CN1767147B - Electron device manufacturing chamber and forming method thereof - Google Patents

Electron device manufacturing chamber and forming method thereof Download PDF

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Publication number
CN1767147B
CN1767147B CN200510103895.2A CN200510103895A CN1767147B CN 1767147 B CN1767147 B CN 1767147B CN 200510103895 A CN200510103895 A CN 200510103895A CN 1767147 B CN1767147 B CN 1767147B
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chamber
central unit
side component
component
device manufacturing
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CN1767147A (en
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S·库利塔
W·T·布劳尼干
M·伊纳贾瓦
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Applied Materials Inc
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Applied Materials Inc
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Abstract

In a first aspect, a kind of first multi-piece chamber is provided.This first multi-piece chamber comprises: (1) central unit, has the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit; And (3) second side components, be applicable to being connected with the second side of central unit.When central unit, the first side component and the second side component link together, form substantially cylindrical circular inner chamber region.Additionally provide other contents many.

Description

Electron device manufacturing chamber and forming method thereof
This application claims the priority of U.S. Provisional Patent Application US 60/576902 and US 60/587109.US 60/576902 proposed on June 2nd, 2004, title is " semiconductor device fabrication tool and using method thereof " (summary No.8840/L), US 60/587109 proposed on July 12nd, 2004, and title is " electronic installation fabrication tool and using method thereof " (summary No.8840/L2).Here it is all incorporated herein by reference.
Technical field
The present invention relates to flat panel display and/or electronic installation manufacture, particularly relate to electron device manufacturing chamber and forming method thereof.
Background of invention
Because the substrate size used in flat-panel monitor increases, the size for the manufacture of the electron device manufacturing chamber (as process and/or transfer chamber) of large-sized panel display device also must increase.But based on overall dimension and/or the weight of this room, the difficulty manufacturing and transport this room also increases along with the size of this room.Therefore, need the electron device manufacturing chamber for the manufacture of large-sized panel display device improved, comprise the method for this room of transport of improvement.
Summary of the invention
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit; (3) second side components, are applicable to being connected with the second side of central unit.When central unit, the first side component and the second side component link together, form substantially cylindrical circular inner chamber region.
In certain embodiments, provide a kind of central unit, have: (1) first open side; (2) second open side, relative with the first open side; (3) first surface, between the first open side and the second open side, is applicable to being connected with room, and has the opening that passes through of its size permission substrate; (4) second, relative with first surface, between the first open side and the second open side.This second is applicable to being connected with room, and has the opening of the vertical stacking that at least two its sizes allow substrate to pass through.This multi-piece chamber also comprises: (1) first side component, is applicable to being connected with the first open side of central unit, and has at least first surface, and this first surface has an opening, and the size of this opening allows substrate to pass through; (2) second side components, be applicable to being connected with the second open side of central unit, and have at least first surface, this first surface has an opening, and the size of this opening allows substrate to pass through.When the first side component, the second side component and central unit link together, first opening of the opening of the first surface of the first side component, the opening of the first surface of the second side component and second of central unit is generally within sustained height.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) first component; (2) at least second component, is connected with first component, to form multi-piece chamber.The overall dimension of at least one, three multi-piece chamber of the size conforms land of each parts and air transportation regulation does not meet at least one of land and air transportation regulation.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side, the second side and there is the bottom of hemisphere portion; (2) first side components, are applicable to being connected with the first side of central unit; (2) second side components, are applicable to being connected with the second side of central unit.
In certain embodiments, provide a kind of multi-piece chamber, comprising: central unit, this central unit has the first side and the second side and has the bottom of hemisphere portion and flat.Flat has the first thickness, and hemisphere portion has the second thickness being less than the first thickness.Multi-piece chamber also comprises: (1) first side component, is applicable to being connected with the first side of central unit; (2) second side components, are applicable to being connected with the second side of central unit.
In certain embodiments, provide a kind of multi-piece chamber, comprise central unit, have: (1) first side; (2) second sides; (3) first surface, comprises at least one opening, and its size allows substrate to pass through; (4) second, comprise at least three openings, the size of each allows substrate to pass through.This multi-piece chamber also comprises: (1) first side component, is applicable to being connected with the first side of central unit; (2) second side components, are applicable to being connected with the second side of central unit.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit; (3) second side components, are applicable to being connected with the second side of central unit.First side of central unit comprises at least the first recess, is applicable to allowing substrate to rotate in multi-piece chamber, and substrate is sent to the room be connected with the first side component of multi-piece chamber from multi-piece chamber.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit, have at least one laminated structure, be applicable to the movement of the sidewall of reduction first side component; (3) second side components, are applicable to being connected with the second side of central unit.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit.This first side component comprises at least one supporting construction, is applicable to the movement of the sidewall of reduction first side component.This multi-piece chamber also comprises the second side component, is applicable to being connected with the second side of central unit.This second side component comprises at least one supporting construction, is applicable to the movement of the sidewall of reduction second side component.In addition, when central unit, the first side component and the second side component link together, form substantially cylindrical inner chamber region.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit; (3) second side components, are applicable to being connected with the second side of central unit; (4) cover, applicable covering is this central unit at least.This lid comprises flat and multiple support component, is applicable to reducing flat movement in vertical direction.
In certain embodiments, provide a kind of multi-piece chamber, comprising: (1) central unit, there is the first side and the second side; (2) first side components, are applicable to being connected with the first side of central unit; (3) second side components, are applicable to being connected with the second side of central unit; (4) cover, applicable covering is this central unit at least.This lid comprises at least one recess, is applicable to the access of the interior zone being provided in multi-piece chamber, and does not need to remove this lid.
In certain embodiments, provide a kind of multi-part electron device manufacturing chamber, comprise one or more overall dimensions that (1) determines electron device manufacturing chamber; (2) determine how electron device manufacturing chamber is divided into multiple parts, make the size conforms land of each and at least one of air transportation regulation in multiple parts; (3) multiple parts are manufactured.The overall dimension of this multi-piece chamber does not meet at least one of land and air transportation regulation.
