CN117162290A - Device and method for processing hydrophilic structure on surface of transparent hard and brittle material - Google Patents
Device and method for processing hydrophilic structure on surface of transparent hard and brittle material Download PDFInfo
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- CN117162290A CN117162290A CN202311234550.5A CN202311234550A CN117162290A CN 117162290 A CN117162290 A CN 117162290A CN 202311234550 A CN202311234550 A CN 202311234550A CN 117162290 A CN117162290 A CN 117162290A
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- 238000003672 processing method Methods 0.000 abstract description 7
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XOJVVFBFDXDTEG-UHFFFAOYSA-N Norphytane Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C XOJVVFBFDXDTEG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
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- 230000009286 beneficial effect Effects 0.000 description 1
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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Abstract
The invention discloses a device and a processing method for processing a hydrophilic structure on the surface of a transparent and brittle material, wherein the device comprises a magnetic field generator, a target material capable of generating plasma under the irradiation of a laser beam and a laser component used for emitting the laser beam, wherein the emitting end of the laser component and the target material are arranged at two sides of a transparent and brittle material sample at intervals along a laser beam emitting path, light spots of the laser beam emitted by the emitting end penetrate through the transparent and brittle material sample and are focused on the surface of the target material, which is close to the transparent and brittle material sample, the target material and the transparent and brittle material sample are both positioned in a magnetic field generated by the magnetic field generator, and the magnetic induction line of the magnetic field is perpendicular to the surface of the target material and extends in the same direction as the laser beam.
Description
Technical Field
The invention relates to the technical field of laser micromachining, in particular to a device and a method for machining a hydrophilic structure on the surface of a transparent hard and brittle material.
Background
The hydrophilic structure is manufactured on the surface of the transparent and brittle material, so that the transparent and brittle material has the functions of self cleaning, anti-fog and the like, has very important application value in the fields of submarines, aerospace and the like, and is more beneficial to the improvement of the self cleaning and anti-fog functions of the material as the contact angle is smaller. At present, a plurality of methods for preparing the hydrophilic surface, such as a solid drop method, a mask plate method, chemical etching and the like, but the methods have the defects of high cost, complex process, environmental pollution and the like, so that the method is limited in large-scale industrial application.
The method for processing the hydrophilic structure on the surface of the transparent and hard and brittle material by using the longitudinal magnetic field to assist the laser-induced plasma is to utilize laser to pass through the transparent and hard and brittle material sample and focus on the target surface below the sample to generate high-temperature and high-pressure plasma, and the plasma is impacted on the back surface of the transparent and hard and brittle material to etch a compact microstructure. The laser energy required by the processing mode is lower than the ablation threshold value of the transparent hard and brittle material, and the lower laser energy avoids the problems of microcracks, micro-edge breakage and the like caused by direct laser ablation. When a longitudinal magnetic field is applied, charged particles in the plasma along the direction parallel to the magnetic field are not affected, while charged particles in other directions do spiral curve motion due to the action of lorentz force. And the farther the upward movement is from the surface of the magnet, the weaker the magnetic field strength is, the smaller the lorentz force is, and the radius of the circular movement is increased. After the longitudinal magnetic field is applied, the particles do spiral motion upwards, the travel reaching the back surface of the transparent and hard and brittle material is increased compared with the linear motion without the magnetic field, the speed of the particles is reduced due to air resistance in the travel, the impact speed reaching the back surface of the transparent and hard and brittle material is reduced, the mechanical impact force on the transparent and hard and brittle material is reduced, the etching depth is reduced, and part of the particles adhere to the surface of the transparent and hard and brittle material due to the too low speed of the particles to form sputtered objects. Therefore, after the longitudinal magnetic field is increased, micro-nano sputtering particles on the back surface of the transparent and brittle material can be increased, the range of sputtered substances can be increased, and the etching depth can be reduced. The shallow etching depth and a large number of micro-nano particles greatly reduce the contact angle of the transparent hard and brittle material and increase the hydrophilicity of the transparent hard and brittle material.
Disclosure of Invention
The invention aims to provide a device and a processing method for processing a hydrophilic structure on the surface of a transparent and brittle material, which are used for solving the problems of the prior art, and have the advantages of low processing cost, simple operation, simple process, easy realization of large-scale application and higher processing quality and faster processing rate.
