CN1189425C - Chip for heat treating silicon carbide materials - Google Patents
Chip for heat treating silicon carbide materials Download PDFInfo
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- CN1189425C CN1189425C CNB021080089A CN02108008A CN1189425C CN 1189425 C CN1189425 C CN 1189425C CN B021080089 A CNB021080089 A CN B021080089A CN 02108008 A CN02108008 A CN 02108008A CN 1189425 C CN1189425 C CN 1189425C
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- anchor clamps
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- C03B29/04—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way
- C03B29/06—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way with horizontal displacement of the products
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Abstract
The invention provides a heat treating tool which is capable to suppress the deformation of the tool with time and the deformation of a glass substrate under the heat treatment by bending, has excellent thermal conductivity to permit the efficient and uniform heat treatment of the glass substrate in a relatively short time besides stability and appropriate rigidity, and is improved in the handleability when the large-sized glass substrate is placed or removed. This planar heat treating tool is used for placing the glass substrate when the glass substrate is heat treated. Its main phase consists of SiC and has a rugged shape on its surface. The arithmetic mean roughness Ra of the surface is 0.01 to 200 &mu m and the value (Sm/Ra) obtained by dividing the average spacing Sm of the ruggedness by the arithmetic mean roughness Ra is <=500.
Description
Technical field
When the relatively large glass substrate that the present invention relates to glass substrate that a kind of flat display board uses etc. is heat-treated, be used for the employed tabular anchor clamps of this sheet glass of mounting.
Background technology
In the manufacturing engineering of flat display board, as heat treatment step, after implementing die on the glass substrate of flat display board, carry out drying and calcination processing, when carrying out this thermal treatment, need mounting to be used for the tabular thermal treatment anchor clamps of glass substrate.This glass substrate thermal treatment anchor clamps, previously used is the glassiness anchor clamps of crystallization.
But the thermal treatment anchor clamps of sintered glass ceramics matter owing to use crystallization phases to change repeatedly, produce flexural deformation, so, after using short time durations, just can not re-use.In addition, sintered glass ceramics matter thermal treatment anchor clamps are because its modulus of rigidity is low to 80Gpa, when anchor clamps multistage ground tower group is carried out the thermal treatment of glass substrate, in the section more than 2 sections, the middle body of anchor clamps is bent downwardly, and exists the glass substrate of handling to produce the situation of distortion.
And, sintered glass ceramics matter thermal treatment apparatus, thermal conductivity is low to moderate 1W/mK, during intensification and when cooling in anchor clamps, easily produce temperature distribution, when this temperature distribution was big, glass substrate generates in thermal treatment handled speckle, so, heating up and lowering the temperature all needs the sufficiently long time, has limited the raising of processing speed.
Therefore, recently, when firing the more small-sized goods of sanitary ware or ceramic tile etc., the thermal treatment that the principal phase of use is made of silicon carbide anchor clamps were also attempted to be applied in the thermal treatment of aforesaid glass substrate in the past.
Yet, in the past at the more small-sized goods of sanitary ware or ceramic tile etc. when burning till, the principal phase of use be the thermal treatment that constitutes by silicon carbide with the common area of anchor clamps at 0.7 meter
2Below, the average arithmetic roughness Ra on surface surpasses 200 μ m, for the distortion such as bending of anchor clamps, is 0.7 meter at area
2Situation under, allow 3 millimeters intensity, still, when the thermal treatment of the glass substrate that uses flat display board etc., area is bigger, the surface is more smooth, requires distortion littler.
For example, the glass substrate as a kind of plasma display panel of flat display board is used maximizes because substrate advances from body, and the anchor clamps that its thermal treatment is used also usable floor area are 0.9 meter
2Above maximization anchor clamps, and allow being deformed into below 1 millimeter of bending etc.And, if when thermal treatment because glass substrate and thermal treatment produce friction with the contact surface of the thermal expansion official post of anchor clamps, thermal treatment with the surfaceness of anchor clamps resemble prior art big, meeting abrades glass substrate because of this friction.This abrasive generation is along with thermal treatment is more remarkable with the increasing of anchor clamps.
