CN1216180C - Equipment for in-line exchange of substrate in vacuum chamber - Google Patents
Equipment for in-line exchange of substrate in vacuum chamber Download PDFInfo
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- CN1216180C CN1216180C CN 02136223 CN02136223A CN1216180C CN 1216180 C CN1216180 C CN 1216180C CN 02136223 CN02136223 CN 02136223 CN 02136223 A CN02136223 A CN 02136223A CN 1216180 C CN1216180 C CN 1216180C
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- rotating shaft
- substrate
- vacuum chamber
- baffle plate
- hollow rotating
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Abstract
The present invention relates to a device for realizing changing substrate on line in a vacuum chamber, which comprises a rotating shaft, and the rotating shaft is composed of a hollow rotating shaft and a solid rotating shaft which is concentrically arranged in the hollow rotating shaft. When the hollow rotating shaft and the solid rotating shaft are fixed by two top threads, a substrate clamp and a baffle are driven to rotate together. When the two top threads are unclamped, the hollow rotating shaft and the solid rotating shaft can respectively drive the substrate clamp and the baffle to rotate, and then the relative position of the substrate clamp and the baffle is changed. Therefore, the substrate to be plated can be changed on one under the condition of not damaging the vacuum degree of a vacuum chamber. The present invention has two selection structures. Compared with the prior art, the present invention has the advantages of simple structure and convenient operation of the on-line change of the substrate to be plate, and the device of the present invention can greatly shorten the development cycle of thin film new products.
Description
Technical field:
The present invention relates to a kind of device of in-line exchange of substrate in vacuum chamber, particularly relate to a kind of device of in the vacuum chamber of vacuum plating unit, dynamically changing film plating substrate.
Background technology:
Thin-film material has obtained using very widely in modern science and technology.No matter have a large amount of workers all to join in the research and development field of film, but will develop a kind of film with specified property, be optical thin film or function film, all will do a large amount of exploration work.Adopting vacuum coating technology is one of main path of the various performance films of preparation at present, as the physical vapor deposition (PVD) mode.Adopt the PVD mode prepare film generally to experience vacuumize, heat, a series of processes such as thin-film-coating, cooling.Longer in this process owing to vacuumizing with warm-up time, therefore for the performance of the film of groping different processing parameter deposit, usually to pay very big cost in time, and not the processing parameter between the experiment of homogeneous often because the influence of stabilization of equipment performance and repeatability, so that comparability often is not special ideal.Therefore, how shortening the research and development cycle of film, accelerate the industrialization process of new film product, is the problem that thin film work person relatively is concerned about.In the present invention, utilize hollow cross-compound arrangement to be implemented in online this technology of replacing film plating substrate in the coating equipment, can improve conventional efficient greatly, shorten the R﹠D cycle of film.
Formerly in the technology, the device of online replacing film plating substrate (being commonly referred to control strip) successfully is applied in various types of coating equipments in coating equipment, but reference plate is an immobilized in process of plating, do not rotate with workpiece, the homogeneity of film can't be guaranteed, especially on the smaller small-sized coating equipment of even area.Carry out the online sheet that dynamically changes for the substrate that rotates around a certain rotating shaft in coating process, formerly technology just seems powerless.
Summary of the invention:
The objective of the invention is to overcome the difficulty of technology formerly, be implemented in the interior online replacing substrate to be coated of vacuum chamber of coating equipment.
Characteristics of the present invention are to utilize concentric cross-compound arrangement to realize and can synchronously rotate, and can do dual-use function in relative rotation again, are implemented in line exchange of substrate.Concrete implementation structure is: the rolling clamp in the coating equipment vacuum chamber has partly adopted hollow rotating shaft, puts a concentric solid spindle simultaneously in hollow rotating shaft again.Two externally transmission rig effect rotations synchronously down of axle also can be done independently of each other and rotate.In more detail: in film deposition process, two fixing rotations synchronously together of axle.When needs were changed substrate to be coated, two rotating shafts were done to relatively rotate and are realized changing substrate to be coated.For direct transmission system, it is continuous that promptly the axle of Xuan Zhuan anchor clamps passes the power wheel that the vacuum (-tight) housing of vacuum chamber links to each other with outside transmission rig later on directly, as shown in Figure 1, 2.
