CN217467464U - Optical engine system - Google Patents
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- CN217467464U CN217467464U CN202221247325.6U CN202221247325U CN217467464U CN 217467464 U CN217467464 U CN 217467464U CN 202221247325 U CN202221247325 U CN 202221247325U CN 217467464 U CN217467464 U CN 217467464U
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Abstract
An optical engine system, comprising: the device comprises a light source unit, a reflector, a first focusing lens, a spatial light modulator, an imaging unit and a second focusing lens. The utility model discloses an optical engine system utilizes the light source unit to produce the exposure light beam, reflects the exposure light beam via the speculum, forms the reflection light path and passes to spatial light modulator to generate pixel figure or pixel mask figure, the light of production will be inputed to the imaging element, and the imaging element can adopt the high magnification camera lens, with the generation high resolution figure, comes the calibration counterpoint that is used for follow-up figure. The first focusing lens is used for accurately matching with the position of a light beam focused on an object plane, so that the definition of a graph is ensured; the second focusing lens is used for realizing beam shaping, and can be matched with a high-magnification lens adopted by the imaging unit to generate a larger zoom ratio, so that a thinner graphic line is realized. Compared with the prior art, the high-precision pattern photoetching method can realize high-precision pattern photoetching, and can be completely realized based on the current exposure system, the cost performance is high, and the development cost is relatively low.
Description
Technical Field
The utility model relates to a digital laser direct writing exposure technical field, in particular to optical engine system.
Background
Among the correlation technique, to laser direct writing exposure machine, present mainstream production linewidth is 25um to 75um, and the higher laser direct writing exposure machine of precision can reach 5um for film manufacturing etc.. In the face of market application, the laser direct-writing exposure machine with 1um and submicron level shows own advantages for the requirement of high-density patterns and the photoetching requirement of partial semiconductor wafer industry. With the improvement of software algorithms and the manufacturing level of the object stage, the design of the exposure machine needs to be further improved, and the current technology is limited to the pixel size of the DMD, and it is difficult to achieve the reduction of the pattern in transmission for the optical path system of the exposure machine, resulting in that only the pattern lithography with low precision and relatively larger line width is finally achieved.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides an optical engine system has solved the problem that the figure photoetching precision is low of prior art exposure machine.
According to the utility model discloses optical engine system, include:
a light source unit for emitting an exposure light beam;
the reflecting mirror is arranged on one side of the light source unit, which emits the exposure light beam, and is used for receiving the exposure light beam and reflecting a reflected light beam;
a first focusing lens disposed on a light beam transfer path between the light source unit and the reflector;
the spatial light modulator is arranged on one side of the reflecting beam reflected by the reflecting mirror and used for generating a pixel pattern or a pixel mask pattern;
the imaging unit is arranged on one side of the spatial light modulator, which outputs the pixel pattern, and is used for carrying out high-resolution imaging on the pixel pattern or the pixel mask pattern;
and the second focusing lens is arranged on a light beam transmission path between the spatial light modulator and the imaging unit.
According to the utility model discloses optical engine system has following beneficial effect at least:
the light source unit is used for generating exposure light beams, the exposure light beams are reflected through the reflecting mirror to form a reflection light path and are transmitted to the spatial light modulator to generate pixel patterns or pixel mask patterns, the generated light is input to the imaging unit, and the imaging unit can adopt a high-magnification lens to generate high-resolution patterns for calibration and alignment of subsequent patterns. In the light beam transmission process, a first focusing lens is used for accurately matching the light beam to focus to an object plane position, so that the definition of a graph is ensured; the second focusing lens is used for realizing beam shaping, and can be matched with a high-magnification lens adopted by the imaging unit to generate a larger zoom ratio, so that a thinner graphic line is realized. Compared with the prior art, the utility model discloses optical engine system can realize high accuracy figure photoetching under the combined action of each component or unit, and can realize completely based on current exposure system, the sexual valence relative altitude, and development cost is low relatively.
