CN117031590A - Microarray lens preparation system and method - Google Patents
Microarray lens preparation system and method Download PDFInfo
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- CN117031590A CN117031590A CN202310985459.0A CN202310985459A CN117031590A CN 117031590 A CN117031590 A CN 117031590A CN 202310985459 A CN202310985459 A CN 202310985459A CN 117031590 A CN117031590 A CN 117031590A
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- 238000002493 microarray Methods 0.000 title claims abstract description 92
- 238000002360 preparation method Methods 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 106
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 238000006073 displacement reaction Methods 0.000 claims abstract description 58
- 230000033001 locomotion Effects 0.000 claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 5
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 3
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000009304 pastoral farming Methods 0.000 claims 1
- 239000006185 dispersion Substances 0.000 abstract description 6
- 230000010354 integration Effects 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 10
- 238000005266 casting Methods 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
The embodiment of the application provides a micro-array lens preparation system and a method, wherein the micro-array lens preparation system comprises the following components: a base material; the femtosecond laser output module is used for outputting femtosecond laser; a first mirror for changing a direction of the femtosecond laser beam; the three-dimensional precision displacement platform is used for fixing the substrate material; the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and used for controlling the femtosecond laser output module to output femtosecond laser and controlling the movement of the three-dimensional precise displacement platform so as to realize the inscription of the focus on the substrate material and obtain the micro-array lens. The preparation flexibility of the micro-array lens can be improved, the preparation cost of the micro-array lens is reduced, the integration level of the micro-array lens is improved, and the dispersion and distortion phenomena of the traditional micro-array lens are eliminated.
Description
Technical Field
The application relates to the technical field of micro-array lenses, in particular to a micro-array lens preparation system and a micro-array lens preparation method.
Background
The micro-array lens is an important component element required for a new generation optical system such as optical communication, optical information storage device, sensor, display, etc., and has been widely used in various fields such as life, industry, scientific research, etc.
At present, the preparation method of the micro-array lens adopts a recorded mould to carry out integral casting and compression molding. However, the preparation method of the mold casting and compression molding has complex procedures, low mold design flexibility, long processing time, weak universality and high manufacturing cost. And the micro-array lens prepared by the traditional method is not easy to integrate, and has the phenomena of dispersion and distortion.
Disclosure of Invention
The embodiment of the application provides a micro-array lens preparation system and a micro-array lens preparation method, which aim to improve the flexibility of micro-array lens preparation, reduce the preparation cost of the micro-array lens, improve the integration level of the micro-array lens and effectively eliminate the chromatic dispersion and distortion phenomenon of the micro-array lens.
In a first aspect, embodiments of the present application provide a micro-array lens manufacturing system, the system comprising: a first predetermined amount of base material; the femtosecond laser output module is used for outputting collimated and energy-controllable femtosecond laser; the first reflector is used for changing the direction of the femtosecond laser beam output by the femtosecond laser output module, so that the femtosecond laser beam is focused on the substrate material through the focusing module to form a focus; the three-dimensional precision displacement platform is used for fixing the substrate material, and the position and the motion track of the substrate material are respectively controlled by the control module; the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and used for controlling the femtosecond laser output module to output femtosecond laser and controlling the movement of the three-dimensional precise displacement platform so as to realize simultaneous inscription of the focus on the substrate material and obtain the microarray lens.
In one embodiment, the number of base materials is 2 or more, and the micro array lens manufacturing system further includes: the beam splitting and focusing module comprises a first preset number of beam splitters, a first preset number of second reflecting mirrors and a second preset number of focusing objective lenses; wherein the first preset number is 1 less than the number of base materials, and the second preset number is equal to the number of base materials; the beam splitter is used for dividing the femtosecond laser reflected by the first reflecting mirror into a first preset number of light beams, and after each beam of femtosecond laser respectively passes through different second reflecting mirrors and focusing objective lenses, the beam splitter correspondingly focuses on each first preset number of substrate materials respectively to form a plurality of transversely parallel distributed focuses; the three-dimensional precision displacement platform is used for fixing the substrate materials, and the control module is used for controlling the position and the movement track of each substrate material respectively; the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and is used for controlling the femtosecond laser output module to output femtosecond laser and controlling the movement of the three-dimensional precise displacement platform, so that a plurality of transversely parallel focuses are realized to write all substrate materials at the same time, and a plurality of micro array lenses are obtained.