In order to achieve the above object, the present invention provides the following solutions: the invention provides a device for processing a hydrophilic structure on the surface of a transparent and brittle material, which comprises a magnetic field generator, a target material capable of generating plasma under the irradiation of a laser beam and a laser component used for emitting the laser beam, wherein an emitting end of the laser component and the target material are arranged at two sides of the transparent and brittle material sample at intervals along a laser beam emitting path, a light spot of the laser beam emitted by the emitting end penetrates through the transparent and brittle material sample and is focused on the surface of the target material, which is close to the transparent and brittle material sample, the target material and the transparent and brittle material sample are both positioned in a magnetic field generated by the magnetic field generator, and a magnetic induction line of the magnetic field is perpendicular to the surface of the target material and extends in the same direction with the laser beam.
Preferably, the magnetic field generator is a magnet positioned on one side of the target material away from the transparent hard and brittle material sample, and the N pole of the magnet is arranged towards the target material.
Preferably, the magnet is matched with a workbench, a supporting plane parallel to a horizontal plane is arranged at the top end of the workbench, the magnet is placed on the supporting plane, the target is placed at the top of the magnet, and the transparent hard and brittle material sample and the emergent end are sequentially arranged above the target at intervals from bottom to top.
Preferably, the transparent hard and brittle material sample is matched with a sample clamp, the sample clamp comprises a clamp base and a clamping part for clamping the transparent hard and brittle material sample, and the clamping part is movably arranged on the clamp base along the direction parallel to the magnetic induction line.
Preferably, the sample base is movably provided with a supporting block along a direction parallel to the magnetic induction line, the clamping part comprises clamping arms which are installed on the supporting block in pairs, the two clamping arms are clamped on two sides of the transparent hard and brittle material sample and are movably installed on the supporting block along a direction perpendicular to the movement direction of the supporting block, and the supporting block and the clamping arms are respectively matched with positioning pieces for positioning the sample base and the supporting block.
Preferably, the laser assembly comprises a laser, a beam expander and a focusing field lens which are sequentially arranged along the transmission direction of the laser beam, wherein the focusing field lens is positioned on one side of the transparent hard and brittle material sample, which is far away from the target, and is arranged at intervals with the transparent hard and brittle material sample.
Preferably, a scanning galvanometer is arranged between the beam expander and the focusing field lens, and the focusing scene is arranged at the emergent end of the scanning galvanometer.
Preferably, a plurality of reflectors are arranged between the beam expander and the scanning galvanometer, and each reflector is sequentially arranged along the transmission direction of the laser beam.
Preferably, the target is made of a non-ferromagnetic material.
The processing method of the device for processing the hydrophilic structure on the surface of the transparent hard and brittle material comprises the following steps:
sample installation: the method comprises the steps of installing a sample clamp on a workbench, placing a magnet with the N pole upwards on a supporting plane of the workbench, placing a target on the magnet, horizontally clamping a transparent hard and brittle material sample between two clamping arms of the sample clamp, and adjusting the height of the clamping arms to control the distance between the transparent hard and brittle material sample and the target;
preparing a laser assembly: preparing a laser component, sequentially passing laser beams generated by a laser through a beam expander, various reflectors, a scanning galvanometer and a focusing field lens, and focusing and irradiating on a target material through a transparent hard and brittle material sample;
etching: controlling a scanning galvanometer, and etching the microstructure on the lower surface of the transparent and brittle material sample by using the laser beam under the control of the scanning galvanometer;
cleaning and drying: and placing the processed transparent hard and brittle material sample in a cleaning solution for ultrasonic cleaning, and then drying to complete the processing of the transparent hard and brittle material sample.
