CN1428455A - Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment - Google Patents
Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment Download PDFInfo
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- CN1428455A CN1428455A CN 01138914 CN01138914A CN1428455A CN 1428455 A CN1428455 A CN 1428455A CN 01138914 CN01138914 CN 01138914 CN 01138914 A CN01138914 A CN 01138914A CN 1428455 A CN1428455 A CN 1428455A
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- chamber
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- heat treatment
- stainless steel
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 28
- 230000008021 deposition Effects 0.000 title claims abstract description 16
- 239000002131 composite material Substances 0.000 title claims abstract description 11
- 238000000576 coating method Methods 0.000 title claims description 45
- 239000011248 coating agent Substances 0.000 title claims description 44
- 239000010935 stainless steel Substances 0.000 claims abstract description 20
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 20
- 230000005540 biological transmission Effects 0.000 claims description 11
- 230000000740 bleeding effect Effects 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 238000007747 plating Methods 0.000 abstract description 5
- 238000012546 transfer Methods 0.000 abstract description 3
- 230000007704 transition Effects 0.000 abstract 3
- 238000003780 insertion Methods 0.000 abstract 1
- 230000037431 insertion Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 239000000758 substrate Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000012528 membrane Substances 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000001659 ion-beam spectroscopy Methods 0.000 description 4
- 238000007669 thermal treatment Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
The present invention relates to a gas-phase deposition film-plating and vacuum heat treatment on-line combined composite deposition equipment, including deposition chamber, heat treatment chamber, glove box and transition chamber. The transition chamber is made into a stainless steel cylindrical structure, and is set between the deposition chamber, heat treatment chamber and glove box and is connected with the deposition chamber, heat treatment chamber and glove box by means of stainless steel pipeline, and on the stainless steel pipeline a stainless steel high vacuum insertion plate valve is set. Said transition chamber also is equipped with upper cover with observation window, and its side wall is equipped with a transfer bar and a robot, its heat treatment chamber also is equipped with an observation window.
Description
Technical field
The present invention relates to coating technique, specifically the online bonded composite coating equipment of gas-phase deposition coating and vacuum heat treatment.
Background technology
The Application Areas of thin-film material is in continuous expansion, to functional membrane, claims more and more higher to the microstructure and the Composition Control of film from reinforcing membrane, decorating film.Control method for membrane structure and composition profiles has the control of substrate preheating temperature, film forming speed control, ion beam assisted depositing, substrate bias control etc. at present.But, heat treating method but fails effectively to be applied to mould material, and reason is that film device is to separate two equipment of existence with Equipment for Heating Processing in the prior art, and the material behind the plated film will take out from filming equipment, deliver to again in the Equipment for Heating Processing, have the surface contamination problem of film like this.As everyone knows, if fresh material surface is exposed in the air, material surface will be paved with one deck above reactive gas molecule or atom within tens seconds kinds, and film in sending into the process of heat treatment furnace surface adsorption a large amount of reactive gass, in further heat treatment process, part reactive gas atom (as Sauerstoffatom), film forming material (as titanium) that can be higher with activity forms stable compound and retains in the film.Because the function of thin-film material just realizes sometimes the several atomic shells on the surface, and the thickness of thin-film material itself is very thin, this and isolating thermal treatment process of coating process can cause the pollution of certain degree at film surface, influences the performance of film.
The another kind of heat treatment process relevant with the system film is that the high temperature of substrate degass.Under high vacuum condition, the soak process of substrate material is a degasification process, experiment confirm, a lot of metallic substance have two venting peaks respectively at 200～300 ℃ and 700～900 ℃, it is generally acknowledged that low temperature venting peak is dehydration or desorb peak, the high-temperature outgassing peak is the deoxidation peak.The substrate material of handling through the high temperature high vacuum degassing is more pure, and the surface dewatering deoxidation process makes the activation of substrate surface atom, helps and the combining of film forming atom.But, if taking out, this substrate is being put into the plated film position again from heat treatment furnace independently, its surface will the passivation owing to absorption one deck water oxygen film, influences combining of substrate and film.
At present, in the design commercialization of coating chamber chip bench original position to the substrate preheating, it can not realize having the thermal treatment function of Practical significance with regard to himself equipment.This is because in position component and durable temperature limitation such as target electrode, washer and viewing windows, be difficult to realize more than 800 ℃, make sample be in uniform temperature zone, the accurate type of heating of measure sample temperature, also be difficult to realize heat treatment operations such as chilling, so inconvenience is put into coating chamber with heat treatment section.