The thermal treatment that principal phase is made of silicon carbide, need grind its surface in order to satisfy the heat treated desirable criterion of aforementioned glass substrate usually with anchor clamps, moltenly penetrate, the surface working of glazing etc. to be to improve planeness.The material that is made of silicon carbide for principal phase is only considered to improve its planeness and when implementing attrition process, is carried out becoming up to its surface the grinding of mirror-like, and the roughness on surface becomes very little.This tendency is at the molding to being made of carborundum particle, remarkable especially when the silicon carbide of the impregnation silicon that the impregnation Pure Silicon Metal is fired in its pore grinds.
But, glass substrate is positioned in thermal treatment that this surface grinding becomes mirror-like with on the anchor clamps time, the location is time-consuming because glass substrate slides on anchor clamps, glass substrate closely contacts with anchor clamps with thermal treatment after the thermal treatment simultaneously, be difficult to its separation, because closely contact, in thermal treatment glass substrate can rupture, row line equivalent damage.
In addition, as the method for improving planeness, on the surface molten penetrate or glazing with after the glass coating thermal expansion is consistent, improve planeness by attrition process.But, in this case, carry out the attrition process surface working and become mirror-like owing to consider the raising planeness, can produce problem same as described above.
And, carrying out molten penetrating, surface pore is nearby covered by the molten film of penetrating, and planeness is improved, can the control plane degree by adjusting molten granularity of penetrating raw material.But, use the big molten raw material of penetrating of granularity, because the cause of the granularity of raw material makes the molten film of penetrating produce protuberance, not only can not improve surfaceness, abraded glass baseplate surface on the contrary.
Because after thermal treatment finishes, glass substrate drawing off from the operation efficiency viewpoint from the anchor clamps consider, the automaton of the sorption parts by sucker etc. is set carries out usually, needs to use automaton to take out operation.If be that area is at 0.7 meter
2Following thermal treatment is with the more small-sized glass substrate of mounting on the anchor clamps, may draw off the anchor clamps of tight contact with automaton, still, when drawing off, the tight small defective of contact part branch generation.
In addition, must it be 0.7 meter at area
2Above thermal treatment is during with the more large-scale glass substrate of mounting on the anchor clamps, and closely exposure level increases, and is difficult to draw off operation with automaton.And, must the mounting area be 0.9 meter in thermal treatment on anchor clamps
2During the relatively large glass substrate of above ratio, closely the exposure level increase is bigger, not only can not draw off operation with automaton, and when drawing off, can rupture, significant deficiency such as crackle.
As its countermeasure, attempt thermal treatment with anchor clamps on the general hole of process air streams, preventing tight contact, but have the rigidity that reduces anchor clamps, add the problem of macrobending.
Summary of the invention
In view of the above problems, the purpose of this invention is to provide a kind of have can suppress because anchor clamps are out of shape or crooked stability and the suitable rigidity that makes the glass substrate distortion in the thermal treatment in time from body, having glass substrate simultaneously can have and carrying out heat treated good heat conductivity uniformly than the short period expeditiously, and improves in the mounting of large-size glass substrate or the thermal treatment anchor clamps of the drawing off property when taking out.
According to the present invention, the thermal treatment that the glass substrate that is provided uses with the feature of anchor clamps is: principal phase is made of silicon carbide, and modulus of rigidity is more than the 130Gpa, and thermal conductivity is more than the 80W/mk, and its wall thickness is 2.0 * 10 with the ratio of area
-6L/mm-7.3 * 10
-6L/mm has concaveconvex shape on its surface, and the arithmetic average roughness Ra on surface is 0.01-200 μ m, and concavo-convex equispaced Sm is below 500 with the ratio of arithmetic average roughness Ra.And in the present invention, (arithmetic average roughness Ra) and (concavo-convex equispaced Sm) all is the value by JIS B 0601-1994 definition.
The siliceous thermal treatment anchor clamps of carbonization that thermal treatment of the present invention is made of silicon carbide with the principal phase of anchor clamps.Silicon carbide with compared with the widely used sintered glass ceramics of the material of anchor clamps as the thermal treatment of glass substrate in the past because its rigidity height,, can suppress the distortion of glass substrate in the thermal treatment that the bending by anchor clamps causes even the tower group bending on multistage ground is also less.Specifically, preferably more than 130Gpa, if more than 200Gpa, bending is most preferred to modulus of rigidity more for a short time.