In certain embodiments, provide a kind of method of transporting multi-piece chamber, comprise (1) first component by land or the multiple chamber component of air transportation; (2) by the second component of land or the multiple chamber component of air transportation; (3), when transporting the first and second parts, at least one of necessary transportation regulations is met.The overall dimension of this multi-piece chamber violates at least one of land and air transportation regulation.
In certain embodiments, provide a kind of method of transporting multi-piece chamber, this multi-piece chamber has central unit, the first side component and the second side component.What the method comprised (1) by vacuum mechanical-arm is placed in the central unit of this room at least partially; (2) by land or air transportation central unit; (3) the first side component is connected with the second side component; (4) by land or aviation, the first and second side components are transported together; (5), when transporting central unit, the first side component and the second side component, necessary transportation regulations is met.The overall dimension of multi-piece chamber violates at least one of land and air transportation regulation.
In certain embodiments, provide a kind of method that support electronics manufactures room, comprising: electron device manufacturing chamber is connected with one or more slide mechanisms of electron device manufacturing chamber strutting piece by (1); (2) use one or more slide mechanism, to receive the expansion of electron device manufacturing chamber, thus prevention electron device manufacturing chamber shifts out the position on electron device manufacturing chamber strutting piece.
In certain embodiments, the equipment that a kind of support electronics manufactures room is provided.This equipment comprises base, and this base comprises: (1) one or more support component; (2) one or more slide mechanism, this one or more slide mechanism is applicable to being connected with electron device manufacturing chamber and receives the expansion of electron device manufacturing chamber, thus prevention electron device manufacturing chamber shifts out the position on base.
In certain embodiments, provide a kind of equipment, comprise a kind of unit, this unit has: the central unit of (1) multi-piece chamber, is applicable to being connected with the second side component with the first side component, to form multi-piece chamber; (2) vacuum mechanical-arm, is positioned at central unit; (3) base of central unit, is connected with this central unit.The size conforms land of this unit and air transportation regulation at least one.
In certain embodiments, provide a kind of equipment, comprise a kind of unit, this unit has: first side component of (1) multi-piece chamber; (2) the second side component of multi-piece chamber.This first and second side component is applicable to being connected with central unit, to form multi-piece chamber.This unit also comprises: (1) first base member, is connected with the first side component; (2) second base members, are connected with the second side component.The size conforms land of this unit and air transportation regulation at least one.Additionally provide many other sides, above-mentioned with of the present invention and other side is consistent.
Further feature of the present invention and aspect can be become apparent by specific descriptions, subsidiary claim and accompanying drawing below.
Accompanying drawing explanation
Fig. 1 is according to certain embodiments of the invention, the vertical view of the first typical multi-part electron device manufacturing chamber.
Fig. 2 A is according to some embodiment of the present invention, the exploded perspective view of the first typical multi-part electron device manufacturing chamber.
Fig. 2 B is the stereogram that the first Room shown in Fig. 2 A assembles.
Fig. 2 C is the vertical view of the first Room shown in Fig. 2 A.
Fig. 2 D is the end view of the first Room shown in Fig. 2 A.
Fig. 2 E is the stereogram of the first Room of the use replacing cover design shown in Fig. 2 A.
Fig. 3 is according to some embodiment of the present invention, the stereogram of the second typical multi-part electron device manufacturing chamber.
Fig. 4 is according to some embodiment of the present invention, the exploded perspective view of the second typical multi-part electron device manufacturing chamber.
Fig. 5 is according to some embodiment of the present invention, represents the end view being arranged in the first component of the second typical multi-part electron device manufacturing chamber of container.
Fig. 6 represents according to some embodiment of the present invention, represents the end view being arranged in the second component of the second typical multi-part electron device manufacturing chamber of container.
Fig. 7 represents according to some embodiment of the present invention, the stereogram of electron device manufacturing chamber strutting piece.
Fig. 8 represents according to some embodiment of the present invention, and exemplary electronic device manufactures the stereogram of room strutting piece.
Fig. 9 represents according to some embodiment of the present invention, and the exemplary electronic device shown in Fig. 8 manufactures the stereogram of room strutting piece.
Figure 10 is the stereogram that the exemplary electronic device shown in Fig. 9 manufactures that room strutting piece manufactures room for support electronics.
Figure 11 is the stereogram of the typical chassis/central compartment's element that can be used as whole Transporting.
Figure 12 is the stereogram of the side component/base assembly that can be used as whole Transporting.
Embodiment
About central transfer chamber, process central transfer chamber by single aluminium block " scene " and central transfer chamber is decomposed into multiple assembly, inquiring into as the possible method measuring transfer chamber further.Such as, see " LCD large-size substrate periodical; substrate increases: size restrictions wherein? " (LCDLarge-Area Substrate Issues, Substrate Enlargement:Where is the SizeLimitation? "), flat-panel monitor (Flat Panel Display) 2003 (panel seminar (panel discussion)), wherein the I.D.Kang of Applied Komatsu Technologies (AKT) thinks:
If transfer chamber increases further, a kind of equipment scheme is, the processing of single aluminium block is completed ... alternatively central transfer chamber is decomposed into multiple assembly in Asia.Although process transfer chamber by single aluminium block can ensure vacuum condition, also can form the large-scale transfer chamber be made up of assembly, and carry out Assembling, this assembly is made up of some aluminium blocks.
The first aspect of this method and equipment relates to a kind of method and apparatus of improvement, manufactures room, as the measurability of transfer chamber for finding electronic device.The second aspect of this method and equipment relates to a kind of electron device manufacturing chamber of dynamic support.
