CN117369223B - Leveling device and photoetching machine - Google Patents
Leveling device and photoetching machine Download PDFInfo
- Publication number
- CN117369223B CN117369223B CN202311676029.7A CN202311676029A CN117369223B CN 117369223 B CN117369223 B CN 117369223B CN 202311676029 A CN202311676029 A CN 202311676029A CN 117369223 B CN117369223 B CN 117369223B
- Authority
- CN
- China
- Prior art keywords
- base
- assembly
- hole
- groove
- locking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
Links
- 238000001259 photo etching Methods 0.000 title description 16
- 239000000758 substrate Substances 0.000 claims abstract description 70
- 238000006073 displacement reaction Methods 0.000 claims abstract description 43
- 238000001514 detection method Methods 0.000 claims abstract description 23
- 230000000712 assembly Effects 0.000 claims abstract description 13
- 238000000429 assembly Methods 0.000 claims abstract description 13
- 230000001174 ascending effect Effects 0.000 claims abstract description 3
- 238000007789 sealing Methods 0.000 claims description 47
- 235000014676 Phragmites communis Nutrition 0.000 claims description 24
- 230000006835 compression Effects 0.000 claims description 13
- 238000007906 compression Methods 0.000 claims description 13
- 238000005096 rolling process Methods 0.000 claims description 5
- 238000001459 lithography Methods 0.000 abstract 2
- 238000004891 communication Methods 0.000 description 13
- 238000000605 extraction Methods 0.000 description 7
- 238000003825 pressing Methods 0.000 description 6
- 238000007667 floating Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 230000003139 buffering effect Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention relates to the technical field of lithography machines, and discloses a leveling device and a lithography machine. The leveling device comprises a sucker assembly, a mask table, a vertical movement table and at least three leveling assemblies. The adjustment balls of at least three leveling assemblies are not in a straight line; the vertical driving component is in driving connection with the base, and is used for driving the base to lift and further driving the base to lift so as to enable the base to be abutted against the lower end point of the adjusting ball and enable the mask plate to be abutted against the upper end point of the adjusting ball; the displacement sensor is arranged between the base and the carrier part and is used for detecting the displacement of the carrier part relative to the base; the control module is used for receiving the detection result of the detection assembly and controlling the vertical driving assembly according to the detection result, when the vertical driving assembly drives the base to ascend, if the detection result is that the displacement detected by the displacement sensor is larger than or equal to a preset value, the substrate and the mask plate reach a parallel state, and the control module controls the vertical driving assembly to stop ascending.
Description
Technical Field
The invention relates to the technical field of photoetching machines, in particular to a leveling device and a photoetching machine.
Background
Photolithography is a process technique that exposes a mask pattern to light and images onto a substrate and is an important step in the semiconductor device manufacturing process. In a lithographic apparatus, the carriers carrying the reticles/substrates are moved precisely relative to each other to meet lithographic requirements. When in photoetching, the mask plate and the substrate need to be kept in a parallel state, the substrate and the mask plate are parallel by only adjusting the displacement of the substrate, but the parallelism error between the leveling product carrier and the mask table is large, the leveling needs to be repeatedly performed, and the leveling precision is low.
In view of the foregoing, there is a need for a leveling device and a lithographic apparatus that solve the above-mentioned problems.
Disclosure of Invention
Based on the above, the invention aims to provide a leveling device and a photoetching machine, which can quickly adjust a substrate and a mask plate to a parallel state, improve the photoetching processing quality, and have the advantages of simple structure, low cost and convenient operation.
In order to achieve the above purpose, the invention adopts the following technical scheme:
in one aspect, there is provided a leveling device for adjusting a substrate and a mask plate to a parallel state, the leveling device comprising:
A chuck assembly for sucking the substrate;
the mask table is positioned above the sucker assembly and is used for placing the mask plate;
at least three leveling assemblies, wherein the leveling assemblies comprise adjusting balls, the adjusting balls are arranged between the substrate and the mask plate, and the adjusting balls of the at least three leveling assemblies are not in a straight line;
the vertical motion platform comprises a base, a carrier part, an elastic part and a vertical driving assembly, wherein the sucker assembly is arranged above the carrier part, the carrier part is arranged above the base through the elastic part, the vertical driving assembly is in driving connection with the base, and the vertical driving assembly is used for driving the base to lift and further driving the base to lift so as to enable the base to be abutted to the lower end point of the adjusting ball and enable the mask plate to be abutted to the upper end point of the adjusting ball;
the detection assembly comprises a displacement sensor, wherein the displacement sensor is arranged between the base and the carrier part and is used for detecting the displacement of the carrier part relative to the base;
and the control module is used for receiving the detection result of the detection assembly and controlling the vertical driving assembly according to the detection result, and when the vertical driving assembly drives the base to ascend, if the detection result is that the displacement detected by the displacement sensor is greater than or equal to a preset value, the substrate and the mask plate reach a parallel state, and the control module controls the vertical driving assembly to stop ascending.
As a preferable technical solution of the leveling device, the vertical movement table further includes a plurality of guide members, the plurality of guide members are annularly disposed on the carrier member, and the guide members include:
a guide frame connected to the stage member, the guide frame being provided with a guide groove extending in a vertical direction;
the lifting support is installed on the base, the guide pulley is rotationally connected with the lifting support, and the guide pulley is arranged in the guide groove in a rolling mode.
As a preferable technical scheme of the leveling device, the guide component further comprises a locking rod and a locking cylinder, the base is provided with a locking hole extending along the vertical direction, the locking rod is slidably arranged in the locking hole, and the locking rod can be abutted to the bottom of the guide frame;
the lateral wall in locking hole is provided with dodges the hole, the locking cylinder set up in the base, the piston is installed to the output of locking cylinder, the locking cylinder can drive the piston passes dodge the hole and the butt in the lateral wall of locking lever.
As a preferable technical scheme of the leveling device, the guide member further comprises a decoupling member, one end of the decoupling member is connected to the guide frame, and the other end is connected to the locking rod.
As a preferable technical scheme of the leveling device, the carrier part is provided with a plurality of first connecting holes, the side wall of the base is provided with a plurality of limit grooves, and the top walls of the limit grooves are respectively provided with a second connecting hole;
the vertical movement table further comprises a plurality of limiting parts, and the limiting parts are annularly arranged on the base; the limiting member includes:
the limiting rod penetrates through the first connecting hole and the second connecting hole and stretches into the limiting groove, a first limiting part and a second limiting part are respectively arranged at two ends of the limiting rod, and the first limiting part can be abutted to the end face of one end, far away from the second connecting hole, of the first connecting hole;
a limiting block which is arranged on the side wall of the base;
the limiting connecting rod is hinged to the limiting block;
the adjusting rod is in threaded connection with the limiting block, the end part of the adjusting rod can be in butt joint with the first end of the limiting connecting rod, and the second end of the limiting connecting rod is provided with a clamping groove;
the limiting connecting rod rotates, so that the limiting rod is embedded in the clamping groove, and the second end of the limiting connecting rod can stop the second limiting part from moving upwards.
As a preferable technical scheme of the leveling device, the elastic component comprises a plurality of springs, the springs are uniformly arranged between the carrier component and the base, one end of each spring is connected to the bottom of the carrier component, and the other end of each spring is connected to the top of the base; and/or
The elastic component includes a plurality of pressure compensation cylinder, and a plurality of pressure compensation cylinder is encircled and is located the base, pressure compensation cylinder install in on the base, pressure compensation cylinder's output connect in the bottom of carrier part.