Compared with the prior art, the invention has the following technical effects:
the light spot of the laser beam passes through the transparent hard and brittle material sample and is focused on the surface of the target material, which is close to the transparent hard and brittle material sample, and the target material and the transparent hard and brittle material sample are both positioned in the magnetic field generated by the magnetic field generator, the magnetic induction line of the magnetic field is vertical to the surface of the target material and extends in the same direction with the laser beam so as to provide a longitudinal magnetic field for plasma, the plasma is induced when the target material is ablated by the laser, the plasma impacts the back surface of the transparent hard and brittle material sample under the assistance of the longitudinal magnetic field, and meanwhile, the movement track of the laser-induced plasma can be regulated by the longitudinal magnetic field, and the removal of sample materials can be realized by the synergistic effect of heat energy and mechanical energy. And processing a large-area microstructure on the back surface of the transparent and hard brittle material to enable a large amount of micro-nano particles to be attached to the back surface of the transparent and hard brittle material, thereby achieving the hydrophilic effect.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings that are needed in the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of the overall apparatus of the present invention;
FIG. 2 is a scanning electron microscope image of a micro-groove array structure etched on sapphire by laser induced plasma under the assistance of a longitudinal magnetic field by adopting monocrystalline silicon as a target material;
FIG. 3 is an enlarged view of a scanning electron microscope of micro-nano particles on the surface of a processed micro-groove array structure by adopting monocrystalline silicon as a target material and sapphire as a sample;
FIG. 4 (a) is a surface contact angle measurement image of pristine sapphire; 4 (b) is a contact angle measurement image of etching a micro-groove array structure on sapphire by using monocrystalline silicon as a target material and using laser induced plasma under the assistance of a longitudinal magnetic field;
the device comprises a 1-computer, a 2-laser, a 3-beam expander, a 4-first reflecting mirror, a 5-second reflecting mirror, a 6-scanning vibrating mirror, a 7-focusing field lens, an 8-transparent hard and brittle material sample, a 9-target, a 10-magnet, an 11-workbench and a 12-sample clamp.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention aims to provide a device and a processing method for processing a hydrophilic structure on the surface of a transparent and brittle material, which are used for solving the problems of the prior art, and have the advantages of low processing cost, simple operation, simple process, easy realization of large-scale application and higher processing quality and faster processing rate.
In order that the above-recited objects, features and advantages of the present invention will become more readily apparent, a more particular description of the invention will be rendered by reference to the appended drawings and appended detailed description.
As shown in fig. 1 to 4, the present embodiment provides a device for processing a hydrophilic structure on a surface of a transparent and brittle material, which includes a magnetic field generator, a target 9 capable of generating plasma under irradiation of a laser beam, and a laser 2 assembly for emitting the laser beam, wherein an emitting end of the laser 2 assembly and the target 9 are disposed at two sides of the transparent and brittle material sample 8 along a laser beam emitting path at intervals, a light spot of the laser beam emitted from the emitting end passes through the transparent and brittle material sample 8 and is focused on a surface of the target 9 near the transparent and brittle material sample 8, the target 9 and the transparent and brittle material sample 8 are both located in a magnetic field generated by the magnetic field generator, and a magnetic induction line of the magnetic field is perpendicular to the surface of the target 9 and extends in the same direction as the laser beam, preferably, the magnetic induction line is parallel to the incident direction of the laser, that is to provide a longitudinal magnetic field to the plasma. The light spot of the laser beam passes through the transparent hard and brittle material sample 8 and is focused on the surface of the target material 9, which is close to the transparent hard and brittle material sample 8, so that high-temperature and high-pressure plasma is generated in the process of ablating the target material 9 by using the laser, the plasma is impacted on the back surface of the transparent hard and brittle material sample 8 under the assistance of a longitudinal magnetic field, the material is removed by the synergistic effect of heat energy and mechanical energy, a large number of micro-nano particles are generated on the back surface of the transparent hard and brittle material, the surface contact angle of the transparent hard and brittle material is greatly reduced by the existence of the micro-nano particles, and the hydrophilicity of the transparent hard and brittle material is increased.
Compared with the existing hydrophilic surface manufacturing technology, the processing device and the processing method have the advantages of low processing cost, simple operation, simple process, easy realization of large-scale application, higher processing quality and faster processing speed guarantee, are high-efficiency high-quality low-consumption micro-processing technology, and provide a new way for high-efficiency high-quality processing of the hydrophilic structure on the surface of the transparent and brittle material. In specific application, the longitudinal magnetic field assisted laser induced plasma provided by the invention can process a hydrophilic structure on the surface of a transparent and brittle material, so that the contact angle of the sapphire can be reduced from the original 86 degrees to 24 degrees.