In one embodiment, the at least two pieces of substrate material include at least one of quartz, silicon wafer, germanium wafer, sapphire, rutile, calcium fluoride, barium fluoride, magnesium fluoride, and zinc selenide.
In one embodiment, the femtosecond laser output module comprises a femtosecond laser light source, an energy adjusting unit, an optical shutter and a diaphragm which are sequentially distributed in an optical path; the femtosecond laser source outputs femtosecond laser with set power under the control of the control module; an energy adjusting unit for receiving the femtosecond laser and adjusting the power of the femtosecond laser; the optical shutter is connected with the control module and used for controlling the on-off of the femtosecond laser beam; the diaphragm is used for adjusting the spot diameter of the femtosecond laser beam, and carrying out low-pass filtering on the femtosecond laser beam to filter high-frequency components excited in the transmission process of the femtosecond laser.
In one embodiment, the energy conditioning unit comprises a half-wave plate and a grapple prism positioned sequentially along the optical path; the half wave plate can rotate and is used for controlling the transmission ratio of the femtosecond laser beam so as to adjust the energy of the femtosecond laser output by the Grignard prism; and the Greenland prism is used for outputting the energy of the femtosecond laser.
In one embodiment, the three-dimensional precision displacement platform comprises a precision three-dimensional electronically controlled displacement platform and a plurality of substrate material clamps placed on the precision three-dimensional electronically controlled displacement platform; the precise three-dimensional electric control displacement platform is connected with the control module and is controlled and moved by the control module.
In one embodiment, the plurality of substrate material holders is twice the number of substrate materials, wherein two substrate material holders are in a group for holding a block of substrate material.
In one embodiment, the control module is configured to adjust laser power and repetition rate parameters of the femtosecond laser output module.
In an embodiment, the control module is configured to adjust the pump power of the femtosecond laser light source to achieve adjustment of the laser output power and the repetition frequency of the femtosecond laser output module.
A second aspect of an embodiment of the present application provides a method for preparing a micro array lens, applied to the micro array lens preparation system of the first aspect, the method comprising: inputting a first control instruction into the control module to control the femtosecond laser output module to output collimated and energy-controllable femtosecond laser and control the femtosecond laser beam to sequentially pass through the first reflector and the focusing module to form a focus; and inputting a second control instruction into the control module to control the movement of the three-dimensional precise displacement platform, so as to control the position and the movement track of the substrate material fixed on the three-dimensional precise displacement platform, so that the focus is focused on the substrate material, and writing the substrate material to obtain the micro-array lens.
The micro-array lens preparation system provided by the embodiment of the application comprises: a base material; the femtosecond laser output module is used for outputting collimated and energy-controllable femtosecond laser; the first reflector is used for changing the direction of the femtosecond laser beam output by the femtosecond laser output module to enable the femtosecond laser beam to be focused on the substrate material to form a focus; the three-dimensional precision displacement platform is used for fixing the substrate material, and the position and the motion track of the substrate material are respectively controlled by the control module; the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and used for controlling the femtosecond laser output module to output femtosecond laser and controlling the movement of the three-dimensional precise displacement platform to realize the inscription of the focus on the substrate material so as to obtain the micro-array lens. The flexibility of the preparation of the micro-array lens can be improved, the preparation cost of the micro-array lens is reduced, and the integration level of the micro-array lens is improved. And by adjusting parameters such as femto-second laser power, repetition frequency and the like, refractive indexes of different positions of the micro-array lens can be changed differently, so that dispersion and distortion phenomena commonly existing in the micro-array lens can be eliminated.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a micro-array lens manufacturing system according to an embodiment of the present application;
fig. 2 is a schematic structural diagram of a femto-second laser output module according to an embodiment of the present application;
FIG. 3 is a schematic diagram of a micro-array lens manufacturing system according to another embodiment of the present application;
fig. 4 is a schematic structural diagram of a beam splitting and focusing module according to an embodiment of the present application;
fig. 5 is a schematic flow chart of a method for manufacturing a micro array lens according to an embodiment of the present application.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
The flow diagrams depicted in the figures are merely illustrative and not necessarily all of the elements and operations/steps are included or performed in the order described. For example, some operations/steps may be further divided, combined, or partially combined, so that the order of actual execution may be changed according to actual situations.
