TW574172B - SiC clamp manufacturing method - Google Patents

Description

574172

FIELD OF THE INVENTION The present invention relates to a plate-shaped jig used for placing a large glass substrate such as a glass substrate for a flat display panel on which the glass substrate is subjected to heat treatment. '' Description of the conventional technology In the manufacturing process of a flat display panel, as a heat treatment step, after a stamp is implemented on the glass substrate of the flat display panel, drying and sintering are performed. Jig for heat treatment of glass substrates. This type of jig for heat treating glass substrates has conventionally used a crystallized glassy jig. However, since the heat treatment jig of 疋 'crystallized glass is repeatedly used, the crystal phase will change and bend. Therefore, it cannot be used after a short period of time. In addition, the crystallized glass-breaking heat treatment jig has a rigidity as low as 80 Gpa. When heat treatment is performed on the glass substrate of the multi-segment tower group of the jig, the central part of the jig is downwards in two or more stages. The processed glass substrate may be deformed. In addition, the thermal conductivity of crystallized glassy heat treatment appliances is as low as 1 W / mK, and temperature distribution in the fixture is easy to occur during heating and cooling.

When this kind of temperature distribution is large, the glass substrate generates processing streaks during heat treatment, so that it takes a long time to increase and decrease the temperature, which limits the increase in processing speed. Therefore, recently, when the comparative products such as sanitary ware and ceramic tiles were fired, the heat treatment jig composed of silicon carbide was used as the main phase.

Page 5 574172

It is attempted to be applied to the aforementioned heat treatment of a glass substrate. However, 'in the past, relatively small products such as sanitary pottery or porcelain monuments were fired, and the main phase used was silicon carbide. The heat treatment jigs usually accumulated below 0.7 to 2 and the average arithmetic roughness of the surface. Ra exceeds 200 / zm, = T loses the shape of the arm bend, etc. In the case of an area of 0.7 meters, the strength of 3 square meters is allowed, but 疋, the heat treatment of glass substrates such as flat display panels is used ^ 'Large area, smoother surface, requiring less deformation. For example, 'glass substrates for plasma display panels as a type of flat display panel', since the substrate itself is being enlarged, the heat treatment fixtures also use large-scale fixtures with an area of 0.9 m 2 or more. Change = below 1¾ meters. Moreover, if the contact surfaces of the two substrates are abraded due to the thermal expansion difference between the glass substrate and the heat treatment jig during heat treatment, the surface roughness of the heat treatment inflammator is as large as in the prior art, and the glass substrate will be scratched due to such friction. The occurrence of such abrasions becomes more significant as the heat treatment jig becomes larger. In order to meet the necessary standards for the aforementioned glass substrates and treatments, a heat treatment jig composed of a carbide phase is generally required to improve the flatness of the surface by grinding, spraying, or glazing the surface. In the case of a material made of silicon carbide whose main phase is made of silicon carbide, the surface roughness is very small when polishing is performed only to improve the flatness. The "type of tendency" is notable for polishing a silicon carbide-impregnated silicon carbide obtained by impregnating a silicon body with silicon carbide impregnated with metal silicon in the pores of a molded body composed of silicon carbide particles. 'But ’a glass substrate is placed on such a surface and polished into a mirror-like heat.

