CN1234528C - 一种打印装置和形成打印头的方法及打印方法 - Google Patents
一种打印装置和形成打印头的方法及打印方法 Download PDFInfo
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- 239000000758 substrate Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 25
- 238000007639 printing Methods 0.000 claims description 52
- 238000005530 etching Methods 0.000 claims description 43
- 238000007641 inkjet printing Methods 0.000 claims description 26
- 239000004020 conductor Substances 0.000 claims description 23
- 238000000465 moulding Methods 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 238000009413 insulation Methods 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 2
- 238000010018 discharge printing Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 33
- 229910052710 silicon Inorganic materials 0.000 abstract description 32
- 239000010703 silicon Substances 0.000 abstract description 32
- 239000010409 thin film Substances 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 127
- 239000005360 phosphosilicate glass Substances 0.000 description 21
- 229910016570 AlCu Inorganic materials 0.000 description 20
- 229910052715 tantalum Inorganic materials 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 13
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 13
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- 150000004767 nitrides Chemical class 0.000 description 8
- 241000446313 Lamella Species 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 238000002161 passivation Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000004224 protection Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- SLUYGONTZAHWEW-UHFFFAOYSA-N C=1(C(=CC=CC1)O)O.[P].C(CN)N Chemical compound C=1(C(=CC=CC1)O)O.[P].C(CN)N SLUYGONTZAHWEW-UHFFFAOYSA-N 0.000 description 1
- 101100493705 Caenorhabditis elegans bath-36 gene Proteins 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 241000736199 Paeonia Species 0.000 description 1
- 235000006484 Paeonia officinalis Nutrition 0.000 description 1
- 229910004074 SiF6 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- WMBRIIKTEIVKDG-UHFFFAOYSA-N boron;tetraethyl silicate Chemical compound [B].CCO[Si](OCC)(OCC)OCC WMBRIIKTEIVKDG-UHFFFAOYSA-N 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000834 fixative Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- IGELFKKMDLGCJO-UHFFFAOYSA-N xenon difluoride Chemical compound F[Xe]F IGELFKKMDLGCJO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14072—Electrical connections, e.g. details on electrodes, connecting the chip to the outside...
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14032—Structure of the pressure chamber
- B41J2/1404—Geometrical characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/1408—Structure dealing with thermal variations, e.g. cooling device, thermal coefficients of materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14387—Front shooter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Geometry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
