CN118092080A - Comprehensive monitoring device and monitoring method for light spot position of vertical incidence light beam - Google Patents
Comprehensive monitoring device and monitoring method for light spot position of vertical incidence light beam Download PDFInfo
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- 238000012544 monitoring process Methods 0.000 title claims abstract description 51
- 238000012806 monitoring device Methods 0.000 title claims abstract description 21
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- 239000005304 optical glass Substances 0.000 claims abstract description 22
- 230000007246 mechanism Effects 0.000 claims abstract description 13
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- 239000011521 glass Substances 0.000 description 9
- 210000004907 gland Anatomy 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
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- 238000001459 lithography Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/003—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring position, not involving coordinate determination
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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Abstract
The application discloses a comprehensive monitoring device and a monitoring method for the light spot position of a vertical incidence light beam, and relates to the technical field of optical compensation of a photoetching machine, comprising a shell, wherein a light inlet area and a light beam channel are arranged on the shell; the optical glass is fixedly arranged in the light inlet area and used for reflecting light beams into a light beam channel in the shell; the beam direction detection mechanism is arranged in the beam channel and is used for detecting the direction of the beam; the light beam modulator is arranged in the light beam channel, four photosensitive areas are arranged on the light beam modulator, and turning lenses are arranged in each photosensitive area; four photosensitive areas on the light beam modulator are in one-to-one correspondence with four quadrants on the APD four-quadrant photoelectric sensor, and turning lenses in the photosensitive areas are respectively used for projecting light beams to the quadrants corresponding to the APD four-quadrant photoelectric sensor. The application has the effect of realizing high-precision monitoring of the position of the light beam under the condition of ensuring the precision of monitoring the pointing direction of the light beam.
Description
Technical Field
The application relates to the technical field of optical compensation of a photoetching machine, in particular to a comprehensive monitoring device and a monitoring method for the position of a light spot of a vertical incident light beam.
Background
In the illumination system of the lithography machine, on the one hand, the position and the direction of the output beam of the laser drift, on the other hand, after long-distance transmission, the position and the direction of the output beam of the laser can be influenced by environmental factors to generate offset, so that the illumination system of the lithography machine often needs to use a light stabilizing mechanism to compensate the related offset in real time so as to ensure that an illumination light field with uniform and stable light intensity distribution is obtained on the surface of a silicon wafer in the exposure process, and the effective monitoring of the light beam is an important premise for accurately executing the compensation.
At present, when monitoring the light beam, the light beam is mainly divided into light beam direction monitoring and light beam position monitoring, however, the existing light beam monitoring device has obvious tendency between the light beam direction monitoring and the light beam position monitoring, the device for protruding the direction monitoring is limited in position monitoring, the device for protruding the position monitoring is relatively low in accuracy, and light spots with different sizes are difficult to be compatible. Under the condition of not sacrificing the pointing monitoring precision, the position of the light beam is monitored with high precision, and the light beam are integrated in a compact and integrated way, so that the device has great promotion effect on the research of a high-precision light stabilizing device.
Disclosure of Invention
Aiming at the problems existing in the prior art, the application provides a comprehensive monitoring device and a monitoring method for the position of a light spot of a vertical incidence light beam, which have the effect of realizing high-precision monitoring of the position of the light beam under the condition of ensuring the monitoring precision of the direction of the light beam.
In a first aspect, the present application provides a comprehensive monitoring device for a light spot position of a normally incident light beam, which adopts the following technical scheme:
The comprehensive monitoring device for the light spot position of the vertical incidence light beam comprises a shell, wherein a light inlet area is arranged on the shell, and a light beam channel is arranged in the shell; the optical glass is fixedly arranged in the light inlet area and used for reflecting light beams into a light beam channel in the shell; the beam direction detection mechanism is arranged in the beam channel and is used for detecting the direction of the beam; the light beam modulator is arranged in the light beam channel, four photosensitive areas are arranged on the light beam modulator, and turning lenses are arranged in each photosensitive area; the four photosensitive areas on the beam modulator are in one-to-one correspondence with the four quadrants on the APD four-quadrant photoelectric sensor, and turning lenses in the photosensitive areas are respectively used for projecting beams to the quadrants corresponding to the APD four-quadrant photoelectric sensor.
