CN118805143A - 用于以两种成像设置成像掩模层的方法和相关联的成像系统 - Google Patents

用于以两种成像设置成像掩模层的方法和相关联的成像系统 Download PDF

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Publication number
CN118805143A
CN118805143A CN202380024777.9A CN202380024777A CN118805143A CN 118805143 A CN118805143 A CN 118805143A CN 202380024777 A CN202380024777 A CN 202380024777A CN 118805143 A CN118805143 A CN 118805143A
Authority
CN
China
Prior art keywords
imaging
area
halftone
pixels
setting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380024777.9A
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English (en)
Chinese (zh)
Inventor
德克·卢多·朱利安·德劳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allys Prepress Ltd
Original Assignee
Allys Prepress Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allys Prepress Ltd filed Critical Allys Prepress Ltd
Publication of CN118805143A publication Critical patent/CN118805143A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/40—Picture signal circuits
    • H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/40—Picture signal circuits
    • H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
    • H04N1/4055—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern
    • H04N1/4057—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern the pattern being a mixture of differently sized sub-patterns, e.g. spots having only a few different diameters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Facsimile Image Signal Circuits (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
CN202380024777.9A 2022-03-02 2023-03-01 用于以两种成像设置成像掩模层的方法和相关联的成像系统 Pending CN118805143A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL2031133 2022-03-02
NL2031133A NL2031133B1 (en) 2022-03-02 2022-03-02 Method for imaging a mask layer with two imaging settings and associated imaging system
PCT/EP2023/055101 WO2023166020A1 (en) 2022-03-02 2023-03-01 Method for imaging a mask layer with two imaging settings and associated imaging system

Publications (1)

Publication Number Publication Date
CN118805143A true CN118805143A (zh) 2024-10-18

Family

ID=82308481

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380024777.9A Pending CN118805143A (zh) 2022-03-02 2023-03-01 用于以两种成像设置成像掩模层的方法和相关联的成像系统

Country Status (6)

Country Link
US (1) US20250208514A1 (https=)
EP (1) EP4487178A1 (https=)
JP (1) JP2025508360A (https=)
CN (1) CN118805143A (https=)
NL (1) NL2031133B1 (https=)
WO (1) WO2023166020A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2033172B1 (en) 2022-09-28 2024-04-05 Xsys Prepress N V Method of preparing image job data for imaging a mask layer, associated controller and mask layer imaging system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731405B2 (en) * 1999-05-14 2004-05-04 Artwork Systems Printing plates containing ink cells in both solid and halftone areas
US9375910B2 (en) * 2014-10-08 2016-06-28 Eastman Kodak Company Forming a flexographic plate
US11142013B2 (en) * 2016-05-27 2021-10-12 Esko Software Bvba Method for smoother tonal response in flexographic printing
NL2022776B1 (en) 2019-03-20 2020-09-28 Xeikon Prepress Nv Method and system for applying a pattern on a mask layer
NL2024368B1 (en) * 2019-12-03 2021-08-31 Xeikon Prepress Nv Method and system for processing a raster image file
US11388311B2 (en) * 2020-06-05 2022-07-12 Esko Software Bvba System and method for obtaining a uniform ink layer

Also Published As

Publication number Publication date
EP4487178A1 (en) 2025-01-08
JP2025508360A (ja) 2025-03-26
WO2023166020A1 (en) 2023-09-07
US20250208514A1 (en) 2025-06-26
NL2031133B1 (en) 2023-09-11

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