一种用集成电路技术生产的一体化打印头,其中将包括喷墨元件(24,62)在内的薄膜层(24,40-50)设置在硅基片(20)的上表面。对以上各层进行蚀刻,以便形成通向所述喷墨元件(24,62)的导电体(25)。至少为每一个喷墨腔(30)设置一个通过薄膜层的输墨孔(26,66,67)。基片(20)的下表面蚀刻一个槽(36),以便油墨(38)能流入该槽。薄膜层的上方表面形成一个有孔层(28),以便形成喷口(34)和喷墨腔(24,62)。
Description
技术领域
本发明涉及一种打印装置和形成打印头的方法及打印方法。
背景技术
喷墨打印机通常具有一个安装在一个支架上的打印头,该支架前后扫描地通过输入该打印机的一张纸的宽度。来自位于所述支架上或位于该支架外部的油墨容器的油墨被输入位于所述打印头上的喷墨腔中。每一个喷墨腔包括一个喷墨元件,如加热电阻器或压电元件,该元件是独立寻址的。给一个喷墨元件供能会导致一个墨滴通过一个喷口喷出,以便在所述媒介上形成一个小点。这些小点的图案形成一个图象或文字。
随着像点分辨率(每英寸上的点数)因工作频率的增加而增加。所述工作元件产生更多的热量。需要将这些热量驱散。热量的驱散是通过被喷射的油墨和打印头基片吸收来自喷墨元件的热量共同完成的。所述基片甚至能够通过向所述打印头输送油墨而冷却。
有关一种特定类型打印头和喷墨打印机的其它信息可以参见US5,648,806,该专利的名称是“用于高分辨率喷墨打印机的宽幅喷口排列的稳定基片结构”,发明人是Steven Steinfield等,该专利被转让给本受让人,并被收作本文参考文献。
随着打印头分辨率和打印速度的提高以便满足消费市场的需求,需要有新的打印头生产技术和结构。因此,需要一种改进的打印头,该打印头至少具有以下特征:以高的工作频率适当吸收来自所述喷墨元件的热量;以最低流回量用适当的再填充速度对喷墨腔进行再填充;最大限度地降低相邻喷墨腔之间的相互干扰;能忍受油墨中的颗粒;提供高的打印分辨率;能够精确对齐喷口和喷墨腔;提供精确的和可预测的墨滴轨迹;生产较简单而且造价较低;并且性能可靠。
发明内容
本发明披露了一种用集成电路技术生产的一体化打印头。在硅基片的上表面设置包括电阻层在内的若干薄膜层。对以上各层进行蚀刻,以便提供通向所述加热电阻器元件的导电接头。可以用压电元件取代所述电阻元件。一个位于所述加热电阻器下面的选择性的导热层吸收来自所述加热电阻器的热量,并将该热量传给所述硅基片和油墨的组合体。
至少为每一个喷墨腔设置一个通过所述薄膜层的输墨孔。在一种实施方案中,输墨孔的数量多于喷墨腔的数量,以便有一个以上的输墨孔为每一个喷墨腔提供油墨。如果一个输墨孔被颗粒堵塞,另一个输墨孔能适当地再填充所述喷墨腔。
在所述基片的下表面蚀刻一个槽,以便油墨能流入该槽,并通过设在所述薄膜层上的输墨孔进入每一个喷墨腔。
在所述薄膜层的上表面形成一个有孔层,以便形成喷口和喷墨腔。在一种实施方案中,可以用光界定材料生产所述有孔层。
公开了各种薄膜结构以及各种输墨装置和有孔层。
所得到的全集成热喷墨打印头可以很高的精度生产,因为整个结构是一体化的,满足了下一代打印头的要求。
附图说明
图1是一种打印盒的实施方案的透视图,该打印盒可采用本文所披露的任一种打印头。
图2是本发明打印头的一种实施方案的部分去掉的透视图。
图3是图2所示打印头底侧的透视图。
图4是沿图2中线4-4的横剖视图。
图5是图2所示打印头的倒置示意图,具有透明的有孔层。
图6是另一种实施方案的打印头一部分倒置示意图。
图7是沿图6中线7-7的透视剖视图。
图8是沿图7中线8-8的横剖视图。
图9是表示图8所示打印头实施方案中的单个喷墨腔的一部分更详细结构的倒置示意图。
图10A-10F是在生产工艺的各个阶段图8所示打印头的横剖视图。
图11是打印头的第二种实施方案的横剖视图。
图12是可以安装本发明打印头的常规喷墨打印机的透视图,以便在媒介上打印。
图1是可以采用本发明打印头结构的一种类型喷墨打印盒10的透视图。图1中的打印盒10是在其主体12中含有大量油墨类型的,但另一种合适的打印盒可以是从外部墨源接收油墨类型的,所述墨源安装在打印头上或者通过一个管与该打印头连接。
将油墨输送给打印头14。打印头14(将在下文进一步说明)将油墨输入喷墨腔,每一个喷墨腔包括一个喷墨元件。给触点16提供电信号,以便单独给所述喷墨元件供能,通过相关的喷口18喷射一个墨滴。常规打印盒的结构和操作是众所周知的。
本发明涉及打印盒的打印头部分,或可以永久性安装在打印机上的打印头,因此,它独立于为该打印头提供油墨的输墨系统。本发明还独立于采用该打印头的特定打印机。
图2是沿图1中线2-2的图1所示打印头一部分的横剖视图。尽管一个打印头可能有300或更多喷口和相关的喷墨腔,为了理解本发明,仅需要对一个喷墨腔进行详细说明。本领域技术人员还可以理解的是,将很多打印头设置在一个硅片上,然后用常规技术彼此分开。
在图2中,在硅基片20上设置了各种薄膜层22(将在下文进一步说明)。所述薄膜层22包括电阻层,用于形成电阻器24。其它的薄膜层起着各种作用,如提供与基片20的电绝缘,提供从所述加热电阻器元件到基片20的导热通道,和提供通向所述电阻器元件的电导体。图中示出了一个导电体25通向电阻器24的一端。一个类似的导电体通向电阻器的另一端。在实际实施方案中,一个腔室中的电阻器和导电体被重叠的各层遮住。
所形成的输墨孔26完全通过薄膜层22。
将一个有孔层28放置在薄膜层22的表面,并进行蚀刻,以便形成喷墨腔30,每一电阻器24对应一个腔室。还要在有孔层28上形成一个集流腔32,以便为一排喷墨腔30提供共同的油墨通道。集流腔32的内部边缘用虚线33表示。喷口34可以用掩模和激光烧蚀通过常规光刻技术形成。
对硅基片20进行蚀刻,以便形成沿着所述成排的输墨孔26的长度分布的槽36,使来自油墨容器的油墨38可以进入输墨孔26,从而为喷墨腔30输送油墨。
在一种实施方案中,每一个打印头大致为1/2英寸长,并包括两排偏置的喷口,每一排包括150个喷口,每一个打印头共有300个喷口。因此,该打印头沿着所述喷口排的方向移动一次可以产生每英寸600个点(dpi)的分辨率,通过多次可以更高的分辨率打印。还可以沿着打印头的扫描方向打印出更高的分辨率。使用本发明可以获得1200或更高dpi的分辨率。
在操作中,为加热电阻24提供电信号,由此将一部分油墨蒸发,在喷墨腔30中形成气泡。该气泡通过相关的喷口34将墨滴推进到媒介上。
然后通过毛细作用对该喷墨腔进行再填充。
图3是图2所示打印头底部的透视图,表示槽36和输墨孔26。在图3所示特定实施方案中,由一个槽36提供通向两排喷墨孔26的通道
在一种实施方案中,每一个输墨孔26的大小小于喷口34的大小,以便通过输墨孔26对油墨中的颗粒进行过滤,并且不会堵塞喷口34。输墨孔26的堵塞对腔30再填充速度的影响很小,因为有多个输墨孔26为每一个喷墨腔30输墨。在一种实施方案中,喷墨孔26的数量多于喷墨腔30的数量。
图4是沿图2中线4-4的横剖视图。图4表示所述单个的薄膜层。在图4所示具体实施方案中,所示出的硅基片20的该部分大约10微米厚。该部分被称为连接部分。整个硅基片20大约为675微米厚。