In addition, the BALZERS vacuum manufacturer of Ri Ben Japanese vacuum (ULVAC), Switzerland and domestic vacuum apparatus manufacturer do not have the transmission that solves between vacuum plating and the thermal chamber to pollute the report of the equipment of design as yet.
Summary of the invention
The purpose of this invention is to provide a kind of gas-phase deposition coating and online bonded composite coating equipment of vacuum heat treatment that can solve the pollution problem of intermediate transfer link.
To achieve these goals, technical scheme of the present invention is: comprise coating chamber, thermal chamber and glove box, it is characterized in that: also comprise transporting room, described transporting room is the stainless steel cylindrical structure, be arranged on described coating chamber, between thermal chamber and the glove box, with coating chamber, thermal chamber and glove box connect by stainless steel pipes, on stainless steel pipes, be provided with stainless steel high vacuum push-pull valve, transmit bar by the sample transmission mechanism, mechanical manipulator can be with substrate or film at the heat treated sample platform, transmit between film plating substrate platform and the glove box position of function; Wherein:
Described transporting room has loam cake, establishes viewing window on it, and the internal diameter of the pipeline size is fit to sample and passes through; The transporting room sidewall is installed one and is transmitted bar, and direction is aimed at coating chamber; Sidewall is also installed a mechanical manipulator, is used to transmit sample; Described transporting room below is provided with one road bleeding point, one road inlet mouth, and by manual cover plate valve control break-make, inlet mouth is connected with pure Ar gas cylinder regulator, and vacuum pressure gauge is installed on the gas circuit respectively;
One viewing window is installed on the described thermal chamber, and its sidewall is installed a mechanical manipulator respectively, and the transmission bar of direction aligning transporting room, and mechanical manipulator is used for sample from transmitting the annealing specimen platform that bar moves to thermal chamber;
Described glove box inboard, the pressing plate hatch door is set by the transporting room interface, communicates with transporting room by stainless steel pipes;
Described coating chamber is magnetron sputtering chamber and ion beam sputtering chamber double-chamber structure, realizes magnetically controlled DC sputtering and ion beam sputtering deposition function respectively, at its sidewall one mechanical manipulator is installed.
The present invention has following advantage:
1. the present invention realizes online transmission, thermal treatment and the encapsulation under vacuum and protective atmosphere of substrate and film; solved the pollution problem of intermediate transfer link; improved the cleanliness factor on substrate surface and film surface, by to the high-quality thermal treatment of film, can be controlled membrane structure, composition and conjugation.
2. the present invention adopts the transporting room structure, can carry out the sample transmission under the vacuum atmosphere, again can be under protective atmosphere and glove box handing-over sample, and then guarantee coating chamber and annealing furnace long term maintenance vacuum atmosphere, save Ar gas and also improved security.
3. the present invention selects for use magnetic force coupled drive mechanical manipulator to transmit sample, guarantees system's resistance to air loss and does not have oily operating environment, long service life.
4. the present invention selects for use push-pull valve to carry out the isolation of vacuum system and open-minded, and vacuum leakproofness is good, and the passage rule is convenient to transmit passing through of bar, long service life.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Fig. 2 is a structure wiring layout of the present invention.
Fig. 3 is the cross section SEM photo of one embodiment of the invention magnetically controlled DC sputtering titanium film.
