CN117555122A - Micro-shadow imaging projection lens - Google Patents

Micro-shadow imaging projection lens Download PDF

Info

Publication number
CN117555122A
CN117555122A CN202210926988.9A CN202210926988A CN117555122A CN 117555122 A CN117555122 A CN 117555122A CN 202210926988 A CN202210926988 A CN 202210926988A CN 117555122 A CN117555122 A CN 117555122A
Authority
CN
China
Prior art keywords
lens
positive
negative
focal length
object side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210926988.9A
Other languages
Chinese (zh)
Inventor
吴昇澈
周昱宏
林宜桦
苏元宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Yang Optics Development Co ltd
Original Assignee
Sun Yang Optics Development Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Yang Optics Development Co ltd filed Critical Sun Yang Optics Development Co ltd
Priority to CN202210926988.9A priority Critical patent/CN117555122A/en
Publication of CN117555122A publication Critical patent/CN117555122A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)

Abstract

A projection lens for microlithography imaging is suitable for a unit magnification lens system for imaging photoresistive features, and comprises a plurality of lens elements and a diaphragm arranged therein, wherein the diaphragm is arranged along an optical axis and comprises an image side and an object side which are respectively arranged at the front end and the rear end of the plurality of lens elements; wherein: two lenses respectively close to the object side and the image side have positive refraction and brightness; each lens element is a single lens without bonding; the included angle between the chief rays at different image height positions and the optical axis is less than 1 degree, and the included angle between the chief rays at different object height positions and the optical axis is less than 1 degree; and under the projection of light rays with the wavelength of 350-450nm, the imaging effect with accurate magnification is provided.