用常规技术在硅基片20上形成一个厚度为1.2微米的场氧化物层40。然后将一个厚度为0.5微米的磷硅酸盐玻璃(PSG)层42覆盖在氧化物层40上。
可以用一个硼PSG或硼原硅酸四乙酯(BTEOS)层取代层42,不过要用类似于对层42进行蚀刻的方法进行蚀刻。
然后在PSG层42上形成一个厚度为0.1微米的电阻层,例如,铝化钽(TaAl)。还可以使用其它已知的电阻层。所述电阻层在蚀刻之后形成电阻器24。PSG层42和氧化物层40在电阻器24和基片20之间形成电绝缘,在对基片20进行蚀刻时提供一个蚀刻阻挡层,并为超出部分45提供机械支撑。PSG和氧化物层还能对用于连接供能信号于电阻器24的晶体管(未示出)的多晶硅门进行绝缘。
要让背面掩模(用于形成槽36)与输墨孔26完全对齐是困难的。因此,将生产工艺设计成形成一个可变的超出部分45,而不是冒让基片20干涉输墨孔26的危险。
在图4中没有示出,但从图2中可以看到,有一个诸如铝-铜合金的成型金属层覆盖在电阻层上,以便为电阻器提供电气连接。将迹线刻入AlCu和TaAl,以便形成第一电阻器尺寸(例如,宽度)。通过对AlCu层进行蚀刻导致一个电阻部分与AlCu迹线的两端接触形成第二电阻器尺寸(例如,长度)。这种生产电阻器和导电体的技术在本领域中是众所周知的。
在电阻器24和AlCu金属层上形成一个厚度为0.5微米的氮化硅(Si3N4)层46。该层提供绝缘和钝化作用。在沉积氮化硅层46之前,对PSG层42进行蚀刻,从输墨孔26回撤PSG层42,以使其不与任何油墨接触。这样做是重要的,因为PSG层42容易受到某些油墨和用于形成槽36的腐蚀剂的影响。
回刻一层以便防止该层接触油墨的做法还可用于打印头上的多晶硅层和金属层。
在氮化物层46上形成一个厚度为0.25微米的碳化硅(SiC)层48,以便提供额外的绝缘和钝化作用。现在由氮化物层46和碳化物层48保护PSG层42不受油墨和蚀刻剂的影响。还可以用其它非导电层取代氮化物和碳化物层。
对碳化物层48和氮化物层46进行蚀刻,露出AlCu迹线部分,以便与随后形成的接地线(在图4的部位之外)接触。
在碳化物层48的上面形成一个厚度为0.6微米的钽(Ta)的粘接层50。所述钽还在电阻器元件上起着空泡气蚀保护层的作用。层50通过氮化物/碳化物层上的开口接触AlCu导电迹线。
将金(未示出)沉积在钽层50上,并进行蚀刻,以便形成与AlCu迹线中的某一个形成电连接的接地线。所述导电器可以是常规类型的。
还可将AlCu合金和金导电体连接到设在所述基片表面的晶体管上。所述晶体管披露于上文提到过的US5,648,806中。所述导电体可以止于沿着基片20的边缘的电极处。
一个软性电路(未示出)具有连接在所述基片20上的电极上的导电体,并止于该打印机电气连接的接触板16(图1)。
通过对所述薄膜层进行蚀刻形成输墨孔26。在一种实施方案中,使用一个输墨孔掩模。在另一种实施方案中,在对各个薄膜层进行成型时采用若干掩模和蚀刻步骤。
在蚀刻槽36之后,沉积并成型有孔层28。在另一种实施方案中,槽的蚀刻是在有孔层加工之前进行。有孔层28可以由被称为SU8的纺织的环氧树脂制成。在一种实施方案中所述有孔层的厚度大约为20微米。
为了更好地将热量从基片20传到油墨,如果必要可以沉积一背面金属层。
图5是图2所示结构的倒置视图。有关元件的尺寸如下:输墨孔26为10微米×20微米;喷墨腔30为20微米×40微米;喷口34的直径为16微米;加热电阻器24为15微米×15微米;而集流腔32的宽度为大约20微米。以上尺寸可以根据所使用的油墨、工作温度、打印速度、期望的分辨率和其它因素而变化。
图6是打印头的另一种实施方案的一部分的倒置视图。在该打印头上,不存在油墨集流腔。输送到每个喷墨腔的油墨是由两个专门的输墨孔提供的。该打印头的其它视图在图7、8和9中示出。在所示实施方案中,输墨孔的数量为加热电阻器数量的2倍。在另一种实施方案中,每一个喷墨腔具有一个或更多的专用输墨孔。
在图6中,喷墨腔60的外形与加热电阻器62、喷口64(该喷口的较小的直径用虚线表示)和输墨孔66和67一起示出。输墨孔66和67被设计成小于喷口64,以便在任何颗粒到达腔室60之前将其过滤。如果颗粒堵塞一个输墨孔,另一个输墨孔的大小能够以接近工作频率的速度对腔室60进行适当再填充。
图7是沿图6中线7-7的横剖透视图,表示一个喷墨腔60。
在图7中,在硅基片70上设置若干薄膜层72(在图8中示出),包括电阻层和AlCu合金层,对其进行蚀刻以及形成加热电阻器62。所示出的AlCu导电体63通向电阻器62。
产生透过薄膜层72的输墨孔67,以便延伸到硅基片70的表面。然后在薄膜层72上设置有孔层74,以便形成喷墨室60和喷口64。对硅基片70进行蚀刻,以便形成沿成排的喷墨腔的长度分布的槽76。可以在有孔层之前形成槽76。所示的来自油墨容器的油墨78流入槽76,通过输墨孔67并进入腔60。
图8是沿图6中线8-8的横剖视图,表示腔室60的一半。其另一半与图8对称。与第一种实施方案不同,图8的结构使用一个位于加热电阻器下面的金属层排出电阻器的热量,并将该热量转移到所述基片和油墨本身,而在第一种实施方案中,硅基片20的一部分直接位于加热电阻器下面,以便散发来自电阻器的热量。
在形成槽76之前,在硅基片70上形成厚度为1.2微米的氧化物绝缘层90(图7)。在图8中示出的是形成槽76之后的部分打印头,因此在视场内未示出基片70。
然后将厚度为0.5微米的PSG层92沉积在氧化物层90上。正如结合图4说明时所述,所述氧化物和PSG层在加热电阻器和下部导电层之间提供电绝缘和导热性,并在槽76刻出之后在其余的硅基片部分之间的连接部分提供加强的机械支撑。另外,如上文所述,将PSG层92从输墨孔67上抽回,以避免与油墨接触,否则油墨会与PSG发生反应。
在PSG层92上形成一个厚度为0.1微米的TaAl电阻层。在所述TaAl层上形成一个AlCu层(未示出)。按上文所述形成各个加热电阻器62和导电体63(图7)的方法对TaAl和AlCu进行蚀刻。
然后在电阻器62和AlCu导电体上形成一个厚度为0.5微米的氮化物层96,接着再形成一个厚度为0.25微米的碳化硅层98。对所述氮化物/碳化物层进行蚀刻,以便露出部分AlCu导电体。
然后沉积一厚度为0.6微米的钽粘接剂层100,接着是一个金导电层,然后对这两层进行蚀刻,以便形成与某个AlCu导电体呈电接触的金导电体,该AlCu导电体通向加热电阻器62并最终止于沿所述基片边缘分布的结合板。在一种实施方案中所述金导电体是接地线。
然后蚀刻透过薄膜层的输墨孔67(或者在生产所述薄膜层期间成型)。然后设置有孔层74,并进行蚀刻,形成腔60和喷口64。喷口64还可以通过激光烧蚀成型。
然后对基片70的背面(图7)进行沉积,并使用TMAH蚀刻剂进行蚀刻,以形成沿着一排喷墨腔60的长度分布的槽76。可以使用若干蚀刻技术,湿或干技术中的任一种。干蚀刻剂的例子包括XeF2和SiF6。合适的湿蚀刻剂的例子包括乙二胺磷苯二酚(EDP),氢氧化钾和TMAH。还可以使用其它蚀刻剂。可将上述蚀刻剂中的任一种或其组合用于本申请。
槽76可以具有大约为一个喷墨腔的宽度或者可以具有包括若干排喷墨腔的宽度。所述槽可以在所述生产工艺的任何时间成型。