In addition, because the siliceous anchor clamps thermal conductivity ratio of carbonization sintered glass ceramics anchor clamps are high significantly, the time weak point that heats up and lower the temperature, the temperature distribution in the anchor clamps is little, and glass substrate is difficult for generating speckle (system ラ) in thermal treatment.Therefore, and compared in the past, but the short period of time heat-treats expeditiously.Specifically, thermal conductivity is preferably more than the 80W/mK.And the siliceous anchor clamps of carbonization also have the knot day crystalline phase that the generation particle that resembles the sintered glass ceramics matter anchor clamps is grown up, and anchor clamps are out of shape little in time from body, can use steadily in the long term.
The present invention is used for the sort of mounting closely contact and tiny flaw takes place, and draws off the difficult relatively large glass substrate of ratio by automaton, has 0.7 meter
2The thermal treatment of above area with effectively might rupture on the anchor clamps especially for being loaded in when drawing off, the great damage of crackle etc. is than with oversized glass substrate, has 0.9 meter
2The thermal treatment of above area is with better on the anchor clamps, and such large-size glass substrate is main the use in advance the flat pannel display of the plasma display panel that maximizes etc. in recent years.
In the present invention, for preventing the tight contact of glass substrate, the surface has concaveconvex shape, and the arithmetic average roughness Ra on surface is the preferred 0.1-20m of 0.01-200m, more preferably 0.1-10m, concavo-convex equispaced Sm is below 500 with the ratio (Sm/Ra) of arithmetic average roughness Ra.
By controlling the concavo-convex of this chucking surface, between anchor clamps and glass substrate,, can make gas such as air that the path of circulation is arranged by forming fine space, prevent both tight contacts.In addition, owing to such condition of surface is arranged, glass substrate moved the position skew of sliding and causing when glass substrate was positioned on the anchor clamps on anchor clamps, therefore easy location.
In addition, at chucking surface arithmetic average roughness Ra during less than 0.01m, irrelevant with concavo-convex equispaced Sm with the ratio (Sm/Ra) of arithmetic average roughness Ra, because glass substrate closely contacts with the contact part of anchor clamps, a part and the anchor clamps of glass substrate are fastening, therefore, and when drawing off glass substrate, the pressing part remains on the anchor clamps, causes tiny flaw.
Under the situation of the arithmetic average roughness Ra of chucking surface greater than 0.01m, because the ratio (Sm/Ra) of concavo-convex equispaced Sm and arithmetic average roughness Ra is below 500, can prevent that glass substrate from closely contacting with anchor clamps, can prevent tiny flaw as described above.And the arithmetic average roughness Ra of chucking surface is greater than 0.1m, can shorten decision position required time when on anchor clamps glass substrate being set, when subzero treatment, and the skew of the position of glass substrate in the time of can reducing anchor clamps and move.
On the one hand, the arithmetic average roughness Ra of chucking surface is greater than 200m, and the temperature official post of anchor clamps and glass substrate rubs during thermal treatment, can abrade glass substrate.
In addition, concavo-convex equispaced Sm surpasses 500 with the ratio (Sm/Ra) of arithmetic average roughness Ra, during thermal treatment, meaning that glass substrate contacts with anchor clamps increases, still, and in this case, when this contact part closely contacts, the part of glass substrate is fastened on the anchor clamps, and the pressing part can remain on the anchor clamps when drawing off glass substrate, and tiny flaw takes place.And glass substrate is big more, and to draw off glass substrate just difficult more, and glass substrate is easy to generate fracture, crackle damages.
Chucking surface concavo-convex, can be by carborundum particle being done after sintered body surface that molding that main raw material burns till obtains grinds with flat tool etc., form by carrying out sandblasting, its arithmetic average roughness Ra can control by granularity, sandblast projection material and the projection pressure of sic raw material.In addition, concavo-convex equispaced Sm can pass through the granularity and the intensity control of the sic raw material particle of use.Can control the intensity of carborundum particle by the density of molding.
In the present invention, the wall thickness of anchor clamps is preferably 2.0 * 10 with the ratio (wall thickness/area) of area
-6L/mm-7.3 * 10
-6L/mm.This value is less than 2.0 * 10
-6During l/mm, exist bending excessive, the problem of glass substrate distortion, this is worth greater than 7.3 * 10
-6During l/mm, because weight increases the weight of, thermal capacity also surpasses necessary amount, has increased the load of equipment.