It is also to be understood that the terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in this specification and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be further understood that the term "and/or" as used in the present specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes such combinations.
The application provides a micro array lens preparation system and a micro array lens preparation method, which can improve the flexibility of micro array lens preparation, reduce the preparation cost of the micro array lens and improve the integration level of the micro array lens.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a micro-array lens manufacturing system according to an embodiment of the application.
As can be seen from fig. 1, the micro-array lens manufacturing system 100 provided by the present application includes: a base material 101, a femtosecond laser output module 102, a first reflecting mirror 103, a focusing module 104, a three-dimensional precision displacement platform 105, and a control module 106.
The base material 101 includes at least one material of quartz, silicon wafer, germanium wafer, sapphire, rutile, calcium fluoride, barium fluoride, magnesium fluoride, and zinc selenide. Is secured to the three-dimensional precision displacement platform 104 by a base material clamp. Specifically, the base material 101 is laterally fixed on the three-dimensional precision displacement platform 104 by two base material jigs 107 placed on the three-dimensional precision displacement platform. When a plurality of base materials 101 are required to be placed on the three-dimensional precision displacement platform, the required base material clamps 107 are twice as many as the base materials 101, wherein two base material clamps 107 are a group for fixing one base material 101.
The femtosecond laser output module 102 is used for outputting collimated and energy-controllable femtosecond laser.
Specifically, as shown in fig. 2, fig. 2 is a schematic structural diagram of a femtosecond laser output module according to an embodiment of the present application.
As can be seen from fig. 2, in the present embodiment, the femtosecond laser output module 102 includes a femtosecond laser light source 1021, an energy adjustment unit 1022, an optical shutter 1023, and a diaphragm 1024, which are sequentially distributed in an optical path. Wherein, the femtosecond laser source 1021 is used for outputting the femtosecond laser with set power under the control of the control module 106; an energy adjustment unit 1022 for receiving the femtosecond laser and adjusting the power of the femtosecond laser; the optical shutter 1023 is connected with the control module 106 and is used for controlling the on-off of the femtosecond laser beam; and the diaphragm 1024 is used for adjusting the spot diameter of the femtosecond laser beam, and performing low-pass filtering on the femtosecond laser beam to filter out high-frequency components excited in the transmission process of the femtosecond laser.
Specifically, the energy adjustment unit 1022 includes a half-wave plate 1025 and a glaring prism 1026 placed in order along the optical path. The half-wave plate 1025 is rotatable and is used for controlling the projection ratio of the femtosecond laser beam so as to adjust the energy of the femtosecond laser output by the gram prism 1026; a glaring prism 1026 for outputting the energy of the femtosecond laser. By adopting the energy adjusting unit, the power of the femtosecond laser can be more accurately adjusted, and the control precision and the preparation quality of the preparation of the micro-array lens are further improved.
Specifically, the femtosecond laser output by the femtosecond laser output module has the wavelength of 0.1-10 mu m, the pulse energy of 1nJ-10 mu J, the repetition frequency of 1Hz-10GHz and the pulse duration of 1-1000fs.
The power and the beam attribute of the femtosecond laser can be flexibly adjusted through the femtosecond laser output module, so that the energy and the form of the femtosecond laser are suitable for different preparation requirements, and the efficiency and the quality of preparing the micro array lens are further improved.
A first mirror 103 for changing the direction of the femtosecond laser beam output by the femtosecond laser output module 102 so as to be focused on the base material 101 by the focusing module 104 to form a focus.
The first mirror 103 has a function of guiding and changing the direction of the femtosecond laser beam output by the femtosecond laser output module. By reflecting the femtosecond laser beam from the femtosecond laser output module to redirect it in space so that it can focus the femtosecond laser beam onto the substrate material through the focusing module 104, a small and intense focus is formed. At the focus, the laser energy density is very high, and local instantaneous melting or evaporation can be generated on the substrate material, so that the writing of the micro-array lens microstructure is realized.
