CN1775384A - Method for washing metal container and resin formed article - Google Patents
Method for washing metal container and resin formed article Download PDFInfo
- Publication number
- CN1775384A CN1775384A CNA2005101315828A CN200510131582A CN1775384A CN 1775384 A CN1775384 A CN 1775384A CN A2005101315828 A CNA2005101315828 A CN A2005101315828A CN 200510131582 A CN200510131582 A CN 200510131582A CN 1775384 A CN1775384 A CN 1775384A
- Authority
- CN
- China
- Prior art keywords
- cleaning solution
- mentioned
- washing
- washing methods
- diethylene glycol
- Prior art date
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- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 96
- 238000005406 washing Methods 0.000 title claims description 180
- 229910052751 metal Inorganic materials 0.000 title claims description 71
- 239000002184 metal Substances 0.000 title claims description 71
- 229920005989 resin Polymers 0.000 title description 14
- 239000011347 resin Substances 0.000 title description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 127
- 239000000203 mixture Substances 0.000 claims abstract description 85
- 239000007788 liquid Substances 0.000 claims abstract description 27
- -1 diethylene glycol alkyl ether Chemical class 0.000 claims abstract description 25
- 239000004115 Sodium Silicate Substances 0.000 claims abstract description 17
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052911 sodium silicate Inorganic materials 0.000 claims abstract description 17
- 229940048842 sodium xylenesulfonate Drugs 0.000 claims abstract description 17
- QUCDWLYKDRVKMI-UHFFFAOYSA-M sodium;3,4-dimethylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1C QUCDWLYKDRVKMI-UHFFFAOYSA-M 0.000 claims abstract description 17
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000057 synthetic resin Substances 0.000 claims description 55
- 229920003002 synthetic resin Polymers 0.000 claims description 55
- 239000002131 composite material Substances 0.000 claims description 44
- 239000007787 solid Substances 0.000 claims description 44
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims description 33
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical group O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 claims description 33
- 235000019795 sodium metasilicate Nutrition 0.000 claims description 16
- 238000009413 insulation Methods 0.000 claims description 14
- AQEFLFZSWDEAIP-UHFFFAOYSA-N di-tert-butyl ether Chemical compound CC(C)(C)OC(C)(C)C AQEFLFZSWDEAIP-UHFFFAOYSA-N 0.000 claims 2
- 239000002699 waste material Substances 0.000 abstract description 43
- 239000000356 contaminant Substances 0.000 abstract 1
- 238000004506 ultrasonic cleaning Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 126
- 230000000052 comparative effect Effects 0.000 description 40
- 239000003795 chemical substances by application Substances 0.000 description 38
- 239000010408 film Substances 0.000 description 26
- 229920001577 copolymer Polymers 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 238000011156 evaluation Methods 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000007598 dipping method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000000049 pigment Substances 0.000 description 7
- 230000001012 protector Effects 0.000 description 7
- 230000001105 regulatory effect Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000000977 initiatory effect Effects 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- DUJMVKJJUANUMQ-UHFFFAOYSA-N 4-methylpentanenitrile Chemical compound CC(C)CCC#N DUJMVKJJUANUMQ-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 239000003495 polar organic solvent Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002285 radioactive effect Effects 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical class C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 2
- REUQOSNMSWLNPD-UHFFFAOYSA-N [2-(diethylamino)phenyl]-phenylmethanone Chemical compound CCN(CC)C1=CC=CC=C1C(=O)C1=CC=CC=C1 REUQOSNMSWLNPD-UHFFFAOYSA-N 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000012797 qualification Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical compound [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- PXFBZOLANLWPMH-UHFFFAOYSA-N 16-Epiaffinine Natural products C1C(C2=CC=CC=C2N2)=C2C(=O)CC2C(=CC)CN(C)C1C2CO PXFBZOLANLWPMH-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- WXYSZTISEJBRHW-UHFFFAOYSA-N 4-[2-[4-[1,1-bis(4-hydroxyphenyl)ethyl]phenyl]propan-2-yl]phenol Chemical compound C=1C=C(C(C)(C=2C=CC(O)=CC=2)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WXYSZTISEJBRHW-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- KUPZXEMAEQRTSQ-UHFFFAOYSA-N C1(C(C=CC2=CC=CC=C12)=O)=O.C1(=CC=CC=C1)O.C1(=CC=CC=C1)O Chemical class C1(C(C=CC2=CC=CC=C12)=O)=O.C1(=CC=CC=C1)O.C1(=CC=CC=C1)O KUPZXEMAEQRTSQ-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- APZPSKFMSWZPKL-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)CO APZPSKFMSWZPKL-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- WYMSBXTXOHUIGT-UHFFFAOYSA-N paraoxon Chemical compound CCOP(=O)(OCC)OC1=CC=C([N+]([O-])=O)C=C1 WYMSBXTXOHUIGT-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The invention provides a method for cleaning a metallic vessel, by which a photosensitive composition as a contaminant stuck to the object to be cleaned can be cleaned and easily removed, in which specific equipment such as explosion-proof equipment is not required, the waste cleaning liquid is easily treated and the influence to be exerted on the environment is sufficiently taken into consideration. This method for cleaning the metallic vessel comprises the step of removing the photosensitive composition stuck to the metallic vessel by carrying out ultrasonic cleaning of the metallic vessel while using a semi-aqueous cleaning liquid containing at least diethylene glycol alkyl ether, sodium xylene sulfonate and sodium silicate.
Description
Technical field
The present invention relates to the washing methods of metal container made and synthetic resin, in more detail, relate to the metal container made of the photosensitive composite that can easily remove attachment removal and the washing methods of synthetic resin.
Background technology
Comprise by light such as ultraviolet ray, radioactive ray and shine the photosensitive composite of painted resist composition, protection film composition and the insulation film composition etc. that solidify generally as making the material (for example, referring to patent documentation 1～3) of electronic equipments such as colour filter, display floater interval body, thin film transistor (TFT) (TFT) type liquid crystal display cells with parts.
For example, painted resist composition is to contain colouring agent such as pigment and painted resist composition, also is the photosensitive composite that solidifies through irradiation such as radioactive ray.In addition, protection film composition, dielectric film composition are not especially through painted etc. colourless organic composite, and be the same with painted resist composition, is the photosensitive composite that solidifies through irradiation such as radioactive ray.Such photosensitive composite is preservation under the state in being accommodated in the metal container made, carrying etc. generally.
When taking out photosensitive composite using from the metal container made, it is excessive etc. that the part of the photosensitive composite of taking-up is spilt, often attached to the outside of metal container made., perhaps solidify because wherein contained solvent evaporates becomes tunicle attached to the photosensitive composite in the metal container made outside because of the influence of illumination light etc., therefore as dirt securely attached to the outside of metal container made.On the other hand, resin system inner bag is accommodated in the metal container made, and photosensitive composite is under the state that is filled in this resin system inner bag, and situation about being accommodated in the metal container made is a lot.In this case, because resin system inner bag is arranged, photosensitive composite is low attached to the possibility of the inboard of metal container made.But, because of the difference of behaviour in service, resin system inner bag fragmentation etc., photosensitive composite overflows to the inboard of metal container made and spills, and is the same with the outside, often adheres to securely as dirt.In addition, photosensitive composite also as dirt attached to the resinous annex that uses together with this metal container made, for example on the synthetic resins such as pipe, O type circle.