Optionally, according to the voltage value of the light spot output by each quadrant on the APD four-quadrant photoelectric sensor, the following two coefficients Δx and Δy are calculated:
ΔX=[(A+B)-(C+D)]/[(A+B)+(C+D)]
ΔY=[(A+D)-(B+C)]/[(A+D)+(B+C)]
and A, B, C, D is the voltage value output by four quadrants of the APD four-quadrant photoelectric sensor, the offset direction of the light beam is judged according to the calculated values of delta X and delta Y, the offset of the light beam and the values of delta X and delta Y are in linear relation, and the offset of the light beam is calculated through on-line calibration according to the values of delta X and delta Y.
Optionally, the casing includes main light path frame and main body frame, main light path frame and main body frame detachable connection, advance the light zone and set up on main light path frame, light beam channel and light beam modulator all set up on main body frame, offered the connector with advance the light zone intercommunication on the main light path frame, the connector is used for docking the light beam channel.
Optionally, the light beam modulator includes a substrate fixedly disposed on the main body frame, and a plurality of lens supports fixedly disposed on the substrate, four photosensitive areas are disposed on the substrate, and the lens supports are in one-to-one correspondence with the photosensitive areas, the turning lenses are fixed on the lens supports corresponding to the photosensitive areas, and each of the turning lenses is obliquely disposed.
Optionally, the lateral wall of main light path frame has seted up the first access hole with advance optical zone intercommunication, optical glass sets up in first access hole position, and can dismantle with main light path frame and be connected, be provided with the first end cover that is used for sealing first access hole on the main light path frame.
Optionally, a dustproof lens is fixedly arranged at the connection port.
Optionally, a second access hole communicated with the light inlet area is formed in the main light path frame, and a second end cover for sealing the second access hole is arranged at the second access hole.
Optionally, the beam pointing detection mechanism includes an optical lens fixedly disposed in the beam channel, and a PSD optical sensor fixedly disposed on the main body frame, where the optical lens is used to reflect the beam into a photosensitive area of the PSD optical sensor.
In a second aspect, the present application provides a method for monitoring a comprehensive monitoring device for a position of a light spot of a normally incident beam, which adopts the following technical scheme:
a monitoring method of an integrated monitoring device for the position of a light spot of a vertical incidence light beam comprises the following steps:
S1, injecting light, namely vertically injecting a light beam into a light inlet area of a shell, and reflecting the light beam into a light beam channel through optical glass;
s2, monitoring the beam pointing direction, wherein a part of beams entering a beam channel monitor the pointing direction of the beams with high precision through a beam pointing detection mechanism;
S3, monitoring the position of the light beam, irradiating another part of light beam entering the light beam channel into four photosensitive areas on the light beam modulator, respectively projecting the light beam onto corresponding quadrants on the photo-electric sensors of the four quadrants of the APD through turning lenses in the photosensitive areas, and respectively monitoring the energy intensity of light spots on the four quadrants through the photo-electric sensors of the four quadrants of the APD;
s4, calculating the offset of the light beam, wherein when the light beam is not offset, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor are the same, and when the light beam is offset, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor are changed, and according to the change condition of the voltage values of the light spots on the quadrants, the offset direction and the offset of the light beam are calculated.
Optionally, the dividing manner of the beam cross-section area mainly relates to turning lenses of four photosensitive areas on the beam modulator, on the basis that the size of the beam cross-section is not exceeded, the larger the light spot gap reflected by the turning lenses of the four photosensitive areas on the beam modulator is, the higher the sensitivity is, and when the position of the beam is monitored, the gap and the inclination angle of the turning lenses in the four photosensitive areas on the beam modulator need to be adjusted according to the theoretical range of the measured beam cross-section size.
In summary, the application has the following beneficial technical effects:
1. The light beam enters a light inlet area, the light beam is reflected into a light beam channel through optical glass, a part of the light beam entering the light beam channel is subjected to high-precision monitoring on the direction of the light beam through a light beam direction detection mechanism, another part of the light beam entering the light beam channel is irradiated into four photosensitive areas on a light beam modulator, the light beam is projected onto corresponding quadrants on an APD four-quadrant photoelectric sensor through turning lenses in the photosensitive areas respectively, then the energy intensity of light spots on the four quadrants is monitored through the APD four-quadrant photoelectric sensor respectively, when the light beam does not deviate, the voltage value of the light spot on each quadrant on the APD four-quadrant photoelectric sensor is the same, when the light beam deviates, the voltage value of the light spot on each quadrant on the APD four-quadrant photoelectric sensor changes, and according to the change condition of the voltage value of the light spot on each quadrant, the deviation direction and the deviation amount of the light beam are further monitored with high precision of light beam measurement and calculation.