According to some embodiments of the invention, the first focusing lens and the second focusing lens both adopt aspheric lenses.
According to some embodiments of the invention, the light source unit comprises:
an exposure light source;
one end of the optical fiber is connected with the output end of the exposure light source;
and the light collimation and homogenization device is connected with the other end of the optical fiber and is used for outputting the exposure light beam after collimation and/or homogenization treatment.
According to some embodiments of the invention, the exposure light source is a blue-violet light source.
According to some embodiments of the invention, the optical fiber is a square optical fiber.
According to some embodiments of the invention, the imaging unit comprises:
the imaging lens is provided with a light inlet and a light outlet, the light inlet is positioned at one side close to the spatial light modulator, and the light outlet is positioned at one side far away from the spatial light modulator;
and the imaging focal plane is arranged on one side close to the light outlet.
According to some embodiments of the present invention, the numerical aperture range of the imaging lens is 0.25 to 0.5.
According to some embodiments of the utility model, imaging lens adopts telecentric lens.
According to some embodiments of the invention, the spatial light modulator employs a digital micromirror device.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic structural diagram of an optical engine system according to an embodiment of the present invention;
fig. 2 is a schematic diagram of a beam transmission path of an optical engine system according to an embodiment of the present invention.
Reference numerals:
a mirror 100;
a first focusing lens 210; a second focusing lens 220;
a spatial light modulator 300;
an optical fiber 410; a light collimating and homogenizing device 420;
an imaging lens 510; the focal plane 520 is imaged.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper and lower directions, is the orientation or positional relationship shown on the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and therefore should not be construed as limiting the present invention.
In the description of the present invention, a plurality means two or more. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless there is an explicit limitation, the words such as setting, installation, connection, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in combination with the specific contents of the technical solution.
Referring to fig. 1, an embodiment of the present invention provides an optical engine system, including: a light source unit, a reflecting mirror 100, a first focusing lens 210, a spatial light modulator 300, an imaging unit, and a second focusing lens 220. The light source unit is used for emitting exposure light beams; the reflecting mirror 100 is disposed on one side of the light source unit emitting the exposure light beam, and is configured to receive the exposure light beam and reflect a reflected light beam; the first focusing lens 210 is disposed on a light beam transfer path between the light source unit and the reflector 100; the spatial light modulator 300 is disposed on one side of the reflecting mirror 100 reflecting the reflected light beam, and is used for generating a pixel pattern or a pixel mask pattern; the imaging unit is arranged at one side of the spatial light modulator 300, which outputs the pixel pattern, and is used for performing high-resolution imaging on the pixel pattern or the pixel mask pattern; the second focusing lens 220 is disposed on a light beam transfer path between the spatial light modulator 300 and the imaging unit.
The utility model discloses optical engine system utilizes light source unit to produce the exposure light beam, reflects the exposure light beam via speculum 100, forms the reflection light path and passes to spatial light modulator 300 to generate pixel figure or pixel mask figure, the light of production will be inputed to the imaging element, the imaging element can adopt the high magnification camera lens, with the generation high resolution figure, comes the calibration counterpoint that is used for follow-up figure. In the process of transmitting the light beam, the first focusing lens 210 is used for precisely matching the position of the light beam focused on the object plane to ensure the definition of the graph; the second focusing lens 220 is used for realizing beam shaping, and can be matched with a high-magnification lens adopted by the imaging unit to generate a larger zoom ratio, so as to realize thinner graphic lines. Compared with the prior art, the utility model discloses optical engine system can realize high accuracy figure photoetching under the combined action of each component or unit, and can realize completely based on current 5 um's exposure system, and the sexual valence relative altitude, development cost are low relatively.