The first mirror 103 guides the femtosecond laser beam to the base material to achieve efficient writing. The formation of the focus makes the laser energy highly concentrated, so that the writing speed is faster and the production efficiency is higher. The cooperation of the first reflecting mirror 103 and the focusing objective lens can accurately focus the laser beam at a specific position on the substrate material, so as to realize accurate writing of a microstructure. Further, by adjusting the angle of the first reflecting mirror 103, the direction of the laser beam can be controlled, so that the focal position can be flexibly adjusted, and the substrate materials with different shapes and sizes can be adapted. Through the high-energy density focus formed by focusing, high-precision inscription of the substrate material can be realized, and the preparation quality and precision are improved. In addition, since laser energy is highly focused, the focal spot size is small and the energy density is high, less laser energy is required for the writing process, thereby reducing energy consumption and running costs.
The three-dimensional precision displacement platform 105 is used for fixing the base material 101, and the position and the movement track of the base material 101 are respectively controlled by the control module 106.
Specifically, the three-dimensional precision displacement platform comprises a precision three-dimensional electric control displacement platform and a plurality of substrate material clamps arranged on the precision three-dimensional electric control displacement platform, wherein the precision three-dimensional electric control displacement platform is connected with a control module and is controlled and moved by the controllable module, so that the position and the movement track of the substrate material are controlled. To ensure accurate positioning and alignment of the laser focus, thereby ensuring precision and consistency in preparing the microarray lens.
The control module 106 is connected with the femtosecond laser output module 102 and the three-dimensional precision displacement platform 105, and is used for controlling the femtosecond laser output module 102 to output femtosecond laser and controlling the three-dimensional precision displacement platform 105 to move, so that the first reflecting mirror 103 changes the direction of the femtosecond laser beam output by the femtosecond laser output module 102, and focuses the femtosecond laser beam on a focus formed on the base material 101 to inscribe the base material 101, thereby obtaining the microarray lens.
The control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform, so that the control module has the functions of controlling the output, closing and energy adjustment of the femtosecond laser. This allows the operator to flexibly adjust parameters according to the preparation requirements of the micro-array lens, enabling custom preparation of the micro-array lens.
Specifically, the control module is used for adjusting the laser power and the repetition frequency parameters of the femtosecond laser output module, so that the refractive indexes of different positions of the micro-array lens can be changed differently, the dispersion and distortion phenomena of the micro-array lens can be eliminated, and the preparation quality and performance of the micro-array lens are improved. In specific implementation, the control module is used for adjusting the pumping power of the femtosecond laser light source to realize adjustment of the laser power and the repetition frequency times of the femtosecond laser output module.
In this embodiment, a single-block substrate material is exemplified, and a micro array lens manufacturing system is described. In practical application, the preparation system of the micro-array lens provided by the embodiment of the application can also write a plurality of substrate materials at the same time to finish the preparation of a plurality of micro-array lenses.
Exemplary, as shown in fig. 3, fig. 3 is a schematic structural diagram of a micro-array lens manufacturing system according to another embodiment of the present application. Compared with the embodiment shown in fig. 1, this embodiment includes: two pieces of base material 101 (it should be noted that, in implementation, the number of base materials may be greater than 2, and the present embodiment is only illustrated with two pieces of base materials) and the focusing module 104 is replaced with the beam splitting focusing module 108.
Specifically, the beam splitting and focusing module 108 is configured to split the femtosecond laser beam reflected by the first reflecting mirror 103 to obtain a corresponding number of split lasers, in this embodiment, two beams of lasers are correspondingly obtained, and the split lasers are focused on different substrate materials 101 respectively to form corresponding focuses.
As shown in fig. 4, fig. 4 is a schematic structural diagram of a beam splitting and focusing module according to an embodiment of the application.