Embodiment
Embodiment
Structure of the present invention such as accompanying drawing 1, shown in 2, comprise coating chamber 1, thermal chamber 2 and glove box 3, it is characterized in that: also comprise transporting room 4, described transporting room 4 is the stainless steel cylindrical structure, be arranged on described coating chamber 1, between thermal chamber 2 and the glove box 3, with coating chamber 1, thermal chamber 2 and glove box 3 connect by stainless steel pipes, on stainless steel pipes, be provided with stainless steel high vacuum push-pull valve 6, transmit bar 7 by the sample transmission mechanism, mechanical manipulator 8 can be with substrate or film at the heat treated sample platform, transmit between film plating substrate platform and glove box 3 position of function; Wherein:
Described transporting room 4 has loam cake, establishes viewing window 5 on it, and the internal diameter of the pipeline size is fit to sample and passes through; Transporting room 4 sidewalls are installed one and are transmitted bar 7, and direction is aimed at coating chamber 1, adds a supporting roll 9 in leading to coating chamber 1 pipeline, in case shake owing to long during 7 work of described transmission bar; Sidewall is also installed a mechanical manipulator 8, is used to transmit sample; Described transporting room 4 belows are provided with one road bleeding point, one road inlet mouth, and by manual cover plate valve control break-make, inlet mouth is connected with pure Ar gas cylinder regulator, and vacuum pressure gauge is installed on the gas circuit respectively;
One viewing window 5 is installed on the described thermal chamber 2, and its sidewall is installed a mechanical manipulator 8 respectively, and the transmission bar 7 of direction aligning transporting room 4, and mechanical manipulator 8 is used for sample from transmitting the annealing specimen platform that bar 7 moves to thermal chamber 2;
Described glove box 3 inboards, pressing plate hatch door 10 is set by transporting room 4 interfaces, communicates with transporting room 4 by stainless steel pipes;
Described coating chamber 1 is magnetron sputtering chamber 11 and ion beam sputtering chamber 12 double-chamber structures, be installed on the base, realize magnetically controlled DC sputtering and ion beam sputtering deposition function respectively, one mechanical manipulator 8 is installed, be used for sample is moved to the film plating substrate frame from transmitting bar 7 at its sidewall;
Each cavity of composite coating equipment of the present invention is all stainless steel structure; Described glove box 3 is conventional Ar gas displacement normal pressure glove box; The annealing furnace type of heating is conventional internal heat type tungsten filament heating in the thermal chamber 2, and thermal chamber 2 is installed on the base with glove box 3; Mechanical manipulator 8 is sylphon seal magnetic force coupled drive mechanical manipulator; Transmit bar 7 and transmit bar for the magnetic force coupling; Viewing window 5 is the silica glass viewing window.
Present embodiment is used to be coated with the Ti alloy firm: metal substrate 900 ℃ of insulations in the vacuum heat treatment chamber earlier reach 5 * 10 up to vacuum tightness
-4Pa is cooled to room temperature then; The substrate that pyroprocessing is crossed is 5 * 10
-5Be passed to coating chamber 1 under the vacuum atmosphere of Pa and carry out plated film, the film that obtains combine with substrate well, by the scanning electron microscopic observation cross section, substrate-membrane interface does not have cracking continuously referring to accompanying drawing 3.Present embodiment uses molecular pump vacuum acquiring system, system limits vacuum 6 * 10
-5Pa.
The present invention integrates thermal chamber 2 and coating chamber 1 and glove box 3; the high vacuum system that formation can connect; carry out effective vacuum insulation and open-minded between thermal chamber 2 and coating chamber 1 and the glove box 3; thermal chamber 2 is heat-treated under isolated high vacuum state respectively with coating chamber 1 and the operation of plated film; the plated film sample is being implemented in three transmission between the position of function of chamber under vacuum or the protective atmosphere, final vacuum of the present invention is better than 1 * 10
-4Pa, wherein the heat treatment furnace maximum heating temperature should be higher than 1000 ℃ in the thermal chamber 2, the mode of operation of coating chamber 1 can be sputter, ion plating or evaporation etc., also can be for described several plated film modes compound.
Claims (5)
1. gas-phase deposition coating and the online bonded composite coating equipment of vacuum heat treatment, comprise coating chamber (1), thermal chamber (2) and glove box (3), it is characterized in that: also comprise transporting room (4), described transporting room (4) is the stainless steel cylindrical structure, be arranged between described coating chamber (1), thermal chamber (2) and the glove box (3), be connected by stainless steel pipes with coating chamber (1), thermal chamber (2) and glove box (3), on stainless steel pipes, be provided with stainless steel high vacuum push-pull valve (6); Wherein:
Described transporting room (4) has loam cake, establishes viewing window (5) on it; Transporting room (4) sidewall is installed one and is transmitted bar (7), and direction is aimed at coating chamber (1); Sidewall is also installed a mechanical manipulator (8);
Described thermal chamber (2) is gone up a viewing window (5) is installed, and its sidewall is installed a mechanical manipulator (8) respectively, and a direction is aimed at the transmission bar (7) of transporting room (4);
Described glove box (3) is inboard, by transporting room (4) interface pressing plate hatch door (10) is set, and communicates with transporting room (4) by stainless steel pipes;
Described coating chamber (1) sidewall is installed a mechanical manipulator (8).