As a preferable technical scheme of the leveling device, a through hole and at least three mounting grooves are formed in the mask table, the three mounting grooves are annularly arranged in the through hole, the mounting grooves extend along the radial direction of the through hole, and the mask plate is arranged above the through hole;
the leveling assembly further comprises a reed, a first end of the reed is connected into the mounting groove, a second end of the reed is connected with the adjusting ball, and the adjusting ball is located in the through hole.
As a preferable technical scheme of the leveling device, the leveling assembly further comprises a driving component, the driving component is mounted on the end face of the mounting groove, the driving component is connected with the first end of the reed in a driving mode, and the driving component is used for driving the adjusting ball to move along the radial direction of the mounting groove so that the adjusting ball leaves the lower portion of the mask plate or moves to the lower portion of the mask plate.
As a preferred technical scheme of the leveling device, the carrier part comprises a bottom plate, a supporting rod and a mounting seat;
the base plate is connected to the base, the mounting seat is fixed above the base plate through the supporting rods, the number of the supporting rods is at least three, and at least three supporting rods are uniformly arranged between the base plate and the mounting seat.
As a preferable technical scheme of the leveling device, the sucker assembly comprises a sucker and a base, the sucker is arranged on the base, the carrier part is provided with a fixing groove, and the base is embedded in the fixing groove;
the leveling device further comprises a locking assembly, the locking assembly comprises a locking screw and a compression block, a threaded hole extending along the radial direction is formed in the side wall of the fixing groove, a positioning hole extending along the radial direction is formed in the side wall of the sucker assembly, the compression block is installed in the positioning hole, a conical groove is formed in one end, close to the locking screw, of the compression block, the end portion of the locking screw is conical, the locking screw is in threaded connection with the threaded hole, and the end portion of the locking screw abuts against the conical groove; the distance between the axis of the conical groove and the bottom of the fixed groove is larger than the distance between the axis of the locking screw and the bottom of the fixed groove.
As a preferred technical scheme of levelling device, levelling device still includes seal assembly, seal assembly includes annular sealing block and flexible sealing member, the lateral wall of base is echelonment, the lateral wall of base includes major diameter section, step face and path section, the major diameter section inlays and locates in the fixed slot, annular sealing block install in on the step face, annular sealing block is provided with the inflation passageway, flexible sealing member sealing connection in the one end that the inflation passageway is close to the mask plate, the inflation passageway communicates in air supply equipment, when the inflation passageway is inflated, flexible sealing member upwards arches in order to seal laminating the mask plate.
In another aspect, a lithographic apparatus is provided, comprising a leveling device according to any of the above aspects.
The beneficial effects of the invention are as follows:
the invention provides a leveling device and a photoetching machine, wherein an elastic part is arranged between a carrier part and a base while leveling a substrate and a mask plate based on three groups of leveling components, on one hand, when the substrate contacts an adjusting ball of the leveling component, the base can move relative to the carrier part, the elastic part plays a role in buffering to prevent the substrate and the mask plate from being in hard contact with the adjusting ball, so that the damage of the substrate or the mask plate is effectively avoided, and on the other hand, the elastic part can play a role in gravity compensation on the carrier part, a sucker component and the substrate, thereby being beneficial to improving the leveling precision and the processing quality of subsequent photoetching; meanwhile, the detection assembly and the control module are also arranged, and the elastic component is matched, so that the relative position of the base and the carrier component can be detected in the leveling process, whether leveling is in place or not is judged through the relative position of the base and the carrier component, and the leveling precision can be further improved. When the leveling device and the photoetching machine are in leveling, the vertical driving assembly drives the base to rise, the base drives the carrier part, the sucker assembly and the substrate to rise until the substrate is abutted against the lower end point of the adjusting ball, the mask plate is abutted against the upper end point of the adjusting ball, at the moment, the position of the substrate abutted against the lower end point of the adjusting ball cannot continuously move, the base compresses the elastic part to move towards one side close to the carrier part, the displacement sensor detects the displacement of the carrier part relative to the base, when the displacement detected by the displacement sensor is larger than or equal to a preset value, the substrate is abutted against the lower end points of the three adjusting balls, the mask plate is abutted against the upper end points of the three adjusting balls, according to the principle that one plane is determined by three points, the distance between the lower surface of the mask plate and the upper surface of the substrate is equal to the diameter of the adjusting ball, the substrate and the mask plate reach a parallel state, and the control module controls the vertical driving assembly to stop rising. The invention realizes the rapid adjustment of the substrate and the mask plate to the parallel state, improves the processing quality of photoetching, and has the advantages of simple structure, low cost and convenient operation.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following description will briefly explain the drawings needed in the description of the embodiments of the present invention, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to the contents of the embodiments of the present invention and these drawings without inventive effort for those skilled in the art.
FIG. 1 is a schematic view of a leveling device according to an embodiment of the present invention;
FIG. 2 is an exploded view of a leveling device according to an embodiment of the present invention;
FIG. 3 is one of the partial cross-sectional views of a leveling device provided in accordance with an embodiment of the present invention;
fig. 4 is an enlarged view of fig. 2 at F;
FIG. 5 is a second partial cross-sectional view of a leveling device according to an embodiment of the present invention;
FIG. 6 is an enlarged view of FIG. 1 at A;
FIG. 7 is an exploded view of a portion of the construction of a leveling device according to an embodiment of the present invention;
FIG. 8 is an exploded view of a leveling assembly according to an embodiment of the present invention;
FIG. 9 is a third partial cross-sectional view of a leveling device according to an embodiment of the present invention;
FIG. 10 is a cross-sectional view of a portion of a leveling device according to an embodiment of the present invention;
FIG. 11 is a top view of a chuck assembly provided in accordance with an embodiment of the present invention;
fig. 12 is an enlarged view of fig. 11 at B;
fig. 13 is an enlarged view of fig. 11 at C;
FIG. 14 is a fifth partial cross-sectional view of a leveling device provided in accordance with an embodiment of the present invention;
fig. 15 is an enlarged view of fig. 14 at D;
fig. 16 is an enlarged view of fig. 9 at E.
The figures are labeled as follows:
10. a mask plate;
1. a suction cup assembly; 11. a suction cup; 111. a first air hole; 112. an air extraction groove; 113. a second air hole; 114. a first gas passage; 115. a second gas passage; 116. an annular groove; 117. a communication groove; 118. a first annular seal groove; 12. a base; 121. a third gas passage;
2. a mask stage; 21. a through hole; 22. a mounting groove; 23. a mounting hole;
3. a leveling assembly; 31. a reed; 311. a third connection hole; 312. a fourth connection hole; 32. an adjusting ball; 33. a driving part; 331. a driving cylinder; 3311. a telescopic rod; 332. a limiting piece; 3321. a receiving groove; 3322. a semicircular groove; 333. a first screw;
4. a vertical motion platform; 41. a base; 42. a stage member; 421. a mounting base; 4211. a fixing groove; 422. a bottom plate; 423. a support rod; 43. an elastic member; 431. a spring; 432. a pressure compensating cylinder; 44. a guide member; 441. a guide frame; 442. a lifting bracket; 443. a guide pulley; 444. a locking lever; 445. a locking cylinder; 4451. a piston; 446. a decoupling member; 447. a first connecting rod; 448. a second connecting rod; 449. a pre-tightening spring; 45. a limiting member; 451. a limit rod; 452. a limiting block; 453. a limit connecting rod; 454. an adjusting rod;
5. A detection assembly; 51. a displacement sensor;
6. a locking assembly; 61. a locking screw; 62. a compaction block; 621. a conical groove;
7. a seal assembly; 71. an annular sealing block; 711. an inflation channel; 712. a second annular seal groove; 72. a flexible seal; 721. an air-filling cavity; 73. briquetting; 731. and a first air charging hole.