As a preferred embodiment of the present invention, the magnetic field generator is a magnet 10 located on the side of the target 9 away from the transparent hard brittle material sample 8, and the N pole of the magnet 10 is disposed towards the target 9, so that the magnet 10 is used to provide a longitudinal magnetic field, and the whole device has a simple structure. It should be further noted that the plasma is spirally moved under the control of the longitudinal magnetic field, and the further the plasma moves upward from the surface of the magnet 10, the lower the magnetic field strength, the smaller the lorentz force, the larger the radius of the circular movement of the plasma, and the more divergent the plasma. Compared with the linear motion without adding a magnetic field, the longitudinal magnetic field increases the travel and the divergence angle of the plasma to the back surface of the transparent and hard brittle material, so that the mechanical impact force of the plasma to the transparent and hard brittle material is reduced, the etching depth is reduced, and a large number of particles can adhere to the back surface of the transparent and hard brittle material and form micro-nano particles. The shallow etching depth and a large number of micro-nano particle attachments greatly reduce the contact angle of the transparent hard and brittle material and increase the hydrophilicity of the transparent hard and brittle material.
Further, the magnet 10 is matched with the workbench 11, a supporting plane parallel to the horizontal plane is arranged at the top end of the workbench 11, the magnet 10 is placed on the supporting plane, the target 9 is placed at the top of the magnet 10, the transparent hard and brittle material sample 8 and the emergent end are sequentially arranged above the target 9 at intervals from bottom to top, and the workbench 11 is arranged to form supporting carriers for the structures such as the magnet 10, so that the stability in the working process is ensured.
Further, the transparent hard and brittle material sample 8 is provided with a sample clamp 12, the sample clamp 12 comprises a clamp base and a clamping part for clamping the transparent hard and brittle material sample 8, and the clamping part is movably arranged on the clamp base along the direction parallel to the magnetic induction line so as to adjust the distance between the transparent hard and brittle material sample 8 and the target 9.
As a preferred embodiment of the invention, a supporting block is movably arranged on the sample base along the direction parallel to the magnetic induction line, the clamping part comprises clamping arms which are arranged on the supporting block in pairs, the two clamping arms are clamped on two sides of the transparent hard and brittle material sample 8 and are movably arranged on the supporting block along the direction perpendicular to the movement direction of the supporting block so as to clamp the transparent hard and brittle material sample 8 with different dimensions and adjust the distance between the transparent hard and brittle material sample 8 and the target 9, and the supporting block and the clamping arms are respectively matched with positioning pieces, preferably jackscrews or limiting screws and the like, for positioning the transparent hard and brittle material sample 8.
Further, the laser 2 assembly comprises a laser 2, a beam expander 3 and a focusing field lens 7 which are sequentially arranged along the transmission direction of the laser beam, wherein the focusing field lens 7 is positioned on one side of the transparent hard and brittle material sample 8 far away from the target 9 and is arranged at intervals with the transparent hard and brittle material sample 8. A scanning galvanometer 6 is arranged between the beam expander 3 and the focusing field lens 7, a focusing scene is arranged at the emergent end of the scanning galvanometer 6, a driving device for driving the scanning galvanometer 6 to move along the horizontal direction is matched with the scanning galvanometer 6, the driving device is electrically connected with a calculator, and the movement of the scanning galvanometer 6 is controlled through the computer 1, so that the scanning track of the laser beam is gathered at different positions of the target 9, and then a large-area microstructure is processed on the back of the transparent and brittle material. And the computer 1 preferably controls the scanning speed and direction of the laser light through the scanning galvanometer 6.
Moreover, a plurality of reflectors are arranged between the beam expander 3 and the scanning galvanometer 6, and each reflector is sequentially arranged along the transmission direction of the laser beam so as to facilitate the control of the transmission direction of the laser beam, and two preferred reflectors are arranged and are divided into a first reflector 4 and a second reflector 5. The laser beam generated by the laser 2 sequentially passes through the beam expander 3, the first reflecting mirror 4, the second reflecting mirror 5 and the scanning vibrating mirror 6, and then the laser beam light spot is focused on the surface of the target 9 below the transparent hard and brittle material sample 8 through the focusing field lens 7, so that the plasma is induced when the target 9 is ablated by the laser.
The target 9 is made of a non-ferromagnetic material, and the target 9 can generate plasma under laser focusing irradiation, wherein the target 9 comprises, but is not limited to, copper, aluminum, silicon and other non-ferromagnetic materials. The target 9 having ferromagnetism shields the magnetic field and affects the processing effect of the magnetic field on the plasma.