As the washing methods that is used to remove attached to the photosensitive composite on metal container made or its annex, for example, can enumerate the use volatile organic solvent, scrub or manual method such as wiping.But, the manual operations washing, the not talkative height of detersive efficiency in order to improve clean result, need be sought to improve.In addition,, there are the large-scale and special inappropriate like this situations of equipment such as indispensable antiknock device, simultaneously the unmanageable problem of waste liquid that exists washing to produce though machine washing has with an organic solvent improved detersive efficiency.
As eliminating these problems, effectively remove the washing methods of photosensitive composite simultaneously, can enumerate to use to contain and relatively be easy to and organic compound that polarity high affine washing methods as the so-called accurate aqueous systems cleaning solution of cleaning ingredients with water.As relevant prior art, disclose use the cleaning solution of forming by specific amino alcohol and polar organic solvent washing methods (for example, referring to patent documentation 4), contain the cleaning solution of glycol ethers organic solvent or use the washing methods (for example, referring to patent documentation 5～7) of this cleaning solution.
But, disclosed washing methods in these patent documentations, clean result can't be said so fully, the manual operations of often having to depend on.Therefore, be necessary to develop and obtain sufficient clean result and do not rely on manual operations and do not need the washing methods of antiknock device etc.
[patent documentation 1] spy opens flat 10-260309 communique
[patent documentation 2] spy opens the 2001-151829 communique
[patent documentation 3] spy opens the 2001-354822 communique
[patent documentation 4] spy opens the 2004-66155 communique
[patent documentation 5] spy opens the 2003-171692 communique
[patent documentation 6] spy opens the 2003-171694 communique
[patent documentation 7] spy opens the 2003-201498 communique
Summary of the invention
The present invention proposes in view of the problem that this prior art had, the proposition of this problem, the metal container made that purpose is to provide following and the washing methods of synthetic resin, promptly can easily remove by washing when, do not need special installations such as antiknock device as photosensitive composite attached to the polluter on the washing object, the processing of scrub raffinate is also easy, need not worry very much the influence to environment.
The inventor etc. have carried out concentrated research in order to address the above problem, and found that, as cleaning solution, use the accurate aqueous systems cleaning solution that contains compositions such as diethylene glycol (DEG) alkyl ether at least under given conditions, can address the above problem, thereby finish the present invention.
That is, the invention provides below shown in the washing methods of metal container made and the washing methods of synthetic resin.
[1] washing methods of metal container made comprises following operation: use the accurate aqueous systems cleaning solution that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least to carry out ultrasonic washing, remove attached to the photosensitive composite on the metal container made.
[2] washing methods of above-mentioned [1] described metal container made, above-mentioned diethylene glycol (DEG) alkyl ether is a diethylene glycol monobutyl ether, the concentration of the above-mentioned diethylene glycol monobutyl ether of above-mentioned cleaning solution is 0.05～10 quality %.
[3] washing methods of above-mentioned [2] described metal container made, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium xylene sulfonate that above-mentioned cleaning solution is contained are 10～150 quality %.
[4] washing methods of above-mentioned [2] or [3] described metal container made, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium metasilicate that above-mentioned cleaning solution is contained are 10～150 quality %.
[5] washing methods of each described metal container made of above-mentioned [1]～[4], the solid concentration of above-mentioned cleaning solution is 0.1～30 quality %.
[6] washing methods of each described metal container made of above-mentioned [1]～[5], the liquid temperature of above-mentioned cleaning solution is 40～80 ℃, and pH is 10～12.5, and ultrasonic washing carried out 0.5～60 minute.
[7] washing methods of each described metal container made of above-mentioned [1]～[6], above-mentioned photosensitive composite are painted resist composition, protection film composition or insulation film composition.
[8] washing methods of synthetic resin comprises following operation: use the accurate aqueous systems cleaning solution that contains the diethylene glycol (DEG) alkyl ether at least to wash, remove attached to the photosensitive composite on the synthetic resin.
[9] washing methods of above-mentioned [8] described synthetic resin, above-mentioned diethylene glycol (DEG) alkyl ether is a diethylene glycol monobutyl ether, the concentration of the above-mentioned diethylene glycol monobutyl ether of above-mentioned cleaning solution is 0.05～10 quality %.
[10] washing methods of above-mentioned [9] described synthetic resin, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium xylene sulfonate that above-mentioned cleaning solution is contained are 10～150 quality %.
[11] washing methods of above-mentioned [9] or [10] described synthetic resin, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium metasilicate that above-mentioned cleaning solution is contained are 10～150 quality %.
[12] washing methods of each described synthetic resin of above-mentioned [8]～[11], the solid concentration of above-mentioned cleaning solution is 0.1～30 quality %.
[131] washing methods of each described synthetic resin of above-mentioned [8]～[12], the liquid temperature of above-mentioned cleaning solution is 40～80 ℃, and pH is 10～12.5, and washing was carried out 0.5～60 minute.
[14] washing methods of each described synthetic resin of above-mentioned [8]～[13] uses above-mentioned cleaning solution to carry out ultrasonic washing.
[15] washing methods of each described synthetic resin of above-mentioned [8]～[14], above-mentioned photosensitive composite are painted resist composition, protection film composition or insulation film composition.
The invention effect
The washing methods of metal container made of the present invention can be removed by washing easily as the photosensitive composite attached to the polluter of washing on the object, and does not need special installation such as antiknock device.In addition, the washing methods of metal container made of the present invention is also easy to the processing of scrub raffinate, also need not worry very much the influence to environment.
In addition, the washing methods of synthetic resin of the present invention can be removed by washing easily as the photosensitive composite attached to the polluter of washing on the object, and does not need special installation such as antiknock device.In addition, the washing methods of synthetic resin of the present invention is also easy to the processing of scrub raffinate, also need not worry very much the influence to environment.
Description of drawings
[Fig. 1] is the sectional view of the hermetically sealed can (キ ヤ ニ ス one narrow-necked earthen jar) that schematically shows an example of metal container made.
[Fig. 2] is the sectional view that schematically shows an example of the operation of washing the metal container made.
[Fig. 3] is the sectional view that schematically shows an example of dip-tube.
The explanation of symbol
1: hermetically sealed can, 2a: inject and discharge oral area, 2b: sealing bolt, 3a: top protector; 3b: bottom protector, 4: vessel, 10: the metal container made; 11: preparation dipping operation, 12: washing procedure, 13: rinsing process; 14: drying process, 15: efferent, 16: the output receiving platform; 20: ultrasonic vibrator, 31: pipe joint, 32: pipe; 35: dip-tube, 40:O shape ring, H
1: jar overall height, H
2: jar effective depth, D: jar diameter.
The specific embodiment
Below, describe implementing best mode of the present invention, but the present invention is not subjected to the qualification of following embodiment, without departing from the spirit and scope of the present invention, those skilled in the art are based on general knowledge, can carry out suitable change, improvement etc. to following embodiment, these also are interpreted as within the scope of the invention.
An embodiment of the washing methods of metal container made of the present invention is the washing methods that comprises following operation: use the accurate aqueous systems cleaning solution that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least to carry out ultrasonic washing, remove attached to the photosensitive composite on the metal container made.Below, it is elaborated.