Detailed Description
The invention is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting thereof. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present invention are shown in the drawings.
In the description of the present invention, unless explicitly stated and limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
In the description of the present embodiment, the terms "upper", "lower", "left", "right", and the like are orientation or positional relationships based on those shown in the drawings, merely for convenience of description and simplicity of operation, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the invention. Furthermore, the terms "first," "second," and the like, are used merely for distinguishing between descriptions and not for distinguishing between them.
As shown in fig. 1, 2 and 6, the present embodiment provides a lithographic apparatus comprising a leveling device comprising a chuck assembly 1, a mask table 2, a vertical motion table 4 and at least three leveling assemblies 3.
Specifically, the suction cup assembly 1 is used for sucking a substrate; the mask table 2 is positioned above the sucker assembly 1 and is used for placing a mask plate 10; the leveling assemblies 3 comprise adjusting balls 32, the adjusting balls 32 are arranged between the substrate and the mask plate 10, and the adjusting balls 32 of at least three leveling assemblies 3 are not in a straight line; the vertical motion platform 4 comprises a base 41, a carrier part 42, an elastic part 43 and a vertical driving component, the sucker component 1 is arranged above the carrier part 42, the carrier part 42 is arranged above the base 41 through the elastic part 43, the vertical driving component is in driving connection with the base 41, and the vertical driving component is used for driving the base 41 to lift and further drive the sucker component 1 and a substrate on the sucker component 1 to lift so as to enable the substrate to be abutted to the lower end point of the adjusting ball 32 after being lifted, and enable the mask plate 10 to be abutted to the upper end point of the adjusting ball 32; the detection assembly 5 includes a displacement sensor 51, the displacement sensor 51 is disposed between the base 41 and the stage member 42, and the displacement sensor 51 is used for detecting the displacement of the stage member 42 relative to the base 41; the control module is configured to receive a detection result of the detection assembly 5, and control the vertical driving assembly according to the detection result, when the vertical driving assembly drives the base 41 to rise, if the detection result is that the displacement amount detected by the displacement sensor 51 is greater than or equal to a preset value, the substrate and the mask plate 10 reach a parallel state, and the control module controls the vertical driving assembly to stop rising, otherwise, the control module continuously controls the vertical driving assembly to rise until the displacement amounts detected by the displacement sensor 51 are all greater than or equal to the preset value. It should be noted that, the vertical driving assembly may be driven by a driving device such as a lead screw motor or a voice coil motor, which is the prior art.
The elastic component 43 is arranged between the carrier component 42 and the base 41 while leveling the substrate and the mask plate 10 based on the three groups of leveling components 3, on one hand, when the substrate contacts the adjusting ball 32 of the leveling component 3, the base 41 can move relative to the carrier component 42, the elastic component 43 plays a role in buffering to prevent the substrate and the mask plate 10 from being in hard contact with the adjusting ball 32, so that the damage of the substrate or the mask plate 10 is effectively avoided, and on the other hand, the elastic component 43 can play a role in gravity compensation on the carrier component 42, the sucker 11 component 1 and the substrate, thereby being beneficial to improving the leveling precision and the processing quality of subsequent photoetching; meanwhile, the detection assembly 5 and the control module are also arranged, and the elastic component 43 is matched, so that the relative position of the base 41 and the carrier component 42 can be detected in the leveling process, whether leveling is in place or not can be judged through the relative position of the base 41 and the carrier component 42, and the leveling precision can be further improved. When the leveling device and the photoetching machine are leveled, the vertical driving component drives the base 41 to rise, the base 41 drives the carrier part 42, the sucker component 1 and the substrate to rise until the substrate is abutted against the lower end point of the adjusting ball 32, the mask plate 10 is abutted against the upper end point of the adjusting ball 32, at the moment, the position of the substrate abutted against the lower end point of the adjusting ball 32 cannot continuously move, the base 41 compresses the elastic component 43 to move towards one side close to the carrier part 42, the displacement sensor 51 detects the displacement of the carrier part 42 relative to the base 41, when the displacement detected by the displacement sensor 51 is larger than or equal to a preset value, the substrate is proved to be abutted against the lower end points of the three adjusting balls 32, the mask plate 10 is abutted against the upper end points of the three adjusting balls 32, according to the principle that one plane is determined by three points, the distance between the lower surface of the mask plate 10 and the upper surface of the substrate is the diameter of the adjusting ball 32, the substrate and the mask plate 10 reach a parallel state, and the control module controls the vertical driving component to stop rising. If the displacement amount detected by the partial displacement sensor 51 is smaller than the preset value, it is verified that the substrate portion corresponding to the detection portion of the displacement sensor 51 smaller than the preset value has not been in contact with the adjustment ball 32, and thus the substrate and the mask plate 10 do not reach the parallel state. The embodiment realizes the rapid adjustment of the substrate and the mask plate 10 to a parallel state, improves the processing quality of photoetching, and has the advantages of simple structure, low cost and convenient operation.
Preferably, the detecting assembly 5 includes three displacement sensors 51, the displacement sensors 51 are uniformly disposed between the base 41 and the stage member 42, when the displacement amounts detected by all the displacement sensors 51 are equal to or greater than a preset value, three position points detected by the three displacement sensors 51 reach a specified position, and the substrate and the mask plate 10 reach a parallel state according to the principle that one plane is determined by three points.
In this embodiment, as shown in fig. 2, the stage member 42 includes a bottom plate 422, a support rod 423, and a mounting seat 421; the bottom plate 422 is connected to the base 41, the mounting seat 421 is fixed above the bottom plate 422 through the supporting rods 423, the number of the supporting rods 423 is at least three, and at least three supporting rods 423 are uniformly arranged between the bottom plate 422 and the mounting seat 421.
Preferably, as shown in fig. 2-4, the vertical motion stage 4 further includes a plurality of guide members 44, the plurality of guide members 44 are disposed around the stage member 42, the guide members 44 include a guide frame 441, a lifting support 442 and a guide pulley 443, the guide frame 441 is connected to the stage member 42, and the guide frame 441 is provided with a guide groove extending in a vertical direction; one end of the lifting bracket 442 is mounted on the base 41, the guide pulley 443 is rotatably connected to the other end of the lifting bracket 442, and the guide pulley 443 is rotatably disposed in a guide groove of the guide bracket 441. When the carrier member 42 moves relative to the base 41, the guide pulley 443 rotates on the lifting bracket 442 and is disposed in the guide slot in a rolling manner, and the guide slot provides guidance for the lifting bracket 442, thereby providing guidance and limitation in a horizontal direction for the movement of the carrier member 42 relative to the base 41. Preferably, the width of the guide slot is larger than the width of the guide pulley 443, so that the carrier member 42 can generate a certain inclination angle relative to the base 41, and motion decoupling of the carrier member 42 and the base 41 is realized, so that the carrier can generate small-angle deflection besides vertical motion, the accurate leveling of the substrate and the mask plate 10 can be further ensured, and the substrate can be passively leveled relative to the mask plate 10. In this embodiment, the guide frame 441 is connected to the bottom of the mounting seat 421 of the stage member 42.