Description

Micro-shadow imaging projection lens
Technical Field
The present invention relates to a projection lens, and more particularly, to a lithographic projection lens for imaging a substrate with unit magnification and high resolution.
Background
A photolithography process is an important step in the fabrication of semiconductor devices, which uses exposure and development to pattern geometric structures on a photoresist layer, and then transfers the pattern on the mask to a substrate by an etching process; in other words, the photolithography process is a process of "transferring" a circuit pattern onto a wafer through a mask and a photoresist. Therefore, the photolithography process requires very precise control of the shape and size of the image.
A photolithography process for manufacturing a semiconductor device or the like, generally, uses a projection exposure apparatus to expose a pattern of a mask and image the pattern onto a wafer (or a glass plate or the like) coated with a photoresist; with the increase of the integration degree of semiconductor devices, it is more necessary for the projection lens in the projection exposure apparatus to have functions of unit magnification and high resolution.
Disclosure of Invention
The primary objective of the present invention is to provide a lithographic projection lens that can image a maskless device, such as a digital micro-reflector (DMD) with Texas Instruments (TI), onto a substrate at unit magnification and high resolution.
Another object of the present invention is to provide a lithographic projection lens with a long working distance between substrates, which helps to control image aberrations and reduce manufacturing costs.
In order to achieve the above-mentioned objective, the present invention provides a projection lens for microlithography, which is suitable for a unit magnification lens system for photoresist feature imaging, and comprises a plurality of lens elements and a diaphragm disposed therein, wherein the lens elements are arranged along an optical axis and include an object side and an image side, and the object side and the image side are disposed at the front and rear ends of the plurality of lens elements respectively; wherein: two lenses respectively close to the object side and the image side have positive refraction and brightness; each lens element is a single lens without bonding; the included angle between the chief rays at different image height positions and the optical axis is less than 1 degree, and the included angle between the chief rays at different object height positions and the optical axis is less than 1 degree; and under the projection of light rays with the wavelength of 350-450nm, the imaging effect with accurate magnification is provided.
The above-mentioned "diaphragm" component refers to a rectangular or circular light-transmitting hole in the optical system, which can limit the light beam; generally used to control the intensity of light, reduce aberrations, and increase depth of focus; the smaller the stop, the smaller the aberration, the greater the depth of field, the sharper the image, but the less bright the brightness. Also, "single lens without bonding" refers to a lens in which the lenses are all single lenses and the bonding of plural lenses is not performed by using an adhesive; as such, the cemented lens mainly acts to reduce chromatic aberration and aberrations in other optical systems.
According to a feature of the present invention, at least one of the first lens near the object side and the first lens near the image side is a non-biconvex lens.
According to the features disclosed above, the present invention further includes a prism disposed in front of the object side, and the negative lenses in front of and behind the diaphragm are required to satisfy Abbe number of 30< Vd <50, and all lens elements are required to satisfy refractive index of 1.45< Nd <1.75, and have a numerical aperture of 0.08-0.21.
According to the features disclosed above, the lens elements of the present invention are 10, the brightness of the image is positive, negative, positive and positive from the image side to the object side, the diaphragm is arranged between the fifth lens and the sixth lens, the first to fifth lenses have an overall focal length of 35-50 mm, and the sixth to tenth lenses have an overall focal length of 67-140 mm, thereby producing lenses with focal lengths of >1000mm and magnification of 0.25-0.75X.
According to the features disclosed above, the number of the lens elements is 12, the refractive powers thereof are positive, negative, positive, negative, positive in order from the image side to the object side, the diaphragm is disposed between the sixth lens element and the seventh lens element, the lens elements in front of and behind the diaphragm are symmetrical to each other, the overall focal length of the first to sixth lenses is 140-165 mm, the overall focal length of the seventh to twelfth lenses is 72-82 mm, and accordingly, a lens with focal length >1000mm and magnification of 1.7-2.3X is produced.
According to the features disclosed above, the lens elements of the present invention are 13, the brightness of the image is positive, negative, positive, the diaphragm is arranged between the eleventh lens and the twelfth lens, the first to eleventh lenses have an overall focal length of 186-210 mm, and the twelfth to thirteenth lenses have an overall focal length of 78-85 mm, so as to generate lenses with focal lengths of >1000mm and magnification of 2.2-2.7X.