Referring to fig. 1, with reference to the arrangement orientation in the figure, the light source unit is arranged on the left side, the first focusing lens 210 is arranged on the right side of the light source unit and the mirror surface faces the light outlet of the light source unit, the reflecting mirror 100 is arranged on the right side of the first focusing lens 210, the second focusing lens 220 is arranged on the lower side of the reflecting mirror 100, the spatial light modulator 300 is arranged on the lower side of the second focusing lens 220 and the surface thereof is parallel to the mirror surface of the second focusing lens 220, and the imaging unit is arranged on the upper side of the second focusing lens 220 and the light inlet thereof faces the mirror surface of the second focusing lens 220. With continued reference to FIG. 2, in the embodiment shown in FIG. 2, the reflection angle of the mirror 100 needs to be greater than 90 degrees depending on the placement of the elements. In some embodiments, the mirror 100 may be selected to have different reflectivity levels to achieve the desired beam delivery path, depending on the placement of the elements.
Referring to fig. 2, for the optical engine system according to the embodiment of the present invention, the complete light beam transmission path is: the light source unit outputs exposure light beams, the exposure light beams are processed by the first focusing lens 210 and then transmitted to the reflector 100, the exposure light beams are transmitted to the spatial light modulator 300 through the second focusing lens 220, the spatial light modulator 300 receives light signals and then performs light modulation to output patterns, the patterns are processed by the second focusing lens 220 and finally transmitted to the imaging unit, and high-resolution imaging is completed.
In some embodiments, as shown in fig. 1, the first focusing lens 210 and the second focusing lens 220 both employ aspheric lenses.
It can be appreciated that there are five basic types of focusing lenses: plano-convex lenses, positive meniscus lenses, aspherical lenses, diffractive lenses and reflective lenses. The aspheric lens has the advantages that: first, aspheric lenses reduce spherical aberration, which occurs when the lens fails to focus all incident light aberrations at the same point. Even if machined to the theoretical limit, standard spherical lenses never achieve the precise level of focus provided by aspheric lenses. The nature of the aspherical irregular surface shape is such that it allows more precise manipulation of light of multiple wavelengths simultaneously, resulting in a sharper pattern. Second, the aspheric lens can correct off-axis aberrations such as curvature of field. Typically, an optical designer must "stop" his optical system to physically exclude the outermost regions of the lens, which can produce pattern distortions near their edges. Since the aspherical design better corrects the incident light to the focal point, the available aperture of the lens is increased, and a greater luminous flux can be provided. Finally, aspheric lenses reduce the overall number of lenses required to achieve a given result. Since aspheric lenses can better control the light passing through the system, in many cases a single aspheric lens can provide the same precision as multiple standard lenses previously used in series. This reduces the overall weight, size, and possibly even the cost of the final design.
In some embodiments, as shown in fig. 1, the light source unit includes: exposure light source, optical fiber 410, light collimation and homogenization device 420. One end of the optical fiber 410 is connected with the output end of the exposure light source; the light collimating and homogenizing device 420 is connected to the other end of the optical fiber 410, and is used for collimating and/or homogenizing the exposure light beam and outputting the collimated and/or homogenized exposure light beam.
Referring to fig. 1 or 2, the exposure light source is not shown, one end of the optical fiber 410 is connected to the exposure light source, and the other end of the optical fiber 410 is connected to the light collimating and homogenizing device 420. The exposure light source is transmitted through the optical fiber 410, output in the form of exposure light beam, transmitted to the light collimation and homogenization device 420, and then subjected to collimation and/or homogenization treatment, so as to provide higher guarantee for the uniformity of the pattern, and then transmitted to the focusing unit for treatment. It should be understood that, in some embodiments, the light source unit may also directly adopt an exposure light source or parallel light that has been subjected to collimation and/or homogenization treatment, and the invention is not limited thereto.
Specifically, in some embodiments, the light collimating and homogenizing device 420 comprises a collimating lens and a micro-lens array device. The collimating lens has positive optical power and is used for converging the light beam from the exposure light source so as to form a collimated light beam which is substantially collimated; the micro lens array device comprises a micro lens array which is formed by arraying a plurality of micro lenses on a substrate and is used for homogenizing and shaping the collimated light beams from the collimating lens.