In the washing methods of the metal container made of present embodiment, to as the shape of the metal container made of washing object, there is no particular limitation to constitute its kind etc. of metal.As the example of metal container made, can enumerate shapes of containers such as what is called side's bucket, drum.As the preferred metal that constitutes the metal container made, can enumerate for example stainless steel, aluminium, carbon steel etc.As the example of metal container made more specifically, can enumerate the hermetically sealed can 1 of shape as shown in Figure 1.Sealing jar 1 is the resin system inner bag that is used to fill photosensitive composite can be accommodated in its inner metal container made; be equipped with vessel 4, the top protector 3a of configuration on this vessel 4 and bottom protector 3b, same configuration on vessel 4, carry out the injection of content, oral area 2a and sealing bolt 2b are discharged in the injection of discharge.Photosensitive composite mainly is easy to stick on the top of vessel 4 or the top protector 3a, perhaps form thread groove etc. injection, discharge oral area 2a or sealing bolt 2b around.According to the washing methods of the metal container made of present embodiment, even the photosensitive composite of the part of the complicated shapes such as thread groove that are difficult to remove attached to manual operations also can effectively wash, remove.
In the washing methods of the metal container made of present embodiment, the cleaning solution of use is the cleaning solution that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least.When using this cleaning solution to carry out ultrasonic washing, can effectively remove and be bonded at the lip-deep photosensitive composite of metal container made.In addition, the diethylene glycol (DEG) alkyl ether is a kind of polar organic solvent, is easy to and water compatible, and for the cleaning solution that contains it (accurate aqueous systems cleaning solution), the draining after the washing is handled also easy.That is,, regulate, perhaps use separation solid contents such as filter, can easily discard by carrying out water-oil separating and pH for the cleaning solution (waste liquid) after the washing.
In addition, whole relatively cleaning solution, the excessive concentration of diethylene glycol (DEG) alkyl ether exists the solubility of the resist composition of solvent initiation to rise the tendency that is difficult to recycle.In addition, the alkyl that constitutes the diethylene glycol (DEG) alkyl ether is considered from clean result, preferred normal-butyl.That is diethylene glycol (DEG) alkyl ether diethylene glycol monobutyl ether preferably.
When the contained diethylene glycol (DEG) alkyl ether of cleaning solution was diethylene glycol monobutyl ether, the concentration of the diethylene glycol monobutyl ether of this cleaning solution was preferably 0.05～10 quality %, and more preferably 0.1～2 quality % is preferably 0.3～1 quality % especially.When the diethylene glycol monobutyl ether concentration of cleaning solution is lower than 0.05 quality %, there is the tendency that is difficult to give full play to clean result.On the other hand, if surpass 10 quality %, then exist the solubility of the resist composition of solvent initiation to rise the tendency that is difficult to recycle.
In addition, the amount of relative diethylene glycol monobutyl ether, the ratio of the amount of the sodium xylene sulfonate that cleaning solution is contained is preferably 10～150 quality %, and more preferably 30～100 quality % are preferably 50～80 quality % especially.When the ratio of the amount of the sodium xylene sulfonate that cleaning solution is contained is 10 quality %, there is the tendency that is difficult to give full play to clean result in the amount of diethylene glycol monobutyl ether relatively.On the other hand, if surpass 150 quality %, the tendency that then exists required wash time to increase.
The amount of relative diethylene glycol monobutyl ether, the ratio of the amount of the sodium metasilicate that cleaning solution is contained is preferably 10～150 quality %, and more preferably 30～100 quality % are preferably 50～80 quality % especially.If the ratio of the amount of the contained sodium metasilicate of cleaning solution is 10 quality %, then there is the tendency that is difficult to give full play to clean result in the relative amount of diethylene glycol monobutyl ether.On the other hand, if surpass 150 quality %, the tendency that then exists required wash time to increase.
In the washing methods of the metal container made of present embodiment, preferably using solid concentration is the cleaning solution of 0.1～30 quality %, more preferably uses the cleaning solution of 0.2～20 quality %, especially preferably uses the cleaning solution of 0.5～5 quality %.When the solid concentration of cleaning solution is lower than 0.1 quality %, there is the tendency that is difficult to give full play to clean result.On the other hand, if the solid concentration of cleaning solution surpasses 30 quality %, then exist the solubility of the photosensitive composite of solvent initiation to rise the tendency that is difficult to recycle.In addition, in this manual, " solid content of cleaning solution " is meant in the contained whole compositions of cleaning solution, the composition except that moisture.Therefore " solid content " not only comprises and is the composition of solid under the normal temperature, and comprises and be the composition of liquid under the normal temperature.
In the washing methods of the metal container made of present embodiment,, do not need large-scale and special equipment such as antiknock device when therefore washing owing to use the accurate aqueous systems cleaning solution that does not contain volatile organic solvent in fact.Therefore, the washing methods of the metal container made of present embodiment has the advantage that can implement in easy installations and facilities.In addition, in the present embodiment, the easy degree of handling from clean result, scrub raffinate and do not need the viewpoint of antiknock device etc., as the instantiation of the cleaning solution that can preferably use, can enumerate trade name " Block Le one go one Le De J-100 ", " Block Le one go one Le De J-200 " (モ ダ Application ケ ミ カ Le society system) etc.
In the washing methods of the metal container made of present embodiment, the liquid temperature of cleaning solution is preferably 40～80 ℃, more preferably 50～70 ℃, is preferably 55～65 ℃ especially.When the liquid temperature of cleaning solution was lower than 40 ℃, clean result was insufficient sometimes.In addition, when the liquid temperature of cleaning solution surpasses 80 ℃,, aspect cost of energy, there is disadvantageous tendency though can give full play to clean result.
In addition, in the washing methods of the metal container made of present embodiment, the pH of cleaning solution is preferably 10～12.5, and more preferably 11～12, be preferably 11.5～12 especially.The pH of cleaning solution is lower than at 10 o'clock, has the not enough tendency of washing.On the other hand, if the pH of cleaning solution surpasses 12.5, then wash degree is difficult to change, but the tendency that exists the equipment as the back operation (rinsing process) that is used to wash off cleaning solution to increase.
In the washing methods of the metal container made of present embodiment, preferred ultrasonic washing carried out 0.5～60 minute, more preferably carried out 5～40 minutes, especially preferably carried out 10～30 minutes.The time of ultrasonic washing, clean result was insufficient sometimes when being lower than 3 minutes.In addition, the time of ultrasonic washing can be given full play to clean result on the one hand, but have disadvantageous tendency aspect cost of energy when being surpassed 60 minutes.
In addition, the washing methods of the metal container made of present embodiment is adapted at as being to adopt in the occasion of painted resist composition, protection film composition or insulation film composition attached to the photosensitive composite of the polluter on the metal container made.As painted resist composition, can enumerate the radiation sensitive compositions that the colour filter that for example contains colouring agent (comprising the pigment of being made up of azo class pigment and/or dione compounds), alkali soluble resin, multi-functional monomer and Photoepolymerizationinitiater initiater is used.More specifically can enumerate pigment (for example, Colour Index (C.I. with regulation; The Society of Dyers and Colourists society distribution) green 36, the C.I. paratonere 254 of pigment yellow 150, C.I. face material Huang 155, C.I. face material etc.) mixture, methacrylic acid/benzyl methacrylate/polystyrene macromolecular monomer copolymer, double pentaerythritol C5 methacrylate, 2,2 '-two (2-chlorphenyls)-4,4 ', 5,5 '-mixture of tetraphenyl bisglyoxaline and 4,4 '-two (diethylamino) benzophenone is dissolved in composition that obtains in the ethylene glycol monoethyl ether acetate etc.
