CN1189425C - Chip for heat treating silicon carbide materials - Google Patents

Chip for heat treating silicon carbide materials Download PDF

Info

Publication number
CN1189425C
CN1189425C CNB021080089A CN02108008A CN1189425C CN 1189425 C CN1189425 C CN 1189425C CN B021080089 A CNB021080089 A CN B021080089A CN 02108008 A CN02108008 A CN 02108008A CN 1189425 C CN1189425 C CN 1189425C
Authority
CN
China
Prior art keywords
anchor clamps
thermal treatment
glass substrate
writing
putting down
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB021080089A
Other languages
Chinese (zh)
Other versions
CN1376647A (en
Inventor
木下寿治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
NGK Adrec Co Ltd
Original Assignee
NGK Insulators Ltd
NGK Adrec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd, NGK Adrec Co Ltd filed Critical NGK Insulators Ltd
Publication of CN1376647A publication Critical patent/CN1376647A/en
Application granted granted Critical
Publication of CN1189425C publication Critical patent/CN1189425C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B29/00Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
    • C03B29/04Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way
    • C03B29/06Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way with horizontal displacement of the products
    • C03B29/08Glass sheets
    • C03B29/12Glass sheets being in a horizontal position on a fluid support, e.g. a gas or molten metal
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/63Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/63Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
    • C04B35/632Organic additives
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5093Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
    • C04B41/5096Silicon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/85Coating or impregnation with inorganic materials
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/38Non-oxide ceramic constituents or additives
    • C04B2235/3817Carbides
    • C04B2235/3826Silicon carbides
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/42Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
    • C04B2235/422Carbon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/42Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
    • C04B2235/428Silicon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54Particle size related information
    • C04B2235/5418Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5436Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54Particle size related information
    • C04B2235/5463Particle size distributions
    • C04B2235/5472Bimodal, multi-modal or multi-fraction
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/66Specific sintering techniques, e.g. centrifugal sintering
    • C04B2235/668Pressureless sintering
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/72Products characterised by the absence or the low content of specific components, e.g. alkali metal free alumina ceramics
    • C04B2235/728Silicon content
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74Physical characteristics
    • C04B2235/77Density
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80Phases present in the sintered or melt-cast ceramic products other than the main phase
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/94Products characterised by their shape
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9607Thermal properties, e.g. thermal expansion coefficient
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/963Surface properties, e.g. surface roughness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Products (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Abstract

The invention provides a heat treating tool which is capable to suppress the deformation of the tool with time and the deformation of a glass substrate under the heat treatment by bending, has excellent thermal conductivity to permit the efficient and uniform heat treatment of the glass substrate in a relatively short time besides stability and appropriate rigidity, and is improved in the handleability when the large-sized glass substrate is placed or removed. This planar heat treating tool is used for placing the glass substrate when the glass substrate is heat treated. Its main phase consists of SiC and has a rugged shape on its surface. The arithmetic mean roughness Ra of the surface is 0.01 to 200 &mu m and the value (Sm/Ra) obtained by dividing the average spacing Sm of the ruggedness by the arithmetic mean roughness Ra is <=500.

