CN110764224B - Photoetching projection objective lens - Google Patents
Photoetching projection objective lens Download PDFInfo
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- CN110764224B CN110764224B CN201810846020.9A CN201810846020A CN110764224B CN 110764224 B CN110764224 B CN 110764224B CN 201810846020 A CN201810846020 A CN 201810846020A CN 110764224 B CN110764224 B CN 110764224B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Abstract
The embodiment of the invention provides a photoetching projection objective which comprises a first lens group, a second lens group, a diaphragm, a third lens group and a fourth lens group which are sequentially arranged along an optical axis, wherein the plane where the diaphragm is located is a diaphragm surface, the first lens group and the fourth lens group are symmetrical relative to the diaphragm surface, and the second lens group and the third lens group are symmetrical relative to the diaphragm surface; the first lens group and the fourth lens group have positive optical power, and the second lens group and the third lens group have negative optical power; the first lens group and the fourth lens group each include two biconcave negative lenses, two biconvex positive lenses and one meniscus positive lens, and the second lens group and the third lens group each include two meniscus negative lenses, one biconcave negative lens and one biconvex positive lens. The embodiment of the invention provides a photoetching projection objective, which increases the field size of a projection exposure device and improves the yield.
Description
Technical Field
The embodiment of the invention relates to the lithography technology, in particular to a lithography projection objective.
Background
Optical lithography is a technique in which a mask pattern is reproduced by projection with light. Integrated circuits are produced by projection exposure apparatuses. By means of projection exposure apparatus, patterns with different mask patterns are imaged onto a substrate, such as a silicon wafer or an LCD panel, for the manufacture of integrated circuits, thin film magnetic heads, liquid crystal display panels, or a range of structures for micro-electro-mechanical systems (MEMS). The technological level of exposure equipment is continuously developed in the past decades, and the requirements of smaller line size, larger exposure area, higher reliability and yield and lower cost are met.
The existing photoetching projection objective lens has a relatively small field of view, and the problem needs to be solved urgently.
Disclosure of Invention
The embodiment of the invention provides a photoetching projection objective, which increases the field size of a projection exposure device and improves the yield.
The embodiment of the invention provides a photoetching projection objective which comprises a first lens group, a second lens group, a diaphragm, a third lens group and a fourth lens group which are sequentially arranged along an optical axis, wherein the plane where the diaphragm is located is a diaphragm surface, the first lens group and the fourth lens group are symmetrical relative to the diaphragm surface, and the second lens group and the third lens group are symmetrical relative to the diaphragm surface; the first lens group and the fourth lens group have positive optical power, and the second lens group and the third lens group have negative optical power;
the first lens group and the fourth lens group each include two biconcave negative lenses, two biconvex positive lenses and one meniscus positive lens, and the second lens group and the third lens group each include two meniscus negative lenses, one biconcave negative lens and one biconvex positive lens.
Optionally, all lenses in the lithographic projection objective are spherical lenses.
Optionally, the first lens group includes a first lens, a second lens, a third lens, a fourth lens and a fifth lens arranged in sequence along an optical axis, the first lens and the second lens are biconcave negative lenses, the third lens is a meniscus positive lens, and the fourth lens and the fifth lens are biconvex positive lenses;
the fourth lens group comprises a fourteenth lens, a fifteenth lens, a sixteenth lens, a seventeenth lens and an eighteenth lens which are sequentially arranged along an optical axis, wherein the fourteenth lens and the fifteenth lens are double convex positive lenses, the sixteenth lens is a meniscus positive lens, and the seventeenth lens and the eighteenth lens are double concave negative lenses;
the concave surfaces of the third lens and the sixteenth lens are deviated from the diaphragm surface.
Optionally, the second lens group includes a sixth lens, a seventh lens, an eighth lens and a ninth lens, which are arranged in sequence along the optical axis, the sixth lens and the seventh lens are meniscus negative lenses, the eighth lens is a biconcave negative lens, and the ninth lens is a biconvex positive lens;
the third lens group comprises a tenth lens, an eleventh lens, a twelfth lens and a thirteenth lens which are sequentially arranged along an optical axis, wherein the tenth lens is a double convex positive lens, the eleventh lens is a double concave negative lens, and the twelfth lens and the thirteenth lens are meniscus negative lenses;
the concave surfaces of the sixth lens and the thirteenth lens face the diaphragm surface, and the concave surfaces of the seventh lens and the twelfth lens face away from the diaphragm surface.
