CN1508875A - 消除象限光电探测器光电串扰的方法 - Google Patents

消除象限光电探测器光电串扰的方法 Download PDF

Info

Publication number
CN1508875A
CN1508875A CNA021280258A CN02128025A CN1508875A CN 1508875 A CN1508875 A CN 1508875A CN A021280258 A CNA021280258 A CN A021280258A CN 02128025 A CN02128025 A CN 02128025A CN 1508875 A CN1508875 A CN 1508875A
Authority
CN
China
Prior art keywords
isolating diode
shape
photoelectric
quadrant
crosstalk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA021280258A
Other languages
English (en)
Other versions
CN100517736C (zh
Inventor
朱华海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chongqing Eagle Valley Optoelectronic Ltd
Original Assignee
KEYE PHOTOELECTRIC CO Ltd CHONGQING CITY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KEYE PHOTOELECTRIC CO Ltd CHONGQING CITY filed Critical KEYE PHOTOELECTRIC CO Ltd CHONGQING CITY
Priority to CNB021280258A priority Critical patent/CN100517736C/zh
Publication of CN1508875A publication Critical patent/CN1508875A/zh
Application granted granted Critical
Publication of CN100517736C publication Critical patent/CN100517736C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

本发明公开了一种消除半导体象限光电探测器光电串扰的方法,用于无串扰象限光电探测器的制作,其特征在于:在半导体象限光电探测器象限光敏元之间设计、制作一独立的与光敏元同结构、同极性、同工艺条件、同时制作的隔离二极管,该隔离二极管与象元探测器有一公共电极,另有一独立电极。二极管的管芯形状可以是环形形状,也可以是十字形状,还可以是梳状形状,网状形状以及它们的各种组合形状。应用时,该二极管经接偏置电路后构成短路连接,使产生的串扰光电流及该二极管因直接受光照射产生的光电流一同短路,而不进邻近的光敏元,从而消除光电串扰。应用该方法制作的象限光电探测器与现有象限光电探测器相比,其象限光敏元之间的光电串扰完全被消除,探测灵敏度、制导、跟踪测距等的精度以及可靠性等性能大为提高。

Description

消除象限光电探测器光电串扰的方法
技术领域    本发明涉及一种消除半导体象限光电探测器光电串扰的方法,用于半导体无串扰象限光电探测器的制造。
背景技术    半导体象限光电探测器,包括四象限、六象限、八象限(双四象限)、线列、阵列等各种光电探测器,由于存在着象限间,象元间的光电串扰,因而降低了象限光电探测器的探测灵敏度,制导、跟踪精度和可靠性等性能。象限光电探测器的光电串扰,就是象限光电探测器在受光照射时,光生载流子,即光激发而产生的电子一空穴对,在电场作用下,于其产生区和渡越区的一定范围内作无序运动,进入邻近光敏元所产生的不良效应。为降低象限光电探测器光电串扰的不良影响,研究工作者们采取了以下一些办法:(1)增大象限光电探测器光敏元之间的间隔,即增大盲区;(2)制作光隔离层;(3)减薄光生载流子产生区和渡越区的厚度。但是以上所提及的办法对降低光电串扰的作用是有限的,有的甚至是非常不利的。这是因为:首先对小光斑的情况,增大盲区是不可行的;其次,由于光生载流于是在芯片内部的耗尽层中产生光电串扰,而在芯片表面层和可达到的深度内,制作隔离层是毫无作用的;再者,如减薄光生载流子产生区和渡越区的厚度,将会降低光电探测器光灵敏度和频率响应特性。
发明内容    本发明的目的是:针对现有的降低象限光电探测器光电串扰方法的不足之处,提供一种新方法,用此方法制作象限光电探测器,可消除象限光电探测器的光电串扰,即实现无串扰象限光电探测器的制作。具体技术方案如下:在半导体象限光电探测器的象限光敏元之间,设计、制作一与光敏元同结构、同极性、同工艺条件、同时制作的隔离二极管。二极管管芯片的形状根据象限探测器管芯芯片的形状而确定,它可以是环形形状、十字形形状、梳状形状、网状形状以及他们的各种组合。该隔离二极管与象元探测器有一公共电极,另有一独立电极。应用时,通过管脚与偏置电路的地相连接,实现电路的短路回路,使串扰进入隔离二极管的光电流短路,而不进入邻近的光敏元,达到消除光电串扰的目的。例如,在制作四象限光电探测器时,于四象限光电探测器每个象元间加设一个十字形连接一个环形的隔离二极管,其条宽可根据光敏元光斑尺寸而定,最小条宽可作到数十微米。应用中,该隔离二极管经接偏置电路后,实行短路连接,使产生的光电流一并短路,而不加入邻近光敏元的光电流之中,从而消除了光电串扰。
附图说明    附图1是本发明制作的无串扰四象限光电探测器管芯芯片示意图。
            图中A为侧视图;B为正视图。
            附图2是本发明制作无串扰四象限光电探测器的工艺示意图。
图中[n]、[2]是本征硅(n-si)衬底;[P+]是p+-siP;[n+]是n+-si;[1]、[4]是SiO2层;[3]是B扩散(p+-si)层;[5]是磷扩散(n+-si)层;[6]、[7]是金属电极。
具体实施方式    下面结合附图2介绍本发明的一个实施例,该实施例是用本发明制造无串扰四象限光电探测器的工艺过程。
1、在n型硅(n-si)衬底[2]上生产SiO2层[1],并光刻出B(硼)扩散窗口,如图中(a)所示;
2、通过硼扩散窗口进行B扩散形成p+-si层[3],并在其表面生产SiO2层[4],如图中(b)所示;
3、对n-si衬底[2]背面减薄抛光,并进行磷扩散,形成n+-si层[5],如图中(c)所示;
4、在SiO2层[4]上光刻电极窗口,并蒸发电极金属Al,形成电极接触层[6]、[7],如图中(d)所示。制作完毕。以上方法也可用于八象限(双四象限)和其他多象限光电探测器的制作。

