JP2025508360A - 2つの撮像設定でマスク層を撮像するための方法および関連する撮像システム - Google Patents
2つの撮像設定でマスク層を撮像するための方法および関連する撮像システム Download PDFInfo
- Publication number
- JP2025508360A JP2025508360A JP2024546437A JP2024546437A JP2025508360A JP 2025508360 A JP2025508360 A JP 2025508360A JP 2024546437 A JP2024546437 A JP 2024546437A JP 2024546437 A JP2024546437 A JP 2024546437A JP 2025508360 A JP2025508360 A JP 2025508360A
- Authority
- JP
- Japan
- Prior art keywords
- imaging
- halftone
- imaged
- area
- setting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/405—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
- H04N1/4055—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern
- H04N1/4057—Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels producing a clustered dots or a size modulated halftone pattern the pattern being a mixture of differently sized sub-patterns, e.g. spots having only a few different diameters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Optics & Photonics (AREA)
- Facsimile Image Signal Circuits (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2031133 | 2022-03-02 | ||
| NL2031133A NL2031133B1 (en) | 2022-03-02 | 2022-03-02 | Method for imaging a mask layer with two imaging settings and associated imaging system |
| PCT/EP2023/055101 WO2023166020A1 (en) | 2022-03-02 | 2023-03-01 | Method for imaging a mask layer with two imaging settings and associated imaging system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025508360A true JP2025508360A (ja) | 2025-03-26 |
| JP2025508360A5 JP2025508360A5 (https=) | 2026-04-30 |
Family
ID=82308481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024546437A Pending JP2025508360A (ja) | 2022-03-02 | 2023-03-01 | 2つの撮像設定でマスク層を撮像するための方法および関連する撮像システム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250208514A1 (https=) |
| EP (1) | EP4487178A1 (https=) |
| JP (1) | JP2025508360A (https=) |
| CN (1) | CN118805143A (https=) |
| NL (1) | NL2031133B1 (https=) |
| WO (1) | WO2023166020A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2033172B1 (en) | 2022-09-28 | 2024-04-05 | Xsys Prepress N V | Method of preparing image job data for imaging a mask layer, associated controller and mask layer imaging system |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6731405B2 (en) * | 1999-05-14 | 2004-05-04 | Artwork Systems | Printing plates containing ink cells in both solid and halftone areas |
| US9375910B2 (en) * | 2014-10-08 | 2016-06-28 | Eastman Kodak Company | Forming a flexographic plate |
| US11142013B2 (en) * | 2016-05-27 | 2021-10-12 | Esko Software Bvba | Method for smoother tonal response in flexographic printing |
| NL2022776B1 (en) | 2019-03-20 | 2020-09-28 | Xeikon Prepress Nv | Method and system for applying a pattern on a mask layer |
| NL2024368B1 (en) * | 2019-12-03 | 2021-08-31 | Xeikon Prepress Nv | Method and system for processing a raster image file |
| US11388311B2 (en) * | 2020-06-05 | 2022-07-12 | Esko Software Bvba | System and method for obtaining a uniform ink layer |
-
2022
- 2022-03-02 NL NL2031133A patent/NL2031133B1/en active
-
2023
- 2023-03-01 JP JP2024546437A patent/JP2025508360A/ja active Pending
- 2023-03-01 CN CN202380024777.9A patent/CN118805143A/zh active Pending
- 2023-03-01 WO PCT/EP2023/055101 patent/WO2023166020A1/en not_active Ceased
- 2023-03-01 EP EP23707412.5A patent/EP4487178A1/en active Pending
- 2023-03-01 US US18/839,194 patent/US20250208514A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP4487178A1 (en) | 2025-01-08 |
| WO2023166020A1 (en) | 2023-09-07 |
| US20250208514A1 (en) | 2025-06-26 |
| CN118805143A (zh) | 2024-10-18 |
| NL2031133B1 (en) | 2023-09-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251217 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260421 |