Electron device manufacturing chamber
Fig. 1 is according to certain embodiments of the invention, the vertical view of the first typical multi-part electron device manufacturing chamber.See Fig. 1, multi-part electron device manufacturing chamber 101 is transfer chamber, for transmitting substrate during manufacture electronic installation.This transfer chamber is connected with one or more process chamber and/or load lock (load locks) 103 during manufacture electronic installation.This transfer chamber can comprise End effector 105, for transmitting substrate 107 during manufacture electronic installation in process chamber and/or load lock 103.Substrate 107 can comprise as glass component, polymer substrate, semiconductor chip or analog.
According to some embodiment of the present invention, transfer chamber 101 can comprise interconnective multiple parts.Especially, transfer chamber 101 can comprise the first component 109 (as the first side component) and second component 111 (as the second side component) that are connected with the 3rd parts 113 (as central unit).First component 109 is connected with the 3rd parts 113 by O-ring (not shown) with second component 111.First component 109 and second component 111 can utilize positioner such as screw, pin or analog to be positioned the 3rd parts 113.Although the multi-part electron device manufacturing chamber 101 of Fig. 1 comprises three parts, this multi-part electron device manufacturing chamber can comprise more or less parts (as 2,4,5,6 etc.).
The width of conventional transfer chamber (as single part transfer chamber) is limited in about 3m or less substantially by land and/or air transportation regulation, transfer capability or architectural design.Such as, be greater than the transfer chamber of about 3m in 747 airfreighters of the most common capacity, may forbid by the transportation regulations of this locality, and may be excessive, not by the access road of standard electronic device manufacturing equipment.On the contrary, in one or more embodiment of the present invention, when this multi-part transfer chamber assembles, its width (as overall width) W1 is 4.2 meters.Therefore, the single part transfer chamber of the comparable routine of electron device manufacturing chamber 101 of the present invention holds larger substrate.The width of electron device manufacturing chamber 101 can be greater than or less than 4.2 meters.
When typical multi-part electron device manufacturing chamber 101 assembles, its shape (as external shape) is hexagon.But, it (if there are eight rooms to be connected to transfer chamber 101, is then such as, octangle that multi-part electron device manufacturing chamber 101 can have other external shape, can in trapezoidal and non-triangular at this situation first and second parts 109,111, as shown in the figure).
Fig. 2 A is according to some embodiment of the present invention, the exploded perspective view of the first typical multi-part electron device manufacturing chamber 101.Each of first to the 3rd parts 109-113 can level connection joint, to form multi-part electron device manufacturing chamber 101.The length of first component 109 represents with LS1, and width represents with WS1.The length of second component 111 represents with LS2, and width represents with WS2.The length of the 3rd parts 113 represents with LC1, and width represents with WC1.
In one or more embodiments, the width W C1 of the 3rd parts 113 is about 2.4m, and length LC1 is about 4.2m.Greater or lesser length and/or width can be used for the 3rd parts 113.In an illustrated embodiment, the overall width W1 of the length LC1 forming chamber 101 of the 3rd parts 113.As shown in the figure, the length LS1 of the first component 109 and length LS2 of second component 111 is equal with the length LC1 of the 3rd parts 113.But the length LS1 of the first component 109 and/or length LS2 of second component 111 may be different.In one embodiment, the width W S1 of the first component 109 and/or width W S2 of second component 111 is about 1.2 meters.But the width W S1 of the first component 109 and/or width W S2 of second component 111 may difference (as greater or lesser).(in a special embodiment, although can utilize first, second, and third parts 109, other relation between 111 and the width of 113, the width that the width of the 3rd parts 113 can be approximately equal to or less than first component 109 adds the width of second component 111).Each parts 109-113 of multi-part electron device manufacturing chamber 101 can be made up of such as aluminium, stainless steel or any available relative inert material being suitable for use as transfer chamber.
Although the overall dimension of multi-part electron device manufacturing chamber 101 does not meet land and/or air transportation regulation, the size conforms land of each parts 109-113 of multi-part electron device manufacturing chamber 101 and/or air transportation regulation.More particularly, in the above-described embodiments, the overall width W1 of multi-part electron device manufacturing chamber 101 is 4.2m, does not meet land and/or air transportation regulation.But the width W S1 of the first component 109 and width W S2 of second component 111 is 1.2m, the width W C1 of the 3rd parts 113 is 2.4m, each meet land and/or air transportation regulation.(in another embodiment, the width W C1 of the 3rd parts 113 is about 3m to 3.2m, and width W S1, the WS2 of the first and second parts 109,111 are about 1.5m to 1.6m.)
In addition, each parts 109-113 of multi-part electron device manufacturing chamber 101 can manufacture in conventional machining center or shop.Therefore, the producer of multi-part electron device manufacturing chamber 101 can select one or many families in multiple conventional machining center or shop, manufactures the parts 109-113 of multi-part electron device manufacturing chamber 101.Competition between many conventional machining centers or shop makes the producer of multi-part electron device manufacturing chamber 101 obtain lower price.On the contrary, the quantity of the machining center or shop that can manufacture single part electron device manufacturing chamber is limited, and the size of this single part electron device manufacturing chamber can hold larger substrate, is similar to multi-part electron device manufacturing chamber 101.This limited machining center or shop quantity constitute competition and weaken.Because competition weakens, producer, for manufacturing this single part room, pay expense more more than manufacture multi-part semiconductor manufacturing room 101.In addition, because this single part room does not meet land and/or air transportation specifies, when the producer of this single part room transports this device, need to obtain special license, such as guard escorts, " special requirement goods " marks or other.And multi-part electron device manufacturing chamber 101 does not need this license.
Describe the further feature of the first multi-part electron device manufacturing chamber 101 referring to Fig. 2 A and Fig. 2 B-2D, wherein Fig. 2 B is the stereogram that the first Room 101 assembles; Fig. 2 C is the vertical view of the first Room 101; Fig. 2 D is the end view (illustrating a face of the first Room 101, the load locking room that three substrates described further below this face is suitable for being connected to are stacking) of the first Room 101.
