CN116300348A - Carrier leveling device of proximity lithography machine - Google Patents
Carrier leveling device of proximity lithography machine Download PDFInfo
- Publication number
- CN116300348A CN116300348A CN202211742726.3A CN202211742726A CN116300348A CN 116300348 A CN116300348 A CN 116300348A CN 202211742726 A CN202211742726 A CN 202211742726A CN 116300348 A CN116300348 A CN 116300348A
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- product carrier
- voice coil
- stage
- product
- leveling device
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- 238000001459 lithography Methods 0.000 title claims abstract description 26
- 230000001105 regulatory effect Effects 0.000 claims abstract description 4
- 238000001259 photo etching Methods 0.000 description 5
- 230000036544 posture Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7034—Leveling
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7038—Alignment for proximity or contact printer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses a carrier leveling device of a proximity lithography machine, which comprises a mask table, a product carrier, at least three contact balls and at least three voice coil motors, wherein the mask table is arranged on the product carrier; the product carrying platform is arranged below the mask platform; the contact balls are arranged on the product carrier, the diameter of each contact ball is consistent, and each contact ball is not on a straight line; the voice coil motor is arranged below the product carrying platform; the voice coil motor is used for jacking the product carrier, and two ends of the contact ball in the vertical direction are respectively abutted against the lower surface of the mask table and the upper surface of the product carrier, so that one surface of the product carrier, which is opposite to the mask table, is regulated to be parallel to one surface of the mask table, which is opposite to the product carrier. The technical scheme of the invention can realize the rapid leveling of the product carrier in the proximity lithography machine, improve the leveling precision and ensure the exposure quality.
Description
Technical Field
The invention relates to the technical field of special photoetching equipment, in particular to a carrier leveling device of a proximity photoetching machine.
Background
The photoetching machine is also named: mask alignment exposure machines, exposure systems, lithography systems, etc., are the core equipment for manufacturing chips. The method adopts a photo-printing-like technology to print the fine pattern on the mask plate on the silicon wafer through light exposure.
In the related art, in the field of a proximity lithography machine, in order to improve exposure quality, parallelism between a mask plate and a product carrier needs to be ensured, and a leveling device is needed. The traditional carrier leveling device has the defects of large parallelism error between the leveling product carrier and the mask table, repeated leveling, and low leveling precision.
Disclosure of Invention
The invention mainly aims to provide a carrier leveling device of a proximity lithography machine, which aims to improve the leveling precision for adjusting the parallelism between a product carrier and a mask table.
In order to achieve the above object, the present invention provides a stage leveling device for a proximity lithography machine, the stage leveling device for a proximity lithography machine comprising:
a mask table;
the product carrying platform is arranged below the mask platform;
at least three contact balls arranged on the product carrier, wherein the diameter of each contact ball is consistent, and each contact ball is not on a straight line;
the voice coil motors are arranged below the product carrier;
the voice coil motor is used for jacking the product carrier, and two ends of the contact ball in the vertical direction are respectively abutted against the lower surface of the mask table and the upper surface of the product carrier, so that one surface of the product carrier, which is opposite to the mask table, is regulated to be parallel to one surface of the mask table, which is opposite to the product carrier.
In an embodiment, a rotatable ball is mounted at an output end of the voice coil motor, and the ball is in point contact with the product carrier.
In one embodiment, the stage leveling device further comprises a base, and the voice coil motor is mounted on the base and located between the base and the product stage.
In an embodiment, the carrier leveling device further comprises a carrier supporting component, the carrier supporting component comprises a supporting table and a telescopic assembly which is telescopically installed on the supporting table, the telescopic assembly is provided with a rotatable connecting portion, the connecting portion is connected with the product carrier, and the supporting table is connected with the base.
In an embodiment, the number of the contact balls is three, and the three contact balls are uniformly distributed in an equilateral triangle form.
In one embodiment, each of the voice coil motors is not all in a straight line.
In an embodiment, the number of the voice coil motors is three, and the three voice coil motors are uniformly distributed in an equilateral triangle form.
In an embodiment, the center lines of the three contact balls coincide with the center line of the product carrier;
and/or, the central lines of the three voice coil motors are coincided with the central line of the product carrier.
In one embodiment, the cross section of the product carrier is rounded square.