Description

Chip for heat treating silicon carbide materials
Technical field
When the relatively large glass substrate that the present invention relates to glass substrate that a kind of flat display board uses etc. is heat-treated, be used for the employed tabular anchor clamps of this sheet glass of mounting.
Background technology
In the manufacturing engineering of flat display board, as heat treatment step, after implementing die on the glass substrate of flat display board, carry out drying and calcination processing, when carrying out this thermal treatment, need mounting to be used for the tabular thermal treatment anchor clamps of glass substrate.This glass substrate thermal treatment anchor clamps, previously used is the glassiness anchor clamps of crystallization.
But the thermal treatment anchor clamps of sintered glass ceramics matter owing to use crystallization phases to change repeatedly, produce flexural deformation, so, after using short time durations, just can not re-use.In addition, sintered glass ceramics matter thermal treatment anchor clamps are because its modulus of rigidity is low to 80Gpa, when anchor clamps multistage ground tower group is carried out the thermal treatment of glass substrate, in the section more than 2 sections, the middle body of anchor clamps is bent downwardly, and exists the glass substrate of handling to produce the situation of distortion.
And, sintered glass ceramics matter thermal treatment apparatus, thermal conductivity is low to moderate 1W/mK, during intensification and when cooling in anchor clamps, easily produce temperature distribution, when this temperature distribution was big, glass substrate generates in thermal treatment handled speckle, so, heating up and lowering the temperature all needs the sufficiently long time, has limited the raising of processing speed.
Therefore, recently, when firing the more small-sized goods of sanitary ware or ceramic tile etc., the thermal treatment that the principal phase of use is made of silicon carbide anchor clamps were also attempted to be applied in the thermal treatment of aforesaid glass substrate in the past.
Yet, in the past at the more small-sized goods of sanitary ware or ceramic tile etc. when burning till, the principal phase of use be the thermal treatment that constitutes by silicon carbide with the common area of anchor clamps at 0.7 meter 2Below, the average arithmetic roughness Ra on surface surpasses 200 μ m, for the distortion such as bending of anchor clamps, is 0.7 meter at area 2Situation under, allow 3 millimeters intensity, still, when the thermal treatment of the glass substrate that uses flat display board etc., area is bigger, the surface is more smooth, requires distortion littler.
For example, the glass substrate as a kind of plasma display panel of flat display board is used maximizes because substrate advances from body, and the anchor clamps that its thermal treatment is used also usable floor area are 0.9 meter 2Above maximization anchor clamps, and allow being deformed into below 1 millimeter of bending etc.And, if when thermal treatment because glass substrate and thermal treatment produce friction with the contact surface of the thermal expansion official post of anchor clamps, thermal treatment with the surfaceness of anchor clamps resemble prior art big, meeting abrades glass substrate because of this friction.This abrasive generation is along with thermal treatment is more remarkable with the increasing of anchor clamps.
The thermal treatment that principal phase is made of silicon carbide, need grind its surface in order to satisfy the heat treated desirable criterion of aforementioned glass substrate usually with anchor clamps, moltenly penetrate, the surface working of glazing etc. to be to improve planeness.The material that is made of silicon carbide for principal phase is only considered to improve its planeness and when implementing attrition process, is carried out becoming up to its surface the grinding of mirror-like, and the roughness on surface becomes very little.This tendency is at the molding to being made of carborundum particle, remarkable especially when the silicon carbide of the impregnation silicon that the impregnation Pure Silicon Metal is fired in its pore grinds.
But, glass substrate is positioned in thermal treatment that this surface grinding becomes mirror-like with on the anchor clamps time, the location is time-consuming because glass substrate slides on anchor clamps, glass substrate closely contacts with anchor clamps with thermal treatment after the thermal treatment simultaneously, be difficult to its separation, because closely contact, in thermal treatment glass substrate can rupture, row line equivalent damage.
In addition, as the method for improving planeness, on the surface molten penetrate or glazing with after the glass coating thermal expansion is consistent, improve planeness by attrition process.But, in this case, carry out the attrition process surface working and become mirror-like owing to consider the raising planeness, can produce problem same as described above.
And, carrying out molten penetrating, surface pore is nearby covered by the molten film of penetrating, and planeness is improved, can the control plane degree by adjusting molten granularity of penetrating raw material.But, use the big molten raw material of penetrating of granularity, because the cause of the granularity of raw material makes the molten film of penetrating produce protuberance, not only can not improve surfaceness, abraded glass baseplate surface on the contrary.