See Fig. 2 A-2B, the first Room 101 comprises multiple 201a-f (Fig. 2 C).In an illustrated embodiment, there are six faces, but also can have more or less face (as mentioned above).
Each 201a-f provides smooth sidewall, and process chamber, the salable connection of load lock or other room (such as, are enclosed or other seal by O shape) thereon, such as, see room 103, as shown in Figure 1.Although have face 201a-f, the general structure of the first Room 101 is substantially cylindrical.Such as, as seen in figs. 2a-2c, first (side) parts 109 comprise cylindrical wall 203, and face 201b, 201c are formed wherein, and second (side) parts 111 comprise cylindrical wall 205, and face 201e, 201f are formed wherein.3rd (central authorities) parts 113 have the opposing sidewalls 207,209 of substantially flat, as shown in the figure (Fig. 2 A), respectively forming surface 201a, 201d.
Interior zone based on cylindrical wall 203,205, first Room 101 of the first and second parts 109,111 is cylindrical shape (for example, see Fig. 2 A and Fig. 2 C) substantially.The columnar structured internal capacity reducing the first Room 101, and allow the vacuum mechanical-arm (Fig. 7) being arranged in the first Room 101 to rotate freely.This rotation can occur in such as manipulator and rotate to when transmitting substrate between the various rooms be connected with the first Room 101 (Fig. 1).
In order to be adapted to the rotation of vacuum mechanical-arm by the 3rd (central authorities) parts 113 of room 101, the 3rd parts 113 comprise jagged region 211a-d (see Fig. 2 A, wherein illustrate only recess 211a-c).When substrate is transmitted by the opening (as slotted opening) formed in each face of the first and second side components 109,111, recess 211a-d additionally provides modification space.That is, when substrate is transmitted by opening 213,215,217,219 corresponding with face 201f, 201e, 201c, 201b respectively, recess 211a-d can provide modification space (as shown in Figure 2 A and 2 B).
And shown face 201b, 201c, 201e, 201f only has an opening, each can comprise additional opening (as 2,3,4 or more openings).Equally, the face 201a of shown the 3rd (central authorities) parts 113 has single opening 221 (Fig. 2 A), but can comprise additional opening (as 2,3,4 etc.).The face 201d of the 3rd parts 113 comprises the opening 223a-c (Fig. 2 A and Fig. 2 C) of three vertical stackings, but can comprise the opening (as 1,2,4,5 etc.) of other quantity.In at least one embodiment of the present invention, opening 217 vertical arrangement (as shown in Figure 2 D) of the opening 215 of the bottom opening 223c of the face 201d of the 3rd parts 113 and the face 201e of the second side component 111 and the face 201c of the first side component 109.Notice that the size of each opening 213-223c should allow substrate to pass through.Also other structure can be used.
Again see Fig. 2 A-2C, the first and second side components 109,111 comprise multiple laminated structure 225, and each is suitable for the globality providing structure to the first Room 101.Such as, due to the interior zone in the first Room 101 and coupled arbitrary process chamber, and/or the pressure differential between the external environment condition of the first Room 101, laminated structure 225 can reduce the deflection of the cylindrical shape side/roof of the first and second side components 109,111.In addition, use laminated structure 225 that the wall thickness of the first and second parts 109,111 can be made to reduce, and reduce the gross weight of the first Room 101.In one embodiment, laminated structure 225 has the thickness of about 0.55 inch on the outer side/roof side of the first and second side components 109,111, there is on the sealing surface side of the first and second side components 109,111 contacted with central unit 113 (stainless steel material) thickness of about 1.3 inches, but also can use other material and/or thickness.
As further shown in figure 2a, the bottom 227 of the 3rd (central authorities) parts 113 of the first Room 101 comprises flat 229 and hemisphere portion 231 (separately seeing Fig. 2 D).Because hemisphere portion 231 has hemispheric shape, it provides the intensity of improvement to bottom 227, and reduces the material thickness demand of bottom 227.In an exemplary embodiment, when using stainless steel material, hemisphere portion 231 can have about 3/8 " or less thickness, and flat 227 can have about 3/4 "-1 " or less thickness.Other material and/or one-tenth-value thickness 1/10 and/or the thickness difference between flat 229 and hemisphere portion 231 can be used.In order to increase the intensity of hemisphere portion 231 further, laminated structure or similar supporting construction 233 can be formed below hemisphere portion 231, as shown in Figure 2 D.Use laminated structure 233 can reduce the vertical deflection of such as hemisphere portion 231.
Fig. 2 B-2C and Fig. 8 represents the top cover 235 that can be used for the first Room 101.Such as, the 3rd (central authorities) parts 113 (by using O-ring or similar potted component between lid 235 and the 3rd parts 113) that 235 are suitable for sealing first Room are covered.
See Fig. 2 B-2C and Fig. 8, top cover 235 comprises by multiple supporting construction, routine as directed bar 239 and strengthen smooth hermetic unit 237.Hermetic unit 237 can have the thickness similar with the flat 229 (Fig. 2 A) of the bottom 227 of room 101, and bar 239 provides additional structural supports (thickness of lid 235 and weight are reduced).Lid 235 can comprise the linkage unit 241 (such as by crane or analog) for promoting and/or reduce lid 235 relative to the first Room 101.
Based on the weight of lid 235, it is desirable in lid 235, provide one or more access port or other opening, need not remove from the first Room 101 to make whole lid 235 and just can carry out to the first inside, Room 101 accessing (such as safeguarding or other maintenance work).Fig. 2 E is the stereogram of the first Room 101 using replacing cover design 235, and lid 235 comprises two access port 243a-b.Each access port 243a-b can open, and to access to the interior zone of the first Room 101, does not need whole lid 235 to remove from the first Room 101.Also the access port (as 1,3,4 etc.) of other quantity can be adopted.