As an alternative embodiment, the guide pulley 443 is composed of a second limiting member and two rolling bearings, where the two rolling bearings clamp the limiting sliding sheet, so that the second limiting member is rotatably disposed on the lifting bracket 442, and the second limiting member is clamped in the guide slot of the guide frame 441.
Further preferably, the guide member 44 further includes a locking lever 444 and a locking cylinder 445, the base 41 is provided with a locking hole extending in the vertical direction, the locking lever 444 is slidably disposed in the locking hole, and the locking lever 444 can abut against the bottom of the guide frame 441; the side wall of the locking hole is provided with a avoiding hole, the locking cylinder 445 is arranged in the base 41, the output end of the locking cylinder 445 is provided with a piston 4451, and the locking cylinder 445 can drive the piston 4451 to pass through the avoiding hole and abut against the side wall of the locking rod 444. When the stage member 42 moves relative to the base 41, the lock lever 444 slides in the lock hole, and does not interfere with the movement of the stage member 42 relative to the base 41 toward each other. When the substrate and the mask plate 10 reach a parallel state, at this time, the locking cylinder 445 drives the piston 4451 to pass through the avoidance hole and abut against the side wall of the locking rod 444, and the locking rod 444 is fixed on the base 41 by virtue of the friction force between the piston 4451 and the locking rod 444, and because the locking rod 444 abuts against the bottom of the guide frame 441, the carrier part 42 cannot move towards the direction close to the base 41 at this time, so that the fixation of the carrier part 42 and the base 41 is realized, the stability of the substrate is further improved, the processing quality of the substrate is improved, and the shaking of the carrier part 42 is avoided, so that the quality of a subsequent mask is influenced; when the piston 4451 is disengaged from the lock lever 444, the stage member 42 is free to move. Further, a sealing groove is further formed in the side wall of the piston 4451, and a sealing ring is arranged in the sealing groove, so that the sealing performance between the piston 4451 and the base 41 can be improved.
Preferably, the guide member 44 further includes a decoupling member 446, one end of the decoupling member 446 is connected to the guide frame 441, and the other end is connected to the locking lever 444, and the decoupling member 446 achieves decoupling between the guide frame 441 and the locking lever 444. In this embodiment, the decoupling member 446 is a sphere, the sphere is mounted on the end surface of the locking rod 444 near one end of the guide frame 441, the sphere can be abutted against the bottom of the guide frame 441, and the guide frame 441 is in point contact with the sphere, so that the guide frame 441 can tilt relative to the locking rod 444, further the carrier member 42, the suction cup assembly 1 and the substrate can tilt, motion decoupling between the locking rod 444 and the carrier member 42 is realized, and leveling action of the substrate is prevented from being interfered. In other embodiments, the decoupling member 446 can also be a reed.
Further, the guiding component 44 further includes a first connecting rod 447, a second connecting rod 448 and two pre-tightening springs 449, wherein the first connecting rod 447 is penetrating through the bottom of the guiding frame 441, the second connecting rod 448 is penetrating through the top of the locking rod 444, one pre-tightening spring 449 is connected between the first end of the first connecting rod 447 and the first end of the second connecting rod 448, and the other pre-tightening spring 449 is connected between the second end of the first connecting rod 447 and the second end of the second connecting rod 448, so as to pre-tighten the guiding frame 441 and the locking rod 444; further, the top of the locking rod 444 is provided with a plurality of through holes extending along the radial direction of the locking rod 444 and distributed along the length direction of the locking rod 444, the second connecting rod 448 can be inserted into the through holes, and the distance between the second connecting rod 448 and the first connecting rod 447 can be adjusted by arranging a plurality of through holes, so that the expansion and contraction amount of the pre-tightening spring 449 can be adjusted, and the purpose of adjusting the pre-tightening force can be achieved.
Further, as shown in fig. 5, the carrier member 42 is provided with a plurality of first connection holes, the side wall of the base 41 is provided with a plurality of limit grooves, and the top walls of the limit grooves are provided with second connection holes; the vertical movement table 4 further comprises a plurality of limiting components 45, and the limiting components 45 are annularly arranged on the base 41; the limiting component 45 comprises a limiting rod 451, a limiting block 452, a limiting connecting rod 453 and an adjusting rod 454, the limiting rod 451 is arranged in the first connecting hole and the second connecting hole in a penetrating mode and extends into the limiting groove, a first limiting part and a second limiting part are respectively arranged at two ends of the limiting rod 451, and the first limiting part can be abutted to the end face of one end, far away from the second connecting hole, of the first connecting hole; the limiting block 452 is mounted on the side wall of the base 41; the limiting connecting rod 453 is hinged to the limiting block 452; the adjusting rod 454 is in threaded connection with the limiting block 452, the end part of the adjusting rod 454 can be in butt joint with the first end of the limiting connecting rod 453, and the second end of the limiting connecting rod 453 is provided with a clamping groove; the limiting connecting rod 453 rotates to enable the limiting rod 451 to be embedded in the clamping groove, and the second end of the limiting connecting rod 453 can stop the second limiting portion from moving upwards. Wherein, the stop lever 451 is used for connecting the base 41 and the carrier member 42, when the second end of the stop link 453 stops the second stop portion to move upwards, the first stop portion abuts against the end surface of the first connecting hole far away from one end of the second connecting hole, and at this time, the maximum distance between the carrier member 42 and the base 41 can be limited. The second end of the limit link 453 is further adjusted by adjusting the rotation angle of the limit link 453, so that the horizontal positions of the stage member 42, the chuck assembly 1, and the substrate are further adjusted. In this embodiment, the first connection hole is provided on the bottom plate 422 of the stage member 42. It should be noted that, the limiting rod 451 may be a bolt structure, and the lock bolt is provided with a nut, where one of the head of the bolt and the nut forms a first limiting portion, and the other forms a second limiting portion, and by adjusting the screwing depth of the nut, the horizontal positions of the stage member 42, the suction cup assembly 1 and the substrate can also be adjusted.
Further, the elastic member 43 includes a plurality of springs 431, wherein the plurality of springs 431 are uniformly disposed between the stage member 42 and the base 41, and one end of the spring 431 is connected to the bottom of the stage member 42 and the other end is connected to the top of the base 41; and/or, the elastic member 43 includes a plurality of pressure compensation cylinders 432, the plurality of pressure compensation cylinders 432 are annularly disposed on the base 41, the pressure compensation cylinders 432 are mounted on the base 41, and an output end of the pressure compensation cylinders 432 is connected to a bottom of the stage member 42. In this embodiment, the elastic member 43 includes three springs 431 and three pressure compensating cylinders 432, where the pressure compensating cylinders 432 may be constant pressure cylinders or common cylinders, and the types of the pressure compensating cylinders 432 and the springs 431 may be adaptively selected according to the use requirements. By providing the elastic member 43, on the one hand, the base 41 can move and deflect relative to the stage member 42 when the substrate contacts the adjustment ball 32, the elastic member 43 having a cushioning effect preventing the substrate and the mask 10 from being in hard contact with the adjustment ball 32; on the other hand, the elastic member 43 can function as gravity compensation for the stage member 42, the chuck assembly 1, and the substrate.