According to the aforementioned features, the present invention further comprises a prism disposed in front of the object side, wherein the refractive index value of 1.45< Nd <1.75, and the numerical aperture of 0.08-0.21 are satisfied for all the lens elements, and accordingly produces a lens with a focal length of >1000mm, and 13 of the lens elements, the brightness is positive, negative, positive, negative, positive and negative, and positive, and negative positive, negative, positive.
According to the aforementioned features, the present invention further comprises a prism disposed in front of the object side, wherein the refractive index value of 1.45< Nd <1.75, and the numerical aperture of 0.08-0.21 are satisfied for all the lens elements, and accordingly produces a lens with a focal length of >500mm, and 13 of the lens elements, the brightness of the light is positive, negative, positive, negative, positive negative, positive, and positive.
The invention has the technical effects that when the included angle between the principal ray of the object and the image end and the optical axis is smaller than 1 degree, the object and the image end can be satisfied, the lens has good aberration, high resolution and large depth of field, the image distance can keep a considerable amplification ratio in a certain range, the light with the wavelength between 350 and 450nm has good transmissivity, and the durability of the lens can be improved without a glued lens.
Drawings
Fig. 1 is a view showing a lens structure according to a first embodiment of the present invention.
Fig. 2 is a lens structure diagram of a second embodiment of the present invention.
Fig. 3 is a lens structure diagram of a third embodiment of the present invention.
Fig. 4 is a lens structure diagram of a fourth embodiment of the present invention.
Fig. 5 is a lens structure diagram of a fifth embodiment of the present invention.
Reference numerals illustrate: 100-projection lens of first embodiment; 200-a projection lens of a second embodiment; 300-projection lens of the third embodiment; 400-projection lens of fourth embodiment; 500-a projection lens of a fifth embodiment; CG-glass cover plate; g1-a first lens; g2—a second lens; g3—a third lens; g4—fourth lens; g5—fifth lens; g6—sixth lens; g7-seventh lens; g8-eighth lens; g9—eighth lens; g10—tenth lens; g11—eleventh lens; g12—twelfth lens; g13-thirteenth lens; IS-image side; LA-optical axis; OS-object side; stop-diaphragm; TIR-total reflection prism.
Detailed Description
Referring first to fig. 1, a lithographic projection lens 100 according to a first embodiment of the present invention comprises: an image side IS and an object side OS, between which 10 lenses are arranged along an optical axis LA, and the 10 lenses are, in order from the image side IS, a first lens G1 having positive refractive power, a second lens G2 having positive refractive power, a third lens G3 having positive refractive power, a fourth lens G4 having positive refractive power, a fifth lens G5 having negative refractive power, a sixth lens G6 having negative refractive power, a seventh lens G7 having negative refractive power, an eighth lens G8 having positive refractive power, a ninth lens G9 having positive refractive power, and a tenth lens G10 having positive refractive power; a total reflection prism TIR and a glass cover plate CG arranged between the tenth lens G10 and the object side OS, a diaphragm Stop arranged between the fifth lens G5 and the sixth lens G6, wherein the fifth lens G5 and the sixth lens G6 are negative refractive lenses with Abbe numbers of 36.4 and 36.4 respectively, so as to meet the requirement of 30< Vd < 50; the refractive index of the first lens G1-tenth lens G10 is between 1.49-1.73, so that the numerical condition of 1.45< Nd <1.75 is satisfied, and the numerical aperture is between 0.08-0.21; in the present invention, parameter values such as Radius of curvature (Radius), thickness (Thickness), refractive index (Nd), abbe number (Vd) of each mirror are recorded in the fields of table 1, in the present invention, the included angle between the principal ray at different Image height positions and the optical axis is <1 degree, and the included angle between the principal ray at different object height positions and the optical axis is <1 degree, in the present embodiment, the values of the Image side principal ray angle CRA and the object side principal ray angle ObjectCRA generated by different Image heights IH are recorded in the fields of table 2, respectively; furthermore, the overall focal length of the first lens G1 to the fifth lens G5 is 38.2mm, and the overall focal length of the sixth lens G6 to the tenth lens G10 is 76.6mm; therefore, the embodiment can generate the projection effect that the focal length of the lens is 4045.8mm and the magnification reaches 0.498X under the projection of the light with the wavelength of 350-450 nm.
TABLE 1
IH(mm) Object CRA (degree) Image CRA (degree)
0 0 0
0.8 0.010 0.010
1.6 0.010 0.020
2.4 0.020 0.020
3.2 0.020 0.030
4 0.020 0.040
4.8 0.030 0.040
5.6 0.030 0.050
6.4 0.030 0.050
7.2 0.030 0.050
8 0.030 0.050
8.76 0.030 0.050
TABLE 2