Optionally, the surface of the lens on the side away from the diaphragm surface is a front surface, and the surface of the lens on the side close to the diaphragm surface is a rear surface;
at least one meniscus lens exists in the second lens group and the third lens group respectively, and the conditions are as follows: rL-(RS+CT)≥10％*RS，RL＞RS；
Wherein R isLIs the absolute value of the radius of curvature of the front surface of the lens, RSIs the absolute value of the radius of curvature of the rear surface of the lens and CT is the thickness of the lens.
Optionally, the lithographic projection objective further comprises a first plate and a second plate that are plane-symmetric with respect to the diaphragm;
the first flat plate is located on one side, far away from the diaphragm surface, of the first lens group, and the second flat plate is located on one side, far away from the diaphragm surface, of the fourth lens group.
Optionally, the first lens group includes a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens, which are sequentially arranged along an optical axis, the second lens and the third lens are biconcave negative lenses, the fourth lens and the fifth lens are biconvex positive lenses, and the sixth lens is a meniscus positive lens;
the fourth lens group comprises a fifteenth lens, a sixteenth lens, a seventeenth lens, an eighteenth lens and a nineteenth lens which are sequentially arranged along an optical axis, wherein the fifteenth lens is a meniscus positive lens, the sixteenth lens and the seventeenth lens are double-convex positive lenses, and the eighteenth lens and the nineteenth lens are double-concave negative lenses;
the concave surfaces of the sixth lens and the fifteenth lens face the diaphragm surface.
Optionally, the second lens group includes a seventh lens, an eighth lens, a ninth lens and a tenth lens arranged in sequence along the optical axis, the seventh lens and the eighth lens are meniscus negative lenses, the ninth lens is a biconcave negative lens, and the tenth lens is a biconvex positive lens;
the third lens group comprises an eleventh lens, a twelfth lens, a thirteenth lens and a fourteenth lens which are sequentially arranged along an optical axis, wherein the eleventh lens is a double convex positive lens, the twelfth lens is a double concave negative lens, and the thirteenth lens and the fourteenth lens are meniscus negative lenses;
the concave surfaces of the seventh lens and the fourteenth lens face the diaphragm surface, and the concave surfaces of the eighth lens and the thirteenth lens face away from the diaphragm surface.
Optionally, at least one of the five lenses of the first lens group is made of a calcium fluoride material, at least one of the five lenses of the first lens group is made of a flint glass material, and the lens made of the flint glass material has positive focal power.
Optionally, at least one of the four lenses of the second lens group is made of crown glass material, at least one of the four lenses of the second lens group is made of flint glass material, the lenses made of crown glass material have positive power, and the lenses made of flint glass material have negative power.
The embodiment of the invention provides a photoetching projection objective, wherein light emitted by a light source irradiates a mask plate, a pattern on the mask plate is projected onto a workpiece through the photoetching projection objective, and photoresist coated on the workpiece is exposed. The photoetching projection objective comprises a first lens group and a fourth lens group which are symmetrically arranged about a diaphragm surface, and a second lens group and a third lens group which are symmetrically arranged about the diaphragm surface, and the symmetrical arrangement can compensate asymmetric phase difference in a field and improve the imaging quality. The first lens group includes two biconcave negative lenses, two biconvex positive lenses, and one meniscus positive lens. The second lens group includes two meniscus negative lenses, a biconcave negative lens, and a biconvex positive lens. Since the third lens group is symmetrical to the second lens group with respect to the stop surface, the third lens group also includes two meniscus negative lenses, one biconcave negative lens, and one biconvex positive lens. Since the fourth lens group is symmetrical to the first lens group with respect to the stop surface, the fourth lens group also includes two biconcave negative lenses, two biconvex positive lenses, and one meniscus positive lens. The combination of the first lens group, the second lens group, the third lens group and the fourth lens group increases the view field size of the projection exposure device and improves the productivity.