In an embodiment, the cross section of the mask stage is square.
The carrier leveling device of the proximity photoetching machine comprises a mask table, a product carrier, at least three contact balls and at least three voice coil motors; the product carrying platform is arranged below the mask platform; the contact balls are arranged on the product carrier, and each contact ball is not on a straight line; the voice coil motor is arranged below the product carrying platform; the voice coil motor is used for jacking the product carrier, and two ends of the contact ball in the vertical direction are respectively abutted against the lower surface of the mask table and the upper surface of the product carrier, so that one surface of the product carrier, which is opposite to the mask table, is regulated to be parallel to one surface of the mask table, which is opposite to the product carrier. So arranged, the voice coil motors synchronously send out the same moment, the product carrier is lifted up under the pushing of the voice coil motors, the product carrier is abutted against the mask table, the contact ball is pressed and clamped between the lower surface of the mask table and the upper surface of the product carrier, at the moment, a plane principle and the distance between the lower surface of the mask table and the upper surface of the mask table are determined according to three non-collinear points to be everywhere equal to the diameter of the contact ball, the opposite surfaces of the product carrier plate and the mask table are kept parallel, the plane of the product carrier table is determined, the voice coil motor records the respective positions and keeps the contact balls when in compression, and the contact balls are withdrawn.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to the structures shown in these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a stage leveling apparatus for a proximity lithography machine according to an embodiment of the present invention;
FIG. 2 is a front view of an embodiment of a stage leveling apparatus for a proximity lithography machine in accordance with the present invention.
Reference numerals illustrate:
| reference numerals | Name of the name | Reference numerals | Name of the |
| 100 | Mask table | 500 | |
| 200 | |
600 | |
| 300 | |
410 | |
| 400 | Voice coil motor |
The achievement of the objects, functional features and advantages of the present invention will be further described with reference to the accompanying drawings, in conjunction with the embodiments.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It should be noted that, if directional indications (such as up, down, left, right, front, and rear … …) are included in the embodiments of the present invention, the directional indications are merely used to explain the relative positional relationship, movement conditions, etc. between the components in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indications are correspondingly changed.
In addition, if there is a description of "first", "second", etc. in the embodiments of the present invention, the description of "first", "second", etc. is for descriptive purposes only and is not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In addition, if the meaning of "and/or" is presented throughout this document, it is intended to include three schemes in parallel, taking "a and/or B" as an example, including a scheme, or B scheme, or a scheme where a and B meet simultaneously. In addition, the technical solutions of the embodiments may be combined with each other, but it is necessary to base that the technical solutions can be realized by those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not within the scope of protection claimed in the present invention.
The photoetching machine is also named: mask alignment exposure machines, exposure systems, lithography systems, etc., are the core equipment for manufacturing chips. The method adopts a photo-printing-like technology to print the fine pattern on the mask plate on the silicon wafer through light exposure.
In the related art, in the field of a proximity lithography machine, in order to improve exposure quality, parallelism between a mask plate and a product carrier needs to be ensured, and a leveling device is needed. The traditional carrier leveling device has the defects of large parallelism error between the leveling product carrier and the mask table, repeated leveling, and low leveling precision.
Referring to fig. 1 to 2, the present invention provides a stage leveling device of a proximity lithography machine.
The carrier leveling device of the proximity lithography machine comprises a mask table 100, a product carrier 200, at least three contact balls 300 and at least three voice coil motors 400; the product carrier 200 is disposed below the mask stage 100; the contact balls 300 are arranged on the product carrier 200, the diameters of the contact balls 300 are consistent, and the contact balls 300 are not all on the same straight line; the voice coil motor 400 is disposed below the product stage 200; the voice coil motor 400 is used for lifting up the product carrier 200, so that two ends of the contact ball 300 along the vertical direction respectively abut against the lower surface of the mask table 100 and the upper surface of the product carrier 200, and one surface of the product carrier 200 opposite to the mask table 100 is adjusted to be parallel to one surface of the mask table 100 opposite to the product carrier 200.