Fig. 2 shows a lithographic projection lens 200 according to a second embodiment of the invention, comprising: the image side IS and the object side OS are provided with 12 lenses arranged along an optical axis LA, and the 12 lenses are a first lens G1 with positive refractive power, a second lens G2 with positive refractive power, a third lens G3 with negative refractive power, a fourth lens G4 with positive refractive power, a fifth lens G5 with positive refractive power, a sixth lens G6 with negative refractive power, a seventh lens G7 with negative refractive power, an eighth lens G8 with positive refractive power, a ninth lens G9 with negative refractive power, a tenth lens G10 with positive refractive power, an eleventh lens G11 with positive refractive power, and a twelfth lens G12 with positive refractive power in order from the image side IS; a glass cover plate CG arranged between the twelfth lens G12 and the object side OS, a diaphragm Stop arranged between the sixth lens G6 and the seventh lens G7, wherein the sixth lens G6 and the seventh lens G7 are lenses with negative refraction brightness, and Abbe numbers are 36.2 and 36.2 respectively, so that the requirements of 30< Vd <50 are satisfied; the refractive index of the first lens G1-the twelfth lens G12 is between 1.48 and 1.72, so that the numerical condition of 1.45< Nd <1.75 is satisfied, and the numerical aperture is between 0.08 and 0.21; in the present invention, parameter values such as Radius of curvature (Radius), thickness (Thickness), refractive index (Nd), abbe number (Vd) of each mirror are recorded in the fields of table 3, in the present invention, the included angle between the chief ray at different Image height positions and the optical axis is <1 degree, and the included angle between the chief ray at different Object height positions and the optical axis is <1 degree, in the present embodiment, the values of the Image side chief ray CRA and the Object side chief ray CRA generated by different Image heights IH are recorded in the fields of table 4, respectively; furthermore, the first lens G1 to the sixth lens G6 have an overall focal length of 142.8mm, and the seventh lens G7 to the twelfth lens G12 have an overall focal length of 73.2mm; therefore, the embodiment can generate the projection effect that the focal length of the lens is 7498.1mm and the magnification reaches 1.95X under the projection of the light with the wavelength of 350-450 nm.
TABLE 3 Table 3
IH(mm) Image CRA (degree) Object CRA (degree)
0 0 0
1 0.001 0.000
2 0.003 0.001
3 0.005 0.002
4 0.007 0.004
5 0.012 0.007
6 0.017 0.011
7 0.024 0.017
8 0.034 0.026
9 0.046 0.036
10 0.060 0.049
11 0.078 0.066
12 0.100 0.086
12.65 0.116 0.100
TABLE 4 Table 4
Fig. 3 shows a lithographic projection lens 300 according to a third embodiment of the invention, comprising: the image side IS and the object side OS are provided with 13 lenses arranged along an optical axis LA, and the 13 lenses are a first lens G1 with positive refractive power, a second lens G2 with positive refractive power, a third lens G3 with positive refractive power, a fourth lens G4 with negative refractive power, a fifth lens G5 with negative refractive power, a sixth lens G6 with negative refractive power, a seventh lens G7 with positive refractive power, an eighth lens G8 with positive refractive power, a ninth lens G9 with negative refractive power, a tenth lens G10 with positive refractive power, an eleventh lens G11 with positive refractive power, a twelfth lens G12 with positive refractive power, and a thirteenth lens G13 with positive refractive power in order from the image side IS; a Prism and a glass cover plate CG, which are arranged between the thirteenth lens G13 and the object side OS, a diaphragm Stop is arranged between the eleventh lens G11 and the twelfth lens G12, and the refractive index of the first lens G1-thirteenth lens G13 is between 1.46-1.62, so that the numerical condition of 1.45< Nd <1.75 is satisfied, and the numerical aperture is between 0.08-0.21; in the present invention, parameter values such as Radius of curvature (Radius), thickness (Thickness), refractive index (Nd), abbe number (Vd) of each mirror are recorded in the fields of table 5, in the present invention, the included angle between the chief ray at different Image height positions and the optical axis is <1 degree, and the included angle between the chief ray at different Object height positions and the optical axis is <1 degree, in the present embodiment, the values of the Image side chief ray CRA and the Object side chief ray CRA generated by different Image heights IH are recorded in the fields of table 6, respectively; furthermore, the first lens G1 to the eleventh lens G11 have an overall focal length of 202.8mm, and the twelfth lens G12 to the thirteenth lens G13 have an overall focal length of 82.8mm; therefore, the embodiment can generate the projection effect that the focal length of the lens is 1327mm and the magnification reaches 2.52X under the projection of the light with the wavelength of 350-450 nm.
Radius Thickness Nd Vd
G1 -159.82 7.17 1.62 36.36
-100.8 117.81
G2 133.82 12.13 1.62 36.36
-206.1 0.24
G3 42.71 11.37 1.62 36.36
78.213 12.85
G4 122.64 6.00 1.62 36.36
24.053 13.05
G5 -59.863 6.00 1.62 36.36
267.54 5.90
G6 -24.713 5.51 1.62 36.36
-147.98 1.44
G7 -76.888 8.23 1.50 75.54
-32.344 0.20
G8 178.56 8.39 1.50 81.60
-68.825 0.40
G9 54.186 8.21 1.50 81.59
-766.1 4.13
G10 724.26 2.50 1.62 36.36
48.695 3.82
G11 133.09 6.35 1.50 81.60
-120.08 0.20
Stop Inf. 76.89
G12 Inf. 6.54 1.62 36.36
-137.46 0.20
G13 114.63 7.97 1.62 36.36
-369.75 31.74
Prism Inf. 42.50 1.46 67.83
Inf. 0.00
CG Inf. 3.00 1.49 70.42
Inf. 0.50
TABLE 5
TABLE 6