Drawings
Fig. 1 is a schematic structural diagram of a lithographic projection objective according to an embodiment of the present invention;
FIG. 2 is a wave aberration diagram of the lithographic projection objective shown in FIG. 1;
FIG. 3 is a diagram of the optical transfer function of the lithographic projection objective shown in FIG. 1 at fields of view of 250 cl/mm;
FIG. 4 is a plot of field curvature, astigmatism, of the lithographic projection objective shown in FIG. 1;
FIG. 5 is a distortion diagram of the lithographic projection objective shown in FIG. 1;
FIG. 6 is a schematic structural diagram of a lithographic projection objective according to a second embodiment of the present invention;
FIG. 7 is a wave aberration diagram of the lithographic projection objective shown in FIG. 6;
FIG. 8 is a diagram of the optical transfer function of the lithographic projection objective shown in FIG. 6 at fields of view of 250 cl/mm;
FIG. 9 is a plot of field curvature, astigmatism, of the lithographic projection objective shown in FIG. 6;
fig. 10 is a distortion diagram of the lithographic projection objective shown in fig. 6.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Example one
Fig. 1 is a schematic structural diagram of a lithographic projection objective according to an embodiment of the present invention, and referring to fig. 1, the lithographic projection objective includes a first lens group G1, a second lens group G2, a Stop, a third lens group G3, and a fourth lens group G4, which are sequentially arranged along an optical axis, where a plane of the Stop is a Stop surface, and the Stop can limit a beam size of the lithographic projection objective. The first lens group G1 and the fourth lens group G4 are symmetric about a stop surface, and the second lens group G2 and the third lens group G3 are symmetric about the stop surface. The first lens group G1 and the fourth lens group G4 have positive power, and the second lens group G2 and the third lens group G3 have negative power. The power, which is equal to the difference between the image-side and object-side beam convergence, characterizes the ability of the optical system to deflect light. The larger the absolute value of the focal power is, the stronger the bending ability to the light ray is, and the smaller the absolute value of the focal power is, the weaker the bending ability to the light ray is. When the focal power is positive, the refraction of the light is convergent; when the focal power is negative, the refraction of the light is divergent. The focal power can be suitable for representing a certain refractive surface of one lens, can be suitable for representing a certain lens, and can also be suitable for representing a system formed by a plurality of lenses together. The first lens group G1 and the fourth lens group G4 each include two double concave negative lenses, two double convex positive lenses, and one meniscus positive lens, and the second lens group G2 and the third lens group G3 each include two meniscus negative lenses, one double concave negative lens, and one double convex positive lens.
The embodiment of the invention provides a photoetching projection objective, wherein light emitted by a light source irradiates a mask plate, a pattern on the mask plate is projected onto a workpiece through the photoetching projection objective, and photoresist coated on the workpiece is exposed. The photoetching projection objective comprises a first lens group and a fourth lens group which are symmetrically arranged about a diaphragm surface, and a second lens group and a third lens group which are symmetrically arranged about the diaphragm surface, and the symmetrical arrangement can compensate asymmetric phase difference in a field and improve the imaging quality. The first lens group includes two biconcave negative lenses, two biconvex positive lenses, and one meniscus positive lens. The second lens group includes two meniscus negative lenses, a biconcave negative lens, and a biconvex positive lens. Since the third lens group is symmetrical to the second lens group with respect to the stop surface, the third lens group also includes two meniscus negative lenses, one biconcave negative lens, and one biconvex positive lens. Since the fourth lens group is symmetrical to the first lens group with respect to the stop surface, the fourth lens group also includes two biconcave negative lenses, two biconvex positive lenses, and one meniscus positive lens. The combination of the first lens group, the second lens group, the third lens group and the fourth lens group increases the view field size of the projection exposure device and improves the productivity.