Further, as shown in fig. 1, 6 and 7, the mask stage 2 is provided with a through hole 21 and at least three mounting grooves 22, the three mounting grooves 22 are annularly arranged on the through hole 21, the mounting grooves 22 extend along the radial direction of the through hole 21, and the mask plate 10 is placed above the through hole 21; the leveling assembly 3 further comprises a reed 31, a first end of the reed 31 is connected to the inside of the mounting groove 22, a second end of the reed 31 is connected to an adjusting ball 32, and the adjusting ball 32 is located in the through hole 21. Specifically, the mask stage 2 is further provided with an adsorption structure for adsorbing and fixing the mask plate 10 on the mask stage 2, so as to avoid displacement of the mask plate 10 after being stressed.
Wherein, adjusting ball 32 is connected in mounting groove 22 of mask table 2 through reed 31, and mounting groove 22 provides the location for leveling subassembly 3 position, and when needing to carry out the photoetching processing, vertical drive assembly drive base rises, and the base contacts adjusting ball 32 at first, then the base continues to rise into through-hole 21, and reed 31 produces deformation, and until the base butt is in adjusting ball 32's lower extreme point, mask plate 10 butt is in adjusting ball 32's upper extreme point. Because the at least three adjusting balls 32 are arranged between the mask plate 10 and the substrate, according to the principle that a plane is determined by three points, the distance between the lower surface of the mask plate 10 and the upper surface of the substrate is the diameter of the adjusting balls 32, and the substrate is passively leveled at the moment, so that the substrate and the mask plate 10 are adjusted to be in a parallel state, the photoetching processing quality is improved, and the leveling device has the advantages of simple structure, low cost and convenience in operation.
Preferably, as shown in fig. 1 and 6-8, the leveling assembly 3 further includes a driving member 33, wherein the driving member 33 is mounted on an end surface of the mounting groove 22, and the driving member 33 is drivingly connected to the first end of the reed 31, and the driving member 33 is used for driving the adjusting ball 32 to move along a radial direction of the mounting groove 22, so that the adjusting ball 32 moves away from the lower side of the mask plate 10 or moves to the lower side of the mask plate 10. The adjusting balls 32 are driven by the driving part 33 to leave the lower part of the mask plate 10 and avoid the positions of the through holes 21, so that the mask plate 10 can be replaced or assembled, and the operation convenience is improved. When photolithography processing is required, the driving part 33 drives the adjustment ball 32 to move below the mask plate 10. Further, the driving member 33 can drive the adjustment ball 32 to linearly move in the radial direction of the mounting groove 22; alternatively, the driving member 33 can drive the adjustment ball 32 to move rotationally in the radial direction of the mounting groove 22.
Preferably, the driving part 33 includes a driving cylinder 331 and a limiting member 332, and the telescopic rod 3311 of the driving cylinder 331 and the first end of the reed 31 are both connected to the limiting member 332, and the limiting member 332 is slidably disposed in the mounting groove 22. On the one hand, the connection of the reed 31 with the driving cylinder 331 is achieved by the stopper 332; on the other hand, the mounting groove 22 can provide a guide for the stopper 332, improving the moving accuracy of the stopper 332, the reed 31 and the adjustment ball 32. Further preferably, the mounting groove 22 is provided with a mounting hole 23 at an end thereof remote from the through hole 21, and the driving cylinder 331 is mounted in the mounting hole 23.
Preferably, the bottom of the mounting groove 22 is provided with a sliding rail, and the limiting piece 332 is connected with a sliding block, and the sliding block is slidably connected to the sliding rail, so that the moving precision of the leveling component 3 relative to the mask table 2 is further improved.
Preferably, the first end of reed 31 is snapped, glued or otherwise attached to stop 332 by a fastener. In this embodiment, at least two first threaded holes are formed in the side wall of the limiting member 332, a plurality of fourth connecting holes 312 are formed in the first end of the reed 31, the fourth connecting holes 312 are in one-to-one correspondence with the first threaded holes, the first screws 333 are threaded through the fourth connecting holes 312 and are connected to the first threaded holes in a threaded manner, and the reed 31 and the limiting member 332 are fixed through the two first screws 333, so that on one hand, the connection strength is increased; on the other hand, the two first screws 333 can restrict the rotation of the reed 31 with respect to the stopper 332.
Further, the limiting member 332 is provided with a receiving groove 3321, two opposite semicircular grooves 3322 are provided on the side wall of the receiving groove 3321, a first threaded hole and a through hole 21 are provided on the side wall of the receiving groove 3321, the semicircular grooves 3322 are located between the through hole 21 and the bottom of the receiving groove 3321, the telescopic rod 3311 extends into the space between the two semicircular grooves 3322, and the first screw 333 is inserted into the through hole 21 and is screwed to the first threaded hole to clamp the telescopic rod 3311. When the first screw 333 corresponding to the through hole 21 is unscrewed, the distance between the two semicircular grooves 3322 is increased, so that the position of the telescopic rod 3311 relative to the limiting piece 332 is convenient to adjust, and when the first screw 333 corresponding to the through hole 21 is screwed, the distance between the two semicircular grooves 3322 is reduced, so that the telescopic rod 3311 is clamped, and the telescopic rod 3311 and the limiting piece 332 are fixed.
Preferably, the second end of the reed 31 is provided with a third coupling hole 311, and the adjustment ball 32 is bonded in the third coupling hole 311.
Preferably, the diameter of the adjustment ball 32 is in the range of 1 to 5mm. The diameter of the adjusting ball 32 is the distance between the substrate and the mask plate 10 during photolithography, which meets the requirement of photolithography.
Further, as shown in fig. 2, 9 and 10, the suction cup assembly 1 includes a suction cup 11 and a base 12, the suction cup 11 is mounted on the base 12, the carrier member 42 is provided with a fixing groove 4211, and the base 12 is embedded in the fixing groove 4211;
The leveling device further comprises a locking assembly 6, the locking assembly 6 comprises a locking screw 61 and a compression block 62, a threaded hole extending along the radial direction is formed in the side wall of the fixing groove 4211, a positioning hole extending along the radial direction is formed in the side wall of the sucker assembly 1, the compression block 62 is installed in the positioning hole, a conical groove 621 is formed in one end, close to the locking screw 61, of the compression block 62, the end portion of the locking screw 61 is conical, the locking screw 61 is in threaded connection with the threaded hole, and the end portion of the locking screw is abutted against the conical groove 621; the distance of the axis of the taper groove 621 from the groove bottom of the fixed groove 4211 is greater than the distance of the axis of the locking screw 61 from the groove bottom of the fixed groove 4211. In the present embodiment, the fixing groove 4211 is provided on the mounting seat 421 of the stage member 42.
During assembly, the base 12 of the suction cup assembly 1 is embedded in the fixing groove 4211, the positioning hole of the suction cup assembly 1 is aligned with the threaded hole of the mounting seat 421, the locking screw 61 is in threaded connection with the threaded hole, the end part of the locking screw 61 is abutted against the conical groove 621 of the compression block 62, on one hand, the end part of the locking screw 61 is abutted against the compression block 62, the suction cup assembly 1 can be limited to displace radially, the end part of the locking screw 61 is matched with the side wall of the conical groove 621, the suction cup assembly 1 is limited to move axially, and the suction cup assembly 1 is limited to rotate relative to the fixing groove 4211. The connection stability of the sucker assembly 1 and the mounting seat 421 is improved, displacement of the sucker assembly 1 relative to the mounting seat 421 is prevented, stability of the substrate at a preset position is guaranteed, and processing quality is improved. Furthermore, when the compression block 62 is worn and damaged after long-time use, the compression block 62 can be directly replaced without replacing the sucker assembly 1, so that the maintenance cost is reduced. Moreover, when the locking screw 61 is tightened, the tapered end of the locking screw 61 provides a downward force to the tapered slot 621, so that the suction cup assembly 1 is attached to the mounting seat 421 more tightly, and the sealing performance of the air passage connection part is improved, so that the air tightness of the whole structure is improved.