Fig. 4 shows a lithographic projection lens 400 according to a fourth embodiment of the invention, comprising: the image side IS and the object side OS are provided with 13 lenses arranged along an optical axis LA, and the 13 lenses are a first lens G1 with positive refractive power, a second lens G2 with positive refractive power, a third lens G3 with negative refractive power, a fourth lens G4 with positive refractive power, a fifth lens G5 with positive refractive power, a sixth lens G6 with positive refractive power, a seventh lens G7 with negative refractive power, an eighth lens G8 with negative refractive power, a ninth lens G9 with positive refractive power, a tenth lens G10 with positive refractive power, an eleventh lens G11 with negative refractive power, a twelfth lens G12 with positive refractive power, and a thirteenth lens G13 with positive refractive power in order from the image side IS; a Prism and a glass cover plate CG, which are arranged between the thirteenth lens G13 and the object side OS, a diaphragm Stop is arranged between the seventh lens G7 and the eighth lens G8, and the refractive index of the first lens G1-thirteenth lens G13 is between 1.46-1.62, so that the numerical condition of 1.45< Nd <1.75 is satisfied, and the numerical aperture is between 0.08-0.21; in the present invention, parameter values such as Radius of curvature (Radius), thickness (Thickness), refractive index (Nd), abbe number (Vd) of each mirror are recorded in the fields of table 7, in the present invention, the included angle between the chief ray at different Image height positions and the optical axis is <1 degree, and the included angle between the chief ray at different Object height positions and the optical axis is <1 degree, in the present embodiment, the values of the Image side chief ray CRA and the Object side chief ray CRA generated by different Image heights IH are recorded in the fields of table 8, respectively; furthermore, the first lens G1 to the seventh lens G7 have an overall focal length of 145.47mm, and the eighth lens G8 to the thirteenth lens G13 have an overall focal length of 51.5mm; therefore, the embodiment can generate the projection effect that the focal length of the lens is 1011mm and the magnification reaches 2.52X under the projection of the light with the wavelength of 350-450 nm.
Radius Thickness Nd Vd
G1 -3063.851 11.57 1.52 64.1
-115.42 1.00
G2 78.86 12.64 1.52 64.1
367.06 66.91
G3 -105.24 8.00 1.51 65.5
28.70 4.55
G4 -216.14 7.85 1.50 81.4
-69.34 0.20
G5 173.22 5.04 1.52 64.1
-173.22 0.20
G6 31.87 8.00 1.52 64.1
43.97 1.51
G7 Inf. 2.00 1.62 36.4
42.22 1.78
Stop Inf. 2.96
G8 -24.17 8.00 1.62 36.4
-58.72 1.01
G9 -46.80 8.00 1.50 81.6
-31.07 0.20
G10 115.17 10.37 1.50 81.6
-59.46 33.03
G11 418.09 2.00 1.52 64.1
73.00 5.83
G12 165.69 11.71 1.50 81.6
-80.58 0.98
G13 53.90 10.64 1.50 81.6
204.65 45.68
Prism Inf. 42.50 1.46 67.8
Inf. 0.01
CG Inf. 3.00 1.49 70.4
Inf. 0.49
TABLE 7
TABLE 8
Fig. 5 shows a lithographic projection lens 500 according to a fifth embodiment of the invention, comprising: the image side IS and the object side OS are provided with 13 lenses arranged along an optical axis LA, and the 13 lenses are a first lens G1 with positive refractive power, a second lens G2 with positive refractive power, a third lens G3 with positive refractive power, a fourth lens G4 with negative refractive power, a fifth lens G5 with negative refractive power, a sixth lens G6 with positive refractive power, a seventh lens G7 with positive refractive power, an eighth lens G8 with negative refractive power, a ninth lens G9 with positive refractive power, a tenth lens G10 with positive refractive power, an eleventh lens G11 with negative refractive power, a twelfth lens G12 with positive refractive power, and a thirteenth lens G13 with positive refractive power in order from the image side IS; a Prism and a glass cover plate CG, which are arranged between the thirteenth lens G13 and the object side OS, a diaphragm Stop is arranged between the seventh lens G7 and the eighth lens G8, and the refractive index of the first lens G1-thirteenth lens G13 is between 1.46-1.62, so that the numerical condition of 1.45< Nd <1.75 is satisfied, and the numerical aperture is between 0.08-0.21; in the present invention, parameter values such as Radius of curvature (Radius), thickness (Thickness), refractive index (Nd), abbe number (Vd) of each mirror are recorded in the fields of table 9, in the present invention, the included angle between the chief ray at different Image height positions and the optical axis is <1 degree, and the included angle between the chief ray at different Object height positions and the optical axis is <1 degree, in the present embodiment, the values of the Image side chief ray CRA and the Object side chief ray CRA generated by different Image heights IH are recorded in the fields of table 10, respectively; furthermore, the first lens G1 to the seventh lens G7 have an overall focal length of 168.3mm, and the eighth lens G8 to the thirteenth lens G13 have an overall focal length of 71mm; therefore, the embodiment can generate the projection effect that the focal length of the lens is 739mm and the magnification reaches 2.52X under the projection of the light with the wavelength of 350-450 nm.
TABLE 9
IH(mm) Image CRA (degree) Object CRA (degree)
0 0 0
1 0.016 0.070
2 0.032 0.138
3 0.046 0.198
4 0.058 0.250
5 0.066 0.286
6 0.071 0.305
7 0.070 0.302
8 0.064 0.271
9 0.051 0.207
10 0.028 0.096
11 0.003 0.063
12 0.046 0.288
12.6 0.077 0.458
Table 10
The drawings and descriptions disclosed above are merely preferred embodiments of the invention, and modifications and equivalent variations within the spirit and scope of the invention will be apparent to those skilled in the art.