Alternatively, referring to fig. 1, all lenses in the lithographic projection objective are spherical lenses. Spherical lenses are lenses that have a constant curvature from the center to the edge of the lens, both refractive surfaces of a spherical lens are spherical, while aspherical lenses have a continuously changing curvature from the center to the edge, so that spherical lenses are easier to process than aspherical lenses. The lenses in the embodiment of the invention are all spherical lenses, so that the processing cost of the lenses in the photoetching projection objective is reduced, the processing period of the lenses is shortened, and the assembly and adjustment efficiency of the photoetching projection objective is improved.
Alternatively, referring to fig. 1, the first lens group G1 includes a first lens 1, a second lens 2, a third lens 3, a fourth lens 4, and a fifth lens 5 arranged in this order along the optical axis, the first lens 1 and the second lens 2 being double concave negative lenses, the third lens 3 being a meniscus positive lens, and the fourth lens 4 and the fifth lens 5 being double convex positive lenses. The fourth lens group G4 includes a fourteenth lens 14, a fifteenth lens 15, a sixteenth lens 16, a seventeenth lens 17, and an eighteenth lens 18, which are arranged in this order along the optical axis. The fourth lens group G4 is symmetrical to the first lens group G1 with respect to the stop surface, and correspondingly, the fourteenth lens 14 and the fifteenth lens 15 are double convex positive lenses, the sixteenth lens 16 is a meniscus positive lens, and the seventeenth lens 17 and the eighteenth lens 18 are double concave negative lenses. The concave surfaces of the third lens 3 and the sixteenth lens 16 face away from the stop surface. The meniscus positive lens is one of meniscus lenses, the meniscus lens also comprises a meniscus negative lens, the meniscus lens is generally composed of two spherical surfaces with smaller curvature radius and little numerical value difference, and the meniscus lens presents a crescent shape.
Alternatively, referring to fig. 1, the second lens group G2 includes a sixth lens 6, a seventh lens 7, an eighth lens 8, and a ninth lens 9 arranged in this order along the optical axis, the sixth lens 6 and the seventh lens 7 being meniscus negative lenses, the eighth lens 8 being a biconcave negative lens, and the ninth lens 9 being a biconvex positive lens. The third lens group G3 includes a tenth lens 10, an eleventh lens 11, a twelfth lens 12, and a thirteenth lens 13 arranged in this order along the optical axis. The third lens group G3 is symmetrical to the second lens group G2 with respect to the stop surface, and correspondingly, the tenth lens 10 is a biconvex positive lens, the eleventh lens 11 is a biconcave negative lens, and the twelfth lens 12 and the thirteenth lens 13 are meniscus negative lenses. The concave surfaces of the sixth lens 6 and the thirteenth lens 13 face the diaphragm surface, and the concave surfaces of the seventh lens 7 and the twelfth lens 12 face away from the diaphragm surface.
Alternatively, referring to fig. 1, a surface of the lens on a side away from the stop surface is a front surface, and a surface of the lens on a side close to the stop surface is a rear surface; the presence of at least one meniscus lens (sixth lens 6 and thirteenth lens 13; or seventh lens 7 and twelfth lens 12; or sixth lens 6, seventh lens 7, twelfth lens 12 and thirteenth lens 13) in the second lens group G2 and the third lens group G3, respectively, satisfies: rL-(RS+CT)≥10％*RS，RL＞RS(ii) a Wherein R isLIs the absolute value of the radius of curvature of the front surface of the lens, RSIs the absolute value of the radius of curvature of the rear surface of the lens and CT is the thickness of the lens.
Illustratively, referring to fig. 1, the sixth lens 6 in the second lens group G2 is a meniscus lens (meniscus negative lens), and the surface of the sixth lens 6 on the side away from the stop surface has a radius of curvature RLThe curvature radius of the surface of the sixth lens 6 near the diaphragm surface is RSAnd CT is the thickness of the sixth lens 6, the sixth lens 6 satisfies: rL-(RS+CT)≥10％*RS，RL＞RS. Since the third lens group G3 is symmetrical to the second lens group G2 about the stop surface, the thirteenth lens 13 also satisfies the above formula.