Specifically, the plurality of voice coil motors 400 synchronously send out the same moment, under the pushing of the voice coil motors 400, the product carrier 200 rises, the product carrier is abutted against the mask table 100, the contact balls 300 are pressed and clamped between the lower surface of the mask table 100 and the upper surface of the product carrier 200, at the moment, a plane principle is determined according to three non-collinear points, the distance between the lower surface of the mask table 100 and the upper surface of the mask table 100 is everywhere equal to the diameter of the contact balls 300, the opposite surfaces of the two parts of the product carrier and the mask table 100 are kept parallel, the plane of the product carrier 200 is determined, the respective positions of the voice coil motors 400 are kept after being recorded and pressed, and the contact balls 300 are withdrawn, so that the opposite surfaces of the product carrier 200 and the mask table 100 can still be kept parallel all the time in an effective stroke when the product carrier 200 is driven by a mechanical structure outside a leveling device, the leveling precision is improved, and the leveling precision is improved. The carrier leveling device of the proximity lithography machine can realize the rapid leveling of the product carrier 200 in the proximity lithography machine, improve the leveling precision, ensure the exposure quality and improve the qualification rate of products.
Referring to fig. 1 to 2, in an embodiment, a rotatable ball 410 is mounted at an output end of the voice coil motor 400, and the ball 410 is in point contact with the product carrier 200. It can be understood that when the voice coil motor 400 lifts the product carrier 200, one of the contact balls 300 thereon first contacts the mask table 100, and then the voice coil motor 400 still continues to lift upwards, because the ball head 410 of the voice coil motor 400 can rotate freely, the ball head 410 can eliminate the transverse shearing force of the voice coil motor 400 on the product carrier 200, and then the rest of the contact balls 300 are sequentially abutted against the product carrier 200, so that the distance between the product carrier 200 and the mask table 100 is equal to the diameter of the contact balls 300, the parallelism between the product carrier 200 and the mask table 100 is ensured, and the leveling precision is improved.
Referring to fig. 1 to 2, in an embodiment, the stage leveling device further includes a base 500, and the voice coil motor 400 is mounted on the base 500 and located between the base 500 and the product stage 200. It can be understood that the base 500 can be driven by a mechanical structure other than the leveling device to further drive the voice coil motor 400 and the product carrier 200 to move up and down, and since the plurality of voice coil motors 400 record and keep the respective positions of the contact balls 300 pressed by the product carrier 200 and the mask 100, the product carrier 200 and the mask 100 always keep parallel, so that the need of readjusting the parallelism during each exposure is avoided.
Referring to fig. 1 to 2, in an embodiment, the stage leveling device further includes a carrier support member 600, where the carrier support member 600 includes a support stage and a telescopic assembly telescopically mounted on the support stage, the telescopic assembly is provided with a rotatable connection portion, the connection portion is connected to the product stage 200, and the support stage is connected to the base 500. It will be appreciated that carrier support 600 may limit translation of product carrier 200 in the horizontal direction while preserving rotation of product carrier 200 in all directions such that voice coil motor 400 may adjust parallelism between product carrier 200 and mask stage 100.
Referring to fig. 1 to 2, in order to equalize the contact points between the mask stage 100 and the product carrier 200, in one embodiment, the number of the contact balls 300 is three, and the three contact balls 300 are uniformly arranged in the form of an equilateral triangle. In other embodiments, the number of contact balls 300 may be more than three, such as four, five, etc., as long as the contact balls 300 are not arranged in a straight line.
Referring to fig. 1 to 2, in order to facilitate the voice coil motor 400 to adjust the positions of the product carrier 200 in different directions, in one embodiment, each of the voice coil motors 400 is not aligned with a straight line. It can be appreciated that the voice coil motors 400 are respectively disposed at different positions, so that the voice coil motors 400 can adjust the postures of the product carrier 200 under different product carriers 200, thereby improving the adjustment accuracy.
Referring to fig. 1 to 2, in an embodiment, the number of voice coil motors 400 is three, and three voice coil motors 400 are uniformly arranged in an equilateral triangle form. With this arrangement, the adjustment of the position of the product carrier 200 by the different voice coil motors 400 can be balanced. In other embodiments, the number of voice coil motors 400 may be more than three, such as four, five, etc., as long as the voice coil motors 400 are not aligned.