Device of the present invention concrete structure as shown in Figure 1, 2 comprises: the vacuum chamber 14 by vacuum (-tight) housing 141 constitutes is equipped with evaporation source 1 on the base plate in vacuum chamber 14.By putting on vacuum (-tight) housing 141 tops rotating shaft 6-7 is arranged in the vacuum chamber 14, rotating shaft 6-7 is solid spindle 7 formations by hollow rotating shaft 6 and concentricity axis storing in hollow rotating shaft (6).Have pinion 4 on the rotating shaft 6-7 outside vacuum chamber 14, master gear 13 engagements on pinion 4 and the transmission shaft 12.Transmission shaft 12 links to each other with power wheel 10 by connect elements 11.Power wheel 10 links to each other with outside transmission rig, by the rotation of these transmission rigs up to control substrate to be coated.First jackscrew 5 and second jackscrew 9 are arranged on the hollow rotating shaft 6 outside vacuum chamber 14,, make hollow rotating shaft 6 between solid spindle 7, throw off or be fixed tightly in by the pine of two jackscrews or tight.Be equipped with nut 8 on the top of the solid spindle 7 outside vacuum chamber 14.The substrate fixture 3 of putting substrate to be coated is housed on the bottom of the hollow rotating shaft 6 that puts in vacuum chamber 14.As shown in Figure 1.Perhaps in second pinion, 18 engagements of being equipped with on the bottom of hollow rotating shaft 6 on second master gear, 15, the second master gears 15 and second solid spindle 17.The substrate fixture 3 of putting substrate to be coated is housed, as shown in Figure 2 on the bottom of second solid spindle 17.On the bottom of the solid spindle 7 in putting in vacuum chamber 14, between substrate fixture 3 and evaporation source 1, baffle plate 2 is housed.As shown in Figure 1.Perhaps, on the bottom of union lever 20, between substrate fixture 3 and evaporation source 1, load onto baffle plate 2 in the 3rd pinion 19 engagements of being equipped with on the bottom of solid spindle 7 on the 3rd master gear 16, the three master gears 16 and the union lever 20.As shown in Figure 2.
As above-mentioned Fig. 1 is first kind of structure, places nut 8 on solid spindle 7 tops to be used to adjust the relative position of solid spindle 7 and hollow rotating shaft 6.Baffle plate 2 is used with substrate fixture 3, and baffle plate 2 is used to block substrate that has been coated with and the differentiation of preparing to be coated with substrate, under the situation of not opening vacuum (-tight) housing 141, adjusts the position between baffle plate 2 and the substrate fixture 3, thereby is implemented in line exchange of substrate.The selection of dimension of its baffle plate 2 should be able to be advisable to block substrate 3.The shape of baffle plate 2 is normal for having sector notch 301, and the angle of breach has determined can be at the number of line exchange of substrate.Shown in Fig. 4,5.In coating process, hollow rotating shaft 6 fixes by two jackscrews 5 and 9 with solid spindle 7, rotating shaft 6-7 is being meshed by pinion 4 and master gear 13, and the transmission shaft 12 on the master gear 13 links to each other with power wheel 10 by connect elements 11, and power wheel 10 links to each other with outside transmission rig.Externally under the transmission rig effect, driving master gear 13 rotates with pinion 4, thereby also driving rotating shaft 6-7 rotates together, when two jackscrews 5,9 on the hollow rotating shaft 6 that constitutes rotating shaft 6-7 hold out against, hollow rotating shaft 6 and solid spindle 7 rotate together, at this moment substrate fixture 3 rotates with baffle plate 2, and both maintenances are static relatively.When needs are changed substrate to be coated, whole rotation system is quit work, unclamp two jackscrews 5 and 9, adjust the relative position of solid spindle 7 and hollow rotating shaft 6 by nut 8, after relative position is adjusted, use the relative position of 5,9 fixation hollow rotating shafts 6 of two jackscrews and solid spindle 7 again, the plated film of starting shooting again.Be implemented in the online replacing film plating substrate in the vacuum chamber.
As above-mentioned shown in Figure 2 be second kind of structure owing to be subjected to that spatial limits in the vacuum chamber, the rotation of anchor clamps also relates to so-called open-bull gear drive mechanism.
The present invention compares with technology formerly, and the advantage that has is:
1. under the situation of not destroying vacuum tightness in the vacuum chamber, film plating substrate is dynamically changed sheet, and utilize above-mentioned simple physical construction to realize the online sheet that changes, easy and simple to handle.