Page 6 574172 _Case No. 91104358_ Years and Months Revision_ V. Description of the invention (3) When processing the inflammation fixture, it takes time to slide and position the glass substrate on the fixture. At the same time, the glass substrate is in close contact with the heat treatment fixture after heat treatment. Due to the close contact, the glass substrate may be damaged and cracked during heat treatment. In addition, as a method for improving the flatness, the surface flatness is improved by grinding after the surface is sprayed or glazed and the thermal expansion of the glass layer is consistent. However, in this case, since the flatness is considered and the surface is polished to a mirror-like surface, the same problem as described above occurs. In addition, when dissolution shooting is performed, the pores near the surface are covered with the dissolution shooting film to improve the flatness, and the flatness can be controlled by adjusting the particle size of the dissolution raw material. However, the use of a large-sized dissolution raw material causes convex portions of the dissolution film due to the particle size of the raw material, which not only cannot improve the surface roughness, but also scratches the surface of the glass substrate. Since the glass substrate is unloaded from the jig after the heat treatment is completed, it is usually performed by an automatic machine provided with a suction member such as a suction cup from the viewpoint of operation efficiency, and it is necessary to be able to use the automatic machine to perform the removal operation. If a relatively small glass substrate is placed on a heat treatment jig with an area of less than 0.7 m2, the close contact jig may be unloaded by an automatic machine. However, when it is unloaded, the close contact part may cause slight defects. In addition, when a relatively large-sized glass substrate must be placed on a heat treatment jig having an area of 0.7 m 2 or more, the degree of close contact increases, making it difficult to perform an unloading operation by an automatic machine. In addition, when a relatively large glass substrate with an area of 0.9 m 2 or more must be placed on a heat treatment jig, the degree of close contact increases even more. Not only cannot the unloading operation be performed by an automatic machine, but

574172 Correction Major defects such as fracture and crack occurred. As a countermeasure to this, 'it is attempted to process a hole for general air flow in a heat treatment jig' to prevent close contact, but there is a problem that the rigidity of the jig is reduced and the bending is increased. ^ Summary of the invention In view of the above problems, the object of the present invention is to provide a glass substrate that can suppress deformation ^ over time to deform the glass substrate during heat treatment. 1 Stability and appropriate rigidity. A heat treatment jig that performs uniform heat treatment in a relatively short period of time and performs excellent uniform heat treatment, and improves the releasability when placing or taking out a large glass substrate. According to the present invention, the heat treatment jig provided is characterized in that when a glass substrate is subjected to heat treatment, a plate-like heat treatment jig used for placing the glass substrate, whose main phase is made of silicon carbide, is provided with a concave-convex shape on the surface. The arithmetic average roughness Ra of the surface is 0 · 0 1 -2 0 0 " m, and the ratio (Sm / Ra) of the average interval Sm of irregularities to the arithmetic average roughness Ra is 50 or less. Further, in the present invention, both (arithmetic average roughness Ra) and (average interval Sm of irregularities) are values defined in accordance with JIS B 0 60 1-1 9 94. The main phase of the heat treatment jig of the present invention is a carbide heat treatment jig composed of silicon carbide. Compared with crystallized glass, which is widely used as a material for heat treatment fixtures of glass substrates, carbonized carbides are more rigid. Even if the tower group is bent in multiple stages, the bending is smaller. It can suppress the glass substrate during heat treatment caused by the bending of the fixture Of deformation. Specifically, the rigidity is preferably 130 Gpa

Page 8 574172

The smaller the curvature is, the shorter the thermal conductivity is than the time, and the formation of streaks is lost. (The ground is heat treated. Moreover, the charcoal is formed into particles and the growth period is stable to make close contact with the glass substrate, especially for better board display on the extra large fixture. Mainly preferred. Temperature distribution in crystallized glass fixtures). So, reason. Specifically, the silicon jig also has a crystalline phase, which is useless. Minor defects, with a glass substrate that can be loaded and unloaded at 0.7 m2, with a 'larger in recent years to use such large or larger', if it is more than 20 Gpa, it will be bent due to the carbon carbide It is remarkably high, and the temperature rise and fall are small, and the glass substrate is less likely to undergo heat treatment than before, and the thermal conductivity is preferably 80 W / mK or more in a short time and with high efficiency. A jig such as a crystallized vitreous jig has a small deformation over time, and can be used for a long time. The present invention is effective for a heat treatment jig that has a relatively large area where placement and removal are difficult, and cracks and cracks can occur. Other major damages include flat glass substrates such as heat-treated plasma display panels with an area of 0.9 m 2 or more. In the present invention, in order to prevent the glass substrate from coming into close contact, the surface has a concave-convex shape, and the arithmetic average roughness Ra of the surface is 0 · Ol-2 0 0 / zm, preferably 0 · 1-2 0 μm, and more preferably oi-io " m, and the ratio (Sm / Ra) of the average interval Sm of unevenness to the arithmetic average roughness Ra is 50 or less. By controlling the unevenness of the surface of the jig, by forming a fine gap between the fixture and the glass substrate, a gas can be circulated to prevent a close contact between the two. In addition, due to such a surface state, the glass substrate is moved and slid on a jig when the glass substrate is placed on a jig, and the position is shifted, so that positioning is easy.