Because after thermal treatment finishes, glass substrate drawing off from the operation efficiency viewpoint from the anchor clamps consider, the automaton of the sorption parts by sucker etc. is set carries out usually, needs to use automaton to take out operation.If be that area is at 0.7 meter 2Following thermal treatment is with the more small-sized glass substrate of mounting on the anchor clamps, may draw off the anchor clamps of tight contact with automaton, still, when drawing off, the tight small defective of contact part branch generation.
In addition, must it be 0.7 meter at area 2Above thermal treatment is during with the more large-scale glass substrate of mounting on the anchor clamps, and closely exposure level increases, and is difficult to draw off operation with automaton.And, must the mounting area be 0.9 meter in thermal treatment on anchor clamps 2During the relatively large glass substrate of above ratio, closely the exposure level increase is bigger, not only can not draw off operation with automaton, and when drawing off, can rupture, significant deficiency such as crackle.
As its countermeasure, attempt thermal treatment with anchor clamps on the general hole of process air streams, preventing tight contact, but have the rigidity that reduces anchor clamps, add the problem of macrobending.
Summary of the invention
In view of the above problems, the purpose of this invention is to provide a kind of have can suppress because anchor clamps are out of shape or crooked stability and the suitable rigidity that makes the glass substrate distortion in the thermal treatment in time from body, having glass substrate simultaneously can have and carrying out heat treated good heat conductivity uniformly than the short period expeditiously, and improves in the mounting of large-size glass substrate or the thermal treatment anchor clamps of the drawing off property when taking out.
According to the present invention, the thermal treatment that the glass substrate that is provided uses with the feature of anchor clamps is: principal phase is made of silicon carbide, and modulus of rigidity is more than the 130Gpa, and thermal conductivity is more than the 80W/mk, and its wall thickness is 2.0 * 10 with the ratio of area -6L/mm-7.3 * 10 -6L/mm has concaveconvex shape on its surface, and the arithmetic average roughness Ra on surface is 0.01-200 μ m, and concavo-convex equispaced Sm is below 500 with the ratio of arithmetic average roughness Ra.And in the present invention, (arithmetic average roughness Ra) and (concavo-convex equispaced Sm) all is the value by JIS B 0601-1994 definition.
The siliceous thermal treatment anchor clamps of carbonization that thermal treatment of the present invention is made of silicon carbide with the principal phase of anchor clamps.Silicon carbide with compared with the widely used sintered glass ceramics of the material of anchor clamps as the thermal treatment of glass substrate in the past because its rigidity height,, can suppress the distortion of glass substrate in the thermal treatment that the bending by anchor clamps causes even the tower group bending on multistage ground is also less.Specifically, preferably more than 130Gpa, if more than 200Gpa, bending is most preferred to modulus of rigidity more for a short time.
In addition, because the siliceous anchor clamps thermal conductivity ratio of carbonization sintered glass ceramics anchor clamps are high significantly, the time weak point that heats up and lower the temperature, the temperature distribution in the anchor clamps is little, and glass substrate is difficult for generating speckle (system ラ) in thermal treatment.Therefore, and compared in the past, but the short period of time heat-treats expeditiously.Specifically, thermal conductivity is preferably more than the 80W/mK.And the siliceous anchor clamps of carbonization also have the knot day crystalline phase that the generation particle that resembles the sintered glass ceramics matter anchor clamps is grown up, and anchor clamps are out of shape little in time from body, can use steadily in the long term.
The present invention is used for the sort of mounting closely contact and tiny flaw takes place, and draws off the difficult relatively large glass substrate of ratio by automaton, has 0.7 meter 2The thermal treatment of above area with effectively might rupture on the anchor clamps especially for being loaded in when drawing off, the great damage of crackle etc. is than with oversized glass substrate, has 0.9 meter 2The thermal treatment of above area is with better on the anchor clamps, and such large-size glass substrate is main the use in advance the flat pannel display of the plasma display panel that maximizes etc. in recent years.
In the present invention, for preventing the tight contact of glass substrate, the surface has concaveconvex shape, and the arithmetic average roughness Ra on surface is the preferred 0.1-20m of 0.01-200m, more preferably 0.1-10m, concavo-convex equispaced Sm is below 500 with the ratio (Sm/Ra) of arithmetic average roughness Ra.
By controlling the concavo-convex of this chucking surface, between anchor clamps and glass substrate,, can make gas such as air that the path of circulation is arranged by forming fine space, prevent both tight contacts.In addition, owing to such condition of surface is arranged, glass substrate moved the position skew of sliding and causing when glass substrate was positioned on the anchor clamps on anchor clamps, therefore easy location.