In addition; as the protection film composition, for example can enumerate the radiation-sensitive resin composition that contains unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, contains copolymer, polymerizable compound, radiation polymerization initiator and the cyclohexanone of the unsaturated compound of epoxy radicals and specific olefines unsaturated compound with ethylenic unsaturated bond.More specifically can enumerate by 2,2 '-azo two (2, the 4-methyl pentane nitrile), styrene, methacrylic acid, the copolymer that methacrylic acid dicyclo amyl group ester and GMA (and propylene glycol monomethyl ether acetate and/or 1,4-butadiene) are formed, KAYARAD DPHA (trade name (Japanese chemical drug society system)), (mixture of イ Le ガ キ ュ ア 369 (trade name (チ バ ス ペ シ ャ Le テ ィ-ケ ミ カ Le ズ society system)) is dissolved in composition that obtains in the cyclohexanone etc. to 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-Ding-1-ketone.
And, as the insulation film composition, can enumerate the unsaturated compound that contains unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydrides, contain epoxy radicals, maleimide copolymer and 1, the radiation-sensitive resin composition of 2-quinone diazido compounds by class monomer and other olefines unsaturated compound.More specifically can enumerate 2,2 '-azo two (2, the 4-methyl pentane nitrile), styrene, methacrylic acid, GMA and phenyl maleimide (and right-vinyl benzyl glycidol ether and/or 1, the 3-butadiene) copolymer and 2,3,4,4 '-tetrahydroxybenzophenone-1, the mixture of 2-naphthoquinones diazido-4-sulphonic acid ester is dissolved in composition that obtains in the diethylene glycol (DEG) ethyl methyl ether etc.
Then, the washing methods with regard to the metal container made of present embodiment is described in detail referring to accompanying drawing.Fig. 2 is the sectional view that schematically shows an example of the operation of washing the metal container made, demonstrates the state that a plurality of metal container mades 10 are washed in continued operation successively.The metal container made 10 that has adhered to photosensitive composite is washed in the presence of the cleaning solution of regulation in the washing procedure 12 that is equipped with as the ultrasonic vibrator 20 of ultrasonic wave generating source.Wherein, before washing procedure 12, the preparation dipping operation 11 that in advance metal container made 10 is immersed in the cleaning solution being set, can making the photosensitive composite swelling of adhering to like this, can obtain higher clean result, is preferred therefore.
The metal container made 10 that is through with for washing procedure 12 according to the direction of arrow of the direct of travel among Fig. 2, carries out successively that water etc. is washed the rinsing process 13 of cleaning solution off, the drying process 14 by dry metal container mades 10 such as jet airstreams gets final product.The metal container made 10 that drying process 14 is through with can be advanced to output receiving platform 16 grades by efferent 15.
Secondly, the embodiment with regard to the washing methods of synthetic resin of the present invention describes.An embodiment of the washing methods of synthetic resin of the present invention is the washing methods that comprises the resin formed product of following operation: use the accurate aqueous systems cleaning solution washing that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least, remove attached to the photosensitive composite on the synthetic resin.Below it is elaborated.
In the washing methods of the synthetic resin of present embodiment, there is no particular limitation to the shape as the synthetic resin of washing object.For example can enumerate simple shapes such as cup shape, annular, tubulose, and even complicated shape such as various installing components etc.More particularly, can enumerate the pipe joint 31 and dip-tubes 35 of managing 32 formations or O shape ring 40 etc. of shape as shown in Figure 3.These moulding product can be configured in above-mentioned canister 1 (referring to Fig. 1) and go up use, are so-called annexes.In addition, also there is no particular limitation for the kind of the resin of the synthetic resin of formation conduct washing object, as preferred resin, for example, can enumerate fluorine resin, polyethylene, nylon etc.Even the washing methods of the synthetic resin of present embodiment attached to the photosensitive composite on the synthetic resin with the complicated shape that is difficult to remove by manual operations, also can effectively wash, remove.
The cleaning solution that uses in the washing methods of the synthetic resin of present embodiment is the cleaning solution that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least.When using this cleaning solution to wash, can effectively remove and be bonded at the lip-deep photosensitive composite of synthetic resin.In addition, the diethylene glycol (DEG) alkyl ether is a kind of polar organic solvent, is easy to and water compatible, and for the cleaning solution that contains it (accurate aqueous systems cleaning solution), the draining after the washing is handled also easy.That is,, regulate, perhaps use separation solid contents such as filter, can easily discard by carrying out water-oil separating and pH for the cleaning solution (waste liquid) after the washing.In addition, the alkyl that constitutes the diethylene glycol (DEG) alkyl ether is considered from the clean result aspect, preferred normal-butyl.That is diethylene glycol (DEG) alkyl ether diethylene glycol monobutyl ether preferably.
When the contained diethylene glycol (DEG) alkyl ether of cleaning solution was diethylene glycol monobutyl ether, the concentration of the diethylene glycol monobutyl ether of this cleaning solution was preferably 0.05～10 quality %, and more preferably 0.1～2 quality % is preferably 0.3～1 quality % especially.When the diethylene glycol monobutyl ether concentration of cleaning solution is lower than 0.05 quality %, there is the tendency that is difficult to give full play to clean result.On the other hand, if surpass 10 quality %, then exist the solubility of the resist composition of solvent initiation to rise the tendency that is difficult to recycle.
In addition, the amount of relative diethylene glycol monobutyl ether, the ratio of the amount of the sodium xylene sulfonate that cleaning solution is contained is preferably 10～150 quality %, and more preferably 30～100 quality % are preferably 50～80 quality % especially.When the ratio of the amount of the sodium xylene sulfonate that cleaning solution is contained is 10 quality %, there is the tendency that is difficult to give full play to clean result in the amount of diethylene glycol monobutyl ether relatively.On the other hand, if surpass 150 quality %, the tendency that then exists required wash time to increase.
The amount of relative diethylene glycol monobutyl ether, the ratio of the amount of the sodium metasilicate that cleaning solution is contained is preferably 10-150 quality %, and more preferably 30～100 quality % are preferably 50～80 quality % especially.When the ratio of the amount of the sodium metasilicate that cleaning solution is contained is 10 quality %, there is the tendency that is difficult to give full play to clean result in the amount of diethylene glycol monobutyl ether relatively.On the other hand, if surpass 150 quality %, the tendency that then exists required wash time to increase.
In the washing methods of the synthetic resin of present embodiment, preferably using solid concentration is the cleaning solution of 0.1～30 quality %, more preferably uses the cleaning solution of 0.2～20 quality %, especially preferably uses the cleaning solution of 0.5～5 quality %.When the solid concentration of cleaning solution is lower than 0.1 quality %, there is the tendency that is difficult to give full play to clean result.On the other hand, if the solid concentration of cleaning solution surpasses 30 quality %, then exist the solubility of the photosensitive composite of solvent initiation to rise the tendency that is difficult to recycle.
The washing methods of the synthetic resin of present embodiment owing to use the accurate aqueous systems cleaning solution that does not contain volatile organic solvent in fact, does not need large-scale and special equipment such as antiknock device when therefore washing.Therefore, the washing methods of the synthetic resin of present embodiment has the advantage that can implement in easy installations and facilities.In addition, in the present embodiment, the easy degree of handling from clean result, scrub raffinate and do not need the viewpoint of antiknock device etc., as the instantiation of the cleaning solution that can preferably use, can enumerate trade name " Block Le one go one Le De J-100 ", " Block Le one go one Le De J-200 " (モ ダ Application ケ ミ カ Le society system) etc.
In the washing methods of the synthetic resin of present embodiment, the liquid temperature of cleaning solution is preferably 40～80 ℃, more preferably 50～70 ℃, is preferably 55～65 ℃ especially.When the liquid temperature of cleaning solution was lower than 40 ℃, clean result was insufficient sometimes.In addition, when the liquid temperature of cleaning solution surpasses 80 ℃, can give full play to clean result on the one hand, but aspect cost of energy, have disadvantageous tendency.