Preferably, the leveling device comprises at least three locking assemblies 6, at least three threaded holes extending along the radial direction are formed in the side wall of the fixing groove 4211 in a surrounding mode, at least three positioning holes extending along the radial direction are formed in the side wall of the sucker assembly 1, and the threaded holes, the positioning holes and the locking assemblies 6 are in one-to-one correspondence. In this embodiment, leveling device includes three locking subassembly 6, and mounting seat 421 is evenly located to three locking subassembly 6 ring, and three locking subassembly 6 are fixed in sucking disc subassembly 1 on the mounting seat 421 jointly, have improved the installation steadiness of sucking disc 11 equipment, and have improved the installation accuracy.
Further, the suction cup assembly 1 comprises a suction cup 11 and a base 12, the suction cup 11 is installed on the base 12, the base 12 is embedded in the fixing groove 4211, and the positioning hole is formed in the side wall of the base 12.
In this embodiment, as shown in fig. 11-15, the top surface of the suction cup 11 is provided with at least one first air hole 111, the first air hole 111 is connected to an air supply port of the air supply device, the edge of the top surface of the suction cup 11 is provided with at least one air extraction groove 112, the bottom of the air extraction groove 112 is provided with a second air hole 113, the second air hole 113 is communicated with an air extraction port of the air supply device, the first air hole 111 is used for blowing air, and the second air hole 113 is used for extracting air, so that an air-floating surface is formed between the substrate and the suction cup 11. When the sucker 11 works, the substrate is placed on the sucker 11, the first air hole 111 and the second air hole 113 are covered at the same time, the edge of the substrate does not exceed the edge of the sucker 11, the air supply port of the air supply device conveys air between the substrate and the sucker 11 through the first air hole 111, then the air flows back to the air extraction port of the air supply device through the air extraction groove 112 and the second air hole 113, an air-floating surface is formed between the substrate and the sucker 11 at the moment, namely, the first air hole 111 blows air, the second air hole 113 extracts air, and the air-floating surface provides upward supporting force for the substrate. In this embodiment, the number of the pumping chambers 112 is four.
Preferably, the top surface of the sucker 11 is provided with a plurality of annular grooves 116 in sequence from inside to outside, the top surface of the sucker 11 is provided with a plurality of communication grooves 117 extending along the radial direction, the plurality of annular grooves 116 are all communicated with the communication grooves 117, and the first air holes 111 are arranged at the bottoms of the communication grooves 117. Wherein, the centre of a circle of a plurality of ring grooves 116 overlaps with the centre of a circle of sucking disc 11, and the diameter of ring groove 116 of outermost circle is less than the diameter of sucking disc 11, and the length of intercommunication groove 117 equals the diameter of ring groove 116 of outermost circle. Gas can enter the annular groove 116 through the first gas hole 111 and the communication groove 117, so that the flow area of the gas is increased, the area of the air bearing surface is increased, and the stability of the sucker 11 is improved.
In this embodiment, four first air holes 111 are provided on the top surface of the suction cup 11, two communication grooves 117 are provided at the center of the suction cup 11, two communication grooves 117 are provided at an included angle, in this embodiment, two communication grooves 117 are arranged in an X-shape, and four first air holes 111 are respectively located at the edges of the communication grooves 117 near the suction cup 11 and are evenly distributed, so that air pressure uniformity of an air-bearing surface is ensured. The number of first air holes 111 matches the number of communication grooves 117, and if the number of communication grooves 117 is n, the number of first air holes 111 is n. In other embodiments, the plurality of communication grooves 117 may be formed in a zigzag structure, and the number of communication grooves 117 is not limited in this embodiment.
Further, the suction cup 11 is provided with a first gas channel 114 and a second gas channel 115, the base 12 is provided with a third gas channel 121 and a fourth gas channel, and the mounting seat 421 is provided with a fifth gas channel and a sixth gas channel; the first air hole 111, the first air passage 114, the third air passage 121, the fifth air passage and the air supply port of the air supply device are sequentially communicated, and the second air hole 113, the second air passage 115, the fourth air passage, the sixth air passage and the air extraction port of the air supply device are sequentially communicated.
In this embodiment, the first gas passages 114 are annular and located below the first gas holes 111, and the plurality of first gas holes 111 can be simultaneously communicated with the first gas passages 114, so as to simplify the structure. If a plurality of first gas holes 111 are disposed along the radial direction, a plurality of first gas passages 114 are correspondingly disposed. Preferably, a first sealing ring is arranged at the connection part between the first gas channel 114 and the third gas channel 121 and the connection part between the third gas channel 121 and the fifth gas channel, so that sealing is realized, and air leakage is reduced.
Similarly, the second gas channel 115 is annular and is located below the second gas holes 113, and the plurality of second gas holes 113 can communicate with the second gas channel 115 at the same time, thereby simplifying the structure. Preferably, a second sealing ring is arranged at the connection part between the second gas channel 115 and the fourth gas channel and the connection part between the fourth gas channel and the sixth gas channel, so that sealing is realized, and air leakage is reduced.
Preferably, the first sealing ring and the second sealing ring can be replaced by a suction nozzle, so that the air tightness is further enhanced.
Still further, as shown in fig. 9 and 16, the leveling device further includes a sealing assembly 7, the sealing assembly 7 includes an annular sealing block 71 and a flexible sealing member 72, the side wall of the base 12 is in a step shape, the side wall of the base 12 includes a large diameter section, a step surface and a small diameter section, the large diameter section is embedded in the fixing groove 4211, the annular sealing block 71 is installed on the step surface, the annular sealing block 71 is provided with an inflation channel 711, the flexible sealing member 72 can be connected with one end of the inflation channel 711 close to the mask plate 10 in a sealing manner, the inflation channel 711 is communicated with an air supply device, and when the inflation channel 711 is inflated, the flexible sealing member 72 arches upwards to seal and attach the mask plate 10, thereby realizing the sealing between the mask plate 10 and the suction cup 11, fully ensuring the stability of the air-floating surface, and enabling the attachment of the substrate and the mask plate to be more stable. The flexible seal 72 may be a bead of seal.
Preferably, the second gas channel 115 is located on the side wall of the sucker 11, two sides of the second gas channel 115 are respectively provided with a first annular sealing groove 118, a third sealing ring is arranged in the first annular sealing groove 118, the third sealing ring is located between the sucker 11 and the annular sealing block 71, and sealing between the side wall of the sucker 11 and the annular sealing block 71 is achieved.
Further, the seal assembly 7 further includes a pressing block 73, the pressing block 73 is provided with a first air charging hole 731, the flexible seal member 72 is provided with an air charging cavity 721, the pressing block 73 is located in the air charging cavity 721, the pressing block 73 is connected to one end of the annular seal block 71 close to the mask plate 10, and in this embodiment, the pressing block 73 is in sealing connection with the annular seal block 71 so as to press the bottom wall of the air charging cavity 721 onto the annular seal block 71; the bottom wall of the air inflation chamber 721 is provided with an opening, and the first air inflation hole 731, the opening and the air inflation channel 711 are sequentially communicated to form a sealed air path. The outer wall of the pressing block 73 comprises a large-diameter section and a small-diameter section, the large-diameter section is in pressure connection with the bottom wall of the inflating cavity 721, and the small-diameter section penetrates through the opening and is connected to the annular sealing block 71.