Drawings
FIG. 1 is a schematic overall structure of an embodiment of the present application;
FIG. 2 is a cross-sectional view of the structure of an embodiment of the present application;
FIG. 3 is an enlarged view of portion A of FIG. 2;
FIG. 4 is an exploded view of the structure of an embodiment of the present application;
fig. 5 is a schematic diagram showing the structure of a beam modulator according to an embodiment of the present application.
Reference numerals illustrate: 1. a housing; 11. a main light path frame; 111. a light inlet region; 112. a light inlet; 113. a light outlet; 114. a connection port; 1141. a dust-proof lens; 1142. a placement groove; 1143. a dust-proof groove; 1144. a gland; 115. an optical glass; 116. a first access port; 1161. a glass support; 1162. a first end cap; 117. a second access port; 1171. a second end cap; 12. a main body frame; 121. a beam path; 122. a maintenance port; 1221. a semi-transparent mirror support; 123. a mounting port; 2. the beam is directed to a monitoring mechanism; 21. a semi-transparent semi-reflective lens; 22. a PSD optical sensor; 3. APD four-quadrant photosensor; 4. a beam modulator; 41. a substrate; 42. a lens holder; 43. turning the lens.
Detailed Description
The application is described in further detail below with reference to fig. 1-5.
The embodiment of the application discloses a comprehensive monitoring device for the position of a light spot of a vertical incidence light beam. Referring to fig. 1 and 2, the optical fiber monitoring device comprises a shell 1, wherein the shell 1 comprises a main optical path frame 11 and a main body frame 12, the main optical path frame 11 and the main body frame 12 are fixed through bolts, an optical inlet area 111 is arranged in the main optical path frame 11, a light beam channel 121 is arranged in the main body frame 12, a light beam direction monitoring mechanism 2 and an APD four-quadrant photoelectric sensor 3 are arranged on the main body frame 12, and a light beam modulator 4 is arranged in the light beam channel 121.
Referring to fig. 2, the bottom wall of the main optical path frame 11 is provided with an optical inlet 112 communicating with the optical inlet 111, the top wall of the main optical path frame 11 is provided with an optical outlet 113 communicating with the optical inlet 111, the side wall of the main optical path frame 11 is provided with a connection port 114 communicating with the optical inlet 111, and the beam passage 121 communicates with the connection port 114.
Referring to fig. 2, an optical glass 115 is fixedly disposed in the light entrance region 111, the optical glass 115 is obliquely disposed, the optical glass 115 is made of high-transmittance low-reflection glass, the transmittance of the optical glass 115 is more than 95%, the reflectance of the optical glass 115 is about 3%, a light beam enters the light entrance region 111 through the light entrance 112, a large part of the light beam is emitted from the light exit 113 through the optical glass 115, and a small part of the light beam is reflected by the optical glass 115 and horizontally enters the light beam channel 121 along the length direction of the main body frame 12 from the connection port 114 for monitoring.
Referring to fig. 2 and 3, a dustproof lens 1141 is disposed at the connection port 114, a placing groove 1142 communicating with the connection port 114 is formed on a side wall of the main light path frame 11, a dustproof groove 1143 communicating with the connection port 114 is formed on a bottom wall of the placing groove 1142, the dustproof groove 1143 is matched with the dustproof lens 1141, the dustproof lens 1141 is disposed in the dustproof groove 1143, a gland 1144 is fixedly disposed in the placing groove 1142 through bolts, the dustproof lens 1141 is pressed and fixed in the dustproof groove 1143 through the gland 1144, a through hole is formed in the gland 1144, the dustproof lens 1141 is also made of high-transmittance low-reflection glass, the connection port 114 is sealed through the dustproof lens 1141, and dust is effectively prevented from entering the light beam channel 121.
Referring to fig. 2 and 3, the bottom wall of the dustproof slot 1143 and the end of the gland 1144 close to the dustproof lens 1141 are provided with annular grooves, the notch of each annular groove is in contact with the dustproof lens 1141, and as gaps necessarily exist between the dustproof lens 1141 and the dustproof slot 1143, dust in the light inlet region 111 is further prevented from entering the light beam channel 121 by arranging annular grooves on the bottom wall and the end cover of the dustproof slot 1143.