Alternatively, referring to fig. 1, at least one of the five lenses of the first lens group G1 is made of calcium fluoride material, at least one of the five lenses of the first lens group G1 is made of flint glass material, and the lens made of flint glass material has positive power. Chromatic aberration results from the difference in dispersion and refractive index of different wavelengths of light in the glass, resulting in different focal points for different wavelengths of light. By using the combination of calcium fluoride material and flint glass material, the dispersion of each glass can be compensated by the other glass, thereby minimizing the comprehensive chromatic aberration.
Alternatively, referring to fig. 1, at least one of the four lenses of the second lens group G2 is made of crown glass, at least one of the four lenses of the second lens group G2 is made of flint glass, and the lenses made of crown glass have positive power and the lenses made of flint glass have negative power. By using a combination of crown glass and flint glass materials, the dispersion of each glass can be compensated by the other, thereby minimizing the overall chromatic aberration.
The total length of the photoetching projection objective lens provided by the embodiment of the invention is not more than 2500mm, the photoetching projection objective lens is suitable for an i-line (365nm) ultraviolet spectrum range, simultaneously can be compatible with g-line (405nm) and h-line (442nm) wave bands, the usable maximum spectrum width can reach 80nm, the magnification is-1 x, the numerical aperture of an image side is 0.1, and the size of the image side field is 360 mm. The photoetching projection objective lens is provided with an object space and image space double telecentric structure, and the chief ray of each view field of the object space is incident on the first lens 1 approximately parallel to the optical axis; the chief rays of each field of view on the image side are emitted from the eighteenth lens 18 approximately parallel to the optical axis and converged on the image surface, so that the alignment precision can be improved. The object space working distance of the projection objective is 80mm, and the image space working distance is 80 mm.
TABLE 1A specific design value for a lithographic projection objective
Table 1 shows a specific design value of the lithographic projection objective, and the specific value can be adjusted according to the product requirement, and is not a limitation to the embodiment of the present invention. A lens generally comprises two surfaces, each of which is a refractive surface. The numbers in table 1 are numbered according to the surface of each lens. The OBJ in the column "serial number" represents the object plane of the lithographic projection objective, "STOP" in the column "serial number" represents the STOP, "Image" in the column "serial number" represents the Image plane of the lithographic projection objective. "Sphere" in the column "type" represents a Sphere, all surfaces are spheres, and all lenses are spherical lenses. A positive radius value indicates the center of curvature to the right of the surface (closer to the workpiece Wafer side) and a negative radius value indicates the center of curvature to the left of the surface (closer to the mask surface tilt side). The numerical value in the column of "thickness" indicates the on-axis distance from the current surface to the next surface. For example, a cell having a thickness of "20.000" numbered "1" represents that the thickness of the first lens 1 is 20.000mm, and a cell having a thickness of "103.605" numbered "2 represents that the distance between the first lens 1 and the second lens 2 is 103.605 mm.
Fig. 2 is a wave aberration diagram of the lithographic projection objective shown in fig. 1, with reference to fig. 2, the full market wavefront having been corrected.
Fig. 3 is a graph of the optical transfer function of the lithographic projection objective shown in fig. 1 at each field of view 250cl/mm, and with reference to fig. 3, the optical transfer function refers to a function representing the relative change of modulation and lateral phase shift during imaging with spatial frequency as a variable. The optical transfer function is a filtered transformation of the optical system to a spatial spectrum. The numerical value of each curve is above 0.25, which indicates that the imaging quality of the photoetching projection objective is good.
Fig. 4 is a diagram of the field curvature, astigmatism of the lithographic projection objective shown in fig. 1, with reference to fig. 4, with the field curvature, astigmatism corrected.
Fig. 5 is a distortion diagram of the lithographic projection objective shown in fig. 1, with reference to fig. 5, in which no distortion is present and the distortion has been corrected.