In this embodiment, the top of the annular seal block 71 is provided with a second annular seal groove 712, and the pressure block 73 and the flexible seal 72 are both located within the second annular seal groove 712. The second annular seal groove 712 is open upward, and the top surface of the flexible seal 72 is lower than the top surface of the second annular seal groove 712, and only when the inflation channel 711 is vented, the top surface of the flexible seal 72 arches and conforms to the mask plate 10.
Note that the above is only a preferred embodiment of the present invention and the technical principle applied. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, while the invention has been described in connection with the above embodiments, the invention is not limited to the embodiments, but may be embodied in many other equivalent forms without departing from the spirit or scope of the invention, which is set forth in the following claims.
Claims (11)
1. A leveling device for adjusting a base and a mask plate (10) to a parallel state, characterized in that the leveling device comprises:
a suction cup assembly (1) for sucking the substrate;
a mask table (2) which is positioned above the sucker assembly (1) and is used for placing the mask plate (10);
at least three leveling assemblies (3), wherein the leveling assemblies (3) comprise adjusting balls (32), the adjusting balls (32) are arranged between the substrate and the mask plate (10), and the adjusting balls (32) of the at least three leveling assemblies (3) are not in a straight line;
the vertical motion platform (4) comprises a base (41), a carrying platform part (42), an elastic part (43) and a vertical driving assembly, wherein the sucking disc assembly (1) is arranged above the carrying platform part (42), the carrying platform part (42) is arranged above the base (41) through the elastic part (43), the vertical driving assembly is in driving connection with the base (41), and the vertical driving assembly is used for driving the base (41) to lift and further drive the base to lift so as to enable the base to be abutted to the lower end point of the adjusting ball (32) and enable the mask plate (10) to be abutted to the upper end point of the adjusting ball (32);
A detection assembly (5) comprising a displacement sensor (51), wherein the displacement sensor (51) is arranged between the base (41) and the carrier component (42), and the displacement sensor (51) is used for detecting the displacement of the carrier component (42) relative to the base (41);
the control module is used for receiving the detection result of the detection assembly (5) and controlling the vertical driving assembly according to the detection result, when the vertical driving assembly drives the base (41) to ascend, if the detection result is that the displacement detected by the displacement sensor (51) is greater than or equal to a preset value, the base and the mask plate (10) reach a parallel state, and the control module controls the vertical driving assembly to stop ascending;
the vertical movement table (4) further comprises a plurality of guide members (44), the plurality of guide members (44) are annularly arranged on the carrier member (42), and the guide members (44) comprise:
a guide frame (441) connected to the stage member (42), the guide frame (441) being provided with a guide groove extending in a vertical direction;
the lifting support (442) and the guide pulley (443), the lifting support (442) is installed on the base (41), the guide pulley (443) is rotationally connected with the lifting support (442), and the guide pulley (443) is arranged in the guide groove in a rolling mode.
2. The leveling device according to claim 1, characterized in that the guide member (44) further comprises a locking lever (444) and a locking cylinder (445), the base (41) being provided with a locking hole extending in a vertical direction, the locking lever (444) being slidably arranged in the locking hole, the locking lever (444) being capable of abutting against the bottom of the guide frame (441);
the side wall of the locking hole is provided with an avoidance hole, the locking cylinder (445) is arranged in the base (41), a piston (4451) is arranged at the output end of the locking cylinder (445), and the locking cylinder (445) can drive the piston (4451) to penetrate through the avoidance hole and abut against the side wall of the locking rod (444).
3. The leveling device according to claim 2, characterized in that the guide member (44) further comprises a decoupling element (446), the decoupling element (446) being connected at one end to the guide frame (441) and at the other end to the locking lever (444).
4. The leveling device as claimed in claim 1, wherein,
the carrier part (42) is provided with a plurality of first connecting holes, the side wall of the base (41) is provided with a plurality of limit grooves, and the top walls of the limit grooves are respectively provided with a second connecting hole;
The vertical movement table (4) further comprises a plurality of limiting components (45), and the limiting components (45) are annularly arranged on the base (41); the limit member (45) includes:
the limiting rod (451) penetrates through the first connecting hole and the second connecting hole and stretches into the limiting groove, a first limiting part and a second limiting part are respectively arranged at two ends of the limiting rod (451), and the first limiting part can be abutted to the end face of one end, far away from the second connecting hole, of the first connecting hole;
a stopper (452) mounted to a side wall of the base (41);
a limit link (453) hinged to the limit block (452);
an adjusting rod (454) which is in threaded connection with the limiting block (452) and the end part of which can be abutted against the first end of the limiting connecting rod (453), wherein a clamping groove is formed in the second end of the limiting connecting rod (453);
the limiting connecting rod (453) rotates, so that the limiting rod (451) is embedded in the clamping groove, and the second end of the limiting connecting rod (453) can stop the second limiting part from moving upwards.
5. The leveling device according to claim 1, wherein the elastic member (43) comprises a plurality of springs (431), the plurality of springs (431) being uniformly disposed between the stage member (42) and the base (41), the springs (431) having one end connected to the bottom of the stage member (42) and the other end connected to the top of the base (41); and/or
The elastic component (43) include a plurality of pressure compensation cylinder (432), a plurality of pressure compensation cylinder (432) are located in the ring of base (41), pressure compensation cylinder (432) install on base (41), the output of pressure compensation cylinder (432) connect in the bottom of carrier part (42).
6. Leveling device according to claim 1, characterized in that the mask table (2) is provided with a through hole (21) and at least three mounting grooves (22), three mounting grooves (22) are arranged around the through hole (21), the mounting grooves (22) extend radially along the through hole (21), and the mask plate (10) is arranged above the through hole (21);
the leveling assembly (3) further comprises a reed (31), a first end of the reed (31) is connected into the mounting groove (22), a second end of the reed (31) is connected with an adjusting ball (32), and the adjusting ball (32) is located in the through hole (21).
7. The leveling device according to claim 6, wherein the leveling assembly (3) further comprises a driving member (33), the driving member (33) is mounted on an end surface of the mounting groove (22), and the driving member (33) is drivingly connected to the first end of the reed (31), and the driving member (33) is configured to drive the adjusting ball (32) to move in a radial direction of the mounting groove (22) so that the adjusting ball (32) is moved away from under the mask plate (10) or moves to under the mask plate (10).
8. The leveling device according to claim 1, characterized in that the carrier member (42) comprises a base plate (422), a support bar (423) and a mounting seat (421);
the base plate (422) is connected to the base (41), the mounting base (421) is fixed above the base plate (422) through the supporting rods (423), the number of the supporting rods (423) is at least three, and at least three supporting rods (423) are uniformly arranged between the base plate (422) and the mounting base (421).
