CN1457377A - 一种熨斗和熨斗底板 - Google Patents

一种熨斗和熨斗底板 Download PDF

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CN1457377A
CN1457377A CN02800316A CN02800316A CN1457377A CN 1457377 A CN1457377 A CN 1457377A CN 02800316 A CN02800316 A CN 02800316A CN 02800316 A CN02800316 A CN 02800316A CN 1457377 A CN1457377 A CN 1457377A
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sol
coating
flatiron
gel
intermediate layer
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L·H·M·克林斯
Y·L·吴
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G Mcginty Manufacturing Technology Research Institute
Koninklijke Philips NV
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G Mcginty Manufacturing Technology Research Institute
Koninklijke Philips Electronics NV
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    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F75/00—Hand irons
    • D06F75/38—Sole plates
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/02—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
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    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
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    • B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
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Abstract

本发明公开了一种熨斗，其包括表面带有涂层的铝底板，涂层是通过溶胶凝胶工艺涂覆的，其中在铝底板和溶胶凝胶涂层之间设有中间层，中间层是多孔氧化铝层。还公开了制造这种熨斗的方法。该方法包括步骤：设置铝底板，通过在含有磷酸溶液的电解液中对铝底板进行电化学处理得到多孔氧化铝中间层，和在处理后的底板上设置溶胶凝胶涂层。本发明还公开了一种适合用于熨斗的铝底板。