In addition, in the washing methods of the synthetic resin of present embodiment, the pH of cleaning solution is preferably 10～12.5, and more preferably 11～12, be preferably 11.5～12 especially.The pH of cleaning solution is lower than at 10 o'clock, has the not enough tendency of washing.On the other hand, if the pH of cleaning solution surpasses 12.5, then wash degree is difficult to change, but the tendency that exists the equipment as the back operation (rinsing process) that is used to wash off cleaning solution to increase.
In the washing methods of the synthetic resin of present embodiment, there is no particular limitation to the concrete mode of using the washing methods that above-mentioned cleaning solution implements.For example, even, also can obtain sufficient clean result by only in cleaning solution, flooding the method that washings washs (dipping washs).In addition, as preferred examples, can also enumerate and to use the manual washing and the washing of above-mentioned dipping of scrubbers such as brush or scraper to merge the method for use and under the state that synthetic resin (washings) is immersed in the cleaning solution, carry out the method for ultrasonic washing etc.Wherein, in the washing methods of the synthetic resin of present embodiment, carrying out ultrasonic washing under the state that synthetic resin (washings) is immersed in cleaning solution, can more effectively wash, remove attached to the photosensitive composite on the synthetic resin, is preferred therefore.In addition, preferred ultrasonic washing carried out 0.5～60 minute, more preferably carried out 5～40 minutes, especially preferably carried out 10～30 minutes.The ultrasonic washing time can not seek fully to improve clean result when being lower than 3 minutes sometimes.In addition, the ultrasonic washing time can be given full play to clean result on the one hand, but have disadvantageous tendency aspect cost of energy when being surpassed 60 minutes.
In addition, the washing methods of the synthetic resin of present embodiment is applicable to as the photosensitive composite attached to the polluter on the synthetic resin it is the occasion employing of painted resist composition, protection film composition or insulation film composition.As painted resist composition, protection film composition and insulation film composition instantiation separately, can enumerate and the same example cited in the washing methods of above-mentioned metal container made.
Secondly, the washing methods with regard to the synthetic resin of present embodiment is described in detail.The synthetic resin that has adhered to photosensitive composite can be washed under the state of whole cleaning solution that is immersed in regulation with it.Also a plurality of concentrated washings can be need not washing resin moulding product singly.Specifically, can be immersed in the cleaning solution, wash a plurality of synthetic resins being collected under the state of putting into cylinder mould etc.In addition, as previously mentioned, be immersed at synthetic resin and carry out ultrasonic washing under the state of cleaning solution and can remove the photosensitive composite of attachment removal, obtain more effective clean result, thereby be preferred.
After washing finished, water etc. were washed cleaning solution off, then, get final product by dry resin moulding product such as jet airstreams.
[embodiment]
Below, specifically describe the present invention based on embodiment, but the present invention is not subjected to the qualification of these embodiment.
(1) washing of metal container made
(embodiment 1)
Prepare the hermetically sealed can 1 (H of the stainless steel of shape as shown in Figure 1
1(jar overall height)=470mm, H
2(jar effective depth)=400mm; D (jar diameter)=280mm; capacity=19L; quality=5kg; inject the bore=50.8mm φ that discharges oral area 2, the thickness=1.0mm of vessel 4, thickness=0.8mm of top protector 3a; the thickness of bottom protector 3b=1.0mm), make the part of resist composition attached to outside in this jar.Water is diluted to 7 volume % (pH=11.5 with " Block Le one go one Le De J-100 " (trade name (モ ダ Application ケ ミ カ Le society system)), liquid temperature=65 ℃), used as washing (agent) liquid, hermetically sealed can 1 is immersed under the state of this washing (agent) liquid, what apply 28kHz hyperacousticly carries out 10 minutes ultrasonic washings simultaneously.The draining that produces is handled as trade waste after using filter to separate solid content.In addition, as the resist composition, the composition that use is prepared as follows: with 17/83 (mass ratio) mixture, 80 mass parts of C.I. pigment yellow 83 and C.I. pigment green 36, methacrylic acid/benzyl methacrylate/polystyrene macromolecular monomer copolymer (copolymerization mass ratio=25/65/10, weight average molecular weight=55,000) 50 mass parts, double pentaerythritol C5 methacrylate 40 mass parts, 2,2 '-two (2-chlorphenyls)-4,4 ' 5,5 '-tetraphenyl bisglyoxaline 10 mass parts and 4,4 '-mixture of two (diethylamino) benzophenone 10 mass parts is dissolved in ethylene glycol monoethyl ether acetate 800 mass parts.
In addition, water is diluted to 7 volume % with " Block Le one go one Le De J-100 " (trade name (モ ダ Application ケ ミ カ Le society system)) and the solid concentration of the cleaning solution (agent) for preparing is 1.5 quality %.In addition, this cleaning solution (agent) contains diethylene glycol monobutyl ether 0.57 quality %, sodium xylene sulfonate 0.44 quality % and sodium metasilicate 0.39 quality %.
(embodiment 2, comparative example 1～12)
Use washing (agent) liquid shown in the table 1,2, wash with the mode of washing shown in the table 1,2 simultaneously, in addition the same with embodiment 1, carry out the washing of hermetically sealed can 1.In addition, in the record of table 2, " form (1) " is that ethylene glycol monobutyl ether 90 quality %, ammonium fluoride 0.03 quality % and surplus are the washing agent of water, with disclosed washing agent among the embodiment that opens the 2003-171692 communique the spy be the washing agent of same composition.In addition, in the record of table 2, " forming (2) " is the diethylene glycol monobutyl ether 25 quality % aqueous solution, the triethylene glycol monomethyl ether 25 quality % aqueous solution and NH
4The 10 quality % aqueous solution of OH mix the washing agent that obtains with 1: 1: 0.4 volume ratio, open with the spy that disclosed washing agent is the washing agent of same composition among the embodiment of 2003-171694 communique.Below in each table " form (1) " and " forming (2) " with above-mentioned the same meaning use.
(embodiment 3, comparative example 13～17)
The protection film composition replaces the resist composition attached on the hermetically sealed can 1.Afterwards, use washing (agent) liquid shown in the table 3, wash with the mode of washing shown in the table 3 simultaneously, in addition the same with embodiment 1, carry out the washing of hermetically sealed can 1.In addition, as the protection film composition, use composition shown below.
[protection film composition]: in the flask that is equipped with cooling tube, mixer; pack 2 into; 2 '-azo two (isobutyronitrile) 6 mass parts, propylene glycol monomethyl ether acetate 200 mass parts; then; pack into styrene 20 mass parts, GMA 65 mass parts and N-phenylmaleimide 15 mass parts; behind the nitrogen replacement, beginning is slowly stirred.Rise in the temperature of solution under 95 ℃ the state, kept 4 hours, obtain containing the copolymer solution (solid concentration: 32.8 quality %) of copolymer.Behind propylene glycol monomethyl ether acetate 100 mass parts dilution gained copolymer solutions (being equivalent to copolymer 1 00 mass parts (solid content)), add cycloaliphatic epoxy resin (trade name " エ ピ コ-ト 1032H60 ", oiling シ ェ Le エ Port キ シ society system) 20 mass parts, γ-glycidoxy propyl group diethoxy silane 5 mass parts and fluorine-containing surfactant (trade name " メ ガ Off ァ ッ Network 172 ", big Japanese ink chemical industry society system) 0.02 mass parts is further added diethylene glycol (DEG) Methylethyl ethereal solution (25 quality % concentration) 20 mass parts (converting in solid content) of trimellitic anhydride as host.Afterwards, fully stir, film composition is protected.In addition, this protection film composition is to open the identical composition of solidification compound that the embodiment 1 of 2001-158816 communique is put down in writing with the spy.