Claims (10)

1. A kind of projection lens of the micro-shadow imaging, have multiple lens components and a diaphragm placed in it, arrange along an optical axis, and include a thing side and an image side, locate at the front, back both ends of the multiple lens components separately; the method is characterized in that:
two lenses respectively close to the object side and the image side have positive refraction and brightness;
each lens element is a single lens without bonding;
the included angle between the chief rays at different image height positions and the optical axis is less than 1 degree, and the included angle between the chief rays at different object height positions and the optical axis is less than 1 degree; and
under the projection of light rays with the wavelength of 350-450nm, the imaging effect with accurate magnification is provided.
2. The lithographic projection lens of claim 1 wherein at least one of the first lens near the object side and the first lens near the image side is a non-biconvex lens.
3. The projection lens of claim 2, further comprising a prism disposed in front of the object side, wherein the negative lenses in front of and behind the diaphragm satisfy Abbe number values of 30< Vd <50, and all lens elements satisfy refractive index values of 1.45< Nd <1.75, and the numerical aperture is between 0.08 and 0.21.
4. The lithographic projection lens of claim 3 wherein the number of lens elements is 10, the brightness of the lens is positive, negative, positive, negative, positive positive, negative, positive, the diaphragm is arranged between the fifth lens and the sixth lens, the overall focal length of the first lens to the fifth lens is between 35 mm and 50mm, the overall focal length of the sixth lens to the tenth lens is between 67 mm and 140mm, and accordingly, a lens with focal length of >1000mm and magnification of 0.25-0.75X is produced.
5. The lithographic projection lens of claim 3 wherein the number of lens elements is 12, the refraction brightness is positive, negative, positive from the image side to the object side, the diaphragm is arranged between the sixth lens and the seventh lens, the front lens element and the rear lens element of the diaphragm are mutually symmetrical, the overall focal length of the first lens element to the sixth lens element is 140-165 mm, the overall focal length of the seventh lens element to the twelfth lens element is 72-82 mm, and accordingly, the lens with focal length of more than 1000mm and magnification of 1.7-2.3X is produced.
6. The lithographic projection lens of claim 3 wherein the number of lens elements is 13, the brightness of the light is positive, negative, positive, negative, positive negative, positive, the diaphragm is arranged between the eleventh lens and the twelfth lens, the overall focal length of the first lens to the eleventh lens is 186-210 mm, the overall focal length of the twelfth lens to the thirteenth lens is 78-85 mm, and accordingly, the lens with focal length of >1000mm and magnification of 2.2-2.7X is generated.
7. The projection lens of claim 1, further comprising a prism disposed in front of the object side, wherein all lens elements satisfy refractive index values of 1.45< nd <1.75, and a numerical aperture of 0.08-0.21, thereby producing a lens with a focal length >1000 mm.
8. The projection lens of claim 1, further comprising a prism disposed in front of the object side, wherein all lens elements satisfy refractive index values of 1.45< nd <1.75, and a numerical aperture of 0.08-0.21, thereby producing a lens with a focal length >500 mm.
9. The lithographic projection lens of claim 7 wherein there are 13 lens elements, the brightness of the lens is positive from the image side to the object side positive, negative, and positive, positive negative part.
10. The lithographic projection lens of claim 8 wherein there are 13 lens elements, the brightness of the lens is positive from the image side to the object side positive, positive negative, positive, and positive.
CN202210926988.9A 2022-08-03 2022-08-03 Micro-shadow imaging projection lens Pending CN117555122A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210926988.9A CN117555122A (en) 2022-08-03 2022-08-03 Micro-shadow imaging projection lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210926988.9A CN117555122A (en) 2022-08-03 2022-08-03 Micro-shadow imaging projection lens