Description

一种熨斗和熨斗底板
技术领域
本发明涉及一种熨斗，其包括带有涂层的铝底板，涂层是通过溶胶凝胶涂复工艺涂复的，其中在铝底板和溶胶凝胶涂层之间设有中间层。本发明还涉及制造这种熨斗的方法以及适用于熨斗的底板。
背景技术
前言中的熨斗可通过本申请人提交的国际申请WO98/13544进行了解。所述专利申请公开了一种带有铝底板的熨斗，铝底板上设置了含有无机聚合物的耐磨层，耐磨层可以通过溶胶凝胶涂复工艺涂复。为了改进耐磨层的抗划伤性，在所述层间设置了硬中间层。所述硬中间层一般厚度在5到60微米之间。
根据WO98/13544，溶胶凝胶型耐磨层的最佳厚度范围在5到15微米之间。厚度超过20微米，由于干燥和固化时层内产生高应力，可观察到溶胶凝胶层有裂纹形成。当与基底的粘结不是很好时，高应力将使溶胶凝胶层脱开。
发明内容
本发明的目的是提供一种如前言所述的熨斗，其中，底板可设置较大厚度的溶胶凝胶层，且溶胶凝胶层不会有脱开的危险。另外的目的是提供制造这种熨斗的方法。此外，本发明还提供了一种底板，这种底板可设置较厚的溶胶凝胶涂层，溶胶凝胶涂层不存在脱开危险。
实现本发明的这些和其他目的是通过一种熨斗，其包括：带有涂层的铝底板，所述涂层是通过溶胶凝胶涂复工艺涂复的，在所述铝底板和所述溶胶凝胶涂层之间设置了中间层。其特征在于，所述中间层是多孔氧化铝层。
所述多孔中间层为连接到表面上的涂层提供了固定点。中间层上的溶胶凝胶渗透入氧化铝的孔中，因而形成一种互相贯穿的网状物。应当清楚，通过设置多孔氧化铝层可以保证界面上有良好的机械粘附。
本发明还可以采用的办法是通过化学方法增加铝底板的表面粗糙度来改善涂复到铝底板的溶胶凝胶涂层的粘附性。
应当注意到，铝底板包括铝和铝合金。
另一种增加铝底板的表面粗糙度的办法是对表面喷砂。然而，尽管溶胶凝胶层的粘附性与未经喷砂处理的铝底板的溶胶凝胶层相比确实增加了，但改进有限。此外，喷砂工艺具有很多的缺点。其中一个是喷砂工艺带来了污染。为了清洁所述污染而进行的表面清理是非常困难和费时的。
为了在涂层和底板之间得到最佳的粘附性能，多孔氧化铝中间层的厚度最好至少0.5微米。
多孔氧化铝层的厚度对于溶胶凝胶层粘附到铝底板和所述溶胶凝胶层的抗划伤性是非常重要的。为了得到良好的粘附性能只能设置非常薄的多孔氧化铝层。这些层的厚度可以达到大约0.5-1微米的程度。但是为了改进表面层的抗划伤性，厚度应当至少为3-4微米，尽管厚些的涂层显示出更好的抗划伤性。考虑到对于实现较厚涂层非常重要的时间因素，多孔氧化铝层最好不超过20微米。
与WO98/13544的中间层厚度相比，根据本发明的中间层非常薄，考虑到涉及的成本，这样更令人感兴趣。
对于将氧化铝层应用于铝底板，还可以知道欧洲专利EP-B-0754256使用了这种工艺。所述专利和本专利之间最重要的差别在于EP-B-0754256的熨斗的实际熨衣表面是氧化铝涂层，而本发明的实际熨衣表面是溶胶凝胶层。与EP-B-0754256不同，根据本发明的熨斗中的氧化铝层是多孔的并用作中间层。
尤其是，溶胶凝胶涂层的厚度为35-90微米，最好是60-70微米。
为了得到希望的溶胶凝胶涂层厚度，所述涂层最好是由不同的次级层组成。。
本发明还涉及到一种制造如上所述熨斗的方法。所述方法的特征在于，其包括：提供铝底板、在含有磷酸溶液的电解液中对铝底板进行电化学处理得到多孔氧化铝中间层、和在处理后的底板上设置溶胶凝胶涂层。
很清楚铝底板的材料可包括铝以及铝合金。这种铝合金中可以含有的元素包括硅、镁、和所属领域的技术人员熟悉的其他适合元素。
溶胶凝胶层可通过所属领域的技术人员熟知不同的方式涂复。但是最好是将溶胶凝胶层喷涂到处理后的铝底板上。
根据本发明的方法来制造熨斗，可以使涂层和底板之间互相机械固定。因为多孔中间层存在开孔结构，涂层将渗透入孔中。
为获得良好的粘附连接，使用带有严格限定的微孔结构的多孔中间层显示出必要性。上面已经说明了在磷酸溶液中进行电化学处理将形成可保证良好粘附连接的适当的孔结构。
电解液最好包括至少5％(体积)的磷酸。
本发明还涉及带有涂层的铝底板，涂层是通过溶胶凝胶涂复工艺涂复的。其中在铝底板和溶胶凝胶涂层之间设置中间层，其适合用于熨斗。根据本发明，中间层是多孔的氧化铝层。可以预想到本发明可以应用于传统的熨斗和蒸汽熨斗。
本发明将参考下面的示例和实施例进行进一步说明。
附图说明。
本申请包括附图，其中：
图1示意性地显示了根据本发明的熨斗；
图2示意性地显示了根据本发明的熨斗底板的放大的细部。
应当注意到，分别在图1或图2中显示的熨斗或底板的各个部分完全是示意性的并且没有按比例绘制。
具体实施方式
图1是根据本发明的熨斗的示意性侧视图。所述熨斗包括壳体1，壳体可以用塑料制成。壳体的底部可设置金属底板2。在本实施例中，底板是用铸铝件6制成的，薄铝板3固定在铸铝件上。薄铝板3还称作熨衣板。如上面所提到的，铝板可含有铝或铝合金。
熨衣板3朝向壳体1外的表面上设置了多孔的氧化铝层4。所述的多孔氧化铝层4用作底层，以便使溶胶凝胶涂层5有良好的粘附。溶胶凝胶层施加在多孔氧化铝层4的表面。氧化铝层的厚度在大约4微米。溶胶凝胶涂层5具有大约65微米的厚度。溶胶凝胶涂层由三层组成，即35微米厚的第一基层，20微米厚的第二基层和10微米厚的顶层。
图2详细地显示出底板2各层的次序。
在另一个优选的实施例中，在熨衣板3两侧设置了多孔的氧化铝层4(未在图1和图2中显示)。在熨衣板3面对壳体1的侧面设置多孔氧化铝层4是很有用的，因为熨衣板3面对壳体的侧面与蒸汽熨斗情况下的蒸汽腔通过硅胶(silicon paste)来密封，设置多孔氧化物层可使硅胶的密封性能得到提高。示例1根据本发明的制造熨斗的方法
首先，铝合金熨衣板在适当的清洁剂中除油，接下来在如硝酸的酸性溶液，或如氢氧化钠的碱性溶液中进行蚀刻，以活化和清洁表面。然后，用自来水和去离子水对熨衣板进行漂洗，然后将板浸入含有15％(体积)磷酸的电解液中。电解液的温度在大约25℃。
熨衣板连接成为阳极，不锈钢反电极用作阴极。施加的电流密度为1.0A/dm2并在整个过程中保持不变。在30分钟后将电流关断。将熨衣板从溶液中取出，用软化水清洗并用80℃的热空气吹干。在电化学反应过程中，熨衣板两面形成多孔的氧化铝层。
对铝熨衣板进行所述预处理之后，通过喷涂涂复三层溶胶凝胶涂层，在炉中350℃的温度下固化15分钟。其后将熨衣板密封到铸铝件6上。示例2
此示例显示出，比之溶胶凝胶涂层与通过喷砂使之粗糙的铝表面的粘附性，溶胶凝胶涂层与通过电化学方法形成多孔氧化铝层的铝表面提高了粘附性和抗划伤性。
准备两块熨衣板。熨衣板I根据示例1进行准备，而熨衣板II根据类似的方式进行准备，只是电化学处理被喷砂取代。
熨衣板和溶胶凝胶涂层之间的粘附性通过围绕尖锐的角部将熨衣板弯曲成90°进行测试。在弯曲部分可见到的损坏给出了粘附性量度。可以将损坏分成从0到5的等级。等级0表示没有粘附发生，换句话，甚至不需弯曲，涂层已脱开。等级5表示非常好的粘附，弯曲时只有非常小的损坏，只是在弯曲部分的边缘见到裂纹。
熨衣板I可获得等级5，而熨衣板II只获得等级3。
向熨衣板I和熨衣板II施加力，测量涂层上的划伤。测试显示出为了使熨衣板I的涂层出现划伤，需要加3.0-3.5kg的力，而熨衣板II的涂层在2.0-2.5kg力时就已经出现划伤。
因此底板I，即经电化学处理的底板，显示出溶胶凝胶涂层具有改进的粘附性和抗划伤性。