9. Leveling device according to any one of claims 1-8, characterized in that,
the sucker assembly (1) comprises a sucker (11) and a base (12), the sucker (11) is arranged on the base (12), the carrier part (42) is provided with a fixing groove (4211), and the base (12) is embedded in the fixing groove (4211);
the leveling device further comprises a locking assembly (6), the locking assembly (6) comprises a locking screw (61) and a compression block (62), a threaded hole extending along the radial direction is formed in the side wall of the fixing groove (4211), a positioning hole extending along the radial direction is formed in the side wall of the sucker assembly (1), the compression block (62) is installed in the positioning hole, a conical groove (621) is formed in one end, close to the locking screw (61), of the compression block (62), the end portion of the locking screw (61) is conical, the locking screw (61) is connected with the threaded hole in a threaded mode, and the end portion of the locking screw abuts against the conical groove (621); the distance of the axis of the conical groove (621) from the groove bottom of the fixed groove (4211) is greater than the distance of the axis of the locking screw (61) from the groove bottom of the fixed groove (4211).
10. The leveling device according to claim 9, further comprising a sealing assembly (7), wherein the sealing assembly (7) comprises an annular sealing block (71) and a flexible sealing member (72), the side wall of the base (12) is in a step shape, the side wall of the base (12) comprises a large-diameter section, a step surface and a small-diameter section, the large-diameter section is embedded in the fixing groove (4211), the annular sealing block (71) is mounted on the step surface, the annular sealing block (71) is provided with an inflation channel (711), the flexible sealing member (72) is connected with one end, close to the mask plate (10), of the inflation channel (711), the inflation channel (711) is communicated with an air supply device, and when the inflation channel (711) is inflated, the flexible sealing member (72) is arched upwards to be in sealing fit with the mask plate (10).
11. A lithographic apparatus comprising a levelling device according to any one of claims 1 to 10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311676029.7A CN117369223B (en) | 2023-12-08 | 2023-12-08 | Leveling device and photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311676029.7A CN117369223B (en) | 2023-12-08 | 2023-12-08 | Leveling device and photoetching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN117369223A CN117369223A (en) | 2024-01-09 |
| CN117369223B true CN117369223B (en) | 2024-02-27 |
Family
ID=89398855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311676029.7A Withdrawn - After Issue CN117369223B (en) | 2023-12-08 | 2023-12-08 | Leveling device and photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117369223B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117572732A (en) * | 2024-01-16 | 2024-02-20 | 上海图双精密装备有限公司 | Leveling auxiliary device and leveling method |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298273A (en) * | 1978-10-20 | 1981-11-03 | Hitachi, Ltd. | Projection aligner and method of positioning a wafer |
| KR100738995B1 (en) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | Substrate stage leveling device for exposure device |
| CN101891109A (en) * | 2010-07-16 | 2010-11-24 | 北京卫星制造厂 | Two-freedom-degree regulation self-leveling spreader and regulation method |
| CN106371292A (en) * | 2016-09-18 | 2017-02-01 | 中国科学院光电技术研究所 | Double-sided photoetching workpiece table |
| CN109923688A (en) * | 2016-12-12 | 2019-06-21 | 应用材料公司 | Substrate processing apparatus and the method for using substrate processing apparatus |
| CN110045583A (en) * | 2019-05-17 | 2019-07-23 | 中国科学院光电技术研究所 | A kind of dual surface lithography work stage based on dual masks alignment |
| CN211696424U (en) * | 2020-01-13 | 2020-10-16 | 四川道通达工程技术有限公司 | Horizontal reference platform |
| CN112904678A (en) * | 2021-01-14 | 2021-06-04 | 广东华恒智能科技有限公司 | Vertical roll-to-roll exposure equipment |
| CN114156227A (en) * | 2022-02-10 | 2022-03-08 | 上海隐冠半导体技术有限公司 | Clamping device |
| CN116300348A (en) * | 2022-12-27 | 2023-06-23 | 深圳市海目芯微电子装备科技有限公司 | Carrier leveling device of proximity lithography machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101130890B1 (en) * | 2005-03-18 | 2012-03-28 | 엘지전자 주식회사 | Proximity type esposurer |
-
2023
- 2023-12-08 CN CN202311676029.7A patent/CN117369223B/en not_active Withdrawn - After Issue
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298273A (en) * | 1978-10-20 | 1981-11-03 | Hitachi, Ltd. | Projection aligner and method of positioning a wafer |
| KR100738995B1 (en) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | Substrate stage leveling device for exposure device |
| CN101891109A (en) * | 2010-07-16 | 2010-11-24 | 北京卫星制造厂 | Two-freedom-degree regulation self-leveling spreader and regulation method |
| CN106371292A (en) * | 2016-09-18 | 2017-02-01 | 中国科学院光电技术研究所 | Double-sided photoetching workpiece table |
| CN109923688A (en) * | 2016-12-12 | 2019-06-21 | 应用材料公司 | Substrate processing apparatus and the method for using substrate processing apparatus |
| CN110045583A (en) * | 2019-05-17 | 2019-07-23 | 中国科学院光电技术研究所 | A kind of dual surface lithography work stage based on dual masks alignment |
| CN211696424U (en) * | 2020-01-13 | 2020-10-16 | 四川道通达工程技术有限公司 | Horizontal reference platform |
| CN112904678A (en) * | 2021-01-14 | 2021-06-04 | 广东华恒智能科技有限公司 | Vertical roll-to-roll exposure equipment |
| CN114156227A (en) * | 2022-02-10 | 2022-03-08 | 上海隐冠半导体技术有限公司 | Clamping device |
| CN116300348A (en) * | 2022-12-27 | 2023-06-23 | 深圳市海目芯微电子装备科技有限公司 | Carrier leveling device of proximity lithography machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117369223A (en) | 2024-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN117369223B (en) | Leveling device and photoetching machine | |
| JP4884537B2 (en) | Component mounting machine, component mounting head, and component mounting method | |
| US8256101B2 (en) | Apparatus for attaching substrates of flat display panel | |
| KR100807106B1 (en) | Pick-up cylinder in one piece simultaneously having up-down and rotation drive | |
| CN115790455B (en) | Ink jet printing base plate roughness detecting system | |
| CN110289242B (en) | Base adjusting device, chamber and semiconductor processing equipment | |
| CN103529373A (en) | Defect detection device for OLED | |
| KR100439084B1 (en) | A dispenser head able to control a rotation and up-down of a poston in a high-speed, fixed-amount, precise discharge type | |
| CN114413134B (en) | Gravity compensation device and motion platform | |
| CN116147869B (en) | Coupling device and vertical four-integration system | |
| CN109962032B (en) | Precise leveling adsorption table | |
| CN114801151B (en) | Sectional type flexible film laminating equipment and laminating method | |
| CN218215251U (en) | Carrying platform mechanism | |
| CN106054542B (en) | Welding resistance independence aligning platform frame and exposure machine | |
| CN216597523U (en) | Laminating device | |
| CN213381223U (en) | Bearing device and detection equipment | |
| CN117075448B (en) | Nanometer precision photoetching air-floating moving table | |
| CN115939020A (en) | Wafer loading device | |
| CN214212832U (en) | Pressure maintaining device | |
| CN116099732B (en) | Dispensing carrier | |
| CN219017628U (en) | Wafer loading device | |
| CN219937008U (en) | Attaching device | |
| CN216803404U (en) | Position adjustable support | |
| CN218896562U (en) | Pressure-stabilizing adsorption type surface mounting device | |
| CN118483874A (en) | Substrate delivery mechanism and exposure table system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20240227 Effective date of abandoning: 20240529 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20240227 Effective date of abandoning: 20240529 |