Page 9 574172 _Case No. 91104358 Health η π Correction _ V. Explanation of the invention (6) In addition, when the average roughness ra of the surface of the fixture is less than 〇1 〇1, the average distance from the unevenness Sm and the average The ratio of the roughness Ra (gm / Ra) is irrelevant. Since the glass substrate is in close contact with the contact portion of the jig, and a part of the glass substrate is fastened to the jig, the pressing portion remains on the jig when the glass substrate is unloaded, causing a slight defect. In the case where the arithmetic average roughness Ra of the surface of the fixture is greater than 0.01 ^ m, since the ratio (Sm / Ra) of the average interval Sm of the unevenness to the arithmetic average roughness Ra is less than 50, the glass substrate and the fixture can be prevented Close contact can prevent such small defects as described above. In addition, the arithmetic average roughness Ra of the surface of the jig is larger than 0 · m, which can shorten the time required to determine the position when the glass substrate is set on the jig, and can reduce the positional deviation of the glass substrate when the jig moves during low-temperature processing. On the one hand, the arithmetic average roughness Ra of the surface of the fixture is greater than 200 / z m. The temperature difference between the fixture and the glass substrate during heat treatment causes friction between the two, which will scratch the glass substrate. In addition, the ratio (Sm / Ra) of the average interval Sm of the unevenness to the arithmetic average roughness Ra exceeds 50 0, and the heat treatment means that the glass substrate and the jig contact more, but in this case, when the contact portion is close When contacting, a part of the glass substrate is fastened to the jig, and the pressed part remains on the jig when the glass substrate is unloaded, causing slight defects. Furthermore, the larger the glass substrate, the more difficult it is to remove the glass substrate, and the glass substrate is prone to breakage and crack damage. The unevenness on the surface of the jig can be obtained by polishing the surface of the sintered body by using silicon carbide particles as the main raw material for the sintered molded body.

Page 10 574172 — · Case No. 91104358_ 年月 日 绦 正 _ V. Description of the invention (7) Formed by sand blasting, the arithmetic average roughness Ra can be determined by the particle size of the carbonized carbide chip and the blasting projection material And projection pressure to control. In addition, the average interval Sm of the unevenness can be controlled by the particle size and concentration of the raw material particles of the broken fossil. The density of the carbide particles can be controlled by the density of the formed body. In the present invention, the ratio of the wall thickness to the area (wall thickness / area) of the jig is preferably 2 · 0X 1〇-6 · i / mm —7 · 3X 10_6 · I / mm. When the value is less than 2.0 × l / mm, there is a problem that the bending is too large and the glass substrate is deformed. When the value is greater than 7.3 × 10 ′ 丨 / ㈣, the heat capacity also exceeds the necessary amount due to the weight increase, which increases the load of the equipment. The flat display panel will be enlarged to 50 inches and 60 inches. At the same time, the fixture required for the heat treatment of the glass substrate for the flat display panel will also have a large side A. For example, the long side of the heat treatment fixture is 10 Above 0 0 mm, the wall thickness of the jig when it is short ΓΓΓΓ 丨 is preferably 2-1. It may be excessively bent, the glass substrate may change its weight, more than 6mm, the weight is too heavy, and the heat capacity is also exceeded, which increases the burden on equipment. From the viewpoint of conductivity, the heat treatment of the present invention contains a predetermined amount of hafnium. The main phase is composed of carbon cut and powder is formed into a powder. The processing clip can be formed by, for example, forming a carbonized stone, and the shape of the mold. 'The obtained shape will be the same as that in a gas atmosphere or a vacuum,' in impregnated gold The stone eve of the second night is combined with the bonded silicon particles of the moon as the metal τ filled in the gas: 4 =: =; =