Flat display board will be to 50 inches, 60 inches large scale development, accompany therewith, flat display board also will maximize with the required anchor clamps of thermal treatment of glass substrate, for example, thermal treatment is reached for more than the 1000mm with the long limit of anchor clamps, minor face is 500mm when above, and the wall thickness of anchor clamps is preferably 2-6mm.Same as described above, less than 2mm, possible crooked excessive, glass substrate deforms as wall thickness.In addition, surpass 6mm as wall thickness, preponderance, thermal capacity also surpasses necessary amount, has increased the burden of equipment.
From improving the viewpoint of modulus of rigidity or thermal conductivity, thermal treatment anchor clamps of the present invention, Pure Silicon Metal content are 5-50 quality %.That principal phase is made of silicon carbide and the thermal treatment that contains to some extent quantitative Pure Silicon Metal with anchor clamps can by for example silicon carbide powder is configured as fixed clamp-shaped, with the molding that obtains, in the inert gas atmosphere of the decompression that has Pure Silicon Metal or in the vacuum, in the impregnation Pure Silicon Metal, fire and make.The Pure Silicon Metal that fusion and containing is dipped in the molding in burning till be filled in pore in the carborundum particle of aggregate of conduct combine, make the molding densification.
At first, with silicon carbide powder be shaped as fixed clamp-shaped, the molding pre-burned that obtains, this pre-sintered body is in the inert gas atmosphere or vacuum of the decompression that has Pure Silicon Metal, make the molding densification by in the impregnation Pure Silicon Metal, burning till, can make same thermal treatment anchor clamps.In these manufacture method, by the fill-up of control Pure Silicon Metal, the apparent porosity after may command is burnt till.
The thermal treatment anchor clamps that contain Pure Silicon Metal, by the top layer oxidation, in the top layer, generate silicon dioxide layer (glass coating), can be further with as by the reaction of the glass substrate of thermal treatment body, surface owing to carborundum particle is covered by silicon dioxide layer simultaneously, therefore obtain the effect of the edge Pelleting of carborundum particle, to glass substrate easy damaged not.
Because this glass coating oneself generates, even if the special processing of the glass coating that does not generate in advance, as long as to glass substrate a thermal treatment also use once and just can generate substantially, but, be preferably in and heat-treat in the oxidizing atmosphere or generate glass coating on the surface by glazing, molten penetrate etc. in order to improve effect.
Embodiment
Below, illustrate in greater detail the present invention according to embodiments of the invention, still, the present invention is not subjected to the restriction of these embodiment.
Embodiment 1
In median size is the mixed powder of the carborundum particle 50 quality % of 100m, carborundum particle 49 quality % that median size is 1m and the median size carbon dust 1 quality % that is 1m, add polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water and make tabular molding, in the drying machine of 40 ℃ of temperature after the dry night, the silicon carbide powder that pore is loaded q.s is positioned on the molding, calcines 1 hour in 1800 ℃ under the argon gas atmosphere of decompression.After the surface of the sintered body that obtains ground with flat tool, use and carry out sandblasting, obtain the thermal treatment anchor clamps of the embodiment 1 that it is as shown in the table with surface roughness Ra and concavo-convex equispaced Sm by the projection material shown in the table 1.
Embodiment 2,3
In median size is the mixed powder of the carborundum particle 50 quality % of 100m and the carborundum particle 50 quality % that median size is 1m, add polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water and make tabular molding, in the drying machine of 40 ℃ of temperature, after the dry night, under argon gas atmosphere, calcined 1 hour in 2000 ℃.After the surface of the sintered body that obtains ground with flat tool, the projection material shown in the use table 1 carried out sandblasting respectively, obtained the embodiment 2 with surface roughness Ra and concavo-convex equispaced Sm that it is as shown in the table and 3 thermal treatment anchor clamps.
Embodiment 4,5
The sintered body that obtains by the step identical with embodiment 2 or 3, for the control void content reaches institute's definite value, the Pure Silicon Metal of mounting calculated amount is in the argon gas atmosphere of decompression, heating contained Pure Silicon Metal in 1 hour and is immersed in the pore under 1500 ℃ of temperature, obtained the sintered body of controlling apparent porosity as shown in table 1.After the surface of the sintered body that obtains ground with flat tool, the projection material shown in the use table 1 carried out sandblasting, obtained the embodiment 4 with surface roughness Ra and concavo-convex equispaced Sm that it is as shown in the table and 5 thermal treatment anchor clamps.