(embodiment 4, comparative example 18～22)
The insulation film composition replaces the resist composition attached on the hermetically sealed can 1.Afterwards, use washing (agent) liquid shown in the table 4, wash with the mode of washing shown in the table 4 simultaneously, in addition the same with embodiment 1, carry out the washing of hermetically sealed can 1.In addition, as the insulation film composition, use composition shown below.
[insulation film composition]: in the flask that is equipped with cooling tube, mixer, pack 2,2 into '-azo two (2, the 4-methyl pentane nitrile) 7 mass parts, propylene glycol monomethyl ether acetate 220 mass parts.Then, methacrylic acid 22 mass parts of packing into, methacrylic acid bicyclic group ester 38 mass parts, GMA 40 mass parts and α-Jia Jibenyixierjuwu 1.5 mass parts, on one side nitrogen replacement begin slow stirring on one side.Rise in the temperature of solution under 70 ℃ the state, kept 5 hours, obtain containing the copolymer solution (solid concentration: 31.2 quality %) of copolymer.The weight average molecular weight of copolymer is 18500, and molecular weight distribution is 1.8.In addition, weight average molecular weight is to use the mean molecule quantity of the polystyrene conversion of GPC (gel permeation chromatography) (trade name " HLC-8020 ", eastern ソ-society's system) mensuration.Mix gained copolymer solution (being equivalent to copolymer 1 00 mass parts (solid content)), 4,4 '-[1-[4-[1-[4-hydroxyphenyl]-1-Methylethyl] phenyl] ethylidene] bis-phenol (lmol) and 1, the condensation product (4 of 2-naphthoquinones diazido-6-sulfonic acid chloride (2mol), 4 '-the 1-[4-[1-[4-hydroxyphenyl]-the 1-Methylethyl] phenyl] ethylidene] bis-phenol-1,2-naphthoquinones diazido-6-sulphonic acid ester) 30 mass parts and γ-methacryloxypropyl trimethoxy silane 5 mass parts.Be dissolved in the propylene glycol monomethyl ether acetate so that after solid concentration reaches 30 quality %, filter the solution of preparation insulation film composition with the millipore filter of aperture 0.5 μ m.In addition, the solution of this insulation film composition is the identical solution of solution of opening the radiation-sensitive resin composition that the embodiment 1 of 2001-240757 communique put down in writing with the spy.
(embodiment 5, comparative example 23～27)
Interval body replaces the resist composition attached on the hermetically sealed can 1 with composition.Afterwards, use washing (agent) liquid shown in the table 5, wash with the mode of washing shown in the table 5 simultaneously, in addition the same with embodiment 1, carry out the washing of hermetically sealed can 1.In addition, as the interval body composition, use composition shown below.
[interval body composition]: pack 2,2 in the flask that is equipped with cooling tube, mixer into '-azo two (2, the 4-methyl pentane nitrile) 5 mass parts, diethylene glycol (DEG) methyl ethyl ether 200 mass parts.Then, methacrylic acid 20 mass parts of packing into, GMA 45 mass parts, styrene 10 mass parts and methacrylic acid three rings [5.2.1.02,6] last of the ten Heavenly stems-8-base ester 25 mass parts, behind the nitrogen replacement, beginning is slowly stirred.Rise in the temperature of solution under 70 ℃ the state, kept 5 hours, obtain containing the copolymer solution (solid concentration: 33.2 quality %) of copolymer.The weight average molecular weight of copolymer is 24,000.In addition, weight average molecular weight is to use the mean molecule quantity of the polystyrene conversion of GPC (gel permeation chromatography) (trade name " HLC-8020 ", eastern ソ-society's system) mensuration.Mix mixture 80 mass parts of gained copolymer solution (being equivalent to copolymer 1 00 weight portion (solid content)), double pentaerythritol C5 methacrylate and double pentaerythritol methacrylate and Photoepolymerizationinitiater initiater 25 mass parts of following structural formula (1) expression.Be dissolved in propylene glycol monomethyl ether acetate so that after solid concentration reaches 35 quality %, filter with the millipore filter of aperture 0.2 μ m, the preparation interval body is with the solution of composition.In addition, this interval body is identical with the composition solution that the special embodiment 1 that opens the 2001-261761 communique is put down in writing with the solution of composition.
(evaluation method of clean result)
According to benchmark shown below, observe clean result with eyes, divide 3 stages to estimate.Evaluation result is shown in table 1～5.
Zero: do not see remnant (roughly 99% (area occupation ratio) is above can clean)
△: can see remnant (roughly more than 50%, being lower than 99% (area occupation ratio) can clean)
*: can see remnant (roughly being lower than 50% (area occupation ratio) can clean)
Table 1
| Embodiment 1 | | Comparative example 1 | Comparative example 2 | Comparative example 3 | Comparative example 4 | Comparative example 5 | Comparative example 6 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Block Le one go one Le De J-100 *1 | Electrolyzed alkaline water *2 | Varsol EM-3150 *3 | NMP *4 | The ethylene carbonate aqueous solution *5 | Running water *6 | Sodium bicarbonate water *7 |
| Cleaning solution (agent) pH | 11.5 | 10.9 | 112 | - | - | 5.0 | - | 8 |
| Cleaning solution (agent) temperature (℃) | 65 | 55 | 60 | 50 | 50 | 40 | ||
| Wash time (minute) | 10 | 20 | 10 | 5 | 5 | 10 | ||
| Mode of washing | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | (10 minutes) are washed in ultrasonic wave (28kHz) (10 minutes)+hand washing | Ultrasonic wave (40kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (28kHz) | The super-pressure water pump | Air+high-pressure hydraulic pump |
| The evaluation of clean result | ○ | ○ | × | × | × | × | × | × |
| Draining | After separating solid content, trade waste | After separating solid content, trade waste | PH releases after regulating | Trade waste | Trade waste | After solvent solidifies, sintering or regeneration | Release after the water-oil separating | Water-oil separating, pH releases after regulating |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: Ri Donggong advances society's system
*3: new オ オ Star カ society system
*4: new オ オ Star カ society system
*5: Na system テ ッ Network society system
*6: Tokyo イ ス ズ society system
*7: サ Application リ Star society system
Table 2
| Comparative example 7 | Comparative example 8 | Comparative example 9 | Comparative example 10 | Comparative example 11 | Comparative example 12 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Block Le one go one Le De J-200 *1 | バィンァルファST-380 *2 | バィンァルファST- 890T *3 | Form (1) | Form (2) |
| Cleaning solution (agent) pH | 11.5 | 11.5 | - | 6.0 | - | - |
| Cleaning solution (agent) temperature (℃) | 60 | 60 | 40 | 60 | 60 | 60 |
| Wash time (minute) | 10～20 (dippings) | 10～20 (dippings) | 20 | 20 | 20 | 20 |
| Mode of washing | Pump (swivel nozzle) | Pump (swivel nozzle) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) |
| The evaluation of clean result | △ | △ | × | × | × | × |
| Draining | After separating solid content, trade waste | After separating solid content, trade waste | After separating solid content, trade waste | After separating solid content, trade waste | Trade waste | Trade waste |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: waste Chuan Huaxuegongyeshe system (being diluted to 5 volume % uses)
*3: waste Chuan Huaxuegongyeshe system (being diluted to 4 volume % uses)