In some embodiments, the exposure light source employs a blue-violet light source. It can be understood that the exposure light source can also adopt a near ultraviolet light source, a blue-violet light source or an extended near ultraviolet light source, the effect of the photosensitive resist is excellent, and the blue-violet light source supports the extended light source wavelength band while exposing.
In some embodiments, optical fiber 410 is a square fiber. The inner core of the square optical fiber is square, and the outer protective sleeve is cylindrical. By adopting the square optical fiber, the subsequent treatment effect of collimation and light homogenization is facilitated. In some embodiments, the optical fiber 410 may also be a rectangular optical fiber, an octagonal optical fiber, or some other homogenizing optical fiber.
In some embodiments, as shown in fig. 1, the imaging unit includes: imaging lens 510, imaging focal plane 520. The imaging lens 510 has a light inlet and a light outlet, the light inlet is located at a side close to the spatial light modulator 300, and the light outlet is located at a side far from the spatial light modulator 300; the imaging focal plane 520 is disposed on a side close to the light exit.
Referring to fig. 1 or fig. 2, the light inlet of the imaging lens 510 is disposed on the upper side of the focusing unit to receive the pixel pattern or the pixel mask pattern output by the spatial light modulator 300 after being processed by the focusing unit, with the arrangement orientation in the figure as a reference. The imaging focal plane 520 is disposed on an upper side of the light exit of the imaging lens 510 to present a high resolution image processed and output by the imaging lens 510 on a plane.
In some embodiments, the imaging unit may employ an imaging lens, and may also employ a camera or a video camera.
In some embodiments of the present invention, the numerical aperture of the imaging lens 510 ranges from 0.25 to 0.5.
The Numerical Aperture (NA) is a dimensionless number that measures the angular range of light that the system can collect. The larger the numerical aperture, the more light collected, and the higher the resolution. The diffraction limit can be effectively improved by adopting the numerical aperture of 0.25 to 0.5.
In some embodiments, imaging lens 510 employs a telecentric lens.
Specifically, the imaging lens 510 is a high-magnification telecentric lens having a magnification in a range of 10X to 50X. The second focusing unit can be matched with the small diaphragm of the high-magnification telecentric lens to be arranged for inverting the objective lens, so that a larger zoom ratio is generated, thinner graphic lines are realized, high-precision resolving power can be realized, submicron line resolution is realized, and the method can be well applied to the field of semiconductor processing.
In some embodiments, the spatial light modulator 300 employs a digital micromirror device.
The Digital Micromirror Device (DMD) can adopt a high-quality DMD chip, has smaller pixel units and larger turning angle, and can realize turning emission of finer patterns. Meanwhile, the fine patterns can be transmitted by matching a high-precision data processing system (DLP) and data processing software. In some embodiments, the model of the digital micromirror device can adopt one of DLP4500, DLP5500, DLP6500, etc.
In some embodiments, the spatial light modulator 300 may also employ one of a liquid crystal display device LCD, a liquid crystal on silicon device LCOS, or the like.
To better facilitate understanding by those skilled in the art, and to better facilitate understanding by those skilled in the art, a specific embodiment is described herein.
Referring to fig. 1 and fig. 2, the optical engine system of the present embodiment includes a blue-violet light source, a square optical fiber, a light collimating and homogenizing device 420, a reflector 100, a first aspheric lens, a digital micromirror device, a telecentric lens with a numerical aperture of 0.5 and a magnification of 50X, an imaging focal plane 520, and a second aspheric lens. The setting direction in fig. 1 is taken as a reference, a blue-violet light source is not shown in the figure, one end of a square optical fiber is connected with the blue-violet light source, the other end of the square optical fiber is connected with the light collimation and homogenization device 420, a first aspheric lens is arranged on the right side of the light collimation and homogenization device 420, the mirror surface of the first aspheric lens faces the light outlet of the light collimation and homogenization device 420, the reflector 100 is arranged on the right side of the first aspheric lens, a second aspheric lens is arranged on the lower side of the reflector 100, a digital micromirror device is arranged on the lower side of the second aspheric lens, the surface of the digital micromirror device is parallel to the mirror surface of the second aspheric lens, a telecentric lens with a numerical aperture of 0.5 and a magnification of 50X is arranged on the upper side of the second aspheric lens, the imaging focal plane 520 is arranged on the upper side of the telecentric lens with a numerical aperture of 0.5 and a magnification of 50X and faces the light outlet of the telecentric lens.