Fig. 3 is according to some embodiment of the present invention, the stereogram of the second typical multi-part electron device manufacturing chamber 301.Second typical multi-part electron device manufacturing chamber 301 comprises the first to the 5th parts 303-311 linked together.But the second typical multi-part electron device manufacturing chamber 301 can comprise more or less parts.Compared with the first typical multi-part electron device manufacturing chamber 101, each parts of the second typical multi-part electron device manufacturing chamber 301 can vertically connect, to form the second typical multi-part electron device manufacturing chamber 301.
Fig. 4 is according to some embodiment of the present invention, the exploded perspective view of the second typical multi-part electron device manufacturing chamber 301.The first component 303 of the second typical multi-part electron device manufacturing chamber 301 is egg end.The diameter D1 of egg end 303 is about such as 4.2 meters.Egg end 303 can be made up of stainless steel or other material, and can utilize rotary press modelling technology or other technology manufacture.
In the second typical multi-part electron device manufacturing chamber 301, egg end 303 is connected with second component 305, and second component 305 is connected with the 3rd parts 307, and the 3rd parts 307 are connected with the 4th parts 309.Second to the 4th parts 305-309 of the second typical multi-part electron device manufacturing chamber 301 constitutes the main body of the second typical multi-part electron device manufacturing chamber 301.The width W 2 of each in second to the 4th parts 305-309 is about such as 4.2 meters.The width of second component 305, the 3rd parts 307 and/or the 4th parts 309 can be different, although each second to the 4th parts 305-309 is hexagon, also can use other shape.In one aspect, the material of each second to the 4th parts 305-309 is aluminium, but also can use other material.In addition, single parts can be used as main body.
5th parts 311 are the hemisphere bottom for the second typical multi-part electron device manufacturing chamber 301.5th parts 311 are connected with the bottom of the 4th parts 309.This egg end similar, this hemisphere bottom diameter D2 is about such as 4.2 meters.Also other size can be used.
In order to manufacture multi-part electron device manufacturing chamber 101,301, user such as producer can use following creationary method.According to this creationary method, determine one or more overall dimensions of this multi-part electron device manufacturing chamber.Especially, producer needs the substrate manufacturing required size.Based on required size, producer can determine (as design) can manufacture one or more overall dimensions of the multi-part electron device manufacturing chamber of this substrate.If the size of required substrate is enough large, then the overall dimension of this room does not meet at least one of land and air transportation regulation.
Then, producer such as will determine how this multi-part electron device manufacturing chamber is decomposed into multiple parts, specify to make the size conforms land of each in multiple parts and air transportation at least one, simultaneously, when this room assembles, the globality of its structure enough performs manufacture process.Such as, this multi-part electron device manufacturing chamber designed is decomposed into parts by the horizontal segmentation of electron device manufacturing chamber 301 shown in the vertical segmentation of electron device manufacturing chamber 101 shown in Fig. 1-2 or Fig. 3-4 by producer.Producer also can determine, by the segmentation of other direction or combinations of directions, this electron device manufacturing chamber is decomposed into multiple parts.
Then multiple parts are manufactured.Such as, producer manufactures multiple parts by machining center or shop.In this way, multi-part electron device manufacturing chamber 101,301 is manufactured.
Once manufacture multi-part electron device manufacturing chamber 101,301, multi-part electron device manufacturing chamber 101,301 can be transported to such as user site.In order to transport multi-part electron device manufacturing chamber 101,301, producer can utilize the method for this room of transport according to the one or more embodiment of the present invention.Such as, the first component of multiple electron device manufacturing chamber parts transports by land or air transportation.First component can be placed on and meet in the container of transportation regulations, makes side (as the bottom surface) shape of first component and this container at an angle.Like this, the actual height of first component or width dimensions will be greater than permissible value when not being placed on this container with this angle, but still can put into the container meeting transportation regulations.The ability of water transport larger portion part makes this creationary multi-piece chamber be formed by less parts.Therefore, although do not need, preferably these parts are placed in water transport container with an angle.In certain embodiments, preferably manufacture multi-piece chamber, make master unit or central unit large as much as possible, and still can put into standard-sized water transport container, and remainder is little as much as possible, to make assembling easier.
Fig. 5 represents according to some embodiment of the present invention, the first component of the shown in container 501 second typical multi-part electron device manufacturing chamber.With reference to Fig. 5, the width W 3 of container 501 can be such as 3 meters, meets land and/or air transportation regulation.Also the container of less width can be used.First component 303 (as egg end) can be placed in container 501, makes first component 303 about become the angle A of 50 degree with the side 503 (as bottom surface) of container 501.First component 303 also can form greater or lesser angle with the side 503 of container 501.In one embodiment, first component 303 is formed with the side 503 of container 501 and is more than or equal to 50 ° and the angle A being less than or equal to 90 °.Therefore, although the width of first component 303 is 4.2 meters, it is applicable to the container putting into less width.Then, container 501 transports through land or air transportation.In this manner, necessary transportation regulations is met when transporting this first component.
Similarly, the second component 305 of electron device manufacturing chamber 301 transports through land or air transportation.Second component 305 is placed on and meets in the container of transportation regulations, makes the bottom surface shape of second component 305 and this container at an angle.Such as, Fig. 6 represents according at least one embodiment of the present invention, the end view of the second component 305 of the in container 501 second typical multi-part electron device manufacturing chamber 301.With reference to Fig. 6, second component 305 is placed in container 501 in the mode of similar first component 303.
The overall dimension of the multi-part electron device manufacturing chamber 301 assembled violates at least one of land and air transportation regulation.Such as, the overall width of electron device manufacturing chamber 301 is not less than 3 meters, therefore, does not meet land and/or air transportation regulation.Therefore, first and/or second component are such as transported respectively in container 501.
In this way, multi-part electron device manufacturing chamber 101,301 can the work in-process heart or shop manufacture, and overcomes the shortcoming (as cost) of the single part electron device manufacturing chamber manufacturing similar size.Further, multi-part electron device manufacturing chamber 101,301 can be transported to user site, overcomes the shortcoming (as cost, time etc.) of the single part electron device manufacturing chamber transporting similar size.
Support electronics manufactures room
Fig. 7 represents according to the present invention, the stereogram of electron device manufacturing chamber strutting piece 701.With reference to Fig. 7, electron device manufacturing chamber strutting piece 701 comprises base 703.One or more parts of base 703 can be arranged on floor (is such as fixed by ground board binding 704).
Notice and manufacture in the strutting piece of room in routine, one or more parts of base install (as fixing) bottom electron device manufacturing chamber.According to some embodiment of the present invention, to manufacture room strutting piece contrary with routine, and electron device manufacturing chamber strutting piece 701 additionally or alternatively can comprise one or more slide mechanism 705, provides dynamic support part at bottom 707 place of electron device manufacturing chamber 709.One or more slide mechanism 705 comprises slidably bearing, such as, apply the bearing of polytetrafluoroethylene (PTFE), also comprises the elastic support (mount) with load-bearing rubber or analog.The material that other is applicable to also can be used on one or more slide mechanism 705.
Alternatively, one or more slide mechanism 705 can comprise the roller replacing or be additional to sliding bearing.In certain embodiments, electron device manufacturing chamber 709 hangs up by flexible line that is vertical, oblique and/or level, this flexible line with swelliong power permits any expansion of this room, and this swelliong power exceedes the swell increment of electron device manufacturing chamber 709 maximum possible.
One or more slide mechanism 705 is suitable for heat or other expansion of receiving electron device manufacturing chamber 709.Such as, during manufacture electronic installation, the heat from adjacent process chamber can cause the temperature of electron device manufacturing chamber 101,301 more than 200 degrees Celsius or 300 degrees Celsius, causes electron device manufacturing chamber 709 to expand.Slide mechanism 705 stops electron device manufacturing chamber 709 to shift out position (such as on base 703) on electron device manufacturing chamber strutting piece 701.Slide mechanism 705 effectively can receive any possible swell increment of electron device manufacturing chamber, thus stops electron device manufacturing chamber 709 to shift out electron device manufacturing chamber strutting piece 701, even stops it only to shift out its position.
Fig. 8 represents according to some embodiment of the present invention, and exemplary electronic device manufactures the stereogram of room strutting piece 801.With reference to Fig. 8, it can be multi-part strutting piece that exemplary electronic device manufactures room strutting piece 801.Especially, exemplary electronic device manufacture room strutting piece 801 can comprise multi-part base 803.Such as, base 803 can comprise first component 805, second component 807 and the 3rd parts 809.Base 803 also can comprise more or less parts.The parts that exemplary electronic device manufactures room strutting piece 801 correspond to the parts (as 109-113) being manufactured the multi-part electron device manufacturing chamber 101 that room strutting piece 801 supports by exemplary electronic device.
In the example shown in Fig. 8, the 3rd parts 809 (as central unit) of base 803 comprise eight slide mechanisms 705.3rd parts 809 can comprise more or less slide mechanism 705.As shown in Figure 7, one or more slide mechanism 705 can (as direct top) arranged together with ground board binding 704.But slide mechanism 705 also can be positioned at diverse location.Similarly, the first and second parts 805,807 of base 803 can comprise multiple slide mechanism 705.Although be described above multi-part electron device manufacturing chamber strutting piece 801, it can be single part strutting piece that exemplary electronic device manufactures room strutting piece 801.
Notice if thermal expansion causes one or more slide mechanism 705 to arrive the edge of its individual scope, in certain embodiments, other slide mechanism 705 can start to receive any further towards the thermal expansion of original slide mechanism 705.That is, once the external force making slide mechanism 705 move to the limit of its individual scope encounters stop mouth (stop frame) (as described below), expansive force will be redirected to rightabout, be received by other slide mechanism 705.
Fig. 9 represents according to some embodiment of the present invention, and exemplary electronic device manufactures the amplification stereogram of the detail section of room strutting piece 801.With reference to Fig. 9, exemplary electronic device manufactures room strutting piece 801 and comprises one or more slide mechanism 705 with sliding bearing 905 and elastic support 907.
Sliding bearing 905 can comprise the axle or screw rod 903 that are installed on pin or slider disc 901.Slider disc 901 is arranged in recess 904, and the fluoropolymer resin that recess 904 is coated with low-frictional force such as E.I.Du Pont Company produces
Figure GA20183138200510103895201D00141
this recess or " stop mouth " (" stop frame ") 904 can be square circular or any suitable shapes, to adapt to the expected range of the horizontal movement of slider disc 901.Equally, slider disc 901 can be square circular or any suitable shape, to adapt to the expected range of the horizontal movement in recess 904.Sliding bearing 905 can be made up of steel or any suitable material.In certain embodiments, the lower surface of slider disc 901 or side surface also can be coated with the fluoropolymer resin of low-frictional force such as
Figure GA20183138200510103895201D00151
sliding bearing 905 is moved freely in recess 904.Further, slider disc 901 can comprise replacement or be additional to the tectal roller of low-frictional force or ball bearing.In certain embodiments, any suitable mobile bearing can be used to replace sliding bearing 905.
Be installed on the bottom 707 (Fig. 7) that the axle of slider disc 901 or screw rod 903 also can be installed on electron device manufacturing chamber 709.Screw rod 903 can be screwed in the threaded recess of bottom 707 of electron device manufacturing chamber 709, or utilizes any suitable fastener such as nail or other securing member to be fixed.
Elastic support 907 can comprise elastomeric material, as load-carrying bearing vulcanized rubber, to be clipped between mounting disc 908a-b and to be fixed therein.Also other suitable elastomeric material can be used, as metal spring.This mounting disc can be made up of steel or any suitable material, and can comprise the hole making mounting disc be individually fixed in the bottom 707 of electron device manufacturing chamber 709 and support 909 part of base 803.