[table 3]
| | Comparative example 13 | Comparative example 14 | Comparative example 15 | Comparative example 16 | Comparative example 17 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Electrolyzed alkaline water *2 | バインァルファST-380 *3 | バィンァルファST-890T *4 | NMP *5 | Form (1) |
| Cleaning solution (agent) pH | 11.5 | 112 | - | 6.0 | - | - |
| Cleaning solution (agent) temperature (℃) | 65 | 60 | 40 | 60 | 80 | 65 |
| Wash time (minute) | 15 | 20 | 20 | 20 | 10 | 20 |
| Mode of washing | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (28kHz) |
| The evaluation of clean result | ○ | × | × | × | × | × |
| Draining | After separating solid content, trade waste | PH releases after regulating | After separating solid content, trade waste | After separating solid content, trade waste | Trade waste | Trade waste |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: Ri Donggong advances society's system
*3: waste Chuan Huaxuegongyeshe system (being diluted to 5 volume % uses)
*4: waste Chuan Huaxuegongyeshe system (being diluted to 4 volume % uses)
*5: new オ オ Star カ society system
[table 4]
| | Comparative example 18 | Comparative example 19 | Comparative example 20 | Comparative example 21 | Comparative example 22 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Electrolyzed alkaline water *2 | バィンァルファST-380 *3 | バィンァルファST-890T *4 | NMP *5 | Form (1) |
| Cleaning solution (agent) pH | 11.4 | 11.1 | - | 6.0 | - | - |
| Cleaning solution (agent) temperature (℃) | 60 | 60 | 45 | 60 | 75 | 65 |
| Wash time (minute) | 15 | 20 | 20 | 20 | 15 | 20 |
| Mode of washing | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (28kHz) |
| The evaluation of clean result | ○ | × | × | × | × | × |
| Draining | After separating solid content, trade waste | PH releases after regulating | After separating solid content, trade waste | After separating solid content, trade waste | Trade waste | Trade waste |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: Ri Donggong advances society's system
*3: waste Chuan Huaxuegongyeshe system (being diluted to 5 volume % uses)
*4: waste Chuan Huaxuegongyeshe system (being diluted to 4 volume % uses)
*5: new オ オ Star カ society system
[table 5]
| Embodiment 5 | Comparative example 23 | Comparative example 24 | Comparative example 25 | Comparative example 26 | Comparative example 27 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Electrolyzed alkaline water *2 | バィンァルファST-380 *3 | NMP *4 | Varsol EM-315 *5 | Form (1) |
| Cleaning solution (agent) pH | 11.5 | 11.2 | - | - | - | - |
| Cleaning solution (agent) temperature (℃) | 65 | 60 | 45 | 75 | 50 | 65 |
| Wash time (minute) | 20 | 30 | 30 | 15 | 20 | 20 |
| Mode of washing | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (28kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (28kHz) |
| The evaluation of clean result | ○ | × | × | × | × | × |
| Draining | After separating solid content, trade waste | PH releases after regulating | After separating solid content, trade waste | Trade waste | Trade waste | Trade waste |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: Ri Donggong advances society's system
*3: waste Chuan Huaxuegongyeshe system (being diluted to 5 volume % uses)
*4: new オ オ Star カ society system
*5: new オ オ Star カ society system
(investigation)
As show shown in the 1-5, can confirm that embodiment 1-5 has brought into play the clean result than comparative example 1～27 excellence.
(2) washing of synthetic resin
(embodiment 6)
As washings, prepare pipe joint, pipe and the O shape ring (being fluorine resin system) of shape as shown in Figure 3, at the identical resist composition of its surface attachment with embodiment 1 use.Water is diluted to 7 volume % (pH=11.5 with " Block Le one go one Le De J-100 " (trade name (モ ダ Application ケ ミ カ Le society system)), liquid temperature=65 ℃), used as washing (agent) liquid, under washings was immersed in state in this washing (agent) liquid, what apply 28kHz hyperacousticly carried out 20 minutes ultrasonic washings simultaneously.The draining that produces is handled as trade waste after using filter to separate solid content.
(embodiment 7,8)
Replace outside the ultrasonic washing with nozzle, the same with embodiment 6, washing washings (pipe joint, pipe and O shape ring).In addition, " the Block Le one go one Le De J-200 " that water will use in embodiment 8 (trade name (モ ダ Application ケ ミ カ Le society system)) is diluted to 7 volume % and in the washing (agent) for preparing, contains diethylene glycol monobutyl ether, sodium xylene sulfonate and sodium metasilicate.
(comparative example 28～33)
Use washing (agent) liquid shown in the table 6, wash with the mode of washing shown in the table 6 simultaneously, in addition the same with embodiment 6, carry out the washing of washings (pipe joint, pipe and O shape ring).
(evaluation method of clean result)
According to benchmark shown below, observe clean result with eyes, divide 3 stages to estimate.Evaluation result is shown in table 6.
Zero: do not see remnant (roughly 99% (area occupation ratio) is above can clean)
△: can see remnant (roughly more than 50%, being lower than 99% (area occupation ratio) can clean)
*: can see remnant (roughly being lower than 50% (area occupation ratio) can clean)
[table 6]
| Embodiment 6 | Embodiment 7 | Embodiment 8 | Comparative example 28 | Comparative example 29 | Comparative example 30 | Comparative example 31 | Comparative example 32 | Comparative example 33 | |
| Cleaning solution (agent) | Block Le one go one Le De J-100 *1 | Block Le one go one Le De J-100 *1 | Block Le one go one Le De J-200 *1 | Electrolyzed alkaline water *2 | Varsol EM-3150 *3 | NMP *4 | The ethylene carbonate aqueous solution *5 | Running water | Sodium bicarbonate water *7 |
| Cleaning solution (agent) pH | 11.5 | 11.5 | 11.5 | 112 | - | - | 5 | - | 8 |
| Cleaning solution (agent) temperature (℃) | 65 | 60 | 60 | 60 | 50 | 50 | 40 | - | - |
| Wash time (minute) | 20 | 10～20 (dippings) | 10～20 (dippings) | 10 | 5 | 5 | 10 | - | - |
| Mode of washing | Ultrasonic wave (28kHz) | Pump (swivel nozzle) | Pump (swivel nozzle) | Ultrasonic wave (28kHz) (10) minute)+hand washing washs (10 minutes) | Ultrasonic wave (40kHz) | Ultrasonic wave (40kHz) | Ultrasonic wave (28kHz) | The super-pressure water pump | Air+water pump |
| The evaluation of clean result | ○ | △ | △ | × | × | × | × | × | × |
| Draining | After separating solid content, trade waste | After separating solid content, trade waste | After separating solid content, trade waste | PH releases after regulating | Trade waste | Trade waste | After solvent solidifies, sintering or regeneration | Release after the water-oil separating | Water-oil separating, pH releases after regulating |
*1: モ ダ Application ケ ミ カ Le society system (being diluted to 7 volume % uses)
*2: Ri Donggong advances society's system
*3: new オ オ Star カ society system
*4: new オ オ Star カ society system
*5: Na system テ ッ Network society system
*6: Tokyo イ ス ズ society system
*7: サ Application リ Star society system
(investigation)
As shown in table 6, can confirm that embodiment 6～8 compares with comparative example 28～33, can bring into play excellent clean result.
[industrial applicability]
The washing methods of metal container made of the present invention and the washing methods of synthetic resin are easy to adhere to metal container made as the photosensitive composite of polluter, proper as the method for the synthetic resin of its annex as effective washing.