Referring to fig. 2, a blue-violet light source is transmitted through a square optical fiber, output in the form of a light beam, transmitted to a light collimating and homogenizing device 420, collimated and/or homogenized, then transmitted to a reflector 100 after being processed by a first aspheric lens, transmitted to a digital micromirror device after being processed by a second aspheric lens, received by the digital micromirror device, modulated by light to output a pattern, processed by the second aspheric lens, and finally transmitted to a telecentric lens with a numerical aperture of 0.5 and a magnification of 50X, and a high-resolution pattern is formed on an imaging focal plane 520. The optical engine system of the embodiment can realize high-precision pattern lithography under the combined action of each element or unit, and the current exposure system based on 5um can be completely realized, so that the cost performance is high, and the development cost is relatively low.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (9)
1. An optical engine system, comprising:
a light source unit for emitting an exposure light beam;
the reflecting mirror is arranged on one side of the light source unit, which emits the exposure light beam, and is used for receiving the exposure light beam and reflecting a reflected light beam;
a first focusing lens disposed on a light beam transfer path between the light source unit and the reflecting mirror;
the spatial light modulator is arranged on one side of the reflecting beam reflected by the reflecting mirror and used for generating a pixel pattern or a pixel mask pattern;
the imaging unit is arranged on one side of the spatial light modulator, which outputs the pixel pattern, and is used for performing high-resolution imaging on the pixel pattern or the pixel mask pattern;
and the second focusing lens is arranged on a light beam transmission path between the spatial light modulator and the imaging unit.
2. The optical engine system as claimed in claim 1, wherein the first focusing lens and the second focusing lens are aspheric lenses.
3. The optical engine system as claimed in claim 1, wherein the light source unit comprises:
an exposure light source;
one end of the optical fiber is connected with the output end of the exposure light source;
and the light collimation and homogenization device is connected with the other end of the optical fiber and is used for outputting the exposure light beam after collimation and/or homogenization treatment.
4. The optical engine system as claimed in claim 3, wherein the exposure light source is a blue-violet light source.
5. The optical engine system of claim 3, wherein the optical fiber is a square optical fiber.
6. The optical engine system as claimed in claim 1, wherein the imaging unit comprises:
the imaging lens is provided with a light inlet and a light outlet, the light inlet is positioned at one side close to the spatial light modulator, and the light outlet is positioned at one side far away from the spatial light modulator;
and the imaging focal plane is arranged on one side close to the light outlet.
7. The optical engine system as claimed in claim 6, wherein the numerical aperture of the imaging lens is in a range of 0.25 to 0.5.
8. The optical engine system of claim 6, wherein the imaging lens is a telecentric lens.
9. The optical engine system of claim 1, wherein the spatial light modulator is a digital micromirror device.
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| CN202221247325.6U CN217467464U (en) | 2022-05-19 | 2022-05-19 | Optical engine system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221247325.6U CN217467464U (en) | 2022-05-19 | 2022-05-19 | Optical engine system |
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| CN217467464U true CN217467464U (en) | 2022-09-20 |
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Effective date of registration: 20240131 Address after: 528400 No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee after: Zhongshan Xinnuo Microelectronics Co.,Ltd. Country or region after: China Address before: 528400 No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee before: ZHONGSHAN AISCENT TECHNOLOGIES Co.,Ltd. Country or region before: China |