Referring to fig. 4, a first access hole 116 communicating with the light inlet region 111 is formed in a side wall of the main light path frame 11, a glass bracket 1161 is fixedly arranged at the first access hole 116 through bolts, the optical glass 115 is fixedly arranged on the glass bracket 1161, a first end cover 1162 is fixedly arranged on the main light path frame 11 through bolts, and the first end cover 1162 is used for closing the first access hole 116 and preventing dust from entering the light inlet region 111; because the optical glass 115 is easy to age, turn yellow and the like after being used for a certain time, the accuracy of monitoring the light beam is seriously affected, and the glass bracket 1161 can be maintained or replaced by opening the first end cover 1162 to detach the glass bracket 1161 from the first access hole 116, so that the practicability is increased.
Referring to fig. 4, a second access hole 117 communicating with the light inlet region 111 is formed in a side wall of the main light path frame 11, a second end cover 1171 is fixed at the second access hole 117 through bolts, the second end cover 1171 is used for closing the second access hole 117, and the optical glass 115 and the dust-proof lens 1141 in the light inlet region 111 can be maintained and cleaned without disassembling the glass bracket 1161 through the arrangement of the second access hole 117.
Referring to fig. 2, in the embodiment of the present application, the beam direction detecting mechanism includes an optical lens fixedly disposed in the beam channel 121, and a PSD optical sensor 22 fixedly disposed on the main body frame 12, wherein a light-sensing position of the PSD optical sensor 22 is provided with a condensing lens, the optical lens adopts a half-mirror 21, and the optical lens is obliquely disposed and is used for reflecting a beam onto the condensing lens at the light-sensing position of the PSD optical sensor 22, and then focusing the beam onto a light-sensing area of the PSD optical sensor 22 through the condensing lens, so as to monitor the beam direction.
In other embodiments, the PSD optical sensor 22 may be replaced with an APD four-quadrant photosensor 3; in the conventional beam monitoring technique, both the PSD optical sensor 22 and the APD four-quadrant photosensor 3 can be used as a beam-pointing monitoring device with relatively high accuracy.
Referring to fig. 2, a maintenance port 122 communicating with the beam passage 121 is opened at a top wall of the main body frame 12, a semi-transparent mirror support 1221 is fixedly provided at the maintenance port 122 through bolts, and an optical lens is fixedly provided on the semi-transparent mirror support 1221, so that maintenance of the optical lens is facilitated by detachably providing the optical lens on the main body frame 12.
Referring to fig. 2 and 5, the beam modulator 4 includes a substrate 41 fixedly disposed on the main body frame 12, and a plurality of lens supports 42 fixedly disposed on the substrate 41, four photosensitive areas are disposed on the substrate 41, the lens supports 42 are in one-to-one correspondence with the photosensitive areas, and a turning lens 43 is fixedly disposed on each lens support 42; the light-sensing position of the APD four-quadrant photoelectric sensor 3 is also provided with a condensing lens, four light-sensing areas on the substrate 41 are respectively corresponding to four quadrants on the APD four-quadrant photoelectric sensor 3 one by one, turning lenses 43 in the light-sensing areas are respectively used for projecting light beams onto the condensing lens at the light-sensing position of the APD four-quadrant photoelectric sensor 3, and then the light beams are respectively focused onto the corresponding quadrants on the APD four-quadrant photoelectric sensor 3 through the condensing lens.
Referring to fig. 5, the turning lenses 43 in the photosensitive areas are all inclined, and the inclination angles of the turning lenses 43 in the photosensitive areas are set according to the pitch of each light spot in four quadrants of the APD four-quadrant photosensor 3.
For the translation of the beam section in the vertical direction, the most intuitive characterization mode is to divide the beam section into four areas, the turning lenses 43 in the four areas modulate the directions of the beam respectively to different directions and focus on four different focuses, the four focuses are respectively projected onto each quadrant on the APD four-quadrant photoelectric sensor 3, when the beam translates in the vertical axis direction, the energy distribution of the beam in the four areas changes in real time and is reflected in the voltage values of the four quadrants, and then the displacement components of the beam in each direction are directly calculated.