在形成槽76之后,在硅片的背面在氧化物层90上面形成一个厚度为0.1微米的钽粘接剂层101,然后在粘接剂层101上形成一个厚度为1.5微米的诸如金(Au)的导热层102。接下来在导热层102上再形成一个厚度为0.1微米的钽粘接剂层103。
图9是用在图6所示打印头上的喷墨腔60的一半的倒置视图。图9表示对各层的蚀刻,并且与图8结合阅读。从输墨孔67开始,由氧化物和钝化层90、96和98形成一个大约2微米长的叠层。该叠层的长度还可以为其它尺寸,例如1-100微米。所示的钽100(用作金导体的粘接层)超出PSG层92一微米,并显示PSG层92超出电阻器62二微米
图10A-10F是在图8所示打印头的生产期间的各个步骤的硅片的一部分的横剖视图。除非另有说明,使用常规沉积、掩模、和蚀刻步骤。
在图10A中,将具有结晶方向(111)的硅基片70放置在一个真空室中。让场氧化物90以常规方式生成。然后用常规技术沉积PSG层92。图10A表示用常规光刻技术在PSG层92上形成掩模110。然后用常规活性离子蚀刻(RIE)对PSG层92进行蚀刻,将PSG层92从随后形成的喷墨孔上回撤。
在图10B中,将掩模110去掉,并将一个TaAl的电阻层111沉积在硅片表面。然后在TaAl上沉积一个AlCu的导电层112。沉积一个第一掩模113,并用常规光刻技术成型,用常规IC生产技术对导电层112和电阻层111进行蚀刻。使用另一个掩模和蚀刻步骤(未示出),以便按上文所述方式去掉覆盖在加热电阻器62上的AlCu部分。所得到的导体AlCu位于图10A-F的视野之外。
在图10C中,用常规技术在硅片上面沉积钝化层、氮化物层96和碳化物层98。然后对钝化层进行掩模(在视野之外)并利用常规技术蚀刻,以便露出AlCu导电迹线的一部分,与随后的金导电层形成电接触。
然后在硅片上沉积一个钽粘接剂层100和金导电层114,用第一掩模115保护,并用常规技术蚀刻,以便形成接地线,该接地线止于沿所述基片边缘的粘接板。第二掩模(未示出)去掉了Ta粘接剂层100上的部分金,如覆盖在加热器部位上的金。
图10D表示在图10C中的步骤之后所得到的结构,使掩模116露出待蚀刻的薄膜层的一部分,以便形成输墨孔。另外,在成型各个薄膜层时可以使用多个掩模和蚀刻步骤,以便刻出所述输墨孔。
图10E表示在对所述薄膜层进行蚀刻之后的结构。所述薄膜层是使用各向异性的蚀刻剂蚀刻的。这种输墨孔蚀刻工艺可以是若干种蚀刻剂的组合(RIE或湿型)。输墨孔67可以与被成型的薄膜一起在生产期间用一种蚀刻剂生产。孔67可以用一个掩模和蚀刻步骤形成或者用一系列蚀刻步骤形成。所有蚀刻都可以使用常规IC生产技术。
然后用常规技术对硅片的背面进行掩模,露出油墨槽部分76(参见图7)。槽76是用湿蚀刻工艺用四甲胺氢氧化物(TMAH)作为蚀刻剂蚀刻的,以便形成倾斜的形状。还可以使用其它湿各向异性的蚀刻剂。(参见U.Schnakenberg等,用于硅微加工的TMAHW蚀刻剂,技术文摘,第六届固态传感器和致动器国际会议(换能器91),加州,旧金山,1991年6月24-28日,815-818页)。所述湿蚀刻剂将形成倾斜的槽76。槽76可以延长打印头的长度或者为了改善打印头的机械强度,仅仅延伸位于喷墨腔60下面的打印头的一部分长度上。如果考虑到所述基片与油墨反应的话,可以在所述基片上沉积一个钝化层。
在图10F中,将钽粘接剂层101迅速蒸发或者喷在所述基片下表面,然后再沉积金导热层102和另一个钽层103。这些层起着导热层的作用,并提供连接部分的机械强度。
图10F还表示有孔层74的成型。在一种实施方案中,有孔层74是可以光学成像的材料,如SU8。有孔层74可以是重叠、网状或纺织物。所述喷墨腔和喷口是通过光刻技术形成的。
在图8中示出了对有孔层74进行蚀刻以后所得到的结构。有孔层74还可以用两步骤形成,对第一层进行成型,以便形成油墨腔,对第二层进行成型以便形成喷口。
然后对所得到的硅片进行切割,形成单个打印头,然后将用于为该打印头上的导电体提供电力入口的软性电路(未示出)连接在位于所述基片边缘的连接板上,然后将所得到的组件固定在塑料打印盒上,如图1所示,并使该打印头相对打印盒主体密封,以防止油墨泄露。
图11是类似于图4所示打印头的第二种实施方案的一部分的横剖视图,所不同的是位于硅片上的槽并没有从头到尾蚀刻到薄膜层。相反,对大块的硅120进行局部蚀刻,在加热电阻器24下面形成一个薄的硅粘接部分。为了达到这一目的,在沉积薄膜层之前,用掩模对硅片的正面进行造型,以便露出位于所述槽部位的硅面,对槽的部位不进行彻底的蚀刻。然后用诸如硼的P-型掺杂剂对暴露的部分进行掺杂,达到大约1-2微米的深度。该深度可以高达15微米或更深。然后将掩模去掉。用背面硬掩模限定要进行槽蚀刻的部位。然后对硅片的背面进行TMAH蚀刻工艺,该工艺仅蚀刻未掺杂的硅部分。位于槽部位的硅部分的厚度为大约10微米,现在该部位位于电阻器24上面。
可以用类似工艺形成图4中的薄硅连接部分。
与图4中编号相同的薄膜层可能是相同的,并且随后用类似于上文所述工艺成型。如上所述,这些薄膜层然后被蚀刻以形成输墨孔118。有孔层122可以与图8所示有孔层相同。
图11所示打印头的一个优点是位于电阻器24下面的硅可以传导来自电阻器24的热量。
集成电路生产领域的技术人员可以理解用于生产本文所述打印头结构的各种技术。所述薄膜层及其厚度可以改变,某些层可以去掉,而仍然能获得本发明的优点。
图12表示可采用本发明的喷墨打印机130的一种实施方案。除本发明以外,还可用喷墨打印机的多种其它设计。有关喷墨打印机的更多细节参见授予Norman Pawlowski等的US5,852,459中,该专利被收作本文参考文献。
喷墨打印机130包括一个装纸张134的输入盘132,用滚子137向前输送所述纸张通过打印区135,以便在它上面打印。纸134然后向前到达输出盘136。由一个活动打印支架138支撑打印盒140-143,这些打印盒分别打印蓝绿色(C)、黑色(K)、深红色(M)、和黄色(Y)油墨。
在一种实施方案中,将装在可更换的油墨支架146中的油墨通过柔性输墨管148输送给相关的打印盒。所述打印盒还可以是这种类型的:它装有大量流体,并可以再填充或不能再填充。在另一种实施方案中,所述墨源与所述打印头部分分开,并可分离地安装在打印架138上的打印头上。
打印架138通过常规传动带和滑轮系统沿着扫描轴线运动,并沿着滑动杆150滑动。在另一种实施方案中,该打印架是固定的,并由一排固定打印盒在运动的纸张上打印。
来自常规外置计算机(例如,PC)的打印信号由打印机130处理,以便产生一个待打印的点的位图。然后将该位映像转换成打印头的工作信号。在打印时,当打印架138沿着扫描周线向后和向前运动时的位置是由一个光学编码器条确定的,通过打印架138上的光电元件检测,导致每一个打印盒上的多个喷墨元件在打印架扫描期间的合适时间选择性地工作。
所述打印头可以使用电阻、压电、或其它类型的喷墨元件。
当打印架138上的打印盒扫描通过纸张时,通过打印盒重叠而打印出一行行字符,在经过一次或几次扫描之后,纸张134沿着朝向输出盘136的方向移动,并且打印架138继续扫描。