Claims (15)
1. the washing methods of metal container made comprises following operation: use the accurate aqueous systems cleaning solution that contains diethylene glycol (DEG) alkyl ether, sodium xylene sulfonate and sodium metasilicate at least to carry out ultrasonic washing, remove attached to the photosensitive composite on the metal container made.
2. the washing methods of the described metal container made of claim 1, above-mentioned diethylene glycol (DEG) alkyl ether is a diethylene glycol monobutyl ether, the concentration of the above-mentioned diethylene glycol monobutyl ether of above-mentioned cleaning solution is 0.05～10 quality %.
3. the washing methods of the described metal container made of claim 2, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium xylene sulfonate that above-mentioned cleaning solution is contained are 10～150 quality %.
4. the washing methods of claim 2 or 3 described metal container mades, the amount of above-mentioned relatively diethylene glycol monobutyl ether, the ratio of the amount of the above-mentioned sodium metasilicate that above-mentioned cleaning solution is contained are 10～150 quality %.
5. the washing methods of the described metal container made of claim 1, the solid concentration of above-mentioned cleaning solution is 0.1～30 quality %.
6. the washing methods of the described metal container made of claim 1, the liquid temperature of above-mentioned cleaning solution is 40～80 ℃, and pH is 10～12.5, and ultrasonic washing carried out 0.5～60 minute.
7. the washing methods of the described metal container made of claim 1, above-mentioned photosensitive composite are painted resist composition, protection film composition or insulation film composition.
8. the washing methods of synthetic resin comprises following operation: use the accurate aqueous systems cleaning solution that contains the diethylene glycol (DEG) alkyl ether at least to wash, remove attached to the photosensitive composite on the synthetic resin.
9. the washing methods of the described synthetic resin of claim 8, above-mentioned diethylene glycol (DEG) alkyl ether is a diethylene glycol monobutyl ether, the concentration of the above-mentioned diethylene glycol monobutyl ether of above-mentioned cleaning solution is 0.05～10 quality %.
10. the washing methods of the described synthetic resin of claim 9, the amount of above-mentioned relatively diglycol monotertiary butyl ether, the ratio of the amount of the above-mentioned sodium xylene sulfonate that above-mentioned cleaning solution is contained are 10～150 quality %.
11. the washing methods of claim 9 or 10 described synthetic resins, the amount of above-mentioned relatively diglycol monotertiary butyl ether, the ratio of the amount of the above-mentioned sodium metasilicate that above-mentioned cleaning solution is contained are 10～150 quality %.
12. the washing methods of the described synthetic resin of claim 8, the solid concentration of above-mentioned cleaning solution are 0.1～30 quality %.
13. the washing methods of the described synthetic resin of claim 8, the liquid temperature of above-mentioned cleaning solution is 40～80 ℃, and pH is 10～12.5, and washing was carried out 0.5～60 minute.
14. the washing methods of the described synthetic resin of claim 8 uses above-mentioned cleaning solution to carry out ultrasonic washing.
15. the washing methods of the described synthetic resin of claim 8, above-mentioned photosensitive composite are painted resist composition, protection film composition or insulation film composition.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004330927 | 2004-11-15 | ||
| JP2004-330927 | 2004-11-15 | ||
| JP2004330927 | 2004-11-15 | ||
| JP2005307523A JP4830445B2 (en) | 2004-11-15 | 2005-10-21 | Metal container cleaning method and resin molded product cleaning method |
| JP2005-307523 | 2005-10-21 | ||
| JP2005307523 | 2005-10-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1775384A true CN1775384A (en) | 2006-05-24 |
| CN1775384B CN1775384B (en) | 2011-06-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005101315828A Expired - Fee Related CN1775384B (en) | 2004-11-15 | 2005-11-14 | Method for washing metal container and resin formed article |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4830445B2 (en) |
| KR (1) | KR100804982B1 (en) |
| CN (1) | CN1775384B (en) |
| TW (2) | TWI409109B (en) |
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| KR100787820B1 (en) | 2006-10-11 | 2007-12-21 | 경운대학교 산학협력단 | Surface treatment method of magnesium alloys frame of a pair of spectacles |
| CN105603442A (en) * | 2016-02-05 | 2016-05-25 | 上海上创超导科技有限公司 | Normal-temperature foamless oil-removal cleaning agent for highlight metal strip material |
| EP3770697B1 (en) | 2019-07-26 | 2023-08-30 | Comadur S.A. | Method for manufacturing a bevelled stone, in particular for a clock movement |
| CN114682589A (en) * | 2022-04-11 | 2022-07-01 | 云南磷化集团有限公司 | Method for washing quinoline phosphomolybdate precipitate remained in glass sand core crucible |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02233600A (en) * | 1989-03-03 | 1990-09-17 | Toray Ind Inc | Method for processing organic crystal material and organic crystal material |
| JPH06313867A (en) * | 1993-04-28 | 1994-11-08 | Olympus Optical Co Ltd | Detergent composite for precision optical element |
| JP3053550B2 (en) * | 1995-07-14 | 2000-06-19 | クリーンケミカル株式会社 | How to clean medical equipment |
| DE69628464D1 (en) * | 1995-11-27 | 2003-07-03 | Procter & Gamble | CLEANING METHOD FOR FABRICS |
| JP3376800B2 (en) * | 1995-12-13 | 2003-02-10 | 荒川化学工業株式会社 | How to wash goods |
| JPH10186644A (en) * | 1996-12-27 | 1998-07-14 | Hitachi Chem Co Ltd | Production of phosphor pattern |
| CN1195833C (en) * | 1998-11-16 | 2005-04-06 | 宝洁公司 | Cleaning products which uses sonic or ultrasonic waves |
| MXPA02001970A (en) * | 1999-08-25 | 2002-10-31 | Ecolab Inc | Method for removing an ultraviolet light cured floor finish, removable ultraviolet light curable floor finish and strippable finished floor. |
| JP3783512B2 (en) * | 2000-02-29 | 2006-06-07 | Ｊｓｒ株式会社 | Radiation-sensitive resin composition and interlayer insulating film formed therefrom |
| JP2002066498A (en) * | 2000-08-29 | 2002-03-05 | Ryohei Mihara | Cleaning method for container and member containing organic chlorine compound pcb oil |
| KR20020025618A (en) * | 2000-09-29 | 2002-04-04 | 이영석 | Liquid Composition for Aluminum Cleaning |
| JP2003073692A (en) * | 2001-08-31 | 2003-03-12 | Showa Denko Kk | Detergent composition and cleaning method using the same |
| JP4082576B2 (en) * | 2001-10-15 | 2008-04-30 | ジョンソンディバーシー株式会社 | Alkaline cleaning composition |
| KR100646793B1 (en) * | 2001-11-13 | 2006-11-17 | 삼성전자주식회사 | Chemical rinse composition |
| JP4118586B2 (en) * | 2002-04-04 | 2008-07-16 | 花王株式会社 | Resist remover composition for compound semiconductor |
-
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- 2005-10-21 JP JP2005307523A patent/JP4830445B2/en active Active
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- 2005-10-28 TW TW094137936A patent/TWI430850B/en not_active IP Right Cessation
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| TW200624552A (en) | 2006-07-16 |
| JP4830445B2 (en) | 2011-12-07 |
| TWI409109B (en) | 2013-09-21 |
| CN1775384B (en) | 2011-06-08 |
| KR20060054148A (en) | 2006-05-22 |
| TWI430850B (en) | 2014-03-21 |
| JP2006159180A (en) | 2006-06-22 |
| KR100804982B1 (en) | 2008-02-20 |
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