As can be seen from fig. 4, the beam splitting and focusing module 108 provided in this embodiment includes: a beam splitter 1081, a second mirror 1082, and two focusing objective lenses 1083; wherein the beam splitter 1081 is respectively connected to the second reflecting mirror 1082 and one focusing objective 1083, and the second reflecting objective 1082 is also connected to the other focusing objective 1083; the second reflecting objective 1082 is configured to split the femtosecond laser reflected by the first reflecting mirror 103 into two femtosecond lasers, where one of the two femtosecond lasers passes through the second reflecting mirror 1082 and one focusing objective 1083 and is correspondingly focused on one substrate material 101, and the other of the two femtosecond lasers passes through the other focusing objective and is correspondingly focused on the other substrate material 101, and the two femtosecond lasers respectively form two focuses distributed in parallel in a transverse direction on the two substrate materials.
It should be noted that fig. 4 only shows a schematic structural diagram of the beam splitting and focusing module required for writing two pieces of substrate materials placed in parallel in the lateral direction, and does not constitute a limitation of the beam splitting and focusing module. The corresponding beam splitting and focusing module 108 includes a different number of beam splitters 1081, second mirrors 1082, and two focusing objectives 1083 depending on the number of substrate materials to be inscribed. Wherein the number of beam splitters 1081 and second mirrors 1082 is the same, each is 1 less than the number of substrate materials, and the number of focusing objectives 1083 is the same as the number of substrate materials. The beam splitters 1081 and the second reflection objective 1082 are arranged in the same row at intervals, and each beam splitter 1081 is respectively connected with the second reflection objective 1082 at the adjacent position; each beam splitter 1081 and each second mirror 1082 are respectively connected to a focusing objective 1083 in the vertical direction. Each focusing objective 1083 is used to focus one of the femtosecond laser beams after the beam splitting by each beam splitter 1081 connected correspondingly on the corresponding substrate material, or focus the other of the femtosecond laser beams reflected by each second reflecting mirror 1082 connected correspondingly on the corresponding substrate material. Each substrate material is placed under each focusing objective lens correspondingly and transversely, and a focus is formed on each substrate material. The number of focal points of the micro-array lens system prepared by femtosecond laser direct writing is increased by increasing the number of reflecting mirrors and focusing lenses in the beam splitting focusing module, so that more micro-array lenses can be prepared simultaneously, and the preparation efficiency is improved.
In this embodiment, the three-dimensional precision displacement platform 105 is used for fixing the base materials 101, and the control module 106 controls the position and the movement track of each base material 101.
Preferably, the three-dimensional precision displacement platform comprises a precision three-dimensional electronically controlled displacement platform and a substrate material clamp placed on the precision three-dimensional electronically controlled displacement platform. The precise three-dimensional electric control displacement platform is connected with the control module and can be controlled and moved by the control module. By adopting the three-dimensional precise displacement platform, high-precision positioning and motion control of the substrate material can be realized, so that the preparation position of the micro-array lens is ensured to be accurate, and the preparation consistency and stability are improved.
And the control module 106 is connected with the femtosecond laser output module 101 and the three-dimensional precision displacement platform 105 and is used for controlling the femtosecond laser output module 101 to output femtosecond laser and controlling the three-dimensional precision displacement platform 105 to move so as to realize simultaneous inscription of a plurality of transversely parallel distributed focuses on each substrate material 101 and obtain a plurality of micro array lenses.
From the above analysis, the preparation system of the micro array lens provided by the embodiment of the application comprises: a base material; the femtosecond laser output module is used for outputting collimated and energy-controllable femtosecond laser; the first reflector is used for changing the direction of the femtosecond laser beam output by the femtosecond laser output module to enable the femtosecond laser beam to be focused on the substrate material to form a focus; the three-dimensional precision displacement platform is used for fixing the substrate material, and the position and the motion track of the substrate material are respectively controlled by the control module; the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and used for controlling the femtosecond laser output module to output femtosecond laser and controlling the movement of the three-dimensional precise displacement platform to realize the inscription of the focus on the substrate material so as to obtain the micro-array lens. The flexibility of the preparation of the micro-array lens can be improved, the preparation cost of the micro-array lens is reduced, and the integration level of the micro-array lens is improved.
