CN2736786Y - Optical filming device - Google Patents
Optical filming device Download PDFInfo
- Publication number
- CN2736786Y CN2736786Y CNU2004200884184U CN200420088418U CN2736786Y CN 2736786 Y CN2736786 Y CN 2736786Y CN U2004200884184 U CNU2004200884184 U CN U2004200884184U CN 200420088418 U CN200420088418 U CN 200420088418U CN 2736786 Y CN2736786 Y CN 2736786Y
- Authority
- CN
- China
- Prior art keywords
- base plate
- coating device
- vacuum
- plate carrying
- optical coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses an optical film coating device, comprising a vacuum film coating chamber, a basal plate bearing mechanism, a copple system and a heating system. The basal plate bearing mechanism is arranged on the upper part of the vacuum film coating chamber; the copple system is positioned on the lower part of the basal plate bearing mechanism in the vacuum film coating chamber; the heating system is positioned on the lower part of the basal plate bearing mechanism in the vacuum film coating chamber; wherein the basal plate bearing mechanism is provided with a driving device which can rotate in high speed while in the film coating.
Description
[technical field]
The utility model is about a kind of optical coating device, especially about a kind of optical coating device of tool rotary plate load carrier.
[background technology]
At present, optical thin film is widely used in optical instrument, as a lot of fields such as sensor, other semiconductor lasers, interferometer, glasses and optical-fibre communications assembly.Optical thin film normally reaches its Expected Results by interference effect, and it is meant that the dielectric film or the metal film that plate one or more layers on optical module or separate substrates change the light wave transmission characteristic.
At present, optical thin film is made usually based on physical vapor deposition (physics vapordeposition, be called for short PVD), this method is by solid-state gaseous state or the ionic state of being converted into membraneous material, the material of gaseous state or ionic state passes through the space by evaporation source, arrives at substrate surface, after material arrives at substrate surface, will deposit and form film gradually.Usually, in order to make highly purified film, the processing procedure of plated film must be finished under high vacuum environment.Extend vacuum coating thus, common practices is that substrate is cleaned with the ultrasonic scrubber, cleans back row and goes up anchor clamps, sends into coating machine, heats and vacuumizes.After reaching high vacuum, the beginning plated film.During plated film, with the heating of electron gun or resistance-type, membraneous material is become ionic state, it is different and length arranged that the plated film time is then looked the number of plies and program.After plated film finishes, treat temperature cooling back taking-up.
Yet in the existing optical coating equipment, the load carrier of coated basal plate is generally tabular, because its evaporation scope is concentrated inadequately, cause the optical articles of each evaporation less, and because the tabular load carrier occupies in vacuum chamber than large tracts of land, easily cause the space waste in the vacuum chamber, also can cause being subjected in the vacuum chamber scope of deposition material pollution bigger simultaneously, the cost of clean vacuum equipment when then having increased volume production.
In view of this, but provide in a kind of evaporation range set, each a plurality of optical articles of evaporation and reduce the optical coating device of coating cost.
[utility model content]
But the purpose of this utility model is to provide in a kind of evaporation range set, each a plurality of coated basal plates of evaporation and reduce the optical coating device of coating cost.
In order to realize the purpose of this utility model, the utility model provides a kind of optical coating device, comprise vacuum film coating chamber, base plate carrying mechanism, crucible system and heating system, base plate carrying mechanism is arranged at the top of vacuum film coating chamber, crucible system is positioned at the indoor base plate carrying of vacuum coating mechanism bottom, heating system is positioned at the indoor base plate carrying of vacuum coating mechanism bottom, wherein in the base plate carrying mechanism drive unit is installed, can be when plated film high speed rotating.
Compare prior art, the utility model optical coating device is to utilize the round barrel shape base plate carrying mechanism can ccontaining a large amount of coated basal plate, but and this round barrel shape base plate carrying mechanism high speed rotating during plated film, in the evaporation range set and can carry out plated film to the multi-disc coated basal plate simultaneously, thereby reduced coating cost.
[description of drawings]
Fig. 1 is an optical coating device exploded view of the present utility model;
Fig. 2 is an optical coating device cut-open view of the present utility model.
[embodiment]
See also Fig. 1 and Fig. 2, the utility model optical coating device 1 comprises a vacuum film coating chamber 10, a base plate carrying mechanism 20, a crucible system 30 and a heating system 40.
This vacuum film coating chamber 10 is divided into upper cover body 102 and lower cover 103, and upper cover body 102 and lower cover 103 closely cooperate mutually and form the vacuum environment of a sealing.This base plate carrying mechanism 20 is round barrel shape, dismountable top that is installed on vacuum film coating chamber 10, and this base plate carrying mechanism 20 is provided with a plurality of substrate fixed bits 202, these a plurality of substrate fixed bits 202 can be fixed thereon a plurality of substrates when plated film, also be provided with drive unit (figure does not show) in this base plate carrying mechanism, this drive unit can drive base plate carrying mechanism high speed rotating.