According to the voltage value of the light spot output by each quadrant on the APD four-quadrant photoelectric sensor 3, the following two coefficients delta X and delta Y are calculated:
ΔX=[(A+B)-(C+D)]/[(A+B)+(C+D)]
ΔY=[(A+D)-(B+C)]/[(A+D)+(B+C)]
Wherein A, B, C, D is the voltage value output by four quadrants on the APD four-quadrant photoelectric sensor 3, and corresponds to the first quadrant, the second quadrant, the third quadrant and the fourth quadrant on the APD four-quadrant photoelectric sensor 3, and determines the offset direction of the light beam according to the calculated values of Δx and Δy:
When the light beam is not deviated, the voltage values of light spots on each quadrant of the APD four-quadrant photoelectric sensor 3 are the same, and at the moment, the values of delta X and delta Y are 0;
When the light beam is shifted, the voltage value of the light spot on each quadrant of the APD four-quadrant photoelectric sensor 3 changes, and the shift direction of the light beam is determined according to the calculated values of Δx and Δy, specifically, the following determination method is adopted:
when DeltaX is positive, the light spot is deflected to the A, B quadrant side in the transverse direction (X-axis direction);
When Δx is negative, it means that the spot is biased laterally (X-axis direction) to the C, D quadrant side;
When deltay is positive, it means that the spot is deflected to the A, D quadrant side in the longitudinal direction (Y-axis direction);
When Δy is negative, it means that the spot is biased toward the B, C quadrant side in the longitudinal direction (Y-axis direction);
when monitoring the light beam, the light spot shape on each quadrant needs to be ensured to be square, at the moment, the offset and the delta X value are in linear relation, and a specific proportionality coefficient can obtain an accurate value through on-line calibration, so that the specific direction and the offset of the light beam are calculated, and the high-precision monitoring of the position of the light beam is realized.
Referring to fig. 2, the side wall of the main body frame 12 is provided with a mounting opening 123 communicating with the beam passage 121, and the substrate 41 is fixedly arranged at the position of the mounting opening 123 by bolts, so that the substrate 41 is detachably connected with the main body frame 12, thereby facilitating maintenance of the beam modulator 4.
The embodiment of the application provides a comprehensive monitoring device for the position of a light spot of a vertical incident light beam, which is implemented by the following principle: the light beam enters the light inlet region 111 through the light inlet 112, most of the light beam is emitted from the light outlet 113 through the optical glass 115, and a small part of the light beam is reflected through the optical glass 115, passes through the dustproof glass at the connection port 114 and then horizontally enters the light beam channel 121 along the length direction of the main body frame 12, and a part of the light beam entering the light beam channel 121 is reflected to the photosensitive region of the PSD optical sensor 22 through the optical lens, so that the light beam direction is monitored with high precision.
The other part of light beams entering the light beam channel 121 irradiates the four photosensitive areas on the light beam modulator 4 through the optical lens, the light beams are respectively projected onto corresponding quadrants on the APD four-quadrant photoelectric sensor 3 through turning lenses 43 in the photosensitive areas, then the energy intensity of light spots on the four quadrants is respectively monitored through the APD four-quadrant photoelectric sensor 3, and the values of delta X and delta Y calculated according to the voltage values of the light spots on the quadrants are respectively monitored, when the light beams are not deviated, the voltage values of the light spots on the quadrants on the APD four-quadrant photoelectric sensor 3 are the same, and at the moment, the values of delta X and delta Y are both 0; when the light beam is offset, the voltage value of the light spot on each quadrant of the APD four-quadrant photoelectric sensor 3 changes, and the offset direction of the light beam is judged according to the calculated delta X and delta Y values, so that the offset direction and the offset of the light beam are calculated, and the high-precision monitoring of the position of the light beam is realized.
According to the application, the unique beam modulator 4 is arranged to divide the beam into 4 parts, the 4 parts are focused on four quadrants of the APD four-quadrant photoelectric sensor 3 respectively, and the unique measuring and calculating mode is adopted to calculate the offset direction of the beam, so that the high-precision monitoring of the beam position is realized under the condition of ensuring the monitoring precision of the beam direction; the application has the advantages of compact structure, compatibility of accurate monitoring of the direction and the position of the light beam, light and small integrated comprehensive monitoring system, high practicability, wide market prospect and great promotion on the research of a high-precision light stabilizing device.