Embodiment 6-9
In median size is the carborundum particle 50 quality % of 100m, median size is in the mixed powder of the carborundum particle 49 quality % of 1m and the carbon dust 1 quality % that median size is 1m, add the polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water are made tabular molding, in the drying machine of 40 ℃ of temperature after the dry night, be processed into fixed size, the q.s silicon carbide powder of filling pore is positioned on the molding with reducing in order, under the argon gas atmosphere of decompression in 1800 ℃ of calcinings 1 hour, the sintered body of apparent porosity that obtained control as shown in table 1 respectively.After the surface of the sintered body that obtains ground with flat tool, carry out sandblasting with the projection material shown in the table 1 respectively, obtain the thermal treatment anchor clamps of the embodiment 6-9 that it is as shown in the table with surface roughness Ra and concavo-convex equispaced Sm.
Embodiment 10
Obtain molding by the step identical with embodiment 1, in 40 ℃ of temperature drying machines after dry 1 night, be processed into fixed size, the Si powder of filling pore q.s is positioned on the molding, under the argon gas atmosphere of decompression in 1800 ℃ of calcinings 1 hour.On the sintered body surface that obtains,, under 1200 ℃ of temperature, heat-treat with the glaze glazing identical with the coefficient of thermal expansion of this sintered body.The carborundum particle of surface after the thermal treatment with 2-4m ground gently, obtain the thermal treatment anchor clamps of the embodiment 10 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Embodiment 11
Obtain sintered body by the step identical with embodiment 4, be processed into fixed size, molten from the teeth outwards penetrating applies the mullite composition, will obtain the thermal treatment anchor clamps of the embodiment 11 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Embodiment 12
Obtain sintered body by the step identical with embodiment 1, be processed into institute's dimensioning, grind with flat tool on the surface, will obtain the thermal treatment anchor clamps of the embodiment 12 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 1
By the step identical with embodiment 3, obtain the thinner sintered body of thickness of slab, after the surface of the sintered body that obtains ground with flat tool, projection material shown in the use table 1 carries out sandblasting, obtains the thermal treatment anchor clamps of the comparative example 1 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 2
By the step identical with embodiment 4, obtain the thinner sintered body of thickness of slab, after the surface of the sintered body that obtains ground with flat tool, projection material shown in the use table 1 carries out sandblasting, obtains the thermal treatment anchor clamps of the comparative example 2 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 3
After will grinding with flat tool by the sintered body surface that obtains with embodiment 1 same steps as, carry out hymonette and grind, obtain the thermal treatment anchor clamps of the comparative example 3 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 4
On the sintered body surface that obtains by the step identical with embodiment 11, with having the molten molten molten mullite composition of penetrating of raw material of penetrating of penetrating raw material 1.5-5 times particle diameter that in embodiment 11, uses, obtain the thermal treatment anchor clamps of the comparative example 4 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
The thermal treatment characteristic of anchor clamps
When each thermal treatment of previous embodiment 1-12 and comparative example 1-4 is used for the thermal treatment of glass substrate with the characteristic of anchor clamps and these thermal treatments with anchor clamps to the influence of glass substrate and and the distortion of anchor clamps estimate, it the results are shown in table 1.In addition, as a comparative example 5, measure similarly and estimate with the characteristic of anchor clamps etc. utilizing thermal treatment that former sintered glass ceramics material constitutes, its result also is shown in table 1.