Claims (6)

1、本发明涉及一种消除半导体象限光电探测器光电串扰的方法,用于无串扰象限光电探测器的制作,其特征在于:在半导体象限光电探测器象限光敏元之间,设计、制作一独立的与光敏元同结构、同极性、同工艺条件、同时制作的隔离二极管,该隔离二极管与象元探测器有一公共电极,另有一独立电极。
2、根据权利要求1所述的隔离二极管,其特征在于:隔离二极管的管芯形状是环形形状。
3、根据权利要求1所述的隔离二极管,其特征在于:隔离二极管的管芯形状是十字形状。
4、根据权利要求1所述的隔离二极管,其特征在于:隔离二极管的管芯形状是梳状形状。
5、根据权利要求1所述的隔离二极管,其特征在于:隔离二极管的管芯形状是网状形状。
6、根据权利要求1所述的隔离二极管,其特征在于:隔离二极管的管芯形状是环形形状、十字形状、梳状形状和网状形状的各种组合形状。
CNB021280258A 2002-12-16 2002-12-16 消除象限光电探测器光电串扰的方法 Expired - Fee Related CN100517736C (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB021280258A CN100517736C (zh) 2002-12-16 2002-12-16 消除象限光电探测器光电串扰的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB021280258A CN100517736C (zh) 2002-12-16 2002-12-16 消除象限光电探测器光电串扰的方法

Publications (2)

Publication Number Publication Date
CN1508875A true CN1508875A (zh) 2004-06-30
CN100517736C CN100517736C (zh) 2009-07-22

Family

ID=34231194

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021280258A Expired - Fee Related CN100517736C (zh) 2002-12-16 2002-12-16 消除象限光电探测器光电串扰的方法

Country Status (1)

Country Link
CN (1) CN100517736C (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102544196A (zh) * 2010-12-31 2012-07-04 重庆鹰谷光电有限公司 双色紫光红外光硅基复合光电探测器的制作方法
CN102789993A (zh) * 2011-05-17 2012-11-21 重庆鹰谷光电有限公司 高效、广角、抗干扰、微型激光接收器的制作方法
CN111024220A (zh) * 2019-12-26 2020-04-17 中国科学院长春光学精密机械与物理研究所 一种消除象限光电探测器串扰的信号处理系统
CN112054075A (zh) * 2020-07-31 2020-12-08 重庆鹰谷光电股份有限公司 一种超高精度的硅象限光电探测器

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102569310B (zh) * 2010-12-31 2015-05-13 重庆鹰谷光电有限公司 无盲区、无光电串扰的硅象限光电探测器制作方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102544196A (zh) * 2010-12-31 2012-07-04 重庆鹰谷光电有限公司 双色紫光红外光硅基复合光电探测器的制作方法
CN102544196B (zh) * 2010-12-31 2015-08-05 重庆鹰谷光电有限公司 双色紫光红外光硅基复合光电探测器的制作方法
CN102789993A (zh) * 2011-05-17 2012-11-21 重庆鹰谷光电有限公司 高效、广角、抗干扰、微型激光接收器的制作方法
CN102789993B (zh) * 2011-05-17 2015-08-19 重庆鹰谷光电有限公司 高效、广角、抗干扰、微型激光接收器的制作方法
CN111024220A (zh) * 2019-12-26 2020-04-17 中国科学院长春光学精密机械与物理研究所 一种消除象限光电探测器串扰的信号处理系统
CN112054075A (zh) * 2020-07-31 2020-12-08 重庆鹰谷光电股份有限公司 一种超高精度的硅象限光电探测器
CN112054075B (zh) * 2020-07-31 2023-01-06 重庆鹰谷光电股份有限公司 一种超高精度的硅象限光电探测器