In addition, at chucking surface arithmetic average roughness Ra during less than 0.01m, irrelevant with concavo-convex equispaced Sm with the ratio (Sm/Ra) of arithmetic average roughness Ra, because glass substrate closely contacts with the contact part of anchor clamps, a part and the anchor clamps of glass substrate are fastening, therefore, and when drawing off glass substrate, the pressing part remains on the anchor clamps, causes tiny flaw.
Under the situation of the arithmetic average roughness Ra of chucking surface greater than 0.01m, because the ratio (Sm/Ra) of concavo-convex equispaced Sm and arithmetic average roughness Ra is below 500, can prevent that glass substrate from closely contacting with anchor clamps, can prevent tiny flaw as described above.And the arithmetic average roughness Ra of chucking surface is greater than 0.1m, can shorten decision position required time when on anchor clamps glass substrate being set, when subzero treatment, and the skew of the position of glass substrate in the time of can reducing anchor clamps and move.
On the one hand, the arithmetic average roughness Ra of chucking surface is greater than 200m, and the temperature official post of anchor clamps and glass substrate rubs during thermal treatment, can abrade glass substrate.
In addition, concavo-convex equispaced Sm surpasses 500 with the ratio (Sm/Ra) of arithmetic average roughness Ra, during thermal treatment, meaning that glass substrate contacts with anchor clamps increases, still, and in this case, when this contact part closely contacts, the part of glass substrate is fastened on the anchor clamps, and the pressing part can remain on the anchor clamps when drawing off glass substrate, and tiny flaw takes place.And glass substrate is big more, and to draw off glass substrate just difficult more, and glass substrate is easy to generate fracture, crackle damages.
Chucking surface concavo-convex, can be by carborundum particle being done after sintered body surface that molding that main raw material burns till obtains grinds with flat tool etc., form by carrying out sandblasting, its arithmetic average roughness Ra can control by granularity, sandblast projection material and the projection pressure of sic raw material.In addition, concavo-convex equispaced Sm can pass through the granularity and the intensity control of the sic raw material particle of use.Can control the intensity of carborundum particle by the density of molding.
In the present invention, the wall thickness of anchor clamps is preferably 2.0 * 10 with the ratio (wall thickness/area) of area -6L/mm-7.3 * 10 -6L/mm.This value is less than 2.0 * 10 -6During l/mm, exist bending excessive, the problem of glass substrate distortion, this is worth greater than 7.3 * 10 -6During l/mm, because weight increases the weight of, thermal capacity also surpasses necessary amount, has increased the load of equipment.
Flat display board will be to 50 inches, 60 inches large scale development, accompany therewith, flat display board also will maximize with the required anchor clamps of thermal treatment of glass substrate, for example, thermal treatment is reached for more than the 1000mm with the long limit of anchor clamps, minor face is 500mm when above, and the wall thickness of anchor clamps is preferably 2-6mm.Same as described above, less than 2mm, possible crooked excessive, glass substrate deforms as wall thickness.In addition, surpass 6mm as wall thickness, preponderance, thermal capacity also surpasses necessary amount, has increased the burden of equipment.
From improving the viewpoint of modulus of rigidity or thermal conductivity, thermal treatment anchor clamps of the present invention, Pure Silicon Metal content are 5-50 quality %.That principal phase is made of silicon carbide and the thermal treatment that contains to some extent quantitative Pure Silicon Metal with anchor clamps can by for example silicon carbide powder is configured as fixed clamp-shaped, with the molding that obtains, in the inert gas atmosphere of the decompression that has Pure Silicon Metal or in the vacuum, in the impregnation Pure Silicon Metal, fire and make.The Pure Silicon Metal that fusion and containing is dipped in the molding in burning till be filled in pore in the carborundum particle of aggregate of conduct combine, make the molding densification.
At first, with silicon carbide powder be shaped as fixed clamp-shaped, the molding pre-burned that obtains, this pre-sintered body is in the inert gas atmosphere or vacuum of the decompression that has Pure Silicon Metal, make the molding densification by in the impregnation Pure Silicon Metal, burning till, can make same thermal treatment anchor clamps.In these manufacture method, by the fill-up of control Pure Silicon Metal, the apparent porosity after may command is burnt till.
The thermal treatment anchor clamps that contain Pure Silicon Metal, by the top layer oxidation, in the top layer, generate silicon dioxide layer (glass coating), can be further with as by the reaction of the glass substrate of thermal treatment body, surface owing to carborundum particle is covered by silicon dioxide layer simultaneously, therefore obtain the effect of the edge Pelleting of carborundum particle, to glass substrate easy damaged not.
Because this glass coating oneself generates, even if the special processing of the glass coating that does not generate in advance, as long as to glass substrate a thermal treatment also use once and just can generate substantially, but, be preferably in and heat-treat in the oxidizing atmosphere or generate glass coating on the surface by glazing, molten penetrate etc. in order to improve effect.