Referring to fig. 5, fig. 5 is a schematic flow chart of a method for manufacturing a micro array lens according to an embodiment of the application. It should be noted that the method for preparing a micro-array lens provided in this embodiment is applied to the micro-array lens preparation system shown in the embodiment of fig. 1. As can be seen from fig. 5, the method for manufacturing a micro array lens according to the present embodiment includes steps S501 to S502. The details are as follows:
s501: and a first control instruction is input into the control module to control the femtosecond laser output module to output collimated and energy-controllable femtosecond laser and control the femtosecond laser beam to sequentially pass through the first reflector and the focusing module to form a focus.
Before inscription, a suitable femtosecond laser beam needs to be prepared. By inputting a first control command into the control module, the system can start the femtosecond laser output module to generate collimated and energy-controllable femtosecond laser. This means that the laser beam is adjusted by the system, the high quality beam characteristics are maintained, and the stability of the energy and direction of the laser is ensured, thereby providing a high quality laser writing process.
After the femtosecond laser beam is controlled to be output by the femtosecond laser output module, the direction of the femtosecond laser beam is changed by adjusting the angle of the first reflecting mirror through guiding of the first reflecting mirror, and then the femtosecond laser beam is focused on a substrate material to form a small and strong focus. This focus is a critical part of laser inscription because its high energy density can produce localized instantaneous melting or evaporation on the substrate material, enabling inscription of fine structures. High-quality laser inscription can be realized, and inscription precision and stability are ensured. Specifically, the process of controlling the femtosecond laser output module to output the collimated and energy-controllable femtosecond laser and controlling the femtosecond laser beam to sequentially pass through the first reflecting mirror to form the focus may be specifically described in fig. 1 to 4, and will not be described herein.
S502: and inputting a second control instruction into the control module to control the movement of the three-dimensional precise displacement platform, so as to control the position and the movement track of the substrate material fixed on the three-dimensional precise displacement platform, to enable the focus to be gathered on the substrate material, and to write the substrate material, thereby obtaining the micro-array lens.
In the laser writing process, the position of the base material needs to be precisely controlled. By inputting a second control instruction into the control module, the three-dimensional precision displacement platform can be started, so that the position and the motion track of the substrate material can be accurately adjusted, and the laser focus is ensured to be accurately focused on a required position. The precise position control can realize high-precision inscription and ensure the quality and stability of products.
By controlling the three-dimensional precise displacement platform, the high-precision control on the position and the motion trail of the substrate material can be realized, so that the inscription process is more flexible and precise. This allows the system to accommodate substrate materials of different sizes and shapes, achieving varied inscription requirements. Specifically, the specific implementation process of this step may refer to the specific descriptions in the embodiments of fig. 1 to 4, which are not repeated herein.
The preparation method of the micro array lens not only improves the flexibility of the preparation of the micro array lens and reduces the preparation cost of the micro array lens, but also improves the integration level of the micro array lens and effectively eliminates the dispersion and distortion phenomena of the micro array lens.
While the application has been described with reference to certain preferred embodiments, it will be understood by those skilled in the art that various changes and substitutions of equivalents may be made and equivalents will be apparent to those skilled in the art without departing from the scope of the application. Therefore, the protection scope of the application is subject to the protection scope of the claims.
Claims (10)
1. A microarray lens preparation system, comprising:
a base material;
the femtosecond laser output module is used for outputting femtosecond laser;
the first reflector is used for changing the direction of the femtosecond laser beam output by the femtosecond laser output module, so that the femtosecond laser beam is focused on the substrate material through the focusing module to form a focus;
the three-dimensional precision displacement platform is used for fixing the substrate material, and the position and the movement track of the substrate material are respectively controlled by the control module;
the control module is connected with the femtosecond laser output module and the three-dimensional precise displacement platform and used for controlling the femtosecond laser output module to output the femtosecond laser and controlling the three-dimensional precise displacement platform to move so as to realize the inscription of the focus on the substrate material and obtain the micro array lens.