Table 1
Material | Size (mm) | Wall thickness (mm) | Pure Silicon Metal amount (quality %) | Room temperature strength (Mpa) | Apparent porosity (%) | Modulus of rigidity (Gpa) | Amount of bow (mm) | Thermal conductivity (W/mk) | The projection material | Surface roughness Ra (μ m) | Concavo-convex equispaced Sm (μ m) | Sm/Ra | Influence to glass substrate | The anchor clamps distortion | |
Embodiment 1 | sic | 1600×1200 | 5 | 30 | 180 | 0.1 | 300 | 0.3 | 150 | Al 2O 3#24 | 8 | 430 | 54 | Indeformable | Indeformable till using 50 times |
Embodiment 2 | sic | 1600×1200 | 5 | 0 | 100 | 20 | 180 | 0.5 | 100 | Al 2O 3#100 | 2 | 200 | 100 | Indeformable | Indeformable till using 50 times |
Embodiment 3 | sic | 1600×1200 | 2 | 0 | 90 | 30 | 130 | 0.9 | 80 | Al 2O 3#50 | 5 | 300 | 60 | Indeformable | Indeformable till using 50 times |
Embodiment 4 | sic | 1600×1200 | 7 | 10 | 110 | 15 | 220 | 0.3 | 110 | Al 2O 3#80 | 4 | 210 | 53 | Indeformable | Indeformable till using 50 times |
Embodiment 5 | sic | 1600×1200 | 5 | 18 | 150 | 4 | 250 | 0.4 | 130 | No. 5, silica sand | 1 | 190 | 190 | Indeformable | Indeformable till using 50 times |
Embodiment 6 | sic | 1600×1200 | 5 | 30 | 180 | 0.1 | 300 | 0.3 | 150 | Al 2O 3#8 | 20 | 490 | 25 | Indeformable | Indeformable till using 50 times |
Embodiment 7 | sic | 1200×800 | 3 | 26 | 180 | 0.5 | 290 | 0.1 | 150 | Al 2O 3#24 | 8 | 510 | 64 | Indeformable | Indeformable till using 50 times |
Embodiment 8 | sic | 1200×800 | 2 | 22 | 150 | 3 | 250 | 0.2 | 140 | No. 10, silica sand | 0.8 | 150 | 188 | Indeformable | Indeformable till using 50 times |
Embodiment 9 | sic | 900×800 | 5 | 30 | 180 | 0.1 | 300 | 0.1 | 150 | Al 2O 3#10 | 15 | 350 | 23 | Indeformable | Indeformable till using 50 times |
Embodiment 10 | sic | 320×320 | 5 | 30 | 180 | 0.1 | 300 | <01 | 150 | Glass glazing | 0.01 | 5 | 500 | Indeformable | Indeformable till using 50 times |
Embodiment 11 | sic | 320×320 | 5 | 10 | 110 | 15 | 220 | <0.1 | 110 | Mullite is molten to be penetrated | 200 | 1300 | 7 | Indeformable | Indeformable till using 50 times |
Embodiment 12 | sic | 320×320 | 5 | 30 | 180 | 0.1 | 300 | <0.1 | 150 | - | 0.23 | 110 | 478 | Indeformable | Indeformable till using 50 times |
Comparative example 1 | sic | 1600×1200 | 1.5 | 0 | 90 | 30 | 130 | 1.2 | 80 | sic#10 | 250 | 350 | 1 | Flexural deformation | Indeformable till using 50 times |
Comparative example 2 | sic | 1600×1200 | 5 | 10 | 110 | 15 | 220 | 0.4 | 110 | sic#10 | 220 | 450 | 2 | Scratch repeatedly | Indeformable till using 50 times |
Comparative example 3 | sic | 1600×1200 | 5 | 30 | 180 | 0.1 | 300 | 0.3 | 150 | - | 0.15 | 130 | 867 | Adherence | Indeformable till using 50 times |
Comparative example 4 | sic | 1600×1200 | 5 | 10 | 110 | 15 | 220 | 0.4 | 110 | Mullite is molten to be penetrated | 250 | 1950 | 8 | Scratch several times | Indeformable till using 50 times |
Comparative example 5 | Sintered glass ceramics matter | 1600×1200 | 5 | - | 100 | 0 | 80 | 1.0 | 1 | - | - | - | - | Flexural deformation | 32 times |
In thermal treatment, use 50 times sinuousness 1mm till access times.
As shown in table 1, the thermal treatment anchor clamps of embodiment 1-12, to as the glass substrate of heat treatment object without any influence, but, surpass the thermal treatment of 200 comparative example 1,2 and 4 with producing the glass substrate scratch in the anchor clamps at surperficial arithmetic average roughness Ra, the thermal treatment that the ratio (Sm/Ra) of concavo-convex equispaced Sm and arithmetic average roughness Ra surpasses 500 comparative example 3 closely contacts with glass substrate with anchor clamps, draws off difficulty.In addition, the thermal treatment anchor clamps of the comparative example 5 that constitutes by the sintered glass ceramics material, because rigidity is low and crooked big, glass substrate produces crooked, during Datong District, anchor clamps also deform too early from body.