Embodiment
Below, illustrate in greater detail the present invention according to embodiments of the invention, still, the present invention is not subjected to the restriction of these embodiment.
Embodiment 1
In median size is the mixed powder of the carborundum particle 50 quality % of 100m, carborundum particle 49 quality % that median size is 1m and the median size carbon dust 1 quality % that is 1m, add polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water and make tabular molding, in the drying machine of 40 ℃ of temperature after the dry night, the silicon carbide powder that pore is loaded q.s is positioned on the molding, calcines 1 hour in 1800 ℃ under the argon gas atmosphere of decompression.After the surface of the sintered body that obtains ground with flat tool, use and carry out sandblasting, obtain the thermal treatment anchor clamps of the embodiment 1 that it is as shown in the table with surface roughness Ra and concavo-convex equispaced Sm by the projection material shown in the table 1.
Embodiment 2,3
In median size is the mixed powder of the carborundum particle 50 quality % of 100m and the carborundum particle 50 quality % that median size is 1m, add polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water and make tabular molding, in the drying machine of 40 ℃ of temperature, after the dry night, under argon gas atmosphere, calcined 1 hour in 2000 ℃.After the surface of the sintered body that obtains ground with flat tool, the projection material shown in the use table 1 carried out sandblasting respectively, obtained the embodiment 2 with surface roughness Ra and concavo-convex equispaced Sm that it is as shown in the table and 3 thermal treatment anchor clamps.
Embodiment 4,5
The sintered body that obtains by the step identical with embodiment 2 or 3, for the control void content reaches institute's definite value, the Pure Silicon Metal of mounting calculated amount is in the argon gas atmosphere of decompression, heating contained Pure Silicon Metal in 1 hour and is immersed in the pore under 1500 ℃ of temperature, obtained the sintered body of controlling apparent porosity as shown in table 1.After the surface of the sintered body that obtains ground with flat tool, the projection material shown in the use table 1 carried out sandblasting, obtained the embodiment 4 with surface roughness Ra and concavo-convex equispaced Sm that it is as shown in the table and 5 thermal treatment anchor clamps.
Embodiment 6-9
In median size is the carborundum particle 50 quality % of 100m, median size is in the mixed powder of the carborundum particle 49 quality % of 1m and the carbon dust 1 quality % that median size is 1m, add the polycarboxylic acid dispersion agent, acrylic acid or the like latex and ion exchanged water are made tabular molding, in the drying machine of 40 ℃ of temperature after the dry night, be processed into fixed size, the q.s silicon carbide powder of filling pore is positioned on the molding with reducing in order, under the argon gas atmosphere of decompression in 1800 ℃ of calcinings 1 hour, the sintered body of apparent porosity that obtained control as shown in table 1 respectively.After the surface of the sintered body that obtains ground with flat tool, carry out sandblasting with the projection material shown in the table 1 respectively, obtain the thermal treatment anchor clamps of the embodiment 6-9 that it is as shown in the table with surface roughness Ra and concavo-convex equispaced Sm.
Embodiment 10
Obtain molding by the step identical with embodiment 1, in 40 ℃ of temperature drying machines after dry 1 night, be processed into fixed size, the Si powder of filling pore q.s is positioned on the molding, under the argon gas atmosphere of decompression in 1800 ℃ of calcinings 1 hour.On the sintered body surface that obtains,, under 1200 ℃ of temperature, heat-treat with the glaze glazing identical with the coefficient of thermal expansion of this sintered body.The carborundum particle of surface after the thermal treatment with 2-4m ground gently, obtain the thermal treatment anchor clamps of the embodiment 10 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Embodiment 11
Obtain sintered body by the step identical with embodiment 4, be processed into fixed size, molten from the teeth outwards penetrating applies the mullite composition, will obtain the thermal treatment anchor clamps of the embodiment 11 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Embodiment 12
Obtain sintered body by the step identical with embodiment 1, be processed into institute's dimensioning, grind with flat tool on the surface, will obtain the thermal treatment anchor clamps of the embodiment 12 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 1
By the step identical with embodiment 3, obtain the thinner sintered body of thickness of slab, after the surface of the sintered body that obtains ground with flat tool, projection material shown in the use table 1 carries out sandblasting, obtains the thermal treatment anchor clamps of the comparative example 1 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 2
By the step identical with embodiment 4, obtain the thinner sintered body of thickness of slab, after the surface of the sintered body that obtains ground with flat tool, projection material shown in the use table 1 carries out sandblasting, obtains the thermal treatment anchor clamps of the comparative example 2 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 3
