NL2031133B1 - Method for imaging a mask layer with two imaging settings and associated imaging system - Google Patents

Method for imaging a mask layer with two imaging settings and associated imaging system Download PDF

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Publication number
NL2031133B1
NL2031133B1 NL2031133A NL2031133A NL2031133B1 NL 2031133 B1 NL2031133 B1 NL 2031133B1 NL 2031133 A NL2031133 A NL 2031133A NL 2031133 A NL2031133 A NL 2031133A NL 2031133 B1 NL2031133 B1 NL 2031133B1
Authority
NL
Netherlands
Prior art keywords
area
exposure
halftone
pixel
imaging
Prior art date
Application number
NL2031133A
Other languages
English (en)
Dutch (nl)
Inventor
Ludo Julien De Rauw Dirk
Original Assignee
Xsys Prepress N V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xsys Prepress N V filed Critical Xsys Prepress N V
Priority to NL2031133A priority Critical patent/NL2031133B1/en
Priority to CN202380024777.9A priority patent/CN118805143A/zh
Priority to JP2024546437A priority patent/JP2025508360A/ja
Priority to PCT/EP2023/055101 priority patent/WO2023166020A1/en
Priority to US18/839,194 priority patent/US20250208514A1/en
Priority to EP23707412.5A priority patent/EP4487178A1/en
Application granted granted Critical
Publication of NL2031133B1 publication Critical patent/NL2031133B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/40—Picture signal circuits
    • H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/40—Picture signal circuits
    • H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
    • H04N1/4055—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern
    • H04N1/4057—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern the pattern being a mixture of differently sized sub-patterns, e.g. spots having only a few different diameters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Facsimile Image Signal Circuits (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
NL2031133A 2022-03-02 2022-03-02 Method for imaging a mask layer with two imaging settings and associated imaging system NL2031133B1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL2031133A NL2031133B1 (en) 2022-03-02 2022-03-02 Method for imaging a mask layer with two imaging settings and associated imaging system
CN202380024777.9A CN118805143A (zh) 2022-03-02 2023-03-01 用于以两种成像设置成像掩模层的方法和相关联的成像系统
JP2024546437A JP2025508360A (ja) 2022-03-02 2023-03-01 ２つの撮像設定でマスク層を撮像するための方法および関連する撮像システム
PCT/EP2023/055101 WO2023166020A1 (en) 2022-03-02 2023-03-01 Method for imaging a mask layer with two imaging settings and associated imaging system
US18/839,194 US20250208514A1 (en) 2022-03-02 2023-03-01 Method for imaging a mask layer with two imaging settings and associated imaging system
EP23707412.5A EP4487178A1 (en) 2022-03-02 2023-03-01 Method for imaging a mask layer with two imaging settings and associated imaging system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2031133A NL2031133B1 (en) 2022-03-02 2022-03-02 Method for imaging a mask layer with two imaging settings and associated imaging system

Publications (1)

Publication Number Publication Date
NL2031133B1 true NL2031133B1 (en) 2023-09-11

Family

ID=82308481

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2031133A NL2031133B1 (en) 2022-03-02 2022-03-02 Method for imaging a mask layer with two imaging settings and associated imaging system

Country Status (6)

Country Link
US (1) US20250208514A1 (https=)
EP (1) EP4487178A1 (https=)
JP (1) JP2025508360A (https=)
CN (1) CN118805143A (https=)
NL (1) NL2031133B1 (https=)
WO (1) WO2023166020A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4345596A1 (en) 2022-09-28 2024-04-03 XSYS Prepress NV Method of preparing image job data for imaging a mask layer, associated controller and mask layer imaging system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020083855A1 (en) * 1999-05-14 2002-07-04 Mark Samworth Printing plates containing ink cells in both solid and halftone areas
US9235126B1 (en) * 2014-10-08 2016-01-12 Eastman Kodak Company Flexographic surface patterns
WO2017203034A1 (en) * 2016-05-27 2017-11-30 Esko Software Bvba Method for smoother tonal response in flexographic printing
WO2020188041A1 (en) 2019-03-20 2020-09-24 Xeikon Prepress N.V. Method and system for applying a pattern on a mask layer
WO2021110831A1 (en) * 2019-12-03 2021-06-10 Xeikon Prepress N.V. Method and system for processing a raster image file
US20210385353A1 (en) * 2020-06-05 2021-12-09 Esko Software Bvba System and method for obtaining a uniform ink layer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020083855A1 (en) * 1999-05-14 2002-07-04 Mark Samworth Printing plates containing ink cells in both solid and halftone areas
US9235126B1 (en) * 2014-10-08 2016-01-12 Eastman Kodak Company Flexographic surface patterns
WO2017203034A1 (en) * 2016-05-27 2017-11-30 Esko Software Bvba Method for smoother tonal response in flexographic printing
WO2020188041A1 (en) 2019-03-20 2020-09-24 Xeikon Prepress N.V. Method and system for applying a pattern on a mask layer
WO2021110831A1 (en) * 2019-12-03 2021-06-10 Xeikon Prepress N.V. Method and system for processing a raster image file
US20210385353A1 (en) * 2020-06-05 2021-12-09 Esko Software Bvba System and method for obtaining a uniform ink layer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4345596A1 (en) 2022-09-28 2024-04-03 XSYS Prepress NV Method of preparing image job data for imaging a mask layer, associated controller and mask layer imaging system

Also Published As

Publication number Publication date
EP4487178A1 (en) 2025-01-08
JP2025508360A (ja) 2025-03-26
WO2023166020A1 (en) 2023-09-07
US20250208514A1 (en) 2025-06-26
CN118805143A (zh) 2024-10-18

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