Example two
Fig. 6 is a schematic structural diagram of a lithography projection objective according to a first embodiment of the present invention, and referring to fig. 6, the lithography projection objective includes a first lens group G1, a second lens group G2, a Stop, a third lens group G3, and a fourth lens group G4, which are sequentially arranged along an optical axis, where a plane of the Stop is a Stop surface. The first lens group G1 and the fourth lens group G4 are symmetric about a stop surface, and the second lens group G2 and the third lens group G3 are symmetric about the stop surface. The first lens group G1 and the fourth lens group G4 have positive power, and the second lens group G2 and the third lens group G3 have negative power. The first lens group G1 and the fourth lens group G4 each include two double concave negative lenses, two double convex positive lenses, and one meniscus positive lens, and the second lens group G2 and the third lens group G3 each include two meniscus negative lenses, one double concave negative lens, and one double convex positive lens. The lithographic projection objective further comprises a first plate 1 and a second plate 20 which are symmetrical with respect to the stop surface, the first plate 1 being located on the side of the first lens group G1 remote from the stop surface, the second plate 20 being located on the side of the fourth lens group G4 remote from the stop surface.
An embodiment of the present invention provides a lithographic projection objective lens, which adds a first flat plate and a second flat plate on the basis of the first embodiment, wherein the first flat plate and the second flat plate are located outside the first lens group, the second lens group, the third lens group, and the fourth lens group, and are used for protecting the first lens group, the second lens group, the third lens group, and the fourth lens group from being contaminated by the outside.
Alternatively, referring to fig. 6, the first lens group G1 includes a second lens 2, a third lens 3, a fourth lens 4, a fifth lens 5, and a sixth lens 6 arranged in this order along the optical axis, the second lens 2 and the third lens 3 being double concave negative lenses, the fourth lens 4 and the fifth lens 5 being double convex positive lenses, and the sixth lens 6 being a meniscus positive lens. The fourth lens group G4 includes a fifteenth lens 15, a sixteenth lens 16, a seventeenth lens 17, an eighteenth lens 18, and a nineteenth lens 19, which are arranged in this order along the optical axis. The fourth lens group G4 is symmetrical to the first lens group G1 with respect to the stop surface, and correspondingly, the fifteenth lens 15 is a meniscus positive lens, the sixteenth lens 16 and the seventeenth lens 17 are double convex positive lenses, and the eighteenth lens 18 and the nineteenth lens 19 are double concave negative lenses. The concave surfaces of the sixth lens 6 and the fifteenth lens 15 face away from the stop surface.
Alternatively, referring to fig. 6, the second lens group G2 includes a seventh lens 7, an eighth lens 8, a ninth lens 9, and a tenth lens 10 arranged in this order along the optical axis, the seventh lens 7 and the eighth lens 8 being meniscus negative lenses, the ninth lens 9 being a biconcave negative lens, and the tenth lens 10 being a biconvex positive lens. The third lens group G3 includes an eleventh lens 11, a twelfth lens 12, a thirteenth lens 13, and a fourteenth lens 14 arranged in this order along the optical axis. The third lens group G3 is symmetrical to the second lens group G2 with respect to the stop surface, and correspondingly, the eleventh lens 11 is a biconvex positive lens, the twelfth lens 12 is a biconcave negative lens, and the thirteenth lens 13 and the fourteenth lens 14 are meniscus negative lenses. The concave surfaces of the seventh lens 7 and the fourteenth lens 14 face the diaphragm surface, and the concave surfaces of the eighth lens 8 and the thirteenth lens 13 face away from the diaphragm surface.
Alternatively, referring to fig. 6, the surface of the lens on the side away from the stop surface is a front surface, and the surface of the lens on the side close to the stop surface is a rear surface; the presence of at least one meniscus lens (seventh lens 7 and fourteenth lens 14; or eighth lens 8 and thirteenth lens 13; or seventh lens 7, eighth lens 8, thirteenth lens 13 and fourteenth lens 14) in the second lens group G2 and the third lens group G3, respectively, satisfies: rL-(RS+CT)≥10％*RS，RL＞RS(ii) a Wherein R isLIs the absolute value of the radius of curvature of the front surface of the lens, RSIs the absolute value of the radius of curvature of the rear surface of the lens and CT is the thickness of the lens.
Alternatively, referring to fig. 6, at least one of the five lenses of the first lens group G1 is made of calcium fluoride material, at least one of the five lenses of the first lens group G1 is made of flint glass material, and the lens made of flint glass material has positive power. Chromatic aberration results from the difference in dispersion and refractive index of different wavelengths of light in the glass, resulting in different focal points for different wavelengths of light. By using the combination of calcium fluoride material and flint glass material, the dispersion of each glass can be compensated by the other glass, thereby minimizing the comprehensive chromatic aberration.