2. according to described gas-phase deposition coating of claim and the online bonded composite coating equipment of vacuum heat treatment, it is characterized in that: described transporting room (4) below is provided with one road bleeding point, one road inlet mouth, respectively by manual cover plate valve control break-make, inlet mouth is connected with pure Ar gas cylinder regulator, and vacuum pressure gauge is installed on the gas circuit.
3. according to described gas-phase deposition coating of claim and the online bonded composite coating equipment of vacuum heat treatment, it is characterized in that: described mechanical manipulator (8) is a sylphon seal magnetic force coupled drive mechanical manipulator.
4. according to described gas-phase deposition coating of claim and the online bonded composite coating equipment of vacuum heat treatment, it is characterized in that: described transmission bar (7) transmits bar for the magnetic force coupling.
5. according to described gas-phase deposition coating of claim and the online bonded composite coating equipment of vacuum heat treatment, it is characterized in that: described viewing window (5) is the silica glass viewing window.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011389141A CN1161492C (en) | 2001-12-25 | 2001-12-25 | Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011389141A CN1161492C (en) | 2001-12-25 | 2001-12-25 | Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1428455A true CN1428455A (en) | 2003-07-09 |
| CN1161492C CN1161492C (en) | 2004-08-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB011389141A Expired - Fee Related CN1161492C (en) | 2001-12-25 | 2001-12-25 | Gas-phase deposition coating and vacuum heat-treatment on-line combined composite coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1161492C (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102569035A (en) * | 2012-02-27 | 2012-07-11 | 上海先进半导体制造股份有限公司 | Method for reworking wafer after interruption of back metallization process |
| CN103290363A (en) * | 2012-02-24 | 2013-09-11 | 国家纳米科学中心 | Integrated device for preparing organic film device on flexible substrate |
| CN103693256A (en) * | 2013-12-17 | 2014-04-02 | 兰州空间技术物理研究所 | Device and method for unsealing sample sealing device |
| CN108588665A (en) * | 2018-04-27 | 2018-09-28 | 深圳市正和忠信股份有限公司 | Aluminum alloy surface PVD decorative coveringns preparation method and system |
| CN111719132A (en) * | 2020-06-29 | 2020-09-29 | 东部超导科技（苏州）有限公司 | Multi-channel winding device integrating film coating and heat treatment of superconducting strip |
-
2001
- 2001-12-25 CN CNB011389141A patent/CN1161492C/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103290363A (en) * | 2012-02-24 | 2013-09-11 | 国家纳米科学中心 | Integrated device for preparing organic film device on flexible substrate |
| CN103290363B (en) * | 2012-02-24 | 2015-06-24 | 国家纳米科学中心 | Integrated device for preparing organic film device on flexible substrate |
| CN102569035A (en) * | 2012-02-27 | 2012-07-11 | 上海先进半导体制造股份有限公司 | Method for reworking wafer after interruption of back metallization process |
| CN102569035B (en) * | 2012-02-27 | 2016-06-29 | 上海先进半导体制造股份有限公司 | The reworking method of wafer after back metal process disruption |
| CN103693256A (en) * | 2013-12-17 | 2014-04-02 | 兰州空间技术物理研究所 | Device and method for unsealing sample sealing device |
| CN103693256B (en) * | 2013-12-17 | 2015-09-30 | 兰州空间技术物理研究所 | A kind of device and method of deblocking sample sealer |
| CN108588665A (en) * | 2018-04-27 | 2018-09-28 | 深圳市正和忠信股份有限公司 | Aluminum alloy surface PVD decorative coveringns preparation method and system |
| CN108588665B (en) * | 2018-04-27 | 2019-08-13 | 深圳市正和忠信股份有限公司 | Aluminum alloy surface PVD decorative coveringn preparation method and system |
| CN111719132A (en) * | 2020-06-29 | 2020-09-29 | 东部超导科技（苏州）有限公司 | Multi-channel winding device integrating film coating and heat treatment of superconducting strip |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1161492C (en) | 2004-08-11 |
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