本发明同样适用于其它打印系统(未示出),该系统使用另一种媒介和/或打印头移动机构,如采用了磨擦轮、输送辊、或滚筒或真空带技术来支撑并相对打印头组件移动打印媒介的装置。采用磨擦轮设计,用一个磨擦轮和夹紧辊沿着一条轴线向后和向前移动所述介质,同时携带一个或几个打印头组件的打印架沿着垂直轴线方向扫描通过所述媒介。对于滚筒打印机设计而言,将所述媒介安装在一个旋转滚筒上,该滚筒沿一个轴线旋转,同时由一个打印架携带一个或几个打印头组件沿一条垂直轴线扫描通过所述媒介。在滚筒或磨擦轮设计中,扫描通常不是图12所示系统那样以向后和向前方式进行。
可以在一个基片上设置多个打印头。另外,可将一排打印头分布在一张纸的整个宽度上,这样就不需要所述打印头的扫描;只是所述纸张垂直于所述排列移动。
位于所述支架上的其它打印盒可以包括其它颜色或定色剂。
尽管业已对本发明的特定实施方案进行了图示和说明,本领域技术人员显而易见的是,可以在不超出本发明广义范围的前提下进行改变和改进,因此,所附权利要求书用来包括落入本发明实际构思和范围内的所有上述改变和改进。
Claims (10)
1.一种打印装置,包括:
一个打印头,包括:
一个基片(20,70);
设置在所述基片(20,70)第一表面上的若干薄膜层(24,40-50,72),所述薄膜层中的至少一层形成若干喷墨元件(24,62),其它薄膜层至少包括提供与基片(20,70)电绝缘的层、从所述喷墨元件到基片(20,70)的导热通道层及通向该喷墨元件的电导体层;
通过所述薄膜层形成的若干输墨孔(26,66,67),从而输墨孔的数量多于喷墨元件(24,62)的数量;和
设置在所述基片(20,70)中的至少一个槽(36,76),所述至少一个槽提供一个从所述基片的第二表面、通过所述基片(20,70)并到达设在所述薄膜层上的所述输墨孔(26,66,67)的油墨通道(38,78),
其中,每一个所述输墨孔都位于所述至少一个槽的上方。
2.如权利要求1的装置,还包括:
一个设在所述薄膜层上方的有孔层(28,74),所述有孔层限定若干喷墨腔(30,60),每一个喷墨腔都具有一形成于其中的喷墨元件(24,62),所述有孔层还为每一个喷墨腔(30,60)限定一个喷口(34,64)。
3.如权利要求2的装置,其中,所述有孔层(28,74)是作为所述打印头的整体部分成型的可光照成像的层。
4.如权利要求1的装置,其中,输墨孔(26,66,67)的数量大约为喷墨元件(24,62)的2倍。
5.如权利要求1的装置,其中,所述基片(20,70)中的所述至少一个槽(36,76)是在所述基片(20,70)中蚀刻而成的。
6.如权利要求1的装置,还包括与所述输墨孔(26)呈流体连通状态的一个油墨集流腔(32),用于将油墨(38)输送到所述喷墨元件(24)。
7.如权利要求1的装置,其中,每一个喷墨元件(62)与两个输墨孔(66,67)连接,这两个输墨孔位于每一个喷墨元件的相对两侧。
8.如上述权利要求中任一项的装置,还包括提供给所述至少一个槽(36,76)的油墨(38,78)。
9.一种形成打印头的方法,包括:
提供一个基片(20,70);
在所述基片(20,70)的第一表面上设置若干薄膜层(24,40-50,72),所述薄膜层中的至少一层形成若干喷墨元件(24,62),其它薄膜层至少包括提供与基片(20,70)电绝缘的层、从所述喷墨元件到基片(20,70)的导热通道层及通向该喷墨元件的电导体层;
形成通过所述薄膜层的若干输墨孔(26,66,67),从而使输墨孔的数量多于喷墨元件(24,62)的数量;和
在所述基片(20,70)的上形成至少一个槽(36,76),所述至少一个槽提供一个从所述基片的第二表面、通过所述基片并到达设在所述薄膜层(24,40-50,72)上的所述输墨孔(26,66,67)的油墨通道(38,78),
其中,每一个所述输墨孔都位于所述至少一个槽的上方。
10.一种打印方法,包括:
沿形成在基片(20,70)中的至少一个槽(36,76)和通过形成在所述基片上的若干薄膜层(24,40-50,72)中的输墨孔(26,66,67)输送油墨(38,78),每一个所述输墨孔都位于所述至少一个槽的上方,所述薄膜层中的至少一层形成若干喷墨元件(24,62),其它薄膜层至少形成提供与基片(20,70)电绝缘的层、从所述喷墨元件到基片(20,70)的导热通道层及通向该喷墨元件的电导体层,输墨孔(26,66,67)的数量多于喷墨元件(24,62)的数量;和
给所述喷墨元件(24,62)供能,以便通过相关的喷口(34,64)排出油墨。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/384,849 | 1999-08-27 | ||
US09/384849 | 1999-08-27 | ||
US09/384,849 US6305790B1 (en) | 1996-02-07 | 1999-08-27 | Fully integrated thermal inkjet printhead having multiple ink feed holes per nozzle |
Publications (2)
Publication Number | Publication Date |
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CN1286169A CN1286169A (zh) | 2001-03-07 |
CN1234528C true CN1234528C (zh) | 2006-01-04 |
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Country Status (7)
Country | Link |
---|---|
US (1) | US6305790B1 (zh) |
EP (1) | EP1078755B1 (zh) |
JP (1) | JP2001071504A (zh) |
CN (1) | CN1234528C (zh) |
DE (1) | DE60001524T2 (zh) |
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Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6744796B1 (en) * | 2000-03-30 | 2004-06-01 | Triquint Technology Holding Co. | Passivated optical device and method of forming the same |
US6988840B2 (en) | 2000-05-23 | 2006-01-24 | Silverbrook Research Pty Ltd | Printhead chassis assembly |
