CN117425751A - 电沉积暗铬层的方法、包含其的衬底及其电镀浴 - Google Patents
电沉积暗铬层的方法、包含其的衬底及其电镀浴 Download PDFInfo
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- CN117425751A CN117425751A CN202280040771.6A CN202280040771A CN117425751A CN 117425751 A CN117425751 A CN 117425751A CN 202280040771 A CN202280040771 A CN 202280040771A CN 117425751 A CN117425751 A CN 117425751A
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- trivalent chromium
- sulfur
- plating bath
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- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- ULSZVNJBVJWEJE-UHFFFAOYSA-N thiazolidine-2-carboxylic acid Chemical compound OC(=O)C1NCCS1 ULSZVNJBVJWEJE-UHFFFAOYSA-N 0.000 description 1
- 229950006389 thiodiglycol Drugs 0.000 description 1
- 150000004886 thiomorpholines Chemical class 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical group [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21178841.9A EP4101947A1 (fr) | 2021-06-10 | 2021-06-10 | Procédé d'électrodéposition d'une couche de chrome noir, substrat la comprenant et son bain d'électrodéposition |
| EP21178841.9 | 2021-06-10 | ||
| PCT/EP2022/065531 WO2022258680A1 (fr) | 2021-06-10 | 2022-06-08 | Procédé d'électrodéposition d'une couche de chrome sombre, substrat la comprenant et bain d'électroplacage associé |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117425751A true CN117425751A (zh) | 2024-01-19 |
Family
ID=76392184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280040771.6A Pending CN117425751A (zh) | 2021-06-10 | 2022-06-08 | 电沉积暗铬层的方法、包含其的衬底及其电镀浴 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240271305A1 (fr) |
| EP (1) | EP4101947A1 (fr) |
| JP (1) | JP2024520816A (fr) |
| CN (1) | CN117425751A (fr) |
| TW (1) | TW202314050A (fr) |
| WO (1) | WO2022258680A1 (fr) |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2231581C1 (ru) | 2002-12-25 | 2004-06-27 | Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" | Электролит хромирования и способ получения хромового покрытия на стальных деталях |
| BRPI0710028B1 (pt) * | 2006-03-31 | 2018-02-14 | Atotech Deutschland Gmbh | Depósito de cromo funcional cristalino, seu processo de eletrodeposição, e banho de eletrodeposição |
| EP2336390B1 (fr) | 2008-09-29 | 2014-07-30 | Yuken Industry Co., Ltd. | Composition pour traitement de transformation chimique et procédé de production d un élément pourvu d un revêtement noir à l aide de ladite composition |
| TW201125753A (en) * | 2010-01-19 | 2011-08-01 | Hon Hai Prec Ind Co Ltd | Casing having color and the related surface-treating method |
| US8273235B2 (en) | 2010-11-05 | 2012-09-25 | Roshan V Chapaneri | Dark colored chromium based electrodeposits |
| CN102618825A (zh) * | 2011-01-28 | 2012-08-01 | 鸿富锦精密工业（深圳）有限公司 | 壳体及其制作方法 |
| JP5890394B2 (ja) | 2011-03-31 | 2016-03-22 | 日本化学工業株式会社 | 三価クロムめっき液 |
| US9689081B2 (en) * | 2011-05-03 | 2017-06-27 | Atotech Deutschland Gmbh | Electroplating bath and method for producing dark chromium layers |
| CN103895279B (zh) * | 2012-12-29 | 2017-07-18 | 深圳富泰宏精密工业有限公司 | 镀膜件及其制备方法 |
| MX2015008897A (es) * | 2013-01-10 | 2016-02-05 | Coventya Inc | Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente. |
| CN104070913B (zh) * | 2013-03-29 | 2017-06-13 | 深圳富泰宏精密工业有限公司 | 壳体及其制作方法 |
| WO2015198914A1 (fr) * | 2014-06-23 | 2015-12-30 | 奥野製薬工業株式会社 | Film multicouche de placage et objet présentant un film multicouche de placage |
| CN111663100B (zh) * | 2020-06-15 | 2022-05-31 | 福建新越金属材料科技有限公司 | 一种不锈钢基材的装饰性涂层 |
-
2021
- 2021-06-10 EP EP21178841.9A patent/EP4101947A1/fr active Pending
-
2022
- 2022-06-08 TW TW111121142A patent/TW202314050A/zh unknown
- 2022-06-08 WO PCT/EP2022/065531 patent/WO2022258680A1/fr active Application Filing
- 2022-06-08 US US18/568,352 patent/US20240271305A1/en active Pending
- 2022-06-08 JP JP2023575932A patent/JP2024520816A/ja active Pending
- 2022-06-08 CN CN202280040771.6A patent/CN117425751A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW202314050A (zh) | 2023-04-01 |
| US20240271305A1 (en) | 2024-08-15 |
| WO2022258680A1 (fr) | 2022-12-15 |
| EP4101947A1 (fr) | 2022-12-14 |
| JP2024520816A (ja) | 2024-05-24 |
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