Also Published As

Publication number Publication date
CN100517736C (zh) 2009-07-22

Similar Documents

Publication Publication Date Title
RU2666525C2 (ru) Устройство фотоэлектрического преобразования, аппарат измерения дальности и система обработки информации
JP6346911B2 (ja) 半導体基板用集積フォトダイオード
US8093624B1 (en) High fill-factor avalanche photodiode
CN103887362B (zh) 一种带有深n阱的np型cmos雪崩光电二极管
US6281561B1 (en) Multicolor-color sensor
CN108231946B (zh) 一种单光子雪崩二极管探测器结构及其制造方法
US8350937B2 (en) Solid-state imaging device having pixels including avalanche photodiodes
TW200402146A (en) Photodetector circuits
JP2011009749A (ja) アバランシェフォトダイオード
CN110246903B (zh) 低噪声宽光谱响应的单光子雪崩光电二极管及其制作方法
EP2149158A1 (en) Phototransistor having a buried collector
CN111293131A (zh) X射线探测器及其制备方法
CN209282223U (zh) 一种背照式光电二极管
CN102569310B (zh) 无盲区、无光电串扰的硅象限光电探测器制作方法
US7671392B2 (en) Photoreceiver cell with color separation
CN111180532B (zh) 一种光电二极管及其制作方法以及显示屏
CN101414612B (zh) 半导体受光元件和照度传感器
CN1508875A (zh) 消除象限光电探测器光电串扰的方法
CN207719212U (zh) 背照式图像传感器
CN106252456A (zh) 一种高灵敏度光敏三极管及其制造方法
JP2002314116A (ja) Pin構造のラテラル型半導体受光素子
CN112271229B (zh) 一种硅基背照pin器件结构
CN210349839U (zh) 一种采用tsv技术的无背电极光电探测器阵列结构
US11810938B2 (en) Back-lit image sensor based on heterojunction and preparation thereof
CN102569320A (zh) 图像传感器的感光区域以及制造方法、图像传感器

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20051216

Address after: Chongqing Nanping Nan'an District No. 14 Huayuan Road 44

Applicant after: Zhu Huahai

Address before: Chongqing Nan'an District No. 14 Huayuan Road Nanping

Applicant before: KEYE PHOTOELECTRIC Co.,Ltd. CHON

C14 Grant of patent or utility model
GR01 Patent grant
DD01 Delivery of document by public notice

Addressee: Zhu Huahai

Document name: Notification to Pay the Fees

EE01 Entry into force of recordation of patent licensing contract

Application publication date: 20040630

Assignee: CHONGQING EAGLE VALLEY OPTOELECTRONIC Ltd.

Assignor: Zhu Huahai

Contract record no.: 2013500000068

Denomination of invention: Method for eliminating photoelectric crosstalk for guadrantal photoelectric detector

Granted publication date: 20090722

License type: Exclusive License

Record date: 20130829

LICC Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model
ASS Succession or assignment of patent right

Owner name: CHONGQING EAGLE VALLEY OPTOELECTRONIC LTD.

Free format text: FORMER OWNER: ZHU HUAHAI

Effective date: 20140610

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 400060 NANAN, CHONGQING TO: 400000 ECONOMIC-TECHNOLOGICAL DEVELOPMENT AREA, CHONGQING

TR01 Transfer of patent right

Effective date of registration: 20140610

Address after: 400000 Chongqing City Economic Development Zone Danlong Road No. 7 building E

Patentee after: CHONGQING EAGLE VALLEY OPTOELECTRONIC Ltd.

Address before: 400060 Chongqing Nanping Gold Purple Street No. 126 unit 2 13-4 (longevity garden)

Patentee before: Zhu Huahai

DD01 Delivery of document by public notice

Addressee: Zhu Huahai

Document name: Notification of Passing Examination on Formalities

C56 Change in the name or address of the patentee
CP03 Change of name, title or address

Address after: 400060 Chongqing City Economic Development Zone Danlong Road No. 7 building E

Patentee after: CHONGQING EAGLE VALLEY OPTOELECTRONIC Ltd.

Address before: 400000 Chongqing City Economic Development Zone Danlong Road No. 7 building E

Patentee before: CHONGQING EAGLE VALLEY OPTOELECTRONIC Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090722

Termination date: 20211216

CF01 Termination of patent right due to non-payment of annual fee