2017-07-05 | 2017-11-17 | 中北大学 | TMAH silicon is atomized gas phase etching system |
| CN107572833A (en) * | 2017-08-02 | 2018-01-12 | 深圳市华星光电技术有限公司 | Engraving method, Etaching device and the display panel of glass plate |
| CN108978424A (en) * | 2018-09-12 | 2018-12-11 | 四川泓毅通建设工程有限公司 | Colored green road LOGO ground stereoscopic identifies construction technology |
| CN109680278A (en) * | 2019-02-26 | 2019-04-26 | 合肥永淇智材科技有限公司 | A kind of the vertical Etaching device and its engraving method of FMM sheet metal |
| CN111182736A (en) * | 2020-03-16 | 2020-05-19 | 佛山市恒灏科技有限公司 | Etching method and device |
| CN113597125A (en) * | 2021-08-02 | 2021-11-02 | 湖南鸿展自动化设备有限公司 | Vertical continuous etching device and etching method |
| WO2022000703A1 (en) * | 2020-06-30 | 2022-01-06 | 东莞宇宙电路板设备有限公司 | Surface treatment device |
| GB2601472A (en) * | 2020-06-30 | 2022-06-08 | Universal Circuit Board Equipment Co Ltd | Surface treatment device |
-
2006
- 2006-04-07 CN CN 200610072661 patent/CN101051604A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103539362A (en) * | 2012-07-09 | 2014-01-29 | 技迪科技股份有限公司 | Ultra-thin glass manufacturing system |
| CN103539363A (en) * | 2012-07-09 | 2014-01-29 | 技迪科技股份有限公司 | Method for manufacturing ultrathin glass |
| CN104854679A (en) * | 2012-10-30 | 2015-08-19 | 株式会社Smc | Method for manufacturing microcircuit |
| WO2015196520A1 (en) * | 2014-06-26 | 2015-12-30 | 深圳市华星光电技术有限公司 | Etching method and etching soaking device for glass substrate |
| CN107352501A (en) * | 2017-07-05 | 2017-11-17 | 中北大学 | TMAH silicon is atomized gas phase etching system |
| CN107572833A (en) * | 2017-08-02 | 2018-01-12 | 深圳市华星光电技术有限公司 | Engraving method, Etaching device and the display panel of glass plate |
| CN108978424A (en) * | 2018-09-12 | 2018-12-11 | 四川泓毅通建设工程有限公司 | Colored green road LOGO ground stereoscopic identifies construction technology |
| CN109680278A (en) * | 2019-02-26 | 2019-04-26 | 合肥永淇智材科技有限公司 | A kind of the vertical Etaching device and its engraving method of FMM sheet metal |
| CN111182736A (en) * | 2020-03-16 | 2020-05-19 | 佛山市恒灏科技有限公司 | Etching method and device |
| WO2022000703A1 (en) * | 2020-06-30 | 2022-01-06 | 东莞宇宙电路板设备有限公司 | Surface treatment device |
| GB2601472A (en) * | 2020-06-30 | 2022-06-08 | Universal Circuit Board Equipment Co Ltd | Surface treatment device |
| CN113597125A (en) * | 2021-08-02 | 2021-11-02 | 湖南鸿展自动化设备有限公司 | Vertical continuous etching device and etching method |
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