The embodiment of the application also discloses a monitoring method of the comprehensive monitoring device for the light spot position of the vertical incidence light beam, which comprises the following steps:
s1, light beams are perpendicularly incident into a light inlet area 111 of a shell 1 and reflected into a light beam channel 121 through optical glass 115;
S2, a part of light beams entering the light beam channel 121 are subjected to high-precision monitoring on the direction of the light beams through the light beam direction detection mechanism;
S3, the other part of light beams entering the light beam channel 121 irradiates four photosensitive areas on the light beam modulator 4, the light beams are respectively projected onto corresponding quadrants on the APD four-quadrant photoelectric sensor 3 through turning lenses 43 in the photosensitive areas, and the energy intensity of light spots on the four quadrants is respectively monitored through the APD four-quadrant photoelectric sensor 3;
And S4, when the light beam is not deviated, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor 3 are the same, when the light beam is deviated, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor 3 are changed, and according to the change condition of the voltage values of the light spots on the quadrants, the deviation direction and the deviation amount of the light beam are calculated, so that the high-precision monitoring of the position of the light beam is realized.
Considering the gradual change of the cross section edge of the parallel light beam for monitoring and the influence of the stability of the light source, the light beam has floatability within a reasonable range, and the unfocused light rays are directly received and observed by using an area array CCD/CMOS and a line array CCD/CMOS, so that certain limitations exist. The light sensing devices such as APD which are sensitive to the change rate of input energy are used for being lapped on the edges of the cross section of the light beam, on one hand, the compatible range of the caliber and the size of the measured light beam is extremely limited, and on the other hand, the influence of the gradual change of the edges and the floatability of the edges greatly restricts the feasibility of the monitoring mode.
For parallel light paths, there is usually a correlation between the beam position and the beam direction, especially when the beam direction is not perpendicular to the beam action plane, the optical path is different, and the position of the light spot in the perpendicular direction is also different, but if only the position of the light spot in the action plane is considered, the vertical axis displacement can be effectively monitored and compensated through the tangential relation of the optical path and the included angle under the condition of non-perpendicular incidence.
The dividing mode of the beam cross section area mainly relates to turning lenses 43 of four photosensitive areas on the beam modulator 4, on the basis that the size of the beam cross section is not exceeded, the larger the light spot gaps reflected by the turning lenses 43 of the four photosensitive areas on the beam modulator 4 are, the higher the sensitivity is, when the beam position is monitored, the gaps and the inclination angles of the turning lenses 43 in the four photosensitive areas on the beam modulator 4 are required to be adjusted according to the theoretical range of the measured beam cross section size, and the specific scheme of the equipment is formed by carrying out targeted optimization design.
The above embodiments are not intended to limit the scope of the present application, so: all equivalent changes in structure, shape and principle of the application should be covered in the scope of protection of the application.
Claims (10)
1. The utility model provides a comprehensive monitoring device of normal incidence light beam facula position which characterized in that: comprising the following steps:
the light source comprises a shell (1), wherein a light inlet area (111) is arranged on the shell (1), and a light beam channel (121) is arranged in the shell (1);
An optical glass (115) fixedly arranged in the light inlet region (111) and used for reflecting light beams into a light beam channel (121) in the shell (1);
The beam direction detection mechanism is arranged in the beam channel (121) and is used for detecting the direction of the beam;
The light beam modulator (4) is arranged in the light beam channel (121), four photosensitive areas are arranged on the light beam modulator (4), and turning lenses (43) are arranged in each photosensitive area;
The four photosensitive areas on the beam modulator (4) are in one-to-one correspondence with the four quadrants on the APD four-quadrant photoelectric sensor (3), and turning lenses (43) in the photosensitive areas are respectively used for projecting light beams to the corresponding quadrants on the APD four-quadrant photoelectric sensor (3).
2. The integrated monitoring device for normal incidence beam spot location of claim 1, wherein: according to the voltage value of the light spot output by each quadrant on the APD four-quadrant photoelectric sensor (3), the following two coefficients delta X and delta Y are calculated:
ΔX=[(A+B)-(C+D)]/[(A+B)+(C+D)]
ΔY=[(A+D)-(B+C)]/[(A+D)+(B+C)]
The A, B, C, D is the voltage value output by four quadrants of the APD four-quadrant photoelectric sensor (3), the offset direction of the light beam is judged according to the calculated values of delta X and delta Y, the offset of the light beam and the values of delta X and delta Y are in linear relation, and the offset of the light beam is calculated through on-line calibration according to the values of delta X and delta Y.
3. The integrated monitoring device for normal incidence beam spot location of claim 1, wherein: the casing (1) includes main light path frame (11) and main part frame (12), main light path frame (11) can dismantle with main part frame (12) and be connected, advance optical zone (111) and set up on main light path frame (11), beam channel (121) and beam modulator (4) all set up on main part frame (12), main light path frame (11) are last to have seted up connector (114) with advance optical zone (111) intercommunication, connector (114) are used for docking beam channel (121).