574172 __911Q4 ^ R_year month day_correction 5. Description of the invention (8) Densification of the body. First, the silicon carbide powder is formed into a predetermined jig shape, and the formed body is pre-fired. This pre-fired body is impregnated with metal silicon while being impregnated with an inert gas atmosphere or vacuum under the presence of metal silicon. The firing densifies the molded body, and the same heat treatment jig can be produced. In these manufacturing methods, by controlling the filling amount of metallic silicon, the apparent porosity after firing can be controlled. The silicon dioxide layer (glass layer) is formed in the heat treatment clip containing metallic silicon, and the glass substrate is covered with the oxide layer to obtain carbonized particles. The glass substrate is not easily damaged. Because the glass layer is generated by itself, the special treatment of the layer can be basically formed as long as the glass is processed, but in order to improve the heat treatment, or through the application of shafts, solvents, and surface oxidation, the surface layer can be further treated as a heated surface. Because the surface of the silicon carbide particles is pelletized by the edges of the two sons, the primary effect is used even if the pre-generated glass-breaking substrate is not subjected to a single heat treatment. It is best to wait in an oxidizing atmosphere to generate a glass layer on the surface. The detailed description of the preferred embodiment of the present invention illustrates the present invention in detail, but in the following, according to the embodiments of the present invention, the present invention is not limited by these embodiments. Example 1 The average particle size of the carbon powder 1 is equal to the particle size. 10 porphyrin carbide particles 50 mass silicon carbide particles with l ^ n 49 mass 铷 average particle diameter shoulder

574172

--9πη ^ «V. Description of the invention (9) A plate-shaped molded body made of polyacrylic acid-based dispersant, acrylic latex, and ion-exchanged water is added to the mixed powder in the amount of%, and the dryer is at a temperature of 40 ° C After overnight drying, the pores were filled with a sufficient amount of silicon carbide powder and placed on a jealous body, and sintered at 180 0 ° C for 1 hour under a reduced pressure argon atmosphere. The surface of the fired body obtained by v was polished with a flat grinding disc, and then subjected to sandblasting using a shot as shown in Table 1, to obtain an example having a surface roughness \ and an average interval of unevenness 3111 as shown in the table. 1 heat treatment jig. X a Example 2, 3, 50% by mass of silicon carbide particles with an average particle size of 100 # JJJ, and 50% by mass of silicon carbide particles with a diameter of 1 " m, mixed with powder = acid dispersion The zibu acrylic latex and ion-exchanged water were made into a plate-shaped 4 ^ body, and dried overnight in a dryer at a temperature of 40 ° C, & ^ 20_ 煆 ㈣, hours. The obtained firing surface was ground and ground, and then the projective materials shown in Table 1 were used for sandblasting, and the surface roughness as shown in Table 2 was used for the heat treatment of the taste concavities 2 and 3. Example 4 and 5 of the ten-millimeter interval h Sm of the jig. The calcined body obtained in the same procedure as in Example 2 or 3, the porosity reached a predetermined value, and a calculated amount of silicon metal was placed. (Heating at TC temperature for 1 hour, immersing the metal stone in the air hole, milk hole and milk atmosphere to obtain the fired body a whose apparent porosity is controlled as shown in Table i. The surface of the obtained body is polished with a flat grinding disk. Use table, projection shown