After will grinding with flat tool by the sintered body surface that obtains with embodiment 1 same steps as, carry out hymonette and grind, obtain the thermal treatment anchor clamps of the comparative example 3 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
Comparative example 4
On the sintered body surface that obtains by the step identical with embodiment 11, with having the molten molten molten mullite composition of penetrating of raw material of penetrating of penetrating raw material 1.5-5 times particle diameter that in embodiment 11, uses, obtain the thermal treatment anchor clamps of the comparative example 4 with surface roughness Ra and concavo-convex equispaced Sm as shown in table 1.
The thermal treatment characteristic of anchor clamps
When each thermal treatment of previous embodiment 1-12 and comparative example 1-4 is used for the thermal treatment of glass substrate with the characteristic of anchor clamps and these thermal treatments with anchor clamps to the influence of glass substrate and and the distortion of anchor clamps estimate, it the results are shown in table 1.In addition, as a comparative example 5, measure similarly and estimate with the characteristic of anchor clamps etc. utilizing thermal treatment that former sintered glass ceramics material constitutes, its result also is shown in table 1.
Table 1
Material Size (mm) Wall thickness (mm) Pure Silicon Metal amount (quality %) Room temperature strength (Mpa) Apparent porosity (%) Modulus of rigidity (Gpa) Amount of bow (mm) Thermal conductivity (W/mk) The projection material Surface roughness Ra (μ m) Concavo-convex equispaced Sm (μ m) Sm/Ra Influence to glass substrate The anchor clamps distortion
Embodiment 1 sic 1600×1200 5 30 180 0.1 300 0.3 150 Al 2O 3#24 8 430 54 Indeformable Indeformable till using 50 times
Embodiment 2 sic 1600×1200 5 0 100 20 180 0.5 100 Al 2O 3#100 2 200 100 Indeformable Indeformable till using 50 times
Embodiment 3 sic 1600×1200 2 0 90 30 130 0.9 80 Al 2O 3#50 5 300 60 Indeformable Indeformable till using 50 times
Embodiment 4 sic 1600×1200 7 10 110 15 220 0.3 110 Al 2O 3#80 4 210 53 Indeformable Indeformable till using 50 times
Embodiment 5 sic 1600×1200 5 18 150 4 250 0.4 130 No. 5, silica sand 1 190 190 Indeformable Indeformable till using 50 times
Embodiment 6 sic 1600×1200 5 30 180 0.1 300 0.3 150 Al 2O 3#8 20 490 25 Indeformable Indeformable till using 50 times
Embodiment 7 sic 1200×800 3 26 180 0.5 290 0.1 150 Al 2O 3#24 8 510 64 Indeformable Indeformable till using 50 times
Embodiment 8 sic 1200×800 2 22 150 3 250 0.2 140 No. 10, silica sand 0.8 150 188 Indeformable Indeformable till using 50 times
Embodiment 9 sic 900×800 5 30 180 0.1 300 0.1 150 Al 2O 3#10 15 350 23 Indeformable Indeformable till using 50 times
Embodiment 10 sic 320×320 5 30 180 0.1 300 <01 150 Glass glazing 0.01 5 500 Indeformable Indeformable till using 50 times
Embodiment 11 sic 320×320 5 10 110 15 220 <0.1 110 Mullite is molten to be penetrated 200 1300 7 Indeformable Indeformable till using 50 times
Embodiment 12 sic 320×320 5 30 180 0.1 300 <0.1 150 - 0.23 110 478 Indeformable Indeformable till using 50 times
Comparative example 1 sic 1600×1200 1.5 0 90 30 130 1.2 80 sic#10 250 350 1 Flexural deformation Indeformable till using 50 times
Comparative example 2 sic 1600×1200 5 10 110 15 220 0.4 110 sic#10 220 450 2 Scratch repeatedly Indeformable till using 50 times
Comparative example 3 sic 1600×1200 5 30 180 0.1 300 0.3 150 - 0.15 130 867 Adherence Indeformable till using 50 times
Comparative example 4 sic 1600×1200 5 10 110 15 220 0.4 110 Mullite is molten to be penetrated 250 1950 8 Scratch several times Indeformable till using 50 times
Comparative example 5 Sintered glass ceramics matter 1600×1200 5 - 100 0 80 1.0 1 - - - - Flexural deformation 32 times
In thermal treatment, use 50 times sinuousness 1mm till access times.
As shown in table 1, the thermal treatment anchor clamps of embodiment 1-12, to as the glass substrate of heat treatment object without any influence, but, surpass the thermal treatment of 200 comparative example 1,2 and 4 with producing the glass substrate scratch in the anchor clamps at surperficial arithmetic average roughness Ra, the thermal treatment that the ratio (Sm/Ra) of concavo-convex equispaced Sm and arithmetic average roughness Ra surpasses 500 comparative example 3 closely contacts with glass substrate with anchor clamps, draws off difficulty.In addition, the thermal treatment anchor clamps of the comparative example 5 that constitutes by the sintered glass ceramics material, because rigidity is low and crooked big, glass substrate produces crooked, during Datong District, anchor clamps also deform too early from body.
As mentioned above, thermal treatment anchor clamps of the present invention, because principal phase is made of silicon carbide, specific rigidity is higher mutually with the anchor clamps of employed sintered glass ceramics matter in the traditional glass substrate thermal treatment, thermal conductivity is good, can suppress distortion, can in the relatively shorter time, carry out the even thermal treatment of glass substrate expeditiously simultaneously by the caused glass substrate of bending.In addition, do not generate the crystallization phases that particle is grown up owing to do not have, anchor clamps are little from body distortion in time, can use steadily in the long term.And, by suitably control surface roughness and concavo-convex interval, in anchor clamps, there is not the hole, the location of the glass substrate on anchor clamps and draw off glass substrate from anchor clamps and all can easily carry out.