4. A device for integrated monitoring of the location of a normal incident beam spot according to claim 3, wherein: the light beam modulator (4) comprises a substrate (41) fixedly arranged on a main body frame (12) and a plurality of lens supports (42) fixedly arranged on the substrate (41), four photosensitive areas are arranged on the substrate (41), the lens supports (42) are in one-to-one correspondence with the photosensitive areas, the turning lenses (43) are fixed on the lens supports (42) corresponding to the photosensitive areas, and all the turning lenses (43) are obliquely arranged.
5. A device for integrated monitoring of the location of a normal incident beam spot according to claim 3, wherein: the side wall of the main light path frame (11) is provided with a first access hole (116) communicated with the light inlet area (111), the optical glass (115) is arranged at the position of the first access hole (116) and is detachably connected with the main light path frame (11), and the main light path frame (11) is provided with a first end cover (1162) for closing the first access hole (116).
6. The integrated monitoring device for normal incidence beam spot location of claim 5, wherein: a dustproof lens (1141) is fixedly arranged at the connecting port (114).
7. The integrated monitoring device for normal incidence beam spot location of claim 6, wherein: a second overhaul port (117) communicated with the light inlet region (111) is formed in the main light path frame (11), and a second end cover (1171) for closing the second overhaul port (117) is arranged at the second overhaul port (117).
8. A device for integrated monitoring of the location of a normal incident beam spot according to claim 3, wherein: the beam direction detection mechanism comprises an optical lens fixedly arranged in the beam channel (121) and a PSD optical sensor (22) fixedly arranged on the main body frame (12), wherein the optical lens is used for reflecting the beam into a photosensitive area of the PSD optical sensor (22).
9. A method of monitoring an integrated monitoring device based on the normal incidence beam spot position of claim 2, comprising the steps of:
s1, injecting light, namely vertically injecting a light beam into a light inlet area (111) of a shell (1), and reflecting the light beam into a light beam channel (121) through optical glass (115);
s2, monitoring the beam direction, wherein a part of beams entering a beam channel (121) are subjected to high-precision monitoring on the beam direction through a beam direction detection mechanism;
S3, monitoring the position of the light beam, irradiating the other part of the light beam entering the light beam channel (121) into four photosensitive areas on the light beam modulator (4), respectively projecting the light beam onto corresponding quadrants on the APD four-quadrant photoelectric sensor (3) through turning lenses (43) in the photosensitive areas, and respectively monitoring the energy intensity of light spots on the four quadrants through the APD four-quadrant photoelectric sensor (3);
S4, calculating the offset of the light beam, when the light beam is not offset, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor (3) are the same, when the light beam is offset, the voltage values of the light spots on the quadrants of the APD four-quadrant photoelectric sensor (3) are changed, and measuring and calculating the offset direction and the offset of the light beam according to the change condition of the voltage values of the light spots on the quadrants.
10. The method for monitoring the position of a spot of a normal incident beam according to claim 9, wherein: the dividing mode of the beam cross section area mainly relates to turning lenses (43) of four photosensitive areas on a beam modulator (4), on the basis that the size of the beam cross section is not exceeded, the larger the light spot gaps reflected by the turning lenses (43) of the four photosensitive areas on the beam modulator (4) are, the higher the sensitivity is, and when the position of the beam is monitored, the gaps and the inclination angles of the turning lenses (43) of the four photosensitive areas on the beam modulator (4) are required to be adjusted according to the theoretical range of the measured beam cross section size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410133007.4A CN118092080A (en) | 2024-01-30 | 2024-01-30 | Comprehensive monitoring device and monitoring method for light spot position of vertical incidence light beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410133007.4A CN118092080A (en) | 2024-01-30 | 2024-01-30 | Comprehensive monitoring device and monitoring method for light spot position of vertical incidence light beam |
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| Publication Number | Publication Date |
|---|---|
| CN118092080A true CN118092080A (en) | 2024-05-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202410133007.4A Pending CN118092080A (en) | 2024-01-30 | 2024-01-30 | Comprehensive monitoring device and monitoring method for light spot position of vertical incidence light beam |
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| Country | Link |
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| CN (1) | CN118092080A (en) |
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- 2024-01-30 CN CN202410133007.4A patent/CN118092080A/en active Pending
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