US6488422B1 (en) | 2000-05-23 | 2002-12-03 | Silverbrook Research Pty Ltd | Paper thickness sensor in a printer |
US7213989B2 (en) | 2000-05-23 | 2007-05-08 | Silverbrook Research Pty Ltd | Ink distribution structure for a printhead |
US6786658B2 (en) | 2000-05-23 | 2004-09-07 | Silverbrook Research Pty. Ltd. | Printer for accommodating varying page thicknesses |
US6951383B2 (en) * | 2000-06-20 | 2005-10-04 | Hewlett-Packard Development Company, L.P. | Fluid ejection device having a substrate to filter fluid and method of manufacture |
US6457810B1 (en) * | 2000-10-20 | 2002-10-01 | Silverbrook Research Pty Ltd. | Method of assembly of six color inkjet modular printhead |
US6402301B1 (en) | 2000-10-27 | 2002-06-11 | Lexmark International, Inc | Ink jet printheads and methods therefor |
US6517735B2 (en) * | 2001-03-15 | 2003-02-11 | Hewlett-Packard Company | Ink feed trench etch technique for a fully integrated thermal inkjet printhead |
US6616268B2 (en) * | 2001-04-12 | 2003-09-09 | Lexmark International, Inc. | Power distribution architecture for inkjet heater chip |
US6880925B2 (en) * | 2001-05-31 | 2005-04-19 | Canon Kabushiki Kaisha | Liquid discharge recording head, liquid discharge recording apparatus, and method for producing stopper member for liquid discharge recording head |
US6561632B2 (en) * | 2001-06-06 | 2003-05-13 | Hewlett-Packard Development Company, L.P. | Printhead with high nozzle packing density |
KR100552662B1 (ko) * | 2001-10-29 | 2006-02-20 | 삼성전자주식회사 | 다중 배열 구조를 가진 고밀도 잉크 젯 프린트 헤드 |
US6626523B2 (en) * | 2001-10-31 | 2003-09-30 | Hewlett-Packard Development Company, Lp. | Printhead having a thin film membrane with a floating section |
US6596644B1 (en) * | 2002-01-16 | 2003-07-22 | Xerox Corporation | Methods for forming features in polymer layers |
US6764605B2 (en) * | 2002-01-31 | 2004-07-20 | Hewlett-Packard Development Company, L.P. | Particle tolerant architecture for feed holes and method of manufacturing |
US6767073B2 (en) | 2002-05-14 | 2004-07-27 | Wellspring Trust | High-speed, high-resolution color printing apparatus and method |
US6712694B1 (en) * | 2002-09-12 | 2004-03-30 | Igt | Gaming device with rotating display and indicator therefore |
KR100499132B1 (ko) * | 2002-10-24 | 2005-07-04 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
CN1296209C (zh) * | 2003-01-10 | 2007-01-24 | 佳能株式会社 | 喷墨记录头 |
US6916090B2 (en) | 2003-03-10 | 2005-07-12 | Hewlett-Packard Development Company, L.P. | Integrated fluid ejection device and filter |
US6761435B1 (en) * | 2003-03-25 | 2004-07-13 | Lexmark International, Inc. | Inkjet printhead having bubble chamber and heater offset from nozzle |
US7441865B2 (en) * | 2004-01-21 | 2008-10-28 | Silverbrook Research Pty Ltd | Printhead chip having longitudinal ink supply channels |
US20050260522A1 (en) * | 2004-02-13 | 2005-11-24 | William Weber | Permanent resist composition, cured product thereof, and use thereof |
US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
CN100503248C (zh) * | 2004-06-02 | 2009-06-24 | 佳能株式会社 | 头基板、记录头、头盒、记录装置以及信息输入输出方法 |