574172

Concave Examples 6-9 First, silicon carbide particles with an average particle size of 10 m 50% by mass and an average particle size of 1 // H1's fossils Xixin / 1 Qj ^ T Dan 0/4: τ mass % Of the mixed powder, the average particle size of the particles is 9 m, and the average particle size is M m.] ^ ^ ^ At the end, adding polycarboxylic acid-based dispersant, acrylic milk II, fl a > =, made of water into a plate shape Body, in a dryer at a temperature of 40 ° C, 2 ^ &! ≫, Kawai becomes a predetermined size, and a sufficient amount of carbon J ° η to fill the pores is sequentially placed on the formed body, and the pressure is reduced. The argon gas was sintered at 180 ° C for 1 hour, and the calcined bodies with controlled porosity as shown in Table 丨 were obtained. After the surface of the obtained fired body was polished with a flat grinding disc = sandblasted with the projection materials shown in Table 1, respectively, Example 6 having a surface roughness Ra and an average interval of unevenness as shown in the table was obtained. -9 heat treatment fixture. Example 1 03. A molded body was obtained in the same procedure as in Example 1. After drying at 40 ° C for 2 nights, it was processed into a predetermined size, and the filling pores were sufficient. The Shi Xi powder was placed on the formed body, and it was sintered for 1 hour at 180 ° C. under a reduced-pressure argon atmosphere. The surface of the obtained fired body was glazed with a glaze having the same heat / swelling rate as the fired body, and heat-treated at a temperature of 120 ° C. The heat-treated surface was lightly polished with 2-4 " m silicon carbide particles to obtain an implementation having a surface roughness Ra and an average interval Sm of unevenness as shown in Table 1.

574172 _Case No. 91104358_ Year Month Revision _ 5. Description of the invention (11) Example 10 Fixture for heat treatment. Example 1 1 A sintered body was obtained by the same procedure as in Example 4, processed to a predetermined size, and a mullite component was spray-coated on the surface. The surface roughness Ra and unevenness shown in Table 1 were obtained. The heat treatment jig of Example 11 of the average interval Sm. Example 1 2 A sintered body was obtained by the same procedure as in Example 1, and processed to a predetermined size. The surface was polished with a flat grinding disk to obtain the implementation of the average interval Sm with surface roughness Ra and unevenness as shown in Table 1. Example 12 Heat treatment jig. Comparative Example 1 According to the same procedure as in Example 3, a fired body having a thinner plate thickness was obtained, and the surface of the fired body obtained was polished with a flat grinding disc, and then subjected to sandblasting using a projection material shown in Table 1, The heat treatment jig of Comparative Example 1 having the surface roughness Ra and the average interval Sm of unevenness as shown in Table 1 was obtained. Comparative Example 2 The same procedure as in Example 4 was used to obtain a fired body having a thinner plate thickness. The surface of the fired body obtained was polished with a flat grinding disk, and then subjected to sandblasting using a projection material shown in Table 1. Obtain the surface as shown in Table 1.

Page 15 574172 __Case No. 91104358__ Month J -_____ V. Description of the invention (12) The heat treatment jig of Comparative Example 2 of the slackness Ra and the average interval of unevenness ^. Comparative Example 3 The surface of the sintered body obtained in the same procedure as in Example 1 was polished with a flat polishing disc, and then ground interlining was polished to obtain a comparative example having a surface roughness Ra and an average interval Sm of unevenness as shown in Table 1. 3 heat treatment missing. Comparative Example 4 On the surface of the sintered body obtained by the same procedure as in Example 11, mullite was dissolved by using a spraying raw material having a particle diameter of 1.5-5 times that of the solvent-spraying raw material used in Example 11 (b). Components, as shown in Table 1, a heat treatment jig of Comparative Example 4 having an average interval Sm of surface rough greenness Ra ^ unevenness was obtained. Characteristics of heat treatment jigs The characteristics of each of the heat treatment jigs of the foregoing Examples 1 to 12 and Comparative Examples 1 to 4 and the influence of these heat treatment jigs on the heat treatment of the glass substrate and the deformation of the jig were evaluated. The results are shown.于 表 1。 In Table 1. In addition, as Comparative Example 5 ', the characteristics and the like of a heat treatment S cooler made of a conventional crystallized glassy material were also measured and evaluated in the same manner. The results are also shown in the table.