2. disc changing mechanism of the present invention is applied in the coating equipment, can shorten the new film Products Development cycle greatly.
Description of drawings:
Fig. 1 is the synoptic diagram of first kind of online record changer structure of the present invention.
Fig. 2 is the synoptic diagram of second kind of online record changer structure of the present invention.
The synoptic diagram of substrate fixture 3 during Fig. 3 implements for the present invention is concrete.
The synoptic diagram of baffle plate 2 during Fig. 4 implements for the present invention is concrete.
Fig. 5 is invention synoptic diagram of dynamic mapping position between substrate fixture 3 and the baffle plate 2 in concrete enforcement.Wherein, Fig. 5-1 is the synoptic diagram of the starting position relation between substrate fixture 3 and the baffle plate 2.Fig. 5-2 is 1 hour mera anchor clamps 3 and the synoptic diagram of the position relation of baffle plate 2.The synoptic diagram of the position of substrate fixture 3 and baffle plate 2 relation when Fig. 5-3 is end.
Embodiment:
Embodiment 1: utilize dynamic disc changing mechanism to realize that different deposition parameters compares work.
Rolling clamp at the ion beam sputtering deposition machine has partly adopted above-mentioned first kind of structure, as shown in Figure 1.
Fig. 3 is the plane signal of the circular substrate anchor clamps 3 of employing, and substrate to be coated is placed in 6 holes of uniform distribution 301 on substrate fixture 3.Fig. 4 is the floor map of the baffle plate 2 of employing, and its drift angle is 300 °, and breach 201 is the fan-shaped of 60 ° of angles.Baffle plate 2 radiuses are identical with substrate fixture 3.Before plated film, adjust the relative position of substrate fixture 3 and baffle plate 2, make baffle plate 2 block five substrates just, remaining a slice is in 60 ° of segmental breach 201 places of baffle plate, with the relative position of two jackscrews, 5,9 fixation hollow rotating shafts 6 with solid spindle 7, selected filming parameter.In process of plating, substrate fixture 3 guaranteed the homogeneity of sample, and anchor clamps 3 is constant with the relative position of baffle plate 2 with baffle plate 2 rotations, and the substrate that just is positioned at baffle plate breach 201 places is in by the plating state always.When the substrate at breach 201 places be coated with finish after; need not open vacuum chamber 14 and change vacuum state; as long as stopping power wheel 10 rotates; unclamp two jackscrews 5,9; turn nut 8 and make solid spindle 7 rotate 60 ° clockwise or counterclockwise, baffle plate 2 also rotates same angle with respect to substrate fixture 3, and the substrate that will be plated just is exposed to breach 201 places of baffle plate 2 like this; the substrate that originally was in breach 201 places is because the rotation of baffle plate 2, just is blocked to protect.The rest may be inferred, can be coated with other substrate to be coated.Owing to placed 6 (or more than 6) substrates to be coated simultaneously, can 6 substrates of online replacing, after once vacuumizing,, significantly reduced workload with 6 kinds of different parameter plated films, shortened the plated film time, improved the experiment contrast gradient under the different parameters condition.
Embodiment 2: utilize dynamic disc changing mechanism to realize the accumulation function of depositing time.