US20050280674A1 (en) * | 2004-06-17 | 2005-12-22 | Mcreynolds Darrell L | Process for modifying the surface profile of an ink supply channel in a printhead |
US7195341B2 (en) * | 2004-09-30 | 2007-03-27 | Lexmark International, Inc. | Power and ground buss layout for reduced substrate size |
US7645026B2 (en) * | 2005-10-11 | 2010-01-12 | Silverbrook Research Pty Ltd | Inkjet printhead with multi-nozzle chambers |
JP2008179039A (ja) * | 2007-01-24 | 2008-08-07 | Canon Inc | 液体吐出ヘッド及び液体吐出ヘッドの製造方法 |
JP5046841B2 (ja) * | 2007-10-03 | 2012-10-10 | キヤノン株式会社 | インクジェット記録ヘッド |
US8328330B2 (en) * | 2008-06-03 | 2012-12-11 | Lexmark International, Inc. | Nozzle plate for improved post-bonding symmetry |
WO2010050959A1 (en) * | 2008-10-30 | 2010-05-06 | Hewlett-Packard Development Company, L.P. | Thermal inkjet printhead feed transition chamber and method of cooling using same |
JP5404121B2 (ja) * | 2009-03-25 | 2014-01-29 | キヤノン株式会社 | 記録基板、該記録基板の製造方法及び液体吐出ヘッド |
WO2011014180A1 (en) | 2009-07-31 | 2011-02-03 | Hewlett-Packard Development Company, | Inkjet printhead and method employing central ink feed channel |
US8425787B2 (en) * | 2009-08-26 | 2013-04-23 | Hewlett-Packard Development Company, L.P. | Inkjet printhead bridge beam fabrication method |
US8531952B2 (en) | 2009-11-30 | 2013-09-10 | The Hong Kong Polytechnic University | Method for measurement of network path capacity with minimum delay difference |
JP5709536B2 (ja) * | 2010-01-14 | 2015-04-30 | キヤノン株式会社 | シリコン基板の加工方法 |
EP3296113B1 (en) | 2013-02-28 | 2019-08-28 | Hewlett-Packard Development Company, L.P. | Molded print bar |
US10821729B2 (en) * | 2013-02-28 | 2020-11-03 | Hewlett-Packard Development Company, L.P. | Transfer molded fluid flow structure |
KR101827070B1 (ko) | 2013-02-28 | 2018-02-07 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 유체 유동 구조체 성형 |
US9724920B2 (en) | 2013-03-20 | 2017-08-08 | Hewlett-Packard Development Company, L.P. | Molded die slivers with exposed front and back surfaces |
US20180290449A1 (en) * | 2015-07-15 | 2018-10-11 | Hewlett-Packard Development Company, L.P. | Adhesion and insulating layer |
US10207500B2 (en) | 2015-10-15 | 2019-02-19 | Hewlett-Packard Development Company, L.P. | Print head interposers |
CN106515219B (zh) * | 2016-10-14 | 2019-08-27 | 苏州锐发打印技术有限公司 | 一种打印装置及其喷墨打印头 |
ES2955508T3 (es) | 2019-02-06 | 2023-12-04 | Hewlett Packard Development Co | Troquel para un cabezal de impresión |
PL3710260T3 (pl) | 2019-02-06 | 2021-12-06 | Hewlett-Packard Development Company, L.P. | Matryca do głowicy drukującej |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4558333A (en) * | 1981-07-09 | 1985-12-10 | Canon Kabushiki Kaisha | Liquid jet recording head |
US4438191A (en) * | 1982-11-23 | 1984-03-20 | Hewlett-Packard Company | Monolithic ink jet print head |
JP2635043B2 (ja) | 1986-04-28 | 1997-07-30 | ヒューレット・パッカード・カンパニー | 熱インクジエツト式プリントヘツド |
US4894664A (en) | 1986-04-28 | 1990-01-16 | Hewlett-Packard Company | Monolithic thermal ink jet printhead with integral nozzle and ink feed |