Page 16 574172 Case No. 91104358 Amendment V. Description of Invention (13)

SK ± 1 〇 κ- er s $ O SK κ- Seven! 〇 玲 9K K- 七 1 «Γ 〇9 9 K- -y« Γ ο * y ο Tom, κ- i i6 ο κ- -y ο SK: + XJ o 5 cans 〇3Κ * • id 〇 安9Κ Κ- -y 〇Κ- -Η can ο »: + Η shout 〇 SM .3 altar 〇3 s $ 〇3 if times < n S Si KK 5 ttn mm K δ Μ ιΛ κ 2 in ST 5 1/1 mm «η SC s watt m ΙΛ 芝 2 benzene mm 2 5 \ Λ i • St in = 3 芄 m 1 /) 5 m 5 5 μ 3; μ 5 • 33 -No change, no change, no change, no change, no change, no change, no change, no change, no change, no change, no change, no change, no change, no change. S «/ Ka S 100 3 3 1 «η CN * t〇1 rn 500 r- 00 c ^ *-04 1 00 1 Uneven Y-Mass MS» (μ * >! 430 200 8 Ο 5Μ ο% 510 s i- 350 1_ _ U3 IJOO Ο S HS0 § iU5U 1 Agricultural surface m Selectivity Ra (μ · > 00 CM «η-ο CO a〇o in o.oi § ϋ. 23 S Ο 0. 15 2 .1 Discussion" _ 1 ΛΙ , α, Μ24 A "0, MI00 ΑΙΑΜ50 ΛΙΑΝ80 Silica sand 5 铖 Ai, 〇j» a ΛΙΑΜ24 Silica 丨 〇Bis 1 AIARI0 1__ Poune Shiyoudian rice stone mi | j 1 sicNIO sicttIO 1 Rice rice mill I Μ Fu Yan (W / ek) S Ο ο SS ο SS ο 2 S Ο S ο-Aphid Quercus (mm) 〇 U9 〇 · σ »d cn 〇 ο 〇o '5M Ο d 〇 ο CM 〇 0 3 d 〇 / Wtt contention (Cpo) 300 1 ο Ο C4 s «Μ 300 1_ 1 250 300 300 ο CM 300 〇220 300 ο CM [Table slave oxygen contention (X) do ο U3 ^ r 〇 \ Λ d ％% d- U9 Ο o ιη 〇 \ η 〇 room temperature strong Ιίί UV ») ss Ο 2% s S o 〇ο Ο ο S Ο 8 gold collapse silicon site (MOLD oo ο 〇 30 oo 〇ο ο o ο 〇〇 1 capital 1 «A \ r > CM c— vn m r > C4 \ Λ \ Λ in χΛ \ n νΛ κη 7Γ 9 1 a S ra 1 3 | | X 1 χ I 3 r > ο rn 5 Π 1 1 | ο CM 1 = < JX s • o X s X 1 X s: 〇X 1 X 8 # £ s 04 1 X 1 X 5 r > X Ο r > X ο rj X 1 I ink 8 • 〇 ink 1 material》 u • Λ sic CJ (A u O v »u ui u VI ο νι u tfl ςι VI u VI ς > • Αsic U UI UV» • Λ CM η m ς00 σι 〇 2 CM CSJ cn cn Tsuenki mmmm 壎m * mm ί -¾ i xj ± f AJ oi- Η0ms page 17 574172

For example, if the processed material is coarse on average, the glass produced Ra is tighter than the plate. If the comparison plate is produced as shown in the figure, the fixture will cause the particles to enter the granularity to form a fixed spacer. It does not have any effect on the glass substrate of the workpiece. However, in Comparative Examples 2 and 4 of the surface tube's roughness Ra exceeding 200, the heat treatment was lost; the middle glass substrate was scratched, and the average interval Sm of the unevenness and the arithmetic average thickness were ^ The heat treatment jig disk of Comparative Example 3 whose production (Sm / Ra) exceeds exceeded, it was difficult to remove. In addition, the heat treatment jig made of the crystallized vitreous material glass Example 5 has a large bending due to its low rigidity, and is bent and deformed prematurely. According to Qin Qin, because the heat treatment of the present invention is lost, the main phase is more rigid and has better thermal conductivity than the crystallized glass used in the conventional glass substrate heat treatment, which can suppress the deformation of the glass substrate and can also In a relatively short period of time, the glass substrates were uniformly heat treated. In addition, since there is no long crystal phase, the deformation of the fixture itself with time is small, and it can be used stably for a long time. Furthermore, by appropriately controlling the surface roughness and the absence of cavities in the jig, the fixation of the glass substrate on the jig and the removal of the glass substrate can be easily performed.