This crucible system 30 is installed on the bottom of vacuum film coating chamber 10, it is the vapor deposition source 302 when being used for ccontaining plated film, heating system 40 is installed on base plate carrying mechanism 20 bottoms, can the desire coated basal plate in the base plate carrying mechanism 20 be heated, and makes substrate temperature reach the optimum temperature of evaporation.This optical coating device 1 also includes electron gun activating system (figure does not show), vacuum measurement system (figure does not show) and film thickness monitoring system 70, the electron gun activating system is to be used for exciting vapor deposition source, the vacuum measurement system is the vacuum tightness that is used for measuring in the vacuum film coating chamber 10, and film thickness monitoring system 70 is used for measuring the thickness of plated film on the substrate with control plated film progress.
Before the plated film, the substrate of desiring plated film is fixed in the substrate fixed bit 202 in the base plate carrying mechanism 20, then this base plate carrying mechanism 20 is packed in the vacuum film coating chamber 10, seal this vacuum film coating chamber 10, this vacuum film coating chamber 10 is vacuumized, stop to vacuumize after reaching predetermined vacuum tightness.The drive unit that activates then in the base plate carrying mechanism 20 makes it rotate with certain rotating speed, simultaneously, utilize the substrates in 40 pairs of substrate fixed bits of heating system 202 to heat, reach active electron rifle activating system behind the predetermined temperature and excite vapor deposition source 302 in the crucible system 30, beginning plated film.By the film thickness measuring system thickness on the substrate is measured, stopped plated film when reaching predetermined thickness, open vacuum film coating chamber 10 after the cooling, take out base plate carrying mechanism 20, the coated basal plate that is fixed thereon is taken off the optical module that can obtain plated film.
Claims (6)
1. optical coating device, comprise: vacuum film coating chamber, base plate carrying mechanism, crucible system and heating system, this base plate carrying mechanism is arranged on the vacuum film coating chamber, this crucible system is positioned at the indoor base plate carrying of vacuum coating mechanism bottom, this heating system is positioned at the indoor base plate carrying of vacuum coating mechanism bottom, it is characterized in that: in the base plate carrying mechanism drive unit is installed, can driving substrate load carrier rotation when plated film.
2. optical coating device as claimed in claim 1 is characterized in that: this base plate carrying mechanism includes a plurality of substrate fixed bits.
3. optical coating device as claimed in claim 1 is characterized in that: this optical coating device also comprises an electron gun activating system.
4. optical coating device as claimed in claim 3 is characterized in that: this optical coating device also comprises a vacuum measurement system.
5. optical coating device as claimed in claim 4 is characterized in that: this optical coating device also comprises a film thickness monitoring system.
6. optical coating device as claimed in claim 1 is characterized in that: this base plate carrying mechanism is a round barrel shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2004200884184U CN2736786Y (en) | 2004-09-15 | 2004-09-15 | Optical filming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2004200884184U CN2736786Y (en) | 2004-09-15 | 2004-09-15 | Optical filming device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2736786Y true CN2736786Y (en) | 2005-10-26 |
Family
ID=35307521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2004200884184U Expired - Lifetime CN2736786Y (en) | 2004-09-15 | 2004-09-15 | Optical filming device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2736786Y (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102644052A (en) * | 2012-05-03 | 2012-08-22 | 中国科学院光电技术研究所 | Vacuum coating machine with ultraviolet irradiation cleaning function |
| CN102758180A (en) * | 2011-04-28 | 2012-10-31 | 日本电波工业株式会社 | Basque for forming optical thin film |
| CN107794508A (en) * | 2017-11-15 | 2018-03-13 | 中山市创科科研技术服务有限公司 | A kind of optical coating device base plate carrying mechanism |
-
2004
- 2004-09-15 CN CNU2004200884184U patent/CN2736786Y/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102758180A (en) * | 2011-04-28 | 2012-10-31 | 日本电波工业株式会社 | Basque for forming optical thin film |
| CN102644052A (en) * | 2012-05-03 | 2012-08-22 | 中国科学院光电技术研究所 | Vacuum coating machine with ultraviolet irradiation cleaning function |
| CN102644052B (en) * | 2012-05-03 | 2014-02-05 | 中国科学院光电技术研究所 | Vacuum coating machine with ultraviolet irradiation cleaning function |
| CN107794508A (en) * | 2017-11-15 | 2018-03-13 | 中山市创科科研技术服务有限公司 | A kind of optical coating device base plate carrying mechanism |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20140915 Granted publication date: 20051026 |