Alternatively, referring to fig. 6, at least one of the four lenses of the second lens group G2 is made of crown glass, at least one of the four lenses of the second lens group G2 is made of flint glass, and the lenses made of crown glass have positive power and the lenses made of flint glass have negative power. By using a combination of crown glass and flint glass materials, the dispersion of each glass can be compensated by the other, thereby minimizing the overall chromatic aberration.
The total length of the photoetching projection objective lens provided by the embodiment of the invention is not more than 2500mm, the photoetching projection objective lens is suitable for an i-line (365nm) ultraviolet spectrum range, simultaneously can be compatible with g-line (405nm) and h-line (442nm) wave bands, the usable maximum spectrum width can reach 80nm, the magnification is-1 x, the numerical aperture of an image side is 0.1, and the size of the image side field is 360 mm. The photoetching projection objective lens is provided with an object space and image space double telecentric structure, and the chief ray of each view field of the object space is incident on the first flat plate 1 approximately parallel to the optical axis; the chief rays of each field of view on the image side are emitted from the second flat plate 2 approximately parallel to the optical axis and converged on the image surface, so that the alignment precision can be improved. The object space working distance of the projection objective is 80mm, and the image space working distance is 80 mm.
TABLE 2 Another detailed design value of a lithographic projection objective
Table 2 shows another specific design value of the lithography projection objective, and the specific value can be adjusted according to the product requirement, and is not a limitation to the embodiment of the present invention. The meanings represented in the cells in table 2 are similar to those in table 1 of the first embodiment, and are not repeated here.
Fig. 7 is a wave aberration diagram for the lithographic projection objective shown in fig. 6, with reference to fig. 7, the full market wavefront having been corrected.
Fig. 8 is a graph of the optical transfer function of the lithographic projection objective shown in fig. 6 at each field of view 250cl/mm, and with reference to fig. 8, the optical transfer function refers to a function representing the relative change of modulation and lateral phase shift during imaging with spatial frequency as a variable. The optical transfer function is a filtered transformation of the optical system to a spatial spectrum. The numerical value of each curve is above 0.25, which indicates that the imaging quality of the photoetching projection objective is good.
FIG. 9 is a graph of field curvature, astigmatism for the lithographic projection objective shown in FIG. 6, with reference to FIG. 9, with the field curvature, astigmatism corrected.
FIG. 10 is a distortion diagram for the lithographic projection objective shown in FIG. 6, with reference to FIG. 10, with no distortion present and with distortion corrected.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious modifications, rearrangements, combinations and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (6)
1. A photoetching projection objective lens is characterized by comprising a first lens group, a second lens group, a diaphragm, a third lens group and a fourth lens group which are sequentially arranged along an optical axis, wherein the plane of the diaphragm is a diaphragm surface, the first lens group and the fourth lens group are symmetrical relative to the diaphragm surface, and the second lens group and the third lens group are symmetrical relative to the diaphragm surface; the first lens group and the fourth lens group have positive optical power, and the second lens group and the third lens group have negative optical power;
the first lens group and the fourth lens group each include two biconcave negative lenses, two biconvex positive lenses and one meniscus positive lens, and the second lens group and the third lens group each include two meniscus negative lenses, one biconcave negative lens and one biconvex positive lens;
the photoetching projection objective lens has a first arrangement mode or a second arrangement mode;
in the first setting mode,