Further, a processing method of a device for processing a hydrophilic structure on the surface of a transparent hard brittle material is provided, and the processing method comprises the following steps:
sample installation: mounting a sample clamp 12 on a workbench 11, placing a magnet 10 with the N pole upwards on a supporting plane of the workbench 11, placing a target 9 on the magnet 10, horizontally clamping a transparent hard and brittle material sample 8 between two clamping arms of the sample clamp 12, and adjusting the height of the clamping arms to control the distance between the transparent hard and brittle material sample 8 and the target 9, wherein the distance between the transparent hard and brittle material sample 8 and the target 9 is preferably 0-2 mm;
preparing a laser 2 assembly: preparing a laser 2 assembly, sequentially passing a laser beam generated by the laser 2 through a beam expander 3, various reflectors, a scanning galvanometer 6 and a focusing field lens 7, and focusing and irradiating on a target 9 through a transparent hard and brittle material sample 8;
etching: controlling a scanning galvanometer 6, and etching the microstructure on the lower surface of the transparent hard brittle material sample 8 by the laser beam under the control of the scanning galvanometer 6;
cleaning and drying: and placing the processed transparent hard and brittle material sample 8 in a cleaning solution for ultrasonic cleaning, and then drying to complete the processing of the transparent hard and brittle material sample 8.
In the specific implementation, the transparent hard and brittle material sample 8 is a single crystal sapphire sheet, and has the length of 10mm, the width of 10mm and the thickness of 0.43mm; and the sample holder 12 is mounted on the table 11, and the magnet 10 is placed on the table 11 with the N pole facing upward. In the present embodiment, the magnet 10 is an N52 grade NvFeB high strength magnet 10, and the size is 10×10×5mm 3 The surface magnetic field intensity of the single magnet 10 is 0.42T, and the magnetic field intensity during processing is 0.38T; the target 9 is then placed on the magnet 10. In the specific embodiment, the target 9 is monocrystalline silicon, and the size of the target is 50.8mm in diameter and 0.43mm in thickness; other sizes can be set according to the specification of the target 9, and the target 9 can be made of silicon or other non-magnetic metals; the sapphire is horizontally clamped between two clamping arms of the sample clamp 12, and the height of the clamping arms is adjusted to control the distance between the sapphire and the target 9. In this embodiment, the distance between the sapphire and the target 9 is 100 μm; the laser beam generated by the laser 2 sequentially passes through the beam expander 3, the first reflecting mirror 4, the second reflecting mirror 5, the scanning galvanometer 6 and the focusing field lens 7, and is focused and irradiated on the upper surface of the target 9 below the sapphire through transparent sapphire. In this embodiment, the wavelength is 1064nm, the pulse width is 30ns, and the laser energy density is 7.4J/cm 2 The repetition frequency is 90kHz; the computer 1 controls the scanning galvanometer 6, and the laser beam etches the microstructure on the lower surface of the sample under the control of the scanning galvanometer 6. In the embodiment, the processing shape is a groove-shaped array structure, the distance between laser scanning lines is 50 mu m, the scanning speed is 5mm/s, the scanning times are 5 times, the processed structure is shown in figure 2, and a large number of micro-nano particles are attached around the micro-groove, as shown in figure 3; and placing the sapphire processed in the mode in a solution for ultrasonic cleaning and blow-drying.
The adaptation to the actual need is within the scope of the invention.
It should be noted that it will be apparent to those skilled in the art that the present invention is not limited to the details of the above-described exemplary embodiments, but may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
The principles and embodiments of the present invention have been described in detail with reference to specific examples, which are provided to facilitate understanding of the method and core ideas of the present invention; also, it is within the scope of the present invention to be modified by those of ordinary skill in the art in light of the present teachings. In view of the foregoing, this description should not be construed as limiting the invention.
Claims (10)
1. The device for processing the hydrophilic structure on the surface of the transparent and hard and brittle material is characterized by comprising a magnetic field generator, a target material capable of generating plasma under the irradiation of a laser beam and a laser component used for emitting the laser beam, wherein the emitting end of the laser component and the target material are arranged at two sides of the transparent and hard and brittle material sample at intervals along a laser beam emitting path, a light spot of the laser beam emitted by the emitting end penetrates through the transparent and hard and brittle material sample and is focused on the surface of the target material, which is close to the transparent and hard and brittle material sample, the target material and the transparent and hard and brittle material sample are both positioned in a magnetic field generated by the magnetic field generator, and a magnetic induction line of the magnetic field is perpendicular to the surface of the target material and extends in the same direction with the laser beam.