574172 Case No. 91104358 Date of Amendment

Claims (1)

574172 _Case No. 91104358_ Year Month Amendment_ Six. Patent Application Law, where the glass substrate is used in a flat panel display. 9. The method for manufacturing a silicon carbide jig as described in any one of claims 1 to 3, wherein the rigidity is 130 Gpa or more. 10. The method for manufacturing a silicon carbide jig as described in item 4 of the scope of patent application, wherein the rigidity is 130 Gpa or more. 11. The method for manufacturing a silicon carbide jig according to item 5 of the scope of patent application, wherein the rigidity is 130 Gpa or more. 1 2. The method of manufacturing a silicon carbide jig according to item 6 of the scope of patent application, wherein the rigidity is 130 Gpa or more. 13. The method for manufacturing a silicon carbide jig as described in any one of claims 1 to 3, wherein the rigidity is 200 Gpa or more. 1 4. The method of manufacturing a silicon carbide jig as described in item 4 of the scope of patent application, wherein the rigidity is 20 OGpa or more. 1 5. The method for manufacturing a silicon carbide jig as described in item 5 of the scope of patent application, wherein the rigidity is 20 OGpa or more. 1 6. The method for manufacturing a silicon carbide jig according to item 6 of the scope of patent application, wherein the rigidity is 20 OGpa or more. 1 7. The method for manufacturing a silicon carbide clamp according to any one of claims 1 to 3 in the scope of the patent application, wherein the silicon-containing metal contains 5 to 50% by mass. 1 8. The method for manufacturing a silicon carbide jig as described in item 4 of the scope of patent application, wherein the silicon-containing metal contains 5-50 mass ° / 〇. 574172 _Case No. 9Π04358_ Year Month Amendment __ VI. Scope of Patent Application 1 9. The method for manufacturing silicon carbide jigs as described in Item 5 of the scope of patent application, which contains 5-50% by mass of metal stone. 20. The method for manufacturing a silicon carbide jig as described in item 6 of the scope of patent application, which contains 5-50% by mass of the metal stone. 2 1. The method for manufacturing a silicon carbide jig as described in item 7 of the scope of patent application, wherein the metal-containing material contains 5 to 50% by mass. 2 2. The method for manufacturing a silicon carbide jig as described in item 8 of the scope of patent application, wherein the silicon-containing metal contains 5 to 50% by mass. 2 3. The method for manufacturing a silicon carbide jig as described in any one of claims 1 to 3, wherein the ratio of wall thickness to area (wall thickness / area) is 2.0 X 10 夂 l / mm-7.3 X 10 ^ 1 / mm. 2 4. The method of manufacturing a silicon carbide jig as described in item 4 of the scope of patent application, wherein the ratio of wall thickness to area (wall thickness / area) is 2.0 \ 10-6 · l / mm-7. 3X 10- 6. · l / mm ° 2 5. The method for manufacturing a silicon carbide jig as described in item 5 of the scope of patent application, wherein the ratio of wall thickness to area (wall thickness / area) is 2.0 乂 10-6 · l / mm -7 · 3X 10-6 · l / mm〇2 6. The method for manufacturing a silicon carbide jig as described in item 6 of the patent application scope, wherein the ratio of wall thickness to area (wall thickness / area) is 2 · 〇 x 10-6 · l / mm-7. 3X 10-6 · l / mm ° 2 7. The method of manufacturing a silicon carbide jig as described in item 7 of the scope of patent application, wherein the ratio of wall thickness to area (wall Thickness / area) is 2 · Ox 10 -6 · l / mm-7. 3X 10-6 · l / mm ° 2 8. The manufacturer of the silicon carbide jig described in item 8 of the scope of patent application Page 22 574172 _Case No. 91104358_ Year and Month Amendment_ 6. Method of Patent Application, where the ratio of wall thickness to area (wall thickness / area) is 2 · OX 1 0-6 · Ι / mm-7 · 3 × 10-6 · l / mmo 2 9. The method for manufacturing a silicon carbide jig as described in item 17 of the scope of patent application, wherein the ratio of wall thickness to area (wall thickness / area) is 2.0 × 10-6 · L / mm-7.3x 10-6 · l / mm ° 3 0. The method for manufacturing a silicon carbide jig as described in item 17 of the patent application scope, wherein the surface layer has a silicon dioxide layer. 