Claims (8)

1.一种熨斗，包括：带有涂层的铝底板，所述涂层是通过溶胶凝胶涂复工艺涂复的，在所述铝底板和所述溶胶凝胶涂层之间设置了中间层；其特征在于，所述中间层是多孔氧化铝层。
2.根据权利要求1所述的熨斗，其特征在于，所述多孔氧化铝中间层的厚度至少为0.5微米。
3.根据权利要求1所述的熨斗，其特征在于，所述溶胶凝胶涂层的厚度为35-90微米。
4.根据权利要求3中所述的熨斗，其特征在于，所述溶胶凝胶涂层的厚度为60-70微米。
5.根据权利要求1所述的熨斗，其特征在于，所述溶胶凝胶涂层由不同的次级层组成。
6.一种制造如权利要求1-5中任一项所述熨斗的方法，其特征在于，所述方法包括步骤：设置铝底板，通过在含有磷酸溶液的电解液中对所述铝底板进行电化学处理得到多孔氧化铝中间层，和在处理后的底板上设置溶胶凝胶涂层。
7.根据权利要求6所述的方法，其特征在于，所述电解液包括至少5％(体积)的磷酸。
8.一种带有涂层的铝底板，所述涂层是通过溶胶凝胶工艺进行涂复的，其中在所述溶胶凝胶涂层和所述铝底板之间设有中间层，所述铝底板适用于权利要求1-5中任一项所述的熨斗。
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