Referring to fig. 1-2, in one embodiment, the center lines of the three contact balls 300 are coincident with the center line of the product carrier 200; and/or, the center lines of the three voice coil motors 400 coincide with the center line of the product carrier 200. It will be appreciated that the centerlines of the three contact balls 300 coincide with the centerlines of the product carrier 200. Alternatively, the center lines of the three voice coil motors 400 coincide with the center line of the product stage 200. Alternatively, the center lines of the three contact balls 300, the center lines of the three voice coil motors 400, and the center line of the product stage 200 are all coincident. By such arrangement, the acting force of each contact ball 300 and each voice coil motor 400 on the product carrier 200 can be more uniform, which is beneficial to adjusting the parallelism between the product carrier 200 and the mask table 100.
The cross-section of the product carrier 200 can be varied and can be square, rectangular, oval, etc. Referring to fig. 1-2, in one embodiment, the cross section of the product carrier 200 is rounded square.
The cross-section of the mask stage 100 may be varied and may be square, rectangular, elliptical, etc. Referring to fig. 1 to 2, in an embodiment, the cross section of the mask stage 100 is square.
The foregoing description is only of the optional embodiments of the present invention, and is not intended to limit the scope of the invention, and all the equivalent structural changes made by the description of the present invention and the accompanying drawings or the direct/indirect application in other related technical fields are included in the scope of the invention.
Claims (10)
1. A stage leveling device for a proximity lithography machine, comprising:
a mask table;
the product carrying platform is arranged below the mask platform;
at least three contact balls arranged on the product carrier, wherein the diameter of each contact ball is consistent, and each contact ball is not on a straight line;
the voice coil motors are arranged below the product carrier;
the voice coil motor is used for jacking the product carrier, and two ends of the contact ball in the vertical direction are respectively abutted against the lower surface of the mask table and the upper surface of the product carrier, so that one surface of the product carrier, which is opposite to the mask table, is regulated to be parallel to one surface of the mask table, which is opposite to the product carrier.
2. The stage leveling device of a proximity lithography machine of claim 1, wherein an output end of the voice coil motor is provided with a rotatable ball, the ball being in point contact with the product stage.
3. The stage leveling device of claim 2, further comprising a base, wherein the voice coil motor is mounted to the base and is positioned between the base and the product stage.
4. A stage leveling device for a proximity lithography machine as recited in claim 3, further comprising a carrier support member comprising a support table and a telescoping assembly telescopically mounted to the support table, the telescoping assembly being provided with a rotatable connection portion, the connection portion connecting the product stage, the support table connecting the base.
5. The stage leveling device of a proximity lithography machine of claim 4, wherein the number of contact balls is three, and three of the contact balls are uniformly arranged in an equilateral triangle.
6. The stage leveling device of a proximity lithography machine of claim 5, wherein each of said voice coil motors is not all in a straight line.
7. The stage leveling device of a proximity lithography machine of claim 6, wherein the number of voice coil motors is three, and the three voice coil motors are uniformly arranged in an equilateral triangle.
8. The stage leveling device of a proximity lithography machine of claim 7, wherein the center lines of three of said contact balls coincide with the center line of said product stage;
and/or, the central lines of the three voice coil motors are coincided with the central line of the product carrier.
9. The stage leveling device of a proximity lithography machine of claim 1, wherein the product stage has a rounded square cross-section.
10. The stage leveling device of a proximity lithography machine of claim 1, wherein the mask stage is square in cross-section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211742726.3A CN116300348A (en) | 2022-12-27 | 2022-12-27 | Carrier leveling device of proximity lithography machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211742726.3A CN116300348A (en) | 2022-12-27 | 2022-12-27 | Carrier leveling device of proximity lithography machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116300348A true CN116300348A (en) | 2023-06-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211742726.3A Pending CN116300348A (en) | 2022-12-27 | 2022-12-27 | Carrier leveling device of proximity lithography machine |
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| CN (1) | CN116300348A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117369223A (en) * | 2023-12-08 | 2024-01-09 | 上海隐冠半导体技术有限公司 | Leveling device and photoetching machine |
-
2022
- 2022-12-27 CN CN202211742726.3A patent/CN116300348A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117369223A (en) * | 2023-12-08 | 2024-01-09 | 上海隐冠半导体技术有限公司 | Leveling device and photoetching machine |
| CN117369223B (en) * | 2023-12-08 | 2024-02-27 | 上海隐冠半导体技术有限公司 | Leveling device and photoetching machine |
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