Claims (9)

1. when a glass substrate is heat-treated, be the employed thermal treatment anchor clamps of this glass substrate of mounting, it is characterized in that: principal phase is made of silicon carbide, and its modulus of rigidity is more than the 130Gpa, its thermal conductivity is more than the 80W/mk, and its wall thickness is 2.0 * 10 with the ratio of area -61/mm-7.3 * 10 -61/mm has concaveconvex shape on its surface, and the arithmetic average roughness Ra on surface is 0.01-200 μ m, and concavo-convex equispaced Sm is below 500 with the ratio of arithmetic average roughness Ra.
2. thermal treatment anchor clamps of putting down in writing as claim 1, wherein, the arithmetic average roughness Ra on surface is 0.1-20 μ m.
3. thermal treatment anchor clamps of putting down in writing as claim 1 is characterized in that: the arithmetic average roughness Ra on surface is 0.1-10 μ m.
4. thermal treatment anchor clamps of putting down in writing as claim 1, it is characterized in that: its modulus of rigidity is more than the 200Gpa.
5. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: area is 0.7 meter 2More than.
6. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: area is 0.9 meter 2More than.
7. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: this glass substrate is to use in flat-panel monitor.
8. as each thermal treatment anchor clamps of putting down in writing of claim 1-4, it is characterized in that: also contain Pure Silicon Metal 5-50 quality %.
9. the thermal treatment anchor clamps of putting down in writing as claim 8 is characterized in that: on the top layer silicon dioxide layer is arranged.
CNB021080089A 2001-03-22 2002-03-22 Chip for heat treating silicon carbide materials Expired - Fee Related CN1189425C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001082030 2001-03-22
JP2001082030A JP4049545B2 (en) 2001-03-22 2001-03-22 SiC heat treatment jig