3 1. The method for manufacturing a silicon carbide clamp according to any one of claims 1 to 3 in the scope of patent application, wherein the thermal conductivity is 80 W / mK. 3 2. The method of manufacturing a silicon carbide jig as described in item 4 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. 3 3. The method for manufacturing a silicon carbide jig according to item 5 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. 34. The method for manufacturing a silicon carbide jig according to item 6 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. 3 5. The method of manufacturing a silicon carbide jig according to item 9 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. 36. The method for manufacturing a silicon carbide jig as described in item 10 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. 37. The method for manufacturing a silicon carbide jig according to item 17 in the scope of patent application, wherein the thermal conductivity is 80 W / mK. 3 8. The method for manufacturing a silicon carbide jig according to item 23 of the patent application scope, wherein the thermal conductivity is 80 W / mK. Page 23 574172 Case No. 91104358 Month, Day, Amendment VI. Scope of Patent Application 39. The method of manufacturing a silicon carbide jig as described in Item 30 of the scope of patent application, wherein the thermal conductivity is 80 W / mK. i ·! Page 24 (The above are filled by this bureau.) Invention Patent Specification 574172 Chinese invention name English SiC clamp manufacturing method SiC clamp Name (Chinese) 1. Kinoshita Inventor Name (English) Nationality Residence, Residence Name (Name) ( Chinese) Name (Name) (English) l.Toshiharu Kinoshita 1 · Japan (Inside the company limited by shares) 1. The Japanese Prayer Co., Ltd. 2. NGK Aqing Leike Co., Ltd. 1. NGK INSULATORS, LTD. 2. NGK ADREC CO., LTD. ) Name of Representative (Chinese) Name of Representative (English) 1. Japanese version 2. Japanese version 1. Japanese country No. 56, Suda-cho, Mizuho-ku, Nagoya City, Aichi Prefecture, Japan 3〇4〇 Fandi 1. Shibata Masaharu 2. Shirakawa Hiroshi 1. Masaharu Shibata 2. Hiroshi Shirakawa Month 574172 said Leng Yishi r * i > Patented method for manufacturing anti-fossil eve cooler of ancient A 擗 helmets, which is characterized by using silicon carbide powder II :, a predetermined shape of the fixture, and pre-firing the formed body. This pre-fired body is densified in a pre-fired body in a reduced-pressure inert gas atmosphere or a vacuum in which metallic silicon is present, while being impregnated with the metallic silicon, and forming a concave-convex shape on the surface. The arithmetic average roughness Ra of the surface is 0 · 0 1 -2 0 0 a m, and the ratio (81111 "8) of the average interval Sm of unevenness to the arithmetic average roughness 88 is 5 0 or less. 2 The method for manufacturing a silicon carbide jig according to one item, wherein the arithmetic average roughness of the surface "is 0.20 / zm. 3. The method for manufacturing a silicon carbide jig as described in item 1 of the scope of patent application, wherein the arithmetic average roughness Ra of the surface is 0H 〇 " m. 4. The manufacturing method of silicon carbide jigs as described in any one of claims 1 to 3 in the scope of patent application, wherein the area is 0.7 m2 or more. '5. The method for manufacturing a silicon carbide jig according to any one of claims 1 to 3 in the scope of patent application, wherein the area is 0.9 m 2 or more. 6 · The carbonization as described in any one of the scope of application patents (1) to (3); the manufacturing method of the ear canal, where the glass substrate is used in a flat panel display. 7. The method for manufacturing a carbonization jig according to item 4 of the scope of patent application, wherein the glass substrate is used in a flat panel display. 8 · Manufacturer of silicon carbide jigs as described in item 5 of the scope of patent application