US4789425A (en) | 1987-08-06 | 1988-12-06 | Xerox Corporation | Thermal ink jet printhead fabricating process |
JPH01190458A (ja) | 1988-01-25 | 1989-07-31 | Nec Corp | インクジェットヘッド |
US4866461A (en) * | 1988-05-17 | 1989-09-12 | Eastman Kodak Company | Thermal, drop-on-demand, ink jet print cartridge |
US4864329A (en) | 1988-09-22 | 1989-09-05 | Xerox Corporation | Fluid handling device with filter and fabrication process therefor |
US5016024A (en) | 1990-01-09 | 1991-05-14 | Hewlett-Packard Company | Integral ink jet print head |
US5198834A (en) | 1991-04-02 | 1993-03-30 | Hewlett-Packard Company | Ink jet print head having two cured photoimaged barrier layers |
US5648806A (en) | 1992-04-02 | 1997-07-15 | Hewlett-Packard Company | Stable substrate structure for a wide swath nozzle array in a high resolution inkjet printer |
US5638101A (en) | 1992-04-02 | 1997-06-10 | Hewlett-Packard Company | High density nozzle array for inkjet printhead |
DE4214556A1 (de) | 1992-04-28 | 1993-11-04 | Mannesmann Ag | Elektrothermischer tintendruckkopf |
US5489930A (en) | 1993-04-30 | 1996-02-06 | Tektronix, Inc. | Ink jet head with internal filter |
US5463413A (en) * | 1993-06-03 | 1995-10-31 | Hewlett-Packard Company | Internal support for top-shooter thermal ink-jet printhead |
US5322594A (en) | 1993-07-20 | 1994-06-21 | Xerox Corporation | Manufacture of a one piece full width ink jet printing bar |
US5666143A (en) * | 1994-07-29 | 1997-09-09 | Hewlett-Packard Company | Inkjet printhead with tuned firing chambers and multiple inlets |
US6113221A (en) | 1996-02-07 | 2000-09-05 | Hewlett-Packard Company | Method and apparatus for ink chamber evacuation |
US6162589A (en) | 1998-03-02 | 2000-12-19 | Hewlett-Packard Company | Direct imaging polymer fluid jet orifice |
US6019907A (en) * | 1997-08-08 | 2000-02-01 | Hewlett-Packard Company | Forming refill for monolithic inkjet printhead |
US6322201B1 (en) | 1997-10-22 | 2001-11-27 | Hewlett-Packard Company | Printhead with a fluid channel therethrough |
US6065823A (en) * | 1999-04-16 | 2000-05-23 | Hewlett-Packard Company | Heat spreader for ink-jet printhead |
-
1999
- 1999-08-27 US US09/384,849 patent/US6305790B1/en not_active Expired - Fee Related
-
2000
- 2000-03-02 TW TW089103705A patent/TW526139B/zh not_active IP Right Cessation
- 2000-03-10 SG SG200001365A patent/SG85699A1/en unknown
- 2000-03-29 DE DE60001524T patent/DE60001524T2/de not_active Expired - Lifetime
- 2000-03-29 EP EP00106052A patent/EP1078755B1/en not_active Expired - Lifetime
- 2000-05-26 CN CN00108729.0A patent/CN1234528C/zh not_active Expired - Fee Related
- 2000-08-11 JP JP2000243538A patent/JP2001071504A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1078755A1 (en) | 2001-02-28 |
US6305790B1 (en) | 2001-10-23 |
TW526139B (en) | 2003-04-01 |
DE60001524D1 (de) | 2003-04-10 |
EP1078755B1 (en) | 2003-03-05 |
SG85699A1 (en) | 2002-01-15 |
CN1286169A (zh) | 2001-03-07 |
JP2001071504A (ja) | 2001-03-21 |
DE60001524T2 (de) | 2003-12-24 |
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