the first lens group comprises a first lens, a second lens, a third lens, a fourth lens and a fifth lens which are sequentially arranged along an optical axis, wherein the first lens and the second lens are biconcave negative lenses, the third lens is a meniscus positive lens, and the fourth lens and the fifth lens are biconvex positive lenses; the fourth lens group comprises a fourteenth lens, a fifteenth lens, a sixteenth lens, a seventeenth lens and an eighteenth lens which are sequentially arranged along an optical axis, wherein the fourteenth lens and the fifteenth lens are double convex positive lenses, the sixteenth lens is a meniscus positive lens, and the seventeenth lens and the eighteenth lens are double concave negative lenses; the concave surfaces of the third lens and the sixteenth lens are away from the diaphragm surface; the second lens group comprises a sixth lens, a seventh lens, an eighth lens and a ninth lens which are sequentially arranged along an optical axis, wherein the sixth lens and the seventh lens are meniscus negative lenses, the eighth lens is a biconcave negative lens, and the ninth lens is a biconvex positive lens; the third lens group comprises a tenth lens, an eleventh lens, a twelfth lens and a thirteenth lens which are sequentially arranged along an optical axis, wherein the tenth lens is a double convex positive lens, the eleventh lens is a double concave negative lens, and the twelfth lens and the thirteenth lens are meniscus negative lenses; the concave surfaces of the sixth lens and the thirteenth lens face the diaphragm surface, and the concave surfaces of the seventh lens and the twelfth lens face away from the diaphragm surface;
in the second setting mode, the first setting mode,
the first lens group comprises a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens which are sequentially arranged along an optical axis, wherein the second lens and the third lens are biconcave negative lenses, the fourth lens and the fifth lens are biconvex positive lenses, and the sixth lens is a meniscus positive lens; the fourth lens group comprises a fifteenth lens, a sixteenth lens, a seventeenth lens, an eighteenth lens and a nineteenth lens which are sequentially arranged along an optical axis, wherein the fifteenth lens is a meniscus positive lens, the sixteenth lens and the seventeenth lens are double-convex positive lenses, and the eighteenth lens and the nineteenth lens are double-concave negative lenses; the concave surfaces of the sixth lens and the fifteenth lens face the diaphragm surface; the second lens group comprises a seventh lens, an eighth lens, a ninth lens and a tenth lens which are sequentially arranged along an optical axis, wherein the seventh lens and the eighth lens are meniscus negative lenses, the ninth lens is a biconcave negative lens, and the tenth lens is a biconvex positive lens; the third lens group comprises an eleventh lens, a twelfth lens, a thirteenth lens and a fourteenth lens which are sequentially arranged along an optical axis, wherein the eleventh lens is a double convex positive lens, the twelfth lens is a double concave negative lens, and the thirteenth lens and the fourteenth lens are meniscus negative lenses; the concave surfaces of the seventh lens and the fourteenth lens face the diaphragm surface, and the concave surfaces of the eighth lens and the thirteenth lens face away from the diaphragm surface.
2. Lithography projection objective according to claim 1, wherein all lenses of the lithography projection objective are spherical lenses.
3. Lithography projection objective according to claim 1, wherein in the first arrangement the surface of the lens on the side remote from the stop face is a front surface and the surface of the lens on the side close to the stop face is a rear surface;
at least one meniscus lens exists in the second lens group and the third lens group respectively, and the conditions are as follows: rL-(RS+CT)≥10％*RS，RL＞RS；
Wherein R isLIs the absolute value of the radius of curvature of the front surface of the lens, RSIs the absolute value of the radius of curvature of the rear surface of the lens and CT is the thickness of the lens.
4. Lithography projection objective according to claim 1, further comprising a first plate and a second plate that are plane-symmetric with respect to the diaphragm;
the first flat plate is located on one side, far away from the diaphragm surface, of the first lens group, and the second flat plate is located on one side, far away from the diaphragm surface, of the fourth lens group.
5. A lithographic projection objective according to claim 1, wherein at least one of the five lenses of said first lens group is made of calcium fluoride material, at least one of the five lenses of said first lens group is made of flint glass material, and the lens made of flint glass material has positive power.
6. A lithographic projection objective according to claim 1, wherein at least one of the four lenses of the second lens group is made of a crown glass material, at least one of the four lenses of the second lens group is made of a flint glass material, and the lenses made of the crown glass material have a positive power and the lenses made of the flint glass material have a negative power.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810846020.9A CN110764224B (en) | 2018-07-27 | 2018-07-27 | Photoetching projection objective lens |
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| CN201810846020.9A CN110764224B (en) | 2018-07-27 | 2018-07-27 | Photoetching projection objective lens |
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| CN110764224B true CN110764224B (en) | 2020-12-18 |
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