Publications (1)

Publication Number Publication Date
CN117555122A true CN117555122A (en) 2024-02-13

Family

ID=89819123

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210926988.9A Pending CN117555122A (en) 2022-08-03 2022-08-03 Micro-shadow imaging projection lens

Country Status (1)

Country Link
CN (1) CN117555122A (en)

Similar Documents

Publication Publication Date Title
US6259508B1 (en) Projection optical system and exposure apparatus and method
KR100866818B1 (en) Projection optical system and exposure apparatus comprising the same
JP3819048B2 (en) Projection optical system, exposure apparatus including the same, and exposure method
US6333781B1 (en) Projection optical system and exposure apparatus and method
KR20010051115A (en) Optical projection lens system
JP2008519433A (en) Apochromatic equal magnification projection optical system
JP4779394B2 (en) Projection optical system, exposure apparatus, and exposure method
JP2004022708A (en) Imaging optical system, illumination optical system, aligner and method for exposure
JPWO2007086220A1 (en) Catadioptric imaging optical system, exposure apparatus, and device manufacturing method
TW536735B (en) Optical condenser system, optical illumination system provided with the same, and exposure system
WO2002103431A1 (en) Catadioptric system and exposure system provided with the system
JP2005003982A (en) Projection optical system, and device and method of exposure
CN109375480B (en) Photoetching projection objective and photoetching machine
CN117555122A (en) Micro-shadow imaging projection lens
CN112526833B (en) Projection imaging system for maskless lithography
TW588223B (en) Projection optical system and exposure device
JP2002244035A (en) Projection optical system and exposure device provided with it
JP2005115127A (en) Catadioptric projection optical system, exposure device and exposing method
TWI820836B (en) Lithography projection lens
CN110764224B (en) Photoetching projection objective lens
US6700645B1 (en) Projection optical system and exposure apparatus and method
JP4868209B2 (en) Projection optical system, exposure apparatus, and exposure method
US20240085667A1 (en) Photolithography projection lens
EP0581585A1 (en) Catadioptric reduction projection optical system
CN217467464U (en) Optical engine system

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication