CN1681102A - 半导体器件中隔离层或层间介质层的平整方法 - Google Patents
半导体器件中隔离层或层间介质层的平整方法 Download PDFInfo
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- CN1681102A CN1681102A CN 200410017564 CN200410017564A CN1681102A CN 1681102 A CN1681102 A CN 1681102A CN 200410017564 CN200410017564 CN 200410017564 CN 200410017564 A CN200410017564 A CN 200410017564A CN 1681102 A CN1681102 A CN 1681102A
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CN 200410017564 CN1292467C (zh) | 2004-04-07 | 2004-04-07 | 半导体器件中隔离层或层间介质层的平整方法 |
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CN 200410017564 CN1292467C (zh) | 2004-04-07 | 2004-04-07 | 半导体器件中隔离层或层间介质层的平整方法 |
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CN1681102A true CN1681102A (zh) | 2005-10-12 |
CN1292467C CN1292467C (zh) | 2006-12-27 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102023477A (zh) * | 2009-09-17 | 2011-04-20 | 中芯国际集成电路制造(上海)有限公司 | 光刻方法 |
CN105990130A (zh) * | 2015-02-04 | 2016-10-05 | 中芯国际集成电路制造(上海)有限公司 | 平坦化方法 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102023477A (zh) * | 2009-09-17 | 2011-04-20 | 中芯国际集成电路制造(上海)有限公司 | 光刻方法 |
CN102023477B (zh) * | 2009-09-17 | 2013-06-19 | 中芯国际集成电路制造(上海)有限公司 | 光刻方法 |
CN105990130A (zh) * | 2015-02-04 | 2016-10-05 | 中芯国际集成电路制造(上海)有限公司 | 平坦化方法 |
CN105990130B (zh) * | 2015-02-04 | 2019-01-18 | 中芯国际集成电路制造(上海)有限公司 | 平坦化方法 |
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CN1292467C (zh) | 2006-12-27 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20111201 |
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Effective date of registration: 20111201 Address after: 201203 Shanghai Zhangjiang Road, Zhangjiang High Tech Park of Pudong New Area No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai Zhangjiang Road, Zhangjiang High Tech Park of Pudong New Area No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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Granted publication date: 20061227 Termination date: 20190407 |