CN1207943C - 射频计量的方法和装置 - Google Patents
射频计量的方法和装置 Download PDFInfo
- Publication number
- CN1207943C CN1207943C CNB03106406XA CN03106406A CN1207943C CN 1207943 C CN1207943 C CN 1207943C CN B03106406X A CNB03106406X A CN B03106406XA CN 03106406 A CN03106406 A CN 03106406A CN 1207943 C CN1207943 C CN 1207943C
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- Prior art keywords
- signal
- telecommunication
- radiofrequency signal
- shell
- bus
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 238000005070 sampling Methods 0.000 claims description 17
- 238000004088 simulation Methods 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 11
- 239000004020 conductor Substances 0.000 claims description 6
- 230000008878 coupling Effects 0.000 claims description 5
- 238000010168 coupling process Methods 0.000 claims description 5
- 238000005859 coupling reaction Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 4
- 230000003139 buffering effect Effects 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 3
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- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
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- 238000006243 chemical reaction Methods 0.000 description 2
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- 229910052802 copper Inorganic materials 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
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- 230000013011 mating Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
- G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
- G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Plasma Technology (AREA)
- Measurement Of Current Or Voltage (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/082,645 US6608446B1 (en) | 2002-02-25 | 2002-02-25 | Method and apparatus for radio frequency (RF) metrology |
US10/082645 | 2002-02-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1441255A CN1441255A (zh) | 2003-09-10 |
CN1207943C true CN1207943C (zh) | 2005-06-22 |
Family
ID=27660365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB03106406XA Expired - Fee Related CN1207943C (zh) | 2002-02-25 | 2003-02-24 | 射频计量的方法和装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6608446B1 (zh) |
EP (1) | EP1339086A2 (zh) |
JP (1) | JP2003315386A (zh) |
KR (1) | KR20030070548A (zh) |
CN (1) | CN1207943C (zh) |
TW (1) | TWI229353B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6707255B2 (en) | 2002-07-10 | 2004-03-16 | Eni Technology, Inc. | Multirate processing for metrology of plasma RF source |
US6791274B1 (en) * | 2003-07-15 | 2004-09-14 | Advanced Energy Industries, Inc. | RF power control device for RF plasma applications |
US6983215B2 (en) | 2003-12-02 | 2006-01-03 | Mks Instruments, Inc. | RF metrology characterization for field installation and serviceability for the plasma processing industry |
US20060060139A1 (en) * | 2004-04-12 | 2006-03-23 | Mks Instruments, Inc. | Precursor gas delivery with carrier gas mixing |
US7403764B2 (en) * | 2004-11-30 | 2008-07-22 | Turner Terry R | RF power delivery diagnostic system |
US7298128B2 (en) * | 2005-01-11 | 2007-11-20 | Innovation Engineering Llc | Method of detecting RF powder delivered to a load and complex impedance of the load |
US7538562B2 (en) * | 2006-03-20 | 2009-05-26 | Inficon, Inc. | High performance miniature RF sensor for use in microelectronics plasma processing tools |
US7821250B2 (en) * | 2006-07-31 | 2010-10-26 | Inficon, Inc. | RF sensor clamp assembly |
US7728602B2 (en) * | 2007-02-16 | 2010-06-01 | Mks Instruments, Inc. | Harmonic derived arc detector |
US8055203B2 (en) | 2007-03-14 | 2011-11-08 | Mks Instruments, Inc. | Multipoint voltage and current probe system |
US7970562B2 (en) * | 2008-05-07 | 2011-06-28 | Advanced Energy Industries, Inc. | System, method, and apparatus for monitoring power |
US9291649B2 (en) * | 2012-08-16 | 2016-03-22 | Mks Instruments, Inc. | On the enhancements of planar based RF sensor technology |
CN104062492B (zh) * | 2014-06-13 | 2017-07-28 | 清华大学 | 射频功率测量系统 |
KR101588231B1 (ko) | 2014-06-27 | 2016-01-25 | 주식회사 한국화이어텍 | 탄소나노튜브를 이용한 원적외선방열 세라믹 코팅재 |
KR102442423B1 (ko) * | 2015-05-20 | 2022-09-13 | 주식회사 레인보우코퍼레이션 | Rf 센서 장치 |
KR101648484B1 (ko) | 2015-09-11 | 2016-08-16 | 주식회사 한국화이어텍 | 탄소동소체를 이용한 방열 세라믹 하이브리드 방열코팅재 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5041791A (en) | 1989-08-07 | 1991-08-20 | Washington University | Magnetic resonance RF probe with electromagnetically isolated transmitter and receiver coils |
US5383019A (en) | 1990-03-23 | 1995-01-17 | Fisons Plc | Inductively coupled plasma spectrometers and radio-frequency power supply therefor |
US5313642A (en) | 1990-10-03 | 1994-05-17 | Seagull Scientific Systems, Inc. | Power interface for peripheral devices |
US5175472A (en) | 1991-12-30 | 1992-12-29 | Comdel, Inc. | Power monitor of RF plasma |
US5325019A (en) | 1992-08-21 | 1994-06-28 | Sematech, Inc. | Control of plasma process by use of harmonic frequency components of voltage and current |
US5576629A (en) * | 1994-10-24 | 1996-11-19 | Fourth State Technology, Inc. | Plasma monitoring and control method and system |
DE4445762A1 (de) * | 1994-12-21 | 1996-06-27 | Adolf Slaby Inst Forschungsges | Verfahren und Vorrichtung zum Bestimmen absoluter Plasmaparameter |
US5565737A (en) | 1995-06-07 | 1996-10-15 | Eni - A Division Of Astec America, Inc. | Aliasing sampler for plasma probe detection |
US5770922A (en) | 1996-07-22 | 1998-06-23 | Eni Technologies, Inc. | Baseband V-I probe |
US5834931A (en) * | 1996-10-31 | 1998-11-10 | Sematech, Inc. | RF current sensor |
US5808415A (en) | 1997-03-19 | 1998-09-15 | Scientific Systems Research Limited | Apparatus for sensing RF current delivered to a plasma with two inductive loops |
US5971591A (en) * | 1997-10-20 | 1999-10-26 | Eni Technologies, Inc. | Process detection system for plasma process |
-
2002
- 2002-02-25 US US10/082,645 patent/US6608446B1/en not_active Expired - Lifetime
-
2003
- 2003-02-17 TW TW092103216A patent/TWI229353B/zh not_active IP Right Cessation
- 2003-02-20 EP EP03075496A patent/EP1339086A2/en not_active Withdrawn
- 2003-02-24 CN CNB03106406XA patent/CN1207943C/zh not_active Expired - Fee Related
- 2003-02-24 KR KR10-2003-0011335A patent/KR20030070548A/ko not_active Application Discontinuation
- 2003-02-24 JP JP2003045605A patent/JP2003315386A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
TW200303562A (en) | 2003-09-01 |
KR20030070548A (ko) | 2003-08-30 |
EP1339086A2 (en) | 2003-08-27 |
US6608446B1 (en) | 2003-08-19 |
US20030160567A1 (en) | 2003-08-28 |
TWI229353B (en) | 2005-03-11 |
JP2003315386A (ja) | 2003-11-06 |
CN1441255A (zh) | 2003-09-10 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: MKS EQUIPMENT CO.,LTD. Free format text: FORMER OWNER: ENI TECHNOLOGY CO.,LTD. Effective date: 20090710 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090710 Address after: Massachusetts USA Patentee after: MKS Instruments Inc. Address before: American New York Patentee before: ENI Technology Co. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050622 Termination date: 20170224 |