2. The apparatus for processing a hydrophilic structure on a surface of a transparent and brittle material according to claim 1, wherein the magnetic field generator is a magnet located on a side of the target material away from the transparent and brittle material sample, and an N-pole of the magnet is disposed toward the target material.
3. The device for processing hydrophilic structures on the surface of transparent and brittle materials according to claim 2, wherein the magnet is matched with a workbench, a supporting plane parallel to a horizontal plane is arranged at the top end of the workbench, the magnet is placed on the supporting plane, the target is placed on the top of the magnet, and the transparent and brittle material sample and the emergent end are sequentially arranged above the target at intervals from bottom to top.
4. A device for processing hydrophilic structures on the surface of a transparent and brittle material according to claim 2 or 3, characterized in that the transparent and brittle material sample is provided with a sample holder, the sample holder comprises a holder base and a holding part for holding the transparent and brittle material sample, and the holding part is movably arranged on the holder base along the direction parallel to the magnetic induction line.
5. The apparatus according to claim 4, wherein the sample base is provided with a support block movably in a direction parallel to a magnetic induction line, the clamping part comprises clamping arms mounted on the support block in pairs, the two clamping arms are clamped on both sides of the transparent hard and brittle material sample and are mounted on the support block movably in a direction perpendicular to the movement direction of the support block, and the support block and the clamping arms are respectively provided with positioning members for positioning the sample base and the support block.
6. The apparatus according to claim 5, wherein the laser assembly comprises a laser, a beam expander and a focusing field lens sequentially arranged along a transmission direction of the laser beam, and the focusing field lens is located on a side of the transparent hard brittle material sample away from the target and is spaced apart from the transparent hard brittle material sample.
7. The device for processing hydrophilic structures on the surface of transparent and brittle materials according to claim 6, wherein a scanning galvanometer is arranged between the beam expander and the focusing field lens, and the focusing scene is arranged at the emergent end of the scanning galvanometer.
8. The apparatus for processing hydrophilic structures on a transparent and brittle material according to claim 7, characterized in that a plurality of reflecting mirrors are arranged between the beam expander and the scanning galvanometer, and each reflecting mirror is arranged in sequence along the transmission direction of the laser beam.
9. The apparatus for finishing a hydrophilic structure on a transparent and brittle material according to claim 8, wherein the target is made of a nonferromagnetic material.
10. A method of processing a device for processing a hydrophilic structure on a surface of a transparent, hard and brittle material according to any of claims 1 to 9, comprising the steps of:
sample installation: the method comprises the steps of installing a sample clamp on a workbench, placing a magnet with the N pole upwards on a supporting plane of the workbench, placing a target on the magnet, horizontally clamping a transparent hard and brittle material sample between two clamping arms of the sample clamp, and adjusting the height of the clamping arms to control the distance between the transparent hard and brittle material sample and the target;
preparing a laser assembly: preparing a laser component, sequentially passing laser beams generated by a laser through a beam expander, various reflectors, a scanning galvanometer and a focusing field lens, and focusing and irradiating on a target material through a transparent hard and brittle material sample;
etching: controlling a scanning galvanometer, and etching the microstructure on the lower surface of the transparent and brittle material sample by using the laser beam under the control of the scanning galvanometer;
cleaning and drying: and placing the processed transparent hard and brittle material sample in a cleaning solution for ultrasonic cleaning, and then drying to complete the processing of the transparent hard and brittle material sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311234550.5A CN117162290A (en) | 2023-09-25 | 2023-09-25 | Device and method for processing hydrophilic structure on surface of transparent hard and brittle material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311234550.5A CN117162290A (en) | 2023-09-25 | 2023-09-25 | Device and method for processing hydrophilic structure on surface of transparent hard and brittle material |
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| CN117162290A true CN117162290A (en) | 2023-12-05 |
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| CN202311234550.5A Pending CN117162290A (en) | 2023-09-25 | 2023-09-25 | Device and method for processing hydrophilic structure on surface of transparent hard and brittle material |
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| CN (1) | CN117162290A (en) |
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