Publications (2)

Publication Number Publication Date
CN1376647A CN1376647A (en) 2002-10-30
CN1189425C true CN1189425C (en) 2005-02-16

Family

ID=18938028

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021080089A Expired - Fee Related CN1189425C (en) 2001-03-22 2002-03-22 Chip for heat treating silicon carbide materials

Country Status (5)

Country Link
JP (1) JP4049545B2 (en)
KR (1) KR100465389B1 (en)
CN (1) CN1189425C (en)
DE (1) DE10212607A1 (en)
TW (1) TW574172B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008018401A1 (en) * 2006-08-09 2008-02-14 Mitsui Mining & Smelting Co., Ltd. SiC-BASED SINTERED PRODUCT, AND METHOD FOR PRODUCTION THEREOF
EP2138474B1 (en) * 2008-06-23 2018-08-08 Imerys Kiln Furniture Hungary Ltd. Sic material
MY184778A (en) * 2010-07-26 2021-04-21 Ngk Insulators Ltd Rack for firing
JP5936230B2 (en) * 2010-11-09 2016-06-22 信越ポリマー株式会社 Holding jig, handling jig, a set of holding jig, and adherend holding device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3378608B2 (en) * 1993-05-31 2003-02-17 イビデン株式会社 Method for producing silicon carbide substrate for jig for semiconductor production
JPH09275078A (en) * 1996-04-05 1997-10-21 Sumitomo Metal Ind Ltd Silicon wafer retaining jig
JPH10321543A (en) * 1997-05-20 1998-12-04 Sumitomo Metal Ind Ltd Wafer support and vertical boat
JP2000315720A (en) * 1999-04-28 2000-11-14 Ibiden Co Ltd Semiconductor manufacturing jig made of ceramics
JP2000327459A (en) * 1999-05-26 2000-11-28 Asahi Glass Co Ltd Silicon carbide jig for low pressure cvd and its production

Also Published As

Publication number Publication date
KR100465389B1 (en) 2005-01-13
DE10212607A1 (en) 2002-10-31
TW574172B (en) 2004-02-01
KR20020075231A (en) 2002-10-04
JP2002274946A (en) 2002-09-25
JP4049545B2 (en) 2008-02-20
CN1376647A (en) 2002-10-30

Similar Documents

Publication Publication Date Title
EP0891311B1 (en) Tape cast silicon carbide dummy wafer
JPH07299708A (en) Manufacture of silicon nitride system ceramics part
CN1849276A (en) Sic refractory comprising silicon nitride bonded thereto and method for production thereof
CN1654432A (en) Method for preparing silicon nitride/silicon carbide porous ceramic
CN1207247C (en) Prepn process of aluminium nitride ceramic substrate
WO2013035646A1 (en) Molded inorganic-fiber object
CN1872793A (en) Oxide-bonded silicon carbide material
US7081425B2 (en) Aluminum nitride sintered body
CN1189425C (en) Chip for heat treating silicon carbide materials
CN1061330C (en) Wear resistant sintered zirconium boule composite and manufacture thereof
CN1713968A (en) Method for improving toughness of surface of ceramic and ceramic article
WO1995006622A1 (en) Light-permeable ceramic material and method of manufacturing the same
CN1076012C (en) Process for preparation of transparent aluminium nitride ceramic
CN1902143A (en) Composite material and method for producing same
JP2005072039A (en) Vacuum chuck
JP3980262B2 (en) SiC heat treatment jig
CN114644525A (en) Composite sagger added with waste materials and preparation method thereof
CN1131650A (en) Process for production of silicon nitride sintered body
CN1184795A (en) Method for preparing non-crack, anti-oxidation silicone carbide coating carbon material
CN112912356A (en) Method for manufacturing silicon nitride substrate and silicon nitride substrate
JP2007063124A (en) Ceramic substrate
JP2000327430A (en) Aluminum nitride sintered compact and its production
JP2001089270A (en) Method of producing silicon impregnated silicon carbide ceramic member
CN114380610B (en) Method for manufacturing pressureless liquid phase sintered silicon carbide ceramic grinding disc
CN1355150A (en) Process for preparing composite microcrystal alumina ceramics with high P/C ratio

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20050216

Termination date: 20110322