In operation, sliding bearing 905 can carry the weight of electron device manufacturing chamber 709, when also making electron device manufacturing chamber 709 expand, moves within the acceptable range.Meanwhile, elastic support 907 can make electron device manufacturing chamber 709 be partial to ideal position on electron device manufacturing chamber strutting piece 801 effectively.As mentioned above, the accepted moving range of electron device manufacturing chamber 709 can be determined by the size of the slider disc 901 being arranged in recess 904.The position of this recess and geometry also can affect this moving range.In certain embodiments, elastic support 907 additionally or alternatively can manufacture the moving range of room 709 by limiting electronic device.
For setting forth the present invention further, provide example size.But notice, following size is only the elaboration to specific embodiments, is only used for summarizing the example of relatively suitable size.In certain embodiments, the diameter D3 of slider disc 901 is about 100mm, and recess 904 is laterally about 125mm, and the height h1 of slider disc 901 is about 25mm, and the diameter D4 of axle or screw rod 903 is about 25mm, and the height h2 of screw rod 903 is about 137mm.In certain embodiments, the screw (ISO 965-1, Sect.5, metric system fastener sizes title) of M25 can be used as screw rod 903.Slide mechanism 705 can have the shape different from figure and/or size.In certain embodiments, elastic support 907 can deflect or be stretched to about 15mm.Elastic support 907 can have the shape different from figure and/or size.
Figure 10 is the stereogram that the exemplary electronic device shown in Fig. 9 manufactures room strutting piece 801, represents and which support electron device manufacturing chamber 101.With reference to Figure 10, the elastic support 907 of each strutting piece 801 is connected with the bottom of sliding bearing 905 with electron device manufacturing chamber 101.
When manufacturing electronic installation, electron device manufacturing chamber 101 can extend based on thermal expansion or other power.Especially, a part for the electron device manufacturing chamber 101 above strutting piece 801 can vertically and flatly expand.The elongation of electron device manufacturing chamber 101 or expansion make elastic support 907 compress or elongate, and sliding bearing 705 is moved.In this way, each slide mechanism 705 receives increase or the deflection of arbitrary dilation of electron device manufacturing chamber 101.Remaining slide mechanism 705 uses in a similar manner, and to receive the expansion of this electron device manufacturing chamber, thus prevention electron device manufacturing chamber 101 shifts out the position on electron device manufacturing chamber strutting piece 801.When manufacturing electronic installation, in this way, electron device manufacturing chamber 101 kept in balance and level.On the contrary, the thermal expansion of the manufacture room supported by the conventional support part being only fixedly connected on this electron device manufacturing chamber can cause this electron device manufacturing chamber to shift out, drop and/or destroy this strutting piece.
In order to support electronics manufactures room, the method for this electron device manufacturing chamber of support according to some embodiment of the present invention can be used.Especially, this support electronics manufactures one or more slide mechanisms 705 that room is connected to electron device manufacturing chamber strutting piece 801.One or more slide mechanism 705 for receiving the expansion of electron device manufacturing chamber, thus stops this electron device manufacturing chamber to shift out or the electron device manufacturing chamber strutting piece 801 that drops.Such as, the elastic support 907 of slide mechanism 705 can elongate or compress, to receive the expansion of electron device manufacturing chamber.
Foregoing disclose only exemplary embodiments of the present invention.What fall into the scope of the invention is apparent to the amendment of above-mentioned disclosed equipment and method to those skilled in the art.Such as, although some embodiment above-mentioned relates to transfer chamber, this method and equipment also can be used for the electron device manufacturing chamber of other type, as PVD, CVD or analog process chamber.Further, in one or more embodiments, before the parts of multi-part electron device manufacturing chamber 101,301 are transported to user site, in manipulator can insert (as being assembled into) these parts.Such as, the bottom of vacuum mechanical-arm can be arranged in base 803 the 3rd (central authorities) parts 809 (Fig. 8), as in the base ring 811 of base 803, the top of vacuum mechanical-arm can be arranged in the 3rd (central authorities) parts 113 of room 101.Then the 3rd parts 113 of room 101 can be connected to the 3rd parts 809 of base 803, and the element of base/central compartment can be used as an entirety and transports.Figure 11 is the stereogram comprising the element 1101 of the typical chassis/central compartment of vacuum mechanical-arm (not shown) preparing transport.In at least one embodiment, before water transport, capping unit 1103a-b is installed on more than the open side of the 3rd (central authorities) parts 113 of room 101, and capping unit 1105 is installed on more than the opening of any surface of the 3rd parts 113.Capping unit 1103a-b, 1105 can be made up of aluminium or other suitable material any, can protect any assembly that room 101 is inner and/or be arranged on wherein when water transport.
In one or more embodiment of the present invention, the size conforms land of assembly 1101 and air transportation regulation at least one.Such as, assembly 1101 can have the height of about 3m or less.
In another embodiment of the present invention, the first and second side room parts 109,111 and first and second base members 807,805 can fit together and/or transport together as a whole.Such as, Figure 12 is the stereogram of the side component/base assembly 1201 that can be used as whole Transporting.Such as by the first side component 109 of room 101 is connected to base member 807, by the second side component 111 of room 101 is connected to base member 805, by being fitted together by this side component/base assembly, form assembly 1201, as shown in the figure.Then assembly 1201 is transported as a whole.The capping unit 1203 being similar to capping unit 1105 shown in Figure 11 covers any opening (such as protect this chamber component inner) before being used in water transport.
In one or more embodiment of the present invention, the size of assembly 1201, meets at least one land and air transportation regulation.Such as, assembly 1201 can have the height of about 3m or less.
The parts of room 101,103 and/or base 803 can utilize any suitable method to transport.In at least one embodiment, the side component 109,111 of room 101 can utilize the first Transportation Model (as land, ship, aviation etc.) to transport, and the central unit 113 of room 101 can utilize the second Transportation Model (as land, ship, aviation etc.) to transport.In another embodiment, the first and/or second side component 109,111 transports by the first truck, and central unit 113 transports by the second truck.
