CN118648114A - 功能元件及其制造方法 - Google Patents

功能元件及其制造方法 Download PDF

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Publication number
CN118648114A
CN118648114A CN202380019841.4A CN202380019841A CN118648114A CN 118648114 A CN118648114 A CN 118648114A CN 202380019841 A CN202380019841 A CN 202380019841A CN 118648114 A CN118648114 A CN 118648114A
Authority
CN
China
Prior art keywords
electrode
film
photoelectric conversion
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380019841.4A
Other languages
English (en)
Chinese (zh)
Inventor
山冈义和
町田真一
宍戸三四郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Intellectual Property Management Co Ltd
Original Assignee
Panasonic Intellectual Property Management Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Intellectual Property Management Co Ltd filed Critical Panasonic Intellectual Property Management Co Ltd
Publication of CN118648114A publication Critical patent/CN118648114A/zh
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621Providing a shape to conductive layers, e.g. patterning or selective deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/191Photoconductor image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/30Devices controlled by radiation
    • H10K39/32Organic image sensors

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
CN202380019841.4A 2022-02-18 2023-01-23 功能元件及其制造方法 Pending CN118648114A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022-023771 2022-02-18
JP2022023771 2022-02-18
PCT/JP2023/001942 WO2023157571A1 (ja) 2022-02-18 2023-01-23 機能素子およびその製造方法

Publications (1)

Publication Number Publication Date
CN118648114A true CN118648114A (zh) 2024-09-13

Family

ID=87578279

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380019841.4A Pending CN118648114A (zh) 2022-02-18 2023-01-23 功能元件及其制造方法

Country Status (5)

Country Link
US (1) US20240389444A1 (https=)
EP (1) EP4481826A4 (https=)
JP (1) JPWO2023157571A1 (https=)
CN (1) CN118648114A (https=)
WO (1) WO2023157571A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2011027745A1 (ja) * 2009-09-01 2013-02-04 ローム株式会社 光電変換装置および光電変換装置の製造方法
JP2014011392A (ja) * 2012-07-02 2014-01-20 Sony Corp 固体撮像装置及びその製造方法、電子機器
JP2015012239A (ja) * 2013-07-01 2015-01-19 ソニー株式会社 撮像素子および電子機器
JP7040445B2 (ja) * 2016-07-20 2022-03-23 ソニーグループ株式会社 半導体膜及びその製造方法、並びに、光電変換素子、固体撮像素子及び電子装置
JP7162275B2 (ja) 2018-06-14 2022-10-28 パナソニックIpマネジメント株式会社 制御電極と、透明電極と、前記制御電極と前記透明電極の側面とを電気的に接続する接続層と、を備えるイメージセンサ

Also Published As

Publication number Publication date
EP4481826A4 (en) 2025-06-18
JPWO2023157571A1 (https=) 2023-08-24
US20240389444A1 (en) 2024-11-21
WO2023157571A1 (ja) 2023-08-24
EP4481826A1 (en) 2024-12-25

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