In order to study the influence of depositing time to film performance, concern over time as film performance in the research thin film growth process, need under same deposition parameter, prepare the different sample of depositing time.Adopt device first kind of structure as shown in Figure 1.In order to raise the efficiency, baffle plate 2 shapes that present embodiment adopts are that drift angle is 180 ° fan-shaped.Its breach 201 also is 180 ° fan-shaped.The preparation film time was respectively one, two, four, five, seven, eight hour.When initial, adjust the relative position of substrate fixture 3 and baffle plate 2, make baffle plate 2 block three substrates to be coated just, other three substrates are exposed to outside the baffle plate 2.The position of substrate fixture 3 and baffle plate 2 is shown in Fig. 5-1.Along clockwise direction substrate is numbered, the substrate that is blocked is numbered J1, J2, J3, and the substrate numbering that is exposed to outside the baffle plate 2 is respectively J4, J5, J6.The relative position of fixation hollow rotating shaft 6 and solid spindle 7, selected filming parameter, beginning plated film.In process of plating, baffle plate 2 is with anchor clamps 3 rotations, and substrate J4, J5, J6 are simultaneously by plated film.When being coated with the film time when being one hour, substrate fixture 3 and baffle plate 2 are stopped the rotation, adjust solid spindles 7 and hollow rotating shaft 6 relative positions by nut 8, make baffle plate 2 rotate 60 ° in the counterclockwise direction with respect to substrate fixture 3.The position of substrate fixture 3 and baffle plate 2 is shown in Fig. 5-2 at this moment, and the J6 substrate is under the protection of baffle plate 2, and the J3 substrate is exposed to outside the baffle plate 2, and J4, J5 substrate continue to be exposed to outside the baffle plate 2.Continue plated film,,, the J5 substrate also is under the protection of baffle plate 2 along the identical direction adjustment baffle plate 2 and the relative position of substrate fixture 3 after one hour.According to aforesaid way, after two hours, the J4 substrate also was under the baffle plate 2, and after five hours, plated film finished.At this moment, the position of baffle plate 2 and substrate fixture 3 is shown in Fig. 5-3, and substrate J6, J5, J4 are under the baffle plate, and the plated film time was respectively one, two, four hour.Substrate J3, J2, J1 are in outside the baffle plate, and the plated film time is eight, seven, five hours.In vacuum chamber, do not destroy under the situation of vacuum tightness, at line exchange of substrate, can be in about nine hours time, prepared six samples that the plated film time was respectively, two, four, five, seven, eight hour.Because the build-up effect on free, formerly these need of technology were finished the film sample preparation in 27 hours, only need just finish in nine hours now, and all samples almost prepared under identical condition, and the comparative between the sample is stronger.Realize to keep under the vacuum state, online replacing film plating substrate has important effect for the evolution at analysed film sample grown interface.
Claims (1)
1. be implemented in the device of line exchange of substrate in the vacuum chamber, comprise the vacuum chamber (14) that constitutes by vacuum (-tight) housing (141), be equipped with evaporation source (1) on the base plate in vacuum chamber (14), by putting on vacuum (-tight) housing (141) top rotating shaft (6-7) is arranged in the vacuum chamber (14), master gear (13) engagement on pinion (4) that has in the rotating shaft (6-7) outside vacuum chamber (14) and the transmission shaft (12), transmission shaft (12) links to each other with power wheel (10) by connect elements (11), it is characterized in that said rotating shaft (6-7) is solid spindle (7) formation by hollow rotating shaft (6) and concentricity axis storing in hollow rotating shaft (6), first jackscrew (5) and second jackscrew (9) are arranged on the hollow rotating shaft (6) outside vacuum chamber (14), on the top of solid spindle (7), be equipped with nut (8); Second pinion (18) engagement on second master gear (15) and second solid spindle (17) is housed on the bottom of the hollow rotating shaft (6) in putting in vacuum chamber (14), on the bottom of second solid spindle (17), loads onto the substrate fixture (3) of putting substrate to be coated; The 3rd pinion (19) engagement on the 3rd master gear (16) and the union lever (20) is housed on the bottom of the solid spindle (7) in putting in vacuum chamber (14), on the bottom of union lever (20), between substrate fixture (3) and evaporation source (1), load onto baffle plate (2), described baffle plate (2) has a sector notch (201), and the angle of this sector notch (201) is 60 ° or 180 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02136223 CN1216180C (en) | 2002-07-26 | 2002-07-26 | Equipment for in-line exchange of substrate in vacuum chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02136223 CN1216180C (en) | 2002-07-26 | 2002-07-26 | Equipment for in-line exchange of substrate in vacuum chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1390978A CN1390978A (en) | 2003-01-15 |
| CN1216180C true CN1216180C (en) | 2005-08-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02136223 Expired - Fee Related CN1216180C (en) | 2002-07-26 | 2002-07-26 | Equipment for in-line exchange of substrate in vacuum chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1216180C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100338256C (en) * | 2004-08-13 | 2007-09-19 | 精碟科技股份有限公司 | Coating apparatus for color drum filter |
| CN100415928C (en) * | 2004-10-29 | 2008-09-03 | 精碟科技股份有限公司 | Filming apparatus |
| CN102230163B (en) * | 2009-10-16 | 2013-07-31 | 鸿富锦精密工业（深圳）有限公司 | Film plating device |
-
2002
- 2002-07-26 CN CN 02136223 patent/CN1216180C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1390978A (en) | 2003-01-15 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050824 Termination date: 20100726 |