In at least one embodiment of the present invention, vacuum mechanical-arm can utilize floating seal parts the movement bottom this manipulator and this room to be separated, as shown in Figure 7 (such as by utilizing bellows seal to be arranged on the base of this room by this manipulator), the U.S. Patent application US 10/601185 that its mode and on June 20th, 2003 propose is similar, it is all incorporated herein by reference at this.
As shown in Fig. 2 A-2E, the side component 109,111 of the first Room 101 is all the single parts not needing independent lid or bottom.Independent lid and/or bottom can be used for side component 109,111 one of them or all, but need the additional seal interface that may degrade and/or leak.
Although the present invention is described mainly for flat-panel monitor, but be appreciated that this creationary multi-piece chamber can be used for transmitting, processing and/or manufacture the substrate of any type, and can be used for the device (such as flat-panel monitor, solar panels and/or battery etc.) transmitting, process and/or manufacture any type.
Be appreciated that transportation regulations may difference (as the U.S., Japan, Korea S, TaiWan, China, China etc.) between country /region.Such as, size restrictions or other relevant shipping parameters may be different between country /region.But the present invention can modify the special transportation regulations (still dropping in the spirit and scope of the invention) adapting to any country /region.
Therefore, although disclose the present invention with reference to exemplary embodiments, should be appreciated that other embodiment also may fall into as defined by the following claims in the spirit and scope of the invention.

Claims (10)

1. a multi-part transfer chamber, comprising:
Central unit, has the first side and the second side, and described first side comprises at least one first recess, and described first recess is suitable for allowing substrate to rotate in multi-piece chamber;
First side component, is applicable to being connected with the first side of central unit; And
Second side component, is applicable to being connected with the second side of central unit;
Wherein, when central unit, the first side component and the second side component link together, form inner chamber region substantially cylindrically; And
This first side component and this second side component have be less than or equal to 3 meters combined width to meet at least one of land and air transportation regulation, and this multi-part transfer chamber has the overall width being greater than 3 meters.
2. multi-part transfer chamber as claimed in claim 1, is characterized in that, forms transfer chamber when described central unit, the first side component and the second side component link together.
3. multi-part transfer chamber as claimed in claim 1, it is characterized in that, central unit has basic rectangular shape.
4. multi-part transfer chamber as claimed in claim 1, it is characterized in that, central unit has about 2.4 meters or wider width.
5. multi-part transfer chamber as claimed in claim 1, it is characterized in that, central unit comprises the bottom with hemisphere portion.
6. a multi-part transfer chamber, comprising:
Central unit, has the first side, the second side and has the bottom of hemisphere portion;
First side component, is applicable to being connected with the first side of central unit, and this first side component has cylindrical wall and at least simultaneously, and described first side comprises at least one first recess, and described first recess is suitable for permission substrate and rotates in multi-piece chamber;
Second side component, is applicable to being connected with the second side of central unit, and this second side component has cylindrical wall and at least simultaneously;
Wherein the overall structure of this room is cylindrical shape substantially; And
This first side component and this second side component have be less than or equal to 3 meters combined width to meet at least one of land and air transportation regulation, and this multi-part transfer chamber has the overall width being greater than 3 meters.
7. a multi-part transfer chamber, comprising:
Central unit, has:
First side, described first side comprises at least one first recess, and described first recess is suitable for allowing substrate to rotate in multi-piece chamber;
Second side;
First surface, comprises at least one opening, and the size of this at least one opening allows substrate to pass through opening; And
Second, comprise at least three openings, the size of each opening allows substrate to pass through opening;
First side component, is applicable to being connected with the first side of central unit and the first base member, and this first side component has cylindrical wall and at least simultaneously; And
Second side component, is applicable to being connected with the second side of central unit and the second base member, and this second side component has cylindrical wall and at least simultaneously;
Wherein the overall structure of this room is cylindrical shape substantially; And
This first side component be connected with this first base member and this second side component be connected with this second base member have the combined width that is less than or equal to 3 meters to meet land and air transportation specify at least one, and this multi-part transfer chamber has the overall width being greater than 3 meters.
8. a multi-part transfer chamber, comprising:
Central unit, has the first side and the second side;
First side component, is applicable to being connected with the first side of central unit, and this first side component has cylindrical wall and at least simultaneously; And
Second side component, is applicable to being connected with the second side of central unit, and this second side component has cylindrical wall and at least simultaneously;
Wherein, the first side of central unit comprises at least one first recess, and this first recess is suitable for allowing substrate to rotate in multi-piece chamber, and is sent to the room be connected with the first side component of multi-piece chamber from multi-piece chamber;
Wherein the overall structure of this room is cylindrical shape substantially; And
This first side component and this second side component have be less than or equal to 3 meters combined width to meet at least one of land and air transportation regulation, and this multi-part transfer chamber has the overall width being greater than 3 meters.
9. multi-part transfer chamber as claimed in claim 8, it is characterized in that, second side of central unit comprises at least one first recess, and this first recess is suitable for allowing substrate to rotate in multi-piece chamber, and is sent to the room be connected with the second side component of multi-piece chamber from multi-piece chamber.
10. an equipment, comprising:
Unit, this unit has:
First side component of multi-piece chamber;
Second side component of multi-piece chamber, wherein, each in first and second side components has cylindrical wall and is applicable to being connected with central unit, to form multi-piece chamber, described central unit has the first side, described first side has at least one first recess, and described first recess is suitable for allowing substrate to rotate in described multi-piece chamber;
First base member, is connected with the first side component; And
Second base member, is connected with the second side component;
Wherein, the height of this unit is less than or equal to 3 meters to meet at least one of land and air transportation regulation, and the overall width of this multi-piece chamber is greater than 3 meters.
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