As mentioned above, thermal treatment anchor clamps of the present invention, because principal phase is made of silicon carbide, specific rigidity is higher mutually with the anchor clamps of employed sintered glass ceramics matter in the traditional glass substrate thermal treatment, thermal conductivity is good, can suppress distortion, can in the relatively shorter time, carry out the even thermal treatment of glass substrate expeditiously simultaneously by the caused glass substrate of bending.In addition, do not generate the crystallization phases that particle is grown up owing to do not have, anchor clamps are little from body distortion in time, can use steadily in the long term.And, by suitably control surface roughness and concavo-convex interval, in anchor clamps, there is not the hole, the location of the glass substrate on anchor clamps and draw off glass substrate from anchor clamps and all can easily carry out.
Claims (9)
1. when a glass substrate is heat-treated, be the employed thermal treatment anchor clamps of this glass substrate of mounting, it is characterized in that: principal phase is made of silicon carbide, and its modulus of rigidity is more than the 130Gpa, its thermal conductivity is more than the 80W/mk, and its wall thickness is 2.0 * 10 with the ratio of area
-61/mm-7.3 * 10
-61/mm has concaveconvex shape on its surface, and the arithmetic average roughness Ra on surface is 0.01-200 μ m, and concavo-convex equispaced Sm is below 500 with the ratio of arithmetic average roughness Ra.
2. thermal treatment anchor clamps of putting down in writing as claim 1, wherein, the arithmetic average roughness Ra on surface is 0.1-20 μ m.
3. thermal treatment anchor clamps of putting down in writing as claim 1 is characterized in that: the arithmetic average roughness Ra on surface is 0.1-10 μ m.
4. thermal treatment anchor clamps of putting down in writing as claim 1, it is characterized in that: its modulus of rigidity is more than the 200Gpa.
5. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: area is 0.7 meter
2More than.
6. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: area is 0.9 meter
2More than.
7. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: this glass substrate is to use in flat-panel monitor.
8. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: also contain Pure Silicon Metal 5-50 quality %.
9. the thermal treatment anchor clamps of putting down in writing as claim 8 is characterized in that: on the top layer silicon dioxide layer is arranged.
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JP2001082030 | 2001-03-22 | ||
JP2001082030A JP4049545B2 (en) | 2001-03-22 | 2001-03-22 | SiC heat treatment jig |
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CN1376647A CN1376647A (en) | 2002-10-30 |
CN1189425C true CN1189425C (en) | 2005-02-16 |
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JP (1) | JP4049545B2 (en) |
KR (1) | KR100465389B1 (en) |
CN (1) | CN1189425C (en) |
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WO2008018401A1 (en) * | 2006-08-09 | 2008-02-14 | Mitsui Mining & Smelting Co., Ltd. | SiC-BASED SINTERED PRODUCT, AND METHOD FOR PRODUCTION THEREOF |
EP2138474B1 (en) * | 2008-06-23 | 2018-08-08 | Imerys Kiln Furniture Hungary Ltd. | Sic material |
MY184778A (en) * | 2010-07-26 | 2021-04-21 | Ngk Insulators Ltd | Rack for firing |
JP5936230B2 (en) * | 2010-11-09 | 2016-06-22 | 信越ポリマー株式会社 | Holding jig, handling jig, a set of holding jig, and adherend holding device |
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JPH09275078A (en) * | 1996-04-05 | 1997-10-21 | Sumitomo Metal Ind Ltd | Silicon wafer retaining jig |
JPH10321543A (en) * | 1997-05-20 | 1998-12-04 | Sumitomo Metal Ind Ltd | Wafer support and vertical boat |
JP2000315720A (en) * | 1999-04-28 | 2000-11-14 | Ibiden Co Ltd | Semiconductor manufacturing jig made of ceramics |
JP2000327459A (en) * | 1999-05-26 | 2000-11-28 | Asahi Glass Co Ltd | Silicon carbide jig for low pressure cvd and its production |
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2001
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2002
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JP4049545B2 (en) | 2008-02-20 |
CN1376647A (en) | 2002-10-30 |
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