2. The microarray lens preparation system of claim 1, wherein the number of substrate materials is 2 or more, said system further comprising: the beam splitting and focusing module comprises a first preset number of beam splitters, a first preset number of second reflecting mirrors and a second preset number of focusing objective lenses; wherein the first preset number is 1 less than the number of base materials, and the second preset number is equal to the number of base materials;
the beam splitter is used for splitting the femtosecond laser reflected by the first reflecting mirror into a first preset number of light beams, and after each beam of femtosecond laser respectively passes through the different second reflecting mirrors and the focusing objective lens, the beam splitter correspondingly focuses on each first preset number of substrate materials respectively to form a plurality of focuses which are distributed in parallel transversely;
the three-dimensional precision displacement platform is used for fixing the substrate materials, and the control module is used for controlling the position and the movement track of each substrate material respectively;
the control module is connected with the femtosecond laser output module and the three-dimensional precision displacement platform and used for controlling the femtosecond laser output module to output the femtosecond laser and controlling the three-dimensional precision displacement platform to move so as to realize simultaneous inscription of the substrate materials by the plurality of transversely parallel distributed focuses and obtain a plurality of micro-array lenses.
3. The microarray lens preparation system of claim 1 or 2, wherein said at least two substrate materials comprise at least one of quartz, silicon wafer, germanium wafer, sapphire, rutile, calcium fluoride, barium fluoride, magnesium fluoride and zinc selenide.
4. The micro array lens manufacturing system of claim 1 or 2, wherein the femtosecond laser output module comprises a femtosecond laser light source, an energy adjusting unit, an optical shutter and a diaphragm which are sequentially distributed in an optical path;
the femtosecond laser source is used for outputting femtosecond laser with set power under the control of the control module;
the energy adjusting unit is used for receiving the femtosecond laser and adjusting the power of the femtosecond laser;
the optical shutter is connected with the control module and used for controlling the on-off of the femtosecond laser beam;
the diaphragm is used for adjusting the spot diameter of the femtosecond laser beam, and carrying out low-pass filtering on the femtosecond laser beam to filter high-frequency components excited in the transmission process of the femtosecond laser.
5. The microarray lens preparation system of claim 4, wherein said energy adjustment unit comprises a half wave plate and a grazing prism placed sequentially along the optical path;
the half-wave plate can rotate and is used for controlling the transmission proportion of the femtosecond laser beam so as to adjust the energy of the femtosecond laser output by the Grignard prism;
the Greenland prism is used for outputting the energy of the femtosecond laser.
6. The microarray lens preparation system of claim 1 or 2, wherein said three-dimensional precision displacement stage comprises a precision three-dimensional electronically controlled displacement stage and a plurality of substrate material clamps placed on said precision three-dimensional electronically controlled displacement stage; the precise three-dimensional electric control displacement platform is connected with the control module and is controlled and moved by the control module.
7. The microarray lens preparation system of claim 6, wherein said plurality of substrate holders is twice as many as said substrate, wherein two substrate holders are a set for holding a block of substrate.
8. The micro-array lens manufacturing system of claim 1 or 2, wherein the control module is configured to adjust laser power and repetition rate parameters of the femtosecond laser output module.
9. The micro-array lens manufacturing system of claim 8, wherein the control module is configured to adjust the pump power of the femtosecond laser light source to achieve adjustment of the laser power and the number of repetition frequencies of the femtosecond laser output module.
10. A method for manufacturing a micro array lens, which is applied to the micro array lens manufacturing system according to any one of claims 1 to 8, the method comprising:
inputting a first control instruction into the control module to control the femtosecond laser output module to output collimated and energy-controllable femtosecond laser and control the femtosecond laser beam to sequentially pass through the first reflector and the focusing module to form a focus;
and inputting a second control instruction into the control module to control the movement of the three-dimensional precision displacement platform, so as to control the position and the movement track of the substrate material fixed on the three-dimensional precision displacement platform, so that the focus is gathered on the substrate material, and writing the substrate material to obtain the micro-array lens.
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| CN202310985459.0A CN117031590A (en) | 2023-08-05 | 2023-08-05 | Microarray lens preparation system and method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202310985459.0A CN117031590A (en) | 2023-08-05 | 2023-08-05 | Microarray lens preparation system and method |
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- 2023-08-05 CN CN202310985459.0A patent/CN117031590A/en active Pending
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